JP2009066540A - Washing apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a washing apparatus which turns a flow of a washing fluid upward to minimize a downward flow, clarifies the relationship between the aperture rates of a flow regulation plates and of a diffusion plate and the dispersion of liquid flows, and is provided with a means capable of real-timely monitoring the dispersion of liquid flows. <P>SOLUTION: The washing apparatus of the present invention is provided with a washing barrel which holds an upwardly flowing washing fluid, flow regulation plates on the surface of each of which small holes through which a washing fluid passes and which are arranged on the bottom of the washing barrel, and a diffusion plate on the surface of which small holes through which the washing fluid passes and which is situated in position above the feed port of the washing fluid and below the flow regulation plates. Further, the washing apparatus is provided with a means having a flow regulation monitoring mechanism which can visualize the liquid flow near the inside wall of the washing barrel by having one or more fine threads fixed on the inside wall of the washing barrel to real-timely monitor the dispersion of liquid flows. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a cleaning processing apparatus.

  For example, in an electronic device manufacturing process such as a liquid crystal display device, a semiconductor element, and a plasma display, contamination of particles, organic contaminants, metal contaminants, etc. attached to the surface of the object to be processed, or a natural oxide film formed on the surface A cleaning processing apparatus is used to remove water. In the conventional overflow type wet cleaning processing apparatus, a cleaning processing liquid such as a surfactant or ultrapure water in the cleaning processing is supplied from the bottom to the top in the cleaning processing tank, while the liquid flow in the cleaning processing tank is directed upward. There is a structure in which a rectifying plate having a large number of small holes is installed in a tank and a carrier holding an object to be processed is placed on the rectifying plate for the purpose of forming a laminar flow. Here, upward and upward are directions opposite to the direction in which an object naturally falls due to gravity. A cleaning processing apparatus having such a structure is disclosed in Patent Document 1, for example. Conventionally, the small holes are uniformly formed in the current plate, but Patent Document 1 makes the small holes in the portion near the workpiece in the current plate larger than the small holes in the other parts, A plurality of rectifying plates are arranged to form a uniform laminar flow from the lower side to the upper side of the cleaning treatment tank so as to uniformly clean the object to be processed. In Patent Document 1, as a method of observing the flow state of pure water in the cleaning device, a method of observing the behavior of polystyrene particles using an argon laser while mixing polystyrene particles in pure water is used. .

  In Patent Document 2, in a cleaning processing apparatus having a rectifying means composed of a rectifying plate and a diffusion plate disposed above a supply port, the inside of the processing tank is raised by forming a blocking wall for the cleaning processing liquid. It is disclosed that turbulence can be prevented from occurring in the cleaning treatment liquid.

  Patent Document 3 discloses that the positions of the small holes provided in each of the rectifying plates are shifted from each other between the rectifying plates adjacent to each other, thereby contributing to rectification of the cleaning liquid.

Japanese Patent Laid-Open No. 4-56321 JP-A-6-333907 JP-A-7-161677

  In a conventional cleaning processing apparatus, when the cleaning processing liquid is circulated from the bottom to the top from the center of the bottom surface of the cleaning processing tank without installing a current plate, and the cleaning target is immersed and cleaned, the vicinity of the center of the cleaning processing tank There was a problem that the liquid flow and the liquid flow in the vicinity of the wall of the cleaning treatment tank were partially reversed. For this reason, there has been a problem that contamination such as particles peeled off from the surface of the object to be processed is transported again to the surface of the object to be processed by the backflow and reattached to the surface of the object to be processed.

  In order to solve the problem of backflow, in Patent Documents 1 to 3, a rectifying plate and a diffusing plate are installed at the bottom of the cleaning tank, thereby forming a uniform liquid flow from the bottom to the top of the cleaning tank. A means for efficiently discharging contamination such as particles peeled off from the surface of the object to be processed out of the cleaning treatment tank is disclosed. However, in such a cleaning processing apparatus, since the relationship between the aperture ratio of the rectifying plate and the diffusion plate and the variation in the liquid flow is not clear, if the shape of the cleaning processing tank is changed, the rectifying plate and the diffusing plate may be installed. There was a problem that a uniform liquid flow from the bottom to the top of the cleaning treatment tank could not be formed. Here, the aperture ratio is a percentage of the total area of the small holes with respect to the areas of the current plate and the diffusion plate. Further, the variation in the liquid flow is a standard deviation σ of the flow velocity observed at a plurality of arbitrary points in the cleaning tank by the observation method described later, as shown in Equation 1. The standard deviation, that is, the variation in the liquid flow, was obtained by setting the case where the flow direction is upward of the tank as a positive value and the case where the flow direction is downward as a negative value.

  Moreover, in patent document 1, while using the method of observing the behavior of a polystyrene particle using an argon laser while mixing the particle | grains made from a polystyrene as a method of observing the flow condition of the pure water in a washing | cleaning apparatus. However, there is a problem that it takes time to observe the flow state and it is difficult to grasp the flow state in the actual production line.

