JP2009135283A - Electrostatic discharge detecting element and electrostatic discharge detecting method - Google Patents

Electrostatic discharge detecting element and electrostatic discharge detecting method Download PDF

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JP2009135283A
JP2009135283A JP2007310464A JP2007310464A JP2009135283A JP 2009135283 A JP2009135283 A JP 2009135283A JP 2007310464 A JP2007310464 A JP 2007310464A JP 2007310464 A JP2007310464 A JP 2007310464A JP 2009135283 A JP2009135283 A JP 2009135283A
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electrostatic discharge
dielectric breakdown
electronic device
discharge detection
manufacturing process
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Katsuya Ogiso
克也 小木曽
Yasuyuki Kano
康行 加納
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Tokai Rika Co Ltd
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Tokai Rika Co Ltd
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<P>PROBLEM TO BE SOLVED: To provide an electrostatic discharge detecting element such that if a dielectric breakdown due to an electrostatic discharge occurs to an IC chip in a manufacturing process of manufacturing electronic equipment such as a control unit of an engine by mounting the IC chip on a substrate, the occurrence of the dielectric breakdown can be detected with high precision, and to provide an electrostatic discharge detecting method. <P>SOLUTION: Disclosed is the electrostatic discharge detecting element 1 for detecting the dielectric breakdown due to the electrostatic discharge occurring to the IC chip in the manufacturing step of manufacturing the control unit of the engine by mounting the IC chip on the printed circuit board. The electrostatic discharge detecting element 1 is characterized in that a breakdown part is intentionally provided where a dielectric breakdown is easy to occur and can be confirmed by using equipment such as an insulation resistance tester 5, etc. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、電子機器の製造工程において、静電気放電による絶縁破壊が発生した旨を検出するための静電気放電検出素子、及び、該検出素子を用いて好ましく行われる静電気放電検出方法に関する。   The present invention relates to an electrostatic discharge detection element for detecting that dielectric breakdown due to electrostatic discharge has occurred in a manufacturing process of an electronic device, and an electrostatic discharge detection method preferably performed using the detection element.

ICチップ(Integrated Circuit;集積回路)等の半導体デバイス(電子デバイス)は、一般に静電気に対して敏感である。このため、該ICチップをプリント基板(プリント配線板)上に実装してプリント回路板(電子回路板)を作成し、さらに該プリント回路板により自動車用機器、通信機器等の各種の電子機器を製造する製造工程においては、所謂静電気放電(ESD;Electro-Static Discharge)により、該ICチップの金属配線パターン若しくはP型、N型拡散層等の抵抗体間で絶縁破壊を生じ、得られる電子機器に不良品を発生させることがある(例えば、特許文献1参照)。   A semiconductor device (electronic device) such as an IC chip (Integrated Circuit) is generally sensitive to static electricity. For this reason, the IC chip is mounted on a printed circuit board (printed wiring board) to produce a printed circuit board (electronic circuit board), and various electronic devices such as automobile equipment and communication equipment are produced using the printed circuit board. In the manufacturing process to be manufactured, the so-called electrostatic discharge (ESD) causes dielectric breakdown between the metal wiring pattern of the IC chip or resistors such as P-type and N-type diffusion layers, and the resulting electronic device Defective products may be generated (see, for example, Patent Document 1).

このような静電気放電による絶縁破壊を防止するために、ICチップにおいては静電気保護回路が当該ICチップ内部の電源部や入出力部に設けられている場合がある(例えば、特許文献2参照)。   In order to prevent such dielectric breakdown due to electrostatic discharge, in an IC chip, an electrostatic protection circuit may be provided in a power supply unit or an input / output unit inside the IC chip (see, for example, Patent Document 2).

しかしながら、この保護回路も万全ではなく、電気特性への影響や保護回路の寸法的制限、さらにはICチップ毎に異なる静電気耐量(静電気放電による絶縁破壊耐力)に対応した保護回路の選定の困難性が障害となっている。   However, this protection circuit is not perfect, and it is difficult to select a protection circuit that can affect the electrical characteristics, limit the dimensions of the protection circuit, and respond to different electrostatic immunity (dielectric breakdown strength due to electrostatic discharge) for each IC chip. Is an obstacle.

また、上記した電子機器の製造工程は、リフロー処理工程や外観検査・補修工程等の複数の部分工程により構成されており、どの部分工程において静電気放電による絶縁破壊が発生しているかを特定できれば、例えば、当該製造工程に携わる作業者や製造設備の帯電防止・帯電除去等の適切な静電気放電抑制処置を採り得ると考えられる。
特開平10−12691号公報 特開2000−277700号公報
In addition, the manufacturing process of the electronic device described above is configured by a plurality of partial processes such as a reflow processing process and an appearance inspection / repair process, and if it is possible to identify which partial process causes dielectric breakdown due to electrostatic discharge, For example, it is considered that an appropriate electrostatic discharge suppression measure such as prevention of charge / removal of charge of workers or manufacturing equipment involved in the manufacturing process can be taken.
JP-A-10-12691 JP 2000-277700 A

しかしながら、現状では、電子機器の製造工程において、例えば、ICチップの帯電量を計測しても、該帯電が絶縁破壊に至るものであるか否かを正確に判断できず、このため、静電気放電によりICチップに絶縁破壊が発生している部分工程の特定は困難である。   However, at present, in the manufacturing process of electronic equipment, for example, even if the charge amount of an IC chip is measured, it cannot be accurately determined whether or not the charge leads to dielectric breakdown. Therefore, it is difficult to specify a partial process in which dielectric breakdown occurs in the IC chip.

本発明は、上記問題点を解決するためになされたものであって、その目的は、基板上に装着された電子デバイスで静電気放電による絶縁破壊が発生した場合に、その旨を高い確度で検出可能な静電気放電検出素子及び静電気放電検出方法を提供することにある。   The present invention has been made to solve the above problems, and its purpose is to detect with high accuracy when dielectric breakdown due to electrostatic discharge occurs in an electronic device mounted on a substrate. It is an object of the present invention to provide a possible electrostatic discharge detection element and electrostatic discharge detection method.

上記問題点を解決するために、請求項1に記載の発明は、基板上に装着された電子デバイスで静電気放電による絶縁破壊が発生した旨を検出するための静電気放電検出素子であって、前記絶縁破壊が発生し易く、且つ、該絶縁破壊が発生した旨を目視又は機器を用いて確認可能な絶縁破壊部位を故意に設けたこと、を要旨とする。   In order to solve the above problems, the invention according to claim 1 is an electrostatic discharge detection element for detecting that dielectric breakdown due to electrostatic discharge has occurred in an electronic device mounted on a substrate, The gist of the present invention is that a dielectric breakdown part is intentionally provided, and a dielectric breakdown part can be visually confirmed or confirmed by using an instrument.

同構成によれば、静電気放電検出素子において、静電気放電による絶縁破壊が発生し易く、且つ、該絶縁破壊が発生した旨を目視又は機器を用いて確認可能な絶縁破壊部位を故意に設けている。このため、例えば、電子デバイスを基板上に実装し、電子機器を製造する製造工程において、当該静電気放電検出素子を実装した基板を同製造工程に流して該検出素子の絶縁破壊の状態を目視又は機器を用いて観測することで、当該電子デバイスで静電気放電による絶縁破壊が発生した場合に、その旨を高い確度で検出できる。   According to this configuration, the electrostatic discharge detection element is intentionally provided with a dielectric breakdown site that is likely to cause dielectric breakdown due to electrostatic discharge and that can be confirmed visually or by using a device. . For this reason, for example, in a manufacturing process in which an electronic device is mounted on a substrate and an electronic apparatus is manufactured, the substrate on which the electrostatic discharge detection element is mounted is flowed through the manufacturing process to visually check the state of dielectric breakdown of the detection element. By observing with an apparatus, when a dielectric breakdown occurs due to electrostatic discharge in the electronic device, it can be detected with high accuracy.

請求項2に記載の発明は、請求項1に記載の静電気放電検出素子において、前記絶縁破壊部位が、当該検出素子に設けた配線パターン若しくは抵抗体間を所定のギャップ幅で離隔した部位、又は、当該検出素子に設けた導電体又は半導体間を所定厚さの絶縁膜で絶縁した部位に設定され、当該配線パターン若しくは抵抗体間、又は導電体間が導通したことを目視又は機器を用いて観測することで前記絶縁破壊が発生した旨を確認可能とされていること、を要旨とする。   According to a second aspect of the present invention, in the electrostatic discharge detection element according to the first aspect, the dielectric breakdown part is a part where a wiring pattern or a resistor provided in the detection element is separated by a predetermined gap width, or The conductor or the semiconductor provided in the detection element is set at a site insulated with an insulating film having a predetermined thickness, and the wiring pattern or the resistor or the conductor is electrically connected with the eyes or using an instrument. The gist is that it is possible to confirm that the dielectric breakdown has occurred by observing.

