JP2009079243A - Partial plating method and apparatus therefor - Google Patents

Partial plating method and apparatus therefor Download PDF

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JP2009079243A
JP2009079243A JP2007248127A JP2007248127A JP2009079243A JP 2009079243 A JP2009079243 A JP 2009079243A JP 2007248127 A JP2007248127 A JP 2007248127A JP 2007248127 A JP2007248127 A JP 2007248127A JP 2009079243 A JP2009079243 A JP 2009079243A
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plated
plating
rotating plate
contact
plating solution
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JP5032932B2 (en
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Masahide Maruyama
雅秀 丸山
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Panasonic Electric Works Co Ltd
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Panasonic Electric Works Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To plate only a required part of an article to be plated, with a simple process at a high speed. <P>SOLUTION: This plating method includes: making a plating solution 40 adhere to a peripheral part of a rotary plate 3 to be rotationally driven, by bringing a part of the rotary plate 3 in contact with the plating solution 40; and electroplating the part 11, which is desired to be plated, of the article 1 to be plated, by bringing the plating solution 40 adhering to the perimeter of the rotary plate 3 in contact with the part 11 to be plated, when the peripheral part of the rotary plate 3 passes the vicinity of the part 11, which is desired to be plated, of the article 1 to be plated. The plating method can plate only the desired part to be plated by bringing the plating solution in contact with the part to be plated through the rotary plate. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、被めっき物の一部のみにめっきを行うための部分めっき方法及びその装置に関するものである。   The present invention relates to a partial plating method and apparatus for plating only a part of an object to be plated.

被めっき物の一部のみにめっきを行うめっき方法として、ブラシめっき法やスパージャーめっき法が知られている。これらの中で部分めっきという点について着目されたものとして、前者では特許文献2に、後者では特許文献1に示されたものがある。   Brush plating methods and sparger plating methods are known as plating methods for plating only a part of the object to be plated. Among these, attention is focused on the point of partial plating, which is disclosed in Patent Document 2 in the former and Patent Document 1 in the latter.

しかし、被めっき物が例えば図4に示すように、対向している肩部をコンタクト部11,11としている端子1が図の紙面と直交する方向に0.4mmピッチというような狭ピッチで並ぶコネクター用のフープ材である場合、スパージャめっき法では、コンタクト部11部分だけにめっき(金めっき)をすることはできない。   However, as shown in FIG. 4, for example, the terminals 1 whose contact portions 11 and 11 are the opposite shoulder portions are arranged at a narrow pitch such as 0.4 mm pitch in the direction orthogonal to the drawing sheet. In the case of a hoop material for a connector, it is not possible to perform plating (gold plating) only on the contact portion 11 by the sparger plating method.

ブラシめっき法ではそのブラシ(筆)に該当する部材の形状を端子1の形状に合わせることで、図3に示すようにコンタクト部11部分だけにめっき(金めっき)をすることが可能である。しかし、フープ材の状態で供給される各端子に均一なめっきを行うことは難しく、更には単位時間当たりの処理数を多くすることは困難である。
特開2000−345385号公報 特開平5−132795号公報
In the brush plating method, by matching the shape of the member corresponding to the brush (brush) with the shape of the terminal 1, it is possible to plate (gold plating) only on the contact portion 11 as shown in FIG. However, it is difficult to uniformly plate each terminal supplied in the state of a hoop material, and it is difficult to increase the number of treatments per unit time.
JP 2000-345385 A JP-A-5-132895

本発明は上記の従来の問題点に鑑みて発明したものであって、必要とする部分だけにめっきを行うことを簡便に且つ高速に行うことができる部分めっき方法及びその装置を提供することを課題とするものである。   The present invention was invented in view of the above-described conventional problems, and provides a partial plating method and apparatus capable of simply and rapidly performing plating only on a necessary portion. It is to be an issue.

