JP2009115867A - Manufacturing method of reflection film and reflection film - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a reflection film by which the reflection film formed by laminating an undercoat layer, a metallic thin film layer and a topcoat layer in order on a synthetic resin film as a base material can be obtained and further whole thickness can be made thinner and to provide the reflection film obtained by the manufacturing method. <P>SOLUTION: The manufacturing method of the reflection film comprises an undercoat layer laminating process of laminating the undercoat layer on a surface of a polymer resin film as the base material, a metal laminating process of laminating a metallic layer and a topcoat layer laminating process of laminating the topcoat layer. The undercoat layer laminating process, the metal laminating process and the topcoat layer laminating process are based on a dry coating method and these processes are carried out in order of description. Further the reflection film obtained by the method is also provided. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a method for producing a reflective film with improved quality and a reflective film obtained by the production method, and specifically, improved interlayer adhesion, appearance, layer surface uniformity, etc. The present invention relates to a reflective film manufacturing method and a reflective film obtained by the manufacturing method.

  Liquid crystal display devices are used as image display devices for mobile phones, computers, televisions, etc., but this can be made much thinner than conventional cathode ray tube display devices and can be easily reduced in size. There is an advantage that. In particular, it can be said that the demand for the use of this liquid crystal display device is rapidly increasing with the increasing demand for lightness, thinness and miniaturization, which has been noticeable recently.

  Now, in such a liquid crystal display device, a backlight device is usually provided so that the liquid crystal display portion can be clearly seen, but the light emitted from the light source in this backlight device is ultimately efficient. In addition, a mechanism for reaching the liquid crystal display element is required. This is because in the liquid crystal display device, the liquid crystal display portion becomes clearer by illuminating the display portion more strongly from the back.

  For example, in order to allow light rays emitted from a light source in a backlight device using a cold cathode tube as a light source to efficiently reach the liquid crystal display device, the backlight device has a light source for directing all the light rays emitted from the light source to the liquid crystal display device. A light source reflector is installed in a substantially semi-enclosed state. By this light source reflector, the light emitted from the light source is directed in one direction. In addition, when an LED (light emitting diode), which has been widely used recently, is used as a light source, light can be emitted toward the light guide plate without using such a light source reflector. A light guide plate is installed at the destination of the light beam, and the light beam incident on the light guide plate is emitted toward the liquid crystal plate. However, even in this case, not all light rays are emitted in the same direction, and light rays are emitted in unnecessary directions. That is, the light beam emitted from the light source may be directed directly to the liquid crystal display device, but it is necessary to return the light beam that has been spilled from the light guide plate, that is, directed toward the unnecessary direction, to the light guide plate again. For this purpose, a configuration is provided in which a reflection film that reflects the light beam is installed in a position corresponding to an unnecessary direction in which the light beam is emitted, and the light beam that has been emitted in an unnecessary direction is returned to the light guide plate again. The provided backlight device is employed in a liquid crystal display device.

  As described above, in order to effectively use the light reflected from the reflection film in the current liquid crystal display device, the light reflected from the reflection film must correctly reach the liquid crystal display device through the light guide plate. For this purpose, for example, a reflective film as described in Patent Document 1 has been proposed.

Japanese Patent Laid-Open No. 06-167709

The reflective film described in Patent Document 1 employs a configuration in which a film in which a metal thin film layer is laminated on the surface of a synthetic resin film and a support having an electric resistivity of 10 ² Ω · m or more are laminated. In this way, it is said that a reflector having insulating properties can be obtained while maintaining high reflection efficiency.

  As described above, the high reflection efficiency is achieved while maintaining the insulating property as described above. However, when the reflective film having the actual configuration is used, silver used as a metal thin film layer is easily sulfided. It is widely known that the reflection efficiency is suddenly lowered due to darkening. Therefore, in order to prevent such a phenomenon, it is widely practiced to laminate a corrosion-resistant layer as a top coat layer on the surface of the metal layer. It has been broken. At the same time, in order to prevent the synthetic resin film and the metal thin film layer from easily peeling off, an undercoat layer is also widely provided between these layers in order to secure the interlayer adhesion. It has been broken. Furthermore, it is widely known that the undercoat layer needs to have anticorrosion properties, and various countermeasures have been implemented.

