JP2009035750A - HEAT RESISTANT PtRh ALLOY - Google Patents
HEAT RESISTANT PtRh ALLOY Download PDFInfo
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- JP2009035750A JP2009035750A JP2007198573A JP2007198573A JP2009035750A JP 2009035750 A JP2009035750 A JP 2009035750A JP 2007198573 A JP2007198573 A JP 2007198573A JP 2007198573 A JP2007198573 A JP 2007198573A JP 2009035750 A JP2009035750 A JP 2009035750A
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- 239000000956 alloy Substances 0.000 title claims abstract description 57
- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 57
- 229910019017 PtRh Inorganic materials 0.000 title claims abstract description 31
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 5
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 4
- 229910052741 iridium Inorganic materials 0.000 claims abstract description 4
- 229910052702 rhenium Inorganic materials 0.000 claims abstract description 4
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 4
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 4
- 229910052737 gold Inorganic materials 0.000 claims abstract description 3
- 229910052748 manganese Inorganic materials 0.000 claims abstract description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 3
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 3
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 3
- 229910052707 ruthenium Inorganic materials 0.000 claims abstract description 3
- 229910052709 silver Inorganic materials 0.000 claims abstract description 3
- 239000000463 material Substances 0.000 claims description 10
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- 230000007797 corrosion Effects 0.000 abstract description 16
- 238000005260 corrosion Methods 0.000 abstract description 16
- 239000003779 heat-resistant material Substances 0.000 abstract description 6
- 239000000203 mixture Substances 0.000 abstract description 5
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 abstract description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 abstract description 4
- 229910052785 arsenic Inorganic materials 0.000 abstract description 4
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 abstract description 4
- 229910052797 bismuth Inorganic materials 0.000 abstract description 4
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 abstract description 4
- 229910052796 boron Inorganic materials 0.000 abstract description 4
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 abstract description 4
- 229910052710 silicon Inorganic materials 0.000 abstract description 4
- 239000010703 silicon Substances 0.000 abstract description 4
- 229910052725 zinc Inorganic materials 0.000 abstract description 4
- 239000011701 zinc Substances 0.000 abstract description 4
- 230000005856 abnormality Effects 0.000 abstract description 3
- 238000011161 development Methods 0.000 abstract description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 27
- 229910052698 phosphorus Inorganic materials 0.000 description 27
- 239000011574 phosphorus Substances 0.000 description 26
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 25
- 238000012360 testing method Methods 0.000 description 24
- 238000002844 melting Methods 0.000 description 16
- 230000008018 melting Effects 0.000 description 16
- 230000000052 comparative effect Effects 0.000 description 13
- 238000007254 oxidation reaction Methods 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- 239000010410 layer Substances 0.000 description 7
- 230000003647 oxidation Effects 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 230000007423 decrease Effects 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 229910052703 rhodium Inorganic materials 0.000 description 3
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 238000005275 alloying Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- -1 Platinum Metals Chemical class 0.000 description 1
- 229910001260 Pt alloy Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000005355 lead glass Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
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Abstract
Description
本発明は、エネルギー関連部材、航空・宇宙産業用部材、高融点材料製造用の構造材等の高温領域で使用される耐熱PtRh合金に関する。 The present invention relates to a heat-resistant PtRh alloy used in a high temperature region such as energy-related members, members for aerospace industry, structural materials for manufacturing high melting point materials.
耐熱材料に使用される白金族元素は、Pt、Ir、Rhが知られており、中でもPtは、純Pt、Pt合金や強化Pt等の形態で、高融点材料溶解坩堝や高温用器具等の構造材料、熱電対やヒーター線、温度センサー、スパークプラグ用電極等の電気材料として工業的に幅広く使用されている。その代表的な理由は、数ある金属の中で比較的融点が高く、蒸気圧が低いため消耗しにくく、酸化しにくく、また、化学的安定性が高いという特徴があるからである。 Platinum group elements used for heat-resistant materials are known as Pt, Ir, and Rh. Among them, Pt is in the form of pure Pt, Pt alloy, reinforced Pt, etc. It is widely used industrially as electrical materials such as structural materials, thermocouples and heater wires, temperature sensors, and electrodes for spark plugs. The typical reason is that among a number of metals, the melting point is relatively high and the vapor pressure is low, so that it is difficult to wear out, hardly oxidize, and has high chemical stability.
