JP2009064599A - Coating apparatus - Google Patents

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JP2009064599A
JP2009064599A JP2007229623A JP2007229623A JP2009064599A JP 2009064599 A JP2009064599 A JP 2009064599A JP 2007229623 A JP2007229623 A JP 2007229623A JP 2007229623 A JP2007229623 A JP 2007229623A JP 2009064599 A JP2009064599 A JP 2009064599A
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liquid
substrate
coating
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coating apparatus
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Taiji Tomita
泰治 冨田
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Canon Inc
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a coating apparatus that allows a smaller amount of liquid to adhere to a substrate even when liquid sucked up in the tip end of a liquid outlet portion is splashed, thereby reducing the possibility of improper coating. <P>SOLUTION: The coating apparatus for coating liquid on a target coating area of a substrate is provided with a shield mechanism that operates together with the liquid outlet portion 32 of the coating apparatus 1 and, when liquid discharged from the liquid outlet portion 32 is out of use, shields the splash of the liquid. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、基板上の塗布領域に有機EL材料などの液体を塗布する塗布装置に関するものである。   The present invention relates to a coating apparatus that applies a liquid such as an organic EL material to a coating region on a substrate.

有機EL素子は、発光層にEL発光能をもつ有機低分子又は有機高分子で形成した素子であり、自発光のため視野角がよく、耐衝撃性に優れるなど、ディスプレイ素子として理想的な特徴を有している。このため、各種の分野において研究、開発が進められている。   An organic EL element is an element formed of an organic low-molecular or organic polymer having EL light-emitting ability in the light-emitting layer, and has a good viewing angle for self-emission and excellent impact resistance. have. For this reason, research and development are underway in various fields.

製造方法としては、真空蒸着法、インクジェット法、ディスペンス法などが広く研究されている。   As a manufacturing method, a vacuum deposition method, an ink jet method, a dispensing method, and the like are widely studied.

ディスペンス法では、一般的に基板上に形成されたストライプ状の隔壁に対しノズル(液体吐出部)を隔壁に平行に往復移動させながら液体の有機EL材料を塗布することでパターニングを行っている。   In the dispensing method, patterning is generally performed by applying a liquid organic EL material to a stripe-shaped partition formed on a substrate while reciprocating a nozzle (liquid ejection unit) in parallel with the partition.

この種の塗布装置としては、特許文献1に記載された塗布装置などがある。   As this type of coating apparatus, there is a coating apparatus described in Patent Document 1.

しかしながら、この種の装置では粘度の低い有機EL材料は、ノズルの先端部分に吸い上げられ、塗布動作時以外の動作時(例えばアライメント時など)にも飛散して、塗布不良が生じるという課題があった。   However, in this type of apparatus, the organic EL material having a low viscosity is sucked up at the tip of the nozzle and scattered during operations other than the coating operation (for example, during alignment), resulting in a defective coating. It was.

この種の対策としては特許文献2に記載されるように、塗布領域以外をマスクで覆うことにより塗布する必要のない領域に有機EL材料が塗布されることを防止する方法などがある。   As a countermeasure of this type, as described in Patent Document 2, there is a method of preventing the organic EL material from being applied to an area that does not need to be applied by covering the area other than the application area with a mask.

特開2001−189192号公報JP 2001-189192 A 特開2004−50080号公報JP 2004-5080 A

しかしながら、特許文献2のようなマスクによる方法では、塗布領域はマスクに遮蔽されていないため、塗布領域に不要な有機EL材料が飛散することは防止できない。実際に精度良く塗布を行うためには基板のアライメントを行った後、塗布を行い、位置ずれや塗布量などを最適化する必要がある。この時、ノズルは塗布後に基板上を幾度となく往復することになり、その際ノズル先端部分に吸い上げられた有機EL材料が基板に飛散して、塗布不良の原因となる。   However, in the method using the mask as in Patent Document 2, since the application region is not shielded by the mask, it is not possible to prevent unnecessary organic EL material from scattering in the application region. In order to actually apply with high accuracy, it is necessary to perform application after alignment of the substrate and to optimize misalignment and application amount. At this time, the nozzle reciprocates several times on the substrate after coating, and at this time, the organic EL material sucked up at the nozzle tip portion is scattered on the substrate, causing defective coating.

