JP2009269094A - Method and system of manufacturing ground article - Google Patents

Method and system of manufacturing ground article Download PDF

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JP2009269094A
JP2009269094A JP2008118757A JP2008118757A JP2009269094A JP 2009269094 A JP2009269094 A JP 2009269094A JP 2008118757 A JP2008118757 A JP 2008118757A JP 2008118757 A JP2008118757 A JP 2008118757A JP 2009269094 A JP2009269094 A JP 2009269094A
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polishing
manufacturing
buffer material
sludge
consumable
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JP5097611B2 (en
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Tomio Kojima
富美夫 小島
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Ohara Inc
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00Technologies relating to the processing of minerals
    • Y02P40/50Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57Improving the yield, e-g- reduction of reject rates

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  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Treatment Of Sludge (AREA)
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method and a system of manufacturing a ground article capable of reducing an amount of waste sludge. <P>SOLUTION: The manufacturing method of the ground article 60 includes a preparatory grinding step of chamfering an object 50 to be ground by scrubbing the object 50 in a grinding container 21 in the presence of a shock-absorbing medium 51 to make the article 60, and a recycling step of mixing the sludge 54 generated during the preparatory grinding step with a worn shock-absorbing medium 53 comprising the worn medium 51 into a lump to recycle a shock-absorbing medium 55, wherein the preparatory grinding step and the recycling step are successively repeated. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、被研磨品の製造方法及び製造システムに関し、より詳しくはプレス用ガラス製品の製造方法及び製造システムに関する。   The present invention relates to a manufacturing method and a manufacturing system for an article to be polished, and more particularly to a manufacturing method and a manufacturing system for a glass product for pressing.

従来、素材を所望の形状へと変形する技術として、研磨が汎用されている。例えば、レンズ等の光学素子は、ガラスブロックを切断、研削、及び研磨することでレンズに近い大きさのガラス角材を作製し、このガラス角材を面取りした後にプレス成形することで製造される(特許文献1参照)。
特開2001−19446号公報
Conventionally, polishing has been widely used as a technique for deforming a material into a desired shape. For example, an optical element such as a lens is manufactured by cutting, grinding, and polishing a glass block to produce a glass square having a size close to that of the lens, chamfering the glass square, and then press molding (patent) Reference 1).
Japanese Patent Laid-Open No. 2001-19446

しかし、切断、研削、及び研磨の際には、素材や緩衝材等が削られたスラッジが多量に発生する。かかるスラッジは、その処理に多大な費用がかかるのみならず、外部環境に悪影響を与える場合もある。   However, during cutting, grinding, and polishing, a large amount of sludge from which the material, cushioning material, and the like have been removed is generated. Such sludge is not only very expensive to process, but may also adversely affect the external environment.

本発明は、以上の実情に鑑みてなされたものであり、スラッジの廃棄量を低減できる被研磨品の製造方法及び製造システムを提供することを目的とする。   This invention is made | formed in view of the above situation, and it aims at providing the manufacturing method and manufacturing system of the to-be-polished goods which can reduce the discard amount of sludge.

本発明者は、研磨等で発生するスラッジが緩衝材として活用できることを見出し、本発明を完成するに至った。具体的には、本発明は以下のようなものを提供する。   The inventor has found that sludge generated by polishing or the like can be used as a buffer material, and has completed the present invention. Specifically, the present invention provides the following.

(1) 研磨対象を緩衝材の存在下、研磨容器内で擦りあわせることで前記研磨対象の面取りを行い、被研磨品を作製する予備研磨工程と、
前記予備研磨工程で生じるスラッジを塊化することで、緩衝材を再生する再生工程と、を有し、
前記予備研磨工程及び前記再生工程を順次繰り返す被研磨品の製造方法。
(1) A preliminary polishing step of chamfering the polishing object by rubbing the polishing object in the presence of a cushioning material in a polishing container to produce an object to be polished;
A regeneration step of regenerating the buffer material by agglomerating sludge generated in the preliminary polishing step,
A method for manufacturing an article to be polished, wherein the preliminary polishing step and the regeneration step are sequentially repeated.

(2) 前記緩衝材とともに砥粒を併用する(1)記載の製造方法。   (2) The manufacturing method according to (1), wherein abrasive grains are used in combination with the cushioning material.

(3) 前記再生工程では、前記予備研磨工程で生じるスラッジと、前記緩衝材が消耗した消耗緩衝材とを混合し造粒することで、緩衝材を再生する(1)又は(2)記載の製造方法。   (3) In the regeneration step, the buffer material is regenerated by mixing and granulating the sludge generated in the preliminary polishing step and the consumable buffer material consumed by the buffer material (1) or (2) Production method.

(4) 前記消耗緩衝材を消耗の程度に基づいて複数の消耗クラスに分類する分類工程を更に有し、
前記再生工程では、いずれか一つの消耗クラスに属する消耗緩衝材を用いて、緩衝材を再生する(3)記載の製造方法。
(4) The method further comprises a classification step of classifying the consumable cushioning material into a plurality of consumable classes based on the degree of consumable,
(3) The manufacturing method according to (3), wherein in the regeneration step, the cushioning material is regenerated using a consumable cushioning material belonging to any one of the consumption classes.

(5) 前記消耗の程度は、前記消耗緩衝材の粒子径及び/又は質量の大小である(4)記載の製造方法。   (5) The production method according to (4), wherein the degree of consumption is a particle size and / or mass of the consumption buffer material.

(6) 消耗の程度が低い低消耗クラスに属する低消耗緩衝材は、前記再生工程を経ずに、前記予備研磨工程において再利用する(4)又は(5)記載の製造方法。   (6) The manufacturing method according to (4) or (5), wherein the low-consumption buffer material belonging to the low-consumption class having a low degree of consumption is reused in the preliminary polishing step without going through the regeneration step.

(7) 前記予備研磨工程の前に、元材を切断、研削、及び/又は切削することで前記研磨対象を作製する研磨対象作製工程を有し、
前記再生工程では、前記研磨対象作製工程で生じるスラッジを更に混合する(1)から(6)いずれか記載の製造方法。
(7) Before the preliminary polishing step, the polishing target preparation step of preparing the polishing target by cutting, grinding, and / or cutting the base material,
The manufacturing method according to any one of (1) to (6), wherein the sludge generated in the polishing object manufacturing step is further mixed in the regeneration step.

(8) 前記予備研磨工程後の前記研磨容器内を洗浄液で洗浄することにより、スラッジを含む廃液を回収し、この廃液から分離し乾燥することで粉状のスラッジを得るスラッジ回収工程を更に有し、
前記再生工程では、前記粉状のスラッジを用い、所定液体を噴霧することで塊化を促進する(1)から(7)いずれか記載の製造方法。
(8) There is further provided a sludge recovery step of recovering waste liquid containing sludge by washing the inside of the polishing container after the preliminary polishing step with a cleaning liquid, and obtaining powdery sludge by separating from the waste liquid and drying. And
In the regeneration step, the agglomeration is promoted by spraying a predetermined liquid using the powdery sludge, the manufacturing method according to any one of (1) to (7).