  However, both the topcoat layer and the undercoat layer are often performed using a resin, and as the topcoat layer, for example, a transparent metal layer may be laminated. As a method, a so-called wet coating method such as a gravure coating method is mainly used.

  That is, in order to protect the metal thin film layer of the reflective film described in Patent Document 1, the top coat layer is laminated, and in order to ensure the interlayer adhesion between the synthetic resin film serving as the substrate and the metal thin film layer. Laminating an undercoat layer between these layers was widely performed, but these layers were all laminated by the wet coating method. Because of the downsizing of the device involved, the condition that the reflective film is even thinner, the metal thin film layer is not sulfided or deteriorated, and further, the base film and the metal thin film layer are not easily peeled off. There is a strong desire to maintain.

  In addition, the recent market demand is to further improve the appearance. This is due to the situation where it has become unusable now because there is a minute appearance defect that was not considered as an important problem before, due to the recent demand for higher quality. In the manufacturing method according to the procedure of the conventional wet coating method → dry coating method → wet coating method as described in Patent Document 1 described above, dust in the atmosphere is generated when the intermediate product is transferred at each stage. The problem that a large amount of appearance defects occur due to adhesion to the surface of an object has been recognized as a serious problem, and in this respect also the realization of a new manufacturing method has been realized. It is becoming desirable.

  Therefore, the present invention has been made in view of such problems, and the object thereof is a general configuration of a conventional reflective film, which has a synthetic resin film as a base material and an undercoat layer and a metal thin film on the surface thereof. A reflective film produced by sequentially laminating a layer and a topcoat layer, and a method for producing a reflective film capable of further reducing the overall thickness, and a reflective film obtained by the production method That is.

  In order to solve the above-mentioned problems, the invention relating to the method for producing a reflective film according to claim 1 of the present invention includes at least an undercoat lamination step of laminating an undercoat layer on the surface of a polymer resin film serving as a substrate. A method for producing a reflective film comprising a metal laminating step for laminating a metal layer, a topcoat laminating step for laminating a topcoat layer, and the undercoat layer laminating step is based on a dry coating method, The metal laminating step is performed by a dry coating method and is performed after the undercoat layer laminating step is completed, the top coat layer laminating step is performed by a dry coating method, and the It is characterized in that it is performed after the metal lamination step is completed.

  The invention relating to the method for producing a reflective film according to claim 2 of the present invention is the method for producing a reflective film according to claim 1, wherein the dry coating method is a vacuum deposition method, an ion plating method, or sputtering. Or any one of a plurality of laws.

  The invention relating to the method for producing a reflective film according to claim 3 of the present invention is the reflective film according to claim 1 or 2, wherein the undercoat layer and the topcoat layer are formed of silicon oxide. , Titanium oxide, zinc oxide, niobium, tin-indium, zinc sulfide, silicon nitride, aluminum oxide, or a compound containing any one or more of these, and the metal layer And / or a mixture or alloy using either or both of silver and aluminum, or both.

  The invention relating to the method for producing a reflective film according to claim 4 of the present invention is the method for producing a reflective film according to any one of claims 1 to 3, wherein the thickness of the undercoat layer is 10 nm. The thickness is 500 nm or less, the thickness of the metal layer is 10 nm or more and 500 nm or less, and the thickness of the top coat layer is 10 nm or more and 500 nm or less.

  The invention relating to the method for producing a reflective film according to claim 5 of the present invention includes an undercoat lamination step of laminating an undercoat layer on a surface of a polymer resin film serving as a substrate, and a metal lamination step of laminating silver. A method for producing a reflective film comprising: a topcoat layering step for laminating a topcoat layer, wherein the undercoat layer layering step comprises silicon oxide, titanium oxide, zinc oxide, niobium, tin oxide-indium, zinc sulfide. Any one or more of silicon nitride, aluminum oxide, or a compound containing any one or more of these is laminated by sputtering, and the metal lamination step is either or both of silver and aluminum, or A mixture or alloy using either or both is laminated by sputtering. And the top coat layer laminating step is performed after the undercoat layer laminating step is completed, and the top coat layer laminating step is performed by silicon oxide, titanium oxide, zinc oxide, niobium, tin oxide-indium, zinc sulfide, silicon nitride, aluminum oxide. Any one or more of these, or a compound containing any one or more of these is laminated by a sputtering method, and is performed after the metal lamination step is completed, and the thickness of the undercoat layer Is from 10 nm to 500 nm, the thickness of the metal layer is from 10 nm to 500 nm, and the thickness of the topcoat layer is from 10 nm to 500 nm.