上記課題を解決するために本発明に係る部分めっき方法は、回転駆動される回転板の一部をめっき液に接触させて該回転板の周縁部にめっき液を付着させ、被めっき物におけるめっきを施したい箇所の近傍を上記回転板の周縁部が通過する際に回転板の周縁に付着しためっき液を被めっき物におけるめっきを施したい箇所に接触させることで電気めっきを行うことに特徴を有している。回転板によってめっきを施したい箇所にのみ、めっき液を接触させてめっきを行うことができる。   In order to solve the above-described problems, a partial plating method according to the present invention is a method in which a part of a rotating plate that is driven to rotate is brought into contact with a plating solution, and the plating solution is attached to the peripheral portion of the rotating plate. The electroplating is performed by bringing the plating solution adhering to the periphery of the rotating plate into contact with the portion to be plated on the object to be plated when the peripheral portion of the rotating plate passes in the vicinity of the portion to be plated. Have. Plating can be performed by bringing a plating solution into contact only with a portion where plating is desired by the rotating plate.

そして本発明に係る部分めっき装置は、被めっき物を保持する保持体と、保持体で保持された被めっき物におけるめっきを施したい箇所の近傍を周縁部が通過する回転板と、この回転板の周縁部にめっき液を接触させるめっき液供給手段とからなることに特徴を有している。ここにおけるめっき液供給手段は、回転板の周縁が浸かるめっき液槽であってもよい。   The partial plating apparatus according to the present invention includes a holding body for holding an object to be plated, a rotating plate whose peripheral portion passes in the vicinity of a portion to be plated in the object to be plated held by the holding body, and the rotating plate. And a plating solution supply means for bringing the plating solution into contact with the peripheral edge of the substrate. Here, the plating solution supply means may be a plating solution tank in which the periphery of the rotating plate is immersed.

そして被めっき物が互いにつながっているとともに対向しているコンタクト部を有する端子であり、回転板は上記の対向しているコンタクト部の間を周縁部が通過するものであると、単一の回転板で対向する対のコンタクト部にめっき液を同時に接触させることができる。   And it is a terminal which has the contact part which the to-be-plated objects are connected to each other and facing each other, and the rotating plate has a single rotation when the peripheral part passes between the contact parts facing each other. A plating solution can be simultaneously brought into contact with a pair of contact portions opposed by a plate.

本発明によれば、回転板の周縁部に付着させためっき液がめっきを施したい箇所に接触してめっきがなされるために、必要とする箇所にのみめっきを施すことができるものであり、短時間に多くの処理を行うことができる上に、設備的にも実際上、回転板を設けるだけでよいものである。   According to the present invention, since the plating solution adhered to the peripheral portion of the rotating plate comes into contact with the portion where plating is desired to be plated, it is possible to perform plating only at a required portion, In addition to being able to perform many treatments in a short time, it is practically only necessary to provide a rotating plate in terms of equipment.

以下、本発明を添付図面に示す実施形態に基いて説明すると、図3は被めっき物である端子1を示しており、対向している肩部をコンタクト部11,11としたコネクター用の該端子1は、0.4mmピッチというような狭ピッチで多数が並ぶフープ材の状態でそのコンタクト部11に対し、めっきが施される。図中12は対向するコンタクト部11,11を連結しているばね弾性を備えた片、13は一方のコンタクト部11側から伸びるとともにコネクターボディ(図示せず)などに固定される固定片、14は固定片13から更に延出された外部接続用の接続片である。該接続片14はコネクターボディから外側方に突出して、回路基板上の回路パターンに半田付けなどによって接続される。   Hereinafter, the present invention will be described based on an embodiment shown in the accompanying drawings. FIG. 3 shows a terminal 1 which is an object to be plated, and the connector for a connector having contact portions 11 and 11 as opposed shoulder portions. The terminal 1 is plated on the contact portion 11 in the state of a hoop material in which a large number are arranged at a narrow pitch such as 0.4 mm pitch. In the figure, reference numeral 12 denotes a spring elastic piece connecting the opposing contact portions 11, 11, 13 denotes a fixed piece that extends from one contact portion 11 side and is fixed to a connector body (not shown), etc. Is a connection piece for external connection further extended from the fixed piece 13. The connection piece 14 protrudes outward from the connector body and is connected to a circuit pattern on the circuit board by soldering or the like.

