JP2009251418A - Liquid crystal display device, method for manufacturing liquid crystal display device, and electronic device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To solve the problem that it is difficult to improve display quality in conventional liquid crystal display devices. <P>SOLUTION: This liquid crystal display device has a first substrate 51; a second substrate 81 facing the first substrate 51; liquid crystal 19 interposed between the first substrate 51 and the second substrate 81; and a diffuse reflection layer 53 diffuse-reflecting light incident to the liquid crystal 19 through the second substrate 81, to the second substrate 81 side. The liquid crystal 19 is controlled in driving for each of a plurality of pixels 7, and a transmission region T for transmission display and a reflection region H for reflection display, are set to each pixel 7. The first substrate 51 has a first surface 54a which is on the liquid crystal 19 side, and a second surface 54b on the side opposite to the first surface 54a. The diffuse reflection layer 53 is provided in a region overlapping with each reflection region H and on the second surface 54b side of the first substrate 51. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a liquid crystal display device, a method for manufacturing a liquid crystal display device, and an electronic apparatus.

  Conventionally, a liquid crystal display device capable of performing reflective display is known (for example, see Patent Document 1).

JP 2008-33371 A

In the liquid crystal display device described in Patent Document 1, a concavo-convex pattern is provided in a region where reflection display is performed. In this concavo-convex pattern, the thickness of the liquid crystal differs between the convex and concave portions of the concavo-convex pattern.
The difference in thickness of the liquid crystal means that the retardation (product of birefringence and thickness) of the liquid crystal is different. If the retardation of the liquid crystal is different, the modulation state of the light modulated by the liquid crystal is different.
For this reason, in the liquid crystal display device described in Patent Document 1, the modulation state of light by the liquid crystal tends to vary. As a result, the contrast in display tends to decrease.
In other words, the conventional liquid crystal display device has a problem that it is difficult to improve display quality.

  SUMMARY An advantage of some aspects of the invention is to solve at least a part of the problems described above, and the invention can be implemented as the following forms or application examples.

  Application Example 1 A first substrate, a second substrate facing the first substrate, a liquid crystal interposed between the first substrate and the second substrate, and the liquid crystal entering the liquid crystal through the second substrate. A diffuse reflection layer that diffusely reflects the reflected light toward the second substrate side, and the liquid crystal is controlled to drive for each pixel of a plurality of pixels, and each pixel has a transmissive region for transmissive display And a reflective region for performing reflective display is set, and the first substrate has a first main surface on the liquid crystal side and a second main surface on the opposite side to the first main surface, The liquid crystal display device, wherein the diffuse reflection layer is provided in a region overlapping each reflection region, and is provided on the second main surface side of the first substrate.

The liquid crystal display device of Application Example 1 includes a first substrate, a second substrate, a liquid crystal, and a diffuse reflection layer. The second substrate faces the first substrate. The liquid crystal is interposed between the first substrate and the second substrate, and driving is controlled for each pixel of the plurality of pixels. A transmission region and a reflection region are set for each pixel. The first substrate has a first main surface that is a surface on the liquid crystal side, and a second main surface opposite to the first main surface. The diffuse reflection layer diffusely reflects light incident on the liquid crystal through the second substrate toward the second substrate. The diffuse reflection layer is provided in a region overlapping each reflection region. In this liquid crystal display device, transmissive display and reflective display can be performed by the above-described configuration.
In this liquid crystal display device, since the diffuse reflection layer is provided on the second main surface side of the first substrate, the first substrate is interposed between the liquid crystal and the diffuse reflection layer. For this reason, it can suppress that the thickness of the liquid crystal which overlaps with a diffuse reflection layer by planar view varies with a diffuse reflection layer. Thereby, a reduction in contrast in display can be suppressed to a low level, so that display quality can be easily improved.

  Application Example 2 In the above-described liquid crystal display device, the liquid crystal display device includes a polarizing plate provided on the second main surface side of the first substrate, and the diffuse reflection layer includes the first substrate and the polarized light. A liquid crystal display device interposed between the plate and the plate.

In Application Example 2, since the diffuse reflection layer is interposed between the first substrate and the polarizing plate, the diffuse reflection is compared with the configuration in which the polarizing plate is interposed between the first substrate and the diffuse reflection layer. The distance between the layer and the first substrate can be shortened.
Here, when the distance between the diffuse reflection layer and the first substrate is increased, more of the scattered light irregularly reflected by the diffuse reflection layer cannot reach the second substrate. That is, when the distance between the diffuse reflection layer and the first substrate becomes long, the light use efficiency tends to be low.
In the liquid crystal display device of Application Example 2, since the distance between the diffuse reflection layer and the first substrate can be shortened, the light use efficiency can be increased.

  Application Example 3 In the above liquid crystal display device, the diffuse reflection layer includes a concavo-convex portion and a reflective film covering the concavo-convex portion.

  In Application Example 3, the diffuse reflection layer includes a concavo-convex portion and a reflection film. The reflective film covers the uneven part. With this configuration, light can be irregularly reflected by the diffuse reflection layer.

  Application Example 4 In the above-described liquid crystal display device, the uneven portion is formed on the second main surface of the first substrate.

  In Application Example 4, since the uneven portion is formed on the second main surface of the first substrate, the distance between the diffuse reflection layer and the first substrate can be further shortened.

  Application Example 5 In the above liquid crystal display device, the liquid crystal display device includes a resin layer provided on the second main surface side of the first substrate, and the uneven portion is formed in the resin layer. A liquid crystal display device characterized by the above.

  The liquid crystal display device of Application Example 5 has a resin layer. The resin layer is provided on the second main surface side of the first substrate. And the uneven | corrugated | grooved part is formed in the resin layer. Thereby, an uneven | corrugated | grooved part can be comprised.

  Application Example 6 In the above liquid crystal display device, the liquid crystal display device includes a third substrate facing the second main surface side of the first substrate, and the resin layer includes the third substrate and the first substrate. A liquid crystal display device interposed between the substrate and the substrate.

  The liquid crystal display device of Application Example 6 includes a third substrate. The third substrate faces the second main surface side of the first substrate. The resin layer is interposed between the third substrate and the first substrate. With this configuration, the resin layer can be protected by the third substrate.

  Application Example 7 In the above-described liquid crystal display device, the liquid crystal display device includes a plurality of switching elements that are provided corresponding to the pixels and that control driving of the liquid crystal. A liquid crystal display device, wherein the liquid crystal display device is provided in a region that is interposed between a substrate and the resin layer and overlaps each of the reflection regions.

The liquid crystal display device of Application Example 7 has a plurality of switching elements provided corresponding to the respective pixels. The switching element controls driving of the liquid crystal. Each switching element is interposed between the third substrate and the resin layer, and is provided in a region overlapping each reflective region.
In this liquid crystal display device, since each switching element is interposed between the third substrate and the resin layer in a region overlapping each reflection region, light contributing to display is not blocked by the switching element. For this reason, it is possible to easily increase the aperture ratio of each pixel.

  Application Example 8 In the above liquid crystal display device, the concavo-convex portion is formed on the first substrate side of the resin layer.

  In Application Example 8, the uneven portion is formed on the first substrate side of the resin layer. Thereby, the distance between a diffuse reflection layer and a 1st board | substrate can be shortened further.

  Application Example 9 In the above liquid crystal display device, the liquid crystal display device includes a third substrate facing the second main surface side of the first substrate, and the uneven portion is formed on the third substrate. A liquid crystal display device.

  The liquid crystal display device of Application Example 9 has a third substrate. The third substrate faces the second main surface side of the first substrate. And the uneven | corrugated | grooved part is formed in the 3rd board | substrate. Thereby, an uneven | corrugated | grooved part can be comprised.

  Application Example 10 In the above-described liquid crystal display device, the third substrate has a facing surface facing the second main surface, and the uneven portion is formed on the facing surface side. A liquid crystal display device characterized by the above.

  In Application Example 10, the third substrate has a facing surface that faces the second main surface. And the uneven | corrugated | grooved part is formed in the opposing surface side. Thereby, the distance between a diffuse reflection layer and a 1st board | substrate can be shortened further.

  Application Example 11 A first substrate, a second substrate facing the first substrate, a liquid crystal interposed between the first substrate and the second substrate, and a side opposite to the liquid crystal side of the first substrate A resin layer provided on the surface of the resin layer, and a reflective film provided on a surface of the resin layer opposite to the first substrate side. The resin layer includes the resin layer and the reflective film. A liquid crystal display device, wherein an uneven portion is provided between the two.

The liquid crystal display device of Application Example 11 includes a first substrate, a second substrate, a liquid crystal, a resin layer, and a reflective film. The second substrate faces the first substrate. The liquid crystal is interposed between the first substrate and the second substrate. The resin layer is provided on the surface of the first substrate opposite to the liquid crystal side. The reflective film is provided on the surface of the resin layer opposite to the first substrate side. The resin layer has an uneven portion between the resin layer and the reflective film. In this liquid crystal display device, the light incident on the liquid crystal through the second substrate can be diffusely reflected to the second substrate side by the reflective film by the above configuration. Thereby, reflective display can be performed.
In this liquid crystal display device, the uneven portion is located on the side opposite to the liquid crystal side of the first substrate. For this reason, it can suppress that the thickness of a liquid crystal varies by an uneven | corrugated | grooved part low. Thereby, a reduction in contrast in display can be suppressed to a low level, so that display quality can be easily improved.

  [Application Example 12] A first substrate, a second substrate facing the first substrate, a liquid crystal interposed between the first substrate and the second substrate, and a side opposite to the liquid crystal side of the first substrate. A resin layer provided on the surface of the first substrate and a reflection film provided on the surface of the resin layer on the first substrate side, and the resin layer includes a gap between the resin layer and the reflection film. A liquid crystal display device provided with an uneven portion.

