JP2009122071A - Electric test-use contactor and method of manufacturing the same - Google Patents

Electric test-use contactor and method of manufacturing the same Download PDF

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JP2009122071A
JP2009122071A JP2007299220A JP2007299220A JP2009122071A JP 2009122071 A JP2009122071 A JP 2009122071A JP 2007299220 A JP2007299220 A JP 2007299220A JP 2007299220 A JP2007299220 A JP 2007299220A JP 2009122071 A JP2009122071 A JP 2009122071A
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contact
recess
contact portion
pedestal
needle tip
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JP5087371B2 (en
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Takayuki Hayashizaki
孝幸 林崎
Hideki Hirakawa
秀樹 平川
Akira Soma
亮 相馬
Yuka Yamatani
裕香 山谷
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Micronics Japan Co Ltd
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Micronics Japan Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To improve the mechanical strength of a contact part, while enabling its stylus tip to be positioned accurately. <P>SOLUTION: A contactor for burn-in tests is equipped with a tabular mount part which extends vertically; a tabular arm part extending horizontally, to at least one side from the lower end of the mount part; a tabular pedestal part projecting downward from the head of the arm part; and a contact part projecting downward from the lower end of the pedestal part. The lower end of the contact part is used as the stylus tip. The mount part, the arm part and the pedestal part are made of a conductive metal material in tabular forms, and the hardness of the contact part is higher than that of the metal material of the pedestal part, or the like. The surface of at least a portion on the contact part side of the pedestal part and the surface of the contact part, except at least the stylus tip and its proximity, are covered by a film, having an optical reflection coefficient which is smaller than that of the conductive material of the pedestal part, and the like. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、半導体集積回路のような平板状被検査体の電気試験に用いる接触子及びその製造方法に関する。   The present invention relates to a contact for use in an electrical test of a flat object to be inspected such as a semiconductor integrated circuit and a method for manufacturing the contact.

半導体集積回路のような平板状被検査体は、それが仕様書通りに製造されているか否かの電気的な試験をされる。この種の電気試験は、被検査体の電極に個々に押圧される複数のプローブすなわち接触子を配線基板やプローブ基板等の基板に配置したプローブカード、プローブブロック、プローブユニット等の電気的接続装置を用いて行われる。この種の電気的接続装置は、被検査体の電極と、テスターの電気回路とを電気的に接続するために利用される。   A flat test object such as a semiconductor integrated circuit is subjected to an electrical test as to whether or not it is manufactured according to specifications. This type of electrical test is an electrical connection device such as a probe card, a probe block, or a probe unit in which a plurality of probes that are individually pressed against the electrodes of an object to be inspected, that is, contacts are arranged on a substrate such as a wiring board or a probe board. It is done using. This type of electrical connection device is used to electrically connect an electrode of a device under test and an electrical circuit of a tester.

この種の電気的接続装置に用いられる接触子として、上下方向へ伸びる状態に基板に取り付けられる板状の取付部と、該取付部の下端部から左右方向における一方側へ伸びる板状のアーム部と、該アーム部の先端部から下方へ突出する板状の台座部と、該台座部の下端から下方へ突出する接触部であって当該接触部の下端を針先とする接触部(すなわち、被検査体の電極への接触部)とを含むものがある。   As a contactor used in this type of electrical connection device, a plate-shaped mounting portion that is attached to the substrate so as to extend in the vertical direction, and a plate-shaped arm portion that extends from the lower end portion of the mounting portion to one side in the left-right direction. And a plate-like pedestal that protrudes downward from the tip of the arm, and a contact that protrudes downward from the lower end of the pedestal, with the lower end of the contact being the needle tip (that is, And a part to be inspected).

上記の接触子において、取付部、アーム部及び台座部が導電性金属材料で板状に形成されて接触子本体とされている。そのような接触子は、取付部の上端において基板に取り付けられて、片持ち梁状に支持される。多数の接触子を基板に配置した電気的試験装置は、テスターに取り付けられる。   In the above contact, the attachment portion, the arm portion, and the pedestal portion are formed in a plate shape from a conductive metal material to form a contact body. Such a contact is attached to the substrate at the upper end of the attachment portion and is supported in a cantilever shape. An electrical test apparatus having a large number of contacts arranged on a substrate is attached to a tester.

電気的接続装置がテスターに取り付けられた状態において、接触子は、針先を被検査体の側から照明されて、針先をCCDカメラのようなエリアセンサにより被検査体の側から撮影される。得られた画像信号は、テスター又は被検査体の電極に対する針先の位置を求めて針先の座標位置を決定する位置合わせを行うべく、処理される。   In a state in which the electrical connecting device is attached to the tester, the contact is illuminated from the side of the object to be inspected by illuminating the needle tip from the side of the object to be inspected, and an area sensor such as a CCD camera images the needle tip . The obtained image signal is processed so as to perform alignment for determining the coordinate position of the needle tip by obtaining the position of the needle tip with respect to the electrode of the tester or the object to be inspected.

一方、集積回路の場合、被検査体である集積回路の高密度化が進み、1つのウエーハに多数の集積回路が形成され、それらの集積回路を未切断の状態で同時に又は複数回に分けて試験することが行われるようになってきている。このことから、基板への接触子の配置ピッチを小さくし、同時に試験可能の集積回路数を増大させることが望まれている。   On the other hand, in the case of an integrated circuit, the density of an integrated circuit to be inspected has increased, and a large number of integrated circuits are formed on one wafer, and these integrated circuits are uncut and simultaneously or divided into multiple times. Testing is being done. For this reason, it is desired to reduce the arrangement pitch of the contacts on the substrate and simultaneously increase the number of integrated circuits that can be tested.

