JP2009070696A - Display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a display device having a good display quality and capable of extending a life-time. <P>SOLUTION: The display device includes an active area constructed by a plurality of pixels and has an organic insulating film 114 arranged on a support substrate 101, a first electrode 60 which is arranged for every pixel on the surface corresponding to the active area 102 of the organic insulating film 114, an organic active layer 62 arranged on the first electrode 60, a second electrode 64 which is arranged on the organic active layer 62 and is common to the plurality of pixels, and a barrier film 130 which is formed of an identical material to the first electrode 60 and covers the surface outside of the active area 104 of the organic insulating film 114. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a display device, and more particularly to a display device having a structure including a self-luminous display element.

  In recent years, organic electroluminescence (EL) display devices have attracted attention as flat display devices. Since this organic EL display device includes an organic EL element that is a self-luminous element, the viewing angle is wide, the backlight can be thinned, the power consumption can be reduced, and the response speed can be reduced. It has the feature of being fast.

  Because of these features, organic EL display devices are attracting attention as potential candidates for next-generation flat display devices that replace liquid crystal display devices. As an organic EL display device, a bottom emission method in which EL light generated in the organic EL element is extracted from the array substrate side and an EL light generated in the organic EL element is extracted from the sealing substrate side to the outside. There is a top emission method.

  The organic EL element is provided on an array substrate together with a pixel circuit and the like, and is configured by holding an organic active layer containing an organic compound having a light emitting function between an anode and a cathode. The anode is arranged for each pixel in order to drive each pixel independently. Each pixel is separated by a partition wall. The organic EL element having such a configuration is configured to include a thin film that easily deteriorates due to the influence of moisture. For this reason, in the case of a configuration in which an organic EL element is simply formed on a substrate, a non-lighting area called a dark spot or pixel shrinkage occurs in a short time, and such an area expands as a product. It becomes unusable.

Therefore, a substrate in which a moisture absorbing material for removing moisture in the organic EL display device is provided on the organic EL element is prepared, and a sealing substrate is provided via a sealing material provided around the substrate on which the organic EL element is arranged. The structure which prevents deterioration by a water | moisture content by bonding together is proposed (for example, refer patent document 1).
JP 2002-299040 A

  In many cases, the organic EL element is disposed on a flattened base (planarized layer) so as not to be affected by the unevenness of the lower layer. Such a planarization layer is formed by a technique such as spin coating with a resin material.

  Such a resin material may have a property of easily absorbing moisture. For this reason, there is a mode in which moisture absorbed in the resin material diffuses and a phenomenon that the organic EL element is deteriorated may occur. That is, since the organic EL element deteriorates due to moisture intrusion, the luminance decreases, and there may be a situation in which the light does not emit light with normal luminance as time passes.

  It is effective to install a large amount of desiccant as a measure to suppress the influence of such moisture, but it causes an increase in cost and the area where desiccant can be installed is limited especially in the top emission method. It cannot be a sufficient measure.

  The present invention has been made in view of the above-described problems, and an object of the present invention is to provide a display device that has good display quality and can have a long lifetime.

A display device according to an aspect of the present invention includes:
A display device having an active area composed of a plurality of pixels,
An organic insulating film disposed on a support substrate;
A first electrode disposed for each pixel on the surface corresponding to the active area of the organic insulating film;
An organic active layer disposed on the first electrode;
A second electrode disposed on the organic active layer and common to a plurality of pixels;
A barrier film formed of the same material as the first electrode and covering a surface outside the active area in the organic insulating film;
It is provided with.

  According to the present invention, since the organic insulating film and the partition are separated by the barrier film, even if moisture enters from the partition, it is possible to suppress diffusion to the organic insulating film, and conversely, It is also possible to suppress diffusion of moisture contained in the organic insulating film into the partition walls. For this reason, rapid deterioration of some pixels can be suppressed, and unevenness in light emission luminance can be suppressed, so that display quality can be improved and life can be extended. Therefore, the production yield can be improved, and a large amount of desiccant is not required, so that an increase in cost can be suppressed. In particular, in the top emission method, a sufficient countermeasure against moisture can be realized with a small amount of desiccant.