  The invention related to the reflective film according to claim 6 of the present invention is characterized by being obtained by the method for producing a reflective film according to any one of claims 1 to 5.

  As described above, if it is a manufacturing method of a reflective film according to the present invention, each layer laminated on the surface of the film as a base material is laminated by a process called the same dry coating method. The time required for the process can be greatly shortened, and a finished product can be obtained at once with one apparatus.

  That is, in the conventional case, for example, when a lamination process by a wet coating method is performed first, followed by a lamination process by a dry coating method, and finally by a lamination process by a wet coating method, one step is one paragraph. When the process is completed, the intermediate product at that stage is transferred to another device and the next process is performed.After that, the intermediate product is transferred again to another device and the final process is performed. In the manufacturing method according to the present invention, it was necessary to transfer the intermediate product at every interval. Since all layers were formed by the same dry coating method, for example, sputtering, the conditions for sputtering performed three times If all the materials are prepared, once the base material is inserted into the apparatus that first executes the sputtering method, the final process is carried out without taking out the intermediate from the apparatus. In addition to being able to execute each lamination process in the same device, since it can shorten the time required to obtain a finished product as a laminate, it is not necessary to move between devices as a whole. It is possible to obtain an effect that a finished product can be made at once with the same apparatus, and that a finished product can be obtained in a shorter time than in the past.

  In addition to the recent strong market demand that the appearance should be further improved, if it is a manufacturing method of a reflective film according to the present invention, as described above, it can be completed at once in the same apparatus. From the point that it can be done conventionally, when transferring the intermediate product in each stage of the production process, dust in the atmosphere adheres to the product surface, which causes a lot of appearance defects due to this. As a result, it has become possible to obtain a manufacturing method in which the appearance defects are hardly generated.

  Furthermore, since each layer is made by dry coating, the thickness of each layer to be laminated can be made uniform compared to the case by wet coating, and the surface can be made smoother. In addition, since each layer is made by a dry coating method, the thickness of the entire laminate can be reduced, so that a reflective film is manufactured in accordance with the current situation where a lighter, thinner and smaller size is required. In addition, the reflective film obtained by the method for manufacturing a reflective film according to the present invention has the same effect, i.e., the entire thickness can be reduced, and the performance is easy to stabilize because the layer thickness is uniform. Can be obtained.

Embodiments of the present invention will be described below. The embodiment shown here is merely an example, and is not necessarily limited to this embodiment.
(Embodiment 1)
The manufacturing method of the reflective film which concerns on this invention is demonstrated as 1st Embodiment.

  The method for producing a reflective film according to the present embodiment includes at least an undercoat lamination step of laminating an undercoat layer on a surface of a polymer resin film serving as a substrate, a metal lamination step of laminating a metal layer, and a top A top coat laminating step for laminating a coat layer and a method for producing a reflective film. These undercoat layer laminating step, metal laminating step, and topcoat layer laminating step are all based on a technique called dry coating, and the undercoat layer laminating step, metal laminating step, and topcoat layer laminating step They are executed in order.

  The dry coating method in the present embodiment refers to a technique such as a vacuum deposition method, an ion plating method, or a sputtering method, and the sputtering method is used in the following description.

  First of all, it is a plastic film as a base material. This may be a commonly used plastic film, for example, a transparent film such as a polyethylene terephthalate (PET) film, or to improve reflectance. For example, a white film such as a white PET film may be used, and further, an olefin film, a polycarbonate (PC) film, a polyether sulfone (PES) film, etc. may be used. This PET film is used.

  The thickness of the plastic film as the base material is not particularly limited. For example, the thickness is preferably 20 μm or more and 400 μm or less. However, when the thickness is 400 μm or more, the thickness of the entire reflective film according to the present embodiment. When the thickness is 20 μm or less, the base film itself is damaged or the obtained reflective film is easily damaged when the thickness is 20 μm or less. This is because the necessary “strain” cannot be obtained for the obtained reflection film itself, so that problems such as being too soft to be practically used in actual use tend to occur.

  Next, an anchor coat layer laminating step for laminating an anchor coat layer provided on the surface of the plastic film will be described.