The liquid crystal display device of Application Example 12 includes a first substrate, a second substrate, a liquid crystal, a resin layer, and a reflective film. The second substrate faces the first substrate. The liquid crystal is interposed between the first substrate and the second substrate. The resin layer is provided on the surface of the first substrate opposite to the liquid crystal side. The reflective film is provided on the surface of the resin layer on the first substrate side. The resin layer has an uneven portion between the resin layer and the reflective film. In this liquid crystal display device, the light incident on the liquid crystal through the second substrate can be diffusely reflected to the second substrate side by the reflective film by the above configuration. Thereby, reflective display can be performed.
In this liquid crystal display device, the uneven portion is located on the side opposite to the liquid crystal side of the first substrate. For this reason, it can suppress that the thickness of a liquid crystal varies by an uneven | corrugated | grooved part low. Thereby, a reduction in contrast in display can be suppressed to a low level, so that display quality can be easily improved.

  Application Example 13 First substrate, second substrate facing the first substrate, liquid crystal interposed between the first substrate and the second substrate, and the opposite side of the first substrate from the liquid crystal side A liquid crystal display device, wherein the first substrate is provided with a concavo-convex portion between the first substrate and the reflective film.

The liquid crystal display device of Application Example 13 includes a first substrate, a second substrate, a liquid crystal, and a reflective film. The second substrate faces the first substrate. The liquid crystal is interposed between the first substrate and the second substrate. The reflective film is provided on the surface opposite to the liquid crystal side of the first substrate. The first substrate is provided with an uneven portion between the first substrate and the reflective film. In this liquid crystal display device, the light incident on the liquid crystal through the second substrate can be diffusely reflected to the second substrate side by the reflective film by the above configuration. Thereby, reflective display can be performed.
In this liquid crystal display device, the uneven portion is located on the side opposite to the liquid crystal side of the first substrate. For this reason, it can suppress that the thickness of a liquid crystal varies by an uneven | corrugated | grooved part low. Thereby, a reduction in contrast in display can be suppressed to a low level, so that display quality can be easily improved.

  Application Example 14 A first substrate, a second substrate facing the first substrate, a liquid crystal interposed between the first substrate and the second substrate, and a side opposite to the liquid crystal side of the first substrate And a reflective film provided on a surface of the third substrate on the first substrate side. The third substrate includes the third substrate and the reflective film. A liquid crystal display device, wherein an uneven portion is provided between the two.

The liquid crystal display device of Application Example 14 includes a first substrate, a second substrate, a liquid crystal, a third substrate, and a reflective film. The second substrate faces the first substrate. The liquid crystal is interposed between the first substrate and the second substrate. The third substrate faces the surface of the first substrate opposite to the liquid crystal side. The reflective film is provided on the surface of the third substrate on the first substrate side. The third substrate is provided with an uneven portion between the third substrate and the reflective film. In this liquid crystal display device, the light incident on the liquid crystal through the second substrate can be diffusely reflected to the second substrate side by the reflective film by the above configuration. Thereby, reflective display can be performed.
In this liquid crystal display device, the uneven portion is located on the side opposite to the liquid crystal side of the first substrate. For this reason, it can suppress that the thickness of a liquid crystal varies by an uneven | corrugated | grooved part low. Thereby, a reduction in contrast in display can be suppressed to a low level, so that display quality can be easily improved.

  Application Example 15 A first substrate, a second substrate facing the first substrate, a liquid crystal interposed between the first substrate and the second substrate, and the liquid crystal that is incident on the liquid crystal through the second substrate. A diffused reflection layer that diffusely reflects the reflected light toward the second substrate side, wherein the diffused reflection layer is provided on the side opposite to the liquid crystal side of the first substrate, A method of manufacturing a liquid crystal display device comprising a step of thinning the first substrate.

  The liquid crystal display device according to the manufacturing method of Application Example 15 includes a first substrate, a second substrate, a liquid crystal, and a diffuse reflection layer. The second substrate faces the first substrate. The liquid crystal is interposed between the first substrate and the second substrate. The diffuse reflection layer diffusely reflects light incident on the liquid crystal through the second substrate toward the second substrate. In this liquid crystal display device, reflection display can be performed by the above-described configuration. In this liquid crystal display device, since the diffuse reflection layer is provided on the side opposite to the liquid crystal side of the first substrate, the first substrate is interposed between the liquid crystal and the diffuse reflection layer. For this reason, it can suppress that the thickness of the liquid crystal which overlaps with a diffuse reflection layer by planar view varies with a diffuse reflection layer. Thereby, a reduction in contrast in display can be suppressed to a low level, so that display quality can be easily improved.

The manufacturing method of Application Example 15 includes a step of thinning the first substrate.
Here, when the distance between the diffuse reflection layer and the first substrate becomes long, light that is incident on the transmission region among scattered light irregularly reflected by the diffuse reflection layer is likely to be generated. That is, when the distance between the diffuse reflection layer and the first substrate is increased, the contrast in display tends to be lowered.
In this manufacturing method, the distance between the diffuse reflection layer and the first substrate can be shortened by the step of thinning the first substrate. For this reason, it is possible to manufacture a liquid crystal display device that can suppress a decrease in contrast in display.

  Application Example 16 Electronic equipment having the above-described liquid crystal display device as a display portion.

In the electronic device of Application Example 16, a liquid crystal display device as a display unit includes a first substrate, a second substrate, a liquid crystal, and a diffuse reflection layer. The second substrate faces the first substrate. The liquid crystal is interposed between the first substrate and the second substrate, and driving is controlled for each pixel of the plurality of pixels. A transmission region and a reflection region are set for each pixel. The first substrate has a first main surface that is a surface on the liquid crystal side, and a second main surface opposite to the first main surface. The diffuse reflection layer diffusely reflects light incident on the liquid crystal through the second substrate toward the second substrate. The diffuse reflection layer is provided in a region overlapping each reflection region. In this liquid crystal display device, transmissive display and reflective display can be performed by the above-described configuration.
In this liquid crystal display device, since the diffuse reflection layer is provided on the second main surface side of the first substrate, the first substrate is interposed between the liquid crystal and the diffuse reflection layer. For this reason, it can suppress that the thickness of the liquid crystal which overlaps with a diffuse reflection layer by planar view varies with a diffuse reflection layer. Thereby, a reduction in contrast in display can be suppressed to a low level, so that display quality can be easily improved.
And since the electronic device of the application example 16 has said liquid crystal display device as a display part, the display quality is improved.

Embodiments will be described with reference to the drawings, taking as an example a display device which is one of transflective liquid crystal devices.
As shown in FIG. 1, the display device 1 in the first embodiment includes a display panel 3 and a lighting device 5.

  Here, a plurality of pixels 7 are set on the display panel 3. The plurality of pixels 7 are arranged in the X direction and Y direction in the drawing within the display area 8, and constitutes a matrix M in which the X direction is the row direction and the Y direction is the column direction. The display device 1 selectively emits light incident on the display panel 3 from the illumination device 5 from the plurality of pixels 7 set on the display panel 3 to the outside of the display panel 3 through the display surface 9. Thus, an image can be displayed on the display surface 9. The display area 8 is an area where an image can be displayed. In FIG. 1, the pixels 7 are exaggerated and the number of the pixels 7 is reduced for easy understanding of the configuration.

The display panel 3 includes a liquid crystal panel 10 and polarizing plates 13a and 13b, as shown in FIG. 2, which is a cross-sectional view taken along line AA in FIG.
The liquid crystal panel 10 includes an element substrate 15, a counter substrate 17, a liquid crystal 19, and a sealing material 21.
The element substrate 15 is provided with a switching element, which will be described later, corresponding to each of the plurality of pixels 7 on the display surface 9 side, that is, the liquid crystal 19 side.

  The counter substrate 17 faces the element substrate 15 on the display surface 9 side with respect to the element substrate 15, and is provided with a gap between the counter substrate 17 and the element substrate 15. The counter substrate 17 is provided with a retardation film, which will be described later, on the bottom surface 23 side, that is, the liquid crystal 19 side, which corresponds to the back surface of the display surface 9 in the display panel 3.

  The liquid crystal 19 is interposed between the element substrate 15 and the counter substrate 17, and is sealed between the element substrate 15 and the counter substrate 17 by a sealing material 21 that surrounds the display region 8 inside the periphery of the display panel 3. Has been. In the present embodiment, an FFS (Fringe Field Switching) type driving method is employed as the driving method of the liquid crystal 19.

  The polarizing plate 13a is provided on the bottom surface 23 side of the element substrate 15, that is, on the side opposite to the liquid crystal 19 side. The polarizing plate 13b is provided on the display surface 9 side, that is, on the side opposite to the liquid crystal 19 side from the counter substrate 17. In the display device 1, the polarizing plates 13a and 13b are set such that the direction of the light transmission axis in the polarizing plate 13a and the direction of the light transmission axis in the polarizing plate 13b are orthogonal to each other. Each of the polarizing plates 13a and 13b can transmit light having a polarization axis in the direction of the transmission axis.

  In addition, the structure which provided the optical compensation film between the polarizing plate 13a and the element substrate 15 or between the polarizing plate 13b and the opposing board | substrate 17 can also be employ | adopted. By providing the optical compensation film, it is possible to compensate for the phase difference of the liquid crystal 19 when the liquid crystal 19 is viewed from the normal direction of the display surface 9 or when viewed from the direction inclined from the normal direction. Thereby, light leakage can be reduced and the contrast can be improved.

  As the optical compensation film, a negative uniaxial medium (for example, a WV film manufactured by Fuji Film) in which discotic liquid crystal molecules having negative refractive index anisotropy or the like are hybrid-aligned can be used. Also, a positive uniaxial medium (for example, NH film manufactured by Nippon Petroleum) in which nematic liquid crystal molecules having a positive refractive index anisotropy are hybrid-aligned may be employed. Further, a configuration in which a negative uniaxial medium and a positive uniaxial medium are combined may be employed. In addition, a biaxial medium in which the refractive index in each direction satisfies nx> ny> nz, a negative C-Plate, or the like can be employed.