  A display device according to an embodiment of the present invention will be described below with reference to the drawings. In this embodiment, a self-luminous display device such as an organic EL (electroluminescence) display device will be described as an example of the display device.

  As shown in FIG. 1, the organic EL display device 1 includes an array substrate 100 having an active area 102 for displaying an image. The active area 102 is composed of a plurality of pixels PX arranged in a matrix. Further, FIG. 1 shows a color display type organic EL display device 1 as an example, and the active area 102 includes a plurality of types of color pixels, for example, a red pixel PXR, a green pixel PXG, and a blue color corresponding to three primary colors. A pixel PXB is used.

  At least the active area 102 of the array substrate 100 is sealed with a sealing body 200. That is, the array substrate 100 and the sealing body 200 are bonded together by the sealing material 300 arranged in a frame shape so as to surround the active area 102. The sealing material 300 may be a photosensitive resin (for example, an ultraviolet curable resin) or a frit.

  Each pixel PX (R, G, B) includes a pixel circuit 10 and a display element 40 that is driven and controlled by the pixel circuit 10. The pixel circuit 10 shown in FIG. 1 is an example, and it goes without saying that a pixel circuit having another configuration may be applied. In the example shown in FIG. 1, the pixel circuit 10 includes a drive transistor DRT, a first switch SW1, a second switch SW2, a third switch SW3, a storage capacitor element CS, and the like. The drive transistor DRT has a function of controlling the amount of current supplied to the display element 40. The first switch SW1 and the second switch SW2 function as a sample / hold switch. The third switch element SW3 has a function of controlling driving current supply from the driving transistor DRT to the display element 40, that is, on / off of the display element 40. The storage capacitor element CS has a function of holding the potential between the gate and source of the drive transistor DRT.

  The drive transistor DRT is connected between the high potential power supply line P1 and the third switch SW3. The display element 40 is connected between the third switch SW3 and the low potential power line P2. The gate electrodes of the first switch SW1 and the second switch SW2 are connected to the first gate line GL1. The gate electrode of the third switch SW3 is connected to the second gate line GL2. The source electrode of the first switch SW1 is connected to the video signal line SL. The drive transistor DRT, the first switch SW1, the second switch SW2, and the third switch element SW3 are configured by, for example, thin film transistors, and the semiconductor layer is formed of polysilicon here.

  In the case of such a circuit configuration, the first switch SW1 and the second switch SW2 are turned on based on the ON signal supplied from the first gate line GL1, and the high potential is set according to the amount of current flowing through the video signal line SL. A current flows from the power supply line P1 to the drive transistor DRT, and the storage capacitor element CS is charged according to the current flowing through the drive transistor DRT. As a result, the drive transistor DRT can supply the same amount of current as that supplied from the video signal line SL to the display element 40 from the high potential power supply line P1.

  Then, the third switch SW3 is turned on based on the ON signal supplied from the second gate line GL2, and the driving transistor DRT is connected to the first potential from the high potential power supply line P1 according to the capacitance held in the storage capacitor element CS. A predetermined amount of current corresponding to a predetermined luminance is supplied to the display element 40 via the three switch SW3. Thereby, the display element 40 emits light with a predetermined luminance.

  The display element 40 includes an organic EL element 40 (R, G, B) that is a self-luminous display element. That is, the red pixel PXR includes an organic EL element 40R that mainly emits light corresponding to the red wavelength. The green pixel PXG includes an organic EL element 40G that mainly emits light corresponding to the green wavelength. The blue pixel PXB includes an organic EL element 40B that mainly emits light corresponding to the blue wavelength.