(9) 前記所定液体は、前記廃液からスラッジが分離された廃水を含む(8)記載の製造方法。   (9) The manufacturing method according to (8), wherein the predetermined liquid includes waste water in which sludge is separated from the waste liquid.

(10) (1)から(9)いずれか記載の製造方法において前記研磨対象としてガラス角材を用いて製造されるプレス用ガラス製品をリヒートプレスする光学素子の製造方法。   (10) A method for manufacturing an optical element, wherein the glass product for press manufactured using a glass square material as the polishing object in the manufacturing method according to any one of (1) to (9) is reheat pressed.

(11) (10)記載の製造方法で製造される光学素子を用いる光学機器の製造方法。   (11) A method for manufacturing an optical apparatus using the optical element manufactured by the manufacturing method according to (10).

(12) 研磨対象を緩衝材の存在下、研磨容器内で擦りあわせることで前記研磨対象の面取りを行い、被研磨品を作製する予備研磨手段と、
前記予備研磨手段で生じるスラッジを塊化することで、緩衝材を再生する再生手段と、を備える被研磨品の製造システム。
(12) Pre-polishing means for chamfering the object to be polished by rubbing the object to be polished in a polishing container in the presence of a buffer material to produce an object to be polished;
A system for manufacturing an article to be polished, comprising: regeneration means for regenerating the buffer material by agglomerating sludge generated by the preliminary polishing means.

(13) 前記再生手段で再生した緩衝材を、前記研磨容器に供給する再生供給手段を更に備える(12)記載の製造システム。   (13) The manufacturing system according to (12), further including a regeneration supply unit that supplies the buffer material regenerated by the regeneration unit to the polishing container.

(14) 前記研磨容器に砥粒を供給する砥粒供給手段を更に備える(12)又は(13)記載の製造システム。   (14) The manufacturing system according to (12) or (13), further comprising an abrasive supply means for supplying abrasive to the polishing container.

(15) 前記再生手段は、前記予備研磨手段で生じるスラッジと、前記緩衝材が消耗した消耗緩衝材とを混合し造粒することで、緩衝材を再生する(12)から(14)いずれか記載の製造システム。   (15) The regeneration unit regenerates the buffer material by mixing and granulating the sludge generated by the preliminary polishing unit and the consumable buffer material consumed by the buffer material, and any one of (12) to (14) The described manufacturing system.

(16) 前記消耗緩衝材を消耗の程度に基づいて複数の消耗クラスに分類する分類手段を更に備え、
前記再生手段には、いずれか一つの消耗クラスに属する消耗緩衝材が投入される(15)記載の製造システム。
(16) It further comprises classification means for classifying the consumable cushioning material into a plurality of consumable classes based on the degree of consumption,
The production system according to (15), wherein a consumable cushioning material belonging to any one consumable class is input to the regeneration means.

(17) 前記分類手段は、前記消耗緩衝材の粒子径及び/又は質量の大小に応じて前記消耗の程度を判定する判定手段を有する(16)記載の製造システム。   (17) The manufacturing system according to (16), wherein the classification unit includes a determination unit that determines the degree of consumption according to the particle size and / or mass of the consumable buffer material.

(18) 消耗の程度が低い低消耗クラスに属する低消耗緩衝材を、前記再生手段を迂回して、前記研磨容器に搬送する迂回手段を更に備える(16)又は(17)記載の製造システム。   (18) The manufacturing system according to (16) or (17), further including a bypass unit that bypasses the regeneration unit and transports the low-consumption buffer material belonging to the low-consumption class having a low level of consumption to the polishing container.

(19) 元材を切断、研削、及び/又は切削することで前記研磨対象を作製する研磨対象作製手段を更に備え、
前記再生手段には、前記研磨対象作製手段から生じるスラッジが更に投入されて混合される(12)から(18)いずれか記載の製造システム。
(19) It further comprises a polishing object preparation means for preparing the polishing object by cutting, grinding, and / or cutting the base material,
The production system according to any one of (12) to (18), wherein sludge generated from the polishing object preparation means is further introduced into and mixed with the regeneration means.

(20) 前記研磨容器内を洗浄液で洗浄することにより、スラッジを含む廃液を回収し、この廃液から分離し乾燥することで粉状のスラッジを得るスラッジ回収手段と、
前記粉状のスラッジを前記再生手段に投入する投入手段と、
前記再生手段に所定液体を噴霧することで塊化を促進する噴霧手段と、を更に備える(12)から(19)いずれか記載の製造システム。
(20) Sludge recovery means for recovering waste liquid containing sludge by cleaning the inside of the polishing container with a cleaning liquid, and obtaining powdery sludge by separating from the waste liquid and drying;
A charging means for charging the powdery sludge into the regeneration means;
The manufacturing system according to any one of (12) to (19), further comprising spraying means for promoting agglomeration by spraying a predetermined liquid on the regeneration means.

(21) 前記噴霧手段に、前記廃液からスラッジが分離された廃水を供給する廃水供給手段を更に備える(20)記載の製造システム。   (21) The manufacturing system according to (20), further comprising waste water supply means for supplying the spray means with waste water from which sludge is separated from the waste liquid.

(22) (12)から(21)いずれか記載の製造システムと、この製造システムで製造される被研磨品をリヒートプレスするプレス手段と、を備え、前記製造システムは前記研磨対象としてガラス角材を用いる光学素子製造装置。   (22) The manufacturing system according to any one of (12) to (21), and a press unit that reheat presses an object to be polished manufactured by the manufacturing system, wherein the manufacturing system uses a glass corner as the object to be polished. Optical element manufacturing apparatus to be used.

(23) (22)記載の光学素子製造装置を備える光学機器製造装置。   (23) An optical device manufacturing apparatus including the optical element manufacturing apparatus according to (22).

本発明によれば、予備研磨工程で生じるスラッジが緩衝材の再生に消費されるとともに、再生された緩衝材は予備研磨工程で再利用される。このようなサイクルが順次繰り返されるので、スラッジの廃棄量を低減でき、しかも緩衝材の消耗に伴う新規緩衝材の必要量が低減され、製造コストを削減できる。   According to the present invention, the sludge generated in the preliminary polishing process is consumed for the regeneration of the buffer material, and the regenerated buffer material is reused in the preliminary polishing process. Since such a cycle is sequentially repeated, the amount of sludge discarded can be reduced, and the necessary amount of new cushioning material accompanying consumption of the cushioning material can be reduced, thereby reducing the manufacturing cost.