同構成によれば、静電気放電による絶縁破壊が発生し易く、且つ、該絶縁破壊が発生した旨を目視又は機器を用いて確認可能な絶縁破壊部位が、当該検出素子に設けた配線パターン若しくは抵抗体間を所定のギャップ幅で離隔した部位、又は、当該検出素子に設けた導電体又は半導体間を所定厚さの絶縁膜で絶縁した部位に設定されている。そして、目視又は機器を用いて観測することで当該配線パターン若しくは抵抗体間、又は導電体間に絶縁破壊が発生したことを確認可能とされている。このため、例えば、電子機器を製造する製造工程において、電子デバイスで静電気放電による絶縁破壊が発生した場合に、その旨を実用的且つ合理的な手段によって高い確度で検出できる。さらに、当該検出素子において、配線パターン若しくは抵抗体間に設定した所定のギャップ幅、又は、導電体又は半導体間の絶縁膜に設定した所定の厚さで静電気放電による絶縁破壊が生じた場合は、同程度の絶縁破壊耐力を有する電子デバイスでも絶縁破壊が生じうることが高い確度で推定できるようになる。このため、当該絶縁破壊耐力を超えるように、例えば、配線パターン若しくは抵抗体間のギャップ幅を長くする、又は、導電体間の絶縁膜の厚さを厚くするように電子デバイスを設計すれば、同製造工程で得られる電子機器から不良品を発生させないことが高い確度で期待(保証)できるようになる。   According to this configuration, a dielectric breakdown portion that is likely to cause breakdown due to electrostatic discharge and that can be confirmed visually or by using a device is a wiring pattern or resistor provided in the detection element. It is set to a part where the bodies are separated by a predetermined gap width, or a part where a conductor or semiconductor provided in the detection element is insulated by an insulating film having a predetermined thickness. And it is possible to confirm that dielectric breakdown has occurred between the wiring pattern or the resistors or between the conductors by visual observation or observation with an instrument. For this reason, for example, when a dielectric breakdown due to electrostatic discharge occurs in an electronic device in a manufacturing process for manufacturing an electronic device, this fact can be detected with high accuracy by a practical and rational means. Furthermore, in the detection element, when a dielectric breakdown occurs due to electrostatic discharge at a predetermined gap width set between the wiring pattern or the resistor or a predetermined thickness set in the insulating film between the conductor or the semiconductor, It becomes possible to estimate with high accuracy that dielectric breakdown can occur even in an electronic device having the same breakdown strength. For this reason, if the electronic device is designed so as to exceed the dielectric breakdown strength, for example, the gap width between the wiring patterns or resistors is increased, or the thickness of the insulating film between the conductors is increased, It is expected (guaranteeed) with high accuracy that no defective product is generated from the electronic device obtained in the manufacturing process.

請求項3に記載の発明は、電子デバイスを基板上に実装してなる電子回路板であって、請求項1又は請求項2に記載の静電気放電検出素子が前記電子デバイスと共に同一の基板上に実装されていること、を要旨とする。   Invention of Claim 3 is an electronic circuit board formed by mounting an electronic device on a board | substrate, Comprising: The electrostatic discharge detection element of Claim 1 or Claim 2 on the same board | substrate with the said electronic device The gist is that it is implemented.

同構成によれば、請求項1又は請求項2に記載の静電気放電検出素子が電子デバイスと共に同一の基板上に実装されて電子回路板を構成しているので、該電子回路板を市場に流通させた場合において、当該検出素子に絶縁破壊が発生したときに、その電子回路板の不良が静電気放電に由来する旨を高い確度で特定しうるとともに、当該不良品を流通ルートから選択的に排除することが可能となる。   According to this configuration, since the electrostatic discharge detecting element according to claim 1 or 2 is mounted on the same substrate together with the electronic device to constitute the electronic circuit board, the electronic circuit board is distributed in the market. In this case, when a breakdown occurs in the detection element, it can be identified with high accuracy that the defect of the electronic circuit board is caused by electrostatic discharge, and the defective product is selectively excluded from the distribution route. It becomes possible to do.

請求項4に記載の発明は、所定の機能を発揮する電子デバイスと、外部との信号のやりとりを行う入出力装置とを備えた電子機器であって、請求項3に記載の電子回路板を搭載したこと、を要旨とする。   According to a fourth aspect of the present invention, there is provided an electronic apparatus comprising an electronic device that exhibits a predetermined function and an input / output device that exchanges signals with the outside, wherein the electronic circuit board according to the third aspect is provided. The gist is that it is installed.

同構成によれば、電子デバイス及び入出力装置を備えた電子機器において、請求項3に記載の電子回路板が搭載されているので、製品としての電子機器の流通ルートで何らかの原因で不良品が発生した場合、その原因が静電気放電によるものか否かが高い確度で特定できる。即ち、同電子機器において、運搬時の衝撃による故障を特定するべく搭載される衝撃センサや、水濡れによる故障を特定するべく搭載される水検出センサと同様な機能を発揮させることができる。   According to the configuration, in the electronic device including the electronic device and the input / output device, the electronic circuit board according to claim 3 is mounted, so that a defective product is caused for some reason in the distribution route of the electronic device as a product. If it occurs, it can be identified with high accuracy whether the cause is due to electrostatic discharge or not. That is, the electronic device can exhibit the same function as an impact sensor mounted to specify a failure due to an impact during transportation or a water detection sensor mounted to specify a failure due to water wetting.

請求項5に記載の発明は、電子デバイスを基板上に実装し、電子機器を製造する製造工程において当該電子デバイスで静電気放電による絶縁破壊が発生した旨を検出する静電気放電検出方法であって、前記製造工程が、複数の部分工程からなり、前記絶縁破壊が発生し易く、且つ、該絶縁破壊が発生した旨を目視又は機器を用いて確認可能な絶縁破壊部位を故意に設けた静電気放電検出素子を基板上に実装し、該静電気放電検出素子を実装した基板を前記製造工程に流して前記絶縁破壊が発生した部分工程を特定すること、を要旨とする。   The invention according to claim 5 is an electrostatic discharge detection method for detecting that dielectric breakdown due to electrostatic discharge has occurred in the electronic device in a manufacturing process of mounting the electronic device on a substrate and manufacturing the electronic device, The electrostatic discharge detection in which the manufacturing process is composed of a plurality of partial processes, and the dielectric breakdown is likely to occur, and the dielectric breakdown site is intentionally provided to visually confirm that the dielectric breakdown has occurred. The gist is to mount an element on a substrate, and flow the substrate on which the electrostatic discharge detecting element is mounted to the manufacturing process to identify a partial process in which the dielectric breakdown has occurred.

同構成によれば、電子デバイスを基板上に実装し、電子機器を製造する製造工程において、当該電子デバイスで静電気放電による絶縁破壊が発生した場合に、その旨を高い確度で検出できる。これにより、該製造工程において、電子デバイスに絶縁破壊が発生した部分工程を高い確度で特定でき、さらに当該部分工程において、静電気放電の発生を抑制する処置を採ることができるようになる。また、同製造工程において静電気放電検出素子に絶縁破壊が発生した場合、製品として規格合格品であっても、同製造工程で得られた電子機器が静電気放電によってある程度のダメージを受けていると見做し、出荷停止等の措置を採ることが可能となる。   According to this configuration, when dielectric breakdown due to electrostatic discharge occurs in the electronic device in a manufacturing process in which the electronic device is mounted on the substrate and the electronic device is manufactured, this can be detected with high accuracy. Thereby, in the manufacturing process, the partial process in which the dielectric breakdown has occurred in the electronic device can be specified with high accuracy, and further, in the partial process, a measure for suppressing the occurrence of electrostatic discharge can be taken. In addition, if dielectric breakdown occurs in the electrostatic discharge detection element during the same manufacturing process, even if the product is a standard-compliant product, the electronic device obtained in the same manufacturing process is considered to have been damaged to some extent by electrostatic discharge. Therefore, it is possible to take measures such as shipment suspension.

請求項6に記載の発明は、請求項5に記載の静電気放電検出方法において、前記静電気放電検出素子は、前記絶縁破壊部位の絶縁破壊耐力範囲に基づいて階層分類され、当該階層分類された複数種の静電気放電検出素子を基板上に実装し、前記製造工程に流すこと、を要旨とする。   According to a sixth aspect of the present invention, in the electrostatic discharge detection method according to the fifth aspect, the electrostatic discharge detection element is classified into layers based on a dielectric breakdown strength range of the dielectric breakdown site, and the plurality of hierarchically classified The gist of the invention is to mount a kind of electrostatic discharge detecting element on a substrate and flow it through the manufacturing process.

同構成によれば、絶縁破壊部位の絶縁破壊耐力範囲に基づいて階層分類した複数種の静電気放電検出素子を電子機器の製造工程に流すことで、その部分工程のいずれかにおいて当該検出素子に絶縁破壊が発生したときに、その絶縁破壊の状態を統計的に観測すれば、当該部分工程の静電気による汚染の度合の判断基準とすることができる。これにより、当該各部分工程の汚染の度合いに応じて、静電気放電の発生を抑制する処置を採ることができるようになる。   According to this configuration, a plurality of types of electrostatic discharge detection elements that are hierarchically classified based on the breakdown strength range of the dielectric breakdown site are passed through the manufacturing process of the electronic device, so that the detection element is insulated in any of the partial processes. If the breakdown state is statistically observed when breakdown occurs, it can be used as a criterion for determining the degree of contamination due to static electricity in the partial process. As a result, it is possible to take measures to suppress the occurrence of electrostatic discharge according to the degree of contamination of each partial process.

