JP2009176867A - Method of manufacturing filter for display - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a filter for display having an excellent antireflection property when forming another functional layer on an electromagnetic wave shielding layer. <P>SOLUTION: The method of manufacturing the filter for display includes a step of forming a first functional layer by applying a coating liquid for forming the first functional layer containing at least an ultraviolet curing resin composition onto a transparent base material 210 having a mesh-like electromagnetic wave shielding layer 220 and irradiating a coating layer obtained by that with ultraviolet rays. The coating layer is irradiated with the ultraviolet rays in the state of being made horizontal. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention is applicable to various displays such as a plasma display panel (PDP), a cathode ray tube (CRT) display, a liquid crystal display, an organic EL (electroluminescent) display, and a field emission display (FED) including a surface electric field display (SED). The present invention relates to a method for manufacturing a filter having various functions such as antireflection, near infrared ray shielding, and electromagnetic wave shielding.

  In recent years, flat panel displays such as liquid crystal displays, plasma displays (PDPs), EL displays, and CRT displays have been mainly used for large-screen displays, and PDPs have become common as next-generation large-screen display devices. However, in this PDP, high-frequency pulse discharge is performed on the light emitting unit for image display, and therefore there is a risk of unnecessary electromagnetic radiation and infrared radiation causing malfunction of an infrared remote controller or the like.

  For this reason, a filter having an electromagnetic wave shielding layer formed on a transparent substrate is known as a filter used for a display such as a PDP. In the electromagnetic wave shielding layer, for example, (1) a transparent conductive thin film containing metallic silver, (2) a conductive mesh in which a metal wire or conductive fiber is made into a net, (3) an opening is provided in a metal foil such as a copper foil. A conductive layer such as a mesh-like one or (4) a conductive ink printed in a mesh-like shape is used. Especially, since a high light transmittance is acquired by an opening part, the mesh-shaped electroconductive layer of (2)-(4) is used suitably. Electromagnetic waves are shielded by the conductive mesh portion, and light transmission is ensured by the opening.

  Furthermore, conventional display filters have a hard coat layer for imparting scratch resistance, and an antireflection layer for improving the visibility by suppressing reflection of light emitted from an external light source such as a fluorescent lamp. Laminated. Furthermore, a display filter in which a near-infrared shielding layer is provided on one surface of a transparent substrate in order to shield infrared rays has been proposed.

  For example, Patent Document 1 discloses a display filter including a laminate in which a single transparent substrate, a conductive mesh, an outermost antireflection film, and a near-infrared cut film are laminated and integrated. Has been. The electromagnetic wave shielding layer, the hard coat layer, the antireflection layer, and the near-infrared shielding layer are laminated and used according to the use of the display filter.

  In the display filter, since high electromagnetic shielding properties can be obtained, it is preferable that the mesh-like electromagnetic shielding layer on the transparent substrate is disposed on the user side. In order to produce other functional layers such as an antireflection layer and a near-infrared absorbing layer on the mesh-like electromagnetic shielding layer, an uncured synthetic resin and, if necessary, a coating solution containing fine particles are meshed. A method of coating directly on the electromagnetic wave shielding layer and curing by irradiation with actinic rays such as ultraviolet rays or heating is used.

  Specifically, as a method for producing a display filter, for example, as shown in FIG. 3, on a long transparent substrate 310 having a mesh-shaped electromagnetic wave shielding layer (not shown) formed continuously. In addition, a method is generally used in which a coating liquid (not shown) obtained by applying a coating solution containing at least a synthetic resin is irradiated with ultraviolet rays on a roll 382 by an ultraviolet irradiation device 390. ing. Such a method is preferable because of excellent productivity.

International Publication No. 2006/309660 Pamphlet

  However, the conventional method has a problem that a display filter having excellent antireflection properties cannot be obtained.

  Therefore, an object of this invention is to provide the manufacturing method of the display filter which has the outstanding antireflection property, when another functional layer is formed on an electromagnetic wave shield layer.

  In order to obtain a display filter having excellent antireflection properties, it is necessary that another functional layer formed on the mesh-like electromagnetic shielding layer is excellent in surface smoothness. However, since such a functional layer has a very small thickness, it has been difficult to apply the coating liquid in a very uniform thickness. Furthermore, in the conventional method using a long transparent substrate having a mesh-shaped electromagnetic wave shielding layer formed continuously, the transparent substrate having the coating layer is rolled before the coating layer is cured. There is also a problem that the surface smoothness is deteriorated due to deformation of the coating layer due to stress applied in the manufacturing process or dripping of the coating layer.

  As a result of various studies focusing on such a situation, the present inventor did not give a curve to the coating layer to be cured, and preferably irradiated with ultraviolet rays in a horizontal state on the electromagnetic shielding layer. It has been found that a functional layer having excellent surface smoothness can be produced, and a display filter with significantly improved antireflection properties can be obtained.

That is, the present invention was obtained by applying a first functional layer-forming coating solution containing at least an ultraviolet curable resin composition on a transparent substrate having a mesh-like electromagnetic wave shielding layer. A method for producing a filter for a display comprising a step of forming a first functional layer by irradiating an ultraviolet ray onto a coating layer,
For the display, the ultraviolet ray is irradiated in a state where the coating layer is not curved with a curvature radius of 1000 mm or less and the transparent base material forms an angle of −60 to 60 degrees with respect to a horizontal plane. The above problem is solved by a method for manufacturing a filter.

  According to the method of the present invention, it is possible to form a first functional layer having a smoothed surface on a mesh-like electromagnetic shielding layer. Thereby, irregular reflection of light is suppressed and it becomes possible to manufacture a display filter having excellent antireflection properties. Therefore, the display filter has excellent visibility of an image displayed on the display, and is useful as a display filter installed on the entire surface of a display such as a plasma display (PDP), a liquid crystal display, an organic EL display, and a field emission display. is there.

  In the method for producing a display filter according to the present invention, the first functional layer-forming coating solution is applied onto a transparent substrate having a mesh-like electromagnetic wave shielding layer, and the resulting coating layer is subjected to ultraviolet light. The step of forming the first functional layer is carried out by curing by irradiation.

  FIG. 1 is an explanatory view showing a preferred embodiment of a method for producing a display filter according to the present invention. The manufacturing method of the present invention is not limited to the method shown in FIG. First, a first functional layer-forming coating solution is formed on a mesh-like electromagnetic shielding layer while running on a long transparent substrate 110 having a mesh-like electromagnetic shielding layer (not shown) formed on the surface. The step of forming the first functional layer is performed by irradiating the coating layer (not shown) obtained in this manner with ultraviolet rays by an ultraviolet irradiation device 190.