純Ptや強化Ptは、真空、不活性雰囲気、大気等、雰囲気を選ばず高温でも使用が可能である。ただし、還元雰囲気下ではリン、鉛、ヒ素、ホウ素、ビスマス、けい素、亜鉛等の軽元素との接触により400〜500℃程度の低温で反応して合金化し、融点降下や脆化を起こして破壊に至ることがある。
加えて、純Ptや強化Ptは融点が1769℃であるため、1500℃以上の高温では、耐熱性が不十分な場合がある。その場合には、融点の高い元素と合金化して用いられ、具体的には、酸化消耗に強いPtRh合金がよく使われる。PtRh合金は、合金化によって純Ptや強化Ptに比べ融点が高くなり、常用温度が高くできる。しかし、還元雰囲気下では純Ptや強化Ptと同様にリン、鉛、ヒ素、ホウ素、ビスマス、けい素、亜鉛等の軽元素と接触して反応し、融点降下や脆化といった異常を起こす。Ptとこれら軽元素との合金の融点が、Ptと比べ極端に低いことは、相平衡状態図に明らかにされている。このような注意は、例えば非特許文献１などに開示されている。
Pure Pt and reinforced Pt can be used at high temperatures regardless of the atmosphere such as vacuum, inert atmosphere, air, and the like. However, in a reducing atmosphere, contact with light elements such as phosphorus, lead, arsenic, boron, bismuth, silicon, and zinc reacts at a low temperature of about 400 to 500 ° C to form an alloy, causing melting point drop and embrittlement. May lead to destruction.
In addition, since pure Pt and reinforced Pt have a melting point of 1769 ° C., heat resistance may be insufficient at a high temperature of 1500 ° C. or higher. In that case, it is used by alloying with an element having a high melting point, and specifically, a PtRh alloy that is resistant to oxidation consumption is often used. The PtRh alloy has a higher melting point than that of pure Pt or reinforced Pt due to alloying, and can increase the normal temperature. However, in a reducing atmosphere, as with pure Pt and reinforced Pt, it reacts with light elements such as phosphorus, lead, arsenic, boron, bismuth, silicon, and zinc, causing abnormalities such as melting point drop and embrittlement. It is clear from the phase equilibrium diagram that the melting point of alloys of Pt and these light elements is extremely low compared to Pt. Such attention is disclosed in Non-Patent Document 1, for example.
一方、PtRh合金に関する技術の開示として、特許文献１がある。当該技術は、Wを0.5〜5.0 mass%、Rhを1.0〜20.0 mass%、残部をPtとする電極材料であり、従来のPtRh合金に比べて1000℃以上の熱処理後の引張強さの低下防止や使用時の破断防止を目的としたもので強度の向上が図られている。 On the other hand, there is Patent Literature 1 as a disclosure of the technology related to the PtRh alloy. This technology is an electrode material with 0.5 to 5.0 mass% W, 1.0 to 20.0 mass% Rh, and the balance Pt, and prevents a decrease in tensile strength after heat treatment at 1000 ° C or higher compared to conventional PtRh alloys. In order to prevent breakage during use, the strength is improved.
また、特許文献２に耐熱合金として、Ptを75〜96 mass%、Rhを1〜20 mass%、更にRu及び／又は Irを3〜5 mass%含有する耐熱合金を用いたガラス繊維用ブッシングが開示されている。当該技術は、従来のPtRh合金では高温クリープ強度が弱いことや強化Ptではビッカース硬さが高過ぎるためブッシングの成形が困難な点を解決しようとしたものである。
PtRh合金は耐熱材料として利用範囲が広がる中で、高温強度などの機械的性質の改善に関する技術開発が多くなされてきたが、リン、鉛、ヒ素、ホウ素、ビスマス、けい素、亜鉛等の軽元素との接触によって異常を来たす点については、耐熱合金の耐食性改善という観点からその必要性はあったものの、今まで着目されてこなかった。PtRh合金と軽元素の接触による異常は、還元雰囲気や低酸素分圧の雰囲気でPtRh合金と接触した軽元素が、金属表面及び内部の結晶粒界に沿って拡散し、Ptとの低融点合金を生成するために起こる。 PtRh alloy has been widely used as a heat-resistant material, and many technological developments have been made to improve mechanical properties such as high-temperature strength, but light elements such as phosphorus, lead, arsenic, boron, bismuth, silicon, and zinc. Although there was a need to improve the corrosion resistance of heat-resistant alloys, the point that caused abnormalities due to contact with steel has not been noticed until now. Anomaly caused by contact between PtRh alloy and light element is that light element that contacts PtRh alloy in a reducing atmosphere or low oxygen partial pressure atmosphere diffuses along the metal surface and internal grain boundaries, and is a low melting point alloy with Pt. Happens to produce.