以下、本発明の一実施形態について、図面を参照しながら説明する。   Hereinafter, an embodiment of the present invention will be described with reference to the drawings.

[被研磨品の製造システム]
図1は、本実施形態に係る被研磨品の製造システム10のブロック図である。この製造システム10は、予備研磨手段としての予備研磨部20と、図示しない再生手段を備える。
[Production system for polished products]
FIG. 1 is a block diagram of a manufacturing system 10 for an article to be polished according to the present embodiment. The manufacturing system 10 includes a preliminary polishing unit 20 as preliminary polishing means and a regenerating means (not shown).

(予備研磨部)
予備研磨部20は研磨容器21を備え、この研磨容器21内で被研磨品60を作製する。本実施形態では、研磨容器21は従来周知のバレル研磨装置であり、振動源が内蔵された突起が研磨容器21の中央に突設されている。かかる研磨容器21内に研磨対象50及び緩衝材51が共存する状態で振動源を稼動すると、研磨対象50及び緩衝材51が振動して流動する。これにより、研磨対象50が緩衝材51と擦りあわされ、あるいは後述の研磨対象50と砥粒52とが擦りあわされることにより、面取りされて被研磨品60が作製される。
(Pre-polishing part)
The preliminary polishing unit 20 includes a polishing container 21, and an article 60 to be polished is produced in the polishing container 21. In the present embodiment, the polishing container 21 is a conventionally known barrel polishing apparatus, and a protrusion having a built-in vibration source is provided in the center of the polishing container 21. When the vibration source is operated in a state where the polishing object 50 and the buffer material 51 coexist in the polishing container 21, the polishing object 50 and the buffer material 51 vibrate and flow. As a result, the polishing object 50 is rubbed with the buffer material 51, or the polishing object 50 and abrasive grains 52, which will be described later, are rubbed together to be chamfered to produce the polished article 60.

本実施形態での研磨対象50はガラス角材又は丸棒切断品等であり、かかるガラス角材を用いて得られる被研磨品60は、図示しない光学素子製造装置のプレス手段でリヒートプレスされて、レンズ等の光学素子になる。被研磨品60は面取りされて角部を喪失しているため、リヒートプレスの際に角部が結晶化する等の事態が抑制され、歩留まりを向上できる。また、上記の光学素子は光学機器の製造に有用である。なお、研磨対象50は、セラミック、金属、ガラス、ガラスセラミック等の種々の素材からなってよく、その形状も特に限定されない。   The object to be polished 50 in this embodiment is a glass square or a round bar cut product, etc., and an article to be polished 60 obtained by using such a glass square is reheat-pressed by a pressing means of an optical element manufacturing apparatus (not shown) to form a lens. It becomes an optical element. Since the object to be polished 60 is chamfered and the corner portion is lost, a situation in which the corner portion is crystallized at the time of reheating press is suppressed, and the yield can be improved. Moreover, the above optical element is useful for the production of optical equipment. In addition, the grinding | polishing object 50 may consist of various raw materials, such as a ceramic, a metal, glass, glass ceramic, and the shape is not specifically limited.

緩衝材51は、研磨対象50同士の衝突による破損を抑制するべく、研磨対象50よりも適宜柔らかいことが好ましく、かかる条件を満たす限りにおいて、緩衝材51の組成は特に限定されない。このため、後述の緩衝材55も、その組成が緩衝材51とは異なるが再利用可能である。   The buffer material 51 is preferably softer than the polishing object 50 in order to suppress damage due to collision between the polishing objects 50, and the composition of the buffer material 51 is not particularly limited as long as this condition is satisfied. For this reason, the buffer material 55 described later can be reused although its composition is different from that of the buffer material 51.

本実施形態の製造システム10は、図示しない砥粒供給手段を更に備え、この砥粒供給手段によって研磨容器21に砥粒52が供給される。これにより、研磨対象50が砥粒52で効率的に研磨されることになる。砥粒52は、その組成が特に限定されるものではないが、研磨効率を向上するべく、研磨対象50よりも適宜硬いことが好ましい。かかる砥粒52は、特に限定されないが、通常、炭化ケイ素、ダイヤモンド粒子等である。   The manufacturing system 10 of this embodiment further includes an abrasive grain supply unit (not shown), and the abrasive grains 52 are supplied to the polishing container 21 by the abrasive grain supply unit. As a result, the polishing object 50 is efficiently polished by the abrasive grains 52. The composition of the abrasive grains 52 is not particularly limited, but it is preferable that the abrasive grains 52 are appropriately harder than the object to be polished 50 in order to improve the polishing efficiency. Such abrasive grains 52 are not particularly limited, but are usually silicon carbide, diamond particles and the like.

一方、被研磨品60を除く他の材料も研磨容器21から回収される。回収される材料は、緩衝材51が消耗した消耗緩衝材53と、スラッジ54とを含み、このスラッジ54には研磨対象50の小破片541、粉化した緩衝材、及び砥粒52等が多量に含まれている。そして、スラッジ54及び消耗緩衝材53が再生手段で混合されて塊化することで、緩衝材55が再生されることになる。   On the other hand, materials other than the article to be polished 60 are also collected from the polishing container 21. The recovered material includes a consumable cushioning material 53 consumed by the cushioning material 51 and a sludge 54. The sludge 54 contains a large amount of small fragments 541 of the polishing object 50, powdered cushioning material, abrasive grains 52, and the like. Included. Then, the sludge 54 and the consumable buffer material 53 are mixed and agglomerated by the regenerating means, whereby the buffer material 55 is regenerated.

本実施形態の製造システム10は図示しない分類手段を更に備え、この分類手段は消耗緩衝材53を消耗の程度に基づいて複数の消耗クラスに分類する。本実施形態では、図示しない判定手段が消耗緩衝材53の粒子径及び/又は質量の大小に応じて消耗の程度を判定し、消耗緩衝材53は、消耗の程度が大きい順に、高消耗緩衝材531,中消耗緩衝材532、及び低消耗緩衝材533に分類されている。ただし、消耗の程度は、消耗緩衝材53の粒子径や質量の大小のみには限定されない。   The manufacturing system 10 of the present embodiment further includes a classifying unit (not shown), and classifies the consumable cushioning material 53 into a plurality of consumable classes based on the degree of consumption. In the present embodiment, a determination unit (not shown) determines the degree of consumption according to the particle size and / or mass of the consumable buffer material 53, and the consumable buffer material 53 is a highly consumable buffer material in descending order of consumption. 531, medium wear buffer material 532, and low wear buffer material 533. However, the degree of wear is not limited only to the particle size and mass of the wear buffer material 53.