また、絶縁破壊部位の絶縁破壊耐力範囲に基づいて階層分類した複数種の静電気放電検出素子を電子機器の製造工程に流すことで、その部分工程のいずれかにおいて電子デバイスに絶縁破壊が発生したときに、各検出素子の絶縁破壊の状態を統計的に観測すれば、当該電子デバイスの絶縁破壊耐力の判断基準とすることもできる(電子デバイスの絶縁破壊耐力のレベルが定量化できる)。   In addition, when multiple types of electrostatic discharge detection elements classified hierarchically based on the dielectric breakdown strength range of the dielectric breakdown site are passed through the manufacturing process of electronic equipment, dielectric breakdown occurs in the electronic device in any of the partial processes Furthermore, if the dielectric breakdown state of each detection element is statistically observed, it can be used as a criterion for determining the dielectric strength of the electronic device (the level of dielectric strength of the electronic device can be quantified).

さらに、一の部分工程において、所定の絶縁破壊耐力の静電気放電検出素子が絶縁破壊を生じたときに、当該絶縁破壊耐力を超える(配線パターン若しくは抵抗体間のギャップ幅を長くする、又は、導電体間の絶縁膜の厚さを厚くする)ように電子デバイスを設計すれば、同製造工程で得られる電子機器から不良品を発生させないことが高い確度で期待(保証)できるようにもなる。   Further, in one partial process, when an electrostatic discharge detecting element having a predetermined breakdown strength has a dielectric breakdown, the dielectric breakdown strength is exceeded (by increasing the gap width between wiring patterns or resistors, or by conducting If the electronic device is designed so as to increase the thickness of the insulating film between the bodies, it can be expected (guaranteeed) with high accuracy that no defective product will be generated from the electronic device obtained in the manufacturing process.

本発明によれば、基板上に実装された電子デバイスで静電気放電による絶縁破壊が発生した場合に、その旨を高い確度で検出可能な静電気放電検出素子及び静電気放電検出方法が提供できるようになる。   ADVANTAGE OF THE INVENTION According to this invention, when the dielectric breakdown by electrostatic discharge generate | occur | produces in the electronic device mounted on the board | substrate, it becomes possible to provide the electrostatic discharge detection element and the electrostatic discharge detection method which can detect that to high accuracy. .

以下、本発明を具体化した実施形態について図面に従って説明する。以下に示す各実施形態にかかる静電気放電検出素子は、電子デバイスとしてのICチップをプリント基板(プリント配線板)上に実装し、エンジンの制御ユニット等の自動車用機器(電子機器)を製造する製造工程において、当該ICチップの金属配線パターン又はP型、N型拡散層等の抵抗体間で静電気放電による絶縁破壊が発生した旨を検出するためのものである。   DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, embodiments of the invention will be described with reference to the drawings. The electrostatic discharge detecting element according to each embodiment shown below is manufactured by mounting an IC chip as an electronic device on a printed circuit board (printed wiring board) to manufacture an automotive device (electronic device) such as an engine control unit. This is to detect that dielectric breakdown due to electrostatic discharge has occurred between the metal wiring pattern of the IC chip or resistors such as P-type and N-type diffusion layers in the process.

<第1実施形態>
本実施形態の静電気放電検出素子1は、Al(アルミニウム)金属配線パターンにおいて静電気放電が起こることが想定されるICチップをプリント基板上に実装し、エンジンの制御ユニットを製造する製造工程に適用されるものである。ここで、このICチップのAl金属配線パターンは、折り返し構造とされている。
<First Embodiment>
The electrostatic discharge detection element 1 of this embodiment is applied to a manufacturing process in which an IC chip that is expected to cause electrostatic discharge in an Al (aluminum) metal wiring pattern is mounted on a printed circuit board to manufacture an engine control unit. Is. Here, the Al metal wiring pattern of the IC chip has a folded structure.

図1(a)を参照して、この静電気放電検出素子1では、前記ICチップのAl金属配線パターンにおいて静電気放電による絶縁破壊が発生する状況で同様の不具合が起こるように、その回路基板2上に折り返し構造のAl金属配線パターン1aが形成されているとともに、当該Al金属配線パターン1aにおいて、静電気放電による絶縁破壊が発生し易く、且つ、該絶縁破壊が発生した旨を機器を用いて確認可能な絶縁破壊部位を故意に設けている。   Referring to FIG. 1 (a), in this electrostatic discharge detecting element 1, on the circuit board 2 so that the same problem occurs in the situation where dielectric breakdown due to electrostatic discharge occurs in the Al metal wiring pattern of the IC chip. An Al metal wiring pattern 1a having a folded structure is formed on the surface, and dielectric breakdown due to electrostatic discharge is likely to occur in the Al metal wiring pattern 1a, and it can be confirmed using equipment that the dielectric breakdown has occurred. Intentional breakdown sites are intentionally provided.

具体的には、前記絶縁破壊部位は、図1(b)を参照して、前記Al金属配線パターン1a間を所定のギャップ幅d1[nm]で離隔した部位に設けている。また、本実施形態で用いる8個(複数個)の静電気放電検出素子1,…では、全て前記ギャップ幅d1[nm]が一定値に設定されている。ここで、ギャップ幅d1[nm]は、前記ICチップの絶縁破壊耐力に合致するように、当該ICチップのパターンルールに従って決定される。   Specifically, referring to FIG. 1B, the dielectric breakdown part is provided in a part where the Al metal wiring patterns 1a are separated by a predetermined gap width d1 [nm]. In the eight (plurality) of electrostatic discharge detection elements 1,... Used in the present embodiment, the gap width d1 [nm] is set to a constant value. Here, the gap width d1 [nm] is determined according to the pattern rule of the IC chip so as to match the dielectric breakdown strength of the IC chip.

そして、前記静電気放電検出素子1,…は、例えば、プリント基板上に装着されたICチップに静電気放電による絶縁破壊が発生した場合に、その旨を検出等すべく、前記ICチップと同様にそれぞれ1個ずつ各プリント基板上に実装される。そして、こうして得られた8枚のプリント回路板(電子回路板)が、以下の8つ(複数)の部分工程S1〜S8からなるエンジンの制御ユニットの製造工程にその開始時点から流され、各部分工程S1〜S8が終了する都度、1枚ずつサンプリングされ、各静電気放電検出素子1の絶縁破壊部位に静電気放電による絶縁破壊が発生したか否かが機器を用いて確認される。   The electrostatic discharge detection elements 1,... Are respectively similar to the IC chip in order to detect, for example, when dielectric breakdown due to electrostatic discharge occurs in an IC chip mounted on a printed circuit board. One by one is mounted on each printed circuit board. Then, the eight printed circuit boards (electronic circuit boards) obtained in this way are passed from the start point to the manufacturing process of the engine control unit consisting of the following eight (plural) partial processes S1 to S8, Each time when the partial steps S1 to S8 are completed, one piece is sampled, and it is confirmed by using an apparatus whether or not dielectric breakdown due to electrostatic discharge has occurred in the dielectric breakdown portion of each electrostatic discharge detection element 1.

図2に示すように、まず、ICチップ装着工程S1において、プリント基板上の半田を付着した配線部分にICチップを装着する。そして、ICチップリフロー処理工程S2において、リフロー処理により半田を溶解させてICチップのプリント基板への半田付けを完了し、装着したICチップをプリント基板に搭載する。   As shown in FIG. 2, first, in an IC chip mounting step S1, an IC chip is mounted on a wiring portion to which solder is attached on a printed board. In the IC chip reflow processing step S2, solder is dissolved by reflow processing to complete the soldering of the IC chip to the printed board, and the mounted IC chip is mounted on the printed board.

ICチップ搭載後、外観検査・補修工程S3において、主として前記プリント基板上の半田付けの不具合箇所の発見と当該箇所の補修を行う。その後、電装部品装着工程S4において、当該プリント基板上の半田を付着した配線部分にコネクタやリレー回路等の電装部品を装着する。続いて、電装部品リフロー処理工程S5において、リフロー処理により半田を溶解させて電装部品の半田付けを完了し、装着した電装部品をプリント基板に搭載する。   After mounting the IC chip, in the appearance inspection / repair step S3, the soldering defect part on the printed circuit board is mainly found and the part is repaired. Thereafter, in the electrical component mounting step S4, electrical components such as a connector and a relay circuit are mounted on the wiring portion to which the solder on the printed board is attached. Subsequently, in the electrical component reflow processing step S5, the solder is dissolved by reflow processing to complete the soldering of the electrical component, and the mounted electrical component is mounted on the printed circuit board.

電装部品搭載後、外観検査・補修工程S6において、主としてプリント基板上の半田付けの不具合箇所の発見と当該箇所の補修を行う。その後、プリント回路板の誤品・欠品検査工程S7において、プリント基板にICチップ・電装部品の搭載を完了してなるプリント回路板において、当該チップ・部品の誤品や欠品の検査を行う。   After mounting the electrical components, in the appearance inspection / repair step S6, the soldering defect part on the printed circuit board is mainly found and the part is repaired. Thereafter, in the printed circuit board error / missing part inspection step S7, the printed circuit board obtained by completing the mounting of the IC chip / electrical component on the printed circuit board is inspected for an incorrect or missing part of the chip / part. .