  The various organic EL elements 40 (R, G, B) have basically the same configuration, and are disposed on the wiring substrate 120 as shown in FIG. In addition, the wiring board 120 is insulated on an insulating support substrate 101 such as a glass substrate or a plastic sheet, such as an undercoat layer 111, a gate insulating film 112, an interlayer insulating film 113, and an organic insulating film (planarization layer) 114. In addition to the layers, it is configured to include various switches SW, drive transistors DRT, storage capacitor elements Cs, various wirings (gate lines, video signal lines, power supply lines, etc.) and the like.

  That is, in the example shown in FIG. 2, the semiconductor layer 21 of the transistor element (the third switch SW3 in the circuit configuration shown in FIG. 1) 20 is disposed on the undercoat layer 111. ing. The semiconductor layer 21 is covered with the gate insulating film 112. On the gate insulating film 112, the gate electrode 20G of the transistor element 20 and the like are disposed. The gate electrode 20G is covered with an interlayer insulating film 113. On the interlayer insulating film 113, the source electrode 20S and the drain electrode 20D of the transistor element 20 are disposed. The source electrode 20S and the drain electrode 20D are in contact with the semiconductor layer 21 through contact holes that penetrate the gate insulating film 112 and the interlayer insulating film 113 to the semiconductor layer 21, respectively. The source electrode 20S and the drain electrode 20D are covered with an organic insulating film 114. Such an organic insulating film 114 is formed by a technique such as coating with a resin material in order to alleviate the influence of the unevenness of the lower layer and flatten the surface.

  The organic EL element 40 is disposed on the organic insulating film 114. The organic EL element 40 has a configuration in which an organic active layer 62 is held between a first electrode 60 and a second electrode 64, and a detailed structure will be described below.

  That is, the first electrode 60 is disposed on the organic insulating film 114 in an independent island shape for each color pixel PX, and functions as an anode. The first electrode 60 is in contact with the drain electrode 20D through a contact hole that penetrates the organic insulating film 114 to the drain electrode 20D. Such a first electrode 60 is formed of a light-transmitting conductive material such as indium tin oxide (ITO).

  The organic active layer 62 is disposed on the first electrode 60 and includes at least a light emitting layer. The organic active layer 62 can include functional layers other than the light emitting layer, and includes, for example, functional layers such as a hole injection layer, a hole transport layer, a blocking layer, an electron transport layer, an electron injection layer, and a buffer layer. it can. Such an organic active layer 62 may be composed of a single layer in which a plurality of functional layers are combined, or may have a multilayer structure in which the functional layers are laminated. In the organic active layer 62, the light emitting layer may be an organic material, and layers other than the light emitting layer may be an inorganic material or an organic material. In the organic active layer 62, the functional layer other than the light emitting layer may be a common layer. The light emitting layer is formed of an organic compound having a light emitting function that emits red, green, or blue light.

  The organic active layer 62 may include a thin film formed of a polymer material. Such a thin film can be formed by a selective coating method such as an inkjet method. The organic active layer 62 may include a thin film formed of a low molecular material. Such a thin film can be formed by a technique such as mask vapor deposition.

  The second electrode 64 is common to the plurality of color pixels PX, is disposed on the organic active layer 62 of each color pixel PX, and functions as a cathode. The second electrode 64 may include a semi-transmissive layer. That is, the second electrode 64 is disposed between a transmissive layer formed using a light-transmitting conductive material such as ITO, and between the transmissive layer and the organic active layer 62. Silver (Ag) and magnesium (Mg) It may be a two-layer structure with a semi-transparent layer formed of a mixture thereof or a semi-transparent layer electrode. Needless to say, the second electrode 64 may be formed of a single transmissive layer.

  In addition, the array substrate 100 includes a partition wall 70 that separates at least adjacent color pixels PX (R, G, B) in the active area 102. The partition walls 70 are arranged so as to cover the periphery of each first electrode 60 and are formed in a lattice shape or a stripe shape in the active area 102. Such a partition 70 is formed by patterning a resin material, for example.