  On the other hand, Patent Document 3 discloses that the position of the small holes provided in each of the rectifying plates is mutually shifted between the rectifying plates adjacent to each other, thereby contributing to the rectification of the cleaning treatment liquid. There was a problem that the specific method of shifting was not clarified.

  The present invention has been made in view of the above circumstances, and the flow of the cleaning treatment liquid in the cleaning treatment tank is an upward flow, the downward flow is minimized, and the opening ratio of the rectifying plate and the diffusion plate and the variation of the liquid flow are reduced. It is an object of the present invention to provide a cleaning processing apparatus having means for clarifying the relationship and capable of monitoring liquid flow variations in real time in an actual production line.

  The cleaning processing apparatus according to the present invention uses, for example, the whole or a part of the liquid crystal cell of the liquid crystal display device as an object to be processed, stores the cleaning processing liquid flowing upward, and performs processing on the cleaning processing liquid. The cleaning treatment tank in which the body is immersed, the washing treatment liquid receiving tray for collecting the washing treatment liquid overflowing and discharged from the washing treatment liquid surface of the washing treatment tank, and the washing treatment liquid being supplied to the supply port of the washing treatment tank A cleaning mechanism that holds the cleaning basket filled with the object to be processed and is held by the transfer robot arm between the cleaning processing tanks, and suspends the cleaning basket in the cleaning processing tank at the bottom of the cleaning processing tank. One or a plurality of rectifying plates in which one or a plurality of small holes through which the liquid circulates are arranged in a plane, and a cleaning treatment liquid positioned above the supply port and below the rectifying plate are circulated. One or more And a diffusion plate in which the small holes are arranged in the plane, and one or a plurality of rectification monitoring mechanisms are provided on the inner wall surface of the cleaning treatment tank.

  The rectification monitoring mechanism according to the present invention has a mechanism that visualizes the liquid flow in the vicinity of the inner wall surface of the cleaning treatment tank by fixing one or more thin threads on the inner wall surface of the cleaning processing tank. To do.

  The flow straightening plate of the cleaning treatment apparatus according to the present invention has a flow straightening plate A having an area equal to or less than the area of the bottom surface of the washing treatment tank, and the area of the bottom surface of the washing treatment tank in contact with one surface of the flow straightening plate A. One or a plurality of rectifying plates B having an area obtained by subtracting the area of the bottom surface of the cleaning basket, and rectifying plate mounting legs for arranging the rectifying plate to be fixed or in contact with the bottom surface of the tank The small holes are arranged at lattice points of a square lattice.

  The one or more small holes through which the cleaning solution provided on the current plate of the cleaning apparatus according to the present invention flows are arranged, for example, as circular holes having a diameter of 5 mm, and the small holes are arranged at each intersection of the square lattice. In the arrangement pattern to be arranged, the arrangement pitch of the small holes is set to 12 mm at the center interval.

  The rectifying plate B of the cleaning treatment apparatus according to the present invention includes a long side rectifying plate having a width equal to the long side of the rectangular parallelepiped of the cleaning tank, and a short side rectifying plate having a width equal to the short side of the cuboid. It is characterized by having.

  Here, the cleaning treatment tank according to the present invention has a cubic or rectangular shape with an open surface on which the cleaning treatment liquid overflows and is discharged. The long side rectifying plate and the short side rectifying plate described above indicate the rectifying plates disposed in the long side direction and the short side direction of the bottom surface of the cleaning treatment tank, respectively.

  The long-side rectifying plate and the short-side rectifying plate of the cleaning treatment apparatus according to the present invention are in contact with one surface of the rectifying plate A, and the long-side and short-side rectifying plates are slid with respect to the rectifying plate A. It has a slide mechanism which makes variable the area of the small hole formed by the overlap part of the small hole provided in each, It is characterized by the above-mentioned.

  The aperture ratio of the small holes formed by the overlapping portion of the rectifying plate A formed by the slide of the long side rectifying plate and the short side rectifying plate of the cleaning treatment apparatus according to the present invention is preferably from 12%. It is characterized by being in the range of 8%.

  The diffusion plate of the cleaning processing apparatus according to the present invention can be attached to the lower side of the rectifying plate so as to overlap the supply port, and has a mechanism capable of adjusting the height between the supply port and the diffusion plate. One or a plurality of small holes through which the liquid flows are arranged concentrically.

  The small hole of the diffusion plate of the cleaning processing apparatus according to the present invention has a mechanism that is blocked by an object that plays a role of blocking the cleaning processing liquid flowing through the small hole, and changes the aperture ratio of the diffusion plate by attaching and removing the object. It has the mechanism which can do. This object is, for example, a screw, rubber plug or other substance having the same diameter as the small hole.

