JP2009067939A - Polyamic acid and imidized polymer - Google Patents

Polyamic acid and imidized polymer Download PDF

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JP2009067939A
JP2009067939A JP2007239506A JP2007239506A JP2009067939A JP 2009067939 A JP2009067939 A JP 2009067939A JP 2007239506 A JP2007239506 A JP 2007239506A JP 2007239506 A JP2007239506 A JP 2007239506A JP 2009067939 A JP2009067939 A JP 2009067939A
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dianhydride
polyamic acid
general formula
imidized polymer
acid
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JP4931007B2 (en
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Kanetake Ryu
金剛 劉
Yasuhiro Nakamura
康広 中村
Yuji Shibazaki
祐二 芝崎
Shinji Ando
慎治 安藤
Mitsuru Ueda
充 上田
Shuichi Sugawara
周一 菅原
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JSR Corp
Tokyo Institute of Technology NUC
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Tokyo Institute of Technology NUC
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a polyamic acid giving an imidized polymer which has a high refractive index, excellent transparency, excellent heat resistance and a specific structure. <P>SOLUTION: Provided is a polyamic acid having a structure represented by general formula (1) [wherein, R is a tetravalent organic group; R<SP>1</SP>groups are each independently a 1 to 3C alkyl group; (a) and (a) are each independently an integer of 0 to 4; (m) is an integer of 1 to 100,000]. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、ポリアミック酸及びイミド化重合体に関する。さらに詳しくは、高屈折率かつ耐熱性に優れたポリアミック酸及びイミド化重合体に関する。   The present invention relates to a polyamic acid and an imidized polymer. More specifically, the present invention relates to a polyamic acid and an imidized polymer having a high refractive index and excellent heat resistance.

ポリイミドは複素環や芳香環等の環状構造からなる高次構造を多数有し、高温になっても分子鎖が動き難いこと、二重結合等の高次結合を多数有し、原子間結合エネルギーが大きいこと、複素環や芳香環がポリマー分子内、ポリマー分子間で相互に作用し合いCT(Charge Transfer)錯体を形成し、凝集力が大きい等の理由から、ポリイミドの耐熱性は各種プラスチックの中でも最高位にランクされる。   Polyimides have many higher-order structures consisting of cyclic structures such as heterocycles and aromatic rings, molecular chains are difficult to move even at high temperatures, have many higher-order bonds such as double bonds, and interatomic bond energy The heat resistance of polyimide is different from that of various plastics for the reasons that the heterocycle and aromatic ring interact with each other in the polymer molecule and form a CT (Charge Transfer) complex and the cohesion is large. Among them, it is ranked highest.

さらに、ポリイミドは耐熱性に優れるだけではなく、高強度・高弾性で機械特性にも優れ、高絶縁・低誘電で電気特性にも優れ、さらには耐薬品性、耐放射線性、難燃性にも優れている。   Furthermore, polyimide not only has excellent heat resistance, but also has high strength, high elasticity, excellent mechanical properties, high insulation, low dielectric properties, and excellent electrical properties, as well as chemical resistance, radiation resistance, and flame resistance. Is also excellent.

近年では、感光性を有するポリイミドも開発され、超高集積半導体に、強靭で接着力の強いポリイミドは宇宙往還機に、透明性の高いポリイミドは光通信機器に、射出成型性の良いポリイミドは自動車部品を始めとする耐熱摺動部品に使用されている。   In recent years, photosensitive polyimides have also been developed. Ultra-highly integrated semiconductors, tough and strong adhesive polyimides are used in space transportation machines, highly transparent polyimides are used in optical communication equipment, and injection moldable polyimides are used in automobiles. Used in heat-resistant sliding parts such as parts.

上記のような特性を有するポリイミドを光学的用途に用いた例として、硫黄原子を含有する二酸無水物と硫黄原子を含有しないジアミンを使用したポリイミドを光導波路として利用した例(特許文献1);硫黄原子を含有しない二酸無水物と硫黄原子を含有するジアミンを使用したポリイミドを液晶配向膜として利用した例(特許文献2);特定の構造を有するポリイミドと酸化チタン粒子の混合物を高屈折率材料として利用した例(特許文献3);及び硫黄原子を含有しないポリアミック酸と酸化チタン粒子及び他の特定の化合物との混合物をポジ型感光性樹脂組成物として利用した例(特許文献4)等が知られている。   As an example of using a polyimide having the above characteristics for optical applications, an example using a polyimide using a diacid anhydride containing a sulfur atom and a diamine not containing a sulfur atom as an optical waveguide (Patent Document 1) ; Example using a polyimide using a diacid anhydride containing no sulfur atom and a diamine containing a sulfur atom as a liquid crystal alignment film (Patent Document 2); Highly refracting a mixture of polyimide having a specific structure and titanium oxide particles Example (Patent Document 3) used as a rate material; and Example using a mixture of polyamic acid not containing a sulfur atom, titanium oxide particles and other specific compounds as a positive photosensitive resin composition (Patent Document 4) Etc. are known.

特開2004−131684号公報JP 2004-131684 A 特開平5−263077号公報JP-A-5-263077 特開2001−354853号公報JP 2001-354853 A 特開2005−208465号公報JP 2005-208465 A

二酸無水物に硫黄を導入した例(特許文献1)では、屈折率が1.67〜1.72であったが可視光(400〜700nm)での透明性が不十分であった。液晶配向膜として利用した例(特許文献2)は、ポリイミドの導電性に着目したものであり、屈折率については記載がない。特許文献3に記載の発明は、特定の構造を有する二酸無水物と特定の構造を有するジアミンとを反応させて得られたポリアミック酸を用いている。特許文献3記載の発明で用いているジアミンは、ベンゼン環の間が主としてエーテル基(−O−)によって結合されており、1つのチオエーテル基(−S−)を有するものが2種類のみ記載されている。   In an example in which sulfur was introduced into a dianhydride (Patent Document 1), the refractive index was 1.67 to 1.72, but the transparency with visible light (400 to 700 nm) was insufficient. The example (Patent Document 2) used as the liquid crystal alignment film pays attention to the conductivity of polyimide, and there is no description about the refractive index. The invention described in Patent Document 3 uses a polyamic acid obtained by reacting a dianhydride having a specific structure with a diamine having a specific structure. In the diamine used in the invention described in Patent Document 3, the benzene rings are bonded mainly by an ether group (—O—), and only two types having one thioether group (—S—) are described. ing.

本発明は、屈折率が高く、透明性に優れ、さらに耐熱性にも優れた特定の構造を有するイミド化重合体を与えるポリアミック酸及びイミド化重合体を提供することを目的とする。   An object of the present invention is to provide a polyamic acid and an imidized polymer that give an imidized polymer having a specific structure having a high refractive index, excellent transparency, and excellent heat resistance.

上記目的を達成するため、本発明者らは鋭意研究を行い、特定の位置にスルフィド基及びスルホン基を導入した芳香族ジアミンと、脂肪族又は脂環族テトラカルボン酸二無水物、そして硫黄含有酸二無水物とを組み合わせることにより、高屈折率と高透明性、そして耐熱性に優れたイミド化重合体が得られることを見出し、本発明を完成させた。   In order to achieve the above-mentioned object, the present inventors have conducted intensive research, an aromatic diamine having a sulfide group and a sulfone group introduced at a specific position, an aliphatic or alicyclic tetracarboxylic dianhydride, and a sulfur-containing product. The present inventors have found that an imidized polymer having a high refractive index, high transparency, and excellent heat resistance can be obtained by combining an acid dianhydride, thereby completing the present invention.

