JP2009115835A5 - - Google Patents
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- Publication number
- JP2009115835A5 JP2009115835A5 JP2007285127A JP2007285127A JP2009115835A5 JP 2009115835 A5 JP2009115835 A5 JP 2009115835A5 JP 2007285127 A JP2007285127 A JP 2007285127A JP 2007285127 A JP2007285127 A JP 2007285127A JP 2009115835 A5 JP2009115835 A5 JP 2009115835A5
- Authority
- JP
- Japan
- Prior art keywords
- resin composition
- photosensitive resin
- negative photosensitive
- mass
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000011342 resin composition Substances 0.000 claims 6
- FAYMLNNRGCYLSR-UHFFFAOYSA-M Triphenylsulfonium triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 FAYMLNNRGCYLSR-UHFFFAOYSA-M 0.000 claims 3
- 229920001955 polyphenylene ether Polymers 0.000 claims 3
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 125000004432 carbon atoms Chemical group C* 0.000 claims 2
- 238000004132 cross linking Methods 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 2
- 239000003377 acid catalyst Substances 0.000 claims 1
- 150000001454 anthracenes Chemical class 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 239000003431 cross linking reagent Substances 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 125000004435 hydrogen atoms Chemical class [H]* 0.000 claims 1
- 150000002790 naphthalenes Chemical class 0.000 claims 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
Claims (7)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007285127A JP5099336B2 (en) | 2007-11-01 | 2007-11-01 | Negative photosensitive resin composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007285127A JP5099336B2 (en) | 2007-11-01 | 2007-11-01 | Negative photosensitive resin composition |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009115835A JP2009115835A (en) | 2009-05-28 |
| JP2009115835A5 true JP2009115835A5 (en) | 2010-12-09 |
| JP5099336B2 JP5099336B2 (en) | 2012-12-19 |
Family
ID=40783084
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007285127A Expired - Fee Related JP5099336B2 (en) | 2007-11-01 | 2007-11-01 | Negative photosensitive resin composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5099336B2 (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5656413B2 (en) | 2009-01-30 | 2015-01-21 | 富士フイルム株式会社 | Negative resist pattern forming method, developer and negative chemically amplified resist composition used therefor, and resist pattern |
| JP5520590B2 (en) * | 2009-10-06 | 2014-06-11 | 富士フイルム株式会社 | Pattern forming method, chemically amplified resist composition, and resist film |
| JP5267415B2 (en) * | 2009-10-14 | 2013-08-21 | Ｊｓｒ株式会社 | Resin composition and use thereof |
| JP5723626B2 (en) * | 2010-02-19 | 2015-05-27 | 富士フイルム株式会社 | Pattern forming method, chemically amplified resist composition, and resist film |
| JP5771361B2 (en) * | 2010-04-22 | 2015-08-26 | 富士フイルム株式会社 | Pattern formation method, chemically amplified resist composition, and resist film |
| CN110032040B (en) * | 2018-01-12 | 2020-09-22 | 中国科学院化学研究所 | Chemical amplification glue composition and application thereof in ultraviolet photoetching |
| CN115785455B (en) * | 2022-12-02 | 2023-10-10 | 广东粤港澳大湾区黄埔材料研究院 | Polyphosphate film-forming resin and photoresist composition |
| CN115959974B (en) * | 2022-12-28 | 2024-05-28 | 天津泰合利华材料科技有限公司 | Preparation method of 3,3', 5' -tetramethoxymethyl diphenyl diphenol |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001033964A (en) * | 1999-07-15 | 2001-02-09 | Hitachi Chem Co Ltd | Negative type photosensitive resin composition, production of pattern and electronic parts |
| JP2002251014A (en) * | 2001-02-27 | 2002-09-06 | Sumitomo Chem Co Ltd | Chemical amplification type resist composition |
| JP4501390B2 (en) * | 2003-09-29 | 2010-07-14 | 日本合成化学工業株式会社 | Blue-violet semiconductor laser photosensitive image forming material |
-
2007
- 2007-11-01 JP JP2007285127A patent/JP5099336B2/en not_active Expired - Fee Related
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