  The aperture ratio of the small holes provided in the diffusion plate of the cleaning processing apparatus according to the present invention is preferably in the range of 20% to 14%.

  According to the present invention, the flow of the cleaning treatment liquid between the flow straightening plate and diffusion plate in the cleaning treatment tank and the surface of the cleaning treatment liquid can be made upward, and the downward flow can be minimized. As a result, the contaminants released from the object to be processed are quickly discharged from the cleaning liquid surface, and reattachment to the object to be processed is suppressed.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. Here, a case where the cleaning processing apparatus of the present invention is applied to a cleaning processing apparatus for a liquid crystal cell will be described. Note that components having the same function are denoted by the same reference symbols throughout the drawings for describing the embodiment, and the repetitive description thereof will be omitted. In the following embodiments, the description of the same or similar parts will not be repeated in principle unless particularly necessary.

  Furthermore, in the following embodiments, when necessary, for convenience, the description will be divided into a plurality of sections or embodiments. However, unless otherwise specified, they are not irrelevant, and one of them is The other part or all of the modifications, details, supplementary explanations, and the like are related. In the following embodiments, when referring to the number of elements (including the number, numerical value, quantity, range, etc.), unless explicitly stated or in principle, the number is limited to a specific number. It is not limited to the specific number, and may be a specific number or more. Further, in the following embodiments, it is needless to say that the constituent elements (including element steps and the like) are not necessarily indispensable unless otherwise specified and apparently essential in principle. Yes.

  Similarly, in the following embodiments, when referring to the shape and positional relationship of components and the like, the shape and the like of the component are substantially different unless explicitly stated or otherwise considered in principle. Including those that are approximate or similar to. The same applies to the above numerical values and ranges.

  FIG. 1 is a sectional view showing a schematic structure of a first embodiment of a cleaning apparatus according to the present invention. The cleaning processing apparatus includes a cleaning basket 5 in which cassettes (not shown) that are installed vertically with respect to the bottom of the cleaning processing tank 16 are installed in six rows and two stages, and a liquid crystal cell that is immersed in the cleaning basket 5 Pump 35 for supplying the cleaning treatment liquid to the cleaning treatment tank 16 filled with the cleaning treatment liquid for washing 9 and the washing treatment liquid receiving tray 19 for collecting the cleaning treatment liquid overflowing from the washing treatment tank A valve 34 for controlling the inflow of the cleaning treatment liquid into the cleaning treatment tank 16, a rectifying plate 3, 4 and a diffusion plate 2 for rectifying the liquid flow of the cleaning treatment liquid in the cleaning treatment tank 16; And a rectifying monitor mechanism 6 for monitoring the liquid flow in the cleaning treatment tank 16. Although not shown, in addition to these components, the cleaning processing apparatus has a function unit for adjusting the temperature of the cleaning process liquid and an ultrasonic wave application function unit for promoting the peeling of contaminants from the object to be processed. It does not matter. Further, the cleaning basket 5 is supported by the cleaning basket suspension robot 33 by the transfer robot arm 14 between the cleaning processing tanks, and is held in a state of being suspended in the cleaning processing tank 16. Further, after the liquid crystal cell 9 is cleaned, the cleaning basket 5 is pulled up by the cleaning tank transfer robot arm 14 and is transferred to another cleaning processing apparatus (not shown) or a processing apparatus of another process (not shown).

  The arrows shown in FIG. 1 indicate the flow of the cleaning processing liquid, and the cleaning processing liquid supplied from the cleaning processing liquid supply port 1 is ejected toward the upper side of the cleaning processing tank 16 between the liquid crystal cells 9. As shown by the arrow 17, the cleaning liquid that has reached the vicinity of the cleaning liquid level 15 overflows from the cleaning tank 16, and the cleaning liquid that has overflowed in the cleaning liquid tray 19 is recovered. .

  FIG. 2 is an exploded perspective view showing how the rectifying plate, the diffusing plate, and the mounting leg are attached according to the present invention. The rectifying plate A 3 is fixed to the rectifying plate mounting leg 7 below the cleaning basket 5 with a height adjusting nut 8. A screw thread is provided on the surface of the rectifying plate mounting leg 7 and the inside of the height adjusting nut 8 so as to have a male screw and a female screw. At this time, use two height adjustment nuts 8 to fix the current plate A 3 so that it is sandwiched, or place the current plate A 3 using only one height adjustment nut 8 below the current plate A 3. Either structure is acceptable. In addition, as shown in FIG. 3, four rectifying plate mounting legs 7 are installed at the four corners of the cleaning treatment tank. However, if the rectifying plate is not moved by the liquid flow, any installation method is adopted. May be. Further, the short-side rectifying plate 4a and the long-side rectifying plate 4b are installed on the upper side of the rectifying plate A3 (on the cleaning treatment liquid surface 15 side) in contact with the respective one surfaces. Short side rectifying plate 4a and long side rectifying plate 4b are short side rectifying plate opening rate adjusting screw 10a and short side rectifying plate opening rate adjusting nut 10b, long side side rectifying plate opening rate adjusting screw 12a and long side, respectively. It is installed on the rectifying plate A3 by the side rectifying plate opening ratio adjusting nut 12b. Further, the diffusion plate 2 is installed on the lower side of the rectifying plate A 3 so as to overlap the cleaning treatment liquid supply port 1 using the diffusion plate mounting legs 11a and the diffusion plate height adjustment nut 11b. Further, here, as shown in FIG. 4, the four diffusion plate mounting legs 11a are installed at four points on the outer periphery of the diffusion plate. However, the diffusion plate is not moved by the liquid flow and obstructs the liquid flow. If not, you can take any installation method.