そして、前記プリント回路板へケースやカバーを取り付けてエンジンの制御ユニットを完成させ、電子機器機能検査工程S8において、専用の検査装置を用い、当該制御ユニットの機能検査を行う。   Then, a case or cover is attached to the printed circuit board to complete the engine control unit, and in the electronic device function inspection step S8, a function inspection of the control unit is performed using a dedicated inspection device.

上記各部分工程S1〜S8が終了する都度、本実施形態の静電気放電検出素子1を実装したプリント回路板を1枚ずつサンプリングしてゆき、当該各検出素子1の絶縁破壊部位に静電気放電による絶縁破壊が発生したか否かを機器を用いて観測する。   When each of the partial processes S1 to S8 is finished, the printed circuit board on which the electrostatic discharge detecting element 1 of this embodiment is mounted is sampled one by one, and the insulation breakdown portion of each detecting element 1 is insulated by electrostatic discharge. Observe with the instrument whether or not destruction occurred.

具体的には、図3(a)に示すように、前記製造工程からサンプリングしたオフライン状態で、前記静電気放電検出素子1を実装したプリント基板20(プリント回路板)を絶縁抵抗試験装置の検査ステージ6上に載置し、該検出素子1の絶縁破壊部位にプローブ3及びケーブル4を介して絶縁抵抗試験器5(機器)を接続し、当該絶縁破壊部位の絶縁破壊状態を観測する。   Specifically, as shown in FIG. 3 (a), a printed circuit board 20 (printed circuit board) on which the electrostatic discharge detecting element 1 is mounted in an off-line state sampled from the manufacturing process is inspected in an insulation resistance test apparatus. The insulation resistance tester 5 (apparatus) is connected to the dielectric breakdown part of the detection element 1 via the probe 3 and the cable 4 and the dielectric breakdown state of the dielectric breakdown part is observed.

詳細には、図3(b)に示すように、プリント基板20上の回路配線20aにリード線1bを介して実装された静電気放電検出素子1のAl金属配線パターン1a,1a間のギャップ幅d1[nm]で離隔してなる絶縁破壊部位(図1(b)参照)に、プローブ3を接続し、さらにケーブル4を経由して絶縁抵抗試験器5に接続し、当該絶縁破壊部位の絶縁抵抗値[MΩ]を測定する。   Specifically, as shown in FIG. 3B, the gap width d1 between the Al metal wiring patterns 1a and 1a of the electrostatic discharge detecting element 1 mounted on the circuit wiring 20a on the printed board 20 via the lead wire 1b. The probe 3 is connected to a dielectric breakdown site (see FIG. 1B) separated by [nm], and further connected to the insulation resistance tester 5 via the cable 4, and the insulation resistance of the dielectric breakdown site Measure the value [MΩ].

その結果、当該部分工程S1〜S8のいずれかの工程の終了後、例えば、電装部品装着工程S4及びプリント回路板の誤品・欠品検査工程S7の終了後に前記プリント基板20と共にサンプリングした静電気放電検出素子1の絶縁抵抗値が所定値(例えば、10[MΩ])よりも低下していた場合には、当該部分工程S4及びS7において、静電気放電検出素子1に静電気放電により絶縁破壊が発生していた旨が確認される。   As a result, the electrostatic discharge sampled together with the printed circuit board 20 after the end of any of the partial steps S1 to S8, for example, after the electrical component mounting step S4 and the printed circuit board error / missing part inspection step S7. When the insulation resistance value of the detection element 1 is lower than a predetermined value (for example, 10 [MΩ]), dielectric breakdown occurs in the electrostatic discharge detection element 1 due to electrostatic discharge in the partial processes S4 and S7. It is confirmed that it was.

本実施形態の静電気放電検出素子1又は静電気放電検出方法によれば、以下のような作用・効果を得ることができる。
(1)静電気放電による絶縁破壊が発生し易く、且つ、該絶縁破壊が発生した旨を絶縁抵抗試験器5を用いて確認可能な絶縁破壊部位が、静電気放電検出素子1において、Al金属配線パターン1aを、ICチップの絶縁破壊耐力に合致する所定のギャップ幅d1[nm]で離隔した部位に設定されている。そして、絶縁抵抗試験器5を用いて観測することで当該Al金属配線パターン1a間に絶縁破壊が発生したことを確認可能とされている。このため、エンジンの制御ユニットを製造する製造工程において、当該ICチップで静電気放電による絶縁破壊が発生した場合には、その旨を実用的且つ合理的な手段によって高い確度で検出できる。
According to the electrostatic discharge detection element 1 or the electrostatic discharge detection method of the present embodiment, the following operations and effects can be obtained.
(1) In the electrostatic discharge detecting element 1, an Al metal wiring pattern is a dielectric breakdown site that is likely to cause dielectric breakdown due to electrostatic discharge and that can be confirmed by using the insulation resistance tester 5. 1a is set at a site separated by a predetermined gap width d1 [nm] that matches the dielectric breakdown strength of the IC chip. Then, it is possible to confirm that dielectric breakdown has occurred between the Al metal wiring patterns 1a by observing using the insulation resistance tester 5. For this reason, in the manufacturing process of manufacturing the engine control unit, if dielectric breakdown occurs due to electrostatic discharge in the IC chip, it can be detected with high accuracy by practical and rational means.

(2)静電気放電検出素子1において、Al金属配線パターン1a間に設定した所定のギャップ幅d1[nm]で静電気放電による絶縁破壊が生じた場合は、同程度の絶縁破壊耐力を有するICチップでも絶縁破壊が生じうることが高い確度で推定できるようになる。このため、当該絶縁破壊耐力を超えるようにAl金属配線パターン1a間のギャップ幅をd1[nm]よりも適宜長くするようにICチップを設計すれば、同製造工程で得られるエンジンの制御ユニットから不良品を発生させないことが高い確度で期待(保証)できるようになる。   (2) In the electrostatic discharge detecting element 1, when dielectric breakdown occurs due to electrostatic discharge with a predetermined gap width d1 [nm] set between the Al metal wiring patterns 1a, an IC chip having the same dielectric breakdown resistance can be used. It becomes possible to estimate with high accuracy that dielectric breakdown may occur. Therefore, if the IC chip is designed so that the gap width between the Al metal wiring patterns 1a is appropriately longer than d1 [nm] so as to exceed the dielectric breakdown strength, the engine control unit obtained in the same manufacturing process can be used. It can be expected (guaranteeed) with high accuracy that no defective product is generated.

(3)静電気放電検出素子1の静電気破壊耐力を故意に低くする(換言すれば、静電気放電により絶縁破壊し易い状態とする)、つまり、Al金属配線パターン1a間のギャップ幅を適宜短くし、これを製造工程に流し、なおかつその状態で絶縁破壊が生じなければ、同程度の静電気破壊耐力を有するICチップでも絶縁破壊が生じないことが高い確度で期待できることになる。この結果、当該エンジンの制御ユニットの製造工程への信頼性が高められるとともに同製造工程を経て製造されたエンジンの制御ユニットの品質への信頼性も向上する。   (3) Deliberately lowering the electrostatic breakdown strength of the electrostatic discharge detection element 1 (in other words, making it easy to break down due to electrostatic discharge), that is, appropriately shortening the gap width between the Al metal wiring patterns 1a, If this is applied to the manufacturing process and dielectric breakdown does not occur in that state, it can be expected with high accuracy that dielectric breakdown will not occur even with an IC chip having the same level of electrostatic breakdown resistance. As a result, the reliability of the engine control unit manufacturing process is improved, and the reliability of the engine control unit manufactured through the manufacturing process is improved.

(4)実際に同製造工程によって製造されたエンジンの制御ユニットに故障が発生した場合に、当該故障が静電気放電に由来することが高い確度で推定できるとともに、該静電気放電が発生した箇所が前記部分工程S4又はS7であることが高い確度で特定できるようになる。これにより、当該部分工程S4又はS7において、同工程に携わる作業者や製造設備の帯電防止・帯電除去等の静電気放電の発生を抑制する処置を採ることができるようになる。   (4) When a failure occurs in the engine control unit actually manufactured by the same manufacturing process, it can be estimated with high accuracy that the failure is caused by electrostatic discharge, and the location where the electrostatic discharge has occurred is It becomes possible to specify the partial process S4 or S7 with high accuracy. Thereby, in the said partial process S4 or S7, the process which suppresses generation | occurrence | production of electrostatic discharges, such as the worker who engages in the process, and antistatic and removal of charge of a production facility, can be taken now.

(5)一方、エンジンの制御ユニットに故障が発生しなかった場合でも、当該部分工程S4及びS7において、ICチップに静電気放電が起こり、絶縁破壊が発生し易い状態であったことが高い確度で推定できるようになる。これにより、同製造工程で得られたエンジンの制御ユニットが製品として規格合格品であっても、静電気放電によってある程度のダメージを受けていると見做し、出荷停止等の措置を採ることが可能となる。   (5) On the other hand, even when no failure has occurred in the engine control unit, in the partial processes S4 and S7, it is highly likely that electrostatic discharge has occurred in the IC chip and dielectric breakdown is likely to occur. Can be estimated. As a result, even if the engine control unit obtained in the same manufacturing process is a product that meets the standards, it can be assumed that it has been damaged to some extent by electrostatic discharge, and measures such as shipment stoppage can be taken. It becomes.

