JP2009034671A5 - - Google Patents

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JP2009034671A5
JP2009034671A5 JP2008179115A JP2008179115A JP2009034671A5 JP 2009034671 A5 JP2009034671 A5 JP 2009034671A5 JP 2008179115 A JP2008179115 A JP 2008179115A JP 2008179115 A JP2008179115 A JP 2008179115A JP 2009034671 A5 JP2009034671 A5 JP 2009034671A5
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pfc
processing apparatus
gas
pfc processing
agent
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JP2009034671A (en
JP5066021B2 (en
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Claims (13)

ＰＦＣ含有ガスを処理するＰＦＣ処理装置であって、
棒状の内部ヒーターと、該内部ヒーターから所定間隔をおいて、筒状に配された外部ヒーターとを具備する装置本体からなり、
該内部ヒーター及び該外部ヒーターとの間にＰＦＣ分解処理剤を充填する処理剤配置部が形成されている
ことを特徴とするＰＦＣ処理装置。 A PFC processing apparatus for processing a PFC-containing gas,
A device body comprising a rod-shaped internal heater and an external heater arranged in a cylindrical shape at a predetermined interval from the internal heater,
A PFC processing apparatus, wherein a processing agent disposition unit for filling a PFC decomposition processing agent is formed between the internal heater and the external heater. ＰＦＣ処理装置内に被処理ガスを導入するガス導入部にアルカリ剤が配されてアルカリ剤配置部が形成されていることを特徴とする請求項１記載のＰＦＣ処理装置。   2. The PFC processing apparatus according to claim 1, wherein an alkali agent is arranged in a gas introduction part for introducing a gas to be processed into the PFC processing apparatus to form an alkali agent arrangement part. 上記装置本体に充填される上記ＰＦＣ分解処理剤が、平均粒子径６０μｍ以上１６０μｍ以下のAl（OH）3と、Ca（OH）2とのモル比が３：７〜５：５である混合物を４３０℃よりも高く８９０℃以下の温度範囲、窒素流又は空気流の対向流中で焼成して得られるＰＦＣ分解処理剤である請求項１又は２に記載のＰＦＣ処理装置。 The PFC decomposition treatment agent filled in the apparatus main body is a mixture in which the molar ratio of Al (OH) 3 having an average particle diameter of 60 μm to 160 μm and Ca (OH) 2 is 3: 7 to 5: 5. The PFC treatment apparatus according to claim 1 or 2, which is a PFC decomposition treatment agent obtained by firing in a temperature range higher than 430 ° C and lower than or equal to 890 ° C, in a counterflow of a nitrogen flow or an air flow. 上記内部ヒーターがその長手方向に２分割されて第１及び第２の内部ヒーターが形成されており、また、上記外部ヒーターが２分割されて第１及び第２の外部ヒーターが形成されており、第１及び第２の内部ヒーター並びに第１及び第２の外部ヒーターそれぞれの温度が独立して制御可能になされていることを特徴とする請求項１〜３のいずれかに記載のＰＦＣ処理装置。 The internal heater is divided into two in the longitudinal direction to form first and second internal heaters, and the external heater is divided into two to form first and second external heaters, The PFC processing apparatus according to any one of claims 1 to 3, wherein the temperatures of the first and second internal heaters and the first and second external heaters are independently controllable. ＰＦＣ処理装置内に被処理ガスを導入するガス導入部側に、上部ヒーターがさらに設けられていることを特徴とする請求項１〜４のいずれかに記載のＰＦＣ処理装置。 The PFC processing apparatus according to any one of claims 1 to 4, further comprising an upper heater provided on a gas introduction unit side for introducing the gas to be processed into the PFC processing apparatus . ＰＦＣ処理装置内に被処理ガスを導入するガス導入部側に整流板が配されていることを特徴とする請求項１〜５のいずれかに記載のＰＦＣ処理装置。 The PFC processing apparatus according to any one of claims 1 to 5 , wherein a rectifying plate is arranged on a gas introduction part side for introducing the gas to be processed into the PFC processing apparatus. 上記整流板は、上記内部ヒーターの上方に、小径の板状部材と、中心部に通気用孔を有する大径の板状部材とが、上下に一定の間隔を空けて交互に積層されてなることを特徴とする請求項６に記載のＰＦＣ処理装置。 The rectifying plate is formed by alternately laminating a small-diameter plate-like member and a large-diameter plate-like member having a ventilation hole in the center at a certain interval above and below the internal heater. The PFC processing apparatus according to claim 6 . ＰＦＣ含有ガスを処理するＰＦＣ処理装置であって、A PFC processing apparatus for processing a PFC-containing gas,
被処理ガスを分解処理する反応槽と、A reaction tank for decomposing the gas to be treated;
当該反応槽内に被処理ガスを導入するガス導入部側に設けられている上部ヒーターと、An upper heater provided on the gas introduction part side for introducing the gas to be treated into the reaction tank;
当該反応槽の外周に設けられた筒状の外部ヒーターと、A cylindrical external heater provided on the outer periphery of the reaction vessel;
を具備する装置本体からなり、Comprising a device body comprising
当該反応槽内にＰＦＣ分解処理剤を充填する処理剤配置部が形成されているA treatment agent arrangement portion for filling the PFC decomposition treatment agent in the reaction tank is formed.