  FIG. 5 shows a detailed mounting method of the diffusion plate 2, the diffusion plate mounting leg 11a, and the diffusion plate height adjusting nut 11b according to the present invention. The diffusion plate mounting leg 11a is inserted from the lower side of the diffusion plate 2 together with the holding plate 11c and the washer 11d, and from the upper side of the diffusion plate 2, the diffusion plate height adjusting nut 11b, the holding plate 11c and the washer 11d are connected to the diffusion plate mounting leg 11a. The diffusion plate 2 and the diffusion plate mounting leg 11a are fixed through the leg portion. The other diffusion plate mounting legs 11a are mounted in the same manner. A screw thread is provided on the surface of the diffusion plate mounting leg 11a and the inner side of the diffusion plate height adjusting nut 11b so that the male screw and the female screw are in mutual relation.

  FIG. 6 is an enlarged cross-sectional view showing how the rectifying plate A3, the diffusing plate 2 and the diffusing plate mounting leg 11a are attached according to the present invention. Using two sets of three parts, diffusion plate height adjustment nut 11b, presser plate 11c, and washer 11d, on the lower side of the rectifying plate A3, the above parts with the diffusion plate 2 and diffusion plate mounting leg 11a attached The plate A 3 is sandwiched and fixed through the diffusion plate mounting leg 11a. The other diffusion plate mounting legs 11a are mounted in the same manner. At this time, the distance between the rectifying plate A 3 and the diffusion plate 2 can be made variable by the length of the leg portion of the diffusion plate mounting leg 11a. Further, if the diameter of the leg portion of the diffusion plate mounting leg 11a is made large enough to pass through the cleaning treatment liquid circulation small hole 20, even if the position of the cleaning treatment solution supply port 1 changes, the diffusion plate 2 The mounting position can be adjusted accordingly.

  A structure for changing the aperture ratio of the diffusion plate by closing small holes provided in each of the diffusion plates shown in claim 6 will be described below.

FIG. 7 is a plan view showing the diffusion plate 2 having an aperture ratio of 20% in the first embodiment. Here, the diffusion plate 2 is, for example, a circular one, but may be a square, a rectangle, a triangle, a rhombus, or the like. The cleaning treatment liquid circulation small holes 20 are arranged concentrically with the center and the outer periphery of the diffusion plate 2. The relationship is as follows. The radius of the diffusing plate 2 is R, and R is divided into four equal parts, and the cleaning treatment liquid circulation small holes 20 are provided on concentric circles having radii of 1 / 4R, 2 / 4R, and 3 / 4R. On the 1 / 4R and 2 / 4R circles, there is a small hole 20 for cleaning treatment liquid arranged to divide the circumference into 8 equal parts, and on the 3 / 4R circle, the washing process is arranged to divide the circumference into 16 equal parts. A liquid flow small hole 20 was provided. However, when the head portion of the diffusion plate mounting leg 11a is concentric, the cleaning treatment liquid circulation small hole 20 is not provided. Here, the shape of the cleaning treatment liquid circulation small hole 20 is, for example, circular, but may be a square, a rectangle, a triangle, a rhombus, or the like. In the present invention, those having a circular hole diameter of 4 mm are arranged concentrically. As described above, the aperture ratio is a percentage of the total area of the holes with respect to the areas of the current plate and the diffusion plate. Therefore, if a 24.5mm radius R of the diffuser 2 in this embodiment, the area of the diffuser about 1885Mm ² becomes, the total area of the cleaning liquid flow ostium 20 of about 377 mm ^2. That is, the aperture ratio of the diffusion plate can be expressed as about 20%. The aperture ratios of other diffusion plates can be similarly expressed.

  FIG. 8 is a plan view showing a diffusion plate having an aperture ratio of 14% in the first embodiment. The arrangement of the cleaning solution circulation small holes 20 is the same as that shown in FIG. Here, the aperture ratio is adjusted to 14% by fitting the diffusion plate aperture ratio adjusting screw 21 to the cleaning treatment liquid circulation small hole 20. The diffusion plate opening ratio adjusting screw 21 is referred to as a screw here for convenience, but is an object that serves to block the flow of the cleaning processing liquid passing through the cleaning processing liquid circulation small holes 20, and is eroded by the cleaning processing liquid. Any object may be used as long as it does not scatter contaminants such as particles in the cleaning solution. For example, a stainless steel screw is an example of an object that satisfies such conditions.