そこで本発明は、前記従来のPtRh合金において未だ不十分な耐食性の改善を技術的課題とし、具体的には、Pによる腐食に強い耐熱性PtRh合金を提供することを目的とするものである。 Therefore, the present invention aims at providing a heat-resistant PtRh alloy that is resistant to corrosion by P, in particular, to improve the corrosion resistance still insufficient in the conventional PtRh alloy.
本発明者らは、前記課題を達成するために鋭意研究を重ねた結果、PtRhにV、Cr、Nb、Mo、Ta、Re及びWの何れかからなる元素Ａ群の範囲を0.1〜5.0 mass%、Mn及びCoの何れかからなる元素Ｂ群の範囲を0.1〜3.0 mass%、Ru、Pd、Ir、Au及びAgの何れかからなる元素Ｃ群を0.3〜5.0 mass%、Alを0.01〜1.0 mass%、前記Ａ群、Ｂ群、Ｃ群及びAlの少なくとも１種を含有し、更にRhを10〜40 mass%及び残部をPtとすることにより、本発明を完成するに至った。 As a result of intensive studies to achieve the above-mentioned problems, the present inventors have set the range of the element A group consisting of any of V, Cr, Nb, Mo, Ta, Re, and W to 0.1 to 5.0 mass in PtRh. The range of the element B group consisting of any one of%, Mn and Co is 0.1 to 3.0 mass%, the element C group consisting of any of Ru, Pd, Ir, Au and Ag is 0.3 to 5.0 mass%, and Al is 0.01 to The present invention was completed by containing 1.0 mass%, at least one of the A group, the B group, the C group and Al, further setting Rh to 10 to 40 mass% and the balance to Pt.
本発明の合金は、PtRh合金であり、元素Ａ群の範囲を0.1〜5.0 mass%、元素Ｂ群の範囲を0.1〜3.0 mass%、元素Ｃ群を0.3〜5.0 mass%、Alを0.01〜1.0 mass%として、前記Ａ群、Ｂ群、Ｃ群及びAlの少なくとも１種の元素を含有し、Rhを10〜40 mass%及び残部をPtとする。 The alloy of the present invention is a PtRh alloy, the range of the element A group is 0.1 to 5.0 mass%, the range of the element B group is 0.1 to 3.0 mass%, the element C group is 0.3 to 5.0 mass%, and Al is 0.01 to 1.0 mass%. As mass%, at least one element of group A, group B, group C and Al is contained, Rh is 10 to 40 mass%, and the balance is Pt.
元素Ａ群の範囲を0.1〜5.0 mass%に限定する理由は、0.1 mass%未満だと、リンと接触する際に十分な耐食性が得られず、また5.0 mass%より多いと耐熱材料に不利とされる高温領域での酸化揮発が激しくなるためである。 The reason for limiting the range of element A group to 0.1 to 5.0 mass% is that if it is less than 0.1 mass%, sufficient corrosion resistance cannot be obtained when contacting with phosphorus, and if it exceeds 5.0 mass%, it is disadvantageous for heat resistant materials. This is because the oxidization and volatilization in the high temperature region becomes intense.