本発明は、ノズル先端部分に吸い上げられた液体が飛散しても、基板への付着を低減することができ、塗布不良を低減することができる塗布装置を提供することを目的とする。   An object of this invention is to provide the coating device which can reduce adhesion to a board | substrate even if the liquid sucked up by the nozzle tip part scatters, and can reduce application | coating defect.

上記課題を解決するための手段として、本発明は、
基板上の塗布領域に液体を塗布する塗布装置において、
塗布装置の液体吐出部に連動し、液体吐出部から吐出される液体の不要時に、前記液体の飛散を遮蔽する遮蔽機構を備えていることを特徴とする。
As means for solving the above problems, the present invention provides:
In a coating apparatus that applies a liquid to a coating area on a substrate,
In conjunction with the liquid ejection part of the coating apparatus, a shielding mechanism is provided for shielding the scattering of the liquid when the liquid ejected from the liquid ejection part is unnecessary.

本発明の塗布装置は、ノズル先端部分に吸い上げられた液体が飛散しても、基板への付着を低減することができ、塗布不良を低減することができる。   The coating apparatus of the present invention can reduce adhesion to the substrate even when the liquid sucked up at the nozzle tip portion is scattered, and can reduce defective coating.

以下、本発明の塗布装置について図を用い説明する。ここでは、塗布する液体として有機EL材料を例にとり有機EL素子の基板に塗布するものとする。   Hereinafter, the coating apparatus of this invention is demonstrated using figures. Here, an organic EL material is taken as an example of the liquid to be applied and applied to the substrate of the organic EL element.

図1(a)、(b)は本発明における塗布装置の概略構成を示す平面図及び正面図である。   1A and 1B are a plan view and a front view showing a schematic configuration of a coating apparatus according to the present invention.

図示する塗布装置1は基板設置部2及び塗布機構3を備えている。   The illustrated coating apparatus 1 includes a substrate installation unit 2 and a coating mechanism 3.

基板設置部2は、基板ステージ21及び旋回部22を備えている。基板ステージ21に有機ELパネル等の基板を設置し、旋回部22により基板ステージ21を図示θ方向に回転させることで、基板とノズル移動機構部31との水平方向のアライメントを行う構成とされている。   The substrate installation unit 2 includes a substrate stage 21 and a turning unit 22. A substrate such as an organic EL panel is set on the substrate stage 21 and the substrate stage 21 is rotated in the θ direction shown in the figure by the revolving unit 22 so that the substrate and the nozzle moving mechanism unit 31 are aligned in the horizontal direction. Yes.

塗布機構3は、ノズル移動機構部31と、ノズル(液体吐出部)32と、ノズル保持ユニット33と、遮蔽部34と、排出部35及びアーム36を備えている。   The coating mechanism 3 includes a nozzle moving mechanism unit 31, a nozzle (liquid ejection unit) 32, a nozzle holding unit 33, a shielding unit 34, a discharge unit 35, and an arm 36.

ノズル移動機構部31は、Y軸方向に移動可能な構成とされており、前記ノズル移動機構部31にノズル保持ユニット33がX、Z軸方向に移動可能に支持されている。このノズル保持ユニット33にノズル32が支持されており、上記の構成によって前記ノズル32をXYZ軸方向に移動させて、基板の所望の位置に有機EL材料の塗布を行う。   The nozzle moving mechanism unit 31 is configured to be movable in the Y-axis direction, and a nozzle holding unit 33 is supported on the nozzle moving mechanism unit 31 so as to be movable in the X- and Z-axis directions. The nozzle 32 is supported by the nozzle holding unit 33, and the nozzle 32 is moved in the XYZ axial directions by the above-described configuration to apply the organic EL material to a desired position on the substrate.

本発明では説明を簡便にするためノズル32は一つだけ記載しているが、赤、緑、青の有機EL材料を塗布する場合などではノズルは複数であってもよい。また、本発明ではノズル32をXYZ軸方向に移動させているが、塗布方法としては基板を移動させてもよく、あるいは両方を移動させてもよい。   In the present invention, only one nozzle 32 is shown for simplicity of explanation, but a plurality of nozzles may be used when red, green, and blue organic EL materials are applied. In the present invention, the nozzle 32 is moved in the X, Y, and Z axis directions. However, as a coating method, the substrate may be moved, or both may be moved.