そして、再生手段には、いずれか一つの消耗クラスに属する消耗緩衝材、つまり高消耗緩衝材531,中消耗緩衝材532、及び低消耗緩衝材533ごとに分けて投入される(なお、後述のように低消耗緩衝材533は再生手段に投入されない)。これにより、同一ロットから得られる緩衝材55の品質(例えば、粒子径、質量、硬度)が均質化される。   The regeneration means is supplied separately for each of the consumption buffer materials belonging to any one of the consumption classes, that is, the high-consumption buffer material 531, the medium-consumption buffer material 532, and the low-consumption buffer material 533 (which will be described later). Thus, the low-consumption buffer 533 is not put into the regenerating means). Thereby, the quality (for example, particle diameter, mass, hardness) of the buffer material 55 obtained from the same lot is homogenized.

本実施形態では、図示しない迂回手段が、消耗の程度が低い低消耗クラスに属する低消耗緩衝材533を、再生手段を迂回して研磨容器21に搬送する。低消耗緩衝材533は、その消耗の程度が低いため、再生された緩衝材55と略同等の効率で研磨を行うことができ、他方、低消耗緩衝材533に関して再生処理を行う費用及び時間が削減される。   In the present embodiment, a bypass unit (not shown) transports the low-consumption buffer material 533 belonging to the low-consumption class with a low degree of consumption to the polishing container 21 by bypassing the regeneration unit. Since the low-consumption buffer material 533 has a low degree of consumption, the low-consumption buffer material 533 can be polished with substantially the same efficiency as the regenerated buffer material 55, and on the other hand, the cost and time for performing the regeneration process on the low-consumption buffer material 533 Reduced.

低消耗クラスの範囲は、再生処理を行う費用及び時間と、許容できる磨耗効率の下限及び研磨される研磨対象50の大きさとを考慮して適宜設定されてよい。つまり、低消耗クラスの範囲を広げると、再生処理を行う費用及び時間が削減されるものの、研磨対象50の磨耗効率が低下する一方、低消耗クラスの範囲を狭めると、再生処理を行う費用及び時間が増すものの、研磨対象50の磨耗効率が上昇する。   The range of the low consumption class may be appropriately set in consideration of the cost and time for performing the regeneration process, the lower limit of the allowable wear efficiency, and the size of the object 50 to be polished. That is, if the range of the low consumption class is expanded, the cost and time for performing the regeneration process are reduced. However, the wear efficiency of the polishing object 50 is reduced, while if the range of the low consumption class is narrowed, the cost for performing the regeneration process and Although the time increases, the wear efficiency of the polishing object 50 increases.

(再生手段)
再生手段は、複数成分を混合し塊化できるものであれば特に限定されず、従来周知の造粒装置(例えば回転バレル式)であってよい。この場合、所定の大きさの消耗緩衝材53を芯として、その周囲にスラッジが被覆された造粒体が形成される。緩衝材55の硬度は、スラッジの使用量、液体の添加量、及び芯となる消耗緩衝材5の含水量で調整できる。つまり含水量を上昇させると、スラッジが付着しやすくなるため、被覆するスラッジの量が増加する。ただし、含水量が過剰になると、被覆された造粒体が粘土状になり、再生手段の装置に貼り付いたり、造粒体同士が付着して所望の大きさの造粒体が形成されにくかったりする点に留意すべきである。なお、スラッジの塊化は、粉体から塊を作る方法である限りにおいて、公知の造粒方法に特に限定されない。
(Reproduction means)
The regeneration means is not particularly limited as long as it can mix and agglomerate a plurality of components, and may be a conventionally known granulator (for example, a rotary barrel type). In this case, a granulated body is formed in which a consumable cushioning material 53 of a predetermined size is used as a core and sludge is coated around it. The hardness of the cushioning material 55 can be adjusted by the amount of sludge used, the amount of liquid added, and the water content of the consumable cushioning material 5 serving as a core. That is, when the water content is increased, the sludge tends to adhere, so the amount of sludge to be coated increases. However, if the water content becomes excessive, the coated granulated material becomes clay-like and sticks to the device of the regeneration means, or the granulated materials adhere to each other and it is difficult to form a granulated material of a desired size. It should be noted that. The sludge agglomeration is not particularly limited to a known granulation method as long as it is a method of making a lump from powder.

本実施形態の製造システム10は図示しないスラッジ回収手段を備え、このスラッジ回収手段は研磨容器21内を洗浄液で洗浄することにより、スラッジを含む廃液を廃液槽25に回収する。そして、この廃液から、例えばフィルタープレスによりスラッジ54が分離されるが、ペレット状のスラッジ54を再生手段に投入すると、消耗緩衝材53との混合が不均一になりやすくなることがある。そこで、スラッジ54を乾燥して粉状のスラッジを得て、この粉状のスラッジを、図示しない投入手段が再生手段へと投入する。そして、噴霧手段によって所定液体が再生手段に噴霧されると、粉状のスラッジが消耗緩衝材53に付着しやすくなるため、塊化が促進される。   The manufacturing system 10 of this embodiment includes sludge collection means (not shown), and this sludge collection means collects the waste liquid containing sludge in the waste liquid tank 25 by washing the inside of the polishing container 21 with the washing liquid. The sludge 54 is separated from the waste liquid by, for example, a filter press. However, when the pellet-shaped sludge 54 is put into the regenerating means, the mixing with the consumable buffer material 53 tends to be uneven. Therefore, the sludge 54 is dried to obtain a powdery sludge, and the powdery sludge is thrown into the regenerating means by a feeding means (not shown). When the predetermined liquid is sprayed onto the regenerating means by the spraying means, the powdery sludge is likely to adhere to the consumable cushioning material 53, and thus agglomeration is promoted.

所定液体は、粉状のスラッジを消耗緩衝材53に付着しやすくできる限りにおいて特に
限定されず、通常は水でよい。ただし、廃液からスラッジを分離する際に多量の廃水が残るため、図示しない廃水供給手段によって廃水を噴霧することが好ましい。これにより、廃水の廃棄量が低減するし、廃水中に僅かに残存するスラッジも消耗緩衝材の再生に利用される。
The predetermined liquid is not particularly limited as long as it can easily adhere powdered sludge to the consumable cushioning material 53, and may be water. However, since a large amount of waste water remains when the sludge is separated from the waste liquid, it is preferable to spray the waste water by a waste water supply means (not shown). As a result, the amount of waste water discarded is reduced, and sludge that remains slightly in the waste water is also used for the regeneration of the consumable cushioning material.