しかし、基板への接触子の配置密度を高め、接触子及びその針先を小さくすると、針先からの反射光のみならず、針先近傍の台座部からの反射光もエリアセンサに入射し、針先からだけの反射光を識別することができない。その結果、従来の接触子では、テスター又は被検査体の電極に対する針先の位置を正確に決定することができず、正しい試験を行うことができない。   However, when increasing the arrangement density of the contacts on the substrate and reducing the contacts and their needle tips, not only the reflected light from the needle tips but also the reflected light from the pedestal near the needle tips enters the area sensor, The reflected light only from the needle tip cannot be identified. As a result, the conventional contact cannot accurately determine the position of the needle tip with respect to the electrode of the tester or the object to be inspected, and a correct test cannot be performed.

上記の課題を解決すべく、台座部の下面を鉛直面に対し傾斜させて、台座部からの反射光がエリアセンサに入射することを抑制する技術が提案されている(特許文献1)。しかし、この接触子では、鉛直面に対する台座部の下面の角度が台座部からの反射光のエリアセンサへの入射を抑制するには不十分である。   In order to solve the above-described problem, a technique has been proposed in which the lower surface of the pedestal portion is inclined with respect to the vertical plane and the reflected light from the pedestal portion is prevented from entering the area sensor (Patent Document 1). However, in this contactor, the angle of the lower surface of the pedestal portion with respect to the vertical plane is insufficient to suppress the incidence of reflected light from the pedestal portion on the area sensor.

WO 2006−09544号公報 A1WO 2006-09544 A1

上記のことから、上記従来の接触子では、台座部からの反射光がエリアセンサに入射することをより抑制するには鉛直面に対する台座部の下面の角度を小さくしなければならない。しかし、そのようにすると、台座部と接触部との連結箇所が細くなり、電極への接触部の機械的強度が不足する。   From the above, in the conventional contact described above, the angle of the lower surface of the pedestal portion with respect to the vertical surface must be reduced in order to further suppress the reflected light from the pedestal portion entering the area sensor. However, if it does so, the connection location of a base part and a contact part will become thin, and the mechanical strength of the contact part to an electrode will be insufficient.

本発明の目的は、針先の位置を正確に決定し得るにもかかわらず、接触部の機械的強度を高めることにある。   An object of the present invention is to increase the mechanical strength of the contact portion even though the position of the needle tip can be accurately determined.

本発明に係る電気試験用接触子は、上下方向へ伸びる板状の取付部、該取付部の下端部から左右方向における少なくとも一方の側へ伸びる板状のアーム部及び該アーム部の先端部から下方へ突出する板状の台座部を備える接触子本体と、前記台座部の下端から下方へ突出する接触部であって当該接触部の下端を針先とする接触部とを含む。   An electrical test contact according to the present invention includes a plate-shaped mounting portion extending in the vertical direction, a plate-shaped arm portion extending from the lower end portion of the mounting portion to at least one side in the left-right direction, and a tip portion of the arm portion. A contactor body including a plate-like pedestal portion that protrudes downward, and a contact portion that protrudes downward from the lower end of the pedestal portion, the contact portion having the lower end of the contact portion as a needle tip.

前記取付部、前記アーム部及び前記台座部は導電性金属材料で板状に形成されており、また前記接触部の硬度は前記金属材料のそれより高い。前記台座部の少なくとも前記接触部側の箇所の表面と、少なくとも前記針先及びその近傍を除く前記接触部の表面とは、光反射率が前記導電性材料より低い皮膜で覆われている。   The attachment portion, the arm portion, and the pedestal portion are formed in a plate shape with a conductive metal material, and the hardness of the contact portion is higher than that of the metal material. The surface of at least the contact portion side of the pedestal portion and the surface of the contact portion excluding at least the needle tip and the vicinity thereof are covered with a film having a light reflectance lower than that of the conductive material.

前記皮膜は、可視光の反射率が前記金属材料のそれより低い材料で形成されていてもよい。   The film may be formed of a material having a visible light reflectance lower than that of the metal material.

前記被膜は、電気メッキ技術、スパッタリング技術及び蒸着技術を含むグループから選択された少なくとも1つにより形成されていてもよい。また、前記アーム部は前記取付部の下端部から左右方向における一方の側へ伸びていてもよい。   The film may be formed by at least one selected from the group including an electroplating technique, a sputtering technique, and a vapor deposition technique. The arm portion may extend from the lower end portion of the attachment portion to one side in the left-right direction.

上記のような接触子を製造する方法は、以下の工程を含む。   The method for manufacturing the contact as described above includes the following steps.

接触子本体の少なくとも前記接触部の側の部位の表面と、少なくとも前記針先及びその近傍を除く前記接触部の表面とを模る第1の凹所を有する第1のフォトレジスト層をベース部材の上に形成し、前記第1の凹所に低光反射率を有する導電性材料の堆積により第1の低反射皮膜を前記第1の凹所に形成する第1の工程。   A first photoresist layer having a first recess that imitates at least the surface of the contact main body on the side of the contact portion and at least the surface of the contact portion excluding the needle tip and its vicinity; A first step of forming a first low-reflection coating on the first recess by depositing a conductive material having a low light reflectance on the first recess.

前記第1の低反射皮膜より光反射率が高い金属材料の堆積により前記接触子本体の少なくとも前記接触部の側の部位と、少なくとも前記針先及びその近傍を除く前記接触部の部位とを前記第1の低反射皮膜の上に形成する第2の工程。   By depositing a metal material having a light reflectance higher than that of the first low-reflection coating, at least a portion on the contact portion side of the contact main body, and at least the portion of the contact portion excluding the needle tip and its vicinity. A second step of forming on the first low reflection coating.

前記第1のフォトレジスト層を除去した後、前記接触子本体の残部を模る第2の凹所を有する第2のフォトレジスト層を前記ベース部材の上に形成し、導電性材料の堆積により前記接触子本体の残部を前記第2の凹所に形成する第3の工程。   After removing the first photoresist layer, a second photoresist layer having a second recess imitating the remainder of the contactor body is formed on the base member, and a conductive material is deposited. A third step of forming the remaining part of the contact body in the second recess.