  This anchor coat layer is provided so that the above-described base film and the metal vapor deposition layer described later are not easily peeled off, and the material is not particularly limited. Since the dry coating method is used as described above, the material can be laminated by the dry coating method, for example, any one of silicon oxide, titanium oxide, zinc oxide, niobium, tin-indium, zinc sulfide, silicon nitride, and aluminum oxide. May be used as a raw material. The details of the dry coating method will be described later.

  When the anchor coat layer laminating step is finished, a metal laminating step for laminating metal on the surface of the laminated anchor coat layer is executed. Also in this step, as described above, the dry coating method is used, and there are no particular restrictions on the metal to be laminated. For example, either silver or aluminum, or both of these may be used. In this embodiment, silver is stacked. The details of the dry coating method for performing this metal lamination step will also be described later.

  When the metal layer is stacked by performing the metal stacking step, a topcoat layer stacking step of stacking a topcoat layer on the surface is further performed. This topcoat layer is laminated in order to prevent a metal layer formed by laminating silver, for example, from being exposed to the outside air and being sulfided and darkened, and the material is not particularly limited. In the embodiment, since the dry coating method is used as described above, materials that can be stacked by the dry coating method, for example, silicon oxide, titanium oxide, zinc oxide, niobium, tin oxide-indium, zinc sulfide, silicon nitride, aluminum oxide, Any one may be used as a raw material. The details of the dry coating method will be described later.

  By sequentially executing the steps described above, an undercoat layer is laminated on the surface of the base plastic film, and a metal layer and a topcoat layer are laminated on the surface in this order to obtain the reflective film according to the present embodiment. I can do it.

Here, the dry coating method executed in each step will be described.
Conventionally, the undercoat layer laminating step and the topcoat layer laminating step described above were performed by a so-called wet coating method such as a gravure coating method or a bar coating method, but the laminating step by these wet coating methods was used. In this case, when this method is observed alone, it is advantageous in terms of manufacturing cost and simplicity of the apparatus, but in order to stack the metal vapor deposition layer that is essential in the reflective film according to the present embodiment, the dry coating method is used. Therefore, undercoat layer lamination process = wet coating method, metal vapor deposition layer lamination process = dry coating method, topcoat layer lamination process = wet coating method, and a process for producing a reflective film When the whole is observed, the wet coating method is implemented. Manufacturing equipment and equipment for performing the dry coating method are required, and since the intermediate in the lamination must be transported between these equipments every time the lamination process is completed, the production efficiency is very poor. I didn't get it.

  Furthermore, as explained in the prior art, when transferring the intermediate product at each stage in the production process, dust in the atmosphere adheres to the product surface, which causes a large number of appearance defects. However, in the manufacturing method of the reflective film according to the present embodiment, all necessary steps are dry coating methods, but in each lamination step, If all dry coating methods are performed under the same method and under the same conditions, all processes can be completed with a single device. Since it is not necessary to transfer the product at all, it is possible to easily suppress the appearance defects caused by dust in the atmosphere. That.

  Considering from another point of view, there is an electronic component that is desired to be light and thin recently, and the reflection film according to the present embodiment is also desired to be light and thin, but at the same time, the performance can be further improved. It is desired. In other words, there are limits to the wet coating method for thinning the reflective film, and there is also a limit to homogenizing the laminated surface. By using the dry coating method, the thickness of the layer that exhibits equivalent performance can be reduced. It is possible to make it much thinner than in the case of the wet coating method, and it is possible to make the performance as a reflective film higher by smoothing the laminated surface.

  For this reason, in the manufacturing method of the reflective film according to the present embodiment, the three laminating steps are performed by an equivalent dry coating method.

  And in this embodiment, among the various dry coating methods, it is assumed that the layers are laminated by the sputtering method, which is because it is preferable to use the sputtering method to perform metal vapor deposition when manufacturing the reflective film, In the present embodiment, as the metal vapor deposition layer is executed by the sputtering method, the equivalent sputtering method is also used in the undercoat layer lamination step and the topcoat layer lamination step.

  For example, a metal vapor deposition layer is formed by performing an undercoat layer laminating step by sputtering using zinc oxide as a raw material, and then performing a sputtering method in the same environment as the undercoat layer laminating step by using silver as a raw material. A base film / ZnO / is performed by performing a laminating step and further performing a top coat layer laminating step by performing sputtering under the same environment as the undercoat layer laminating step using zinc oxide as a raw material. A laminate having a structure of Ag / ZnO can be obtained.

