JP2009208000A - Method for treating wastewater from automatic developing device - Google Patents

Method for treating wastewater from automatic developing device Download PDF

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JP2009208000A
JP2009208000A JP2008053529A JP2008053529A JP2009208000A JP 2009208000 A JP2009208000 A JP 2009208000A JP 2008053529 A JP2008053529 A JP 2008053529A JP 2008053529 A JP2008053529 A JP 2008053529A JP 2009208000 A JP2009208000 A JP 2009208000A
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developing
wastewater
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activated carbon
waste water
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Kaoru Ueda
薫 上田
Yuji Nagashima
雄士 長嶌
Yuzuru Baba
譲 馬場
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Toray Industries Inc
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Toray Industries Inc
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a developing method for reducing a further load on the purification apparatus of the company by treating wastewater overflowing developing section and rinsing section of an automatic developing device to make the quality of the wastewater tolerable enough to discharge the wastewater to a river. <P>SOLUTION: (1) The developing method includes the process wherein a planographic printing plate having a silicone layer is developed in the automatic developing device having a pretreatment section, developing section, posttreatment section, and rinsing section, and also wherein the wastewater from the developing section and rinsing section undergoes an adsorbing treatment in an activated carbon treatment tank containing only activated carbon. (2) The developing method of (1) further includes the process wherein the wastewater which has undergone the adsorbing treatment in the activated carbon treatment tank is charged again to the developing section and rinsing section of the automatic developing device. (3) The developing method of (1) or (2) further includes the process wherein the wastewater from the developing section and rinsing section is delivered to the activated carbon treatment tank only when the wastewater stored beforehand in a wastewater storing tank reaches a specified volume. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、平版の自動現像装置の現像部および水洗部から排出された排水の処理に関するものである。   The present invention relates to treatment of waste water discharged from a developing unit and a washing unit of a lithographic automatic developing device.

現在、平版の現像処理は自動現像機を用いて行われるのが一般的であるが、このような自動現像機は露光後、前処理部→現像部→後処理部→水洗部という工程からなっており、現像性を悪化させないために現像時および水洗時には新水を供給し続け、オーバーフローする現像水、水洗水はそのまま下水道へ排出する方法がとられている。   Currently, lithographic development processing is generally carried out using an automatic processor. Such an automatic processor consists of a process of pre-processing part → developing part → post-processing part → water washing part after exposure. In order not to deteriorate the developability, new water is continuously supplied at the time of development and washing, and the overflowing developing water and washing water are discharged to the sewer as they are.

しかし、自動現像機の設置個所に下水道の設備を持たない製版所は、自社浄化設備で浄化後に公共水域に排出している。これらの場合は水質汚濁防止法が適用され、下水道法に対し生物的酸素要求量(BOD)、化学的酸素要求量(COD)等でより厳しい規制が設定されている。また、各項目の規制値は各自治体で上乗せ基準が設定されており、規制値を超えないことが義務づけられている。   However, platemakers that do not have sewer facilities at the locations where automatic processors are installed are discharged into public water areas after purification by their own purification equipment. In these cases, the Water Pollution Control Law is applied, and more stringent regulations are set for the Sewerage Law, such as biological oxygen demand (BOD) and chemical oxygen demand (COD). In addition, the regulation values for each item are set by each local government, and it is obliged not to exceed the regulation values.

また、近年CSR(Corporate Social Responsibility−企業の社会的責任)の観点から、独自に自治体の規制値からさらに上乗せした規制値を設けて自主管理している製版所が増加しつつある。   Further, in recent years, from the viewpoint of CSR (Corporate Social Responsibility-corporate social responsibility), the number of platemakers that independently manage by providing a regulation value that is further increased from the regulation value of the local government is increasing.

さらに、省資源の観点から節水が求められており、この要求は製版所で排水総量規制の問題からますます強まってきている。   Furthermore, water saving is demanded from the viewpoint of resource saving, and this demand is getting stronger due to the problem of regulation of the total amount of wastewater at the plate making plant.

節水を行うには自動現像機の循環使用(新水供給の停止)が考えられるが、その場合現像性が悪化してしまう。すなわち微少な網点の再現性が徐々に悪化してしまう。   In order to save water, it is conceivable to use an automatic processor in a circulating manner (stopping the supply of new water), but in this case, developability deteriorates. That is, the reproducibility of minute halftone dots gradually deteriorates.