The illumination device 5 is provided on the bottom surface 23 side of the display panel 3 and has a light guide plate 31 and a light source 33. The light guide plate 31 is provided on the lower side of the display panel 3 as viewed in FIG. 2 and has a light emission surface 35 b facing the bottom surface 23 of the display panel 3.
The light source 33 is, for example, an LED (Light Emitting Diode) or a cold cathode tube, and is provided on the left side of the side surface 35a of the light guide plate 31 as viewed in FIG.

  Light from the light source 33 enters the side surface 35 a of the light guide plate 31. The light incident on the light guide plate 31 is emitted from the light exit surface 35 b while being repeatedly reflected in the light guide plate 31. The light emitted from the light emission surface 35b enters the display panel 3 from the bottom surface 23 of the display panel 3 through the polarizing plate 13a. The light guide plate 31 is provided with a diffuser plate on the light exit surface 35b and a reflector plate on the bottom surface 35c as necessary.

Each of the plurality of pixels 7 set in the display panel 3 has a red color (R), a green color (G), and a blue color (B) as shown in FIG. ). That is, the plurality of pixels 7 constituting the matrix M include a pixel 7r that emits R light, a pixel 7g that emits G light, and a pixel 7b that emits B light.
In the following, the notation of pixel 7 and the notation of pixels 7r, 7g, and 7b are used appropriately.

  Here, the color of R is not limited to a pure red hue, and includes orange and the like. The color of G is not limited to a pure green hue, and includes blue-green and yellow-green. The color of B is not limited to a pure blue hue, and includes bluish purple and blue-green. From another viewpoint, light exhibiting the color of R can be defined as light having a light wavelength peak in a range of 570 nm or more in the visible light region. The light exhibiting the color G can be defined as light having a light wavelength peak in the range of 500 nm to 565 nm. Light exhibiting the color B can be defined as light having a light wavelength peak in the range of 415 nm to 495 nm.

In the matrix M, a plurality of pixels 7 arranged along the Y direction form one pixel column 41. The light color of each pixel 7 in one pixel column 41 is set to one of R, G, and B. That is, the matrix M includes a pixel column 41r in which a plurality of pixels 7r are arranged in the Y direction, a pixel column 41g in which a plurality of pixels 7g are arranged in the Y direction, and a pixel column 41b in which a plurality of pixels 7b are arranged in the Y direction. have. In the matrix M, the pixel column 41r, the pixel column 41g, and the pixel column 41b are arranged repeatedly in this order along the X direction.
In the following, the notation of the pixel column 41 and the notation of the pixel column 41r, the pixel column 41g, and the pixel column 41b are appropriately used.

Each pixel 7 has a transmission region T and a reflection region H, as shown in FIG. 4 which is an enlarged view of a portion C in FIG. In FIG. 4, the reflective region H is hatched for easy understanding of the configuration.
In the transmissive region T, transmissive display is performed by transmitting light incident on the liquid crystal 19 from the illumination device 5 illustrated in FIG. 2 through the bottom surface 23 to the display surface 9 side.

  In the reflection region H, the external light incident on the liquid crystal 19 through the display surface 9 is reflected by the reflection film described later on the display surface 9 side, and the reflected light is emitted to the display surface 9 side to reflect. Display is performed. The external light is any light incident from the display surface 9 of the display panel 3. The outside light includes, for example, indoor and outdoor illumination light and sunlight.

Here, the configuration of each of the element substrate 15 and the counter substrate 17 of the liquid crystal panel 10 will be described in detail.
The element substrate 15 includes a first substrate 51, an element layer 52, and a diffuse reflection layer 53, as shown in FIG. 5 which is a cross-sectional view taken along the line DD in FIG. 4.
The first substrate 51 is made of a light-transmitting material such as glass or quartz, for example, and includes a first surface 54a facing the display surface 9 and a second surface 54b facing the bottom surface 23. have.

The element layer 52 is provided on the first surface 54 a of the first substrate 51. The element layer 52 includes a gate insulating film 57, an insulating film 59, an alignment film 61, a TFT (Thin Film Transistor) element 63 that is one of switching elements, a common electrode 67, and a pixel electrode 69. It is.
The diffuse reflection layer 53 is provided on the second surface 54 b of the first substrate 51. The diffuse reflection layer 53 includes a resin layer 77 and a reflection film 79.

The gate insulating film 57 is provided on the first surface 54 a of the first substrate 51. The insulating film 59 is provided on the display surface 9 side of the gate insulating film 57. The alignment film 61 is provided on the display surface 9 side of the insulating film 59.
The TFT element 63, the common electrode 67, and the pixel electrode 69 are provided corresponding to each pixel 7, respectively.

The TFT element 63 has a gate electrode 71, a semiconductor layer 72, a source electrode 73, and a drain electrode 74. The gate electrode 71 is provided on the first surface 54 a of the first substrate 51 and is covered with the gate insulating film 57 from the display surface 9 side. In addition, as a material of the gate electrode 71, metals, such as molybdenum, tungsten, and chromium, an alloy containing these, etc. can be employ | adopted, for example. Further, as the material of the gate insulating film 57, for example, a light transmissive material such as silicon oxide or silicon nitride can be employed.
The semiconductor layer 72 is made of, for example, amorphous silicon, and is provided at a position facing the gate electrode 71 with the gate insulating film 57 interposed therebetween.

The source electrode 73 is provided on the display surface 9 side of the gate insulating film 57 and partly overlaps the semiconductor layer 72. The drain electrode 74 is provided on the display surface 9 side of the gate insulating film 57 and partially overlaps the semiconductor layer 72. The TFT element 63 having the above configuration is a so-called bottom gate type in which the semiconductor layer 72 is located between the gate electrode 71 and the source electrode 73 and drain electrode 74.
The TFT element 63 having the above configuration is covered with the insulating film 59 from the display surface 9 side. As the material of the insulating film 59, for example, a light transmissive material such as silicon oxide, silicon nitride, or acrylic resin can be employed.

The common electrode 67 is provided on the first surface 54a side of the first substrate 51 and overlaps the transmission region T and the reflection region H in plan view. The common electrode 67 and the gate electrode 71 are provided in a state spaced from each other in the Y direction. As a material of the common electrode 67, for example, a light transmissive material such as ITO (Indium Tin Oxide) can be adopted.
The common electrode 67 is covered with the gate insulating film 57 from the display surface 9 side.

The pixel electrode 69 is provided on the display surface 9 side of the insulating film 59. The pixel electrode 69 is connected to the drain electrode 74 through a contact hole 75 provided in the insulating film 59. As a material of the pixel electrode 69, for example, a material having optical transparency such as ITO can be adopted.
The alignment film 61 is made of a light-transmitting material such as polyimide, and covers the insulating film 59 and the pixel electrode 69 from the display surface 9 side. The alignment film 61 is subjected to an alignment process.

  The resin layer 77 is provided on the second surface 54 b of the first substrate 51. On the bottom surface 23 side of the resin layer 77, an uneven portion 78 is provided in a region overlapping the reflective region H in plan view. As the material of the resin layer 77, for example, a light transmissive material such as an acrylic resin may be employed.

The reflective film 79 is provided on the bottom surface 23 side of the resin layer 77 and overlaps the reflective region H in plan view. As a material of the reflective film 79, for example, a material having light reflectivity such as aluminum can be adopted.
The reflective film 79 covers the uneven portion 78 of the resin layer 77 from the bottom surface 23 side. For this reason, the reflection film 79 reflects the uneven shape of the uneven portion 78 of the resin layer 77. That is, the reflective film 79 is provided in an uneven shape following the uneven shape of the uneven portion 78. Thereby, the reflective film 79 can diffusely reflect light.

The counter substrate 17 includes a second substrate 81 and a counter layer 82. The second substrate 81 is made of a light-transmitting material such as glass or quartz, for example, and has an outward surface 83a facing the display surface 9 side and an opposing surface 83b facing the bottom surface 23 side. is doing.
The facing layer 82 is provided on the facing surface 83 b of the second substrate 81. The counter layer 82 includes a light absorption layer 85, a color filter 87, an overcoat layer 91, a first alignment film 93, a retardation film 95, and a second alignment film 97.

The light absorption layer 85 is provided on the facing surface 83 b of the second substrate 81 and extends over the region 86. The light absorption layer 85 is provided in a lattice shape in a plan view and partitions each pixel 7. In the display device 1, each pixel 7 can be defined as a region surrounded by the light absorption layer 85.
As a material of the light absorption layer 85, for example, a resin containing a material having a high light absorption property such as carbon black or chromium can be employed.

The color filter 87 is provided corresponding to each pixel 7. The color filter 87 is provided on the facing surface 83b side of the second substrate 81 and covers each region surrounded by the light absorption layer 85, that is, the region of each pixel 7 from the bottom surface 23 side.
Here, the color filter 87 can transmit light in a predetermined wavelength region of incident light. The color filter 87 is composed of a resin colored in a different color for each of the pixels 7r, 7g, and 7b. The color filter 87 corresponding to the pixel 7r can transmit R light. The color filter 87 corresponding to the pixel 7g can transmit G light, and the color filter 87 corresponding to the pixel 7b can transmit B light. In the following, when R, G, and B are identified for each color filter 87, the notation of color filters 87r, 87g, and 87b is used.

The overcoat layer 91 is provided on the bottom surface 23 side of the light absorption layer 85 and the color filter 87. The overcoat layer 91 is made of a light-transmitting resin or the like, and covers the light absorption layer 85 and the color filter 87 from the bottom surface 23 side.
The first alignment film 93 is provided on the bottom surface 23 side of the overcoat layer 91. The first alignment film 93 is made of, for example, a light-transmitting material such as polyimide, and covers the overcoat layer 91 from the bottom surface 23 side. The first alignment film 93 is subjected to an alignment process on the bottom surface 23 side.