元素Ｂ群の範囲を0.1〜3.0 mass%に限定する理由は、0.1 mass%未満だと、リンと接触する際に十分な耐食性が得られず、また3.0 mass%より多いと耐熱材料に不利とされる高温領域での酸化揮発が激しくなる他、合金が脆くなり加工性を低下させるためである。 The reason for limiting the range of element B group to 0.1 to 3.0 mass% is that if it is less than 0.1 mass%, sufficient corrosion resistance cannot be obtained when it comes into contact with phosphorus, and if it exceeds 3.0 mass%, it is disadvantageous for heat resistant materials. This is because the oxidation and volatilization in the high temperature region becomes intense, and the alloy becomes brittle and the workability is lowered.
元素Ｃ群の範囲を0.3〜5.0 mass%に限定する理由は、0.3 mass%未満だと、リンと接触する際に十分な耐食性が得られず、また5.0 mass%より多いと耐熱材料に不利とされる高温領域での酸化揮発が激しくなるためである。 The reason for limiting the range of element C group to 0.3 to 5.0 mass% is that if it is less than 0.3 mass%, sufficient corrosion resistance cannot be obtained when contacting with phosphorus, and if it exceeds 5.0 mass%, it is disadvantageous for heat-resistant materials. This is because the oxidization and volatilization in the high temperature region becomes intense.
Alを0.01〜1.0 mass%に限定する理由は、0.01 mass%未満だと、リンと接触する際に十分な耐食性が得られず、1.0 mass%より多いと融点低下が著しいためである。 The reason for limiting Al to 0.01 to 1.0 mass% is that if it is less than 0.01 mass%, sufficient corrosion resistance cannot be obtained when it comes into contact with phosphorus, and if it exceeds 1.0 mass%, the melting point is significantly lowered.
Rhの範囲を10〜40 mass%に限定する理由は、10 mass％未満だと、リンと接触する際に十分な耐食性が得られず、40 mass％より多いと合金が脆くなり加工性を低下させるためである。 The reason for limiting the Rh range to 10 to 40 mass% is that if it is less than 10 mass%, sufficient corrosion resistance cannot be obtained when it comes into contact with phosphorus, and if it exceeds 40 mass%, the alloy becomes brittle and the workability decreases. This is to make it happen.
前記組成の合金によれば、リンによる腐食に強く、十分な耐熱性を有するので、溶解用坩堝や器具などの構造材料及び熱電対、ヒーター線などの電気材料の信頼性を向上させ、その耐久性を高めることができる。
なお、前記組成の合金のうち、Cr、Re、Taのいずれか１種以上及びRhを含むPtRh合金としたときは、リンによる腐食ばかりか、Pbによる腐食にも強くすることができる。
The alloy having the above composition is resistant to corrosion by phosphorus and has sufficient heat resistance, thus improving the reliability of structural materials such as melting crucibles and appliances and electrical materials such as thermocouples and heater wires, and its durability. Can increase the sex.
In addition, among the alloys having the above composition, when a PtRh alloy containing one or more of Cr, Re, and Ta and Rh is used, the corrosion can be strengthened not only by phosphorus but also by Pb.
以下、本発明を実施例により具体的に説明する。 Hereinafter, the present invention will be specifically described by way of examples.
（試料の作製）
表１に示す組成のPtRh合金のインゴットは、原料金属を所定量に配合し、アーク溶解炉により溶製して得た。一定の加工率となるよう圧延加工と熱処理を繰返し行い、板厚0.5mmまで加工した。最終的にプレス加工で所定の形状に打ち抜いて試験片とし、次の各試験方法により評価した。
なお、インゴットの溶製には真空溶解炉やプラズマ溶解炉などの手段を用いることもできる。
(Sample preparation)
An ingot of a PtRh alloy having the composition shown in Table 1 was obtained by blending raw metal in a predetermined amount and melting it in an arc melting furnace. Rolling and heat treatment were repeatedly performed to obtain a constant processing rate, and processing was performed to a plate thickness of 0.5 mm. Finally, it was punched into a predetermined shape by press working to obtain a test piece, which was evaluated by the following test methods.
For melting the ingot, means such as a vacuum melting furnace and a plasma melting furnace can be used.
（硬さ試験）
硬さ試験は、前記試験片の加工材及び焼鈍材を、それぞれマイクロビッカース硬さ試験機を用いて、荷重200gf、荷重印加時間10秒の条件で行った。
(Hardness test)
In the hardness test, the processed material and the annealed material of the test piece were each subjected to a load of 200 gf and a load application time of 10 seconds using a micro Vickers hardness tester.