前記第2のフォトレジスト層を除去し、前記接触子本体の少なくとも前記接触部の側の部位の表面と、少なくとも前記針先及びその近傍を除く前記接触部の表面とを模る第3の凹所を有する第3のフォトレジスト層をベース部材の上に形成し、前記第3の凹所に低光反射率を有する材料の堆積により第2の低反射皮膜を前記第3の凹所に形成する第4の工程。   The second photoresist layer is removed, and a third recess imitating at least the surface of the contact body on the side of the contact portion and the surface of the contact portion excluding at least the needle tip and the vicinity thereof A third photoresist layer having a point is formed on the base member, and a second low reflection film is formed in the third recess by depositing a material having a low light reflectance in the third recess. The 4th process to do.

前記接触子本体、前記接触部、前記第1の低反射皮膜及び第2の低反射皮膜を前記ベース部材から分離する第5の工程。   A fifth step of separating the contact body, the contact portion, the first low-reflection coating, and the second low-reflection coating from the base member;

前記第1及び第2の低反射皮膜は、前記取付部、前記アーム部、前記台座部及び前記接触部よりも可視光に対する反射率が低い材料で形成されていてもよい。   The first and second low-reflection coatings may be formed of a material having a lower reflectance with respect to visible light than the mounting portion, the arm portion, the pedestal portion, and the contact portion.

前記第1及び第2の低反射被膜は、電気メッキ技術、スパッタリング技術及び蒸着技術を含むグループから選択された少なくとも1つにより形成されていてもよい。   The first and second low reflection coatings may be formed by at least one selected from the group including an electroplating technique, a sputtering technique, and a vapor deposition technique.

前記第2の工程は高硬度の導電性材料を前記第1の低反射皮膜の上に堆積させることを含み、前記第3の工程は高靱性の導電性材料を前記第2の凹所に堆積させることを含むことができる。それらの導電性材料は、金属材料とすることができる。   The second step includes depositing a high hardness conductive material on the first low reflective coating, and the third step deposits a high tough conductive material in the second recess. Can be included. These conductive materials can be metallic materials.

上記のように、台座部の少なくとも接触部側の箇所の表面と、少なくとも針先及びその近傍を除く接触部の表面とが、光反射率が台座部や接触部の素材のそれより低い皮膜で覆われていると、台座部の少なくとも接触部側の箇所の表面と、少なくとも針先及びその近傍を除く接触部の表面とからの反射光がエリアセンサに入射することを著しく低減される。その結果、エリアセンサへの入射光に対する針先からの反射光の割合が著しく高くなり、針先位置を正確に決定することができる。   As described above, the surface of at least the contact portion side of the pedestal portion and the surface of the contact portion except at least the needle tip and the vicinity thereof are coated with a film whose light reflectance is lower than that of the material of the pedestal portion or the contact portion. When covered, the reflected light from the surface of the base portion at least on the contact portion side and at least the surface of the contact portion excluding the needle tip and the vicinity thereof are significantly reduced from entering the area sensor. As a result, the ratio of the reflected light from the needle tip to the incident light to the area sensor becomes remarkably high, and the needle tip position can be determined accurately.

また、従来の接触子のように鉛直面に対する台座部の下面の角度を小さくする必要がないから、台座部と接触部との連結箇所を細くする必要がなく、連結箇所の機械的強度を低下させる必要がない。   Moreover, since it is not necessary to reduce the angle of the lower surface of the pedestal portion with respect to the vertical surface unlike conventional contacts, there is no need to reduce the connection portion between the pedestal portion and the contact portion, and the mechanical strength of the connection portion is reduced. There is no need to let them.

[用語の説明]   [Explanation of terms]

本発明において、図1において、電気的接続装置の側が上方となりかつ検査ステージの側が下方となる方向(上下方向)を上下方向といい、この上下方向と直交する左右方向を左右方向といい、両方向と直交する紙背方向を前後方向という。   In the present invention, in FIG. 1, the direction (vertical direction) in which the side of the electrical connection device is upward and the inspection stage side is downward is referred to as the vertical direction, and the horizontal direction orthogonal to the vertical direction is referred to as the horizontal direction. The direction of the back of the paper perpendicular to the direction is called the front-back direction.

しかし、本発明でいう上下方向は、テスターに対する検査時の被検査体の姿勢により異なる。したがって、本発明でいう上下方向は、実際の検査装置に応じて、上下方向、その逆の方向、水平方向、及び水平面に対し傾斜する傾斜方向のいずれかの方向となるように決定してもよい。   However, the vertical direction in the present invention differs depending on the posture of the object to be inspected at the time of inspection with respect to the tester. Therefore, the vertical direction as used in the present invention may be determined to be one of the vertical direction, the opposite direction, the horizontal direction, and the inclined direction inclined with respect to the horizontal plane, depending on the actual inspection apparatus. Good.

[電気的試験装置及び接触子の実施例]   [Electrical test apparatus and contactor embodiments]

図1を参照するに、電気的試験装置10は、複数の集積回路を有する円板状の半導体ウエーハを被検査体12とするテスター(図示せず)に配置される。テスターは、被検査体(ウエーハ)12に形成された未切断の複数の集積回路の電気的性能試験を一回で又は数回に分けて検査する。各集積回路は、パッド電極のような複数の電極を上面に有する。   Referring to FIG. 1, an electrical test apparatus 10 is disposed in a tester (not shown) having a disk-shaped semiconductor wafer having a plurality of integrated circuits as a device under test 12. The tester inspects an electrical performance test of a plurality of uncut integrated circuits formed on the inspected object (wafer) 12 at one time or in several times. Each integrated circuit has a plurality of electrodes such as pad electrodes on the top surface.

電気的試験装置10は、板状の複数の接触子14を備えるプローブカードすなわち電気的接続装置16と、集積回路12が配置されるチャックトップ18と、チャックトップ18を少なくとも前後方向、左右方向及び上下方向に三次元的に移動させる検査ステージ20と、少なくとも1つの通電試験用接触子14を撮影するように検査ステージ20に配置されたCCDカメラのようなエリアセンサ22とを含む。   The electrical test apparatus 10 includes a probe card or electrical connection device 16 including a plurality of plate-like contacts 14, a chuck top 18 on which the integrated circuit 12 is disposed, and the chuck top 18 at least in the front-rear direction, the left-right direction, and It includes an inspection stage 20 that is moved three-dimensionally in the vertical direction, and an area sensor 22 such as a CCD camera disposed on the inspection stage 20 so as to photograph at least one contact 14 for current test.