即ち、本発明は、下記のポリアミック酸及びイミド化重合体を提供する。
1.下記一般式(1)で示される構造を有するポリアミック酸。

Figure 2009067939
[式(1)中、Rは4価の有機基を示し、Rはそれぞれ独立して炭素数1〜3のアルキル基を示し、aはそれぞれ独立して0〜4の整数を示し、mは1〜100000の整数を示す。]
2.下記一般式(2)で示される構造を有するイミド化重合体。
Figure 2009067939
[式(2)中、Rはそれぞれ独立して炭素数1〜3のアルキル基を示し、aはそれぞれ独立して0〜4の整数を示し、Rは4価の有機基を示し、mは1〜100000の整数を示す。] That is, the present invention provides the following polyamic acid and imidized polymer.
1. A polyamic acid having a structure represented by the following general formula (1).
Figure 2009067939
[In the formula (1), R represents a tetravalent organic group, each R 1 independently represents an alkyl group having 1 to 3 carbon atoms, a represents each independently an integer of 0 to 4, m Represents an integer of 1 to 100,000. ]
2. An imidized polymer having a structure represented by the following general formula (2).
Figure 2009067939
[In Formula (2), R 1 each independently represents an alkyl group having 1 to 3 carbon atoms, a represents each independently an integer of 0 to 4, R represents a tetravalent organic group, m Represents an integer of 1 to 100,000. ]

本発明によれば、硫黄原子を導入したジフェニルスルホン骨格を有するジアミン化合物を使用することにより、高屈折率(波長633nmにおける屈折率が、最高で1.733)と高耐熱性が達成される。
本発明によれば、高屈折率と高透明性、さらに高耐熱性が要求される光学用部材に適したイミド化重合体及びその製造原料であるポリアミック酸を提供することができる。
According to the present invention, by using a diamine compound having a diphenylsulfone skeleton into which a sulfur atom is introduced, a high refractive index (a refractive index at a wavelength of 633 nm is 1.733 at the maximum) and high heat resistance are achieved.
ADVANTAGE OF THE INVENTION According to this invention, the imidized polymer suitable for the optical member by which high refractive index, high transparency, and also high heat resistance are requested | required, and the polyamic acid which is the manufacturing raw material can be provided.

I.一般式(1)で示される構造を有するポリアミック酸
本発明のポリアミック酸は、下記一般式(1)で示される構造を有し、それ自体の屈折率(25℃、波長400〜700nm)が非常に高く、高屈折率で、透明性及び耐熱性に優れた重合体を形成することができる。

Figure 2009067939
I. The polyamic acid having the structure represented by the general formula (1) The polyamic acid of the present invention has the structure represented by the following general formula (1), and its refractive index (25 ° C., wavelength 400 to 700 nm) is very high. In addition, a polymer having a high refractive index and excellent transparency and heat resistance can be formed.
Figure 2009067939

式(1)中、Rは4価の有機基を示し、具体的には、脂肪族、脂環族又は芳香族テトラカルボン酸二無水物から無水物基を除去した残基に相当し、得られる重合体が透明性に優れることから、脂環族テトラカルボン酸二無水物の残基であることが好ましい。また、Rは、高屈折率が得られることから、硫黄原子を含んでいることも好ましい。
はそれぞれ独立して炭素数1〜3のアルキル基を示し、aは基Rの置換数であり、それぞれ独立して0〜4の整数を示す。aは0であることが好ましい。
mは1〜100000の整数を示し、10〜10000の整数であることが好ましい。
In the formula (1), R represents a tetravalent organic group, and specifically corresponds to a residue obtained by removing an anhydride group from an aliphatic, alicyclic or aromatic tetracarboxylic dianhydride. Since the polymer obtained is excellent in transparency, it is preferably a residue of an alicyclic tetracarboxylic dianhydride. Moreover, since R has a high refractive index, it preferably contains a sulfur atom.
R 1 each independently represents an alkyl group having 1 to 3 carbon atoms, a is the number of substitutions of the group R 1 , and each independently represents an integer of 0 to 4. a is preferably 0.
m represents an integer of 1 to 100,000, and is preferably an integer of 10 to 10,000.

(a)一般式(1)で示される構造を有するポリアミック酸の製造
本発明のポリアミック酸は、下記一般式(3)で示されるジアミンと、下記一般式(4)で示されるテトラカルボン酸二無水物を反応させて得られる。

Figure 2009067939
上記式(3)及び(4)中、R、a及びRは、一般式(1)で説明した通りであるため、ここでは省略する。 (A) Production of polyamic acid having the structure represented by the general formula (1) The polyamic acid of the present invention includes a diamine represented by the following general formula (3) and a tetracarboxylic acid dicarboxylic acid represented by the following general formula (4). Obtained by reacting anhydride.
Figure 2009067939
In the above formulas (3) and (4), R 1 , a, and R are as described in the general formula (1), and thus are omitted here.

(b)一般式(3)で示されるジアミン
一般式(3)で示されるジアミンは公知化合物であり、公知の製造方法によって製造することができる。
一般式(3)において、2つのスルフィド基がスルホン基に対してそれぞれp−位に置換している下記一般式(3−1)で示される構造を有することが好ましい。

Figure 2009067939
(B) Diamine represented by the general formula (3) The diamine represented by the general formula (3) is a known compound and can be produced by a known production method.
In the general formula (3), it is preferable to have a structure represented by the following general formula (3-1) in which two sulfide groups are each substituted at the p-position with respect to the sulfone group.
Figure 2009067939

一般式(3)で示されるジアミンは、例えば、下記反応式によって示されるように、非プロトン性極性溶剤中、無水炭酸カリウムとアミノ置換チオフェノール誘導体とを室温〜200℃の温度で反応させ、アミノ置換チオフェノール誘導体のカリウム塩を合成する。そこに、ジハロゲン置換ジフェニルスルホン誘導体を添加することにより、一般式(3)で示されるジアミン化合物を製造することができる。   The diamine represented by the general formula (3), for example, as shown by the following reaction formula, reacts anhydrous potassium carbonate with an amino-substituted thiophenol derivative at a temperature of room temperature to 200 ° C. in an aprotic polar solvent, A potassium salt of an amino-substituted thiophenol derivative is synthesized. A diamine compound represented by the general formula (3) can be produced by adding a dihalogen-substituted diphenylsulfone derivative thereto.

