JP2009137286A - 基板の均一な構造化のためのシステム - Google Patents
基板の均一な構造化のためのシステム Download PDFInfo
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- JP2009137286A JP2009137286A JP2008286980A JP2008286980A JP2009137286A JP 2009137286 A JP2009137286 A JP 2009137286A JP 2008286980 A JP2008286980 A JP 2008286980A JP 2008286980 A JP2008286980 A JP 2008286980A JP 2009137286 A JP2009137286 A JP 2009137286A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
- B29C2059/023—Microembossing
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
- Y10T156/1052—Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
- Y10T156/1062—Prior to assembly
- Y10T156/107—Punching and bonding pressure application by punch
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49815—Disassembling
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49826—Assembling or joining
- Y10T29/49895—Associating parts by use of aligning means [e.g., use of a drift pin or a "fixture"]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/53—Means to assemble or disassemble
- Y10T29/5313—Means to assemble electrical device
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/53—Means to assemble or disassemble
- Y10T29/5313—Means to assemble electrical device
- Y10T29/5317—Laminated device
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/53—Means to assemble or disassemble
- Y10T29/5313—Means to assemble electrical device
- Y10T29/53265—Means to assemble electrical device with work-holder for assembly
Abstract
【解決手段】ナノ構造を、押型1から大面積の基板4の平坦面に転写するためのシステムであって、基板4を基板受容表面上で受け取る基板ホルダ3と、基板受容表面に対して平行に、かつ押型1のこの可動の構造表面に対向して方向付けることができ、基板受容表面に対して直交して働くアクチュエータデバイス10.3とを有する。
【選択図】図1a
Description
Claims (16)
- 押型(1)の構造を大面積の基板(4)の平坦面(4s)に転写するためのシステムにおいて、
前記基板(4)を基板受容表面(3a)上で受け取る基板ホルダ(3)と、
前記基板受容表面(3a)に対して平行に方向付けられ、かつ対向して位置することができる、前記押型(1)の構造表面(1s)と、
前記基板受容表面(3a)に対して直交して働くアクチュエータデバイス(10)と、
を有するシステムであって、
前記アクチュエータデバイス(1)が、前記構造(16)の転写を確実にする、かつ前記基板受容表面(3a)に対して直交することになる力Faを前記押型(1)または基板(4)に加えるために、少なくとも2つの別々に制御可能な、かつ/または調節可能なアクチュエータ(10.1、10.2、…10.n)を有することを特徴とするシステム。 - それぞれの場合において、別々に制御可能な、かつ/または調節される引張力および/または圧縮力(F1、F2、…Fn)を、前記アクチュエータ(10.1、10.2、…10.n)上で調整することができる、請求項1に記載のシステム。
- 制御ライン(14)を介して前記アクチュエータ(10.1、10.2、…10.n)に接続される中央制御デバイス(15)によって前記アクチュエータ(10.1、10.2、…10.n)を制御することができる、請求項1または2に記載のシステム。
- 前記アクチュエータデバイス(10)が、3つの別々に制御可能な、かつ/または調整可能なアクチュエータ(10.1、10.2、…10.n)を有する、請求項1から3のいずれか一項に記載のシステム。
- 前記アクチュエータデバイス(10)が、前記引張力および/または圧縮力(F1、F2、…Fn)を前記押型(1)に伝達する、特に前記押型(1)を中央位置で受け取る押型ホルダ(2)を有する、請求項1から4のいずれか一項に記載のシステム。
- 前記アクチュエータ(10.1、10.2、…10.n)が、特に120°の中間角度αで、前記押型ホルダ(2)の周縁上で均一に分配されて配置される、請求項1から5のいずれか一項に記載のシステム。
- 前記アクチュエータデバイス(10)が、前記引張力および/または圧縮力(F1、F2、…Fn)を前記基板ホルダ(3)に伝達する、請求項1から4のいずれか一項に記載のシステム。
- 前記アクチュエータ(10.1、10.2、…10.n)が、特に120°の中間角度αで、前記押型ホルダ(2)の周縁上で均一に分配されて配置される、請求項7に記載のシステム。
- 前記アクチュエータ(10.1、10.2、…10.n)が、前記構造表面(1s)の外側に逃げる、請求項1から8のいずれか一項に記載のシステム。
- 前記押型(1)と平行に前記基板(4)を並進させ回転方向付けるために、調整デバイス(6)が設けられる、請求項1から9のいずれか一項に記載のシステム。
- 前記調整デバイス(6)、前記基板ホルダ(3)、前記押型(1)が、下部ベースプレート(9)と、前記下部ベースプレート(9)に対して平行に方向付けられる押型ベースプレート(12)との間に配置される、請求項1から10のいずれか一項に記載のシステム。
- 前記下部ベースプレート(9)が、特に前記ベースプレート(9)および前記押型ベースプレート(12)の縁部に取り付けられる接続用支持体(7)を介して前記押型ベースプレート(12)にしっかり接続される、請求項1から11のいずれか一項に記載のシステム。
- 前記アクチュエータ(10.1、10.2、…10.n)が、前記押型ベースプレート(12)を貫通し、前記押型ベースプレート(12)に対して直交して前記押型ベースプレート(12)内に案内されて入る、請求項1から6および9から12のいずれか一項に記載のシステム。
- 前記引張力および/または圧縮力(F1、F2、…Fn)を測定するために、前記押型(1)または基板(4)と、前記アクチュエータ(10.1、10.2、…10.n)のそれぞれとの間に、特に圧電型の力測定セル(10k)が設けられる、請求項1から13のいずれか一項に記載のシステム。
- 前記力測定セル(10k)が、前記制御ライン(14)を介して前記中央制御デバイス(15)に接続され、前記中央制御デバイス(15)が、それぞれの場合において前記アクチュエータ(10.1、10.2、…10.n)に関連付けられる対応する力測定セル(10k)の測定値を用いて前記アクチュエータ(10.1、10.2、…10.n)を制御および/または調節するように設計される、請求項3および14に記載のシステム。