各接触子14は、図2から図5に示すように、上下方向へ伸びる取付部24と、取付部24の下端部から左右方向へ伸びるアーム部26と、アーム部26の先端部から下方へ突出する板状の台座部28と、台座部28の下端から下方へ突出する接触部30とを含む。取付部24、アーム部26及び台座部28は、この実施例においては、接触子本体として作用する。   As shown in FIG. 2 to FIG. 5, each contactor 14 includes an attachment portion 24 extending in the vertical direction, an arm portion 26 extending in the left-right direction from the lower end portion of the attachment portion 24, and downward from the tip portion of the arm portion 26. A projecting plate-like pedestal portion 28 and a contact portion 30 projecting downward from the lower end of the pedestal portion 28 are included. The mounting portion 24, the arm portion 26, and the pedestal portion 28 function as a contact body in this embodiment.

上記の接触子本体は、後に説明するように台座部の一部(接触部32と一体の基部44)を除いて、ニッケル・リン合金(Ni−P)、ニッケル・タングステン合金(Ni−W)、ロジウム(Rh)、燐青銅、ニッケル(Ni)、パラジウム・コバルト合金(Pd−Co)、パラジウム・ニッケル・コバルト合金(Pd−Ni−Co)等、高靭性を有する導電性金属材料で同じ厚さ寸法を有する板の形に一体的に形成されている。   As will be described later, the contact body is made of nickel / phosphorus alloy (Ni-P), nickel / tungsten alloy (Ni-W) except for a part of the pedestal (base 44 integrated with the contact portion 32). Rhodium (Rh), phosphor bronze, nickel (Ni), palladium-cobalt alloy (Pd-Co), palladium-nickel-cobalt alloy (Pd-Ni-Co), etc. It is integrally formed in the shape of a plate having a vertical dimension.

接触部30は、ロジウムやタングステンのように、硬度が取付部24等の素材である金属材料のそれより高い導電性金属材料で作られている。図示の例では、接触部30の下端面は、被検査体12の電極に押圧されるように、上下方向へ伸びる仮想的な軸線に直角の平坦な針先32とされている。   The contact portion 30 is made of a conductive metal material whose hardness is higher than that of the metal material that is the material of the mounting portion 24 or the like, such as rhodium or tungsten. In the illustrated example, the lower end surface of the contact portion 30 is a flat needle tip 32 perpendicular to a virtual axis extending in the vertical direction so as to be pressed by the electrode of the device under test 12.

各接触子14の台座部28の少なくとも接触部30側の箇所の表面と、少なくとも針先32及びその近傍を除く接触部30の表面とは、光反射率が取付部24、アーム部26、台座部28及び接触部30の素材より低い皮膜34で覆われている。   The surface of the contact portion 30 side of at least the contact portion 30 side of each contactor 14 and the surface of the contact portion 30 excluding at least the needle tip 32 and the vicinity thereof have a light reflectivity of the mounting portion 24, arm portion 26, pedestal. It is covered with a film 34 lower than the material of the part 28 and the contact part 30.

被膜34は、亜鉛・ニッケル合金(Ni−Zn)、ニッケルスズ合金(Ni−Sn)、黒ロジウム、黒ルテニウム等、黒色に近い光沢の金属材料で形成することができる。特に、それらの金属材料は、取付部24、アーム部26及び台座部28の素材がニッケルの場合、赤色光の反射率が68.6%程度であるから、それを下回る光低反射率の金属材料を使用することができる。   The coating 34 can be formed of a glossy metal material close to black, such as zinc-nickel alloy (Ni—Zn), nickel tin alloy (Ni—Sn), black rhodium, or black ruthenium. In particular, when the material of the mounting portion 24, the arm portion 26 and the pedestal portion 28 is nickel, the reflectance of red light is about 68.6%. Material can be used.

図示の例では、アーム部26は、上下方向に間隔をおいて前後方向へ伸びる2つのアーム領域36,38と、両アーム領域36,38をそれらの先端部及び後端部においてそれぞれ連結する2つの連結領域40,42を備えている。   In the example shown in the figure, the arm portion 26 is connected to two arm regions 36 and 38 extending in the front-rear direction with an interval in the vertical direction, and two arm regions 36 and 38 are connected to each other at the front end portion and the rear end portion 2. Two connecting regions 40 and 42 are provided.

接触部30は、これの素材と同じ材料で製作されて台座部28の主たる素材に埋め込まれた基部44と一体的に製作されている。この基部44は、台座部28の一部として作用する。   The contact portion 30 is made of the same material as that of the base portion 44 and is integrally formed with the base portion 44 embedded in the main material of the pedestal portion 28. The base portion 44 functions as a part of the pedestal portion 28.

接触部30は、これを前後方向から見たとき截頭角錐形の形状を有しかつ基部44と一体的に製作された付け根部46を備える。このため、接触部30の左右方向の各面は、上下方向へ伸びる仮想的な軸線に対し傾斜している。   The contact portion 30 includes a base portion 46 having a truncated pyramid shape when viewed from the front-rear direction and manufactured integrally with the base portion 44. For this reason, each surface of the contact part 30 in the left-right direction is inclined with respect to a virtual axis extending in the up-down direction.

針先32は、付け根部46に一体的に製作された柱状の先端部48の下面とされている。しかし、針先32は、上下方向へ伸びる仮想的な軸線に対し傾斜する面としてもよいし、角錐形や円錐形の先端のように先鋭な針先としてもよい。基部44、付け根部46及び柱状部48を形成している部材は、クランク状に曲げられている。   The needle tip 32 is a lower surface of a columnar tip portion 48 that is manufactured integrally with the base portion 46. However, the needle tip 32 may be a surface inclined with respect to a virtual axis extending in the up-down direction, or may be a sharp needle tip such as a pyramidal or conical tip. The members forming the base portion 44, the base portion 46, and the columnar portion 48 are bent into a crank shape.