（耐リン性試験）
耐リン性試験は、前記方法で作成した試験片と赤リンを耐熱容器に密封し、不活性ガス中で800℃、1時間熱処理した後の試験片断面を金属顕微鏡で観察した。耐リン性は式１によって定義され、数値が高いほど耐食性が高いことを表す。
式１： 耐リン性（％）＝未反応部分の厚さ／試験片の断面厚さ×100
(Phosphorus resistance test)
In the phosphorus resistance test, the test piece and red phosphorus prepared by the above method were sealed in a heat-resistant container, and the cross section of the test piece after heat treatment in an inert gas at 800 ° C. for 1 hour was observed with a metal microscope. Phosphorous resistance is defined by Formula 1, and the higher the value, the higher the corrosion resistance.
Formula 1: Phosphorus resistance (%) = thickness of unreacted portion / cross-sectional thickness of test piece × 100
（酸化揮発性の試験）
前記方法で作製した試験片の試験前の質量を測定し、大気中1200℃の電気炉内で、20時間熱処理した後の試験片の質量を測定した。試験片の質量変化を式２によって求め、酸化揮発性を評価した。マイナスは酸化揮発による質量減少を表し、プラスは酸化増量を表す。
式２： 質量変化（％）＝（試験後の質量−試験前の質量）／試験前の質量×100
(Oxidation volatility test)
The mass before the test of the test piece produced by the above method was measured, and the mass of the test piece after heat treatment for 20 hours in an electric furnace at 1200 ° C. in the atmosphere was measured. The mass change of the test piece was obtained by Equation 2, and the oxidation volatility was evaluated. A minus represents a mass decrease due to oxidation volatilization, and a plus represents an oxidation increase.
Formula 2: Mass change (%) = (mass after test−mass before test) / mass before test × 100
（耐鉛性試験）
耐鉛性試験は、前記方法で作製した試験片を800℃の電気炉内で溶融鉛ガラス中に浸せきし、8時間保持した後、取り出して、試験片断面を金属顕微鏡により観察した。断面表層に現れる鉛との反応層の厚さを測定して、式３により耐鉛性を評価した。ここでいう耐鉛性は、従来合金（比較例１）との反応層厚さの比であり、数値が低いほど耐食性に優れることを表す。
式３： 耐鉛性 ＝（試験片の鉛との反応層厚さ）／（比較例１の鉛との反応層厚さ）
(Lead resistance test)
In the lead resistance test, the test piece prepared by the above method was immersed in molten lead glass in an electric furnace at 800 ° C., held for 8 hours, taken out, and the cross section of the test piece was observed with a metal microscope. The thickness of the reaction layer with lead appearing in the cross-sectional surface layer was measured, and the lead resistance was evaluated by Equation 3. The lead resistance here is the ratio of the reaction layer thickness to the conventional alloy (Comparative Example 1), and the lower the value, the better the corrosion resistance.
Formula 3: Lead resistance = (reaction layer thickness with lead of test piece) / (reaction layer thickness with lead of Comparative Example 1)
（結果）
前記試験の結果を表２に示す。
実施例１〜実施例２８に示す合金は請求項１記載のPtRh合金である。これら実施例合金のすべては、比較例７を除く比較例合金より耐リン性に優れていた。
(result)
The results of the test are shown in Table 2.
The alloys shown in Examples 1 to 28 are PtRh alloys according to claim 1. All of these Example alloys were superior in phosphorus resistance to Comparative Example alloys except Comparative Example 7.
本発明のPtRh合金は、従来のPtRh合金（比較例１）に比べ、前記反応層の厚さが薄く、リンとの反応を効果的に抑制していた。その一例を図１に示す。これに対し、比較例１及び強化Ptとして知られる比較例２、さらに比較例３〜６は、リンと著しく反応し、厚い反応層が形成されていた。その一例を図２に示す。純Ptにおいても図２同様に厚い反応層が観察された。 The PtRh alloy of the present invention had a thinner reaction layer than the conventional PtRh alloy (Comparative Example 1), and effectively suppressed the reaction with phosphorus. An example is shown in FIG. In contrast, Comparative Example 1 and Comparative Example 2 known as reinforced Pt, and further Comparative Examples 3 to 6, reacted significantly with phosphorus, and a thick reaction layer was formed. An example is shown in FIG. Also in pure Pt, a thick reaction layer was observed as in FIG.