  FIG. 9 is a plan view showing a diffusion plate having an aperture ratio of 8% in the first embodiment. As for the arrangement of the cleaning solution circulation small holes 20, the center of the small holes and the center of the small holes 20 are arranged at each apex, and a total of eight holes are arranged at each vertex, and between the center of the small holes and the head portion of the diffusion plate mounting leg 11a. Is arranged at a position of 15 mm from the center of the small holes arranged in a square lattice shape at an angle of ± 45 degrees from the line connecting the two.

  FIG. 10 is a plan view showing a diffusion plate having an aperture ratio of 40% in the first embodiment. The shape of the cleaning liquid flow square hole 24 is a square with a side of 2 mm, and the opening ratio is 40% by setting the distance between the center of each square hole and the center of the other square hole to 4 mm. Set to

  A structure for changing the aperture ratio of the rectifying plate by shifting the positions of the small holes provided in each of the rectifying plates between the rectifying plates will be described below.

  FIG. 11 is an enlarged cross-sectional view showing a current plate having an aperture ratio of 12% in the first embodiment. The rectifying plate A 3 and the rectifying plate B 4 are in contact with each other, and the short side rectifying plate opening ratio adjusting screw 10a, the long side rectifying plate opening ratio adjusting screw 12a, and the short side rectifying plate opening ratio The adjustment nut 10b and the long side rectifying plate opening ratio adjustment nut 12b are sandwiched and installed. At this time, the opening ratio of the entire surface of the rectifying plate is set to 12% by arranging the rectifying plate A side cleaning treatment liquid circulation small holes 20a and the rectifying plate B side cleaning treatment liquid circulation small holes 20b in an overlapping manner. An arrow 25 indicates a state of the flow of the cleaning treatment liquid on the 12% aperture ratio rectifying plate. By arranging the rectifying plate A-side cleaning treatment liquid circulation small hole 20a and the rectifying plate B-side cleaning treatment liquid circulation small hole 20b in an overlapping manner, the liquid flow through the small hole has a viscosity other than the viscosity of the cleaning treatment liquid itself. It turns out that it is not influenced. As the entire liquid flow in the cleaning treatment tank, the resistance of the portion of the rectifying plate not provided with the small holes is received, and all the liquid flows through the small holes and flows upward in the direction of the cleaning treatment liquid surface 15.

  FIG. 12 is an enlarged cross-sectional view showing a current plate having an aperture ratio of 10% in the first embodiment. This figure is installed so that the opening ratio of all small holes on the rectifying plate B 4 is 50% by sliding the rectifying plate B 4 from the cross-sectional view of FIG. 11 described above. There are a total of four rectifying plates B 4 that are slid, each of the short side rectifying plate 4a and the long side rectifying plate 4b. By sliding these four rectifying plates so that the area of the small holes is 50%, the opening ratio of the entire rectifying plate is set to 10%. That is, the portion other than the four current plates is a region corresponding to the bottom of the cleaning basket 5, and the aperture ratio of the small holes in that region is 100%, and the aperture ratio of the small holes in the region shielded by the four current plates is When the total area of the small holes is calculated with the ratio of 50% and the ratio of the total area of the current plate is calculated, the opening ratio of the current plate is 10%. An arrow 26 indicates a state of the flow of the cleaning treatment liquid on the rectifying plate having an aperture ratio of 10%.

  FIG. 13 is an enlarged sectional view showing a current plate having an aperture ratio of 8% in the first embodiment. This figure is installed so that the opening ratio of all small holes on the rectifying plate B 4 is 0% by sliding the rectifying plate B 4 from the cross-sectional view of FIG. 12 described above. As a result, the cleaning treatment liquid cannot flow through the small holes of the rectifying plate B4. There are a total of four rectifying plates B 4 that are slid, each of the short side rectifying plate 4a and the long side rectifying plate 4b. By sliding the four current plates so that the area of the small holes becomes 0%, the opening ratio of the whole current plate is set to 8%. That is, the portion other than the four current plates is a region corresponding to the bottom of the cleaning basket 5, and the aperture ratio of the small holes in that region is 100%, and the aperture ratio of the small holes in the region shielded by the four current plates is If the total area of the small holes is determined with 0%, and the ratio of the total area of the rectifying plate is calculated, the opening ratio of the entire rectifying plate is 8%. An arrow 27 indicates a state of the flow of the cleaning treatment liquid on the rectifying plate having an aperture ratio of 8%.