また、節水を行うもう1つの方法として水洗水の新水供給量の節水が考えられるが、この方法によれば排水の汚染度は高くなってしまう。すなわち排出される生物的酸素要求量(BOD)、化学的酸素要求量(COD)等の値が高くなり、自社浄化設備で排水を浄化している製版所は、浄化設備の負荷が高くなる問題を有していた。   Further, as another method of saving water, it is conceivable to save water by supplying a new amount of washing water. However, according to this method, the pollution degree of waste water is increased. In other words, the value of biological oxygen demand (BOD), chemical oxygen demand (COD), etc. that are discharged becomes high, and platemakers that purify wastewater with their own purification equipment have a problem of increasing the load on the purification equipment. Had.

そこで、現像排水の生物的,物理的,化学的処理が考えられ、特許文献1、特許文献2に開示される方法が提案されている。   Therefore, biological, physical, and chemical treatment of the development waste water can be considered, and methods disclosed in Patent Document 1 and Patent Document 2 have been proposed.

特許文献1には、生物処理をした後に活性炭吸着処理を行う方法が開示されており、特許文献2には濾過処理を行う方法が開示されている。
特開平9−85233公報(特許請求の範囲) 特開2006−218419公報(特許請求の範囲)
Patent Document 1 discloses a method of performing activated carbon adsorption treatment after biological treatment, and Patent Document 2 discloses a method of performing filtration treatment.
JP-A-9-85233 (Claims) JP 2006-218419 A (Claims)

本発明は、上記の問題を効果的に解決する新たな方法を提供する事を目的としている。つまり、本発明は現像水および水洗水から、オーバーフローして排出された排水に処理を行い、河川に排出可能な水質にすることにより、自社の浄化設備への負荷を低減させる方法を提供するものである。すなわち節水により汚染度が高くなった排水においても河川に排水可能なまでに浄化しうる排水処理方法を確立することを目的とする。   An object of the present invention is to provide a new method for effectively solving the above problems. In other words, the present invention provides a method for reducing the load on the purification equipment of the company by treating the waste water discharged from the developing water and the washing water into an overflow and making the water quality that can be discharged into the river. It is. In other words, an object of the present invention is to establish a wastewater treatment method that can purify wastewater that has become highly polluted by water-saving before it can be drained into a river.

上記課題を解決するために本発明は
(1)シリコーン層を有する平版を前処理部、現像部、後処理部、水洗部を有する自動現像装置で現像する工程において、現像部および水洗部から排出された排水を活性炭のみを有する活性炭処理槽で吸着処理することを特徴とする現像方法。
(2)活性炭処理槽で吸着処理した排水を自動現像装置の現像部および水洗部に再投入することを特徴とする上記(1)に記載の現像方法。
(3)現像部および水洗部から排出された排水を排水貯蔵タンクに一定量貯めてから活性炭処理槽へ送ることを特徴とする上記(1)または(2)に記載の現像方法。
In order to solve the above problems, the present invention
(1) In the process of developing a lithographic plate having a silicone layer with an automatic developing device having a pre-processing unit, a developing unit, a post-processing unit, and a washing unit, activated carbon treatment having only activated carbon for wastewater discharged from the developing unit and the washing unit A developing method characterized by performing adsorption treatment in a tank.
(2) The developing method as described in (1) above, wherein the wastewater adsorbed in the activated carbon treatment tank is reintroduced into the developing unit and the washing unit of the automatic developing device.
(3) The developing method as described in (1) or (2) above, wherein a certain amount of waste water discharged from the developing section and the washing section is stored in a waste water storage tank and then sent to an activated carbon treatment tank.

本発明の排水処理装置により、平版の現像部で必要な水量を減少させることが可能となるとともに、排出される排水の水質を向上させることができる。また、処理排水を再度現像装置で利用することにより、現像装置が循環型の装置となり排水を出さないことが可能となる。   With the wastewater treatment apparatus of the present invention, it is possible to reduce the amount of water required in the lithographic developing section and improve the quality of the discharged wastewater. Further, by using the treated wastewater again in the developing device, the developing device becomes a circulation type device, and the wastewater can be prevented from being discharged.

以下、本発明について、詳細に説明する。本発明において、処理対象たる平版はシリコーン層を有するものであり、例えば印刷用平版の処理に伴って排出される排水に適用するのが好ましい。   Hereinafter, the present invention will be described in detail. In the present invention, the lithographic plate to be treated has a silicone layer, and is preferably applied to, for example, drainage discharged with the processing of the printing lithographic plate.