各接触子14は、取付部24の上面において電気的接続装置16の下面に形成された平坦な導電性部(例えば、接続ランド)に半田付けのような導電性結合材により、片持ち梁状に取り付けられる。   Each contactor 14 has a cantilever shape by a conductive bonding material such as soldering on a flat conductive portion (for example, a connection land) formed on the lower surface of the electrical connection device 16 on the upper surface of the mounting portion 24. Attached to.

電気的接続装置16は、ガラス入りエポキシのような電気絶縁材料で製作された配線基板50と、配線基板50の下面に取り付けられたセラミック基板52と、セラミック基板52の下面に取り付けられたプローブ基板54と、配線基板50の上面に取り付けられた補強板56とを含む。   The electrical connection device 16 includes a wiring substrate 50 made of an electrically insulating material such as glass-filled epoxy, a ceramic substrate 52 attached to the lower surface of the wiring substrate 50, and a probe substrate attached to the lower surface of the ceramic substrate 52. 54 and a reinforcing plate 56 attached to the upper surface of the wiring board 50.

チャックトップ18は、集積回路12を真空的に吸着して移動不能に維持する。検査ステージ20は、チャックトップ18を、前後方向、左右方向及び上下方向の3方向に移動させる三次元移動機構とされていると共に、チャックトップ18を上下方向へ伸びる軸線の周りに角度的に回転させるθ移動機構を備えている。   The chuck top 18 holds the integrated circuit 12 in a vacuum and keeps it immovable. The inspection stage 20 is a three-dimensional movement mechanism that moves the chuck top 18 in three directions, the front-rear direction, the left-right direction, and the up-down direction, and rotates angularly around an axis that extends the chuck top 18 in the up-down direction. A θ moving mechanism is provided.

エリアセンサ22は、図1に示すように、光線58を集束して特定の接触子14の針先32に向けて指向させて針先32及びその近傍を照明し、針先32及びその近傍からの反射光を受光して電気信号に変換する。エリアセンサ22の出力信号は、特定の接触子14、特に針先32の座標位置を決定する画像処理装置に供給される。   As shown in FIG. 1, the area sensor 22 focuses the light beam 58 and directs it toward the needle tip 32 of the specific contact 14 to illuminate the needle tip 32 and the vicinity thereof, and from the needle tip 32 and the vicinity thereof. The reflected light is received and converted into an electrical signal. The output signal of the area sensor 22 is supplied to an image processing apparatus that determines the coordinate position of a specific contact 14, particularly the needle tip 32.

電気的試験装置10において、特定の接触子32に下方から照射される光線58は、接触部30の針先32及び台座部28の下面において反射される。   In the electrical test apparatus 10, the light beam 58 applied to the specific contact 32 from below is reflected on the needle tip 32 of the contact portion 30 and the lower surface of the pedestal portion 28.

しかし、接触子14は、台座部28の少なくとも接触部30側の箇所の表面と、少なくとも針先32及びその近傍を除く接触部32の表面とが、光反射率が台座部28や接触部30の素材のそれより低い皮膜で覆われているから、台座部28及び付け根部46の下面からエリアセンサ22に向けて進む反射光量が針先32からの反射光量に比べて著しく少ない。このため、特定の接触子14の針先32の位置を正確に決定することができる。   However, the contactor 14 has a light reflectivity at least on the surface of the pedestal portion 28 on the contact portion 30 side and at least the surface of the contact portion 32 excluding the needle tip 32 and the vicinity thereof. Therefore, the amount of reflected light traveling toward the area sensor 22 from the lower surfaces of the pedestal portion 28 and the base portion 46 is significantly smaller than the amount of reflected light from the needle tip 32. For this reason, the position of the needle tip 32 of the specific contactor 14 can be determined accurately.

実験によれば、接触子14では、エリアセンサ22の出力信号を処理して得た画像は、図9に示すように針先32の像60が明瞭に現れるにすぎなかった。   According to the experiment, in the contactor 14, the image obtained by processing the output signal of the area sensor 22 only showed the image 60 of the needle tip 32 clearly as shown in FIG.

これに対し、従来の接触子では、エリアセンサ22の出力信号を処理して得た画像は、図10に示すように針先32の像62の近傍に付け根部46の像64が明瞭に現れ、しかも台座部28の下面の像(図示せず)が像62の周りに現れた。   On the other hand, in the conventional contact, the image 64 obtained by processing the output signal of the area sensor 22 clearly shows the image 64 of the root 46 near the image 62 of the needle tip 32 as shown in FIG. In addition, an image (not shown) of the lower surface of the pedestal portion 28 appeared around the image 62.

上記の接触子14によれば、また、従来の接触子のように、鉛直面に対する台座部28の下面の角度を著しく小さくする必要がないから、台座部28と接触部30との連結箇所を細くする必要がなく、連結箇所の機械的強度を低下させる必要がない。   According to the contact 14 described above, unlike the conventional contact, it is not necessary to significantly reduce the angle of the lower surface of the pedestal portion 28 with respect to the vertical surface. There is no need to make it thinner, and there is no need to reduce the mechanical strength of the connection location.

[製造方法の実施例]   [Example of manufacturing method]

図6から図8を参照して、図2から図5に示す構造を有する接触子14の製造方法の一例について説明する。   An example of a method for manufacturing the contact 14 having the structure shown in FIGS. 2 to 5 will be described with reference to FIGS.

先ず、図6(A)に示すように、ステンレス製の板状のベース部材70が準備される。   First, as shown in FIG. 6A, a plate-like base member 70 made of stainless steel is prepared.

次いで、図6(B)に示すように、ベース部材70の上面にフォトレジスト層72が塗布等により形成される。   Next, as shown in FIG. 6B, a photoresist layer 72 is formed on the upper surface of the base member 70 by coating or the like.