上述したように本発明の塗布装置は、旋回部22により基板とノズル移動機構部31との水平方向のアライメントを行った後、ノズル32をXYZ軸方向に移動させることで、基板の所望の位置に有機EL材料を連続塗布し、パターニングを行う。しかしながら、上述したように、ノズル32は塗布動作後に基板上を幾度となく往復することになり、その際ノズル32の先端部分に吸い上げられた有機EL材料が基板に飛散して、塗布不良の原因となる。   As described above, in the coating apparatus of the present invention, after the horizontal alignment between the substrate and the nozzle moving mechanism unit 31 is performed by the swivel unit 22, the nozzle 32 is moved in the XYZ axial directions, thereby the desired position of the substrate. An organic EL material is continuously applied to the substrate and patterned. However, as described above, the nozzle 32 reciprocates several times on the substrate after the coating operation, and at this time, the organic EL material sucked up at the tip portion of the nozzle 32 is scattered on the substrate, causing the coating failure. It becomes.

そこで、本発明ではこのような塗布動作時以外の動作時に、つまり、ノズル32から吐出される有機EL材料の不要時の飛散を遮蔽する遮蔽機構を備えていることを特徴とする。   Therefore, the present invention is characterized by including a shielding mechanism that shields scattering of the organic EL material ejected from the nozzle 32 when it is not necessary, that is, during operations other than the coating operation.

遮蔽機構は、図2(a)、(b)に示すようにノズル32の先端部分(下端部分)にノズル保持ユニット33を介してアーム36により遮蔽部34を一時的に挿入することにより飛散した有機EL材料が基板に塗布されることを防止する構成とされている。具体的には、アーム36の一方の端部がノズル保持ユニット33に回転可能に連結されており、他方の端部に遮蔽部34が設けられている。例えば有機EL材料の塗布動作の終了の信号を受けると、前記ノズル32の塗布動作の終了に連動するように、ノズル保持ユニット33に設けられた回転機構によってアーム36を回転させる。そして、遮蔽部34をノズル32と基板との間に入るように移動させて前記ノズル32の直下位置に配置する(図2(a)を参照)。一方、有機EL材料の塗布動作の開始の信号を受けると、前記ノズル32の塗布動作の開始に連動するように、ノズル保持ユニット33に設けられた回転機構によってアーム36を回転させる。そして、遮蔽部34をノズル32と基板との間に入らないように退避させる(図2(b)を参照)。そのため、ノズル32の先端部分に吸い上げられた有機EL材料が飛散しても、基板への付着を低減することができる。また、塗布動作を行う時には、遮蔽部34をノズル32と基板との間に入らないように退避することにより、塗布動作に影響を与えることなく塗布動作を可能にすることができる。   As shown in FIGS. 2A and 2B, the shielding mechanism is scattered by temporarily inserting the shielding portion 34 by the arm 36 through the nozzle holding unit 33 at the tip portion (lower end portion) of the nozzle 32. The organic EL material is prevented from being applied to the substrate. Specifically, one end portion of the arm 36 is rotatably connected to the nozzle holding unit 33, and a shielding portion 34 is provided at the other end portion. For example, when an organic EL material application operation end signal is received, the arm 36 is rotated by a rotation mechanism provided in the nozzle holding unit 33 so as to be interlocked with the end of the nozzle 32 application operation. And the shielding part 34 is moved so that it may enter between the nozzle 32 and a board | substrate, and it arrange | positions in the position directly under the said nozzle 32 (refer Fig.2 (a)). On the other hand, upon receiving a signal for starting the application operation of the organic EL material, the arm 36 is rotated by a rotation mechanism provided in the nozzle holding unit 33 so as to be interlocked with the start of the application operation of the nozzle 32. Then, the shielding part 34 is retracted so as not to enter between the nozzle 32 and the substrate (see FIG. 2B). Therefore, even if the organic EL material sucked up at the tip portion of the nozzle 32 is scattered, the adhesion to the substrate can be reduced. Further, when performing the coating operation, the coating operation can be performed without affecting the coating operation by retracting the shielding portion 34 so as not to enter between the nozzle 32 and the substrate.