本発明に用いるシリコーンゴム層を有する平版について説明する。本発明のシリコーンゴム層を有する平版は、基板上に少なくとも露光により隣接する層との接着力が変化する層とシリコーンゴムを主成分とする層を有する構成を持つものが好ましい。より具体的には特開2005−309126号公報、特開2000−47377号公報に記載された水なし平版印刷版原版を挙げることができる。   A lithographic plate having a silicone rubber layer used in the present invention will be described. The lithographic plate having the silicone rubber layer of the present invention preferably has a structure having a layer on which the adhesive force between adjacent layers changes at least by exposure and a layer mainly composed of silicone rubber. More specifically, waterless lithographic printing plate precursors described in JP-A-2005-309126 and JP-A-2000-47377 can be mentioned.

次にシリコーンゴム層を有する平版の製版方法を説明する。露光部が画線部となるネガ型・露光部が非画線部となるポジ型平版の場合は、通常保護フィルム上に原図フィルムを配して活性光線により画像露光を行い、その後保護フィルムを除去した後、現像することによって画像を形成することができる。また、直描型平版の場合は、保護フィルムを有する原版についてはそのままもしくは保護フィルムを剥離してから、レーザー光で画像を露光する。その後、保護フィルムを有するものは剥離した後、無いものはそのまま現像することによって画像を形成することができる。   Next, a method for making a lithographic plate having a silicone rubber layer will be described. In the case of a negative type lithographic plate where the exposed area is the image area and a positive type lithographic plate where the exposed area is the non-image area, the original film is usually placed on the protective film and image exposure is performed with actinic rays, and then the protective film is After removal, an image can be formed by development. In the case of a direct-drawing lithographic plate, the original image having a protective film is exposed as it is or after the protective film is peeled off, and then the image is exposed with a laser beam. Thereafter, an image having a protective film is peeled off, and an image having no protective film is developed as it is to form an image.

本発明に係る排水処理装置および排水処理方法について図を参照し説明する。   The waste water treatment apparatus and waste water treatment method according to the present invention will be described with reference to the drawings.

図1は本発明に係る排水処理装置の概略図である。   FIG. 1 is a schematic view of a wastewater treatment apparatus according to the present invention.

排水処理装置1は、ストレーナー2、排水貯蔵タンク3、送液第1ポンプ4、クッションタンク5、流量計6、活性炭処理槽7、処理排水貯蔵タンク8、送液第2ポンプ9を備えている。   The wastewater treatment apparatus 1 includes a strainer 2, a wastewater storage tank 3, a liquid feed first pump 4, a cushion tank 5, a flow meter 6, an activated carbon treatment tank 7, a treated wastewater storage tank 8, and a liquid feed second pump 9. .

自動現像機aの現像部および水洗部から排出された排水はストレーナー2を通り、固形分を除去したのち排水貯蔵タンク3に一時的に保管される。   The waste water discharged from the developing unit and the water washing unit of the automatic processor a passes through the strainer 2 and is temporarily stored in the waste water storage tank 3 after the solid content is removed.

自動現像機としては平版を現像できるものであれば限定されるものではないが、好ましくは少なくとも前処理部と現像部、後処理部および水洗部がこの順に設けられている自動現像機を用いるのがよい。自動現像機の具体的な例としては、東レ(株)製のTWL−1160F、TWL−860F、TWL−650Fなどの自動現像機、あるいは、特開平5−2272号公報、特開平5−6000号公報がなどに開示されている自動現像機を挙げることができる。   The automatic developing machine is not limited as long as it can develop a lithographic plate, but preferably an automatic developing machine in which at least a pre-processing unit, a developing unit, a post-processing unit and a washing unit are provided in this order is used. Is good. Specific examples of the automatic developing machine include an automatic developing machine such as TWL-1160F, TWL-860F, and TWL-650F manufactured by Toray Industries, Inc., or JP-A-5-2272 and JP-A-5-6000. Mention may be made of automatic developing machines which are disclosed in the publication.