The retardation film 95 is provided on the bottom surface 23 side of the first alignment film 93. The retardation film 95 is made of, for example, a material containing a liquid crystal compound, and is provided in a region overlapping the reflection region H in plan view. The retardation film 95 gives a half-wave phase difference to the light incident on the retardation film 95.
The second alignment film 97 is provided on the bottom surface 23 side of the first alignment film 93 and the retardation film 95. The second alignment film 97 is made of a material having optical transparency such as polyimide, and covers the first alignment film 93 and the retardation film 95 from the bottom surface 23 side. The second alignment film 97 is subjected to an alignment process on the bottom surface 23 side.

The liquid crystal 19 interposed between the element substrate 15 and the counter substrate 17 is interposed between the alignment film 61 and the second alignment film 97. In the liquid crystal panel 10, a so-called multi-gap structure in which the thickness of the liquid crystal 19 is different between the transmissive region T and the reflective region H is adopted in each pixel 7.
In the transmissive region T, the liquid crystal 19 has a thickness of L1. On the other hand, in the reflection region H, the thickness of the retardation film 95 is set so that the thickness L2 of the liquid crystal 19 satisfies L1> L2. In the liquid crystal panel 10, L1 is set to approximately twice L2.

  Here, as shown in FIG. 6 which is a cross-sectional view taken along line FF in FIG. 5, the retardation film 95 is arranged over a plurality of pixels 7 arranged in the X direction. That is, the retardation film 95 overlaps the plurality of reflection regions H arranged in the X direction in units of pixel rows 42 of the matrix M shown in FIG.

Here, the arrangement of the TFT element 63, the common electrode 67, and the pixel electrode 69 in each pixel 7 will be described.
As shown in FIG. 7 which is a plan view, the pixel electrode 69 is provided over the region of the pixel 7 and has a plurality of slit portions 111. In FIG. 7, the pixel electrode 69 is hatched for easy understanding of the configuration.
The plurality of slit portions 111 are arranged at predetermined intervals in the Y direction. Each slit 111 extends along a direction intersecting the Y direction. In addition, the direction in which each slit part 111 extends is inclined from the X direction.

The common electrode 67 is provided in a region that covers the pixel electrode 69. Between the pixels 7 adjacent in the X direction, the common electrodes 67 are connected by a common line 113.
In each pixel 7, the common electrode 67 and the pixel electrode 69 have their peripheral portions overlapping the region 86.
Note that the reflective film 79 and the retardation film 95 illustrated in FIG. 5 overlap the common electrode 67 on the reflective region H side with respect to the boundary 115 illustrated in FIG. Therefore, the reflection region H can be defined as a region where each pixel 7, the reflection film 79, and the retardation film 95 overlap in plan view. In addition, the transmissive region T can be defined as a region where the region excluding the reflective region H from each pixel 7 and the common electrode 67 overlap in plan view.

The TFT element 63 is provided in a region 86 on the left side of the transmission region T as viewed in FIG. The pixel electrode 69 extends from the transmissive region T to the region 86, and is connected to the drain electrode 74 through a contact hole 75 provided in the region 86. Between the pixels 7 adjacent to each other in the X direction, the gate electrodes 71 are connected to each other by a gate line 117. Further, between the pixels 7 adjacent in the Y direction, the source electrodes 73 are connected by a data line 119.
Note that the cross sections of the TFT element 63, the common electrode 67, and the pixel electrode 69 in FIG. 5 correspond to the cross section along the line JJ in FIG.

When a voltage is applied between the common electrode 67 and the pixel electrode 69, an electric field is generated between the common electrode 67 and the pixel electrode 69. In the liquid crystal panel 10, when the TFT element 63 changes from the OFF state to the ON state, an electric field is generated between the common electrode 67 and the pixel electrode 69. The alignment state of the liquid crystal 19 can be changed by this electric field.
In the display device 1, the display is controlled by changing the alignment state of the liquid crystal 19 for each pixel 7 in a state in which the illumination device 5 irradiates the display panel 3 with light. The alignment state of the liquid crystal 19 can be changed by switching between the OFF state and the ON state of the TFT element 63.

Each of the alignment film 61 and the second alignment film 97 is subjected to an alignment process. The initial alignment state of the liquid crystal 19 is regulated by the alignment film 61 and the second alignment film 97 that have been subjected to the alignment treatment.
FIG. 8A is a diagram illustrating a polarization state in the transmission region T when the TFT element 63 is in the OFF state, and FIG. 8B is a polarization state in the transmission region T when the TFT element 63 is in the ON state. FIG.
In the display device 1, the initial alignment direction 121 of the liquid crystal 19 is set in a direction along the transmission axis 123a of the polarizing plate 13a as shown in FIG.
When the TFT element 63 is switched to the ON state, the alignment direction 121 of the liquid crystal 19 is counterclockwise as viewed in this figure with respect to the transmission axis 123a of the polarizing plate 13a in plan view, as shown in FIG. 8B. It changes in a direction having an inclination of 45 degrees.

FIG. 9A is a diagram showing a polarization state in the reflection region H when the TFT element 63 is in the OFF state, and FIG. 9B is a polarization state in the reflection region H when the TFT element 63 is in the ON state. FIG.
The alignment direction 121 of the liquid crystal 19 in the reflective region H is the same as that in the transmissive region T, as shown in FIGS. 9A and 9B.

  8A and 8B and FIGS. 9A and 9B, the X ′ direction and the Y ′ direction are along the transmission axis 123a of the polarizing plate 13a. The Y ′ direction indicates the direction along the transmission axis 123b of the polarizing plate 13b. The X ′ direction and the Y ′ direction are arbitrary two directions orthogonal to each other in the XY plane.

In the transmission region T, the incident light incident from the bottom surface 23 side through the polarizing plate 13a has a polarization axis along the transmission axis 123a of the polarizing plate 13a as shown in FIGS. 8 (a) and 8 (b). The linearly polarized light 125 is incident on the liquid crystal 19.
When the TFT element 63 is in the OFF state, the linearly polarized light 125 incident on the liquid crystal 19 has a polarization axis along the alignment direction 121 of the liquid crystal 19 as shown in FIG. Therefore, the linearly polarized light 125 incident on the liquid crystal 19 is incident on the polarizing plate 13b as the linearly polarized light 125 while maintaining the polarization state.
The linearly polarized light 125 incident on the polarizing plate 13b is absorbed by the polarizing plate 13b because the polarization axis is orthogonal to the transmission axis 123b of the polarizing plate 13b.

On the other hand, when the TFT element 63 is in the ON state, the polarization axis of the linearly polarized light 125 intersects the alignment direction 121 of the liquid crystal 19 as shown in FIG. Therefore, the linearly polarized light 125 incident on the liquid crystal 19 is given a half-wave phase difference by the liquid crystal 19 and is incident on the polarizing plate 13 b as the linearly polarized light 127 having a polarization axis orthogonal to the polarization axis of the linearly polarized light 125. Is done.
The linearly polarized light 127 incident on the polarizing plate 13b is transmitted through the polarizing plate 13b because its polarization axis is along the direction of the transmission axis 123b of the polarizing plate 13b.
Thus, in the transmissive region T, transmissive display is controlled by switching the TFT element 63 between the ON state and the OFF state.

In the reflection region H, the incident light incident from the display surface 9 through the polarizing plate 13b is polarized along the transmission axis 123b of the polarizing plate 13b as shown in FIGS. 9 (a) and 9 (b). Is incident on the retardation film 95 as linearly polarized light 129 having
Here, the slow axis 131 of the retardation film 95 is set in a direction having an inclination of 67.5 degrees counterclockwise as viewed in these drawings with respect to the X ′ direction in plan view.
Accordingly, the linearly polarized light 129 incident on the retardation film 95 is given a half-wave phase difference and is incident on the liquid crystal 19 as the linearly polarized light 133. The polarization axis of the linearly polarized light 133 is along a direction having an inclination of 45 degrees counterclockwise as viewed in FIGS. 9A and 9B with respect to the X ′ direction in plan view.

The linearly polarized light 133 incident on the liquid crystal 19 has a polarization axis that intersects the alignment direction 121 of the liquid crystal 19 as shown in FIG. 9A when the TFT element 63 is in the OFF state. For this reason, the linearly polarized light 133 incident on the liquid crystal 19 is given a phase difference of ¼ wavelength, and is emitted toward the reflective film 79 as a counterclockwise circularly polarized light 135 as seen in this figure.
The circularly polarized light 135 is reflected by the reflective film 79 and is incident on the liquid crystal 19 as circularly polarized light 137 rotated clockwise as viewed in FIG.
The circularly polarized light 137 incident on the liquid crystal 19 is given a phase difference of ¼ wavelength, and is along a direction having a tilt of 135 degrees counterclockwise as viewed in this figure with respect to the X ′ direction in plan view. The light is incident on the retardation film 95 as linearly polarized light 139 having a polarization axis.

The linearly polarized light 139 incident on the retardation film 95 is given a half-wave phase difference, and is incident on the polarizing plate 13b as linearly polarized light 141 having a polarization axis along the X ′ direction in plan view.
The linearly polarized light 141 incident on the polarizing plate 13b is absorbed by the polarizing plate 13b because the polarization axis is orthogonal to the transmission axis 123b of the polarizing plate 13b.

On the other hand, when the TFT element 63 is in the ON state, the linearly polarized light 133 incident on the liquid crystal 19 has a polarization axis along the alignment direction 121 of the liquid crystal 19 as shown in FIG. While maintaining the state, the linearly polarized light 133 is emitted toward the reflective film 79.
The linearly polarized light 133 emitted toward the reflective film 79 is reflected by the reflective film 79 while maintaining the polarization state, and is incident on the liquid crystal 19.