<第2実施形態>
本実施形態の静電気放電検出素子1´は、P型(N型)拡散層からなる抵抗体において静電気放電が起こることが想定されるICチップをプリント基板上に実装し、エンジンの制御ユニットを製造する製造工程に適用されるものである。
Second Embodiment
The electrostatic discharge detecting element 1 ′ of the present embodiment is manufactured by mounting an IC chip on a printed circuit board on which an electrostatic discharge is assumed to occur in a resistor composed of a P-type (N-type) diffusion layer, and manufacturing an engine control unit. It is applied to the manufacturing process.

図4(a)を参照して、この静電気放電検出素子1´では、前記ICチップの抵抗体において静電気放電による絶縁破壊が発生する状況で同様の不具合が起こるように、その回路基板(N型(P型)シリコン基板)2上にP型(N型)拡散層からなる抵抗体1a´が形成されているとともに、当該抵抗体1a´において、静電気放電による絶縁破壊が発生し易く、且つ、該絶縁破壊が発生した旨を機器を用いて確認可能な絶縁破壊部位を故意に設けている。   Referring to FIG. 4 (a), in this electrostatic discharge detecting element 1 ', the circuit board (N-type) is used so that a similar problem occurs in a situation where dielectric breakdown occurs due to electrostatic discharge in the resistor of the IC chip. A resistor 1a ′ composed of a P-type (N-type) diffusion layer is formed on the (P-type) silicon substrate 2 and the dielectric breakdown due to electrostatic discharge is likely to occur in the resistor 1a ′. A dielectric breakdown site where the fact that the dielectric breakdown has occurred can be confirmed using equipment is intentionally provided.

詳細には、前記絶縁破壊部位は、図4(b)を参照して、P型(N型)拡散層からなる一対の抵抗体1a´,1a´において、先端が鋭角状とされ、所定のギャップ幅d2[nm]で相対向して離隔する各々の突出部位1t,1tに設けている。ここで、本実施形態で用いる3種(複数種)の静電気放電検出素子1´[1]〜1´[3]は、前記ギャップ幅d2[nm]の範囲、即ち、当該検出素子1´の絶縁破壊部位の絶縁破壊耐力範囲に基づいて階層分類されている。具体的には、前記ICチップの絶縁破壊耐力に近似するように、下表1に示すとおりとされている。   Specifically, referring to FIG. 4 (b), the dielectric breakdown site has a sharp tip at a pair of resistors 1a 'and 1a' made of a P-type (N-type) diffusion layer, The protrusions 1t and 1t are provided to be opposed to each other with a gap width d2 [nm]. Here, the three types (plural types) of electrostatic discharge detection elements 1 ′ [1] to 1 ′ [3] used in the present embodiment are within the range of the gap width d2 [nm], that is, the detection element 1 ′. Hierarchical classification is based on the dielectric breakdown strength range of dielectric breakdown sites. Specifically, it is as shown in Table 1 below so as to approximate the dielectric breakdown strength of the IC chip.

Figure 2009135283
そして、前記静電気放電検出素子1´,…は、例えば、プリント基板上に装着されたICチップに静電気放電による絶縁破壊が発生した場合に、その旨を検出等すべく、前記階層分類に基づき、ギャップ幅d2[nm]の範囲が異なるものがそれぞれ3種(3個)ずつ、合計8枚の各プリント基板上に実装される。そして、こうして得られた8枚のプリント回路板が、図3に示す製造工程と同様に部分工程S1〜S8からなるエンジンの制御ユニットの製造工程にその開始時点から流され、各部分工程S1〜S8が終了する都度、1枚ずつサンプリングされ、各プリント基板上の3種の静電気放電検出素子1´[1]〜1´[3]の絶縁破壊部位に静電気放電による絶縁破壊が発生したか否かが第1実施形態と同様に絶縁抵抗試験器5を用いて確認される。
Figure 2009135283
And, for example, when dielectric breakdown due to electrostatic discharge occurs in an IC chip mounted on a printed circuit board, the electrostatic discharge detection elements 1 ′,... Those having different gap widths d2 [nm] are mounted on a total of eight printed boards, each of three types (three). Then, the eight printed circuit boards obtained in this way are passed from the start point to the manufacturing process of the engine control unit consisting of the partial processes S1 to S8 as in the manufacturing process shown in FIG. Each time S8 is finished, one sheet is sampled, and whether or not dielectric breakdown due to electrostatic discharge has occurred in the dielectric breakdown sites of the three types of electrostatic discharge detection elements 1 ′ [1] to 1 ′ [3] on each printed circuit board. Is confirmed using the insulation resistance tester 5 as in the first embodiment.

その結果、当該部分工程S1〜S8のいずれかの工程の終了後、例えば、電装部品リフロー処理工程S5の終了後に前記プリント基板20と共にサンプリングした静電気放電検出素子1´[1]及び1´[2]の絶縁抵抗値が所定値(例えば、10[MΩ])よりも低下していた場合には、当該部分工程S5において、ギャップ幅d2[nm](=100〜1000[nm])に相当する絶縁破壊耐力以下の静電気放電検出素子1´(即ち、素子[1]及び[2])に静電気放電により絶縁破壊が発生していた旨が確認される。   As a result, the electrostatic discharge detection elements 1 ′ [1] and 1 ′ [2 sampled together with the printed circuit board 20 after the end of any of the partial steps S1 to S8, for example, after the end of the electrical component reflow processing step S5. ] Is lower than a predetermined value (for example, 10 [MΩ]), it corresponds to the gap width d2 [nm] (= 100 to 1000 [nm]) in the partial step S5. It is confirmed that the dielectric breakdown has occurred in the electrostatic discharge detecting element 1 ′ (that is, the elements [1] and [2]) having the dielectric breakdown strength or less due to electrostatic discharge.

本実施形態の静電気放電検出素子1´又は静電気放電検出方法によれば、第1実施形態で得られる作用・効果に加えて、さらに以下のような作用・効果を得ることができる。
(6)絶縁破壊部位の絶縁破壊耐力範囲に基づいて階層分類した3種の静電気放電検出素子1´,…を用いる統計的観測により、当該検出素子1´において静電気放電による絶縁破壊が生じた部分工程S5の静電気による汚染の度合の判断基準とすることができる。これにより、当該部分工程S5の汚染の度合いに応じて、静電気放電の発生を抑制する処置を採ることができるようになる。
According to the electrostatic discharge detection element 1 ′ or the electrostatic discharge detection method of the present embodiment, the following operations / effects can be obtained in addition to the operations / effects obtained in the first embodiment.
(6) A portion where dielectric breakdown due to electrostatic discharge has occurred in the detection element 1 ′ by statistical observation using three types of electrostatic discharge detection elements 1 ′,. It can be used as a criterion for determining the degree of contamination due to static electricity in step S5. As a result, it is possible to take measures to suppress the occurrence of electrostatic discharge according to the degree of contamination in the partial step S5.

(7)絶縁破壊部位の絶縁破壊耐力範囲に基づいて階層分類した3種の静電気放電検出素子1´[1]〜1´[3]をエンジンの制御ユニットの製造工程に流すことで、その部分工程のいずれかにおいてICチップに絶縁破壊が発生したときに、各検出素子1´の絶縁破壊の状態を統計的に観測すれば、当該ICチップの絶縁破壊耐力の判断基準とすることもできる(ICチップの絶縁破壊耐力のレベルが定量化できる)。   (7) The three types of electrostatic discharge detection elements 1 ′ [1] to 1 ′ [3] classified hierarchically based on the dielectric breakdown strength range of the dielectric breakdown sites are flowed through the manufacturing process of the engine control unit, and the part If the breakdown state of each detection element 1 ′ is statistically observed when breakdown occurs in the IC chip in any of the steps, it can be used as a criterion for determining the breakdown strength of the IC chip ( The level of dielectric strength of IC chips can be quantified).

(8)さらに、本実施形態のように一の部分工程S5において、所定の絶縁破壊耐力の静電気放電検出素子1´[1]及び1´[2]に絶縁破壊が生じたときに、当該絶縁破壊耐力を超えるように、例えば、抵抗体間1a´,1a´のギャップ幅d2[nm]を1000[nm]よりも適宜長くした静電気放電検出素子1´と同等の絶縁破壊耐力を有するICチップを設計すれば、同製造工程で得られるエンジンの制御ユニットから不良品を発生させないことが高い確度で期待(保証)できるようにもなる。   (8) Further, when a dielectric breakdown occurs in the electrostatic discharge detecting elements 1 ′ [1] and 1 ′ [2] having a predetermined breakdown strength in one partial step S5 as in the present embodiment, the insulation is performed. For example, an IC chip having a breakdown strength equivalent to that of the electrostatic discharge detection element 1 ′ in which the gap width d2 [nm] between the resistors 1a ′ and 1a ′ is appropriately longer than 1000 [nm] so as to exceed the breakdown strength. Can be expected (guaranteed) with high accuracy that no defective product will be generated from the engine control unit obtained in the same manufacturing process.