このようにして形成された塊は、その後、乾燥され加熱されることで、固化して緩衝材55になる。乾燥は、緩衝材55に生じる亀裂を抑制できる点で、自然乾燥で充分行われることが好ましい。また、加熱は、スラッジの一部を構成する研磨対象50の物性に応じて適宜設定されてよく、例えば研磨対象50がガラスである場合、常温から高温までの間を複数の段階に分けて徐々に昇温することが好ましい。なお、緩衝材55は、本実施形態では球状に造粒されているが、これに限られず、所望のガラスの形状に適応した任意形状の塊であってよい。   The lump formed in this way is then dried and heated to solidify into the buffer material 55. It is preferable that the drying is sufficiently performed by natural drying in that cracks generated in the buffer material 55 can be suppressed. In addition, the heating may be appropriately set according to the physical properties of the polishing object 50 constituting a part of the sludge. For example, when the polishing object 50 is glass, the heating is gradually divided into a plurality of stages from room temperature to high temperature. It is preferable to increase the temperature to In addition, although the buffer material 55 is granulated spherically in this embodiment, it is not restricted to this, You may be the lump of the arbitrary shapes adapted to the shape of desired glass.

緩衝材55は、図示しない再生供給手段によって研磨容器21に供給され、再利用される。なお、本実施形態では緩衝材55がその発生源である研磨容器21に供給され、製造システム10全体のゼロエミッション化が図られているが、これに限られず、別の製造システムの研磨容器に供給されてもよい。   The buffer material 55 is supplied to the polishing container 21 by a recycling supply means (not shown) and reused. In the present embodiment, the cushioning material 55 is supplied to the polishing container 21 that is the generation source, and zero emission of the entire manufacturing system 10 is achieved. However, the present invention is not limited to this, and the polishing container 55 of another manufacturing system is used. It may be supplied.

なお、製造システム10は図示しない研磨対象作製手段を更に備えてもよく、この研磨対象作製手段は元材(例えば板材、棒材)を切断、研削、及び/又は切削することで研磨対象50を作製する。本実施形態では、研磨対象作製手段がガラスブロックを切断、研削、及び/又は研磨することで、ガラス角材である研磨対象50が作製される。そして、この過程で生じるスラッジは再生手段に投入されてスラッジ54と混合され、緩衝材55の作製のために消費できる。これにより、元材から被研磨品60に至る工程全体のゼロエミッション化を促進できることになる。   In addition, the manufacturing system 10 may further include a polishing target preparation unit (not shown). The polishing target preparation unit cuts, grinds, and / or cuts a base material (for example, a plate material or a bar), and thereby the polishing target 50. Make it. In this embodiment, the grinding | polishing target 50 which is a glass corner | angular material is produced because a grinding | polishing target preparation means cut | disconnects, grinds, and / or polishes a glass block. Then, the sludge generated in this process is put into the regenerating means, mixed with the sludge 54, and can be consumed for producing the buffer material 55. Thereby, the zero emission of the whole process from the original material to the article 60 to be polished can be promoted.

[被研磨品の製造方法]
以上の製造システム10を用いた被研磨品の製造方法の手順を以下に説明する。
[Production method of polished product]
The procedure of the manufacturing method of the article to be polished using the manufacturing system 10 will be described below.

まず、研磨対象50及び緩衝材51を研磨容器21内に供給し、振動源を稼動する。これにより、研磨対象50を緩衝材51の存在下、研磨容器21内で擦りあわせることで研磨対象50の面取りを行い、被研磨品60を作製する(予備研磨工程)。本実施形態では、緩衝材51とともに砥粒52を併用し、これにより研磨対象50の研磨効率を向上する。   First, the polishing object 50 and the buffer material 51 are supplied into the polishing container 21, and the vibration source is operated. Thereby, the polishing object 50 is chamfered by rubbing the polishing object 50 in the polishing container 21 in the presence of the buffer material 51, and the article 60 to be polished is produced (preliminary polishing step). In the present embodiment, the abrasive grains 52 are used in combination with the buffer material 51, thereby improving the polishing efficiency of the polishing object 50.

本実施形態での研磨対象50はガラス角材であり、かかるガラス角材を用いて得られる被研磨品60をリヒートプレスすることで、レンズ等の光学素子を製造できる。被研磨品60は面取りされて角部を喪失しているため、リヒートプレスの際に角部が結晶化する等の事態が抑制され、歩留まりを向上できる。また、上記の光学素子を用いて光学機器を製造することが好ましい。   The polishing object 50 in the present embodiment is a glass square, and an optical element such as a lens can be manufactured by reheat-pressing an object to be polished 60 obtained using the glass square. Since the object to be polished 60 is chamfered and the corner portion is lost, a situation in which the corner portion is crystallized at the time of reheating press is suppressed, and the yield can be improved. Moreover, it is preferable to manufacture an optical apparatus using said optical element.

予備研磨工程で生じたスラッジ54と、緩衝材が消耗した消耗緩衝材53とを混合し塊化することで、緩衝材55を再生する(再生工程)。再生された緩衝材55は研磨容器21に供給して予備研磨工程において再利用する。このように、予備研磨工程及び再生工程を順次繰り返すことで、スラッジ54の廃棄量を低減できることになる。   The buffer material 55 is regenerated by mixing and agglomerating the sludge 54 generated in the preliminary polishing step and the consumable buffer material 53 that has consumed the buffer material (regeneration step). The regenerated buffer material 55 is supplied to the polishing container 21 and reused in the preliminary polishing step. Thus, the amount of sludge 54 discarded can be reduced by sequentially repeating the preliminary polishing step and the regeneration step.

本実施形態では、予備研磨工程後の研磨容器21内を洗浄液で洗浄することにより、スラッジを含む廃液を廃液槽25へと回収し、この廃液から分離し乾燥することで粉状のスラッジを得る(スラッジ回収工程)。そして、再生工程では、粉状のスラッジを用い、所定液体を噴霧することで塊化を促進する。これにより、粉状のスラッジが消耗緩衝材53に均等且つ迅速に付着する。   In this embodiment, the inside of the polishing container 21 after the preliminary polishing step is washed with a washing liquid, whereby the waste liquid containing the sludge is recovered into the waste liquid tank 25, and separated from the waste liquid and dried to obtain powdery sludge. (Sludge collection process). In the regeneration step, agglomeration is promoted by spraying a predetermined liquid using powdery sludge. Thereby, powdery sludge adheres to the consumable cushioning material 53 evenly and quickly.

所定液体は、粉状のスラッジを消耗緩衝材53に付着しやすくできる限りにおいて特に
限定されず、通常は水でよい。ただし、廃液からスラッジを分離する際に多量の廃水が残るため、この廃水を含む所定液体を噴霧することが好ましい。これにより、廃水の廃棄量が低減するし、廃水中に僅かに残存するスラッジも消耗緩衝材の再生に利用される。
The predetermined liquid is not particularly limited as long as it can easily adhere powdered sludge to the consumable cushioning material 53, and may be water. However, since a large amount of waste water remains when the sludge is separated from the waste liquid, it is preferable to spray a predetermined liquid containing this waste water. As a result, the amount of waste water discarded is reduced, and sludge that remains slightly in the waste water is also used for the regeneration of the consumable cushioning material.