  In the method of the present invention, the coating layer obtained by coating the first functional layer forming coating solution is not given a curvature having a radius of curvature of 1000 mm or less, and the transparent substrate is −60 with respect to the horizontal plane. The first functional layer is formed by irradiating the coating layer with ultraviolet rays at an angle of -60 degrees, preferably -30 to 30 degrees, more preferably -10 to 10 degrees. Thereby, the 1st functional layer excellent in surface smoothness can be formed on a mesh-shaped electromagnetic wave shield layer, and the display filter which has the remarkably improved antireflection property is obtained.

  In the present invention, the angle of the transparent substrate with respect to the horizontal plane is measured using the means described in the examples described later.

  In the present invention, the first functional layer may be any layer as long as it contains an ultraviolet curable resin having some function formed on the electromagnetic shielding layer. Therefore, the first functional layer is formed using a coating liquid containing an ultraviolet curable resin composition.

  Examples of the first functional layer include a near-infrared absorbing layer or a hard coat layer. Especially, it is preferable that a 1st functional layer is a hard-coat layer. According to the method of the present invention, a hard coat layer having excellent surface flatness can be formed on an electromagnetic wave shielding layer, and a display filter having high antireflection properties can be obtained. In the present invention, the hard coat layer means a layer having a hardness of H or higher in a pencil hardness test specified by JIS-K-5400.

  The ultraviolet curable resin composition used in the first functional layer-forming coating solution contains at least an ultraviolet curable resin monomer and / or oligomer and a photopolymerization initiator. The ultraviolet curable resin composition can be cured in a short time, and the first functional layer having excellent surface smoothness can be formed.

  Examples of the UV curable resin monomer and oligomer include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, 2-ethylhexyl polyethoxy (meth) acrylate, Benzyl (meth) acrylate, isobornyl (meth) acrylate, phenyloxyethyl (meth) acrylate, tricyclodecane mono (meth) acrylate, dicyclopentenyloxyethyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, acryloylmorpholine, N-vinylcaprolactam, 2-hydroxy-3-phenyloxypropyl (meth) acrylate, o-phenylphenyloxyethyl (meth) acrylate, neopentylglyco Rudi (meth) acrylate, neopentyl glycol dipropoxy di (meth) acrylate, hydroxypivalic acid neopentyl glycol di (meth) acrylate, tricyclodecane dimethylol di (meth) acrylate, 1,6-hexanediol di (meth) Acrylate, nonanediol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, tris [(meth) acryloxyethyl] isocyanurate, ditrimethylolpropane (Meth) acrylate monomers such as tetra (meth) acrylate; polyol compounds (for example, ethylene glycol, propylene glycol, neopentyl glycol, 1 6-hexanediol, 3-methyl-1,5-pentanediol, 1,9-nonanediol, 2-ethyl-2-butyl-1,3-propanediol, trimethylolpropane, diethylene glycol, dipropylene glycol, polypropylene glycol , 1,4-dimethylolcyclohexane, bisphenol A polyethoxydiol, polytetramethylene glycol and other polyols, succinic acid, maleic acid, itaconic acid, adipic acid, hydrogenated dimer acid, phthalic acid, isophthalic acid Polyester polyols which are reaction products of polybasic acids such as terephthalic acid or their anhydrides, polycaprolactone polyols which are reaction products of the polyols and ε-caprolactone, the polyols and the poly Basic acid or this Of an acid anhydride of ε-caprolactone, polycarbonate polyol, polymer polyol, etc.) and an organic polyisocyanate (eg, tolylene diisocyanate, isophorone diisocyanate, xylylene diisocyanate, diphenylmethane-4,4′-diisocyanate, dicyclohexane) Pentanyl diisocyanate, hexamethylene diisocyanate, 2,4,4′-trimethylhexamethylene diisocyanate, 2,2′-4-trimethylhexamethylene diisocyanate, etc.) and a hydroxyl group-containing (meth) acrylate (for example, 2-hydroxyethyl (meth)) Acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, 2-hydroxy-3-phenyloxypropyl (meth) acrylate , Cyclohexane-1,4-dimethylol mono (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, glycerin di (meth) acrylate, etc.) (Meth) acrylates such as bisphenol type epoxy (meth) acrylate, which is a reaction product of bisphenol type epoxy resin such as polyurethane (meth) acrylate, bisphenol A type epoxy resin, bisphenol F type epoxy resin and (meth) acrylic acid An oligomer etc. can be mentioned. These compounds can be used alone or in combination.

  Of the above ultraviolet curable resins (monomers and oligomers), hard polyfunctional monomers such as pentaerythritol tri (meth) acrylate, pentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate are mainly used. It is preferable.

  As the photopolymerization initiator of the ultraviolet curable resin monomer or oligomer, any compound suitable for the properties of the ultraviolet curable resin can be used. For example, acetophenone such as 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholinopropane-1 Benzoin series such as benzyldimethyl ketal, benzophenone, 4-phenylbenzophenone, benzophenone series such as hydroxybenzophenone, thioxanthone series such as isopropylthioxanthone, 2-4-diethylthioxanthone, and other special ones include methylphenyl glyoxylate Etc. can be used. Particularly preferably, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholinopropane-1, Examples include benzophenone. These photopolymerization initiators may be optionally selected from one or more known photopolymerization accelerators such as benzoic acid type or tertiary amine type such as 4-dimethylaminobenzoic acid. It can be used by mixing at a ratio. Moreover, it can be used by 1 type, or 2 or more types of mixture of only a photoinitiator. In particular, 1-hydroxycyclohexyl phenyl ketone (manufactured by Ciba Specialty Chemicals, Irgacure (registered trademark) 184) is preferable.

  The content of the photopolymerization initiator is generally 0.1 to 10% by mass, preferably 0.1 to 5% by mass, based on the coating liquid.

  The first functional layer forming coating solution may contain an organic solvent. The organic solvent is not particularly limited, but an organic solvent in which the ultraviolet curable resin composition is dispersed or dissolved and can be easily dried is preferable. Specific examples include ketone solvents such as methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone, alcohol solvents, cellosolve solvents, petroleum solvents and the like. These may be used individually by 1 type, and 2 or more types may be mixed and used for them.

  The content of the organic solvent is preferably 300 parts by mass or less, preferably 50 to 200 parts by mass, particularly preferably 100 parts by mass or less, based on a total of 100 parts by mass of monomers, oligomers, photopolymerization initiators and the like of the UV curable resin. Is 50 to 100 parts by mass. With such a content, irregularities that can occur on the surface due to volatilization of the organic solvent during curing of the coating layer can be suppressed, and a first functional layer having excellent surface smoothness is formed. It becomes possible to do.

  The ultraviolet curable resin composition used for the first functional layer-forming coating solution preferably further contains silicone oil. Thereby, it becomes possible to improve the coating property of a coating liquid. Preferred examples of the silicone oil include dimethyl silicone oil, methylphenyl silicone oil, and methylhydrogen silicone oil. These may be used individually by 1 type, and 2 or more types may be mixed and used for them. As the silicone oil, dimethyl silicone oil is particularly preferably used.