  As described above, all the three steps are performed by the same method, so that the labor involved in manufacturing is considerably reduced, and the thickness of each layer can be reduced by using the dry coating method. Therefore, it is possible to obtain a reflective film that is thinner than the conventional one. For example, the thickness of the undercoat layer is 10 nm or more and 500 nm or less, the thickness of the metal vapor deposition layer is 10 nm or more and 500 nm or less, the thickness of the topcoat layer is 10 nm or more and 500 nm or less, and the thickness of the plastic film serving as the substrate is 25 μm or more and 400 μm or less It is understood that it is possible to make the entire thickness thinner than the thickness of the conventional reflective film, and the thickness was equivalent to that of the conventional reflective film. Since it is unlikely that problems such as so-called heat wrinkles will occur if it is obtained by the method for producing a reflective film according to the embodiment, the performance of the obtained reflective film shall be higher than the conventional one. The rate of appearance defects is very low compared to conventional products, that is, the appearance is also very beautiful. A reflective film can be easily obtained.

  In addition, the structure called the so-called “two-sheet sticking” in which a metal vapor-deposited film or a white PET film is separately attached to the base film side or the top coat layer side of the reflective film obtained by the reflective film manufacturing method described above. However, further details are omitted here.

  Thus, if it is the manufacturing method of the reflective film which concerns on this Embodiment demonstrated above, not only a desired reflective film can be obtained at a stretch in the same apparatus, but each layer is laminated | stacked by the dry-coating method. As a result, while maintaining or improving the performance, the overall thickness can be reduced as compared with the case where the wet coating method is used. The resulting reflective film can have the above characteristics.

Claims (6)

At least an undercoat layering step of laminating an undercoat layer on the surface of a polymer resin film serving as a substrate, a metal layering step of laminating a metal layer, and a topcoat layering step of laminating a topcoat layer A method of manufacturing a reflective film,
The undercoat layer laminating step is based on a dry coating method,
The metal lamination step is performed by a dry coating method and is performed after the undercoat layer lamination step is completed,
The topcoat layer laminating step is performed by a dry coating method and is performed after the metal laminating step is completed;
A method for producing a reflective film. It is a manufacturing method of the reflective film according to claim 1,
The dry coating method is one or more of a vacuum deposition method, an ion plating method, or a sputtering method;
A method for producing a reflective film. The reflective film according to claim 1 or 2,
The undercoat layer and the topcoat layer are
Silicon oxide, titanium oxide, zinc oxide, niobium, tin-indium, zinc sulfide, silicon nitride, aluminum oxide, or a compound containing any or more of these,
The metal layer is formed of either or both of silver and aluminum, or a mixture or alloy using either or both;
A method for producing a reflective film. A method for producing a reflective film according to any one of claims 1 to 3,
The thickness of the undercoat layer is 10 nm or more and 500 nm or less,
The metal layer has a thickness of 10 nm to 500 nm,
The top coat layer has a thickness of 10 nm to 500 nm,
A method for producing a reflective film. An undercoat lamination process for laminating an undercoat layer on the surface of a polymer resin film as a substrate, a metal lamination process for laminating silver, a topcoat lamination process for laminating a topcoat layer, and a reflective film comprising A manufacturing method comprising:
The undercoat layer laminating step is any one or more of silicon oxide, titanium oxide, zinc oxide, niobium, tin-indium, zinc sulfide, silicon nitride, aluminum oxide, or a compound containing any or more of these. Are laminated by sputtering,
The metal laminating step is performed by laminating a mixture or alloy using either or both of silver and aluminum, or either or both by a sputtering method, and is performed after the undercoat layer laminating step is completed. Is,
The topcoat layer laminating step is any one or more of silicon oxide, titanium oxide, zinc oxide, niobium, tin-indium, zinc sulfide, silicon nitride, aluminum oxide, or a compound containing any or more of these. Is performed by a sputtering method, and is performed after the metal lamination step is completed,
The thickness of the undercoat layer is 10 nm or more and 500 nm or less,
The metal layer has a thickness of 10 nm to 500 nm,
The top coat layer has a thickness of 10 nm to 500 nm,
A method for producing a reflective film.   A reflective film obtained by the method for producing a reflective film according to any one of claims 1 to 5.