このようにして形成された塊は、その後、乾燥し加熱することで、固化して緩衝材55になる。乾燥は、緩衝材55に生じる亀裂を抑制できる点で、自然乾燥で充分行うことが好ましい。また、加熱は、スラッジの一部を構成する研磨対象50の物性に応じて適宜設定してよく、例えば研磨対象50がガラスである場合、常温から高温までの間を複数の段階に分けて徐々に昇温することが好ましい。具体的には、まず常温から約700℃まで約11時間かけて昇温し、約700℃を約2時間維持し、700℃から860℃まで2.5時間かけて昇温し、最後に860℃を10時間維持した後、放冷する。   The lump formed in this way is then dried and heated to solidify into the buffer material 55. It is preferable that the drying is sufficiently performed by natural drying in that cracks generated in the buffer material 55 can be suppressed. In addition, the heating may be appropriately set according to the physical properties of the polishing object 50 that constitutes a part of the sludge. For example, when the polishing object 50 is glass, the temperature is gradually divided into a plurality of stages from room temperature to high temperature. It is preferable to increase the temperature to Specifically, the temperature is first raised from room temperature to about 700 ° C. over about 11 hours, maintained at about 700 ° C. for about 2 hours, raised from 700 ° C. to 860 ° C. over 2.5 hours, and finally 860. The temperature is maintained for 10 hours and then allowed to cool.

本実施形態では、再生工程の前に、消耗緩衝材53を消耗の程度(消耗緩衝材53の粒子径及び/又は質量の大小)に基づいて複数の消耗クラスに分類し(分類工程)、いずれか一つの消耗クラスに属する高消耗緩衝材531,中消耗緩衝材532、及び低消耗緩衝材533ごとに分けて再生手段に投入する。ただし、本実施形態では低消耗緩衝材533は再生工程を経ずに研磨容器21に供給し、予備研磨工程において再利用する。   In this embodiment, before the regeneration step, the consumable buffer material 53 is classified into a plurality of consumable classes based on the degree of consumption (particle size and / or mass of the consumable buffer material 53) (classification step). The high-consumption buffer material 531, the medium-consumption buffer material 532, and the low-consumption buffer material 533 that belong to one of the consumption classes are separately input into the reproduction means. However, in this embodiment, the low-consumption buffer material 533 is supplied to the polishing container 21 without undergoing a regeneration process and reused in the preliminary polishing process.

また、本実施形態では、予備研磨工程の前に、元材を切断、研削、及び/又は切削することで研磨対象50を作製し(研磨対象作製工程)、この工程で生じるスラッジは研磨容器21内で消耗緩衝材53と混合し、緩衝材55の形成に利用する。ここで、研磨対象作製工程で生じるスラッジは、スラッジ54と同時に使用してもよいし、別々に使用してもよい。   In the present embodiment, before the preliminary polishing step, the polishing target 50 is manufactured by cutting, grinding, and / or cutting the base material (polishing target manufacturing step), and sludge generated in this step is the polishing container 21. It is mixed with the consumable buffer material 53 and used for forming the buffer material 55. Here, the sludge generated in the polishing object manufacturing process may be used simultaneously with the sludge 54 or may be used separately.

[作用効果]
本実施形態によれば、以下のような作用効果が得られる。
[Function and effect]
According to this embodiment, the following effects can be obtained.

予備研磨工程で生じるスラッジ54は消耗緩衝材53とともに緩衝材55の再生に消費されるとともに、再生された緩衝材55は予備研磨工程で再利用される。このようなサイクルが順次繰り返されるので、スラッジ54の廃棄量を低減でき、しかも緩衝材の消耗に伴う新規緩衝材51の必要量が低減され、製造コストを削減できる。   The sludge 54 generated in the preliminary polishing step is consumed for the regeneration of the buffer material 55 together with the consumable buffer material 53, and the regenerated buffer material 55 is reused in the preliminary polishing step. Since such a cycle is sequentially repeated, the amount of sludge 54 discarded can be reduced, and the necessary amount of the new buffer material 51 accompanying the consumption of the buffer material can be reduced, thereby reducing the manufacturing cost.

緩衝材51,55とともに砥粒52を併用したので、研磨効率が向上し、製造効率を向上できる。   Since the abrasive grains 52 are used in combination with the buffer materials 51 and 55, the polishing efficiency is improved and the manufacturing efficiency can be improved.

消耗クラスごとの高消耗緩衝材531,中消耗緩衝材532、及び低消耗緩衝材533から緩衝材55が再生されるので、再生される緩衝材55はロット内で均質化する。このため、再生された緩衝材55を用いて作製される被研磨品60の品質を容易に制御できる。   Since the buffer material 55 is regenerated from the high-consumption buffer material 531, the medium-consumption buffer material 532, and the low-consumption buffer material 533 for each consumption class, the regenerated buffer material 55 is homogenized within the lot. For this reason, the quality of the to-be-polished product 60 produced using the regenerated buffer material 55 can be easily controlled.

消耗緩衝材53を粒子径及び/又は質量の大小という容易且つ正確に測定可能なパラメータで分類でき、再生される緩衝材55はロット内で容易に更に均質化する。このため、再生された緩衝材55を用いて作製される被研磨品60の品質を正確且つより容易に制御できる。   The consumable buffer material 53 can be classified by a parameter that can be measured easily and accurately, such as the particle size and / or the mass, and the regenerated buffer material 55 is easily homogenized within the lot. For this reason, the quality of the to-be-polished product 60 produced using the regenerated buffer material 55 can be controlled accurately and more easily.

低消耗緩衝材533に関して再生工程を行う費用及び時間が削減されるので、被研磨品60の製造コストをより低減できる。また、再利用される低消耗緩衝材533の消耗の程度は低いので、再生工程を経なくとも、略同等の効率で研磨できる。   Since the cost and time for performing the regeneration process for the low-consumption buffer material 533 are reduced, the manufacturing cost of the article to be polished 60 can be further reduced. In addition, since the low-consumption buffer material 533 to be reused has a low level of consumption, polishing can be performed with substantially the same efficiency without going through a regeneration process.

研磨対象50を作製する過程で生じるスラッジも緩衝材55の再生に消費される。このため、製造工程全体で生じるスラッジの廃棄量を低減でき、ゼロエミッション化を更に高度化できる。   Sludge generated in the process of producing the polishing object 50 is also consumed for the regeneration of the buffer material 55. For this reason, the amount of sludge discarded in the entire manufacturing process can be reduced, and zero emission can be further enhanced.