このコネクター用の端子1は、対応するコネクターの端子におけるコンタクト部が上記コンタクト部11,11に嵌り込んでコンタクト部11に接触することによってコネクター間の電気的接続及び機械的連結がなされる。   The connector terminals 1 are electrically connected and mechanically connected to each other when the contact portions of the corresponding connector terminals are fitted into the contact portions 11 and 11 and come into contact with the contact portions 11.

図1及び図2中の保持体2は上記端子1(フープ材)を保持するもので、該保持体2は、端子1における上記接続片14側の端部間を相互に連結してフープ材としている部分を保持する。   The holding body 2 in FIGS. 1 and 2 holds the terminal 1 (hoop material), and the holding body 2 connects the end portions of the terminal 1 on the connection piece 14 side to each other to connect the hoop material. Hold the part you are trying to.

一方、めっき液40を納めためっき液槽4の上方には厚みが0.2mmといった薄さの回転板3が配設されている。中心側が補強プレート30で補強されている上記回転板3は、モータ31による駆動で回転するもので、図1に示すように、上記端子1におけるコンタクト部11,11の近傍で且つ両コンタクト部11,11から等距離のところを通過する位置に配設されている。なお、回転板3としては、例えばチタンからなるとともに、その周縁部の表面が粗面化処理されたものを好適に用いることができる。   On the other hand, a rotating plate 3 having a thickness of 0.2 mm is disposed above the plating solution tank 4 containing the plating solution 40. The rotating plate 3 whose center side is reinforced by the reinforcing plate 30 is rotated by driving by a motor 31 and, as shown in FIG. , 11 are disposed at positions that pass equidistantly. In addition, as the rotating plate 3, what consists of titanium, for example, and the surface of the peripheral part was roughened can be used suitably.

また上記回転板3は、その回転に際し、周縁部のうちの下方に位置した部分がめっき液40に常時浸かることで、その周縁部にめっき液40を付着させる。回転板3の周縁部に付着しためっき液40は、回転板3の回転による遠心力で周縁部に留まり、対向している上記の対のコンタクト部11,11の近傍を通過する際に両コンタクト部11,11に接触する。   Further, when the rotating plate 3 is rotated, the portion located below the peripheral portion is always immersed in the plating solution 40, so that the plating solution 40 is attached to the peripheral portion. The plating solution 40 adhering to the peripheral portion of the rotating plate 3 stays at the peripheral portion due to the centrifugal force generated by the rotation of the rotating plate 3, and both contacts when passing through the vicinity of the opposing contact portions 11, 11. The parts 11 and 11 are contacted.

端子1への電気めっきが、コンタクト部11,11のみにめっき液40が接触してなされることから、コンタクト部11,11以外にめっきがなされてしまうことがないものであり、しかも図示例においては、対向する対のコンタクト部11,11に対して同時にめっきを行うことができる。しかもコンタクト部11に形成されるめっき層10は、図3に示すように電極4と対向する対向面での厚みをコンタクト部11の背面側よりも厚くすることができる。   Since the plating solution 40 is brought into contact with only the contact portions 11 and 11, the electroplating to the terminal 1 is performed without plating other than the contact portions 11 and 11, and in the illustrated example. Can simultaneously perform plating on the opposing contact portions 11, 11. In addition, as shown in FIG. 3, the plating layer 10 formed on the contact portion 11 can be thicker on the facing surface facing the electrode 4 than on the back side of the contact portion 11.

このために上記固定片13や片12などにめっきがなされることがないものであり、また、固定片13にめっき層10があると、上記接続片14を回路パターンに半田付けする際に固定片13上のめっき層10によって半田の這い上がりが生じてトラブルを起こすことがあるが、このような事態を招くこともない。   For this reason, the fixed piece 13 or the piece 12 is not plated, and if the fixed piece 13 has the plating layer 10, the fixed piece 13 is fixed when the connection piece 14 is soldered to the circuit pattern. Although the plating layer 10 on the piece 13 may cause the solder to scoop up and cause trouble, such a situation is not caused.