  The content of the silicone oil is preferably 0.0005 to 0.1% by mass, more preferably 0.001 to 0.05% by mass with respect to the coating liquid. Thereby, the 1st functional layer excellent in transparency and surface smoothness is obtained.

  When the first functional layer forming coating solution is used as the hard coating layer forming coating solution, the first functional layer forming coating solution is composed of a monomer, an oligomer and a photopolymerization of an ultraviolet curable resin. Although it may contain only an initiator, it may further contain other components such as an ultraviolet absorber, an infrared absorber, an anti-aging agent, a paint processing aid, and a colorant. It is preferable to contain a UV absorber, particularly a benzotriazole UV absorber or a benzophenone UV absorber. Thereby, prevention of yellowing etc. of a filter can be performed efficiently. The content of other components is generally 0.1 to 10% by mass, preferably 0.1 to 5% by mass, based on the coating solution.

  In the step of forming the first functional layer, the above-described first functional layer forming coating solution is applied onto a transparent substrate having a mesh-like electromagnetic wave shielding layer. The coating method is not particularly limited. For example, gravure coater, roll coater (size press, gate roll coater, etc.), bar coater, air knife coater, blade coater, dipping, bar coat, blade coat, knife coat, reverse roll coat , Known methods such as gravure roll coating, squeeze coating, curtain coating, spray coating, and die coating. Of these, a gravure coater is preferable.

  The coating liquid is preferably applied on the transparent substrate while conveying the transparent substrate at a speed of 1 to 20 m / min, more preferably 1 to 10 m / min, and particularly preferably 1 to 5 m / min. It is good. If it is such a coating speed, the vibration and stress which are added to a coating layer in a manufacturing process can be decreased, and the 1st functional layer excellent in surface smoothness can be formed.

  The coating layer obtained by the coating is preferably dried before irradiation with ultraviolet rays to remove the organic solvent. Drying is preferably performed by heating the coating layer at 70 to 130 ° C., particularly 75 to 125 ° C., for 5 seconds to 10 minutes, particularly 1 to 5 minutes. Drying may be performed in multiple steps as long as the heating temperature is within the above range. For example, the coating layer may be dried by heating at 70 to 90 ° C. for 5 seconds to 5 minutes and further at 90 to 130 ° C. for 5 seconds to 5 minutes. The drying may be performed a plurality of times as long as the temperature is within the above range.

  In order to cure the coating layer, the first functional layer having excellent surface smoothness can be formed.

  In the case of ultraviolet curing, many light sources that emit light in the ultraviolet to visible range can be used as the light source. A laser beam etc. can be mentioned. The irradiation time cannot be determined unconditionally depending on the type of lamp and the intensity of the light source, but is about several seconds to several minutes.

  The ultraviolet irradiation is preferably performed in an atmosphere having an oxygen concentration of preferably 1000 ppm or less, more preferably 550 ppm or less. Thereby, while shortening hardening time, a crosslinking density can be improved and the 1st functional layer excellent in surface smoothness can be formed.

  In order to irradiate ultraviolet rays in such an oxygen concentration atmosphere, ultraviolet irradiation may be performed under reduced pressure or in an inert gas atmosphere, and is not particularly limited. Especially, since it can carry out by a simple method, it is preferable to carry out in inert gas atmosphere. Examples of the inert gas include noble gases such as nitrogen, carbon monoxide, carbon dioxide and argon, and mixed gases thereof, and nitrogen gas or nitrogen-containing gas is particularly preferable.

  In the method of the present invention, the step of forming the first functional layer, preferably the hard coat layer, on the mesh-shaped electromagnetic wave shielding layer is performed using a roll-to-roll method. Is preferred. Thereby, a manufacturing process can be simplified and it becomes possible to manufacture the display filter which is easy to manufacture and excellent in productivity.

  The roll-to-roll method is, for example, by the method described above on the transparent substrate while continuously pulling out the transparent substrate from a roll wound with a transparent substrate having a mesh-like electromagnetic wave shielding layer. For example, a first functional layer is formed and wound around a roll again. In such a roll-to-roll system, the coating layer of the first functional layer forming coating solution is not given a curvature with a radius of curvature of 1000 mm or less between the unwinding side roll and the winding side roll. In addition, the transparent substrate is irradiated with ultraviolet rays in a state where the transparent substrate forms an angle of −60 to 60 degrees with respect to a horizontal plane. More preferably, between the unwinding side roll and the winding side roll, the transparent base material having a mesh-like electromagnetic wave shielding layer is not given a curved portion having a curvature radius of 1000 mm or less, and the transparent base material is The first functional layer-forming coating solution is applied onto the transparent substrate at an angle of 60 to 60 degrees, and the resulting coating layer is curved with a curvature radius of 1000 mm or less. And the transparent substrate is irradiated with ultraviolet rays at an angle of −60 to 60 degrees with respect to a horizontal plane. Thereby, the 1st functional layer which has the outstanding surface smoothness can be formed.

  When forming a hard-coat layer as a 1st functional layer, the thickness of a hard-coat layer is 1-50 micrometers normally, Preferably it is 5-40 micrometers, Most preferably, it is 5-35 micrometers.

  In the method of the present invention, as described above, when a hard coat layer is formed as a first functional layer on a transparent substrate having a mesh-like electromagnetic wave shielding layer, an antireflection layer is formed on the hard coat layer. It is preferable to carry out the process. By forming the antireflection layer in this way, the antireflection property can be further improved.

  Examples of the antireflection layer include a low refractive index layer having a low refractive index and / or a high refractive index layer having a high refractive index. As the antireflection layer, (1) only a low refractive index layer having a lower refractive index than the hard coat layer may be formed on the hard coat layer, and (2) a high refractive index layer having a higher refractive index than the hard coat layer, The low refractive index layer having a refractive index lower than that of the high refractive index layer may be laminated in this order.

  In order to form the low refractive index layer, a coating liquid containing fine particles of silica, fluororesin, etc., preferably hollow silica, in addition to a synthetic resin, preferably an ultraviolet curable resin monomer, oligomer, photopolymerization initiator, is used. It is done.

  As the hollow silica, those having an average particle diameter of 10 to 100 nm, preferably 10 to 50 nm, and a specific gravity of 0.5 to 1.0, preferably 0.8 to 0.9 are preferable.

Silica, preferably hollow silica, may be treated with a silane coupling agent. Thereby, stability and antireflection can be improved. Examples of the silane coupling agent include a general formula: R _n SiX _(4-n) (wherein R is an alkoxy group having 1 to 4 carbon atoms, a methacryloylalkyl group, a methacryloyloxy group, an acryloyloxy group, or A perfluoro (meth) acryloyl group, wherein X represents an alkoxy group having 1 to 4 carbon atoms, a silanol group, a halogen atom, or a hydrogen atom, and n represents an integer of 1 to 3, preferably 1. Preferred are those mentioned above.