  Incidentally, since the organic insulating film 114 is formed of a resin material, it has a property of easily absorbing moisture. For this reason, in order to suppress deterioration of the organic EL element 40 due to moisture, it is desirable that the organic insulating film 114 is not exposed, and the end portion 114E extending outside the active area, that is, the peripheral area 104, is the second electrode 64. It is desirable to be covered by.

  Such an organic insulating film 114 is formed to have a relatively thick film thickness, for example, a film thickness of 2 to 3 μm, in order to flatten the surface thereof. For this reason, in the peripheral area 104, a large step is formed by the end portion 114 </ b> E of the organic insulating film 114. That is, a difference in height corresponding to the film thickness of the organic insulating film 114 is formed between the surface 101A of the support substrate 101 and the upper surface 114T of the organic insulating film 114. Further, the end surface 114S of the organic insulating film 114 is also formed as a steep slope.

  On the other hand, the first electrode 60 is patterned through a photolithography process after a conductive material is formed on the organic insulating film 114. That is, a conductive material is formed on the surface of the organic insulating film 114 not only in the active area 102 but also in the peripheral area 104. Then, a resist is applied so as to cover the conductive material, and the resist is patterned so as to correspond to the pattern of the first electrode. Then, after removing the conductive material exposed from the resist, the first electrode 60 is formed by removing the resist.

  At this time, since a large step is formed at the end portion 114E of the organic insulating film 114, the thickness of the resist applied to this portion tends to increase, and the resist cannot be completely removed. As a result, the organic insulating film In the vicinity of the end surface 114S of 114 and the support substrate 101 being in contact with each other, the conductive material that cannot be completely removed may remain.

  For this reason, the second electrode 64 is formed by a technique such as mask vapor deposition in a later process. However, due to the influence of the residue of the conductive material when the first electrode 60 is formed, the organic insulating film 114 is formed in the peripheral area 104. There is a risk of poor coverage of the end 114E. That is, since the organic insulating film 114 is exposed from the pinhole formed in the second electrode 64, a moisture intrusion path is formed.

  Therefore, according to the first embodiment shown in FIG. 2, the surface of the peripheral area 104 in the organic insulating film 114 is covered with the barrier film 130 made of the same material as the first electrode 60. That is, the barrier film 130 is disposed between the outermost partition wall 70X and the organic insulating film 114, and extends outward from the partition wall 70X (that is, the end side of the array substrate 100). The upper surface 114T and the end surface 114S of 114 are covered and in contact with the surface 101A of the support substrate 101. The barrier film 130 is separated from the first electrode 60 of the outermost peripheral pixel.

  Similar to the first electrode 60, the barrier film 130 is formed of an inorganic material having low water permeability, and is formed of ITO here. For this reason, in the peripheral area 104, it is possible to suppress moisture from entering the organic insulating film 114. In the active area 102, the first electrode 60 formed of ITO suppresses the intrusion of moisture from the organic insulating film 114 to the organic active layer 62.

  In the step of forming the first electrode 60, the first electrode 60 as described above is formed by forming the barrier film 130 covering the end portion 114 </ b> E of the organic insulating film 114 simultaneously with the patterning of the first electrode 60. The influence of the residue of the conductive material when forming 60 can be eliminated. That is, sufficient coverage of the organic insulating film 114 is possible only by the barrier film 130.

  Further, when the peripheral area 104 is covered with the second electrode 64, the second electrode 64 is disposed in close contact with the barrier film 130 and in contact with the support substrate 101. At this time, with respect to the second electrode 64, the formation of pinholes due to the influence of the residue when the first electrode is formed can be suppressed. For this reason, the edge part 114E of the organic insulating film 114 is covered with the laminated body of the barrier film 130 and the 2nd electrode 64, and higher coverage performance is realizable.