研磨容器21から洗浄によってスラッジが除去されるため、意図しない量のスラッジが研磨容器21内に残存することによる研磨効率のバラつきが抑制され、被研磨品60の品質をより正確に制御できる。また、洗浄によって研磨容器21から排出されるスラッジは粉状で再生工程に供されるので、消耗緩衝材53と迅速に混ざり合うとともに、所定液体によって消耗緩衝材53に迅速に付着して塊化が促進される。これにより、均質な緩衝材55を容易且つ迅速に再生できる。   Since the sludge is removed from the polishing container 21 by washing, the variation in polishing efficiency due to the unintended amount of sludge remaining in the polishing container 21 is suppressed, and the quality of the workpiece 60 can be controlled more accurately. Further, since the sludge discharged from the polishing container 21 by the cleaning is powdered and used for the regeneration process, the sludge is quickly mixed with the consumable buffer material 53, and quickly adhered to the consumable buffer material 53 with a predetermined liquid and agglomerated. Is promoted. Thereby, the homogeneous buffer material 55 can be reproduced | regenerated easily and rapidly.

廃液からスラッジ54が分離された廃水中に僅かに残存するスラッジも緩衝材55の再生に利用されるとともに、消費した分、廃水の廃棄量が低減するため、ゼロエミッション化をより高度化できる。   The sludge remaining slightly in the waste water from which the sludge 54 has been separated from the waste liquid is also used for the regeneration of the buffer material 55, and the amount of waste water discarded is reduced by the amount consumed, so that zero emission can be further advanced.

本発明は前記実施形態に限定されるものではなく、本発明の目的を達成できる範囲での変形、改良等は本発明に含まれるものである。例えば、図1に示される各材料の移送、供給、投入等は、機械的に行われてもよいし、人為的に行われてもよい。また、前記実施形態では、スラッジに消耗緩衝材を混合して塊化したが、スラッジを含む限りにおいてこれに限られず、消耗緩衝材を必ずしも含まなくてもよい。   The present invention is not limited to the above-described embodiment, and modifications, improvements, and the like within the scope that can achieve the object of the present invention are included in the present invention. For example, the transfer, supply, input, and the like of each material shown in FIG. 1 may be performed mechanically or artificially. Moreover, in the said embodiment, although the consumable buffer material was mixed and agglomerated with sludge, as long as sludge is included, it is not restricted to this, The consumable buffer material does not necessarily need to be included.

本発明の製造システムのブロック図である。It is a block diagram of the manufacturing system of this invention.

符号の説明Explanation of symbols

10 製造システム
20 予備研磨部(予備研磨手段)
25 廃液槽
50 研磨対象
51 緩衝材
52 砥粒
53 消耗緩衝材
54 スラッジ
55 再生された緩衝材
60 被研磨品
533 低消耗緩衝材
10 Manufacturing System 20 Pre-polishing part (Pre-polishing means)
25 Waste Liquid Tank 50 Polishing Object 51 Buffer Material 52 Abrasive Grain 53 Consumable Buffer Material 54 Sludge 55 Recycled Buffer Material 60 Polished Product 533 Low Consumable Buffer Material

Claims (23)