自動現像機の前処理部には、例えば特開2005−338580号公報に記載の製版用処理液である製版用処理液1、すなわち(i)ジエチレングリコールモノ−2−エチルヘキシルエーテル:19重量部、(ii)ポリプロピレングリコール#200 :72重量部、(iii)2−(2−アミノエチルアミノ)エタノール : 9重量部、(iv)水 : 1重量部を入れ、現像部には水を入れ、後処理部には現像の確認を容易にするためシリコーンゴム層以外を染色する染色液として例えば特開平9−34132号公報の実施例3に記載の染色液、すなわち(i)クリスタルバイオレット(塩基性染料、保土谷化学工業(株)製)、0.10重量部、(ii)Brilliant Basic Cyanine 6GH (塩基性染料、保土谷化学工業(株)製)、0.40重量部、(iii)シノリンSO−35(2エチルヘキシル硫酸ナトリウム、40%水溶液、アニオン性界面活性剤、新日本理化(株)製) 5.00重量部、(iv)ブチルカルビトール 10重量部、(v)KS−502(信越化学工業(株)製、消泡剤) 0.002重量部、(vi)純水 84.498重量部を入れ、水洗部には水を入れて現像を行う。   The pre-processing section of the automatic processor includes, for example, plate-making treatment liquid 1 that is a plate-making treatment liquid described in JP-A-2005-338580, that is, (i) diethylene glycol mono-2-ethylhexyl ether: 19 parts by weight, ( ii) Polypropylene glycol # 200: 72 parts by weight; (iii) 2- (2-aminoethylamino) ethanol: 9 parts by weight; (iv) Water: 1 part by weight; In order to facilitate confirmation of development, for example, the dyeing solution described in Example 3 of JP-A-9-34132, for example, (i) crystal violet (basic dye, Hodogaya Chemical Co., Ltd.), 0.10 parts by weight, (ii) Brilliant Basic Cyanine 6GH (basic dye, soil preservation) Chemical Industry Co., Ltd.), 0.40 parts by weight, (iii) Sinoline SO-35 (2-ethylhexyl sodium sulfate, 40% aqueous solution, anionic surfactant, Shin Nippon Rika Co., Ltd.) 5.00 parts by weight , (Iv) 10 parts by weight of butyl carbitol, (v) KS-502 (manufactured by Shin-Etsu Chemical Co., Ltd., defoaming agent) 0.002 parts by weight, (vi) 84.498 parts by weight of pure water, and washed with water Part is developed with water.

自動現像機aから、排水貯蔵タンク3につながる配管の種類は限定されるものではないが、サイズは20A以上が好ましく、排水が逆流することなく排水貯蔵タンク3に流入するために、勾配をつけることが好ましい。好ましくは、排水貯蔵タンク3の入り口の高さと自動現像機の排水の出口配管の高さの差が10mm以上あることが好ましい。なお20Aは配管の呼び径を示し、例えばJIS K 6742 に記載されている水道用硬質ポリ塩化ビニル配管の場合、20Aは外径26.0mm厚さ3.0mmの配管を示す。   The type of piping connected from the automatic processor a to the waste water storage tank 3 is not limited, but the size is preferably 20A or more, and a slope is provided so that the waste water flows into the waste water storage tank 3 without flowing back. It is preferable. Preferably, the difference between the height of the inlet of the waste water storage tank 3 and the height of the outlet pipe of the waste water of the automatic processor is preferably 10 mm or more. In addition, 20A shows the nominal diameter of piping, for example, in the case of hard polyvinyl chloride piping for water supply described in JIS K 6742, 20A shows piping with an outer diameter of 26.0 mm and a thickness of 3.0 mm.

ストレーナー2の材質および目開きは限定されるものではないが、0.10mm〜2.00mmが好ましく、ストレーナーの数は目詰まりを抑制するためには、2つ以上目開きを変更したものを備えるのが好ましい。具体的な例としてはPVC製のY型ストレーナーを挙げることができる。   The material and openings of the strainer 2 are not limited, but are preferably 0.10 mm to 2.00 mm. The number of strainers includes two or more openings that are changed to prevent clogging. Is preferred. A specific example is a PVC Y-strainer.

排水貯蔵タンク3の材質・大きさは限定されるものではないが、例えばFRP製の120Lタンクが挙げられる。   The material and size of the drainage storage tank 3 are not limited, but examples thereof include a 120 L tank made of FRP.

排水貯蔵タンク3に保管された排水があらかじめ設定した一定量貯まると自動的に送液第1ポンプ4が作動し、クッションタンク5、流量計6を介して、活性炭処理槽7に送られる。   When a predetermined amount of waste water stored in the waste water storage tank 3 is stored in advance, the liquid feeding first pump 4 is automatically operated and sent to the activated carbon treatment tank 7 through the cushion tank 5 and the flow meter 6.

送液第1ポンプ4に使用するポンプは限定されるものではないが、活性炭処理槽7の限界処理速度に応じたポンプで速度可変式のものを選定することが好ましい。具体的な例としては(株)タクミナ製ZD1−63−VTCE−FWが挙げられる。   Although the pump used for the liquid feeding first pump 4 is not limited, it is preferable to select a pump of variable speed type according to the limit processing speed of the activated carbon treatment tank 7. A specific example is ZD1-63-VTCE-FW manufactured by Takumina Co., Ltd.