<第3実施形態>
本実施形態の静電気放電検出素子10は、導電体としてのMR素子(強磁性体磁気抵抗素子)において静電気放電が起こることが想定されるICチップをプリント基板上に実装し、自動車用スイッチの制御ユニットを製造する製造工程に適用されるものである。
<Third Embodiment>
In the electrostatic discharge detection element 10 of the present embodiment, an IC chip on which an electrostatic discharge is assumed to occur in an MR element (ferromagnetic magnetoresistive element) as a conductor is mounted on a printed circuit board, and control of an automobile switch is performed. The present invention is applied to a manufacturing process for manufacturing a unit.

図5(a)を参照して、この静電気放電検出素子10では、前記ICチップのMR素子において静電気放電による絶縁破壊が発生する状況で同様の不具合が起こるように、そのシリコン基板(半導体)11上にシリコン酸化膜(SiO)12を介してMR素子10a,10aが形成されているとともに、当該MR素子10a,10aにおいて、静電気放電による絶縁破壊が発生し易く、且つ、該絶縁破壊が発生した旨を機器を用いて確認可能な絶縁破壊部位を故意に設けている。尚、図5(a)において、前記シリコン酸化膜(SiO)12及びMR素子10a,10aは、層間絶縁膜(SiO)13及びパシベーション膜(SiN)14により更に被覆されている。 Referring to FIG. 5 (a), in this electrostatic discharge detecting element 10, the silicon substrate (semiconductor) 11 is arranged so that a similar problem occurs in a situation where dielectric breakdown due to electrostatic discharge occurs in the MR element of the IC chip. The MR elements 10a and 10a are formed on the silicon oxide film (SiO 2 ) 12 on the top, and the MR elements 10a and 10a are susceptible to dielectric breakdown due to electrostatic discharge, and the dielectric breakdown occurs. A dielectric breakdown site that can be confirmed using equipment is intentionally provided. In FIG. 5A, the silicon oxide film (SiO 2 ) 12 and the MR elements 10 a and 10 a are further covered with an interlayer insulating film (SiO) 13 and a passivation film (SiN) 14.

具体的には、前記絶縁破壊部位は、図5(b)を参照して、前記MR素子10a,10aとシリコン基板11の間を所定の均一な膜厚d3[nm]のシリコン酸化膜12で絶縁した部位に設けている。また、本実施形態で用いる8個(複数個)の静電気放電検出素子10,…では、全て前記膜厚d3[nm]が一定値に設定されている。ここで、膜厚d3[nm]は、前記ICチップの絶縁破壊耐力に合致するように、例えば、500[nm]以上1000[nm]以下の範囲とされていることがよい。   Specifically, referring to FIG. 5B, the dielectric breakdown site is a silicon oxide film 12 having a predetermined uniform film thickness d3 [nm] between the MR elements 10a, 10a and the silicon substrate 11. It is provided in an insulated part. In the eight (plural) electrostatic discharge detecting elements 10 used in the present embodiment, the film thickness d3 [nm] is set to a constant value. Here, the film thickness d3 [nm] is preferably in the range of 500 [nm] or more and 1000 [nm] or less, for example, so as to match the dielectric breakdown strength of the IC chip.

そして、前記静電気放電検出素子10,…は、例えば、プリント基板上に装着されたICチップに静電気放電による絶縁破壊が発生した場合に、その旨を検出等すべく、前記ICチップと同様にそれぞれ1個ずつ各プリント基板上に実装される。そして、こうして得られた8枚のプリント回路板が、図3に示す製造工程と同様に部分工程S1〜S8からなる自動車用スイッチの制御ユニットの製造工程にその開始時点から流され、各部分工程S1〜S8が終了する都度、1枚ずつサンプリングされ、各静電気放電検出素子10の絶縁破壊部位に静電気放電による絶縁破壊が発生したか否かが第1及び第2実施形態と同様に絶縁抵抗試験器5を用いて確認される。   The electrostatic discharge detection elements 10,... Are respectively the same as the IC chip in order to detect, for example, when an insulation breakdown due to electrostatic discharge occurs in an IC chip mounted on a printed circuit board. One by one is mounted on each printed circuit board. Then, the eight printed circuit boards obtained in this way are passed from the start point to the manufacturing process of the control unit of the automotive switch consisting of the partial processes S1 to S8 in the same manner as the manufacturing process shown in FIG. Each time S1 to S8 are completed, one sheet is sampled, and whether or not dielectric breakdown due to electrostatic discharge has occurred in the dielectric breakdown portion of each electrostatic discharge detection element 10 is the same as in the first and second embodiments. This is confirmed using the vessel 5.

その結果、当該部分工程S1〜S8のいずれかの工程の終了後、例えば、電装部品搭載後の外観検査・補修工程S6の終了後に前記プリント基板20と共にサンプリングした静電気放電検出素子10の絶縁抵抗値が所定値(例えば、10[MΩ])よりも低下していた場合には、当該部分工程S6において、当該静電気放電検出素子10に静電気放電により絶縁破壊が発生していた旨が確認される。   As a result, the insulation resistance value of the electrostatic discharge detection element 10 sampled together with the printed circuit board 20 after the end of any of the partial steps S1 to S8, for example, after the appearance inspection / repair step S6 after mounting the electrical components. Is lower than a predetermined value (for example, 10 [MΩ]), it is confirmed in the partial step S6 that dielectric breakdown has occurred in the electrostatic discharge detection element 10 due to electrostatic discharge.

本実施形態の静電気放電検出素子10又は静電気放電検出方法によれば、以下のような作用・効果を得ることができる。
(9)静電気放電による絶縁破壊が発生し易く、且つ、該絶縁破壊が発生した旨を絶縁抵抗試験器5を用いて確認可能な絶縁破壊部位が、静電気放電検出素子10において、MR素子10a,10aとシリコン基板11の間を、ICチップの絶縁破壊耐力に合致する所定の均一な膜厚d3[nm]のシリコン酸化膜12で絶縁した部位に設定されている。そして、絶縁抵抗試験器5を用いて観測することで当該シリコン酸化膜12に絶縁破壊が発生したことを確認可能とされている。このため、自動車用スイッチの制御ユニットを製造する製造工程において、ICチップで静電気放電による絶縁破壊が発生した場合には、その旨を実用的且つ合理的な手段によって高い確度で検出できる。
According to the electrostatic discharge detection element 10 or the electrostatic discharge detection method of the present embodiment, the following operations and effects can be obtained.
(9) Dielectric breakdown due to electrostatic discharge is likely to occur, and the dielectric breakdown site where the dielectric breakdown can be confirmed using the insulation resistance tester 5 is the MR element 10a, 10a and the silicon substrate 11 are set to be insulated by a silicon oxide film 12 having a predetermined uniform film thickness d3 [nm] that matches the dielectric breakdown strength of the IC chip. It is possible to confirm that dielectric breakdown has occurred in the silicon oxide film 12 by observing using the insulation resistance tester 5. For this reason, when dielectric breakdown due to electrostatic discharge occurs in the IC chip in the manufacturing process of manufacturing the control unit for the automotive switch, it can be detected with high accuracy by practical and rational means.

(10)静電気放電検出素子10において、MR素子10aとシリコン基板11の間のシリコン酸化膜12に設定した所定の膜厚d3[nm]で静電気放電による絶縁破壊が生じた場合は、同程度の絶縁破壊耐力を有するICチップでも絶縁破壊が生じうることが高い確度で推定できるようになる。このため、当該絶縁破壊耐力を超えるようにシリコン酸化膜12の膜厚をd3[nm]よりも適宜厚くするようにICチップを設計すれば、同製造工程で得られる自動車用スイッチの制御ユニットから不良品を発生させないことが高い確度で期待(保証)できるようになる。   (10) In the electrostatic discharge detection element 10, when dielectric breakdown due to electrostatic discharge occurs at a predetermined film thickness d3 [nm] set in the silicon oxide film 12 between the MR element 10a and the silicon substrate 11, the same level It becomes possible to estimate with high accuracy that dielectric breakdown can occur even in an IC chip having dielectric strength. For this reason, if the IC chip is designed so that the thickness of the silicon oxide film 12 is appropriately larger than d3 [nm] so as to exceed the dielectric breakdown strength, the control unit of the automotive switch obtained in the same manufacturing process can be used. It can be expected (guaranteeed) with high accuracy that no defective product is generated.

(11)静電気放電検出素子10の静電気破壊耐力を故意に低くする、つまり、MR素子10a,10aとシリコン基板11の間のシリコン酸化膜12の膜厚を適宜薄くし、これを製造工程に流し、なおかつその状態で絶縁破壊が生じなければ、同程度の静電気破壊耐力を有するICチップでも絶縁破壊が生じないことが高い確度で期待できることになる。この結果、当該自動車用スイッチの制御ユニットの製造工程への信頼性が高められるとともに同製造工程を経て製造された自動車用スイッチの制御ユニットの品質への信頼性も向上する。   (11) The electrostatic breakdown resistance of the electrostatic discharge detection element 10 is intentionally lowered, that is, the thickness of the silicon oxide film 12 between the MR elements 10a, 10a and the silicon substrate 11 is appropriately reduced, and this is passed to the manufacturing process. If dielectric breakdown does not occur in that state, it can be expected with high accuracy that dielectric breakdown does not occur even with an IC chip having the same level of electrostatic breakdown strength. As a result, the reliability of the automotive switch control unit in the manufacturing process is improved, and the reliability of the automotive switch control unit manufactured through the manufacturing process is improved in quality.