ちなみに、遮蔽部34は飛散する有機EL材料を受け止めることができる形状であれば特に限定しないが、図示するように漏斗形状とされていることが好ましく、その下端部に形成された開口部に排出部35が設けられていることが好ましい。排出部35は排出ユニット(図示せず)と連動し遮蔽部34に溜まった有機EL材料を排出する。これにより飛散した有機EL材料を随時排出することで、量産時などでも有機EL材料が遮蔽部34に溜まることを防止し、長期的・安定的に連続して塗布することを可能にできる。   Incidentally, the shielding portion 34 is not particularly limited as long as it can catch the scattered organic EL material, but it is preferably a funnel shape as shown in the figure, and is discharged to an opening formed at the lower end portion thereof. It is preferable that the part 35 is provided. The discharge unit 35 operates in conjunction with a discharge unit (not shown) and discharges the organic EL material accumulated in the shielding unit 34. By discharging the scattered organic EL material at any time, it is possible to prevent the organic EL material from accumulating on the shielding part 34 even during mass production, and to enable continuous application stably over a long period of time.

以下、本発明を用いた塗布結果と従来方式の塗布結果の比較例を説明する。図3は本発明に用いた有機EL素子用の基板の概略図である。ガラス基板101上の表示領域にパターニングされた画素電極102及びTFT回路(図示せず)を形成し、表示領域外に取り出し電極(図示せず)を形成した。   Hereinafter, a comparative example of the coating result using the present invention and the coating result of the conventional method will be described. FIG. 3 is a schematic view of a substrate for an organic EL element used in the present invention. A patterned pixel electrode 102 and a TFT circuit (not shown) were formed in the display area on the glass substrate 101, and an extraction electrode (not shown) was formed outside the display area.

さらに感光性ポリイミド材料からなるバンク103をフォトリソにより形成した。   Further, a bank 103 made of a photosensitive polyimide material was formed by photolithography.

バンク103の高さは3μm、バンク103の幅及びバンク間の幅はそれぞれ30μm・200μmとした。またバンク103に挟まれたストライプ状の画素ラインは100本とした。   The height of the bank 103 was 3 μm, and the width of the bank 103 and the width between the banks were 30 μm and 200 μm, respectively. The number of stripe-shaped pixel lines sandwiched between the banks 103 is 100.

次にバンク103の形成時の残存有機物を除去するためにUVオゾン処理を10分間行った。   Next, UV ozone treatment was performed for 10 minutes in order to remove residual organic substances during the formation of the bank 103.

次にCF4ガスによりフッ素プラズマ処理を行うことでバンク103に撥液性を付与した。 Next, liquid repellency was imparted to the bank 103 by performing fluorine plasma treatment with CF 4 gas.

ストライプ状のバンク103間に、本発明の塗布装置1を用いてホール注入材料としてPEDOT/PSSを連続的に塗布し、ホットプレートにて200℃、30分間ベークして膜厚30nmのホール注入層を形成した。   PEDOT / PSS is continuously applied as a hole injection material between the stripe-shaped banks 103 using the coating apparatus 1 of the present invention, and baked on a hot plate at 200 ° C. for 30 minutes to form a hole injection layer having a thickness of 30 nm. Formed.

次に同様にテトラリンにポリパラフェニレンビニレン誘導体poly[2−methoxy,5−(2’−ethylhexoxy)−1,4−phenylen vinylene]を1wt%溶かした溶液をバンク103間に塗布した。塗布後、ホットプレートにて150℃、10分間ベークして膜厚100nmの有機EL層を形成した。   Next, similarly, a solution in which 1 wt% of polyparaphenylene vinylene derivative poly [2-methoxy, 5- (2′-ethylhexoxy) -1,4-phenylene vinylene] was dissolved in tetralin was applied between the banks 103. After the application, an organic EL layer having a film thickness of 100 nm was formed by baking at 150 ° C. for 10 minutes on a hot plate.