ポンプの作動開始を設定する水位計は限定されるものではないが、例えば電極式のレベル計が挙げられる。設定した水位に排水が達すると信号が制御盤bに送られ、制御盤bは送液第1ポンプ4を作動させる。   The water level meter for setting the start of operation of the pump is not limited, and examples thereof include an electrode type level meter. When the drainage reaches the set water level, a signal is sent to the control panel b, and the control panel b activates the liquid feeding first pump 4.

クッションタンク5の詳細は図2に示す。上部より送液された排水は、排水の流れ10に従って流れる。クッションタンク5の中に一時的に保管されヘッド圧によって下部から流量計6へと流れ出る構造となっており、エアー抜け配管11が備えられている。エアー抜け配管11の長さは限定されないが、短すぎるとエアーとともに排水まで噴出してしまうため、100mm以上が好ましい。また、クッションタンク5の大きさは送液第1ポンプ4の送液量および送液量のばらつきに依存するが、例えば(株)タクミナ製ZD1−63−VTCE−FWのポンプでの送液の場合、6Lタンクの設置によりエアー抜け配管11から排水が噴出することなく送液ばらつきが9〜24L/minから8.4〜8.7L/min低減される。   Details of the cushion tank 5 are shown in FIG. The wastewater sent from the top flows according to the wastewater flow 10. It is temporarily stored in the cushion tank 5 and flows out from the lower part to the flow meter 6 by the head pressure, and is provided with an air escape pipe 11. The length of the air escape pipe 11 is not limited, but if it is too short, it will be ejected to the drainage together with the air, so 100 mm or more is preferable. Further, the size of the cushion tank 5 depends on the amount of liquid fed by the first liquid feed pump 4 and the variation in the amount of liquid delivered. For example, the amount of liquid delivered by a pump of ZD1-63-VTCE-FW manufactured by Takumina Co., Ltd. In this case, the dispersion of liquid feeding is reduced from 9 to 24 L / min to 8.4 to 8.7 L / min without drainage from the air escape pipe 11 by the installation of the 6 L tank.

クッションタンク5は送液第1ポンプ4による排水の送液にばらつきがある場合に有効となる。ポンプの送液量にばらつきがある場合、送液量が多い瞬間は、活性炭処理槽7内部の活性炭の表面に水圧がかかった排水が打ち付けられ、その部分の活性炭の寿命が短くなる可能性がある。これは特に送液第1ポンプ4にダイヤフラム式ポンプなど脈動が大きいポンプを使用したときに起こる問題であり、クッションタンク5を使用することで、この問題を解決できる。   The cushion tank 5 is effective when there is a variation in the liquid discharge of the waste water by the liquid supply first pump 4. If there is a variation in the amount of liquid delivered by the pump, at the moment when the amount of delivered liquid is large, the surface of the activated carbon inside the activated carbon treatment tank 7 is struck with water pressure, which may shorten the life of the activated carbon. is there. This is a problem that occurs particularly when a pump having a large pulsation such as a diaphragm pump is used as the first liquid-feeding pump 4, and this problem can be solved by using the cushion tank 5.

また、送液量のばらつきはクッションタンク5の下流に設置してある流量計6により安定流量供給されているかを常時確認することが可能となる。
この流量計6は限定されるものではないが、活性炭の交換時期の目安としても利用するためには積算流量計が好ましく、設定した流量の排水が活性炭処理槽7に送られると、信号が制御盤bに送られ、制御盤bはポンプを停止させる。その間に活性炭の交換などを行うことが可能となる。
In addition, it is possible to always check whether or not the amount of liquid fed is being supplied with a stable flow rate by the flow meter 6 installed downstream of the cushion tank 5.
Although this flow meter 6 is not limited, an integrated flow meter is preferable for use as a guideline for the replacement timing of the activated carbon, and when the set amount of waste water is sent to the activated carbon treatment tank 7, the signal is controlled. The control panel b stops the pump. In the meantime, the activated carbon can be exchanged.

活性炭処理槽7に用いる活性炭の種類は、限定されるものではなく吸着能力のある如何なる活性炭であっても良い。即ち活性炭の原料には、木材、石炭、ヤシ殻原材料としてはマツなどの木・竹・椰子殻・胡桃殻などの植物質のもののほか、石炭質、石油質、特殊なものでは獣骨や血液といった動物性の原料を用いてもよい。また、活性炭の種類としては、粉末、粒状、繊維状、板状の何れでもよい。例えば、石炭系破砕炭の三菱化学カルゴン F−400が挙げられる。   The type of activated carbon used in the activated carbon treatment tank 7 is not limited, and any activated carbon having an adsorption ability may be used. In other words, the raw materials for activated carbon include wood, coal, and coconut shell materials such as pine trees, bamboo, coconut shells and walnut shells, as well as coal, petroleum and special ones such as animal bones and blood. Such animal raw materials may be used. Moreover, as a kind of activated carbon, any of powder, a granular form, a fiber form, and plate shape may be sufficient. An example is Mitsubishi Chemical Calgon F-400, a coal-based crushed coal.