次いで、図6(C)に示すように、フォトレジスト層72が、その一部をマスクされた状態で露光され、フォトレジスト層72が現像されて、フォトレジスト層72に凹所74が形成される。   Next, as shown in FIG. 6C, the photoresist layer 72 is exposed in a state where a portion thereof is masked, the photoresist layer 72 is developed, and a recess 74 is formed in the photoresist layer 72. The

次いで、図6(D)に示すように、電気メッキ技術、スパッタリング技術、蒸着技術等により、犠牲層76が凹所74内に形成される。   Next, as shown in FIG. 6D, a sacrificial layer 76 is formed in the recess 74 by an electroplating technique, a sputtering technique, a vapor deposition technique, or the like.

次いで、図6(E)に示すように、フォトレジスト層72が除去され、その代わりに、ベース部材70の一方の面及び犠牲層76にフォトレジスト層78が塗布等により形成される。   Next, as shown in FIG. 6E, the photoresist layer 72 is removed, and instead, a photoresist layer 78 is formed on one surface of the base member 70 and the sacrificial layer 76 by coating or the like.

次いで、図6(F)に示すように、フォトレジスト層78がその一部をマスクされた状態で露光され、フォトレジスト層78が現像されて、フォトレジスト層78に皮膜34の一部の平面形状に対応する平面形状を有する凹所80がフォトリソグラフィー技術により形成される。凹所80は、接触子本体の少なくとも接触部30の側の部位の表面と、少なくとも針先32及びその近傍を除く接触部30の表面とを模る平面形状を有する。   Next, as shown in FIG. 6F, the photoresist layer 78 is exposed in a state in which a part thereof is masked, the photoresist layer 78 is developed, and a plane of a part of the film 34 is formed on the photoresist layer 78. A recess 80 having a planar shape corresponding to the shape is formed by photolithography. The recess 80 has a planar shape imitating at least the surface of the contact main body on the side of the contact portion 30 and at least the surface of the contact portion 30 excluding the needle tip 32 and the vicinity thereof.

次いで、図7(A)に示すように、光反射率が取付部24、アーム部26、台座部28及び接触部30のそれより低い材料による第1の低反射皮膜82が凹所80内に堆積により形成される。   Next, as shown in FIG. 7A, the first low-reflection film 82 made of a material whose light reflectance is lower than that of the mounting portion 24, the arm portion 26, the pedestal portion 28, and the contact portion 30 is formed in the recess 80. Formed by deposition.

次いで、図7(B)に示すように、前記した基部44、付け根部46及び柱状部48を規定するクランク状の部材84が第1の低反射皮膜82の上に堆積により形成される。   Next, as shown in FIG. 7B, the crank-shaped member 84 that defines the base portion 44, the base portion 46, and the columnar portion 48 is formed on the first low reflection coating 82 by deposition.

第1の低反射皮膜82、部材84は、いずれも、電気メッキ技術、スパッタリング技術、蒸着技術等の堆積技術により、形成することができる。基部44、付け根部46及び柱状部48は、部材84として一体化されている。基部44は、前記したように台座部28の一部として作用する。   Both the first low-reflection coating 82 and the member 84 can be formed by a deposition technique such as an electroplating technique, a sputtering technique, or a vapor deposition technique. The base portion 44, the base portion 46, and the columnar portion 48 are integrated as a member 84. The base 44 acts as a part of the pedestal 28 as described above.

次いで、図7(C)に示すように、フォトレジスト層78が除去され、その代わりに、ベース部材70、犠牲層76及び部材84の上にフォトレジスト層86が塗布等により形成される。   Next, as shown in FIG. 7C, the photoresist layer 78 is removed, and instead, a photoresist layer 86 is formed on the base member 70, the sacrificial layer 76, and the member 84 by coating or the like.

次いで、図7(D)に示すように、フォトレジスト層86がその一部をマスクされた状態で露光、フォトレジスト層86が現像されて、取付部24、アーム部26及び台座28を含む接触子本体の平面形状に対応する平面形状を有する凹所88がフォトレジスト層に形成される。   Next, as shown in FIG. 7D, exposure is performed with the photoresist layer 86 partially masked, the photoresist layer 86 is developed, and contact including the mounting portion 24, the arm portion 26, and the pedestal 28 is performed. A recess 88 having a planar shape corresponding to the planar shape of the child body is formed in the photoresist layer.

次いで、図7(E)に示すように、取付部24、アーム部26、及び台座28の残部を規定する部材90が、電気メッキ技術、スパッタリング技術、蒸着技術等により、凹所88内に形成される。   Next, as shown in FIG. 7E, a member 90 that defines the mounting portion 24, the arm portion 26, and the rest of the pedestal 28 is formed in the recess 88 by electroplating technology, sputtering technology, vapor deposition technology, or the like. Is done.

次いで、図7(F)に示すように、フォトレジスト層86が除去され、その代わりに、ベース部材70の上面、犠牲層76、部材84及び部材90の上にフォトレジスト層92が塗布等により形成される。   Next, as shown in FIG. 7F, the photoresist layer 86 is removed. Instead, a photoresist layer 92 is applied on the upper surface of the base member 70, the sacrificial layer 76, the member 84, and the member 90 by coating or the like. It is formed.

次いで、図8(A)に示すように、フォトレジスト層92がその一部をマスクされた状態で露光され、フォトレジスト層92が現像されて、凹所94がフォトレジスト層92に形成される。凹所94は、接触子本体の少なくとも接触部30の側の部位の表面と、少なくとも針先32及びその近傍を除く接触部30の表面とを模る平面形状を有する。   Next, as shown in FIG. 8A, the photoresist layer 92 is exposed with a portion thereof masked, the photoresist layer 92 is developed, and a recess 94 is formed in the photoresist layer 92. . The recess 94 has a planar shape imitating at least the surface of the portion of the contact body on the side of the contact portion 30 and the surface of the contact portion 30 excluding at least the needle tip 32 and the vicinity thereof.