研磨対象を緩衝材の存在下、研磨容器内で擦りあわせることで前記研磨対象の面取りを行い、被研磨品を作製する予備研磨工程と、
前記予備研磨工程で生じるスラッジを塊化することで、緩衝材を再生する再生工程と、を有し、
前記予備研磨工程及び前記再生工程を順次繰り返す被研磨品の製造方法。
Chamfering the object to be polished by rubbing the object to be polished in a polishing container in the presence of a buffer material, and a preliminary polishing step for producing an object to be polished;
A regeneration step of regenerating the buffer material by agglomerating sludge generated in the preliminary polishing step,
A method for manufacturing an article to be polished, wherein the preliminary polishing step and the regeneration step are sequentially repeated.
前記緩衝材とともに砥粒を併用する請求項1記載の製造方法。   The manufacturing method of Claim 1 which uses an abrasive grain together with the said buffer material. 前記再生工程では、前記予備研磨工程で生じるスラッジと、前記緩衝材が消耗した消耗緩衝材とを混合し造粒することで、緩衝材を再生する請求項1又は2記載の製造方法。   The manufacturing method according to claim 1 or 2, wherein in the regeneration step, the buffer material is regenerated by mixing and granulating the sludge generated in the preliminary polishing step and the consumable buffer material consumed by the buffer material. 前記消耗緩衝材を消耗の程度に基づいて複数の消耗クラスに分類する分類工程を更に有し、
前記再生工程では、いずれか一つの消耗クラスに属する消耗緩衝材を用いて、緩衝材を再生する請求項3記載の製造方法。
Further comprising a classification step of classifying the consumable cushioning material into a plurality of consumable classes based on the degree of consumable,
The manufacturing method according to claim 3, wherein in the regeneration step, the cushioning material is recycled using a consumable cushioning material belonging to any one of the consumption classes.
前記消耗の程度は、前記消耗緩衝材の粒子径及び/又は質量の大小である請求項4記載の製造方法。   The manufacturing method according to claim 4, wherein the degree of consumption is a particle size and / or mass of the consumption buffer material. 消耗の程度が低い低消耗クラスに属する低消耗緩衝材は、前記再生工程を経ずに、前記予備研磨工程において再利用する請求項4又は5記載の製造方法。   The manufacturing method according to claim 4 or 5, wherein the low-consumption buffer material belonging to the low-consumption class having a low degree of consumption is reused in the preliminary polishing step without passing through the regeneration step. 前記予備研磨工程の前に、元材を切断、研削、及び/又は切削することで前記研磨対象を作製する研磨対象作製工程を有し、
前記再生工程では、前記研磨対象作製工程で生じるスラッジを更に混合する請求項1から6いずれか記載の製造方法。
Before the preliminary polishing step, it has a polishing object preparation step of preparing the polishing object by cutting, grinding, and / or cutting the base material,
The manufacturing method according to any one of claims 1 to 6, wherein in the regeneration step, sludge generated in the polishing object manufacturing step is further mixed.
前記予備研磨工程後の前記研磨容器内を洗浄液で洗浄することにより、スラッジを含む廃液を回収し、この廃液から分離し乾燥させた後、粉状のスラッジを得るスラッジ回収工程を更に有し、
前記再生工程では、前記粉状のスラッジを用い、所定液体を噴霧することで塊化を促進する請求項1から7いずれか記載の製造方法。
By further cleaning the interior of the polishing container after the preliminary polishing step with a cleaning liquid, the waste liquid containing sludge is recovered, and after separating and drying from the waste liquid, a sludge recovery step of obtaining a powdery sludge is further provided.
The manufacturing method according to any one of claims 1 to 7, wherein in the regeneration step, the powdery sludge is used and spraying a predetermined liquid to promote agglomeration.
前記所定液体は、前記廃液からスラッジが分離された廃水を含む請求項8記載の製造方法。   The manufacturing method according to claim 8, wherein the predetermined liquid includes waste water in which sludge is separated from the waste liquid. 請求項1から9いずれか記載の製造方法において前記研磨対象としてガラス角材を用いて製造されるプレス用ガラス製品をリヒートプレスする光学素子の製造方法。   The manufacturing method of the optical element which reheat presses the glass product for press manufactured using the glass square material as the said grinding | polishing object in the manufacturing method in any one of Claim 1 to 9. 請求項10記載の製造方法で製造される光学素子を用いる光学機器の製造方法。   The manufacturing method of the optical instrument using the optical element manufactured with the manufacturing method of Claim 10. 研磨対象を緩衝材の存在下、研磨容器内で擦りあわせることで前記研磨対象の面取りを行い、被研磨品を作製する予備研磨手段と、
前記予備研磨手段で生じるスラッジを塊化することで、緩衝材を再生する再生手段と、を備える被研磨品の製造システム。
Chamfering the polishing object by rubbing the object to be polished in the polishing container in the presence of a buffer material, pre-polishing means for producing an article to be polished;
A system for manufacturing an article to be polished, comprising: regeneration means for regenerating the buffer material by agglomerating sludge generated by the preliminary polishing means.
前記再生手段で再生した緩衝材を、前記研磨容器に供給する再生緩衝材供給手段を更に備える請求項12記載の製造システム。   The manufacturing system according to claim 12, further comprising a regenerated buffer material supply unit that supplies the buffer material regenerated by the regenerating unit to the polishing container. 前記研磨容器に砥粒を供給する砥粒供給手段を更に備える請求項12又は13記載の製造システム。   The manufacturing system of Claim 12 or 13 further provided with the abrasive grain supply means which supplies an abrasive grain to the said grinding | polishing container. 前記再生手段は、前記予備研磨手段で生じるスラッジと、前記緩衝材が消耗した消耗緩衝材とを混合し造粒することで、緩衝材を再生する請求項12から14いずれか記載の製造システム。   The manufacturing system according to any one of claims 12 to 14, wherein the regenerating unit regenerates the buffer material by mixing and granulating the sludge generated by the preliminary polishing unit and the consumable buffer material consumed by the buffer material. 前記消耗緩衝材を消耗の程度に基づいて複数の消耗クラスに分類する分類手段を更に備え、
前記再生手段には、いずれか一つの消耗クラスに属する消耗緩衝材が投入される請求項15記載の製造システム。
Classifying means for classifying the consumable cushioning material into a plurality of consumable classes based on the degree of consumption,
The manufacturing system according to claim 15, wherein a consumable cushioning material belonging to any one consumable class is input to the regeneration unit.
前記分類手段は、前記消耗緩衝材の粒子径及び/又は質量の大小に応じて前記消耗の程度を判定する判定手段を有する請求項16記載の製造システム。   The manufacturing system according to claim 16, wherein the classification unit includes a determination unit that determines a degree of the consumption according to a particle size and / or a mass of the consumable buffer material. 消耗の程度が低い低消耗クラスに属する低消耗緩衝材を、前記再生手段を迂回して、前記研磨容器に搬送する迂回手段を更に備える請求項16又は17記載の製造システム。   18. The manufacturing system according to claim 16, further comprising a bypass unit configured to bypass the regeneration unit and transport the low-consumption buffer material belonging to the low consumption class having a low level of consumption to the polishing container. 元材を切断、研削、及び/又は切削することで前記研磨対象を作製する研磨対象作製手段を更に備え、
前記再生手段には、前記研磨対象作製手段から生じるスラッジが更に投入されて混合される請求項12から18いずれか記載の製造システム。
A polishing object preparation means for preparing the polishing object by cutting, grinding, and / or cutting the base material;
The manufacturing system according to any one of claims 12 to 18, wherein sludge generated from the polishing object preparation means is further added to and mixed with the regeneration means.
前記研磨容器内を洗浄液で洗浄することにより、スラッジを含む廃液を回収し、この廃液から分離し乾燥させた後、粉状のスラッジを得るスラッジ回収手段と、
前記粉状のスラッジを前記再生手段に投入する投入手段と、
前記再生手段に所定液体を噴霧することで塊化を促進する噴霧手段と、を更に備える請求項12から19いずれか記載の製造システム。
By washing the inside of the polishing container with a washing liquid, a waste liquid containing sludge is recovered, separated from the waste liquid and dried, and then a sludge collecting means for obtaining a powdery sludge,
A charging means for charging the powdery sludge into the regeneration means;
The manufacturing system according to claim 12, further comprising spraying means for promoting agglomeration by spraying a predetermined liquid on the regeneration means.
前記噴霧手段に、前記廃液からスラッジが分離された廃水を供給する廃水供給手段を更に備える請求項20記載の製造システム。   21. The manufacturing system according to claim 20, further comprising waste water supply means for supplying the spray means with waste water from which sludge is separated from the waste liquid. 請求項12から21いずれか記載の製造システムと、この製造システムで製造される被研磨品をリヒートプレスするプレス手段と、を備え、前記製造システムは前記研磨対象としてガラス角材を用いる光学素子製造装置。   An optical element manufacturing apparatus comprising: the manufacturing system according to any one of claims 12 to 21; and a pressing unit that reheat presses an object to be polished manufactured by the manufacturing system, wherein the manufacturing system uses a glass square as the object to be polished. . 請求項22記載の光学素子製造装置を備える光学機器製造装置。   An optical device manufacturing apparatus comprising the optical element manufacturing apparatus according to claim 22.
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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10156719A (en) * 1996-12-02 1998-06-16 Kawasaki Heavy Ind Ltd Polishing facility for casting
JP2001300597A (en) * 2000-04-28 2001-10-30 Ntn Corp Solidifying method of grinding sludge and recycling system thereof
JP2002254289A (en) * 2001-03-01 2002-09-10 Matsushita Electric Ind Co Ltd Manufacturing method and polishing apparatus for electronic part
JP2002265229A (en) * 2001-03-09 2002-09-18 Hoya Corp Manufacturing method for glass sheet, manufacturing method for blank for press forming, and manufacturing method for optical component
JP2004154632A (en) * 2002-11-05 2004-06-03 Nippon Electric Glass Co Ltd Method and equipment for conversion of polishing waste liquid into glass raw material

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10156719A (en) * 1996-12-02 1998-06-16 Kawasaki Heavy Ind Ltd Polishing facility for casting
JP2001300597A (en) * 2000-04-28 2001-10-30 Ntn Corp Solidifying method of grinding sludge and recycling system thereof
JP2002254289A (en) * 2001-03-01 2002-09-10 Matsushita Electric Ind Co Ltd Manufacturing method and polishing apparatus for electronic part
JP2002265229A (en) * 2001-03-09 2002-09-18 Hoya Corp Manufacturing method for glass sheet, manufacturing method for blank for press forming, and manufacturing method for optical component
JP2004154632A (en) * 2002-11-05 2004-06-03 Nippon Electric Glass Co Ltd Method and equipment for conversion of polishing waste liquid into glass raw material

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