- 結果として生じる力Faが、前記アクチュエータデバイス(10)の制御によって、前記基板(4)と押型(1)の間の接触表面の面積の中心において作用する、請求項1から15のいずれか一項に記載のシステム。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP07021676A EP2058107B1 (de) | 2007-11-08 | 2007-11-08 | Vorrichtung zum gleichmäßigen Strukturieren von Substraten |
EP07021676.7 | 2007-11-08 |
Publications (3)
Publication Number | Publication Date |
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JP2009137286A true JP2009137286A (ja) | 2009-06-25 |
JP2009137286A5 JP2009137286A5 (ja) | 2013-10-17 |
JP5590785B2 JP5590785B2 (ja) | 2014-09-17 |
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JP2008286980A Active JP5590785B2 (ja) | 2007-11-08 | 2008-11-07 | 基板の均一な構造化のためのシステム |
Country Status (3)
Country | Link |
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US (1) | US8763239B2 (ja) |
EP (2) | EP2450175B1 (ja) |
JP (1) | JP5590785B2 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014057589A1 (ja) * | 2012-10-12 | 2014-04-17 | アイトリックス株式会社 | 多軸プレス装置及びそれを利用したインプリント装置 |
JP2014167980A (ja) * | 2013-02-28 | 2014-09-11 | Osaka Prefecture Univ | パターン形成装置およびそれを用いたパターン形成方法 |
JP2015056598A (ja) * | 2013-09-13 | 2015-03-23 | 公立大学法人大阪府立大学 | パターン形成装置およびそれを用いたパターン形成方法 |
US10495989B2 (en) | 2015-02-12 | 2019-12-03 | Canon Kabushiki Kaisha | Imprint apparatus and method of manufacturing article |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
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US11472212B2 (en) * | 2016-09-05 | 2022-10-18 | Ev Group E. Thallner Gmbh | Device and method for embossing micro- and/or nanostructures |
CN107144909B (zh) * | 2017-04-06 | 2019-06-07 | 陕西师范大学 | 一种实现非对称传输的单层金纳米结构及其制备方法 |
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JP2005268675A (ja) * | 2004-03-22 | 2005-09-29 | Canon Inc | 微細パターン形成装置および半導体デバイス製造方法 |
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2007
- 2007-11-08 EP EP12151884.9A patent/EP2450175B1/de active Active
- 2007-11-08 EP EP07021676A patent/EP2058107B1/de active Active
-
2008
- 2008-11-07 US US12/266,630 patent/US8763239B2/en active Active
- 2008-11-07 JP JP2008286980A patent/JP5590785B2/ja active Active
Patent Citations (5)
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US20050260295A1 (en) * | 2000-10-27 | 2005-11-24 | Board Of Regents, The University Of Texas System | Remote center compliant flexure device |
WO2003065120A2 (en) * | 2002-01-11 | 2003-08-07 | Massachusetts Institute Of Technology | Microcontact printing |
JP2005268675A (ja) * | 2004-03-22 | 2005-09-29 | Canon Inc | 微細パターン形成装置および半導体デバイス製造方法 |
JP2006116602A (ja) * | 2004-09-24 | 2006-05-11 | Bondotekku:Kk | 加圧装置の平行調整方法及び装置 |
JP2007227890A (ja) * | 2005-12-21 | 2007-09-06 | Asml Netherlands Bv | インプリントリソグラフィ |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2014057589A1 (ja) * | 2012-10-12 | 2014-04-17 | アイトリックス株式会社 | 多軸プレス装置及びそれを利用したインプリント装置 |
JP2014167980A (ja) * | 2013-02-28 | 2014-09-11 | Osaka Prefecture Univ | パターン形成装置およびそれを用いたパターン形成方法 |
JP2015056598A (ja) * | 2013-09-13 | 2015-03-23 | 公立大学法人大阪府立大学 | パターン形成装置およびそれを用いたパターン形成方法 |
US10495989B2 (en) | 2015-02-12 | 2019-12-03 | Canon Kabushiki Kaisha | Imprint apparatus and method of manufacturing article |
Also Published As
Publication number | Publication date |
---|---|
EP2450175A2 (de) | 2012-05-09 |
EP2058107B1 (de) | 2012-08-08 |
EP2450175A3 (de) | 2012-12-19 |
EP2058107A1 (de) | 2009-05-13 |
EP2450175B1 (de) | 2013-09-11 |
JP5590785B2 (ja) | 2014-09-17 |
US8763239B2 (en) | 2014-07-01 |
US20090151154A1 (en) | 2009-06-18 |
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