The linearly polarized light 133 incident on the liquid crystal 19 from the reflective film 79 is incident on the retardation film 95 while maintaining the polarization state. The linearly polarized light 133 incident on the retardation film 95 is given a phase difference of ½ wavelength, and is incident on the polarizing plate 13b as a linearly polarized light 143 having a polarization axis along the Y ′ direction in plan view. The linearly polarized light 143 incident on the polarizing plate 13b passes through the polarizing plate 13b because the polarization axis is along the direction of the transmission axis 123b of the polarizing plate 13b.
As described above, also in the reflective area H, the reflective display is controlled by switching the TFT element 63 between the ON state and the OFF state as in the transmissive area T.

Here, a method for manufacturing the display device 1 will be described.
The manufacturing method of the display device 1 is roughly divided into a substrate manufacturing process, a liquid crystal panel 10 manufacturing process, a display panel 3 manufacturing process, and a display device 1 manufacturing process.
First, the manufacturing process of a board | substrate is demonstrated.
The substrate manufacturing process is roughly divided into a process of forming the element layer 52 on the first substrate 51 and a process of manufacturing the counter substrate 17. Note that either the step of forming the element layer 52 on the first substrate 51 or the step of manufacturing the counter substrate 17 may be performed before or after.

  In the step of forming the element layer 52 on the first substrate 51, as shown in FIG. 10A, first, the gate electrode 71 and the common electrode 67 are formed on the first surface 54a of the first substrate 51. The gate electrode 71 and the common electrode 67 are formed by forming a metal film on the first surface 54a using, for example, a sputtering technique and then patterning the metal film using, for example, a photolithography technique or an etching technique. Can be done.

  Next, a gate insulating film 57 is formed to cover the gate electrode 71 and the common electrode 67 from the first surface 54a side. The gate insulating film 57 can be formed of silicon nitride, silicon oxide, or the like by using, for example, a CVD (Chemical Vapor Deposition) technique, a PVD (Physical Vapor Deposition) technique, a vapor deposition technique, or the like.

Next, as illustrated in FIG. 10B, the semiconductor layer 72 is formed on the gate insulating film 57, and then the source electrode 73 and the drain electrode 74 that overlap with part of the semiconductor layer 72 are formed. Thereby, the TFT element 63 is formed.
The source electrode 73 and the drain electrode 74 are formed by forming a metal film on the gate insulating film 57 using, for example, a sputtering technique, and then patterning the metal film using, for example, a photolithography technique or an etching technique. Can be formed.

Next, as shown in FIG. 10C, an insulating film 59 that covers the TFT element 63 and the gate insulating film 57 from the first surface 54a side is formed. The insulating film 59 can be formed of silicon nitride, silicon oxide, or the like by utilizing, for example, CVD technology, PVD technology, vapor deposition technology, or the like. The insulating film 59 can also be formed of an acrylic resin or the like by utilizing, for example, a spin coating technique.
Next, a contact hole 75 reaching the drain electrode 74 of the TFT element 63 is formed in the insulating film 59 by utilizing a photolithography technique and an etching technique.

Next, an ITO film is formed on the insulating film 59 by utilizing a sputtering technique or the like.
Next, the ITO film is patterned using a photolithography technique, an etching technique, and the like to form a pixel electrode 69 as shown in FIG.

Next, a resin film that covers the pixel electrode 69 with a resin such as polyimide is formed over the pixel electrode 69 and the insulating film 59. The resin film can be formed by utilizing, for example, a spin coating technique.
Next, the alignment film 61 shown in FIG. 5 is formed by performing an alignment process such as a rubbing process on the resin film. As a result, the element layer 52 can be formed on the first substrate 51.

  In the manufacturing process of the counter substrate 17, as shown in FIG. 11A, first, the light absorption layer 85 is formed on the counter surface 83 b of the second substrate 81 in a lattice shape in plan view. The light absorption layer 85 can be formed by forming a resin film containing carbon black, chromium, or the like and then patterning the resin film using, for example, a photolithography technique.

Next, a color filter 87 is formed in the area of each pixel 7 surrounded by the light absorption layer 85. The color filter 87 can be formed by disposing a resin containing a colorant corresponding to each of R, G, and B light in the region of each pixel 7. In addition, arrangement | positioning of resin in the area | region of each pixel 7 can be performed by utilizing an inkjet technique or a vapor deposition technique, for example.
Next, an overcoat layer 91 is formed on the light absorption layer 85 and the color filter 87. The overcoat layer 91 can be formed of a resin having light transparency by utilizing, for example, a spin coat technique.

  Next, as shown in FIG. 11B, a first alignment film 93 is formed on the overcoat layer 91. In the formation of the first alignment film 93, for example, a spin coat technique is used to form a resin film on the overcoat layer 91 with a resin such as polyimide, and then an alignment process such as a rubbing process is performed on the resin film. Thereby, the first alignment film 93 can be formed.

Next, as shown in FIG. 11C, a liquid film 95 b is formed on the first alignment film 93 with the liquid 95 a containing a negative-type liquid crystal compound having photosensitivity. The liquid film 95b can be formed by utilizing, for example, a spin coating technique.
In addition, as the liquid body 95a, the structure which added the photoinitiator to what mixed the liquid crystal compound and the solvent may be employ | adopted.

As the liquid crystal compound, for example, LC242 manufactured by BASF may be employed. As the solvent, for example, PGMEA can be employed. As the photopolymerization initiator, for example, Irgacure 907 manufactured by Ciba Specialty Chemicals may be employed.
Here, the alignment state of the molecules of the liquid crystal compound contained in the liquid film 95b is regulated by the first alignment film 93 that has been subjected to the alignment treatment. As a result, the liquid film 95b exhibits anisotropy in the refractive index.

  Next, as shown in FIG. 11D, the liquid film 95 b is exposed with ultraviolet light 153 through a photomask 151. Here, the photomask 151 is provided with an opening 155 in a region overlapping the reflective region H. The liquid film 95b is irradiated with ultraviolet light 153 through the opening 155. Then, the exposed portion of the liquid film 95b is cured.

  Next, the liquid film 95b is developed with a developer such as PGMEA. As a result, the liquid film 95b in the region shielded from light by the photomask 151 is peeled off, and the retardation film 95 shown in FIG. 5 can be formed.

Next, as shown in FIG. 5, a second alignment film 97 is formed to cover the first alignment film 93 and the retardation film 95 from the bottom surface 23 side.
In the formation of the second alignment film 97, a resin film is formed on the first alignment film 93 and the retardation film 95 with a resin such as polyimide, and then an alignment process such as a rubbing process is performed on the resin film.
Thereby, the second alignment film 97 is formed, and the counter substrate 17 can be manufactured.

Here, in the step of forming the element layer 52 on the first substrate 51, as shown in FIG. 12A, a plurality of element layers 52 corresponding to a plurality of liquid crystal panels 10 are formed on one mother substrate 51m. Form. Each of the plurality of element layers 52 is provided for each portion 161 corresponding to one liquid crystal panel 10.
In the manufacturing process of the counter substrate 17, as shown in FIG. 12B, a plurality of counter layers 82 corresponding to the plurality of liquid crystal panels 10 are formed on one mother substrate 81m. Each of the plurality of facing layers 82 is provided for each portion 161 corresponding to one liquid crystal panel 10.

  In the manufacturing process of the liquid crystal panel 10, first, as shown in FIG. 13A, a mother substrate 51m on which a plurality of element layers 52 are formed and a mother substrate 81m on which a plurality of opposing layers 82 are formed It joins via the sealing material 21 provided annularly for every 161. At this time, the sealing material 21 provided for each part 161 is provided in a state in which a part of the annular contour is missing in plan view. A portion of the sealing material 21 lacking a part of the annular contour becomes an inlet for the liquid crystal 19.

  Next, an etching process, a CMP (Chemical Mechanical Polishing) process, or the like is performed on the surface 163 of the mother substrate 51m to thin the mother substrate 51m as shown in FIG. At this time, the second surface 54b is formed on the mother substrate 51m by performing an etching process, a CMP process, or the like on the surface 163.

Next, as shown in FIG. 14, a liquid film 77 b is formed on the second surface 54 b of the mother substrate 51 m with a liquid 77 a containing the material constituting the resin layer 77. The liquid film 77b has positive photosensitivity, and can be formed by utilizing, for example, a spin coating technique.
Next, as shown in FIG. 15, the liquid film 77 b is exposed with ultraviolet light 166 through a photomask 165. Here, the photomask 165 is provided with a plurality of openings 167 in a region overlapping the reflective region H. The liquid film 77 b is irradiated with ultraviolet light 166 through the plurality of openings 167.

Next, the liquid film 77b is developed. As a result, the exposed portion of the liquid film 77b through the plurality of openings 167 is removed.
Next, by baking the liquid film 77b, a resin layer 77 having a concavo-convex portion 78 can be formed as shown in FIG.
Next, a metal film such as aluminum is formed on the bottom surface 23 side of the resin layer 77 using, for example, a sputtering technique.
Next, the reflective film 79 shown in FIG. 5 is formed by patterning the metal film formed on the bottom surface 23 side of the resin layer 77 using, for example, a photolithography technique or an etching technique. Thereby, the diffuse reflection layer 53 shown in FIG. 5 can be formed.

Next, the mother substrate 51m and the mother substrate 81m are cut for each portion 161.
Next, after the liquid crystal 19 is injected from the injection port for each part 161, the liquid crystal 19 is sealed by closing the injection port. Thereby, the liquid crystal panel 10 shown in FIG. 2 can be manufactured.

In the manufacturing process of the display panel 3, the liquid crystal panel 10 is provided with polarizing plates 13a and 13b shown in FIG. The polarizing plate 13a is provided on the second surface 54b (FIG. 5) of the first substrate 51, and the polarizing plate 13b is provided on the outward surface 83a (FIG. 5) of the second substrate 81. Thereby, the display panel 3 shown in FIG. 2 can be manufactured.
Note that the polarizing plate 13 b may be provided on the second substrate 81 before the manufacturing process of the liquid crystal panel 10.
In the manufacturing process of the display device 1, the display device 1 can be manufactured by combining the display panel 3 and the illumination device 5.