この間、塗布動作時以外の動作時は本発明の遮蔽部34がノズル32の直下位置に挿入されるように設定し、塗布を行った。   During this time, during the operation other than the application operation, application was performed by setting the shielding portion 34 of the present invention so as to be inserted immediately below the nozzle 32.

その後、真空蒸着装置を用いて電子注入層としてCs2CO3を膜厚3nm、上部電極としてAlを膜厚150nm堆積した。 Thereafter, Cs 2 CO 3 was deposited to a thickness of 3 nm as an electron injection layer using a vacuum deposition apparatus, and Al was deposited to a thickness of 150 nm as an upper electrode.

真空から窒素中に移動して、画素部分を覆うように吸湿剤を備えたガラスキャップを接着し、有機EL素子を作成した。   The organic EL element was produced by moving from vacuum to nitrogen and adhering a glass cap provided with a hygroscopic agent so as to cover the pixel portion.

<比較例>
一方、比較例として、本発明の塗布装置1の遮蔽機構を用いずに実施例と同様の基板に同様の条件で有機EL材料を塗布することにより、有機EL素子を作成した。
<Comparative example>
On the other hand, as a comparative example, an organic EL element was formed by applying an organic EL material to a substrate similar to the example under the same conditions without using the shielding mechanism of the coating apparatus 1 of the present invention.

<評価>
作成した実施例における有機EL素子と比較例における有機EL素子で100本中、有機EL材料の飛散による塗布不良の割合を比較した。表1は実施例における不良率と比較例における不良率である。
<Evaluation>
Of the 100 organic EL elements in the prepared example and the organic EL element in the comparative example, the ratio of coating defects due to scattering of the organic EL material was compared. Table 1 shows the defect rate in the example and the defect rate in the comparative example.

Figure 2009064599
Figure 2009064599

表1に示すように、本発明の塗布装置を用いて作成した実施例の有機EL素子は、塗布不良を大きく低減することができた。   As shown in Table 1, the organic EL elements of the examples prepared using the coating apparatus of the present invention were able to greatly reduce coating defects.

本発明では飛散する液体として粘度の低い有機EL材料を用い有機EL素子の基板に塗布を行っているが本発明は液体の飛散を改善するものであり同様の効果が得られるものであれば特にこの分野に限るものではない。   In the present invention, a low-viscosity organic EL material is used as the liquid to be scattered, and coating is performed on the substrate of the organic EL element. However, the present invention improves the liquid scattering and is particularly effective as long as the same effect can be obtained. It is not limited to this field.

本発明における塗布装置の概略構成図である。It is a schematic block diagram of the coating device in this invention. 図1の塗布装置におけるノズル先端部分の模式図である。It is a schematic diagram of the nozzle front-end | tip part in the coating device of FIG. 有機EL素子基板である。It is an organic EL element substrate.

符号の説明Explanation of symbols

1 塗布装置
2 基板設置部
21 基板ステージ
22 旋回部
3 塗布機構
31 ノズル移動機構部
32 ノズル(液体吐出部)
33 ノズル保持ユニット
34 遮蔽部
35 排出部
36 アーム
101 基板
102 画素電極
103 バンク
DESCRIPTION OF SYMBOLS 1 Application | coating apparatus 2 Substrate installation part 21 Substrate stage 22 Turning part 3 Application | coating mechanism 31 Nozzle movement mechanism part 32 Nozzle (liquid discharge part)
33 Nozzle holding unit 34 Shielding portion 35 Discharging portion 36 Arm 101 Substrate 102 Pixel electrode 103 Bank

Claims (4)