Figure 2009067939
Figure 2009067939

尚、本発明のポリアミック酸は、上記一般式(3)で示される構造を有するジアミン以外のジアミンを含んでいてもよい。即ち、上記一般式(3)で示されるジアミンの他に、本発明の効果を損なわない範囲内で、硫黄原子を含有しないジアミンを併用することができる。この硫黄原子を含有しないジアミンとしては、例えば、p−フェニレンジアミン、m−フェニレンジアミン、4,4’−ジアミノジフェニルメタン、4,4’−ジアミノジフェニルエタン、4,4’−ジアミノジフェニルスルフィド、4,4’−ジアミノジフェニルスルホン、4,4’−ジアミノジフェニルエーテル、1,5−ジアミノナフタレン、3,3−ジメチル−4,4’−ジアミノビフェニル、4,4’−ジアミノベンズアニリド、3,4’−ジアミノジフェニルエーテル、3,3’−ジアミノベンゾフェノン、3,4’−ジアミノベンゾフェノン、4,4’−ジアミノベンゾフェノン、2,2−ビス[4−(4−アミノフェノキシ)フェニル]プロパン、2,2−ビス[4−(4−アミノフェノキシ)フェニル]ヘキサフルオロプロパン、2,2−ビス(4−アミノフェニル)ヘキサフルオロプロパン、2,2−ビス[4−(4−アミノフェノキシ)フェニル]スルホン、1,4−ビス(4−アミノフェノキシ)ベンゼン、1,3−ビス(4−アミノフェノキシ)ベンゼン、1,3−ビス(3−アミノフェノキシ)ベンゼン、9,9−ビス(4−アミノフェニル)−10−ヒドロアントラセン、9,9−ビス(4−アミノフェニル)フルオレン、4,4’−メチレン−ビス(2−クロロアニリン)、2,2’,5,5’−テトラクロロ−4,4’−ジアミノビフェニル、2,2’−ジクロロ−4,4’−ジアミノ−5,5’−ジメトキシビフェニル、3,3’−ジメトキシ−4,4’−ジアミノビフェニル、4,4’−(p−フェニレンジイソプロピリデン)ビスアニリン、4,4’−(m−フェニレンジイソプロピリデン)ビスアニリンを挙げることができる。   In addition, the polyamic acid of this invention may contain diamine other than the diamine which has a structure shown by the said General formula (3). That is, in addition to the diamine represented by the general formula (3), a diamine that does not contain a sulfur atom can be used in combination as long as the effects of the present invention are not impaired. Examples of the diamine not containing a sulfur atom include p-phenylenediamine, m-phenylenediamine, 4,4′-diaminodiphenylmethane, 4,4′-diaminodiphenylethane, 4,4′-diaminodiphenyl sulfide, 4, 4'-diaminodiphenyl sulfone, 4,4'-diaminodiphenyl ether, 1,5-diaminonaphthalene, 3,3-dimethyl-4,4'-diaminobiphenyl, 4,4'-diaminobenzanilide, 3,4'- Diaminodiphenyl ether, 3,3′-diaminobenzophenone, 3,4′-diaminobenzophenone, 4,4′-diaminobenzophenone, 2,2-bis [4- (4-aminophenoxy) phenyl] propane, 2,2-bis [4- (4-Aminophenoxy) phenyl] hexafluoropropyl Pan, 2,2-bis (4-aminophenyl) hexafluoropropane, 2,2-bis [4- (4-aminophenoxy) phenyl] sulfone, 1,4-bis (4-aminophenoxy) benzene, 1, 3-bis (4-aminophenoxy) benzene, 1,3-bis (3-aminophenoxy) benzene, 9,9-bis (4-aminophenyl) -10-hydroanthracene, 9,9-bis (4-amino) Phenyl) fluorene, 4,4′-methylene-bis (2-chloroaniline), 2,2 ′, 5,5′-tetrachloro-4,4′-diaminobiphenyl, 2,2′-dichloro-4,4 '-Diamino-5,5'-dimethoxybiphenyl, 3,3'-dimethoxy-4,4'-diaminobiphenyl, 4,4'-(p-phenylenediisopropylidene) bisaniline , 4,4 '- (m- phenylene-isopropylidene) can be mentioned bisaniline.

また、上記の硫黄原子を含有しないジアミンの他、ジアミノテトラフェニルチオフェン等のヘテロ原子を有する芳香族ジアミン;1,1−メタキシリレンジアミン、1,3−プロパンジアミン、テトラメチレンジアミン、ペンタメチレンジアミン、ヘキサメチレンジアミン、ヘプタメチレンジアミン、オクタメチレンジアミン、ノナメチレンジアミン、4,4−ジアミノヘプタメチレンジアミン、1,4−ジアミノシクロヘキサン、イソホロンジアミン、テトラヒドロジシクロペンタジエニレンジアミン、ヘキサヒドロ−4,7−メタノインダニレンジメチレンジアミン、トリシクロ[6,2,1,02.7]−ウンデシレンジメチルジアミン等の脂肪族又は脂環族ジアミンを併用することもできる。 In addition to the above-mentioned diamine not containing sulfur atoms, aromatic diamines having heteroatoms such as diaminotetraphenylthiophene; 1,1-metaxylylenediamine, 1,3-propanediamine, tetramethylenediamine, pentamethylenediamine , Hexamethylenediamine, heptamethylenediamine, octamethylenediamine, nonamethylenediamine, 4,4-diaminoheptamethylenediamine, 1,4-diaminocyclohexane, isophoronediamine, tetrahydrodicyclopentadienylenediamine, hexahydro-4,7 -Aliphatic or alicyclic diamines such as methanoin danylene dimethylene diamine and tricyclo [6,2,1,0 2.7 ] -undecylenedimethyl diamine may be used in combination.

本発明のポリアミック酸の製造に用いるジアミン類のうち、一般式(3)で示されるジアミンの割合は、50モル%以上であることが好ましく、80モル%以上であることがより好ましく、高屈折率を達成するためには100モル%であることが特に好ましい。   Among the diamines used for producing the polyamic acid of the present invention, the proportion of the diamine represented by the general formula (3) is preferably 50 mol% or more, more preferably 80 mol% or more, and high refraction. In order to achieve the rate, it is particularly preferably 100 mol%.

(c)一般式(4)で示されるテトラカルボン酸二無水物
本発明において用いられる酸無水物は上記一般式(4)で表される。式(4)中、Rはテトラカルボン酸二無水物から無水物基を除去した残基に相当する。このような化合物としては、脂肪族、脂環族又は芳香族テトラカルボン酸二無水物が挙げられ、脂肪族及び脂環族テトラカルボン酸二無水物が好ましく、得られる重合体が優れた透明性を有することから、脂環族テトラカルボン酸二無水物が特に好ましい。
(C) Tetracarboxylic dianhydride represented by the general formula (4) The acid anhydride used in the present invention is represented by the general formula (4). In the formula (4), R corresponds to a residue obtained by removing the anhydride group from tetracarboxylic dianhydride. Such compounds include aliphatic, alicyclic or aromatic tetracarboxylic dianhydrides, preferably aliphatic and alicyclic tetracarboxylic dianhydrides, and the resulting polymer has excellent transparency. In particular, alicyclic tetracarboxylic dianhydride is preferable.