なお、図示例では回転する回転板3の回転軸を斜め45度に傾けているが、この角度は何ら限定されるものでない。また、図示例では被めっき物が対向するコンタクト部11,11を有する端子である場合を示したが、対向していない部分へのめっき処理、例えば上記端子1における接続片14へのめっき処理にも適用することができる。また、端子1がコネクター用のものであるものを示したが、これに限定されるものでないことはもちろんである。   In the illustrated example, the rotation axis of the rotating rotating plate 3 is inclined 45 degrees, but this angle is not limited at all. Further, in the illustrated example, the case where the object to be plated is a terminal having the contact portions 11 and 11 facing each other is shown. Can also be applied. Further, although the terminal 1 is for a connector, it is needless to say that the terminal 1 is not limited to this.

更に、上記保持体2は、フープ材をリールトゥリールで送る際のガイドとして機能する形状とするとともに、回転板3の周縁に沿った円弧状に端子1(フープ材)を送ることができる形状とすることで連続処理が可能となるために、高い処理速度を得ることができる。   Further, the holding body 2 has a shape that functions as a guide when the hoop material is fed reel-to-reel, and a shape that can feed the terminal 1 (hoop material) in an arc shape along the periphery of the rotating plate 3. Since continuous processing becomes possible, a high processing speed can be obtained.

本発明の実施の形態の一例の要部拡大図である。It is a principal part enlarged view of an example of embodiment of this invention. 同上の正面図である。It is a front view same as the above. 本発明によってめっき処理した端子の側面図である。It is a side view of the terminal plated by this invention. 従来のめっき処理を行った端子の側面図である。It is a side view of the terminal which performed the conventional plating process.

符号の説明Explanation of symbols

1 端子
3 回転板
11 コンタクト部
1 Terminal 3 Rotating plate 11 Contact part

Claims (3)

回転駆動される回転板の一部をめっき液に接触させて該回転板の周縁部にめっき液を付着させ、被めっき物におけるめっきを施したい箇所の近傍を上記回転板の周縁部が通過する際に回転板の周縁に付着しためっき液を被めっき物におけるめっきを施したい箇所に接触させることで電気めっきを行うことを特徴とする部分めっき方法。   A part of the rotating plate that is driven to rotate is brought into contact with the plating solution so that the plating solution is attached to the peripheral portion of the rotating plate, and the peripheral portion of the rotating plate passes in the vicinity of the portion to be plated on the object to be plated. A partial plating method characterized in that electroplating is performed by bringing a plating solution adhering to the periphery of the rotating plate into contact with a portion of the workpiece to be plated. 被めっき物を保持する保持体と、保持体で保持された被めっき物におけるめっきを施したい箇所の近傍を周縁部が通過する回転板と、この回転板の周縁部にめっき液を接触させるめっき液供給手段とからなることを特徴とする部分めっき装置。   A holding body for holding an object to be plated, a rotating plate whose peripheral part passes in the vicinity of a portion to be plated in the object to be plated held by the holding body, and plating in which a plating solution is brought into contact with the peripheral part of the rotating plate A partial plating apparatus comprising a liquid supply means. 被めっき物が互いにつながっているとともに対向しているコンタクト部を有する端子であり、回転板は上記の対向しているコンタクト部の間を周縁部が通過するものであることを特徴とする請求項2記載の部分めっき装置。   A terminal having contact parts that are opposite to each other while the objects to be plated are connected to each other, and the rotating plate has a peripheral part that passes between the contact parts that face each other. 2. The partial plating apparatus according to 2.
JP2007248127A 2007-09-25 2007-09-25 Partial plating method and apparatus Expired - Fee Related JP5032932B2 (en)

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JP5032932B2 JP5032932B2 (en) 2012-09-26

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5887293A (en) * 1981-11-19 1983-05-25 Yaskawa Electric Mfg Co Ltd Plating device
JPS58224193A (en) * 1982-06-24 1983-12-26 Seiko Epson Corp Partial plating method
JPS61250191A (en) * 1985-04-26 1986-11-07 Electroplating Eng Of Japan Co Brush plating method of connector terminal

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5887293A (en) * 1981-11-19 1983-05-25 Yaskawa Electric Mfg Co Ltd Plating device
JPS58224193A (en) * 1982-06-24 1983-12-26 Seiko Epson Corp Partial plating method
JPS61250191A (en) * 1985-04-26 1986-11-07 Electroplating Eng Of Japan Co Brush plating method of connector terminal

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