ことを特徴とするＰＦＣ処理装置。The PFC processing apparatus characterized by the above-mentioned. ＰＦＣ処理装置内に被処理ガスを導入するガス導入部にアルカリ剤が配されてアルカリ剤配置部が形成されていることを特徴とする請求項８記載のＰＦＣ処理装置。9. The PFC processing apparatus according to claim 8, wherein an alkali agent is arranged in a gas introduction part for introducing a gas to be processed into the PFC processing apparatus to form an alkali agent arrangement part. 上記装置本体に充填される上記ＰＦＣ分解処理剤が、平均粒子径６０μｍ以上１６０μｍ以下のAl（OH） 3 と、Ca（OH） 2 とのモル比が３：７〜５：５である混合物を４３０℃よりも高く８９０℃以下の温度範囲、窒素流又は空気流の対向流中で焼成して得られるＰＦＣ分解処理剤である請求項８又は９に記載のＰＦＣ処理装置。 The PFC decomposition treatment agent filled in the apparatus main body is a mixture in which the molar ratio of Al (OH) 3 having an average particle diameter of 60 μm to 160 μm and Ca (OH) 2 is 3: 7 to 5: 5. The PFC treatment apparatus according to claim 8 or 9, which is a PFC decomposition treatment agent obtained by firing in a temperature range higher than 430 ° C and not higher than 890 ° C, in a counterflow of a nitrogen flow or an air flow . 被処理ガス流れの上流から順に請求項１〜１０の何れかに記載のＰＦＣ処理装置を２個直列接続してなるＰＦＣ処理システムであって、
２つの該ＰＦＣ処理装置には、各ＰＦＣ処理装置に被処理ガスを導入する導入配管、及び、各ＰＦＣ処理装置から処理後の処理済みガスを導出する導出配管が連結されており、第１のＰＦＣ処理装置の導入配管と第２のＰＦＣ処理装置の導出配管とを連結する連絡配管と、第２のＰＦＣ処理装置の導入配管と第１のＰＦＣ処理装置の導出配管とを連結する連絡配管とが設けられており、各配管にはそれぞれ開閉用バルブが設けられているＰＦＣ処理システム。 A PFC processing system in which two PFC processing devices according to any one of claims 1 to 10 are connected in series in order from the upstream of a gas flow to be processed,
The two PFC processing apparatuses are connected to an introduction pipe for introducing a gas to be processed into each PFC processing apparatus and a lead-out pipe for deriving a processed gas from each PFC processing apparatus. A connecting pipe connecting the introduction pipe of the PFC processing apparatus and the outlet pipe of the second PFC processing apparatus, and a connecting pipe connecting the introduction pipe of the second PFC processing apparatus and the outlet pipe of the first PFC processing apparatus; A PFC processing system in which each pipe is provided with an opening / closing valve. 請求項１〜１０のいずれかに記載のＰＦＣ処理装置又は請求項１１に記載のＰＦＣ処理システムを用いて行うＰＦＣ含有ガスの処理方法であって、
上記処理剤配置部に、別に製造したＰＦＣ分解処理剤を充填し、ＰＦＣを含有するガスを装置本体に導入し、処理温度５５０〜８５０℃で処理することを特徴とするＰＦＣ含有ガスの処理方法。 A method for treating a PFC-containing gas using the PFC treatment apparatus according to any one of claims 1 to 10 or the PFC treatment system according to claim 11 ,
A method for treating PFC-containing gas, wherein the treatment agent disposition unit is filled with a separately produced PFC decomposition treatment agent, a gas containing PFC is introduced into the apparatus main body, and treatment is performed at a treatment temperature of 550 to 850 ° C. . 請求項１１に記載のＰＦＣ処理システムを用いるＰＦＣ含有ガスの処理方法であって、
第１のＰＦＣ処理装置からの処理済みガスを第２のＰＦＣ処理装置に導入し、
排ガスの除去率が所定値を下回った時点を検出して第１のＰＦＣ処理装置の稼働を停止し、新しいＰＦＣ分解処理剤に交換し、この交換の間、第２のＰＦＣ処理装置のみを稼働させ、
交換完了後は、第２のＰＦＣ処理装置が上流側となり、新しいＰＦＣ分解処理剤を充填したＰＦＣ処理装置が下流側となるように各配管のバルブを切り替えて、続けて二段直列運転を行うことを特徴とするＰＦＣ含有ガスの処理方法。 A method for processing a PFC-containing gas using the PFC processing system according to claim 11 ,
Introducing treated gas from the first PFC processor into the second PFC processor,
When the exhaust gas removal rate falls below a predetermined value, the operation of the first PFC processing device is stopped and replaced with a new PFC decomposition treatment agent. During this replacement, only the second PFC processing device is operated. Let
After completing the replacement, the valves of each pipe are switched so that the second PFC processing apparatus is on the upstream side and the PFC processing apparatus filled with the new PFC decomposition processing agent is on the downstream side, and then the two-stage series operation is performed. A method for treating a PFC-containing gas.
JP2008179115A 2007-07-10 2008-07-09 PFC processing apparatus and PFC-containing gas processing method Active JP5066021B2 (en)

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JP2007181528 2007-07-10
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JP5020136B2 (en) * 2007-07-10 2012-09-05 株式会社荏原製作所 Fluorine fixing agent, PFC decomposition treatment agent, and preparation method thereof
JP5284773B2 (en) * 2008-12-26 2013-09-11 株式会社荏原製作所 Exhaust gas treatment method for increasing treatment temperature, operation method of exhaust gas treatment device, and exhaust gas treatment device
JP5498752B2 (en) * 2009-10-07 2014-05-21 大陽日酸株式会社 Exhaust gas treatment method and exhaust gas treatment apparatus

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JP3264453B2 (en) * 1992-09-02 2002-03-11 セントラル硝子株式会社 NF 3 gas pretreatment method
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