脂肪族及び脂環族テトラカルボン酸二無水物の例としては、例えば、ブタンテトラカルボン酸二無水物、1,2,3,4−シクロブタンテトラカルボン酸二無水物、1,2,3,4−シクロペンタンテトラカルボン酸二無水物、4,10−ジオキサトリシクロ[6.3.1.02,7]ドデカン−3,5,9,11−テトラオン、1,2,4,5−シクロヘキサンテトラカルボン酸二無水物、2,3,5−トリカルボキシシクロペンチル酢酸二水和物、3,5,6−トリカルボキシノルボルナン−2−酢酸二無水物、2,3,4,5−テトラヒドロフランテトラカルボン酸二無水物、1,3,3a,4,5,9b−ヘキサヒドロ−5−テトラヒドロ−2,5−ジオキソ−3−フラニル)−ナフト[1,2−c]−フラン−1,3−ジオン、5−(2,5−ジオキソテトラヒドロフラル)−3−メチル−3−シクロヘキセン−1,2−ジカルボン酸二無水物、ビシクロ[2,2,2]−オクト−7−エン−2,3,5,6−テトラカルボン酸二無水物等の脂肪族及び脂環族テトラカルボン酸二無水物を挙げることができる。これらのうちではブタンテトラカルボン酸二無水物、1,2,3,4−シクロブタンテトラカルボン酸二無水物、4,10−ジオキサトリシクロ[6.3.1.02,7]ドデカン−3,5,9,11−テトラオン、2,3,5−トリカルボキシシクロペンチル酢酸二無水物、5−(2,5−ジオキソテトラヒドロフラル)−3−メチル−3−シクロヘキセン−1,2−ジカルボン酸二無水物及び1,3,3a,4,5,9b−ヘキサヒドロ−5−テトラヒドロ−2,5−ジオキソ−3−フラニル)−ナフト[1,2−c]−フラン−1,3−ジオンが好ましく、1,2,3,4−シクロブタンテトラカルボン酸二無水物、4,10−ジオキサトリシクロ[6.3.1.02,7]ドデカン−3,5,9,11−テトラオン、1,2,4,5−シクロヘキサンテトラカルボン酸二無水物が特に好ましい。 Examples of the aliphatic and alicyclic tetracarboxylic dianhydrides include, for example, butanetetracarboxylic dianhydride, 1,2,3,4-cyclobutanetetracarboxylic dianhydride, 1,2,3,4 -Cyclopentanetetracarboxylic dianhydride, 4,10-dioxatricyclo [6.3.1.0 2,7 ] dodecane-3,5,9,11-tetraone, 1,2,4,5- Cyclohexanetetracarboxylic dianhydride, 2,3,5-tricarboxycyclopentylacetic acid dihydrate, 3,5,6-tricarboxynorbornane-2-acetic acid dianhydride, 2,3,4,5-tetrahydrofurantetra Carboxylic dianhydride, 1,3,3a, 4,5,9b-hexahydro-5-tetrahydro-2,5-dioxo-3-furanyl) -naphtho [1,2-c] -furan-1,3- Zeon, -(2,5-dioxotetrahydrofural) -3-methyl-3-cyclohexene-1,2-dicarboxylic dianhydride, bicyclo [2,2,2] -oct-7-ene-2,3,5 And aliphatic and alicyclic tetracarboxylic dianhydrides such as 1,6-tetracarboxylic dianhydride. Among these, butanetetracarboxylic dianhydride, 1,2,3,4-cyclobutanetetracarboxylic dianhydride, 4,10-dioxatricyclo [6.3.1.0 2,7 ] dodecane- 3,5,9,11-tetraone, 2,3,5-tricarboxycyclopentyl acetic acid dianhydride, 5- (2,5-dioxotetrahydrofural) -3-methyl-3-cyclohexene-1,2-dicarboxylic acid Acid dianhydride and 1,3,3a, 4,5,9b-hexahydro-5-tetrahydro-2,5-dioxo-3-furanyl) -naphtho [1,2-c] -furan-1,3-dione 1,2,3,4-cyclobutanetetracarboxylic dianhydride, 4,10-dioxatricyclo [6.3.1.0 2,7 ] dodecane-3,5,9,11-tetraone 1, 2, 4, 5-cyclohexanetetracarboxylic dianhydride is particularly preferred.

芳香族テトラカルボン酸二無水物の具体例としては、例えば、ピロメリット酸二無水物、3,3’,4,4’−ベンゾフェノンテトラカルボン酸二無水物、3,3’,4,4’−ビフェニルスルホンテトラカルボン酸二無水物、1,4,5,8−ナフタレンテトラカルボン酸二無水物、2,3,6,7−ナフタレンテトラカルボン酸二無水物、3,3’,4,4’−ビフェニルエーテルテトラカルボン酸二無水物、3,3’,4,4’−ジメチルジフェニルシランテトラカルボン酸二無水物、3,3’,4,4’−テトラフェニルシランテトラカルボン酸二無水物、1,2,3,4−フランテトラカルボン酸二無水物、4,4’−ビス(3,4−ジカルボキシフェノキシ)ジフェニルスルフィド二無水物、4,4’−ビス(3,4−ジカルボキシフェノキシ)ジフェニルスルホン二無水物、4,4’−ビス(3,4−ジカルボキシフェノキシ)ジフェニルプロパン二無水物、4,4’−(ヘキサフルオロイソプロピリデン)ビス(フタル酸)二無水物、3,3’,4,4’−ビフェニルテトラカルボン酸二無水物、ビス(フタル酸)フェニルホスフィンオキサイド二無水物、p−フェニレン−ビス(トリフェニルフタル酸)二無水物、m−フェニレン−ビス(トリフェニルフタル酸)二無水物、ビス(トリフェニルフタル酸)−4,4’−ジフェニルエーテル二無水物、ビス(トリフェニルフタル酸)−4,4’−ジフェニルメタン二無水物等の芳香族テトラカルボン酸二無水物を挙げることができる。これらのうちでは、ピロメリット酸二無水物、3,3’,4,4’−ベンゾフェノンテトラカルボン酸二無水物、3,3’,4,4’−ビフェニルスルホンテトラカルボン酸二無水物、4,4’−(ヘキサフルオロイソプロピリデン)ビス(フタル酸)二無水物及び3,3’,4,4’−ビフェニルテトラカルボン酸二無水物が好ましい。   Specific examples of the aromatic tetracarboxylic dianhydride include, for example, pyromellitic dianhydride, 3,3 ′, 4,4′-benzophenone tetracarboxylic dianhydride, 3,3 ′, 4,4 ′. -Biphenylsulfone tetracarboxylic dianhydride, 1,4,5,8-naphthalene tetracarboxylic dianhydride, 2,3,6,7-naphthalene tetracarboxylic dianhydride, 3,3 ', 4,4 '-Biphenyl ether tetracarboxylic dianhydride, 3,3', 4,4'-dimethyldiphenylsilane tetracarboxylic dianhydride, 3,3 ', 4,4'-tetraphenylsilane tetracarboxylic dianhydride 1,2,3,4-furantetracarboxylic dianhydride, 4,4′-bis (3,4-dicarboxyphenoxy) diphenyl sulfide dianhydride, 4,4′-bis (3,4-dicarbo) Ciphenoxy) diphenylsulfone dianhydride, 4,4′-bis (3,4-dicarboxyphenoxy) diphenylpropane dianhydride, 4,4 ′-(hexafluoroisopropylidene) bis (phthalic acid) dianhydride, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, bis (phthalic acid) phenylphosphine oxide dianhydride, p-phenylene-bis (triphenylphthalic acid) dianhydride, m-phenylene-bis Aromatic tetra such as (triphenylphthalic acid) dianhydride, bis (triphenylphthalic acid) -4,4′-diphenyl ether dianhydride, bis (triphenylphthalic acid) -4,4′-diphenylmethane dianhydride Carboxylic dianhydrides can be mentioned. Among these, pyromellitic dianhydride, 3,3 ′, 4,4′-benzophenone tetracarboxylic dianhydride, 3,3 ′, 4,4′-biphenylsulfone tetracarboxylic dianhydride, 4 4,4 '-(Hexafluoroisopropylidene) bis (phthalic acid) dianhydride and 3,3', 4,4'-biphenyltetracarboxylic dianhydride are preferred.