尚、上記実施形態は以下のように変形してもよい。
・上記各実施形態では、絶縁破壊部位において静電気放電により絶縁破壊が生じた旨を機器としての絶縁抵抗試験器5で確認可能とした。しかし、本発明の技術的思想はこれに限られず、目視による確認手段、例えば、静電気放電検出素子1(1´,10)の絶縁破壊部位、即ち、Al金属配線パターン1a(抵抗体1a´)のギャップ間(MR素子10aとシリコン基板11の間)において、例えばLED(Light Emitting Diode:発光ダイオード)を接続し、前記各電子機器の製造工程において、ICチップを実装するプリント基板や、ICチップを実装したプリント回路板と共に流したインライン状態で、静電気放電により絶縁破壊が発生したときに起こる発光を直接肉眼で観測してもよい。
The above embodiment may be modified as follows.
In each of the above embodiments, it can be confirmed by the insulation resistance tester 5 as a device that dielectric breakdown has occurred due to electrostatic discharge at the dielectric breakdown site. However, the technical idea of the present invention is not limited to this, and a visual confirmation means, for example, a dielectric breakdown part of the electrostatic discharge detection element 1 (1 ′, 10), that is, an Al metal wiring pattern 1a (resistor 1a ′). For example, an LED (Light Emitting Diode) is connected between the gaps (between the MR element 10a and the silicon substrate 11), and an IC chip is mounted in the manufacturing process of each electronic device. Light emission that occurs when dielectric breakdown occurs due to electrostatic discharge may be observed directly with the naked eye in an in-line state that flows along with a printed circuit board on which is mounted.

・上記各実施形態では、絶縁破壊部位において静電気放電により絶縁破壊が生じた旨を機器としての絶縁抵抗試験器5で確認可能とした。しかしこれに限られず、機器による確認手段としては、所定のタイミングで製造工程から静電気放電検出素子1(1´,10)をサンプリングしてオフライン状態で顕微鏡を用いて拡大して観察するようにしてもよい。   In each of the above embodiments, it can be confirmed by the insulation resistance tester 5 as a device that dielectric breakdown has occurred due to electrostatic discharge at the dielectric breakdown site. However, the present invention is not limited to this, and the confirmation means by the device is to sample the electrostatic discharge detection element 1 (1 ′, 10) from the manufacturing process at a predetermined timing, and observe it in an off-line state using a microscope. Also good.

・上記各実施形態では、エンジンの制御ユニット等の電子機器の製造工程の部分工程S1〜S8が終了する都度、静電気放電検出素子1,1´,10をサンプリングし、その絶縁破壊部位の絶縁抵抗値[MΩ]を測定して当該検出素子1,1´,10の絶縁破壊の状態を観測し、その結果でICチップに絶縁破壊が現に発生した部分工程又はICチップに絶縁破壊が発生する可能性の高い部分工程を特定するようにした。しかしこれに限られず、前記部分工程S1〜S8が終了する都度、絶縁破壊部位の絶縁抵抗値[MΩ]を測定し、その結果、絶縁破壊の発生が確認されなければ、当該部分工程の次の部分工程に前記プリント基板又はプリント回路板を流し、当該プリント基板等を用いた電子機器の製造を継続するようにすることもできる。即ち、静電気放電検出素子1,1´,10は、工程ラインチェック用として使用することが可能である。   In each of the above embodiments, the electrostatic discharge detection elements 1, 1 ', 10 are sampled each time the partial steps S1 to S8 of the manufacturing process of the electronic device such as the engine control unit are completed, and the insulation resistance of the dielectric breakdown site The value [MΩ] is measured to observe the state of dielectric breakdown of the detection elements 1, 1 ′, and 10, and as a result, the partial process where the dielectric breakdown actually occurred in the IC chip or the dielectric breakdown can occur in the IC chip A high-performance partial process was specified. However, the present invention is not limited to this, and each time the partial steps S1 to S8 are finished, the insulation resistance value [MΩ] of the dielectric breakdown site is measured. The printed circuit board or the printed circuit board may be poured into the partial process, and the manufacture of the electronic device using the printed circuit board or the like may be continued. That is, the electrostatic discharge detection elements 1, 1 ', 10 can be used for process line check.

・上記各実施形態では、静電気放電検出素子1,1´,10を実装したプリント基板又はプリント回路板を電子機器の製造工程に流し、プリント基板20に実装したICチップに静電気放電による絶縁破壊が発生した場合に、当該製造工程を構成する部分工程のいずれで当該絶縁破壊が発生したかを特定する目的等に用いた。しかしこれに限られず、静電気放電検出素子1,1´,10は、製品としてのプリント回路板や電子機器において、ICチップ等の電子デバイスと共に同一のプリント基板上に実装して市場に流通させることも可能である。ここで、電子機器とは、所定の機能を発揮するICチップと、外部との信号のやりとりを行う入出力装置とを備えたものをいい、例えば、上記実施形態で例示した自動車用機器や、各種の汎用通信機器が挙げられる。これにより、当該プリント回路板や電子機器を市場に流通させた場合において、当該検出素子1,1´,10に絶縁破壊が発生したときに、そのプリント回路板や電子機器の不良が静電気放電に由来する旨を高い確度で特定しうるとともに、当該不良品を流通ルートから選択的に排除することが可能となる。また、製品としてのプリント回路板や電子機器の流通ルートで何らかの原因で不良品が発生した場合、その原因が静電気放電によるものか否かが高い確度で特定できる。即ち、同プリント基板や電子機器において、運搬時の衝撃による故障を特定するべく搭載される衝撃センサや、水濡れによる故障を特定するべく搭載される水検出センサと同様な機能を発揮させることができる。   In each of the above embodiments, the printed circuit board or the printed circuit board on which the electrostatic discharge detection elements 1, 1 ′, 10 are mounted is flown through the manufacturing process of the electronic device, and the dielectric breakdown due to electrostatic discharge is caused on the IC chip mounted on the printed circuit board 20 When it occurred, it was used for the purpose of specifying which of the partial processes constituting the manufacturing process caused the dielectric breakdown. However, the present invention is not limited to this, and the electrostatic discharge detection elements 1, 1 'and 10 are mounted on the same printed circuit board together with an electronic device such as an IC chip in a printed circuit board or an electronic device as a product and distributed to the market. Is also possible. Here, the electronic device refers to a device including an IC chip that exhibits a predetermined function and an input / output device that exchanges signals with the outside. For example, the automotive device exemplified in the above embodiment, Various general-purpose communication devices are listed. As a result, when the printed circuit board or the electronic device is distributed in the market, when the dielectric breakdown occurs in the detection elements 1, 1 ', 10, the defective printed circuit board or the electronic device is caused by electrostatic discharge. The origin can be specified with high accuracy, and the defective product can be selectively excluded from the distribution route. Further, when a defective product is generated for some reason in the distribution route of printed circuit boards or electronic devices as products, it can be specified with high accuracy whether the cause is due to electrostatic discharge. In other words, the printed circuit board and the electronic device can exhibit the same functions as the impact sensor mounted to identify a failure due to an impact during transportation or the water detection sensor mounted to identify a failure due to water wetting. it can.

・上記第1実施形態では、静電気放電検出素子1に折り返し構造のAl金属配線パターン1aを使用したが、このようなAl金属配線パターン1aに代えて、第2実施形態で用いたようなP型(N型)拡散層からなる抵抗体1a´を折り返し構造として使用してもよい。   In the first embodiment, an Al metal wiring pattern 1a having a folded structure is used for the electrostatic discharge detection element 1, but instead of such an Al metal wiring pattern 1a, a P-type as used in the second embodiment is used. The resistor 1a ′ made of an (N-type) diffusion layer may be used as a folded structure.

・上記第2実施形態では、静電気放電検出素子1に、P型(N型)拡散層からなり、所定のギャップ幅d2[nm]となるように近接して相対向する突出部位1t,1tを有する抵抗体1a´を使用したが、このようなP型(N型)拡散層からなる抵抗体1a´に代えて、第1実施形態で用いたようなAl金属配線パターン1aを同様の突出部位を有するように使用してもよい。   In the second embodiment, the electrostatic discharge detection element 1 is made of the P-type (N-type) diffusion layer, and the projecting portions 1t and 1t facing each other so as to have a predetermined gap width d2 [nm] are provided. Although the resistor 1a ′ having the same structure is used, the Al metal wiring pattern 1a used in the first embodiment is replaced with a similar protruding portion instead of the resistor 1a ′ formed of the P-type (N-type) diffusion layer. May be used to have

・上記第2実施形態では、P型(N型)拡散層からなる抵抗体1a´において静電気放電が起こることが想定されるICチップを用いた製造工程を対象としたが、これに限られず、Ni−Co、Ni−Fe、多結晶シリコンからなる抵抗体において静電気放電が起こることが想定されるICチップを用いた製造工程を対象とすることもできる。   In the second embodiment, the manufacturing process using an IC chip in which electrostatic discharge is assumed to occur in the resistor 1a ′ composed of a P-type (N-type) diffusion layer is targeted, but the present invention is not limited thereto. A manufacturing process using an IC chip in which electrostatic discharge is assumed to occur in a resistor made of Ni—Co, Ni—Fe, or polycrystalline silicon can also be targeted.