  The partition wall 70 is also formed of a resin material in the same manner as the organic insulating film 114, but is entirely covered with the second electrode 64 including the outermost partition wall 70 </ b> X. That is, although the barrier film 130 extends outward from the partition 70X, the second electrode 64 also extends outward from the partition 70X, and the barrier film 130 extends at the end 114E of the organic insulating film 114. The film 130 and the second electrode 64 are in close contact. That is, the partition wall 70X is not exposed. For this reason, it becomes possible to suppress the permeation of moisture from the partition wall 70X.

  As a result, rapid deterioration of the organic EL element 40 of the color pixel PX located on the outer periphery of the active area can be suppressed, and unevenness in light emission luminance can be suppressed, so that display quality can be improved. Long service life is possible. Moreover, since deterioration of the organic EL element due to the influence of moisture can be suppressed without installing a large amount of desiccant, even if the top emission method is applied, a small amount of desiccant is disposed in a limited space. It is possible to achieve sufficient moisture countermeasures only with this.

  Next, another embodiment will be described.

  The first electrode 60 may be configured to include a reflective layer. Such a configuration is particularly applicable to the top emission method.

  In the second embodiment shown in FIG. 3, the first electrode 60 includes a reflective layer 60R disposed on the organic insulating film 114, and a transmissive layer 60T stacked on the reflective layer 60R. It is configured. The reflective layer 60R is formed of a light reflective conductive material such as aluminum (Al). Moreover, the transmissive layer 60T is formed of a light-transmitting conductive material such as ITO, as in the first embodiment.

  In such a second embodiment, the barrier film 130 is formed of at least the same material as the transmissive layer 60T. In the example shown in FIG. 3, the barrier film 130 is formed of the same material as the reflective layer 60R and the transmissive layer 60T. Layer structure. That is, the barrier film 130 is configured by a laminated body of the first barrier layer 130A formed of the same material as the reflective layer 60R and the second barrier layer 130B formed of the same material as the transmissive layer 60T.

  The barrier film 130 having such a configuration covers the surface of the peripheral area 104 in the organic insulating film 114. That is, the first barrier layer 130A and the second barrier layer 130B are both disposed between the outermost partition wall 70X and the organic insulating film 114, and extend outward from the partition wall 70X. The upper surface 114T and the end surface 114S are covered and in contact with the surface 101A of the support substrate 101. Further, the first barrier layer 130A and the second barrier layer 130B constituting the barrier film 130 are separated from the reflective layer 60R and the transmissive layer 60T constituting the first electrode 60 of the outermost peripheral pixel, respectively.

  According to such a configuration, it is possible to prevent moisture from entering the organic insulating film 114 in the peripheral area 104.

  Further, in the step of forming the first electrode 60, the reflective layer 60R was formed by forming the first barrier layer 130A covering the end portion 114E of the organic insulating film 114 simultaneously with patterning the reflective layer 60R. The influence of the residue of the conductive material at the time can be eliminated. Similarly, when the transmissive layer 60T is formed by forming the second barrier layer 130B covering the end portion 114E of the organic insulating film 114 on the first barrier layer 130A simultaneously with patterning the transmissive layer 60T. The influence of the residue of the conductive material can be eliminated.

  For this reason, in the second embodiment, the end portion 114E of the organic insulating film 114 is compared with the first embodiment in which the end portion 114E of the organic insulating film 114 is covered with the barrier film 130 that is substantially formed of a single transmissive layer. Is covered by a barrier film having a two-layer structure made of an inorganic material, so that higher coverage performance can be realized.

  Furthermore, when the second electrode 64 covers the peripheral area 104, the second electrode 64 is disposed in close contact with the second barrier layer 130B and in contact with the support substrate 101. At this time, with respect to the second electrode 64, the formation of pinholes due to the influence of the residue when the first electrode is formed can be suppressed. For this reason, the edge part 114E of the organic insulating film 114 is covered with the laminated body of the barrier film 130 and the 2nd electrode 64, and still higher coverage performance is realizable.