また、より高屈折率のポリアミック酸が得られることから、硫黄原子を含むテトラカルボン酸二無水物を用いることも好ましい。硫黄原子含有酸無水物の例としては、例えば、4,4’−[p−チオビス(フェニレン−スルファニル)]ジフタル酸無水物等が挙げられる。   In addition, since a polyamic acid having a higher refractive index can be obtained, it is also preferable to use a tetracarboxylic dianhydride containing a sulfur atom. Examples of sulfur atom-containing acid anhydrides include 4,4 '-[p-thiobis (phenylene-sulfanyl)] diphthalic anhydride.

(d)一般式(3)で示されるジアミンと一般式(4)で示されるテトラカルボン酸二無水物の反応
一般に、N−メチル−2−ピロリドン等の非プロトン性有機溶媒中において、ジアミン化合物と酸二無水物とを攪拌混合することによって、本発明のポリアミック酸を溶液として得ることができる。例えば、ジアミン化合物を有機溶媒に溶解し、これに酸二無水物を加えて、攪拌混合してもよく、また、ジアミン化合物と酸二無水物との混合物を有機溶媒に加えて、攪拌混合してもよい。反応は、通常、100℃以下、好ましくは、80℃以下の温度で、常圧下に行われる。しかし、反応は、必要に応じて、加圧下又は減圧下に行ってもよい。反応時間は、用いるジアミン化合物と酸二無水物や、有機溶媒、反応温度等によって異なるが、通常、4〜24時間の範囲である。
(D) Reaction of the diamine represented by the general formula (3) and the tetracarboxylic dianhydride represented by the general formula (4) Generally, in an aprotic organic solvent such as N-methyl-2-pyrrolidone, a diamine compound And the acid dianhydride are stirred and mixed, whereby the polyamic acid of the present invention can be obtained as a solution. For example, a diamine compound may be dissolved in an organic solvent, and acid dianhydride may be added thereto and mixed with stirring. Alternatively, a mixture of a diamine compound and acid dianhydride may be added to an organic solvent and mixed with stirring. May be. The reaction is usually performed at a temperature of 100 ° C. or lower, preferably 80 ° C. or lower, under normal pressure. However, the reaction may be performed under pressure or under reduced pressure as necessary. The reaction time varies depending on the diamine compound and acid dianhydride used, the organic solvent, the reaction temperature, etc., but is usually in the range of 4-24 hours.

本発明のポリアミック酸は、これをイミド化反応により脱水閉環させることにより、高い屈折率、優れた透明性及び優れた耐熱性を有する重合体(イミド化重合体)を与えるため、これらの特性を必要とする光学用部材の製造用材料として好適である。   The polyamic acid of the present invention gives a polymer having a high refractive index, excellent transparency and excellent heat resistance (imidized polymer) by dehydrating and ring-closing this by an imidization reaction. It is suitable as a material for manufacturing required optical members.

II.一般式(2)で示されるイミド化重合体
本発明のイミド化重合体は、下記一般式(2)で示される構造を有する。

Figure 2009067939
式(2)中のR、a、R及びmは、一般式(1)と同様であるためここでは説明を省略する。 II. The imidized polymer represented by the general formula (2) The imidized polymer of the present invention has a structure represented by the following general formula (2).
Figure 2009067939
Since R 1 , a, R and m in the formula (2) are the same as those in the general formula (1), description thereof is omitted here.

本発明のイミド化重合体は、上記本発明のポリアミック酸を、窒素雰囲気下で80〜300℃の温度で、1〜5時間加熱することによって、ポリアミック酸がイミド化されて、上記一般式(2)で示される構造を有するイミド化重合体となる。   The imidized polymer of the present invention is prepared by heating the polyamic acid of the present invention at a temperature of 80 to 300 ° C. in a nitrogen atmosphere for 1 to 5 hours, whereby the polyamic acid is imidized, and the general formula ( It becomes an imidized polymer having the structure represented by 2).

本発明のイミド化重合体は、波長633nmにおける屈折率が、通常1.60以上であり、好ましくは1.68以上、より好ましくは1.70以上である。   The imidized polymer of the present invention has a refractive index at a wavelength of 633 nm of usually 1.60 or more, preferably 1.68 or more, more preferably 1.70 or more.

本発明のイミド化重合体は、高い屈折率、優れた透明性及び優れた耐熱性を必要とする光学用部材として好適である。本発明のイミド化重合体を用いた光学用部材としては、例えば、固体撮像素子の集光材料、記録用ディスクの集光材料等が挙げられる。   The imidized polymer of the present invention is suitable as an optical member that requires a high refractive index, excellent transparency, and excellent heat resistance. Examples of the optical member using the imidized polymer of the present invention include a light collecting material for a solid-state imaging device, a light collecting material for a recording disk, and the like.

以下、本発明を実施例によってさらに具体的に説明するが、本発明はこれらの実施例によって何ら制限されるものではない。   EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples, but the present invention is not limited to these examples.

合成例1
4,4’−ビス(4−アミノフェニレンスルファニル)ジフェニルスルホン

Figure 2009067939
Synthesis example 1
4,4'-bis (4-aminophenylenesulfanyl) diphenylsulfone
Figure 2009067939

攪拌機、還流冷却器、Dean−Starkトラップ及び窒素導入管を備えた反応容器に、p−アミノチオフェノール(15.0g、0.120mol)と無水炭酸カリウム(8.40g、0.060mol)、4,4’−ジクロロジフェニルスルホン(14.4g、0.050mol)を加え、150℃で1時間、170℃で2時間反応させた。反応液を室温まで冷却し、脱水エタノール(200mL)を加え、1時間加熱還流した。その後、反応液を室温まで戻し、反応液を冷水(500mL)に注ぎ析出物を得た。析出物はエタノールで再結晶し、白色の固体を得た。   In a reaction vessel equipped with a stirrer, reflux condenser, Dean-Stark trap and nitrogen introduction tube, p-aminothiophenol (15.0 g, 0.120 mol) and anhydrous potassium carbonate (8.40 g, 0.060 mol), 4 , 4′-Dichlorodiphenylsulfone (14.4 g, 0.050 mol) was added and reacted at 150 ° C. for 1 hour and 170 ° C. for 2 hours. The reaction solution was cooled to room temperature, dehydrated ethanol (200 mL) was added, and the mixture was heated to reflux for 1 hour. Thereafter, the reaction solution was returned to room temperature, and the reaction solution was poured into cold water (500 mL) to obtain a precipitate. The precipitate was recrystallized from ethanol to obtain a white solid.