・上記第2実施形態では、絶縁破壊部位の絶縁破壊耐力範囲に基づいて階層分類した複数種の静電気放電検出素子1´,…を用い、これらを電子機器の製造工程に流し、統計的観測により、当該検出素子1´において静電気放電による絶縁破壊が生じた部分工程の静電気による汚染の度合の判断基準とした。しかしこれに限られず、第1実施形態で用いた静電気放電検出素子1や第3実施形態で用いた静電気放電検出素子10をそれらの絶縁破壊部位の絶縁破壊耐力範囲に基づいて階層分類した上で、そのような統計的観測により部分工程の静電気による汚染の度合の判断基準としてもよい。   In the second embodiment, a plurality of types of electrostatic discharge detection elements 1 ′,... Hierarchically classified based on the dielectric breakdown strength range of the dielectric breakdown sites are used, and these are passed to the manufacturing process of the electronic device, and statistical observation is performed. The detection element 1 ′ was used as a criterion for determining the degree of contamination due to static electricity in a partial process where dielectric breakdown occurred due to electrostatic discharge. However, the present invention is not limited to this, and the electrostatic discharge detection element 1 used in the first embodiment and the electrostatic discharge detection element 10 used in the third embodiment are classified hierarchically based on the dielectric breakdown strength range of those dielectric breakdown sites. Such statistical observation may be used as a criterion for determining the degree of contamination due to static electricity in a partial process.

本発明の第1実施形態に係る静電気放電検出素子の構造を示す図であり、(a)はその斜視図、(b)はその絶縁破壊部位の拡大図。It is a figure which shows the structure of the electrostatic discharge detection element which concerns on 1st Embodiment of this invention, (a) is the perspective view, (b) is the enlarged view of the dielectric breakdown part. 電子機器の製造工程の一例を示す製造工程図。The manufacturing process figure which shows an example of the manufacturing process of an electronic device. 本発明の第1実施形態に係る静電気放電検出素子の絶縁抵抗値を絶縁抵抗試験器で測定している状態を示す図であり、(a)はその全体図、(b)は要部拡大図。It is a figure which shows the state which is measuring the insulation resistance value of the electrostatic discharge detection element which concerns on 1st Embodiment of this invention with an insulation resistance tester, (a) is the whole figure, (b) is a principal part enlarged view. . 本発明の第2実施形態に係る静電気放電検出素子の構造を示す図であり、(a)はその斜視図、(b)はその絶縁破壊部位の拡大図。It is a figure which shows the structure of the electrostatic discharge detection element which concerns on 2nd Embodiment of this invention, (a) is the perspective view, (b) is the enlarged view of the dielectric breakdown part. 本発明の第3実施形態に係る静電気放電検出素子の構造を示す図であり、(a)はその断面図、(b)はその絶縁破壊部位の拡大図。It is a figure which shows the structure of the electrostatic discharge detection element which concerns on 3rd Embodiment of this invention, (a) is the sectional drawing, (b) is the enlarged view of the dielectric breakdown site | part.

符号の説明Explanation of symbols

1,1´,10…静電気放電検出素子、1a…Al金属配線パターン、1a´…P型(N型)拡散層からなる抵抗体、1t…突出部位、2…回路基板、11…シリコン基板、20…プリント基板、d1,d2…ギャップ幅、d3…(シリコン酸化膜の)膜厚、S1〜S8…部分工程。   DESCRIPTION OF SYMBOLS 1, 1 ', 10 ... Electrostatic discharge detection element, 1a ... Al metal wiring pattern, 1a' ... Resistor which consists of a P-type (N-type) diffusion layer, 1t ... Projection part, 2 ... Circuit board, 11 ... Silicon substrate, 20 ... Printed circuit board, d1, d2 ... Gap width, d3 ... Film thickness (of silicon oxide film), S1-S8 ... Partial process.

Claims (6)

基板上に装着された電子デバイスで静電気放電による絶縁破壊が発生した旨を検出するための静電気放電検出素子であって、
前記絶縁破壊が発生し易く、且つ、該絶縁破壊が発生した旨を目視又は機器を用いて確認可能な絶縁破壊部位を故意に設けたことを特徴とする静電気放電検出素子。
An electrostatic discharge detection element for detecting the occurrence of dielectric breakdown due to electrostatic discharge in an electronic device mounted on a substrate,
An electrostatic discharge detecting element characterized in that a dielectric breakdown part is intentionally provided, and a dielectric breakdown part where the dielectric breakdown can be visually confirmed or confirmed using an instrument is provided.
請求項1に記載の静電気放電検出素子において、
前記絶縁破壊部位が、当該検出素子に設けた配線パターン若しくは抵抗体間を所定のギャップ幅で離隔した部位、又は、当該検出素子に設けた導電体又は半導体間を所定厚さの絶縁膜で絶縁した部位に設定され、当該配線パターン若しくは抵抗体間、又は導電体間が導通したことを目視又は機器を用いて観測することで前記絶縁破壊が発生した旨を確認可能とされている静電気放電検出素子。
The electrostatic discharge detecting element according to claim 1,
The insulation breakdown part is a part where a wiring pattern or resistor provided in the detection element is separated by a predetermined gap width, or a conductor or semiconductor provided in the detection element is insulated by an insulating film having a predetermined thickness. Electrostatic discharge detection that is set at the site where it is possible to confirm that the dielectric breakdown has occurred by observing visually that the wiring pattern or the resistor, or between the conductors are conductive element.
電子デバイスを基板上に実装してなる電子回路板であって、
請求項1又は請求項2に記載の静電気放電検出素子が前記電子デバイスと共に同一の基板上に実装されていることを特徴とする電子回路板。
An electronic circuit board formed by mounting an electronic device on a substrate,
An electronic circuit board, wherein the electrostatic discharge detection element according to claim 1 or 2 is mounted on the same substrate together with the electronic device.
所定の機能を発揮する電子デバイスと、外部との信号のやりとりを行う入出力装置とを備えた電子機器であって、
請求項3に記載の電子回路板を搭載したことを特徴とする電子機器。
An electronic device including an electronic device that performs a predetermined function and an input / output device that exchanges signals with the outside,
An electronic device comprising the electronic circuit board according to claim 3.
電子デバイスを基板上に実装し、電子機器を製造する製造工程において当該電子デバイスで静電気放電による絶縁破壊が発生した旨を検出する静電気放電検出方法であって、
前記製造工程が、複数の部分工程からなり、
前記絶縁破壊が発生し易く、且つ、該絶縁破壊が発生した旨を目視又は機器を用いて確認可能な絶縁破壊部位を故意に設けた静電気放電検出素子を基板上に実装し、
該静電気放電検出素子を実装した基板を前記製造工程に流して前記絶縁破壊が発生した部分工程を特定する静電気放電検出方法。
An electrostatic discharge detection method for detecting that dielectric breakdown due to electrostatic discharge has occurred in an electronic device in a manufacturing process of mounting an electronic device on a substrate and manufacturing an electronic device,
The manufacturing process comprises a plurality of partial processes,
The dielectric breakdown is easily generated, and an electrostatic discharge detecting element intentionally provided with a dielectric breakdown part that can be confirmed visually or by using a device that the dielectric breakdown has occurred is mounted on a substrate,
An electrostatic discharge detection method for specifying a partial process in which the dielectric breakdown has occurred by flowing a substrate mounted with the electrostatic discharge detection element to the manufacturing process.
請求項5に記載の静電気放電検出方法において、
前記静電気放電検出素子は、前記絶縁破壊部位の絶縁破壊耐力範囲に基づいて階層分類され、当該階層分類された複数種の静電気放電検出素子を基板上に実装し、前記製造工程に流す静電気放電検出方法。
In the electrostatic discharge detection method according to claim 5,
The electrostatic discharge detection element is hierarchically classified based on a dielectric breakdown tolerance range of the dielectric breakdown site, and the electrostatic discharge detection element that is mounted on a substrate and the plurality of types of electrostatic discharge detection elements classified in the hierarchy are flowed to the manufacturing process. Method.
JP2007310464A 2007-11-30 2007-11-30 Electrostatic discharge detecting element and electrostatic discharge detecting method Pending JP2009135283A (en)

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Publication number Priority date Publication date Assignee Title
WO2016046917A1 (en) * 2014-09-24 2016-03-31 東芝三菱電機産業システム株式会社 Method for managing assembling process of electrical product
KR20170034421A (en) * 2014-09-24 2017-03-28 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 Method for managing assembling process of electrical product
JPWO2016046917A1 (en) * 2014-09-24 2017-06-22 東芝三菱電機産業システム株式会社 Control method for assembly process of electrical products
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