  In order to treat silica with a silane coupling agent, a conventionally known method such as a method in which a silane coupling agent is added to a dispersion of silica and an acid or alkali is added as a hydrolysis catalyst as necessary. Can be used.

  Content of microparticles | fine-particles, such as a silica and a fluororesin, becomes like this. Preferably it is 10-40 mass% with respect to a coating liquid, More preferably, it is 10-30 mass%.

  The low refractive index layer preferably contains silicone oil. The content of silicone oil in the low refractive index layer is preferably 0.0005 to 0.1 parts by mass, and more preferably 0.001 to 0.05 parts per 100 parts by mass of the synthetic resin contained in the low refractive index layer. Part by mass.

In order to form a high refractive index layer, in addition to a synthetic resin, preferably an ultraviolet curable resin monomer, oligomer, photopolymerization initiator, ITO, ATO, Sb ₂ O ₃ , ZrO ₂ , SbO ₂ , In ₂ O ₃ A coating liquid containing fine metal oxide particles such as SnO ₂ , ZnO, Al-doped ZnO, and TiO ₂ is used.

  The metal oxide fine particles preferably have an average particle diameter of 10 to 10000 nm, preferably 10 to 50 nm. ITO, particularly those having an average particle size of 10 to 50 nm are preferred.

  The high refractive index layer preferably contains silicone oil. The content of silicone oil in the high refractive index layer is preferably 0.0005 to 0.1 parts by mass, more preferably 0.001 to 0.05 parts per 100 parts by mass of the synthetic resin contained in the high refractive index layer. Part by mass.

  The coating liquid used for forming the low refractive index layer and the high refractive index layer may each contain an organic solvent. As the monomer, oligomer, photopolymerization initiator, silicone oil and organic solvent of the ultraviolet curable resin used in the coating liquid, the same ones as described above used in the first functional layer can be used.

  The low refractive index layer and the high refractive index layer can be formed by sequentially applying each coating solution on the hard coat layer and then irradiating with ultraviolet rays. As a coating method and ultraviolet irradiation conditions, it can carry out similarly to the 1st functional layer mentioned above. In this case, it is preferable to coat and harden each layer one by one. Moreover, you may laminate | stack a smoothing sheet on a coating layer before hardening.

  The thickness of the low refractive index layer is usually in the range of 10 to 500 nm, preferably 20 to 200 nm. The refractive index of the low refractive index layer is preferably 1.35 to 1.45. When the refractive index is more than 1.45, the antireflection characteristic of the antireflection film is deteriorated.

  The thickness of the high refractive index layer is usually 10 to 500 nm, preferably 20 to 200 nm. The refractive index of the high refractive index layer is preferably 1.64 or more. By setting the refractive index of the high refractive index layer to 1.64 or more, the minimum reflectance of the surface reflectance of the antireflection layer can be made within 1.5%, and it is 1.69 or more, preferably 1.69 to By setting it to 1.82, the minimum reflectance of the surface reflectance of the antireflection layer can be kept within 1.0%.

  In the method of the present invention, the antireflection layer is preferably formed on the first functional layer, preferably the hard coat layer, using a roll-to-roll method. The manufacturing process can be simplified, and a display filter that is easy to manufacture and excellent in productivity can be manufactured. At this time, the first functional layer forming step and the antireflection layer forming step may be performed separately or continuously. That is, (1) after forming the first functional layer on the transparent base material having the electromagnetic wave shielding layer, the antireflection layer may be continuously formed without winding the transparent base material around the roll, (2) After forming the first functional layer on the transparent base material having the electromagnetic wave shielding layer and winding the transparent base material on a roll, the antireflection layer may be formed by further drawing the transparent base material from the roll. .

  The transparent substrate used in the method of the present invention is not particularly limited as long as it has transparency and flexibility and can withstand subsequent processing. Examples of the material for the transparent substrate include glass, polyester (eg, polyethylene terephthalate, (PET), polybutylene terephthalate), acrylic resin (eg, polymethyl methacrylate (PMMA)), polycarbonate (PC), polystyrene, and cellulose triacetate. , Polyvinyl alcohol, polyvinyl chloride, polyvinylidene chloride, polyethylene, ethylene-vinyl acetate copolymer, polyvinyl butyral, metal ion crosslinked ethylene-methacrylic acid copolymer, polyurethane, cellophane, etc. PET, PC, and PMMA, which are less transparent due to processing (heating, solvent, bending) and are highly transparent, are preferable. Among these, PET is preferable because it is inexpensive and has excellent durability. A transparent base material is used as a sheet | seat, a film, or a board which consists of these materials.

  The thickness of the transparent substrate is not particularly limited, but is preferably about 6 to 250 μm, particularly about 6 to 150 μm.

  In the method of the present invention, (1) a hard coat layer and an antireflection layer may be formed on a single transparent substrate having a mesh-like metal conductive layer, and (2) continuously formed. The hard coat layer and the antireflection layer may be formed on the long transparent film having the meshed metal conductive layer without cutting the transparent film. Of these, the means (2) is preferably used, and the means (2) is particularly preferably performed using a roll-to-roll method.

  Moreover, the mesh-shaped electromagnetic wave shielding layer formed on a transparent base material contains a metal and has electroconductivity. For example, (1) what consists of metals, such as copper, (2) what disperse | distributed electroconductive particle in binder resin can be mentioned.

  (1) In the electromagnetic wave shielding layer made of a metal such as copper, copper, stainless steel, aluminum, nickel, iron, brass, or an alloy thereof, preferably copper, stainless steel, or aluminum is used as the metal.

  In order to produce the electromagnetic wave shielding layer of (1), first, a vapor deposition method such as sputtering, ion plating, electron beam vapor deposition, vacuum vapor deposition or chemical vapor deposition, or a method such as printing or coating is used. What is necessary is just to perform using well-known methods, such as the method of forming the metal foil which consists of the said metal on a transparent base material, and then making the mesh shape by etching the said metal foil and providing an opening part.

  In order to produce the electromagnetic shielding layer of (1), in addition to the above method, dots are formed on a transparent substrate with a material soluble in a solvent, and the film surface is insoluble in a solvent. A method in which a conductive material layer made of a conductive material is formed and the film surface is brought into contact with a solvent to remove the dots and the conductive material layer on the dots may be used. Such a method is described in, for example, Japanese Patent Application Laid-Open No. 2001-332889.

  (2) In the electromagnetic wave shielding layer in which conductive particles are dispersed in a binder resin, examples of the conductive particles include aluminum, nickel, indium, chromium, gold, vanadium, tin, cadmium, silver, platinum, copper, Metals such as titanium, cobalt, lead, alloys; or ITO, indium oxide, tin oxide, zinc oxide, indium oxide-tin oxide (ITO, so-called indium-doped tin oxide), tin oxide-antimony oxide (ATO, so-called antimony-doped oxide) Tin), and conductive oxides such as zinc oxide-aluminum oxide (ZAO; so-called aluminum-doped zinc oxide). In particular, ITO is preferable.