活性炭処理槽7の出口にはバルブが設置してあり、活性炭の寿命を延ばすためにはバルブの開度を調整することにより供給量と同量の処理排水が流れ出るようにし、常に処理槽内の水位を一定に保つようにするのが好ましい。   A valve is installed at the outlet of the activated carbon treatment tank 7, and in order to extend the life of the activated carbon, by adjusting the opening of the valve, the treated waste water flows in the same amount as the supply amount. It is preferable to keep the water level constant.

排水貯蔵タンク3内の排水を活性炭処理槽7に供給すると自動的にポンプが停止し空汲みを防止する。空汲み防止のための水位計としては限定されるものではないが、例えば電極式のレベル計が挙げられる。   When the waste water in the waste water storage tank 3 is supplied to the activated carbon treatment tank 7, the pump is automatically stopped to prevent empty pumping. Although the water level meter for preventing empty pumping is not limited, for example, an electrode type level meter can be mentioned.

活性炭処理槽7から排出される処理排水は処理排水貯蔵タンク8に貯蔵され、送液第2ポンプ9により再度自動現像機a内に投入される。また、処理排水を再利用しない場合にはバルブの切り替えにより活性炭処理槽7から下水もしくは河川に流すことも可能である。   The treated wastewater discharged from the activated carbon treatment tank 7 is stored in the treated wastewater storage tank 8 and is again put into the automatic processor a by the liquid feed second pump 9. Further, when the treated wastewater is not reused, it is possible to flow from the activated carbon treatment tank 7 to the sewage or the river by switching the valve.

処理排水貯蔵タンク8の材質・大きさは限定されるものではないが、例えばFRP製の120Lタンクが挙げられる。また、送液第2ポンプ9は限定されるものではない。   Although the material and size of the treated wastewater storage tank 8 are not limited, for example, a 120 L tank made of FRP can be mentioned. Moreover, the liquid feeding 2nd pump 9 is not limited.

以下、実施例によって本発明をさらに詳しく説明するが、本発明はこれらに限定されるものではない。   EXAMPLES Hereinafter, although an Example demonstrates this invention further in detail, this invention is not limited to these.

<使用した排水>
処理に使用した排水は以下の設定で印刷用感光材料を処理する過程で、現像部からオーバーフローして排出された水を使用した。
自動現像機:TWL−1160F(東レ(株)製)
前処理液:CP−1(東レ(株)製) 温度44℃
現像水:水道水 温度25℃
後処理液:PA−F(東レ(株)製)
感光材料:水なしCTP版 VG5(東レ(株)製)
処理枚数:1030mm×800mm 150枚/日 連続通版
網点面積率:30%
<Used drainage>
The waste water used for processing was water discharged from the developing section in the course of processing the photosensitive material for printing with the following settings.
Automatic processor: TWL-1160F (manufactured by Toray Industries, Inc.)
Pretreatment liquid: CP-1 (manufactured by Toray Industries, Inc.) Temperature: 44 ° C
Developing water: tap water temperature 25 ° C
Post-treatment liquid: PA-F (manufactured by Toray Industries, Inc.)
Photosensitive material: Waterless CTP version VG5 (manufactured by Toray Industries, Inc.)
Number of processed sheets: 1030 mm × 800 mm 150 sheets / day Continuous plate halftone dot area ratio: 30%

次に試験に使用した水なしCTP版の製造・製版・露光・現像部の詳細を説明する。   Next, details of the production, plate making, exposure and development of the waterless CTP plate used in the test will be described.

<製造方法>
基板上に各層を形成する組成物を塗布した。プライマー層組成物塗液を塗布して200℃で2分間熱硬化した後、インキ着肉層組成物塗液を塗布し、140℃で2分間熱硬化した。その上にシリコーンゴム層組成物塗液を塗布し、135℃の温度で2分間処理してゴムを硬化させた。その後、保護フィルムをラミネートした。
<Manufacturing method>
A composition for forming each layer was applied on the substrate. The primer layer composition coating solution was applied and thermally cured at 200 ° C. for 2 minutes, and then the ink deposit layer composition coating solution was applied and thermally cured at 140 ° C. for 2 minutes. A silicone rubber layer composition coating solution was applied thereon and treated at a temperature of 135 ° C. for 2 minutes to cure the rubber. Thereafter, a protective film was laminated.