本発明のPtRh合金においては、Rhの添加量は10 mass％以上で耐リン性を50%以上にまで高める効果があった（図３）。 In the PtRh alloy of the present invention, the amount of Rh added was 10 mass% or more, and the phosphorus resistance was increased to 50% or more (FIG. 3).
本発明のPtRh合金においては、添加元素の種類及び添加量によって耐リン性を高める効果に若干の差はあるものの、いずれも耐リン性が30％以上まで高まった。
従来のPtRh合金（比較例１）や本発明の範囲から外れる組成の合金（比較例２〜６）では、本発明より耐リン性が劣り、Ptに添加する元素の種類及び量によっては、極端に耐リン性を悪化させるものもあった（表２及び図４）。
In the PtRh alloy of the present invention, although there was a slight difference in the effect of enhancing the phosphorus resistance depending on the kind and amount of the additive element, the phosphorus resistance was increased to 30% or more.
Conventional PtRh alloys (Comparative Example 1) and alloys with compositions outside the scope of the present invention (Comparative Examples 2 to 6) are inferior in phosphorus resistance to the present invention, and depending on the type and amount of elements added to Pt, Some of them deteriorated phosphorus resistance (Table 2 and FIG. 4).
本発明のPtRh合金（実施例１〜２８）の質量変化は、増減を示したが、その量は±0.1％以内と極わずかで、高温使用に問題を生じるほどではなかった。
比較例１〜比較例６の合金の質量変化は、実施例と同程度に小さかったが、比較例７は、-0.58％と大きく減量し、酸化揮発が激しかった。
Although the mass change of the PtRh alloy of the present invention (Examples 1 to 28) showed an increase or decrease, the amount was extremely small within ± 0.1%, which was not so high as to cause a problem in high temperature use.
Although the mass change of the alloys of Comparative Examples 1 to 6 was as small as that of the Example, Comparative Example 7 was greatly reduced to -0.58% and the oxidation volatilization was severe.
本発明のPtRh合金のうち、実施例４、１７、１９、２２は、従来例合金に比べて耐リン性に優れるばかりか、耐鉛性も優れていた（図５）。 Among the PtRh alloys of the present invention, Examples 4, 17, 19, and 22 were not only excellent in phosphorus resistance but also excellent in lead resistance as compared with conventional alloys (FIG. 5).
Claims (3)
元素Ａ群としてV、Cr、Nb、Mo、Ta、Re、Wの範囲を0.1〜5.0 mass%、
元素Ｂ群としてMn、Coの範囲を0.1〜3.0 mass%、
元素Ｃ群としてRu、Pd、Ir、Au、Agの範囲を0.3〜5.0 mass%、
Alを0.01〜1.0 mass%、
前記Ａ群、Ｂ群、Ｃ群及びAlの少なくとも１種を含有し、Rhを10〜40 mass%及び残部をPtとすることを特徴とする耐熱PtRh合金。 In PtRh alloy
As element A group, the range of V, Cr, Nb, Mo, Ta, Re, W is 0.1-5.0 mass%,
The range of Mn and Co as element B group is 0.1-3.0 mass%,
As element C group, the range of Ru, Pd, Ir, Au, Ag is 0.3-5.0 mass%,
0.01 to 1.0 mass% Al,
A heat-resistant PtRh alloy containing at least one of Group A, Group B, Group C and Al, wherein Rh is 10 to 40 mass% and the balance is Pt.
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| CN104894525A (en) * | 2015-06-24 | 2015-09-09 | 沈阳东创贵金属材料有限公司 | Vacuum magnetron sputtering platinum-rhodium alloy target and method for manufacturing same |
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| CN115537593A (en) * | 2022-10-11 | 2022-12-30 | 沈阳东创贵金属材料有限公司 | Platinum-ruthenium alloy target material and preparation method and application thereof |
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