  Examples of the binder resin include acrylic resin, polyester resin, epoxy resin, urethane resin, phenol resin, maleic acid resin, melamine resin, urea resin, polyimide resin, and silicon-containing resin. Furthermore, it is preferable that it is a thermosetting resin among these resins.

  In order to produce the electromagnetic wave shielding layer of (2), a method of printing a conductive ink in which conductive particles are dispersed in a binder resin in a mesh shape on a transparent substrate can be used. In addition to the conductive particles and the binder resin, the conductive ink may further contain a solvent in order to adjust to an appropriate viscosity. Examples of the solvent include alcohols such as hexanol, octanol, nonanol, decanol, undecanol, dodecanol, tridecanol, tetradecanol, pentadecanol, stearyl alcohol, seryl alcohol, cyclohexanol, terpineol; ethylene glycol monobutyl ether (butyl cellosolve), ethylene Examples thereof include alkyl ethers such as glycol monophenyl ether, diethylene glycol, diethylene glycol monobutyl ether (butyl carbitol), cellosolve acetate, butyl cellosolve acetate, carbitol acetate, and butyl carbitol acetate.

  In order to print the conductive ink in a mesh on the transparent substrate, a known method such as gravure printing, flexographic printing, gravure offset printing, screen printing, ink jet printing, or electrostatic printing may be used. Then, it is made to dry and harden at room temperature-120 degreeC as needed.

  As the electromagnetic wave shielding layer, it is preferable to use the electromagnetic wave shielding layer of (1) among the above-described ones because it is excellent in antiglare property and electrical conductivity.

  The shape of the opening surrounded by the line of the electromagnetic wave shielding layer can be any shape such as a circle, an ellipse, and a square (quadrangle, hexagon), but is generally a square, and particularly preferably a square. . The lines are net-like, but are preferably grid-like.

  The shape of the mesh pattern in the electromagnetic wave shielding layer is not particularly limited, and examples thereof include a lattice shape in which square openings are formed, and a punching metal shape in which circular, hexagonal, triangular or elliptical openings are formed. It is done. Further, the openings are not limited to those regularly arranged, and may be a random pattern.

  The line width of the mesh-like (including lattice-like) electromagnetic wave shielding layer is generally 50 μm or less, preferably 5 to 45 μm, particularly 5 to 30 μm. The line pitch is preferably 200 μm or less. Moreover, it is preferable that an aperture ratio is 50 to 95%, and it is especially 55 to 80%. The aperture ratio is obtained by calculation from the line width of the mesh and the number of lines existing in 1 inch width.

  In order to improve the electromagnetic shielding effect by setting the electromagnetic shielding layer to a lower resistance value, it is preferable to form a metal plating layer on the electromagnetic shielding layer.

  The metal plating layer can be formed by a known electrolytic plating method or electroless plating method. Generally, copper, copper alloy, nickel, silver, gold, zinc or tin can be used as the metal used for plating. These can be used alone or as two or more kinds of alloys. You may do it. Especially, it is preferable to use the layer which consists of an alloy of nickel and zinc or an alloy of nickel and tin for a metal plating layer. Thereby, the black alloy electroconductive layer excellent in black degree and electroconductivity is obtained, and while anti-glare property can be improved, anti-glare property can be provided.

  The mass ratio (Ni / Zn) of nickel to zinc or tin in the black alloy conductive layer made of an alloy of nickel and zinc or tin is 0.4 to 1.4, particularly 0.2 to 1.2. Is preferred. Thereby, a black alloy conductive layer having a uniform black color tone can be obtained, and an electromagnetic wave shielding layer having high antiglare property can be obtained even if the thickness is thin.

  The thickness of the black alloy conductive layer is preferably 0.001 to 1 μm, particularly preferably 0.01 to 0.1 μm. If the thickness of the black alloy conductive layer is less than 0.001 μm, sufficient antiglare property may not be imparted to a sufficient electromagnetic shielding layer. If the thickness exceeds 1 μm, the thickness of the electromagnetic shielding layer increases, and the display filter This is not desirable from the viewpoint of surface planarization.

  Moreover, you may provide anti-glare performance to an electromagnetic wave shield layer. This antiglare treatment may be performed by performing a blackening treatment on the surface of the electromagnetic wave shielding layer and providing a blackening layer. For example, it can be performed by oxidation treatment of a metal film, black plating of a chromium alloy or the like, application of black or dark ink, or the like.

  In the method of the present invention, as described above, after forming the first functional layer on the transparent base material having the mesh-like electromagnetic wave shielding layer, the side opposite to the surface on which the electromagnetic shielding layer of the transparent base material is formed. It is preferable to further perform a step of forming a second functional layer on the surface.

  The second functional layer may be any layer as long as it is formed on the surface of the transparent substrate opposite to the surface on which the electromagnetic wave shielding layer is formed and includes a synthetic resin exhibiting some function. The second functional layer is generally a near-infrared absorbing layer, a transparent adhesive layer, or a combination thereof. Specifically as a 2nd functional layer, it consists of (1) what consists only of a near-infrared absorption layer, (2) what consists of a transparent adhesive layer, or (3) consists of a near-infrared absorption layer and a transparent adhesive layer. It is preferable to consist of things (provided on the transparent substrate in this order).

  The near-infrared absorbing layer (that is, the near-infrared shielding layer) used as the second functional layer is generally obtained by forming a layer containing a pigment or the like on the surface of the transparent substrate. The near-infrared absorbing layer can be obtained, for example, by applying a coating solution containing an ultraviolet curable or electron beam curable synthetic resin as a pigment and a binder, and if necessary, drying and curing. As the coating method, the same method as the coating method of the first functional layer forming coating solution described above is used. When used as a film, it is generally a near-infrared cut film, such as a film containing a pigment or the like.

  The dye generally has an absorption maximum at a wavelength of 800 to 1200 nm. Examples include phthalocyanine dyes, metal complex dyes, nickel dithiolene complex dyes, cyanine dyes, squarylium dyes, polymethine dyes, Examples thereof include azomethine dyes, azo dyes, polyazo dyes, diimonium dyes, aminium dyes, and anthraquinone dyes, and cyanine dyes and squarylium dyes are particularly preferable. These dyes can be used alone or in combination.

  As an example of the synthetic resin as the binder, acrylic resin, fluororesin, polyester resin, vinyl chloride resin, styrene resin, norbornene resin and the like are preferably used. These may be used individually by 1 type and may be used in mixture of 2 or more types.