基板上の塗布領域に液体を塗布する塗布装置において、
塗布装置の液体吐出部に連動し、液体吐出部から吐出される液体の不要時に、前記液体の飛散を遮蔽する遮蔽機構を備えていることを特徴とする塗布装置。
In a coating apparatus that applies a liquid to a coating area on a substrate,
A coating apparatus, comprising: a shielding mechanism that interlocks with a liquid ejection unit of the coating apparatus and shields the scattering of the liquid when the liquid ejected from the liquid ejection unit is unnecessary.
前記遮蔽機構は遮蔽部を備えており、前記遮蔽部は、前記液体の塗布動作を行う時には、前記液体吐出部と前記基板との間に入らないように退避し、前記液体の塗布動作を行わない時には、前記液体吐出部と前記基板との間に入るように移動する構成とされていることを特徴とする請求項1に記載の塗布装置。   The shielding mechanism includes a shielding part, and when performing the liquid application operation, the shielding part is retracted so as not to enter between the liquid discharge part and the substrate, and performs the liquid application operation. 2. The coating apparatus according to claim 1, wherein when there is not, the coating apparatus is configured to move so as to enter between the liquid ejection unit and the substrate. 前記遮蔽部には、この遮蔽部に溜まった液体を排出する排出部が設けられていることを特徴とする請求項1又は請求項2に記載の塗布装置。   The coating apparatus according to claim 1, wherein the shielding portion is provided with a discharge portion that discharges the liquid accumulated in the shielding portion. 前記液体は有機EL材料から成ることを特徴とする請求項1乃至請求項3のいずれか1項に記載の塗布装置。   The coating apparatus according to claim 1, wherein the liquid is made of an organic EL material.
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US9138784B1 (en) 2009-12-18 2015-09-22 Novellus Systems, Inc. Deionized water conditioning system and methods
US9435049B2 (en) 2013-11-20 2016-09-06 Lam Research Corporation Alkaline pretreatment for electroplating
US9455139B2 (en) 2009-06-17 2016-09-27 Novellus Systems, Inc. Methods and apparatus for wetting pretreatment for through resist metal plating
US9481942B2 (en) 2015-02-03 2016-11-01 Lam Research Corporation Geometry and process optimization for ultra-high RPM plating
US9613833B2 (en) 2013-02-20 2017-04-04 Novellus Systems, Inc. Methods and apparatus for wetting pretreatment for through resist metal plating
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US8962085B2 (en) 2009-06-17 2015-02-24 Novellus Systems, Inc. Wetting pretreatment for enhanced damascene metal filling
US20150096883A1 (en) * 2009-06-17 2015-04-09 Novellus Systems, Inc. Apparatus for wetting pretreatment for enhanced damascene metal filling
US9455139B2 (en) 2009-06-17 2016-09-27 Novellus Systems, Inc. Methods and apparatus for wetting pretreatment for through resist metal plating
US10840101B2 (en) 2009-06-17 2020-11-17 Novellus Systems, Inc. Wetting pretreatment for enhanced damascene metal filling
US10301738B2 (en) 2009-06-17 2019-05-28 Novellus Systems, Inc. Methods and apparatus for wetting pretreatment for through resist metal plating
US9721800B2 (en) 2009-06-17 2017-08-01 Novellus Systems, Inc. Apparatus for wetting pretreatment for enhanced damascene metal filling
US9828688B2 (en) 2009-06-17 2017-11-28 Novellus Systems, Inc. Methods and apparatus for wetting pretreatment for through resist metal plating
US9852913B2 (en) 2009-06-17 2017-12-26 Novellus Systems, Inc. Wetting pretreatment for enhanced damascene metal filling
US9138784B1 (en) 2009-12-18 2015-09-22 Novellus Systems, Inc. Deionized water conditioning system and methods
JP2013073813A (en) * 2011-09-28 2013-04-22 Toppan Printing Co Ltd Method for manufacturing organic electroluminescent panel
US9613833B2 (en) 2013-02-20 2017-04-04 Novellus Systems, Inc. Methods and apparatus for wetting pretreatment for through resist metal plating
US10128102B2 (en) 2013-02-20 2018-11-13 Novellus Systems, Inc. Methods and apparatus for wetting pretreatment for through resist metal plating
US9435049B2 (en) 2013-11-20 2016-09-06 Lam Research Corporation Alkaline pretreatment for electroplating
US9481942B2 (en) 2015-02-03 2016-11-01 Lam Research Corporation Geometry and process optimization for ultra-high RPM plating
US9617648B2 (en) 2015-03-04 2017-04-11 Lam Research Corporation Pretreatment of nickel and cobalt liners for electrodeposition of copper into through silicon vias

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