In the first embodiment, the display device 1 corresponds to a liquid crystal display device, the first surface 54a corresponds to a first main surface, and the second surface 54b corresponds to a second main surface.
In the display device 1 of the first embodiment, the diffuse reflection layer 53 (FIG. 5) is provided on the bottom surface 23 side of the first substrate 51 opposite to the liquid crystal 19 side. For this reason, it is possible to suppress a variation in the thickness of the liquid crystal 19 that overlaps the reflective film 79 from the uneven portion 78 in a plan view. As a result, variation in the retardation of the liquid crystal 19 in the reflection region H can be suppressed to a low level. As a result, the reduction in contrast in the reflective display can be suppressed to a very low level, so that the display quality can be easily improved.

In the first embodiment, since the diffuse reflection layer 53 is interposed between the first substrate 51 and the polarizing plate 13a, for example, the diffuse reflection layer 53 is provided closer to the bottom surface 23 than the polarizing plate 13a. In comparison, the distance between the diffuse reflection layer 53 and the first substrate 51 can be shortened.
Here, when the distance between the diffuse reflection layer 53 and the first substrate 51 becomes long, the light incident on the transmission region T among the scattered light irregularly reflected by the diffuse reflection layer 53 increases. For this reason, since the light which contributes to reflective display tends to decrease, the utilization efficiency of light tends to become low. Further, when scattered light that has been irregularly reflected enters the transmission region T, a light modulation state is not achieved, and a phenomenon such as light leakage tends to occur. When light leakage or the like occurs, the contrast in display decreases.

  On the other hand, in the display device 1, the distance between the diffuse reflection layer 53 and the first substrate 51 can be shortened, and therefore, the light that travels outside the reflection region H among the diffusely scattered light is reduced. Can do. For this reason, the utilization efficiency of light can be improved. Moreover, since the light incident on the transmission region T among the irregularly reflected scattered light can be reduced, it is possible to easily suppress the decrease in contrast in the display.

  In the first embodiment, the method for manufacturing the display device 1 includes the step of thinning the first substrate 51. For this reason, since the distance between the diffuse reflection layer 53 and the 1st board | substrate 51 can be shortened further, while being able to raise the utilization efficiency of light further, it is easy to suppress the fall of the contrast in a display further lower. Can do.

A second embodiment will be described.
The display device 20 in the second embodiment includes a liquid crystal panel 30 as shown in FIG. 17 which is a cross-sectional view taken along line AA in FIG. The display device 20 in the second embodiment has the same configuration as the display device 1 in the first embodiment, except that the liquid crystal panel 10 in the first embodiment is replaced with the liquid crystal panel 30. .
Therefore, in the following second embodiment, in order to avoid redundant description, the same components as those in the first embodiment are denoted by the same reference numerals and detailed description thereof is omitted, and only the differences from the first embodiment are described. Will be described.

  In the liquid crystal panel 30, the element substrate 15 includes an electrode substrate 40 and a reflective substrate 50. The electrode substrate 40 is provided on the bottom surface 23 side of the counter substrate 17 and faces the counter substrate 17 with the liquid crystal 19 interposed therebetween. The reflective substrate 50 is provided on the bottom surface 23 side of the electrode substrate 40 and faces the electrode substrate 40.

  The electrode substrate 40 includes a first substrate 51 and an element layer 171 as shown in FIG. 18 which is a cross-sectional view taken along the line DD in FIG. The element layer 171 is provided on the first surface 54 a of the first substrate 51. The element layer 171 includes an insulating film 59, an alignment film 61, a common electrode 67, and a pixel electrode 69.

The reflective substrate 50 includes a third substrate 173, a diffuse reflection layer 53, a gate insulating film 57, and a TFT element 63.
The third substrate 173 has a facing surface 174a directed to the second surface 54b side of the first substrate 51 and an outward surface 174b directed to the bottom surface 23 side.
The gate insulating film 57 is provided on the facing surface 174 a of the third substrate 173. A gate electrode 71 is provided on the facing surface 174a.
The diffuse reflection layer 53 is provided on the display surface 9 side of the gate insulating film 57. Further, on the display surface 9 side of the gate insulating film 57, a semiconductor layer 72, a source electrode 73, and a drain electrode 74 are provided.

The diffuse reflection layer 53 includes a resin layer 77 and a reflection film 79. The resin layer 77 is provided on the display surface 9 side of the gate insulating film 57, and covers the semiconductor layer 72, the source electrode 73, and the drain electrode 74 from the display surface 9 side. For this reason, in the second embodiment, the TFT element 63 can be regarded as being interposed between the third substrate 173 and the resin layer 77.
On the display surface 9 side of the resin layer 77, a concavo-convex portion 78 is provided in a region overlapping the reflection region H in plan view. The reflective film 79 covers the uneven portion 78 of the resin layer 77 from the display surface 9 side.

The electrode substrate 40 and the reflective substrate 50 having the above-described configuration are bonded via an adhesive layer 175.
Here, in each pixel 7, the TFT element 63 is provided in the reflection region H. Each TFT element 63 overlaps the reflective film 79 in plan view in the reflective region H. The drain electrode 74 extends from the reflection region H into a region 86 on the opposite side to the transmission region T side. The pixel electrode 69 is connected to the drain electrode 74 through the contact hole 75 in the region 86 covered by the drain electrode 74. The contact hole 75 extends from the insulating film 59 to the drain electrode 74 through the first substrate 51, the adhesive layer 175, and the resin layer 77.

A method for manufacturing the liquid crystal panel 30 will be described.
The manufacturing method of the liquid crystal panel 30 is roughly divided into a manufacturing process of the element substrate 15, a manufacturing process of the counter substrate 17, and a manufacturing process of the liquid crystal panel 30. Any of the manufacturing process of the element substrate 15 and the manufacturing process of the counter substrate 17 may be performed first or later.
Here, since the manufacturing process of the counter substrate 17 and the manufacturing process of the liquid crystal panel 30 are both the same as in the first embodiment, only the manufacturing process of the element substrate 15 will be described below. Further, in the manufacturing process of the element substrate 15, each process is performed with each of the first substrate 51 and the third substrate 173 being a mother substrate. Hereinafter, in order to facilitate the description, the first substrate 51 and the third substrate 173 will be described.

In the manufacturing process of the element substrate 15, first, as shown in FIG. 19A, first, the gate electrode 71 is formed on the facing surface 174 a of the third substrate 173.
Next, a gate insulating film 57 is formed to cover the gate electrode 71 from the facing surface 174a side.
Next, the semiconductor layer 72 is formed over the gate insulating film 57, and then the source electrode 73 and the drain electrode 74 that overlap with part of the semiconductor layer 72 are formed. Thereby, the TFT element 63 is formed.
Next, a liquid film 77 b containing a material constituting the resin layer 77 is formed on the gate insulating film 57.

  Next, as shown in FIG. 19B, a concavo-convex portion 78 and a contact hole 75 are formed in the resin layer 77. Here, in the second embodiment, when the liquid film 77b is exposed, a portion where the concave portion of the concave and convex portion 78 is formed and a portion where the contact hole 75 is formed are exposed. By performing development processing on the liquid film 77b after this exposure, the concavo-convex portion 78 and the contact hole 75 can be formed. That is, the concavo-convex portion 78 and the contact hole 75 can be formed by one exposure and one development process. Thereby, simplification of a manufacturing process is achieved.

Next, as illustrated in FIG. 19C, a reflective film 79 is formed on the uneven portion 78. Thereby, the diffuse reflection layer 53 shown in FIG. 18 can be formed.
Next, as illustrated in FIG. 19D, a liquid film 175 b is formed on the resin layer 77 and the reflective film 79 using a liquid body 175 a containing a material constituting the adhesive layer 175. The liquid film 175b has positive photosensitivity, and can be formed by utilizing, for example, a spin coating technique.

Next, as shown in FIG. 20A, the first substrate 51 is placed on the liquid film 175b.
Next, the liquid film 175 b is exposed through the first substrate 51. At this time, exposure light is shielded in a portion 175c of the liquid film 175b that overlaps the contact hole 75 in plan view. As a result, the portion of the liquid film 175b excluding the portion 175c is cured and the adhesive layer 175 can be formed.

Next, as shown in FIG. 20B, the first substrate 51 is thinned. At this time, the first surface 54 a is formed on the first substrate 51.
Next, as shown in FIG. 20C, the common electrode 67 is formed on the first surface 54 a of the first substrate 51.
Next, an insulating film 59 that covers the common electrode 67 from the first surface 54a side is formed.

Next, a contact hole 75 extending from the insulating film 59 to the adhesive layer 175 is formed in the insulating film 59 and the first substrate 51. The contact hole 75 extending from the insulating film 59 to the adhesive layer 175 can be formed by, for example, an etching process using hydrofluoric acid as an etchant.
Next, by removing the portion 175c, a contact hole 75 extending from the insulating film 59 to the drain electrode 74 through the first substrate 51, the adhesive layer 175, and the resin layer 77 is formed as shown in FIG. Can be done.

  Next, after forming the pixel electrode 69 on the insulating film 59 and then forming the alignment film 61 that covers the pixel electrode 69 and the insulating film 59 from the display surface 9 side, the element substrate 15 shown in FIG. 18 can be manufactured. .

In the second embodiment, the TFT element 63 corresponds to a switching element.
Also in the display device 20 in the second embodiment, the same effect as the display device 1 in the first embodiment can be obtained.
Further, in the display device 20, the resin layer 77 is interposed between the first substrate 51 and the third substrate 173. For this reason, the resin layer 77 is protected by the third substrate 173.