  In the present invention, the near-infrared absorbing layer may be provided with a function of adjusting color tone by providing a function of absorbing neon light emission. Therefore, a neon-emitting selective absorption dye may be included in the near-infrared absorbing layer forming coating solution.

  Neon luminescent selective absorption dyes include cyanine dyes, squarylium dyes, anthraquinone dyes, phthalocyanine dyes, polymethine dyes, polyazo dyes, azurenium dyes, diphenylmethane dyes, and triphenylmethane dyes. it can. Such a selective absorption dye is required to have a selective absorption of neon emission near 585 nm and a small absorption at other visible light wavelengths, so that the absorption maximum wavelength is 575 to 595 nm and the absorption spectrum half width is What is 40 nm or less is preferable.

  Also, when combining multiple types of near-infrared or neon luminescent absorbing dyes, if there is a problem with the solubility of the dye, if there is a reaction between the dyes due to mixing, if there is a decline in heat resistance, moisture resistance, etc. All the near-infrared absorbing dyes need not be contained in the same layer, and may be contained in another layer.

  In addition, as long as optical properties are not greatly affected, coloring pigments, ultraviolet absorbers, antioxidants and the like may be further added to the near-infrared absorbing layer forming coating solution.

  As a near-infrared absorption characteristic of the display filter of the present invention, it is preferable that the transmittance at 850 to 1000 nm is 20% or less, and further 15%. Moreover, as selective absorptivity, it is preferable that the transmittance | permeability of 585 nm is 50% or less. Especially in the former case, there is an effect of reducing the transmittance in a wavelength region where malfunction of a remote controller of a peripheral device is pointed out. In the latter case, an orange color having a peak at 575 to 595 nm is color reproducibility. This has the effect of absorbing the orange wavelength, thereby improving the redness and improving the color reproducibility.

  The thickness of the near-infrared absorbing layer is not particularly limited, but is preferably about 0.5 to 50 μm in terms of near-infrared absorption and visible light transmission.

  It is preferable that the near-infrared absorbing layer contains a color correction pigment. Alternatively, a color tone correction layer containing a color tone correction pigment may be provided in the same manner as the near infrared absorption layer.

  As the color correction pigment, in order to neutralize the yellowish brown to green color tone of the near-infrared shielding layer and adjust the color balance, those which are complementary colors thereof are preferable. Examples of such pigments include general pigments such as inorganic pigments, organic pigments, organic dyes, and pigments. Examples of inorganic pigments include cobalt compounds, iron compounds, chromium compounds, and examples of organic pigments include azo-based, indolinone-based, quinacridone-based, vat-based, phthalocyanine-based, naphthalocyanine-based, Examples of the organic dyes and pigments include azo, azine, anthraquinone, indigoid, oxazine, quinophthalone, squalium, stilbene, triphenylmethane, naphthoquinone, pyrarozone, and polymethine. Of these, organic pigments are preferably used in view of the balance between color developability and durability.

  The transparent adhesive layer is a layer for adhering the display filter of the present invention to the display, and any resin can be used as long as it has an adhesive function.

  Examples of the resin having an adhesive function in the transparent adhesive layer include ethylene-vinyl acetate copolymer (EVA), ethylene-methyl acrylate copolymer, acrylic resin (eg, ethylene- (meth) acrylic acid copolymer). , Ethylene- (meth) acrylic acid ethyl copolymer, ethylene- (meth) methyl acrylate copolymer, metal ion crosslinked ethylene- (meth) acrylic acid copolymer), partially saponified ethylene-vinyl acetate copolymer, Examples include ethylene-based copolymers such as carboxylated ethylene-vinyl acetate copolymer, ethylene- (meth) acryl-maleic anhydride copolymer, ethylene-vinyl acetate- (meth) acrylate copolymer (note that And “(meth) acryl” means “acryl or methacryl”.) In addition, polyvinyl butyral (PVB) resin, epoxy resin, phenol resin, silicone resin, polyester resin, urethane resin, rubber adhesive, SEBS (styrene / ethylene / butylene / styrene), SBS (styrene / butadiene / styrene), etc. Thermoplastic elastomers and the like can also be used, but it is acrylic resin-based pressure-sensitive adhesives and epoxy resins that can easily obtain good adhesiveness. When EVA or the like is used, the transparent pressure-sensitive adhesive layer may further contain a crosslinking agent.

  The thickness of the transparent adhesive layer is generally 10 to 50 μm, preferably 20 to 30 μm. In general, the display filter can be equipped by heat-pressing the pressure-sensitive adhesive layer to a glass plate of the display.

  The organic peroxide is usually kneaded with EVA using an extruder, a roll mill or the like, but may be dissolved in an organic solvent, a plasticizer, a vinyl monomer or the like and added to the EVA film by an impregnation method. For example, EVA and the above-mentioned additive are mixed and kneaded with an extruder, a roll, etc., and then the transparent adhesive layer is formed into a predetermined shape by a film forming method such as calendar, roll, T-die extrusion, inflation, etc. It is manufactured by.

  It is preferable that a release sheet is further provided on the transparent adhesive layer. As a material for the release sheet, a transparent polymer having a glass transition temperature of 50 ° C. or higher is preferable. Examples of such a material include polyester resins such as polyethylene terephthalate, polycyclohexylene terephthalate, and polyethylene naphthalate, nylon 46, and modified nylon. In addition to polyamide resins such as 6T, nylon MXD6, polyphthalamide, ketone resins such as polyphenylene sulfide and polythioether sulfone, and sulfone resins such as polysulfone and polyether sulfone, polyether nitrile, polyarylate, poly Resins based on polymers such as ether imide, polyamide imide, polycarbonate, polymethyl methacrylate, triacetyl cellulose, polystyrene and polyvinyl chloride can be used. . Of these, polycarbonate, polymethyl methacrylate, polyvinyl chloride, polystyrene, and polyethylene terephthalate can be suitably used. The thickness is preferably 10 to 200 μm, particularly preferably 30 to 100 μm.

  A first functional layer including the above-described hard coat layer, which is a preferred embodiment of the present invention, an antireflection layer comprising a low refractive index layer and a high refractive index layer, a near infrared absorbing layer and a transparent adhesive layer A schematic cross-sectional view of a display filter having a second functional layer is shown in FIG. The display filter shown in FIG. 2 includes a transparent substrate 210, a mesh-shaped electromagnetic wave shield layer 220 formed on the transparent substrate 210, a hard coat layer 230 formed on the electromagnetic wave shield layer 220, It has a high refractive index layer 240 formed on the coat layer 230 and a low refractive index layer 250 formed on the high refractive index layer 240. Further, the display filter includes a near-infrared absorbing layer 260 and a transparent adhesive layer 270 on the surface of the transparent substrate 210 opposite to the surface on which the electromagnetic wave shielding layer 220 is formed.