収量:19.7g
収率:84.8%
融点:218.6℃(DSC)
H−NMR(300MHz、DMSO−d、ppm):5.56(s、4H)、6.63−6.66(d、4H)、7.07−7.11(d、4H)、7.15−7.18(d、4H)、7.68−7.71(d、2H)
FTIR(KBr、cm−1):3475.1、3378.7、1623.8、1592.9、1573.6、1496.5、1396.2、1315.2、1157.1、1079.9、1006.7、829.2,763.7
元素分析:計算値:C2420:C、62.04%;H、4.34%;N、6.03%
測定値:C、62.28%;H、4.33%;N、5.79%
Yield: 19.7g
Yield: 84.8%
Melting point: 218.6 ° C. (DSC)
1 H-NMR (300 MHz, DMSO-d 6 , ppm): 5.56 (s, 4H), 6.63-6.66 (d, 4H), 7.07-7.11 (d, 4H), 7.15-7.18 (d, 4H), 7.68-7.71 (d, 2H)
FTIR (KBr, cm −1 ): 3475.1, 3378.7, 1623.8, 1592.9, 1573.6, 1496.5, 1396.2, 1315.2, 1157.1, 1079.9, 1006 .7, 829.2, 763.7
Calcd: C 24 H 20 N 2 O 2 S 3: C, 62.04%; H, 4.34%; N, 6.03%
Measurement: C, 62.28%; H, 4.33%; N, 5.79%

合成例2
4,4’−[p−チオビス(フェニレン−スルファニル)]ジフタル酸無水物

Figure 2009067939
Synthesis example 2
4,4 ′-[p-thiobis (phenylene-sulfanyl)] diphthalic anhydride
Figure 2009067939

攪拌機、還流冷却器及び窒素導入管を備えた反応容器に、4,4’−チオビスベンゼンチオール(5.00g、0.02mol)と4−ブロモフタル酸無水物(10.00g、0.044mol)、無水炭酸カリウム(6.08g、0.044mol)、そしてN,N−ジメチルホルムアミド(以下、DMFという)(100mL)を加え、120℃で12時間反応させた。反応液を室温に戻し、白色の固体を濾取し、160℃で24時間減圧乾燥した。得られた白色の固体に蒸留水(100mL)と濃塩酸(100mL)を加え、3時間の間、加熱攪拌した。得られた白色の固体を濾取し、180〜190℃で3時間加熱し黄色の固体を得た。   In a reaction vessel equipped with a stirrer, a reflux condenser and a nitrogen introduction tube, 4,4′-thiobisbenzenethiol (5.00 g, 0.02 mol) and 4-bromophthalic anhydride (10.00 g, 0.044 mol) , Anhydrous potassium carbonate (6.08 g, 0.044 mol), and N, N-dimethylformamide (hereinafter referred to as DMF) (100 mL) were added and reacted at 120 ° C. for 12 hours. The reaction solution was returned to room temperature, and a white solid was collected by filtration and dried under reduced pressure at 160 ° C. for 24 hours. Distilled water (100 mL) and concentrated hydrochloric acid (100 mL) were added to the obtained white solid, and the mixture was heated and stirred for 3 hours. The obtained white solid was collected by filtration and heated at 180 to 190 ° C. for 3 hours to obtain a yellow solid.

収量:7.8g
収率:71.9%
融点:175.2℃(DSC)
FT−IR(KBr、cm−1):1847.5、1778.0、1604.4、1473.3、1326.8、1257.4、902.5、817.7、732.0
H−NMR(300MHz、DMSO−d、ppm):7.45−7.49(d、4H)、7.52−7.55(d、4H)、7.56(s、2H)、7.60−7.63(d、2H)、7.83−7.85(d、2H)
元素分析:計算値 C2814:C、61.98%;H、2.60%
測定値 C、62.23%;H、2.97%
Yield: 7.8g
Yield: 71.9%
Melting point: 175.2 ° C (DSC)
FT-IR (KBr, cm < -1 >): 1847.5, 1778.0, 1604.4, 1473.3, 1326.8, 1257.4, 902.5, 817.7, 732.0
1 H-NMR (300 MHz, DMSO-d 6 , ppm): 7.45-7.49 (d, 4H), 7.52 to 7.55 (d, 4H), 7.56 (s, 2H), 7.60-7.63 (d, 2H), 7.83-7.85 (d, 2H)
Calcd C 28 H 14 O 6 S 3 : C, 61.98%; H, 2.60%
Measured value C, 62.23%; H, 2.97%

合成例3
ジフェニルスルホン−3,3’−ジスルホニルクロライド

Figure 2009067939
Synthesis example 3
Diphenylsulfone-3,3′-disulfonyl chloride
Figure 2009067939

攪拌機、還流冷却器、窒素導入管を備えた反応容器に、ジフェニルスルホン(23.8g、0.11mol)とスルホン酸クロライド(58mL、0.87mol)を加え、反応溶液を140℃で4時間攪拌した。反応液を室温まで冷却し、冷却した蒸留水(500mL)に注ぎ固体を析出させた。析出した固体を濾取・水洗し、80℃で24時間減圧乾燥させた。その後、酢酸エチルで再結晶することにより白色の結晶を得た。
収量:32.9g
収率:72%
融点:181.0℃(DSC)
H−NMR(300MHz、CDCl、ppm):7.85−7.91(t、2H)、8.28−8.36(m、4H)、8.61−8.62(m、2H)
Diphenylsulfone (23.8 g, 0.11 mol) and sulfonic acid chloride (58 mL, 0.87 mol) were added to a reaction vessel equipped with a stirrer, a reflux condenser, and a nitrogen introduction tube, and the reaction solution was stirred at 140 ° C. for 4 hours. did. The reaction solution was cooled to room temperature and poured into cooled distilled water (500 mL) to precipitate a solid. The precipitated solid was collected by filtration, washed with water, and dried under reduced pressure at 80 ° C. for 24 hours. Then, white crystals were obtained by recrystallization with ethyl acetate.
Yield: 32.9g
Yield: 72%
Melting point: 181.0 ° C. (DSC)
1 H-NMR (300 MHz, CDCl 3 , ppm): 7.85-7.91 (t, 2H), 8.28-8.36 (m, 4H), 8.61-8.62 (m, 2H) )

合成例4
ジフェニルスルホン−3,3’−ジチオール

Figure 2009067939
Synthesis example 4
Diphenylsulfone-3,3′-dithiol
Figure 2009067939

攪拌機、還流冷却器、窒素導入管を備えた反応容器に、無水塩化スズ(50g、0.22mol)、酢酸(100mL)、そして塩酸(40mL)を入れ、反応液を90℃に加熱した。ここに合成例1で合成したジフェニルスルホン−3,3’−ジスルホニルクロライド(4.15g、0.01mol)を加え攪拌した。反応液を90℃で3時間攪拌し、室温まで冷却した。その後、反応液を塩酸(20mL)を含む蒸留水(200mL)に注いだ。析出した固体を濾取した。濾取物は水洗し80℃で24時間減圧乾燥した。
収量:2.57g
収率:91.0%
融点:107.5℃(DSC)
H−NMR(300MHz、CDCl、ppm):3.64(s、2H)、7.34−7.46(m、4H)、7.67−7.70(d、2H)、7.81−7.82(m、2H)
Anhydrous tin chloride (50 g, 0.22 mol), acetic acid (100 mL), and hydrochloric acid (40 mL) were placed in a reaction vessel equipped with a stirrer, a reflux condenser, and a nitrogen introduction tube, and the reaction solution was heated to 90 ° C. Diphenyl sulfone-3,3′-disulfonyl chloride (4.15 g, 0.01 mol) synthesized in Synthesis Example 1 was added thereto and stirred. The reaction was stirred at 90 ° C. for 3 hours and cooled to room temperature. Thereafter, the reaction solution was poured into distilled water (200 mL) containing hydrochloric acid (20 mL). The precipitated solid was collected by filtration. The filtered product was washed with water and dried under reduced pressure at 80 ° C. for 24 hours.
Yield: 2.57g
Yield: 91.0%
Melting point: 107.5 ° C. (DSC)
1 H-NMR (300 MHz, CDCl 3 , ppm): 3.64 (s, 2H), 7.34-7.46 (m, 4H), 7.67-7.70 (d, 2H), 7. 81-7.82 (m, 2H)