<製版工程>
次に水なしCTP版の製版方法について説明する。製版とは、平版印刷版原版を活性光線で像様照射する露光工程(画像形成工程)から、露光済みの平版印刷版を現像し印刷版のパターン形成を行う現像工程までを含めた工程のことを言う。なお、現像工程では、現像の前後にそれぞれ前処理、後処理を行うことも行なわれ、その場合、それぞれ前処理部、現像部、後処理部に細分化される。
<Plate making process>
Next, a method for making a waterless CTP plate will be described. Platemaking refers to the process from the exposure process (image formation process) in which the lithographic printing plate precursor is imagewise irradiated with actinic rays to the development process in which the exposed lithographic printing plate is developed and the printing plate is patterned. Say. In the development process, pre-processing and post-processing are also performed before and after development, respectively. In this case, the pre-processing unit, the developing unit, and the post-processing unit are subdivided.

<露光工程>
保護フィルムを剥離してから、あるいは保護フィルム上からレーザー光で画像状に露光する。ここでレーザー光源として830nm波長のレーザー光を用いた。
<Exposure process>
After the protective film is peeled off or exposed on the protective film with a laser beam in an image form. Here, a laser beam having a wavelength of 830 nm was used as a laser light source.

<現像工程>
現像手段としては、前処理部と現像部、および後処理部がこの順に設けられている自動現像装置を用いた。自動現像装置として東レ(株)製の“TWL−1160F”を使用し、現像部からオーバーフローして排出された水を使用して処理を実施した。
上記排水の分析値は以下の通りである。
PH 8.6
COD 300ppm
BOD 430ppm
SS 1ppm
n−ヘキサン抽出物(鉱物油) <0.5ppm
n−ヘキサン抽出物(動植物油) 19ppm
<Development process>
As the developing means, an automatic developing device provided with a pre-processing unit, a developing unit, and a post-processing unit in this order was used. Processing was carried out using “TWL-1160F” manufactured by Toray Industries, Inc. as an automatic developing device, and using water discharged from the developing section.
The analysis values of the waste water are as follows.
PH 8.6
COD 300ppm
BOD 430ppm
SS 1ppm
n-hexane extract (mineral oil) <0.5ppm
n-hexane extract (animal and vegetable oil) 19ppm

各分析値の測定方法を以下に示す。
PH(水素イオン濃度):JIS K0102−1998 12.1に該当するガラス電極法に従って測定した。
COD(化学的酸素要求量):JIS K0102−1998 17に該当する硫酸酸性過マンガン酸カリウムによる方法(CODMn)に従って測定した。
BOD(生物化学的酸素要求量):JIS K0102−1998 21に該当する希釈法ウインクラーアジ化ナトリウム変法に従って測定した。
SS(浮遊物質量):環境庁告示第64号に該当するろ過法に従って測定した。
n−ヘキサン抽出物含有量(鉱物油):JIS K0102−1998 24.2参考II.1に該当するカラムクロマト法に従って測定した。
n−ヘキサン抽出物含有量(動植物油):JIS K0102−1998 24.2参考II.2に該当するカラムクロマト法に従って測定した。
The measuring method of each analytical value is shown below.
PH (hydrogen ion concentration): Measured according to a glass electrode method corresponding to JIS K0102-1998 12.1.
COD (chemical oxygen demand): Measured according to the method (CODMn) using sulfuric acid potassium permanganate corresponding to JIS K0102-199817.
BOD (Biochemical Oxygen Demand): Measured according to a dilution method winker sodium azide modification corresponding to JIS K0102-199821.
SS (Amount of suspended solids): Measured according to the filtration method corresponding to Environment Agency Notification No. 64.
n-Hexane extract content (mineral oil): JIS K0102-1998 24.2 Reference II. It was measured according to the column chromatography method corresponding to 1.
n-Hexane extract content (animal and vegetable oil): JIS K0102-1998 24.2 Reference II. It was measured according to the column chromatography method corresponding to 2.

上記の汚染排水に対し、活性炭処理を行った。処理に用いた装置は石炭系の活性炭処理装置(三菱化学カルゴン(株)製 200L Calsorb DRUM)を使用した。このとき活性炭処理装置には連続で10L/min通水し、同量の処理排水を処理槽下部より排出した。   The above contaminated waste water was treated with activated carbon. The apparatus used for the treatment was a coal-based activated carbon treatment apparatus (200L Calsorb DRUM manufactured by Mitsubishi Chemical Calgon Co., Ltd.). At this time, 10 L / min was continuously passed through the activated carbon treatment apparatus, and the same amount of treated wastewater was discharged from the lower part of the treatment tank.