  According to the method of the present invention described above, a first functional layer having high surface smoothness, preferably a hard coat layer can be formed. Therefore, the antireflection layer formed on such a hard coat layer has a surface roughness Ra of 0.1 μm or less, preferably 0.01 to 0.1 μm, more preferably 0.01 to 0.08 μm. A display filter having surface smoothness, thereby suppressing irregular reflection of light and excellent antireflection properties can be obtained.

  In the present invention, the surface roughness Ra of the antireflection layer can be measured using a surface roughness meter (Surfcom 480A manufactured by Tokyo Seimitsu Co., Ltd.) according to JIS B 0601 (1994).

  The display filter produced by the method of the present invention is not particularly limited, but can be applied to a display using means such as bonding to the surface of the image display glass plate of the display via a transparent adhesive layer. Such displays include field emission displays (FED) including surface field display (SED), liquid crystal displays (LCD), plasma display panels (PDP), flat panel displays (FPD) such as EL displays, and CRTs. A display etc. are mentioned.

  EXAMPLES Hereinafter, although an Example is shown and this invention is demonstrated concretely, this invention is not limited to a following example.

Example 1
1. Formation of Mesh-shaped Electromagnetic Shielding Layer A 20% aqueous solution of polyvinyl alcohol was printed in a dot shape on a polyethylene terephthalate (PET) film (thickness: 100 μm). The size of one dot is a square shape with one side of 234 μm, the interval between the dots is 20 μm, and the dot arrangement is a square lattice. The printing thickness is 5 μm after drying.

  On top of that, copper was vacuum-deposited so as to have an average film thickness of 4 μm. Next, it was immersed in room temperature water and rubbed with a sponge to dissolve and remove the dot portion, then rinsed with water and dried to form a mesh-like electromagnetic wave shielding layer on the entire surface of the polyethylene film.

  The electromagnetic wave shielding layer on the surface of the film has a square lattice shape accurately corresponding to the negative pattern of dots, the average thickness is 4 μm, the average line width is 20 μm, the average pitch is 254 μm, and the aperture ratio is 77%. It was.

2. Formation of Black Alloy Conductive Layer A black alloy conductive layer (thickness 0.2 μm) covering the entire surface of the electromagnetic shield layer by performing zinc-nickel alloy plating on the electromagnetic shield layer formed on the PET film under the following conditions. ) Was formed.

(Plating conditions)
Plating solution temperature: 40 ° C
Current density: 5 to 10 A / dm ²
Plating time: 10 seconds Plating solution amount: 120 m ³
(Plating solution composition)
ZnCl ₂ with Zn ²⁺ concentration of 2.0 g / l, NiCl ₂ .6H ₂ O with Ni ²⁺ concentration of 0.5 g / l, KCl with K ⁺ concentration of 250 g / l, pH 10 plating solution Was used.

3. Preparation of hard coat layer coating material As a resin component, 5 parts by mass of a polymerization initiator (Irgacure (registered trademark) 184 (manufactured by Ciba Specialty Chemicals)) is added to 100 parts by mass of pentaerythritol triacrylate. Obtained. On the other hand, solvent A was obtained by mixing 2-propanol and cyclohexanone at a mass ratio of 7: 3. Solid content A and solvent A are mixed at a mass ratio of 2: 8, 0.02% by mass of silicone oil (KF96-200CS Shin-Etsu Silicone) is added, and the mixture is stirred at room temperature for 1 hour, thereby coating the hard coat layer. Was prepared.

4). Preparation of coating material for high refractive index layer Composite colloidal sol of titanium dioxide and zirconium dioxide (average particle size 13.1 μm, solid content concentration 30% by mass, methanol solvent, mass ratio of titanium dioxide and zirconium dioxide = 85: 15) 200 parts by mass In contrast, 50 parts by mass of trimethylolpropane acrylate (EO 3 mol addition) as a resin component, 7 parts by mass of a polymerization initiator (Irgacure (registered trademark) 1800 (manufactured by Ciba Specialty Chemicals)), 50 parts by mass of isopropyl alcohol as a solvent, Furthermore, 0.01 parts by mass of silicone oil (KF96-50CS Shin-Etsu Silicone) was added, stirred for 1 hour at room temperature, and then filtered through a polypropylene filter having a pore size of 1 μm to prepare a coating material for a high refractive index layer.

5. Preparation of coating material for low refractive index layer 3-Methacryloxypropyltrimethoxysilane (KBM-503) as a silane coupling agent with respect to 100 parts by mass of methanol dispersion of silica fine particles (average particle size 15 nm, solid content concentration 50% by mass). 3 parts by weight of Shin-Etsu Silicon) and 1 part by weight of 1N hydrochloric acid as a catalyst were added, stirred for 12 hours at room temperature, and then allowed to stand at room temperature for 50 hours to prepare a silica fine particle dispersion treated with silane coupling.

  With respect to 5 parts by mass of this silica fine particle dispersion, 25 parts by mass of pentaerythritol triacrylate as a resin component, 94 parts by mass of methyl isobutyl ketone and 5 parts by mass of isobutyl alcohol as a solvent, a polymerization initiator (Irgacure (registered trademark) 907 (Ciba Specialty) Chemical company)) 2 parts by mass, and further 0.001 part by mass of silicone oil (KF96-50CS Shin-Etsu Silicone), stirred for 1 hour at room temperature, and then filtered through a polypropylene filter with a pore size of 1 μm. A layer coating was prepared.

6). Production of filter for display For production of the filter, a micro gravure coater with a UV irradiation device (manufactured by Yasui Seiki Co., Ltd.) using a roll-to-roll method was used.

A coating for a hard coat layer is applied onto the electromagnetic shielding layer of the transparent substrate prepared above, passed through a drying furnace, and the resulting coating layer (25 ° C., viscosity 6500 cP) has no curved portion and PET. In the state where the angle with respect to the horizontal plane of the film is 0 degree, the hard coat layer was prepared by irradiating the coating layer with ultraviolet rays having an integrated light amount of 600 mJ / cm ² from the vertical direction. At this time, the rotation speed of the gravure roll was 50 rpm, and the line speed was 4 m / min. There were two drying furnaces, the drying furnace arranged on the unwinding side was set at a temperature of 80 ° C., and the drying furnace arranged on the winding side was set at a temperature of 100 ° C. Moreover, nitrogen purge was performed so that ultraviolet irradiation might be performed in the atmosphere whose oxygen concentration is 500 ppm or less.

Next, a high refractive index paint was applied on the hard coat layer, dried at 80 ° C. for 10 seconds, and then irradiated with ultraviolet rays having an integrated light amount of 600 mJ / cm ² to form a high refractive index layer. The optical reflection spectrum measurement in the state where the hard coat layer and the high refractive index layer were formed was performed in the range of 350 to 800 nm, and the film thickness was adjusted so that the minimum value of the reflectance was in the range of 400 to 450 nm.