合成例5
4,4’−[m−スルホニルビス(フェニレンスルファニル)]ジフタル酸無水物

Figure 2009067939
Synthesis example 5
4,4 '-[m-sulfonylbis (phenylenesulfanyl)] diphthalic anhydride
Figure 2009067939

攪拌機、還流冷却器、窒素導入管を備えた反応容器に、合成例2で合成したジフェニルスルホン−3,3’−ジチオール(2.82g、0.01mol)、4−ブロモフタル酸無水物(5.00g、0.022mol)、無水炭酸カリウム(3.04g、0.022mol)、そしてN,N−ジメチルホルムアミド(以下、DMFという)(50mL)を入れ、反応溶液を120℃で12時間加熱還流した。室温まで冷却後に生成した白色固体を濾取し、160℃で24時間減圧乾燥した。得られた白色固体に濃塩酸(50mL)を加え加熱し、室温まで冷却後に濾取・水洗した。その後、水を減圧留去し、さらに160〜180℃で3時間減圧乾燥させ淡黄色の固体を得た。   In a reaction vessel equipped with a stirrer, a reflux condenser, and a nitrogen introduction tube, diphenylsulfone-3,3′-dithiol (2.82 g, 0.01 mol) synthesized in Synthesis Example 2 and 4-bromophthalic anhydride (5. 00 g, 0.022 mol), anhydrous potassium carbonate (3.04 g, 0.022 mol), and N, N-dimethylformamide (hereinafter referred to as DMF) (50 mL) were added, and the reaction solution was heated to reflux at 120 ° C. for 12 hours. . The white solid produced after cooling to room temperature was collected by filtration and dried under reduced pressure at 160 ° C. for 24 hours. Concentrated hydrochloric acid (50 mL) was added to the obtained white solid and heated, and after cooling to room temperature, it was collected by filtration and washed with water. Thereafter, water was distilled off under reduced pressure and further dried under reduced pressure at 160 to 180 ° C. for 3 hours to obtain a pale yellow solid.

収量:4.20g
収率:73.1%
融点:193.3℃(DSC)
H−NMR(300MHz、CDCl、ppm):7.57−7.59(d、2H)、7.62−7.67(m、4H)、7.73−7.78(d、2H)、7.86−7.90(d、2H)、8.10−8.12(m、2H)
13C−NMR(75MHz、CDCl、ppm):162.3、162.1、148.6、143.2、138.9、134.7、133.3、132.7、132.6、131.7、128.9、126.3、123.7
FTIR(KBr、cm−1):1851.3、1774.2、1604.5、1461.8、1423.2、1326.8、1295.9、1257.4、1160.9、902.5、732.8、686.5、605.5
元素分析:計算値:C2814:C、58.53%;H、2.46%
測定値:C、58.19%;H、2.73%
Yield: 4.20g
Yield: 73.1%
Melting point: 193.3 ° C. (DSC)
1 H-NMR (300 MHz, CDCl 3 , ppm): 7.57-7.59 (d, 2H), 7.62-7.67 (m, 4H), 7.73-7.78 (d, 2H) ), 7.86-7.90 (d, 2H), 8.10-8.12 (m, 2H)
13 C-NMR (75 MHz, CDCl 3 , ppm): 162.3, 162.1, 148.6, 143.2, 138.9, 134.7, 133.3, 132.7, 132.6, 131 .7, 128.9, 126.3, 123.7
FTIR (KBr, cm −1 ): 1851.3, 1774.2, 1604.5, 1461.8, 1423.2, 1326.8, 1295.9, 1257.4, 1160.9, 902.5, 732 .8, 686.5, 605.5
Calcd: C 28 H 14 N 2 0 8 S 3: C, 58.53%; H, 2.46%
Measurement: C, 58.19%; H, 273%

<ポリアミック酸の製造>
実施例1
窒素導入管を備えた反応容器に、合成例1で合成した4,4’−ビス(4−アミノフェニレンスルファニル)ジフェニルスルホン(以下、BADPSという)(17.30g、40mmol)にN−メチル−2−ピロリドン(以下、NMPという)(80g)を加え、室温で攪拌し完全に溶解させた。次に、合成例2で合成した4,4’−[p−チオビス(フェニレン−スルファニル)]ジフタル酸無水物(以下、3SDEAという)(21.70g、40mmol)とNMP(25g)を添加し、室温で24時間攪拌して、ポリアミック酸のNMP溶液を得た。
<Production of polyamic acid>
Example 1
In a reaction vessel equipped with a nitrogen introduction tube, 4,4′-bis (4-aminophenylenesulfanyl) diphenylsulfone (hereinafter referred to as BADPS) (17.30 g, 40 mmol) synthesized in Synthesis Example 1 was added to N-methyl-2. -Pyrrolidone (hereinafter referred to as NMP) (80 g) was added and stirred at room temperature to completely dissolve. Next, 4,4 ′-[p-thiobis (phenylene-sulfanyl)] diphthalic anhydride (hereinafter referred to as 3SDEA) (21.70 g, 40 mmol) and NMP (25 g) synthesized in Synthesis Example 2 were added, The mixture was stirred at room temperature for 24 hours to obtain an NMP solution of polyamic acid.

実施例2〜5
実施例1で用いた3SDEAの代わりに、下記表1に示す酸無水物を用いた他は、実施例1と同様の方法で重合を行い、各ポリアミック酸のNMP溶液を得た。
Examples 2-5
Instead of 3SDEA used in Example 1, polymerization was carried out in the same manner as in Example 1 except that acid anhydrides shown in Table 1 below were used to obtain NMP solutions of each polyamic acid.

比較例1
窒素導入管を備えた反応容器に、ビス(p−アミノフェニル)エーテル(以下、ODAという)(8.01g、40mmol)にNMP(80g)を加え、室温で攪拌し完全に溶解させた。次に、1,2,3,4−シクロブタンテトラカルボン酸二無水物(以下、CBDAという)(7.84g、40mmol)とNMP(25g)を添加し、室温で24時間攪拌して、ポリアミック酸のNMP溶液を得た。
Comparative Example 1
NMP (80 g) was added to bis (p-aminophenyl) ether (hereinafter referred to as ODA) (8.01 g, 40 mmol) in a reaction vessel equipped with a nitrogen introduction tube, and stirred at room temperature for complete dissolution. Next, 1,2,3,4-cyclobutanetetracarboxylic dianhydride (hereinafter referred to as CBDA) (7.84 g, 40 mmol) and NMP (25 g) were added, and the mixture was stirred at room temperature for 24 hours. Of NMP was obtained.

実施例4で得られたポリアミック酸のIRチャートを図1に示す。   An IR chart of the polyamic acid obtained in Example 4 is shown in FIG.