  In the display device 20, each TFT element 63 is interposed between the third substrate 173 and the resin layer 77 and is provided in a region that overlaps each reflective region H. In the display device 20, each TFT element 63 is interposed between the third substrate 173 and the resin layer 77 in a region that overlaps each reflection region H, so that light contributing to reflective display or transmissive display is transmitted by the TFT element 63. Not blocked. For this reason, it is possible to easily increase the aperture ratio of each pixel 7.

  In the display device 20, the uneven portion 78 is formed on the display surface 9 side of the resin layer 77, that is, on the first substrate 51 side. For this reason, since the distance between the diffuse reflection layer 53 and the 1st board | substrate 51 can be shortened further, while being able to raise the utilization efficiency of light further, it is easy to suppress the fall of the contrast in a display further lower. Can do.

A third embodiment will be described.
A display device 60 according to the third embodiment includes a liquid crystal panel 70 as shown in FIG. 21 which is a cross-sectional view taken along line AA in FIG. The display device 60 in the third embodiment has the same configuration as the display device 1 in the first embodiment, except that the liquid crystal panel 10 in the first embodiment is replaced with a liquid crystal panel 70. .
Therefore, in the following third embodiment, in order to avoid redundant description, the same components as those in the first embodiment are denoted by the same reference numerals and detailed description thereof is omitted, and only the differences from the first embodiment are described. Will be described.

The liquid crystal panel 70 includes an element substrate 80 and a reflective substrate 90. In the liquid crystal panel 70 according to the third embodiment, the element substrate 15 (FIG. 2) of the liquid crystal panel 10 according to the first embodiment is omitted, and an element substrate 80 and a reflective substrate 90 are provided.
The element substrate 80 includes a first substrate 51 and an element layer 52 as shown in FIG. 22 which is a cross-sectional view taken along the line DD in FIG. The element substrate 80 has the same configuration as the element substrate 15 in the first embodiment except that the diffuse reflection layer 53 (FIG. 5) is omitted from the element substrate 15 in the first embodiment. Yes.

The reflective substrate 90 has a configuration in which a reflective film 79 is provided on the facing surface 174 a side of the third substrate 173. The third substrate 173 has a concavo-convex portion 78 formed on the facing surface 174a side. The reflective film 79 is provided on the facing surface 174a side of the third substrate 173, and covers the uneven portion 78 from the display surface 9 side.
The element substrate 80 and the reflective substrate 90 having the above-described configuration are joined via an adhesive 181.

A method for manufacturing the display device 60 will be described.
The manufacturing method of the display device 60 is roughly divided into a substrate manufacturing process, a liquid crystal panel 70 manufacturing process, a display panel 3 manufacturing process, and a display device 60 manufacturing process.
The substrate manufacturing process is roughly divided into a process for forming the element layer 52 on the first substrate 51, a process for manufacturing the counter substrate 17, and a process for manufacturing the reflective substrate 90.
In the display device 60, the process of forming the element layer 52 on the first substrate 51, the manufacturing process of the counter substrate 17, the manufacturing process of the display panel 3, and the manufacturing process of the display apparatus 60 are all in the first embodiment. It is the same. Therefore, only the manufacturing process of the reflective substrate 90 and the manufacturing process of the liquid crystal panel 70 will be described below.

  A manufacturing process of the reflective substrate 90 will be described. Here, the manufacturing process of the reflective substrate 90 is performed in a state where the third substrate 173 is a mother substrate. Hereinafter, in order to facilitate the description, the description will be made in the state of the third substrate 173.

In the manufacturing process of the reflective substrate 90, first, as shown in FIG. 23A, an uneven portion 78 that overlaps the reflective region H in plan view is formed on the facing surface 174 a of the third substrate 173. The uneven portion 78 can be formed by utilizing, for example, an etching technique. A method of forming the concavo-convex portion 78 on the third substrate 173 by utilizing an etching technique using hydrofluoric acid or the like is generally known as a frost treatment.
Next, as shown in FIG. 23B, a reflective film 79 is formed on the concavo-convex portion 78. Thereby, the reflective substrate 90 can be manufactured.
Note that any of the process of forming the element layer 52 on the first substrate 51, the process of manufacturing the counter substrate 17, and the process of manufacturing the reflective substrate 90 may be performed first or later.

A manufacturing process of the liquid crystal panel 70 will be described.
In the manufacturing process of the liquid crystal panel 70, first, as shown in FIG. 13A, a mother substrate 51m on which a plurality of element layers 52 are formed and a mother substrate 81m on which a plurality of opposing layers 82 are formed are It joins via the sealing material 21 provided annularly for every 161. At this time, the sealing material 21 provided for each part 161 is provided in a state in which a part of the annular contour is missing in plan view. A portion of the sealing material 21 lacking a part of the annular contour becomes an inlet for the liquid crystal 19.

  Next, the surface 163 of the mother substrate 51m is subjected to an etching process, a CMP process, and the like, so that the mother substrate 51m is thinned as shown in FIG. At this time, the second surface 54b is formed on the mother substrate 51m by performing an etching process, a CMP process, or the like on the surface 163.

Next, the adhesive 181 is applied to at least one of the second surface 54b of the first substrate 51 and the facing surface 174a of the third substrate 173, and then the second surface 54b of the first substrate 51 and the third substrate 173 are applied. The opposite surface 174a is joined with an adhesive 181.
Next, the mother substrate 51m, the mother substrate 81m, and the mother substrate of the third substrate 173 are cut for each portion 161.
Next, after the liquid crystal 19 is injected from the injection port for each part 161, the liquid crystal 19 is sealed by closing the injection port. Thereby, the liquid crystal panel 70 shown in FIG. 22 can be manufactured.

In the third embodiment, the concavo-convex portion 78 and the reflection film 79 correspond to the diffuse reflection layer.
Also in the display device 60 in the third embodiment, the same effect as the display device 1 in the first embodiment can be obtained.
Furthermore, since the resin layer 77 can be omitted in the display device 60, the display device 60 can be made thinner or the manufacturing cost can be reduced.

  Further, in the display device 60, since the uneven portion 78 is formed on the facing surface 174a side of the third substrate 173, the distance between the reflective film 79 and the liquid crystal 19 can be further shortened. For this reason, it is possible to further improve the light utilization efficiency and to further suppress the decrease in contrast in the display.

A fourth embodiment will be described.
The display device 100 according to the fourth embodiment includes a liquid crystal panel 110 as shown in FIG. 24 which is a cross-sectional view taken along line AA in FIG. The display device 100 in the fourth embodiment has the same configuration as the display device 1 in the first embodiment, except that the liquid crystal panel 10 in the first embodiment is replaced with a liquid crystal panel 110. .
Therefore, in the following fourth embodiment, in order to avoid redundant description, the same components as those in the first embodiment are denoted by the same reference numerals, detailed description thereof is omitted, and only differences from the first embodiment are described. Will be described.

The liquid crystal panel 110 has an element substrate 120. In the liquid crystal panel 110 according to the fourth embodiment, the element substrate 15 (FIG. 2) of the liquid crystal panel 10 according to the first embodiment is replaced with an element substrate 120.
The element substrate 120 includes a first substrate 51 and an element layer 52, as shown in FIG. 25 which is a cross-sectional view taken along the line DD in FIG. In the element substrate 120, the resin layer 77 (FIG. 5) is omitted from the element substrate 15 in the first embodiment.

  In the element substrate 120, the uneven portion 78 is formed on the second surface 54 b side of the first substrate 51. The reflective film 79 is provided on the second surface 54 b side of the first substrate 51 and covers the uneven portion 78 from the bottom surface 23 side.

A method for manufacturing the display device 100 will be described.
The manufacturing method of the display device 100 is roughly divided into a substrate manufacturing process, a liquid crystal panel 110 manufacturing process, a display panel 3 manufacturing process, and a display device 100 manufacturing process.
In the display device 100, the substrate manufacturing process, the display panel 3 manufacturing process, and the display device 100 manufacturing process are all the same as in the first embodiment. Therefore, only the manufacturing process of the liquid crystal panel 110 will be described below.

  In the manufacturing process of the liquid crystal panel 110, first, as shown in FIG. 13A, a mother substrate 51m on which a plurality of element layers 52 are formed and a mother substrate 81m on which a plurality of facing layers 82 are formed are It joins via the sealing material 21 provided annularly for every 161. At this time, the sealing material 21 provided for each part 161 is provided in a state in which a part of the annular contour is missing in plan view. A portion of the sealing material 21 lacking a part of the annular contour becomes an inlet for the liquid crystal 19.

  Next, the surface 163 of the mother substrate 51m is subjected to an etching process, a CMP process, and the like, so that the mother substrate 51m is thinned as shown in FIG. At this time, the second surface 54b is formed on the mother substrate 51m by performing an etching process, a CMP process, or the like on the surface 163.

  Next, as shown in FIG. 26, an uneven portion 78 that overlaps the reflective region H in plan view is formed on the second surface 54b of the mother substrate 51m. The concavo-convex portion 78 can be formed by utilizing the frost processing described above.

Next, a reflective film 79 shown in FIG.
Next, the mother substrate 51m and the mother substrate 81m are cut for each portion 161.
Next, after the liquid crystal 19 is injected from the injection port for each part 161, the liquid crystal 19 is sealed by closing the injection port. Thereby, the liquid crystal panel 110 shown in FIG. 25 can be manufactured.

In the fourth embodiment, the concavo-convex portion 78 and the reflection film 79 correspond to the diffuse reflection layer.
Also in the display device 100 in the fourth embodiment, the same effect as that of the display device 1 in the first embodiment can be obtained.
Further, in the display device 100, since the resin layer 77 and the third substrate 173 can be omitted, the display device 100 can be thinned and the cost can be reduced.

  Further, in the display device 100, since the uneven portion 78 is formed on the second surface 54b side of the first substrate 51, the distance between the reflective film 79 and the liquid crystal 19 can be further shortened. For this reason, it is possible to further improve the light utilization efficiency and to further suppress the decrease in contrast in the display.