  FIG. 14 is an enlarged plan view showing a current plate having an aperture ratio of 12% in the first embodiment. This figure is obtained by replacing the sectional state diagram of FIG. 11 with a plan view, and shows a state before the short side rectifying plate 4a and the long side rectifying plate 4b of the rectifying plate B 4 are slid. The short side rectifying plate 4a is fixed to the rectifying plate A3 using the short side rectifying plate opening ratio adjusting screw 10a in the short side rectifying plate opening ratio adjusting gap 29. The long side rectifying plate 4b is fixed to the rectifying plate A3 using the long side rectifying plate opening ratio adjusting screw 12a in the long side rectifying plate opening ratio adjusting gap 28.

  FIG. 15 is an enlarged plan view showing a current plate with an aperture ratio of 10% in the first embodiment. This figure replaces the sectional state diagram of FIG. 12 with a plan view, and the short side rectifying plate 4a and the long side rectifying plate 4b of the rectifying plate B 4 are connected to all small holes on the rectifying plate B 4. A state of sliding so as to obtain an aperture ratio of 50% is shown. In the short side rectifying plate 4a, the short side rectifying plate opening ratio adjusting screw 10a is loosened in the short side rectifying plate opening ratio adjusting gap 29, and the opening ratio is 50% for all the small holes on the rectifying plate B4. Then, the short side rectifying plate opening ratio adjusting screw 10a is fastened again to fix it to the rectifying plate A3. In the long side rectifying plate 4b, the long side rectifying plate opening ratio adjusting screw 12a is loosened in the long side rectifying plate opening ratio adjusting gap 28, and the opening ratio is 50% for all the small holes on the rectifying plate B4. The long side rectifying plate opening ratio adjusting screw 12a is tightened again to fix the rectifying plate A3.

  FIG. 16 is an enlarged plan view showing a current plate having an aperture ratio of 8% in the first embodiment. This figure is obtained by replacing the sectional state diagram of FIG. 13 with a plan view. The short side rectifying plate 4a and the long side rectifying plate 4b of the rectifying plate B 4 are connected to all small holes on the rectifying plate B 4. A state in which the aperture ratio is 0% is shown. In the short side rectifying plate 4a, the short side rectifying plate opening ratio adjusting screw 10a is loosened in the short side rectifying plate opening ratio adjusting gap 29, and the opening ratio becomes 0% with respect to all small holes on the rectifying plate B4. Then, the short side rectifying plate opening ratio adjusting screw 10a is fastened again to fix it to the rectifying plate A3. In the long side rectifying plate 4b, the long side rectifying plate opening ratio adjusting screw 12a is loosened in the long side rectifying plate opening ratio adjusting gap 28, and the opening ratio becomes 0% for all small holes on the rectifying plate B4. The long side rectifying plate opening ratio adjusting screw 12a is tightened again to fix the rectifying plate A3.

  The rectifying plate A 3 and the rectifying plate B 4 are formed to have a relatively thin thickness of about several mm, for example. Furthermore, the rectifying plate A 3 and the rectifying plate B 4 are made of a material that does not deteriorate or deform due to water pressure in the cleaning liquid. From these viewpoints, the current plate A 3 and the current plate B 4 of the present apparatus are formed of stainless steel having corrosion resistance.

As for the size of the uniform small holes provided in the rectifying plate A 3 and the rectifying plate B 4, for example, circular small holes having a diameter of 5 mm are arranged. For example, in the arrangement pattern in which the small holes are arranged at each intersection of the square lattice, the arrangement pitch of the small holes is set to 12 mm at the center interval.
In the above apparatus configuration, when determining suitable conditions, the flow in the cleaning tank 16 is visualized by observing the flow in the cleaning tank 16 by injecting milk into the cleaning tank 16, and the liquid flow in the cleaning tank 16 is observed. The variation was obtained from the above-mentioned formula 1.

  The technical significance that the aperture ratio of the diffusion plate shown in claim 7 is in the range of 20% to 14% will be described below.