  Thereby, the effect similar to 1st Embodiment is acquired.

  The organic EL display device may further include a protective film 150 that covers the second electrode 64.

  In the third embodiment shown in FIG. 4, the second electrode 64 of each organic EL element 40 arranged in the active area 102 is covered with a protective film 150. Such a protective film 150 includes a thin film formed of an inorganic material such as a silicon nitride film or a silicon oxide film. Further, the protective film 150 may include a thin film formed of an organic material.

  In the third embodiment, the protective film 150 extends to the peripheral area 104 and covers the end 114E of the organic insulating film 114. That is, as in the first embodiment, the barrier film 130 formed of the same material as the first electrode 60 covers the upper surface 114T and the end surface 114S of the organic insulating film 114, and is in contact with the surface 101A of the support substrate 101. . The protective film 150 is disposed so as to cover the barrier film 130, and is in contact with the surface 101 </ b> A of the support substrate 101.

  In the third embodiment, the end portion 114E of the organic insulating film 114 is covered with at least a laminated body of the barrier film 130 and the protective film 150. For this reason, higher coverage performance can be realized in the peripheral area 104, and entry of moisture into the organic insulating film 114 can be suppressed.

  Further, when the second electrode 64 covers the peripheral area 104, the second electrode 64 is disposed in close contact with the barrier film 130 and in contact with the support substrate 101 in the peripheral area 104. In addition, in the peripheral area 104, the protective film 150 is disposed in close contact with the second electrode 64 and in contact with the support substrate 101. At this time, with respect to the second electrode 64 and the protective film 150, the formation of pinholes due to the influence of the residue when the first electrode is formed can be suppressed. For this reason, the end portion 114E of the organic insulating film 114 is covered with the stacked body of the barrier film 130, the second electrode 64, and the protective film 150, and higher coverage performance can be realized.

  Thereby, the effect similar to 1st Embodiment is acquired.

  Next, the effect of the organic EL display device according to this embodiment was verified.

  First, a glass substrate (support substrate) having a size (400 mm × 500 mm) capable of forming 24 array substrates having a diagonal size of 3.5 inches in the active area 102 is prepared, and three types (A, B, C) are prepared. ) Sample was prepared.

  In the sample A, the first electrode 60 arranged for each color pixel on the organic insulating film 114 includes the reflective layer 60R and the transmissive layer 60T, and the end 114E of the organic insulating film 114 is covered with a barrier film. This is a configuration that is covered only by the second electrode 64.

  Sample B has a configuration corresponding to that of the first embodiment shown in FIG. 2, and an end 114 </ b> E of the organic insulating film 114 is covered with a barrier film 130 made of the same material as that of the first electrode (transmission layer) 60. In addition, the barrier film 130 is further covered with the second electrode 64.

  The sample C has a configuration corresponding to the second embodiment shown in FIG. 3, and the end 114 </ b> E of the organic insulating film 114 is a first barrier formed of the same material as the reflective layer 60 </ b> R constituting the first electrode 60. The second barrier layer 130B is formed of the same material as the layer 130A and the transmissive layer 60T, and the second barrier layer 130B is further covered with the second electrode 64.

With respect to the three types of samples described above, each substrate on which the first electrode 60 and the partition wall 70 are formed is set in a resistance heating type organic EL film forming apparatus, and the organic active layer 62 serves as a hole transport layer. After depositing NPD to a thickness of 200 nm, Alq ₃ functioning as a light emitting layer / electron transport layer is deposited to a thickness of 50 nm, and further, Mg · Ag is a 2 nm film as an electron injection layer / damage buffer layer. Films were sequentially formed in thickness. Then, the film-formed substrate was set in a parallel plate magnetron sputtering apparatus, and an ITO film having a thickness of 100 nm was formed.