次いで、図8(B)に示すように、光反射率が取付部24、アーム部26、台座部28及び接触部30のそれより低い材料による第2の低反射皮膜96が凹所94内にあって部材84及び部材90の露出する部分に形成される。第2の低反射皮膜96も、電気メッキ技術、スパッタリング技術、蒸着技術等の堆積技術により形成することができる。   Next, as shown in FIG. 8B, a second low-reflection film 96 made of a material whose light reflectance is lower than that of the mounting portion 24, the arm portion 26, the pedestal portion 28, and the contact portion 30 is formed in the recess 94. Thus, the exposed portion of the member 84 and the member 90 is formed. The second low reflection coating 96 can also be formed by a deposition technique such as an electroplating technique, a sputtering technique, or a vapor deposition technique.

これにより、台座部28の少なくとも接触部30側の箇所の表面、及び少なくとも針先32及びその近傍を除く接触部30の表面が、台座部28等の素材である導電性材料より低い光低反射率の皮膜で覆われた接触子14が製作される。   As a result, at least the surface of the pedestal portion 28 on the side of the contact portion 30 and the surface of the contact portion 30 excluding at least the needle tip 32 and the vicinity thereof are lower in light reflection than the conductive material that is the material of the pedestal portion 28 and the like. A contact 14 covered with a rate coating is produced.

次いで、図8(C)に示すように、フォトレジスト層92が除去されて接触子14が露出されると共に、犠牲層76がエッチング等により除去される。   Next, as shown in FIG. 8C, the photoresist layer 92 is removed to expose the contacts 14, and the sacrificial layer 76 is removed by etching or the like.

次いで、図8(D)に示すように、ベース部材70に形成された接触子14がベース部材70から取り外される。   Next, as shown in FIG. 8D, the contact 14 formed on the base member 70 is removed from the base member 70.

[接触子の他の実施例]   [Other Embodiments of Contact]

図11に示すように、接触子14は、接触部30の付け根部46に続きかつ基部44から前後方向に間隔をおいて基部44と平行に下方へ伸びる他の基部44aを設けて、二股状の両基部44,44aを台座部28の主たる材料内に埋め込んでもよい。この場合、台座部28の主たる材料の両側面の一部は、二股状の基部44,44aにより挟むようにしてもよい。   As shown in FIG. 11, the contact 14 has a bifurcated shape by providing another base portion 44 a that extends from the base portion 44 of the contact portion 30 and extends downward in parallel to the base portion 44 at a distance from the base portion 44 in the front-rear direction. Both base portions 44 and 44 a may be embedded in the main material of the pedestal portion 28. In this case, part of both side surfaces of the main material of the pedestal portion 28 may be sandwiched between the bifurcated base portions 44 and 44a.

本発明は、半導体ウエーハに形成された未切断の集積回路の通電試験用のみならず、切断された集積回路の通電試験用としても用いることができる。   The present invention can be used not only for an energization test of an uncut integrated circuit formed on a semiconductor wafer, but also for an energization test of a cut integrated circuit.

本発明は、上記実施例に限定されず、その趣旨を逸脱しない限り、種々変更することができる。   The present invention is not limited to the above embodiments, and various modifications can be made without departing from the spirit of the present invention.

本発明に係る接触子を用いた電気的試験装置の一実施例を示す正面図である。It is a front view which shows one Example of the electrical test apparatus using the contactor which concerns on this invention. 本発明に係る接触子の一実施例を示す正面図である。It is a front view which shows one Example of the contactor which concerns on this invention. 図2に示す接触子の接触部近傍を拡大して示す正面図である。It is a front view which expands and shows the contact part vicinity of the contactor shown in FIG. 図3の左側面図である。FIG. 4 is a left side view of FIG. 3. 図3の底面図である。FIG. 4 is a bottom view of FIG. 3. 図2から図5に示す接触子の製造方法の一実施例を示す工程図である。It is process drawing which shows one Example of the manufacturing method of the contactor shown in FIGS. 図6に続く工程を説明するための図である。It is a figure for demonstrating the process following FIG. 図7に続く工程を説明するための図である。It is a figure for demonstrating the process following FIG. 本発明に係る接触子をエリアセンサで針先側から撮影して得た画像の一実施例を示す図である。It is a figure which shows one Example of the image acquired by image | photographing the contactor which concerns on this invention from the needle tip side with an area sensor. 従来の接触子をエリアセンサで針先側から撮影して得た画像の一実施例を示す図である。It is a figure which shows one Example of the image obtained by image | photographing the conventional contactor from the needle-tip side with an area sensor. 本発明に係る接触子の他の実施例を示す、図4と同様の側面図である。FIG. 5 is a side view similar to FIG. 4, showing another embodiment of the contact according to the present invention.

符号の説明Explanation of symbols

10 電気的試験装置
12 被検査体
14 接触子
24 取付部
26 アーム部
28 台座部
30 接触部
32 針先
34 被膜
70 基板
72,78,86,92 フォトレジスト
74,80,88,94凹所
76 犠牲層
82,96 第1及び第2の光低反射皮膜
84,90 部材
DESCRIPTION OF SYMBOLS 10 Electrical test apparatus 12 Inspected object 14 Contact 24 Attachment part 26 Arm part 28 Base part 30 Contact part 32 Needle tip 34 Coating 70 Substrate 72, 78, 86, 92 Photoresist 74, 80, 88, 94 Recess 76 Sacrificial layer 82,96 1st and 2nd light low reflection film 84,90 member

Claims (8)