  FIG. 19 is a graph showing the relationship between the aperture ratio of the diffusion plate and the variation in the liquid flow when the current plate aperture ratio is 10% according to the present invention. In this relationship, the condition of the diffusion plate having an aperture ratio of 100% is a condition in which only the current plate having an aperture ratio of 10% is installed without installing the diffusion plate in the conventional tank. For example, FIG. 17 shows the flow of the cleaning treatment tank under the conditions. Further, the condition of the diffusion plate having an aperture ratio of 40% refers to a cleaning treatment tank in which the diffusion plate shown in FIG. 10 is installed and a current plate having an aperture ratio of 10% is installed. Similarly, the condition of the diffusion plate having an aperture ratio of 20% is a condition for installing the diffusion plate shown in FIG. 7, and the condition of the diffusion plate having an aperture ratio of 14% is a condition for installing the diffusion plate shown in FIG. The condition of the diffusion plate with an aperture ratio of 8% is a condition in which the diffusion plate shown in FIG. 9 is installed. FIG. 19 is a graph showing the variation in the liquid flow obtained by visualizing the flow under the above conditions. As a result of examining the liquid flow in the cleaning treatment tank under the above conditions, when the aperture ratio of the diffusion plate having a liquid flow variation of 10 or less is 22% to 0%, the liquid flow in the cleaning treatment tank is almost upward. The downward flow is small. For this reason, the probability that foreign matter such as particles released from the surface of the object to be processed overflows from the cleaning liquid surface 15 and is discharged out of the system increases, and the probability of reattachment of the foreign matter to the object to be processed decreases. When the dispersion of the liquid flow is larger than 10, many downward liquid flows are generated in the cleaning tank, so that particles such as particles released from the surface of the object to be processed overflow from the cleaning liquid surface 15 and are discharged out of the system. This reduces the probability that the foreign matter is reattached to the object to be processed. More preferably, the aperture ratio of the diffusion plate having a rectification degree of 8.5 or less is 20% to 14%. This is because, at this time, it is clear from this experiment that the liquid flow in the cleaning treatment tank is almost upward and the downward flow is minimized. That is, the probability that foreign matter such as particles released from the surface of the object to be processed overflows from the cleaning process liquid surface 15 and is discharged out of the system is maximized, and the probability of reattachment of the foreign matter to the object to be treated is minimized.

  The technical significance that the opening ratio of the current plate shown in claim 4 is in the range of 12% to 8% will be described below.

  FIG. 20 is a graph showing the relationship between the aperture ratio of the rectifying plate and the variation in the liquid flow when the diffusion plate aperture ratio is 20% according to the present invention. In this relationship, the condition of the opening ratio of the rectifying plate of 100% is a condition in which only the diffusion plate having an opening ratio of 20% is installed without installing the rectifying plate in the conventional tank. Further, the condition of the opening ratio of 12% of the rectifying plate is a cleaning treatment tank in which the rectifying plate shown in FIG. Similarly, the condition for the 10% aperture ratio of the rectifying plate is the condition for installing the rectifying plate shown in FIG. 12, and the condition for the 8% aperture ratio of the rectifying plate is the condition for installing the rectifying plate shown in FIG. It is. FIG. 20 is a graph showing the variation of the liquid flow obtained by visualizing the flow under the above conditions. As a result of examining the liquid flow in the cleaning treatment tank under the above conditions, when the opening ratio of the rectifying plate having a liquid flow variation of 10 or less is 20% to 6%, the liquid flow in the cleaning treatment tank is almost upward. The downward flow is smaller. For this reason, the probability that foreign matter such as particles released from the surface of the object to be processed overflows from the cleaning liquid surface 15 and is discharged out of the system increases, and the probability of reattachment of the foreign matter to the object to be processed decreases. When the dispersion of the liquid flow is larger than 10, many downward liquid flows are generated in the cleaning tank, so that particles such as particles released from the surface of the object to be processed overflow from the cleaning liquid surface 15 and are discharged out of the system. This reduces the probability that the foreign matter is reattached to the object to be processed. More preferably, the aperture ratio of the diffusion plate having a rectification degree of 8.5 or less is 12% to 8%. This is because, at this time, it is clear from this experiment that the liquid flow in the cleaning treatment tank is almost upward and the downward flow is minimized. That is, the probability that foreign matter such as particles released from the surface of the object to be processed overflows from the cleaning process liquid surface 15 and is discharged out of the system is maximized, and the probability of reattachment of the foreign matter to the object to be treated is minimized.

  FIG. 18 is a sectional view showing a schematic structure of a second embodiment of the cleaning processing apparatus according to the present invention. The apparatus configuration is the same as that of the first embodiment. The rectifying plate B4 was varied in the direction of the cleaning treatment liquid surface 15, and the opening ratio of the rectifying plate and variations in the liquid flow were observed. As a result, the liquid flow in the cleaning treatment tank increased in the upward direction and decreased in the downward direction with respect to the conventional tank.

It is sectional drawing which shows schematic structure of the 1st Example of the cleaning processing apparatus by this invention. It is a disassembled perspective view which shows the attachment aspect of the baffle plate, diffusion plate, and attachment leg by this invention. It is a schematic perspective view which shows the attachment aspect of the baffle plate, diffusion plate, and attachment leg by this invention. It is an expansion perspective view which shows the attachment aspect of the baffle plate, diffusion plate, and attachment leg by this invention. It is a disassembled perspective view which shows the attachment aspect of the diffusion plate and attachment leg by this invention. It is an expanded sectional view which shows the attachment aspect of the baffle plate, diffusion plate, and attachment leg by this invention. It is a top view which shows the diffusion plate of 20% of aperture ratio in a 1st Example. It is a top view which shows the diffusion plate of 14% of aperture ratio in a 1st Example. It is a top view which shows the diffusion plate of 8% of aperture ratio in a 1st Example. It is a top view which shows the diffusion plate of 40% of aperture ratio in a 1st Example. It is an expanded sectional view which shows the baffle plate of 12% of aperture ratio in a 1st Example. It is an expanded sectional view showing a current plate with an aperture ratio of 10% in the first embodiment. It is an expanded sectional view which shows the baffle plate of 8% of aperture ratio in a 1st Example. It is an enlarged plan view showing a current plate with an aperture ratio of 12% in the first embodiment. It is an enlarged plan view showing a current plate with an aperture ratio of 10% in the first embodiment. It is an enlarged plan view showing a current plate with an aperture ratio of 8% in the first embodiment. It is sectional drawing which shows the conventional washing | cleaning processing apparatus. It is sectional drawing which shows schematic structure of the 2nd Example of the cleaning processing apparatus by this invention. It is a graph which shows the relationship between the aperture ratio of a diffuser plate, and the dispersion | variation in a liquid flow in the rectifier plate aperture ratio 10% by this invention. It is a graph which shows the relationship between the aperture ratio of a baffle plate in the diffusion plate aperture ratio 20% by this invention, and the dispersion | variation in a liquid flow.