このときの処理排水の主な分析結果は以下の通りである。
PH 6.7ppm
COD(二酸化マンガン法) 2ppm
BOD 2.8ppm
SS <1ppm
n−ヘキサン抽出物(鉱物油) <0.5ppm
n−ヘキサン抽出物(動植物油)<0.5ppm
The main analysis results of the treated wastewater at this time are as follows.
PH 6.7ppm
COD (manganese dioxide method) 2ppm
BOD 2.8ppm
SS <1ppm
n-hexane extract (mineral oil) <0.5ppm
n-hexane extract (animal and vegetable oil) <0.5ppm

上記のとおり各測定値いずれについても値が低下していることがわかる。そのためこの処理により下水はもとより河川にも流すことが可能となる。さらにこの処理排水を自動現像機に供給することにより、現像性を悪化させることなく再利用することができる。   As described above, it can be seen that the values are reduced for each measured value. For this reason, this treatment makes it possible to flow into rivers as well as sewage. Furthermore, by supplying this treated wastewater to an automatic processor, it can be reused without deteriorating developability.

本発明に関わる排水処理装置の一例を示す概略図である。It is the schematic which shows an example of the waste water treatment equipment concerning this invention. 本発明のクッションタンク5の一例を示す概略図である。It is the schematic which shows an example of the cushion tank 5 of this invention.

符号の説明Explanation of symbols

W:水供給源
a:自動現像機
a1:前処理部
a2:現像部
a3:後処理部
a4:水洗部
b:制御盤
1:排水処理装置
2:ストレーナー
3:排水貯蔵タンク
4:送液第1ポンプ
5:クッションタンク
6:流量計
7:活性炭処理槽
8:処理排水貯蔵タンク
9:送液第2ポンプ
10:排水の流れ
11:エアー抜け配管
W: Water supply source a: Automatic processor a1: Pre-processing unit a2: Development unit a3: Post-processing unit a4: Washing unit b: Control panel 1: Wastewater treatment device 2: Strainer 3: Wastewater storage tank 4: Liquid supply 1 pump 5: cushion tank 6: flow meter 7: activated carbon treatment tank 8: treated wastewater storage tank 9: liquid feed second pump 10: wastewater flow 11: air vent pipe

Claims (3)

シリコーン層を有する平版を前処理部、現像部、後処理部、水洗部を有する自動現像装置で現像する工程において、現像部および水洗部から排出された排水を活性炭のみを有する活性炭処理槽で吸着処理することを特徴とする現像方法。   In the process of developing a lithographic plate having a silicone layer with an automatic developing device having a pre-processing unit, a developing unit, a post-processing unit, and a washing unit, the waste water discharged from the developing unit and the washing unit is adsorbed in an activated carbon treatment tank having only activated carbon. A developing method characterized by processing. 活性炭処理槽で吸着処理した排水を自動現像装置の現像部および水洗部に再投入することを特徴とする請求項1に記載の現像方法。   2. The developing method according to claim 1, wherein the waste water adsorbed in the activated carbon treatment tank is re-introduced into a developing unit and a washing unit of an automatic developing device. 現像部および水洗部から排出された排水を排水貯蔵タンクに一定量貯めてから活性炭処理槽へ送ることを特徴とする請求項1または2に記載の現像方法。   The developing method according to claim 1 or 2, wherein a certain amount of waste water discharged from the developing unit and the washing unit is stored in a waste water storage tank and then sent to an activated carbon treatment tank.
JP2008053529A 2008-03-04 2008-03-04 Method for treating wastewater from automatic developing device Pending JP2009208000A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014196358A1 (en) * 2013-06-03 2014-12-11 住友理工株式会社 Method for treating printing plate developer liquid and treatment system for printing plate developer liquid

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014196358A1 (en) * 2013-06-03 2014-12-11 住友理工株式会社 Method for treating printing plate developer liquid and treatment system for printing plate developer liquid
JP2014235325A (en) * 2013-06-03 2014-12-15 住友理工株式会社 Treatment method for printing plate developer and treatment system for printing plate developer
EP2975460A1 (en) * 2013-06-03 2016-01-20 Sumitomo Riko Company Limited Method for treating printing plate developer liquid and treatment system for printing plate developer liquid
EP2975460A4 (en) * 2013-06-03 2016-03-02 Sumitomo Riko Co Ltd Method for treating printing plate developer liquid and treatment system for printing plate developer liquid
CN105431781A (en) * 2013-06-03 2016-03-23 住友理工株式会社 Method for treating printing plate developer liquid and treatment system for printing plate developer liquid

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