上下方向へ伸びる板状の取付部、該取付部の下端部から左右方向における少なくとも一方の側へ伸びる板状のアーム部及び該アーム部の先端部から下方へ突出する板状の台座部を備える接触子本体と、前記台座部の下端から下方へ突出する接触部であって当該接触部の下端を針先とする接触部とを含み、
前記取付部、前記アーム部及び前記台座部は導電性金属材料で板状に形成されており、
前記接触部の硬度は前記金属材料のそれより高く、
前記台座部の少なくとも前記接触部側の箇所の表面と、少なくとも前記針先及びその近傍を除く前記接触部の表面とは、光反射率が前記導電性材料より低い皮膜で覆われている、電気試験用接触子。
A plate-shaped mounting portion extending in the vertical direction, a plate-shaped arm portion extending from the lower end portion of the mounting portion to at least one side in the left-right direction, and a plate-shaped pedestal portion protruding downward from the distal end portion of the arm portion. A contact body, and a contact portion protruding downward from the lower end of the pedestal portion, the contact portion having the lower end of the contact portion as a needle tip,
The mounting portion, the arm portion, and the pedestal portion are formed in a plate shape with a conductive metal material,
The hardness of the contact portion is higher than that of the metal material,
The surface of at least the contact portion side of the pedestal portion and the surface of the contact portion excluding at least the needle tip and the vicinity thereof are covered with a film having a light reflectance lower than that of the conductive material. Test contact.
前記皮膜は、可視光の反射率が前記金属材料のそれより低い材料で形成されている、請求項1に記載の電気試験用接触子。   The contact for electrical testing according to claim 1, wherein the film is made of a material having a visible light reflectance lower than that of the metal material. 前記被膜は、電気メッキ技術、スパッタリング技術及び蒸着技術を含むグループから選択された少なくとも1つにより形成されている、請求項1に記載の電気試験用接触子。   The electrical test contact according to claim 1, wherein the coating is formed by at least one selected from the group including an electroplating technique, a sputtering technique, and a vapor deposition technique. 前記アーム部は前記取付部の下端部から左右方向における一方の側へ伸びている、請求項1に記載の電気試験用接触子。   The contact for an electrical test according to claim 1, wherein the arm portion extends from a lower end portion of the attachment portion to one side in the left-right direction. 接触子本体と、該接触子本体から突出して先端を針先とする接触部とを備える接触子を製造する方法であって、
前記接触子本体の少なくとも前記接触部の側の部位の表面と、少なくとも前記針先及びその近傍を除く前記接触部の表面とを模る第1の凹所を有する第1のフォトレジスト層をベース部材の上に形成し、前記第1の凹所に低光反射率を有する材料の堆積により第1の低反射皮膜を前記第1の凹所に形成する第1の工程と、
前記第1の低反射皮膜より光反射率が高い導電性材料の堆積により前記接触子本体の少なくとも前記接触部の側の部位と、少なくとも前記針先及びその近傍を除く前記接触部の部位とを前記第1の低反射皮膜の上に形成する第2の工程と、
前記第1のフォトレジスト層を除去した後、前記接触子本体の残部を模る第2の凹所を有する第2のフォトレジスト層を前記ベース部材の上に形成し、導電性材料の堆積により前記接触子本体の残部を前記第2の凹所に形成する第3の工程と、
前記第2のフォトレジスト層を除去し、前記接触子本体の少なくとも前記接触部の側の部位の表面と、少なくとも前記針先及びその近傍を除く前記接触部の表面とを模る第3の凹所を有する第3のフォトレジスト層をベース部材の上に形成し、前記第3の凹所に低光反射率を有する材料の堆積により第2の低反射皮膜を前記第3の凹所に形成する第4の工程と、
前記接触子本体、前記接触部、前記第1の低反射皮膜及び第2の低反射皮膜を前記ベース部材から分離する第5の工程とを含む、電気試験用接触子の製造方法。
A method of manufacturing a contactor comprising a contactor body and a contact part protruding from the contactor body and having a tip as a needle tip,
Based on a first photoresist layer having a first recess imitating at least the surface of the contact main body on the side of the contact portion and at least the surface of the contact portion excluding the needle tip and the vicinity thereof Forming a first low reflection coating on the first recess by depositing a material having a low light reflectance on the first recess; and
By depositing a conductive material having a light reflectance higher than that of the first low-reflection coating, at least a portion on the contact portion side of the contact body, and at least the portion of the contact portion excluding the needle tip and the vicinity thereof. A second step of forming on the first low reflection coating;
After removing the first photoresist layer, a second photoresist layer having a second recess imitating the remainder of the contactor body is formed on the base member, and a conductive material is deposited. A third step of forming the remainder of the contactor body in the second recess;
The second photoresist layer is removed, and a third recess imitating at least the surface of the contact body on the side of the contact portion and the surface of the contact portion excluding at least the needle tip and the vicinity thereof A third photoresist layer having a point is formed on the base member, and a second low reflection film is formed in the third recess by depositing a material having a low light reflectance in the third recess. A fourth step of
And a fifth step of separating the contact main body, the contact portion, the first low-reflection coating and the second low-reflection coating from the base member.
前記第1及び第2の低反射皮膜は、前記取付部、前記アーム部、前記台座部及び前記接触部よりも可視光に対する反射率が低い材料で形成される、請求項5に記載の製造方法。   The manufacturing method according to claim 5, wherein the first and second low-reflection coatings are formed of a material having a lower reflectance with respect to visible light than the attachment portion, the arm portion, the pedestal portion, and the contact portion. . 前記第1及び第2の低反射被膜は、電気メッキ技術、スパッタリング技術及び蒸着技術を含むグループから選択された少なくとも1つにより形成される、請求項5に記載の製造方法。   The manufacturing method according to claim 5, wherein the first and second low reflection coatings are formed by at least one selected from the group including an electroplating technique, a sputtering technique, and a vapor deposition technique. 前記第2の工程は高硬度の導電性材料を前記第1の低反射皮膜の上に堆積させることを含み、前記第3の工程は高靱性の導電性材料を前記第2の凹所に堆積させることを含む、請求項5に記載の製造方法。   The second step includes depositing a high hardness conductive material on the first low reflective coating, and the third step deposits a high tough conductive material in the second recess. The manufacturing method according to claim 5, further comprising:
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JP2002005957A (en) * 2000-06-15 2002-01-09 Tokyo Electron Ltd Contact pin
JP2004138393A (en) * 2002-10-15 2004-05-13 Umc Japan Cantilever type probe card and its manufacturing method
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WO2006075408A1 (en) * 2005-01-14 2006-07-20 Kabushiki Kaisha Nihon Micronics Continuity testing probe
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