Explanation of symbols

  1 ... Cleaning liquid supply port, 2 ... Diffusion plate, 3 ... Rectifying plate A, 4 ... Rectifying plate B, 4a ... Short side rectifying plate, 4b ... Long side rectifying plate, 5 ... Cleaning basket, 6 ... Rectification monitor Mechanism, 7 ... Rectifying plate mounting leg, 8 ... Height adjusting nut, 9 ... Liquid crystal cell, 10a ... Short side rectifying plate opening rate adjusting screw, 10b ... Short side rectifying plate opening rate adjusting nut, 11a ... Diffusion plate mounting Leg, 11b ... Diffusion plate height adjustment nut, 11c ... Presser plate, 11d ... Washer, 12a ... Long-side rectifying plate opening ratio adjusting screw, 12b ... Long-side rectifying plate opening ratio adjusting nut, 13 ... Liquid crystal cell fixing rod , 14: Transfer robot arm between cleaning treatment tanks, 15 ... Cleaning treatment liquid surface, 16 ... Cleaning treatment tank, 17 ... Arrow indicating the overflow of the cleaning treatment liquid, 18 ... Liquid flow at the cleaning treatment liquid supply port , 19 ... Cleaning treatment liquid tray, 20 ... Cleaning treatment liquid circulation small hole, 20a ... Rectification plate A side cleaning treatment liquid circulation small hole, 20b ... Rectification plate B side cleaning treatment Flow hole, 21 ... diffusion plate aperture ratio adjusting screw, 22 ... aperture ratio 8% diffusion plate, 23 ... aperture ratio 40% diffuser plate, 24 ... cleaning solution flow square hole, 25 ... aperture ratio 12% rectifier plate An arrow indicating the state of the liquid flow of the cleaning treatment liquid, 26... An arrow indicating the state of the liquid flow of the cleaning processing liquid on the 10% aperture ratio rectifying plate, 27. , 28 ... Long side rectifying plate opening ratio adjustment gap, 29 ... Short side rectifying plate opening ratio adjustment gap, 30 ... Arrow indicating the state of liquid flow near the wall surface in the conventional tank, 31 ... Liquid crystal in the conventional tank An arrow indicating the state of the liquid flow near the cell, 32... An arrow indicating the state of the liquid flow near the wall surface in the second embodiment, 33... The washing basket hanging part, 34.

Claims (8)

  In the cleaning processing apparatus, one or a plurality of horizontally arranged rectifying plates having one or a plurality of small holes on the side of the cleaning processing liquid supply port at the bottom of the cleaning processing tank, and above the cleaning processing liquid supply port And a horizontally disposed diffusion plate having one or a plurality of small holes positioned below the rectifying plate, and one or a plurality of rectifying monitor mechanisms on the inner wall surface of the cleaning treatment tank. Cleaning processing equipment.   The cleaning apparatus according to claim 1, further comprising a structure for changing an aperture ratio of the current plate.   3. The cleaning apparatus according to claim 2, further comprising a structure for changing the aperture ratio of the current plate by shifting the positions of the small holes provided in each of the current plates between the current plates.   4. The cleaning apparatus according to claim 3, wherein the opening ratio of the current plate is in a range of 12% to 8%.   3. The cleaning apparatus according to claim 1, further comprising a structure for changing an aperture ratio of the diffusion plate.   6. The cleaning apparatus according to claim 5, further comprising a structure for changing an aperture ratio of the diffusion plate by closing a small hole provided in each of the diffusion plates.   7. A cleaning apparatus according to claim 6, wherein the aperture ratio of the diffusion plate is in the range of 20% to 14%.   2. The cleaning apparatus according to claim 1, further comprising a mechanism for visualizing a liquid flow in the vicinity of the inner wall surface of the cleaning treatment tank by fixing one or a plurality of thin threads on the inner wall surface of the cleaning processing tank. .

Images