  The active area 102 of each sample was sealed with a sealing body 200. That is, an ultraviolet curable resin material was applied in a frame shape on the sealing body 200, and then bonded to the array substrate of each sample, and the resin material was cured by ultraviolet irradiation under a predetermined condition. Thereby, an organic EL element is arrange | positioned in airtight space. After cleaving the substrate pair of each sample, peripheral circuits were mounted, and 24 organic EL display devices were created for each sample. In addition, in order to confirm a remarkable effect in a short time for each sample, a normally necessary desiccant was not installed in the airtight space.

  These 3x24 organic EL display devices are left in a high-temperature, high-humidity environment (85 ° C x 85% RH), and the display is checked after a lapse of a predetermined time to show the state of deterioration due to moisture such as dark spots. It was observed visually. The result is shown in FIG.

  From the results shown in FIG. 5, with respect to the sample A in which the end portion 114E of the organic insulating film 114 is covered only by the second electrode 64, the occurrence of dark spots is confirmed earlier (after 20 hours), It was confirmed that deterioration due to the influence of moisture is likely to proceed. On the other hand, for samples B and C in which the end portion 114E of the organic insulating film 114 is covered by the barrier film 130 and the second electrode 64, the occurrence of deterioration due to the influence of moisture such as dark spots is delayed more than the sample A (after 30 hours have elapsed) ) Was confirmed to be possible.

  Note that the present invention is not limited to the above-described embodiment as it is, and can be embodied by modifying the constituent elements without departing from the spirit of the invention in the stage of implementation. Further, various inventions can be formed by appropriately combining a plurality of constituent elements disclosed in the embodiment. For example, some components may be deleted from all the components shown in the embodiment. Furthermore, you may combine suitably the component covering different embodiment.

FIG. 1 is a diagram schematically showing a configuration of an organic EL display device according to an embodiment of the present invention. FIG. 2 is a cross-sectional view schematically showing a structure when the organic EL display device according to the first embodiment is cut. FIG. 3 is a cross-sectional view schematically showing a structure when the organic EL display device according to the second embodiment is cut. FIG. 4 is a cross-sectional view schematically showing a structure when the organic EL display device according to the third embodiment is cut. FIG. 5 is a diagram showing a verification result of the effect obtained by arranging the barrier film.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Organic EL display device PX (R, G, B) ... Color pixel 10 ... Pixel circuit DRT ... Drive transistor SW1 ... 1st switch SW2 ... 2nd switch SW3 ... 3rd switch Cs ... Storage capacitor element 40 ... Organic EL element 60 ... 1st electrode
60R ... Reflective layer 60T ... Transparent layer 62 ... Organic active layer 64 ... Second electrode 70 ... Partition wall 100 ... Array substrate 102 ... Active area 104 ... Peripheral area 114 ... Organic insulating film 114E ... End face 120 ... Wiring substrate 130 ... Barrier film 130A ... 1st barrier layer 130B ... 2nd barrier layer 150 ... Protective film 200 ... Sealing body 300 ... Sealing material

Claims (5)

A display device having an active area composed of a plurality of pixels,
An organic insulating film disposed on a support substrate;
A first electrode disposed for each pixel on the surface corresponding to the active area of the organic insulating film;
An organic active layer disposed on the first electrode;
A second electrode disposed on the organic active layer and common to a plurality of pixels;
A barrier film formed of the same material as the first electrode and covering a surface outside the active area in the organic insulating film;
A display device comprising: The first electrode has a reflective layer and a transmissive layer laminated on the reflective layer,
The display device according to claim 1, wherein the barrier film is formed of the same material as at least the transmissive layer.   The display device according to claim 2, wherein the barrier film has a two-layer structure formed of the same material as the reflective layer and the transmissive layer.   The display device according to claim 1, wherein the barrier film and the second electrode are in close contact with each other outside an active area.   The display device according to claim 1, further comprising a protective film that covers the second electrode at least in the active area and covers the barrier film outside the active area.

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