  In the display devices 1, 20, 60, and 100, the FFS type driving method is adopted as the driving method of the liquid crystal 19. However, the driving method is not limited to this, and an IPS (In Plane Switching) type, Various methods such as a VA (Vertical Alignment) type may be employed.

  In the display devices 1, 20, 60, and 100, the case where the retardation film 95 is provided on the counter substrate 17 side has been described as an example. However, the retardation film 95 is not limited to this, and the element substrate. It may be provided on the 15, 80, 120 side.

  In the display devices 1, 20, 60, and 100, the configuration having the first alignment film 93 and the retardation film 95 has been described as an example. However, the present invention is not limited thereto, and the first alignment film 93 and the retardation film are included. A configuration in which a phase difference sheet (phase difference plate) is pasted instead of 95 may be employed. In this configuration, the first alignment film 93 is omitted, and a retardation sheet is provided instead of the retardation film 95. With this configuration, the first alignment film 93 can be omitted, so that each display device 1, 20, 60, 100 can be thinned.

  In the display devices 1, 20, 60, and 100, the phase difference film 95 that gives a half-wave phase difference to incident light has been described as an example. However, the present invention is not limited to this, and various phase differences such as ¼ wavelength and １ ／ wavelength can be adopted.

Further, in the display devices 1, 20, 60, and 100, the transflective liquid crystal device has been described as an example, but the display devices 1, 20, 60, and 100 are not limited to this, and the reflective liquid crystal device. Can also be employed.
In the case of a reflective liquid crystal device, the transmissive region T of each pixel 7 is omitted in the display devices 1, 20, 60, and 100, respectively. In this case, in each pixel 7, the external light incident on the liquid crystal 19 through the display surface 9 is reflected by the reflective film 79 toward the display surface 9, and the reflected light is emitted to the display surface 9 side. Reflective display is performed.

  In the case of a reflective liquid crystal device, in the display devices 1, 20, 60, and 100, the front light type configuration in which the illumination device 5 is provided closer to the display surface 9 than the counter substrate 17 and the illumination device 5 are omitted. A configuration or the like can be adopted.

  The display devices 1, 20, 60, and 100 described above can be applied to, for example, the display unit 510 of the electronic device 500 illustrated in FIG. This electronic device 500 is a mobile phone. This electronic device 500 has operation buttons 511. The display unit 510 can display various information including information input by the operation buttons 511 and incoming call information. In this electronic apparatus 500, since the display device 1, the display device 20, the display device 60, or the display device 100 is applied to the display unit 510, a reduction in contrast in the display unit 510 can be suppressed to an extremely low level, thereby improving display quality. It can be made easy.

  The electronic device 500 is not limited to a mobile phone, and includes various electronic devices such as mobile computers, digital still cameras, digital video cameras, in-vehicle devices such as display devices for car navigation systems, and audio devices. The display panel 3 and the liquid crystal panels 10, 30, 70, and 110 can be applied as light valves to projection display devices such as projectors.

The disassembled perspective view which shows the main structures of the display apparatus in 1st Embodiment. Sectional drawing in the AA in FIG. FIG. 3 is a plan view showing a part of a plurality of pixels in the first embodiment. The enlarged view of the C section in FIG. Sectional drawing in the DD line | wire in FIG. Sectional drawing in the FF line | wire in FIG. The top view explaining arrangement | positioning of the TFT element in 1st Embodiment, a common electrode, and a pixel electrode. The figure explaining the polarization state in the transmissive area | region of the display panel in 1st Embodiment. The figure explaining the polarization state in the reflective area | region of the display panel in 1st Embodiment. The figure explaining the process of forming an element layer in the 1st substrate in a 1st embodiment. The figure explaining the manufacturing process of the opposing board | substrate in 1st Embodiment. Sectional drawing explaining each mother board | substrate of the 1st board | substrate and 2nd board | substrate in 1st Embodiment. The figure explaining the manufacturing process of the liquid crystal panel in 1st Embodiment. The figure explaining the manufacturing process of the liquid crystal panel in 1st Embodiment. The figure explaining the manufacturing process of the liquid crystal panel in 1st Embodiment. The figure explaining the manufacturing process of the liquid crystal panel in 1st Embodiment. Sectional drawing in the AA in FIG. 1 of the display apparatus in 2nd Embodiment. Sectional drawing in the DD line in FIG. 4 of the liquid crystal panel in 2nd Embodiment. The figure explaining the manufacturing process of the element substrate in 2nd Embodiment. The figure explaining the manufacturing process of the element substrate in 2nd Embodiment. Sectional drawing in the AA in FIG. 1 of the display apparatus in 3rd Embodiment. Sectional drawing in the DD line in FIG. 4 of the liquid crystal panel in 3rd Embodiment. The figure explaining the manufacturing process of the reflective substrate in 3rd Embodiment. Sectional drawing in the AA in FIG. 1 of the display apparatus in 4th Embodiment. Sectional drawing in the DD line in FIG. 4 of the liquid crystal panel in 4th Embodiment. The figure explaining the manufacturing process of the liquid crystal panel in 4th Embodiment. The perspective view of the electronic device to which the display apparatus in this embodiment was applied.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1,20,60,100 ... Display apparatus, 3 ... Display panel, 5 ... Illumination device, 7 ... Pixel, 8 ... Display area, 9 ... Display surface, 10, 30, 70, 110 ... Liquid crystal panel, 15, 80, DESCRIPTION OF SYMBOLS 120 ... Element substrate, 17 ... Opposite substrate, 19 ... Liquid crystal, 23 ... Bottom, 40 ... Electrode substrate, 50, 90 ... Reflective substrate, 51 ... First substrate, 52 ... Element layer, 53 ... Diffuse reflection layer, 54a ... First 1 surface, 54b ... 2nd surface, 63 ... TFT element, 77 ... resin layer, 77a ... liquid material, 77b ... liquid material film, 78 ... uneven part, 79 ... reflective film, 171 ... element layer, 173 ... 3rd substrate DESCRIPTION OF SYMBOLS 174a ... Opposite surface, 174b ... Outward surface, 500 ... Electronic device, H ... Reflection area | region, T ... Transmission area | region, M ... Matrix.

Claims (16)

A first substrate;
A second substrate facing the first substrate;
Liquid crystal interposed between the first substrate and the second substrate;
A diffuse reflection layer that diffusely reflects light incident on the liquid crystal through the second substrate toward the second substrate;
The driving of the liquid crystal is controlled for each of the plurality of pixels,
In each of the pixels, a transmissive region for performing transmissive display and a reflective region for performing reflective display are set.
The first substrate has a first main surface on the liquid crystal side and a second main surface opposite to the first main surface;
The liquid crystal display device, wherein the diffuse reflection layer is provided in a region overlapping each reflection region, and is provided on the second main surface side of the first substrate. Having a polarizing plate provided on the second main surface side of the first substrate;
The liquid crystal display device according to claim 1, wherein the diffuse reflection layer is interposed between the first substrate and the polarizing plate.   The liquid crystal display device according to claim 1, wherein the diffuse reflection layer includes a concavo-convex portion and a reflective film that covers the concavo-convex portion.   The liquid crystal display device according to claim 3, wherein the uneven part is formed on the second main surface of the first substrate. A resin layer provided on the second main surface side of the first substrate;
The liquid crystal display device according to claim 3, wherein the uneven portion is formed in the resin layer. A third substrate facing the second main surface side of the first substrate;
The liquid crystal display device according to claim 5, wherein the resin layer is interposed between the third substrate and the first substrate. A plurality of switching elements that are provided corresponding to the pixels and control driving of the liquid crystal;
The liquid crystal display device according to claim 6, wherein each of the switching elements is interposed between the third substrate and the resin layer, and is provided in a region that overlaps each of the reflective regions. .   The liquid crystal display device according to claim 6, wherein the concavo-convex portion is formed on the first substrate side of the resin layer. A third substrate facing the second main surface side of the first substrate;
The liquid crystal display device according to claim 3, wherein the concavo-convex portion is formed on the third substrate. The third substrate has a facing surface facing the second main surface,
The liquid crystal display device according to claim 9, wherein the uneven portion is formed on the facing surface side. A first substrate;
A second substrate facing the first substrate;
Liquid crystal interposed between the first substrate and the second substrate;
A resin layer provided on a surface opposite to the liquid crystal side of the first substrate;
A reflective film provided on a surface opposite to the first substrate side of the resin layer,
The liquid crystal display device, wherein the resin layer is provided with an uneven portion between the resin layer and the reflective film. A first substrate;
A second substrate facing the first substrate;
Liquid crystal interposed between the first substrate and the second substrate;
A resin layer provided on a surface opposite to the liquid crystal side of the first substrate;
A reflective film provided on a surface of the resin layer on the first substrate side,
The liquid crystal display device, wherein the resin layer is provided with an uneven portion between the resin layer and the reflective film. A first substrate;
A second substrate facing the first substrate;
Liquid crystal interposed between the first substrate and the second substrate;
A reflective film provided on a surface opposite to the liquid crystal side of the first substrate,
The liquid crystal display device, wherein the first substrate is provided with an uneven portion between the first substrate and the reflective film. A first substrate;
A second substrate facing the first substrate;
Liquid crystal interposed between the first substrate and the second substrate;
A third substrate facing a surface of the first substrate opposite to the liquid crystal side;
A reflective film provided on a surface of the third substrate on the first substrate side,
The liquid crystal display device, wherein the third substrate is provided with an uneven portion between the third substrate and the reflective film. A first substrate; a second substrate facing the first substrate; a liquid crystal interposed between the first substrate and the second substrate; and light incident on the liquid crystal through the second substrate. A diffused reflection layer for irregularly reflecting on two substrate sides, wherein the diffused reflection layer is provided on the opposite side of the first substrate from the liquid crystal side,
A method of manufacturing a liquid crystal display device comprising a step of thinning the first substrate.   An electronic apparatus comprising the liquid crystal display device according to claim 1 as a display portion.

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