Further, a low refractive index layer coating material was applied on the high refractive index layer, dried at 80 ° C. for 10 seconds, and then irradiated with ultraviolet rays having an integrated light amount of 600 mJ / cm ² to form a low refractive index layer. Optical spectrum measurement is performed in the range of 350 to 800 nm with the hard coat layer, the high refractive index layer, and the low refractive index layer formed. The thickness was adjusted so that the minimum reflectance was in the range of 550 to 600 nm.

  In the formation of the high refractive index layer and the low refractive index layer, the rotation speed of the gravure roll was 20 to 80 rpm, and the line speed was 4 m / min. There were two drying furnaces, the drying furnace arranged on the unwinding side was set to a temperature of 50 ° C., and the drying furnace arranged on the winding side was set to a temperature of 50 ° C. Further, the nitrogen irradiation was performed so that the ultraviolet irradiation was performed in an atmosphere having an oxygen concentration of 200 ppm or less.

(Example 2)
A display filter was produced in the same manner as in Example 1 except that the electromagnetic shielding layer had an average line width of 28 μm, an average pitch of 150 μm, an aperture ratio of 66%, and a black alloy conductive layer thickness of 0.1 μm. did.

(Example 3)
In the same manner as in Example 1, except that the coating layer of the hard coat layer coating layer has no curved portion and the PET film is irradiated with ultraviolet rays at an angle of 15 degrees with respect to the horizontal plane. A display filter was prepared.

Example 4
A display filter was produced in the same manner as in Example 2 except that the coating layer of the paint for hard coat layer was irradiated with ultraviolet rays in the state where there was no curved portion and the angle of the PET film with respect to the horizontal plane was 15 degrees. did.

(Comparative Example 1)
When the coating layer of the hard coat layer coating is irradiated with ultraviolet rays, the PET film on which the coating layer is formed is on a roll having a diameter of 500 mm, and the angle of the PET film with respect to the horizontal plane is 120 degrees. A display filter was produced in the same manner as in Example 1 except that the coating layer was changed so that ultraviolet rays could be irradiated from the vertical direction.

(Comparative Example 2)
When the coating layer of the hard coat layer coating is irradiated with ultraviolet rays, the PET film on which the coating layer is formed is on a roll having a diameter of 500 mm, and the angle of the PET film with respect to the horizontal plane is 120 degrees. A display filter was produced in the same manner as in Example 2 except that the coating layer was changed so that ultraviolet rays could be irradiated from the vertical direction.

(Evaluation)
1. Angle of the PET film with respect to the horizontal plane After measuring the horizontal plane (horizontal line) with a digital leveler (ED-35DGLN, manufactured by Ebisu Co., Ltd.) and drying the coating layer obtained by applying the hard coat layer paint, ultraviolet rays It measured by measuring the inclination angle with respect to the said horizontal surface of the surface in which the said coating layer of the PET film at the time of irradiation was formed with a protractor. The results are shown in Table 1.

2. Hard Coat Layer Thickness Using a thin film measuring instrument F20 (manufactured by Filmetrics Co., Ltd.), the thickness of the hard coat layer where the mesh on the PET film was not formed was measured. The results are shown in Table 1.

3. Surface roughness Ra of low refractive index layer
The surface roughness Ra of the low refractive index layer in the display filter is measured using a surface roughness meter (Surfcom 480A, manufactured by Tokyo Seimitsu Co., Ltd.) according to JIS B 0601 (1994), a measurement length of 1 mm, Measurements were made at a cut-off value of 0.25 mm. The results are shown in Table 1.

4). Reflectance (minimum reflectance, luminous reflectance)
A black vinyl tape is attached to the back surface of the display filter (the back surface of the electromagnetic wave shield layer forming surface) using a hand roller, and a spectrophotometer (U-4000 manufactured by Hitachi High-Technologies Corporation) is used to obtain a 5 ° regular reflectance. By measuring, the reflectance (minimum reflectance, luminous reflectance) of the transparent base material with a low reflection film was measured. The lowest reflectance within the wavelength range of 400 nm to 700 nm is defined as the minimum reflectance, and the average reflectance within the wavelength range of 400 to 700 nm is defined as the luminous reflectance. The results are shown in Table 1.

5. Pencil Hardness of Hard Coat Layer The hard coat layer produced was measured based on JIS-K-5400. The results are shown in Table 1.

  Since the method of the present invention is excellent in the visibility of the image displayed on the display, a method for producing a display filter installed on the entire surface of a display such as a plasma display (PDP), a liquid crystal display, an organic EL display, a field emission display, etc. Useful as.

It is explanatory drawing explaining a part of manufacturing method of the filter for displays of this invention. Sectional drawing of the filter for displays of this invention is shown. It is explanatory drawing explaining a part of manufacturing method of the conventional display filter.

Explanation of symbols

110, 210, 310 transparent substrate,
220 mesh electromagnetic wave shielding layer,
230 hard coat layer,
240 high refractive index layer,
250 low refractive index layer,
260 Near-infrared absorbing layer,
270 transparent adhesive layer,
181, 381 support roll,
182, 382 rolls,
190, 390 UV irradiation device,
Arrow a traveling direction.

Claims (8)

On a transparent substrate having a mesh-shaped electromagnetic wave shielding layer, a first functional layer-forming coating solution containing at least an ultraviolet curable resin composition is applied, and ultraviolet rays are applied to the resulting coating layer. A method for producing a display filter comprising a step of forming a first functional layer by irradiation,
For the display, the ultraviolet ray is irradiated in a state where the coating layer is not curved with a curvature radius of 1000 mm or less and the transparent base material forms an angle of −60 to 60 degrees with respect to a horizontal plane. A method for manufacturing a filter.   The method for producing a display filter according to claim 1, wherein the first functional layer is a hard coat layer.   3. The display according to claim 1, wherein the coating liquid contains at least one silicone oil selected from the group consisting of dimethyl silicone oil, methylphenyl silicone oil, and methyl hydrogen silicone oil. Method for manufacturing a filter for an automobile.   The manufacturing method of the filter for a display of any one of Claims 1-3 which perform the said hardening after drying the said coating layer by heating at 70-130 degreeC for 5 second-10 minutes.   The method for producing a display filter according to any one of claims 1 to 4, wherein the ultraviolet irradiation is performed in an atmosphere having an oxygen concentration of 1000 ppm or less.   The method for producing a display filter according to claim 1, wherein the step of forming the first functional layer is performed using a roll-to-roll method.   The display filter according to claim 2, further comprising a step of forming a low refractive index layer having a refractive index lower than that of the hard coat layer on the hard coat layer. Production method.   The method further comprises forming a high refractive index layer having a higher refractive index than the hard coat layer and a low refractive index layer having a lower refractive index than the high refractive index layer on the hard coat layer. The manufacturing method of the filter for displays of any one of Claims 2-6 to do.

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