<イミド化重合体膜の作成>
3インチ径3mm厚の溶融石英基板上に実施例及び比較例で製造したポリアミック酸のNMP溶液をディスペンスし、厚さが約8〜12μmになるようにスピンコート塗布し、窒素雰囲気下280℃で1.5時間加熱し、イミド化重合体の膜を得た。
得られた実施例4のイミド化重合体のIRチャートを図2に示す。
<Creation of imidized polymer film>
An NMP solution of polyamic acid produced in Examples and Comparative Examples was dispensed on a 3 inch diameter 3 mm thick fused quartz substrate, spin coated to a thickness of about 8-12 μm, and applied at 280 ° C. in a nitrogen atmosphere. Heating for 1.5 hours gave an imidized polymer film.
An IR chart of the obtained imidized polymer of Example 4 is shown in FIG.

<イミド化重合体膜の特性評価>
上記で得られたイミド化重合体膜について下記特性を評価した。結果を表1に示す。
<Characteristic evaluation of imidized polymer film>
The following characteristics were evaluated for the imidized polymer film obtained above. The results are shown in Table 1.

(1)屈折率
Metricon社のPC−2000型プリズムカプラーを使用して、上記で得られたイミド化重合体膜の、波長633nmにおける屈折率を測定した。
(1) Refractive index Using a Metricon PC-2000 type prism coupler, the refractive index at a wavelength of 633 nm of the imidized polymer film obtained above was measured.

(2)透過率
日立製作所社製のU−3500型自記分光光度計を使用して、上記で得られたイミド化重合体膜の膜厚10μm当たりの波長450nmにおける透過率(%)を測定した。
(2) Transmittance Using a U-3500 self-recording spectrophotometer manufactured by Hitachi, Ltd., transmittance (%) at a wavelength of 450 nm per 10 μm thickness of the imidized polymer film obtained above was measured. .

(3)耐熱性
セイコーインスツル社製のDSC6300(昇温速度10℃/分、窒素気流下)を使用して、上記で得られたイミド化重合体膜の5%重量減少温度を測定した。5%重量減少温度が400℃以上の場合を耐熱性合格(○)と評価した。
(3) Heat resistance A 5% weight loss temperature of the imidized polymer film obtained above was measured using a DSC6300 manufactured by Seiko Instruments Inc. (temperature increase rate: 10 ° C./min, under nitrogen stream). The case where the 5% weight loss temperature was 400 ° C. or higher was evaluated as heat resistance pass (◯).

Figure 2009067939
Figure 2009067939

表1中の略号は下記のものを表す。
BADPS:4,4’−ビス(4−アミノフェニレンスルファニル)ジフェニルスルホン(合成例1)
ODA:ビス(p−アミノフェニル)エーテル
3SDEA:4,4’−[p−チオビス(フェニレン−スルファニル)]ジフタル酸無水物(合成例2)
BPDA:sBPDA:3,3’,4,4’−ビフェニルテトラカルボン酸二無水物
ODPA:4,4’−オキシジフタル酸二無水物
DPSDA:4,4’−[m−スルホニルビス(フェニレンスルファニル)]ジフタル酸無水物(合成例5)
CBDA:1,2,3,4−シクロブタンテトラカルボン酸二無水物
Abbreviations in Table 1 represent the following.
BADPS: 4,4′-bis (4-aminophenylenesulfanyl) diphenyl sulfone (Synthesis Example 1)
ODA: bis (p-aminophenyl) ether 3SDEA: 4,4 ′-[p-thiobis (phenylene-sulfanyl)] diphthalic anhydride (Synthesis Example 2)
BPDA: sBPDA: 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride ODPA: 4,4′-oxydiphthalic dianhydride DPSDA: 4,4 ′-[m-sulfonylbis (phenylenesulfanyl)] Diphthalic anhydride (Synthesis Example 5)
CBDA: 1,2,3,4-cyclobutanetetracarboxylic dianhydride

表1の結果から、一般式(1)で示されるポリアミック酸は波長633nmにおける屈折率が1.700〜1.733と非常に高く、450nmにおける透過率が高く、耐熱性に優れており、高い屈折率及び優れた耐熱性を必要とする光学用部材の製造材料として有用であることがわかる。   From the results of Table 1, the polyamic acid represented by the general formula (1) has a very high refractive index of 1.700 to 1.733 at a wavelength of 633 nm, a high transmittance at 450 nm, excellent heat resistance, and high It turns out that it is useful as a manufacturing material of the optical member which requires a refractive index and the outstanding heat resistance.

本発明のポリアミック酸は、高屈折率と高透明性、さらに高耐熱性が要求される光学用部材の製造原料として有用である。
本発明のイミド化重合体は、例えば、高反射材料及び反射防止膜の高屈折率材のコーティング材料や、光導波路、各種レンズ、固体撮像素子や記録用ディスクの感度向上材料として有用である。
The polyamic acid of the present invention is useful as a raw material for producing optical members that require high refractive index, high transparency, and high heat resistance.
The imidized polymer of the present invention is useful as, for example, a coating material for a high refractive index material and a high refractive index material for an antireflection film, a material for improving the sensitivity of optical waveguides, various lenses, solid-state imaging devices and recording disks.

実施例4で得られたポリアミック酸のFT−IRチャートである。4 is an FT-IR chart of the polyamic acid obtained in Example 4. 実施例4で得られたポリアミック酸をイミド化させて得られたイミド化重合体のFT−IRチャートである。4 is an FT-IR chart of an imidized polymer obtained by imidizing the polyamic acid obtained in Example 4. FIG.

Claims (2)

下記一般式(1)で示される構造を有するポリアミック酸。
Figure 2009067939
[式(1)中、Rは4価の有機基を示し、Rはそれぞれ独立して炭素数1〜3のアルキル基を示し、aはそれぞれ独立して0〜4の整数を示し、mは1〜100000の整数を示す。]
A polyamic acid having a structure represented by the following general formula (1).
Figure 2009067939
[In the formula (1), R represents a tetravalent organic group, each R 1 independently represents an alkyl group having 1 to 3 carbon atoms, a represents each independently an integer of 0 to 4, m Represents an integer of 1 to 100,000. ]
下記一般式(2)で示される構造を有するイミド化重合体。
Figure 2009067939
[式(2)中、Rはそれぞれ独立して炭素数1〜3のアルキル基を示し、aはそれぞれ独立して0〜4の整数を示し、Rは4価の有機基を示し、mは1〜100000の整数を示す。]
An imidized polymer having a structure represented by the following general formula (2).
Figure 2009067939
[In Formula (2), each R 1 independently represents an alkyl group having 1 to 3 carbon atoms, a represents each independently an integer of 0 to 4, R represents a tetravalent organic group, m Represents an integer of 1 to 100,000. ]
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Publication number Priority date Publication date Assignee Title
CN104672175A (en) * 2015-03-05 2015-06-03 合肥工业大学 Diphenylsulphone thiadiazole thioether contained dimercapto monomer with high refractive index and synthesis method

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JPS63309524A (en) * 1987-06-12 1988-12-16 Mitsubishi Petrochem Co Ltd Aromatic polythioether imide
JPS64121A (en) * 1987-02-13 1989-01-05 New Japan Chem Co Ltd Polyimide resin composition and its production
JP2007332186A (en) * 2006-06-12 2007-12-27 Nitto Denko Corp Polyimide compound and its manufacturing method

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CN104672175A (en) * 2015-03-05 2015-06-03 合肥工业大学 Diphenylsulphone thiadiazole thioether contained dimercapto monomer with high refractive index and synthesis method

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