CN217119830U - Tail gas plasma treatment absorption equipment - Google Patents

Tail gas plasma treatment absorption equipment Download PDF

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Publication number
CN217119830U
CN217119830U CN202221460870.3U CN202221460870U CN217119830U CN 217119830 U CN217119830 U CN 217119830U CN 202221460870 U CN202221460870 U CN 202221460870U CN 217119830 U CN217119830 U CN 217119830U
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nitrogen oxide
oxide adsorption
ventilating
plasma treatment
equipment
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Chinese (zh)
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张帅
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Xingshuo Suzhou Electronic Technology Co ltd
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Xingshuo Suzhou Electronic Technology Co ltd
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Abstract

The utility model belongs to the technical field of tail gas treatment facility, a tail gas plasma treatment absorption equipment is related to, including plasma high temperature reaction device, cooling device and the nitrogen oxide adsorption equipment who connects gradually, cooling device include the shell with a plurality of tubulations of ventilating of vertical setting in the shell, the inside and outside of tubulation of ventilating are each other not intercommunication, the last mouthful intercommunication of tubulation of ventilating the inner chamber of plasma high temperature reaction device, the dust clearance chamber that can open from the lower part is managed to the end opening intercommunication of ventilating, the lateral wall intercommunication in dust clearance chamber nitrogen oxide adsorption equipment's lower part import, be equipped with water inlet and delivery port on the shell, the water inlet with be connected with cooling water circle device between the delivery port. This equipment deposition position department can carry out the plant maintenance very conveniently like this in the dust clearance chamber that can open, can not produce waste water during the heat exchange moreover, can not increase the aftertreatment troublesome.

Description

Tail gas plasma treatment absorption equipment
Technical Field
The utility model relates to a tail gas treatment facility technical field, in particular to tail gas plasma treatment absorption equipment.
Background
In the production and manufacturing process of industrial factories such as semiconductors, solar energy, liquid crystal panels, LEDs and the like, various electronic gases are used, and most of the gases are toxic and harmful hazardous gases. Some of these toxic and harmful gases are utilized in the manufacturing process, and some residual gases are discharged. Because these gases are all high-risk gases, some are corrosive, some are inflammable and explosive, etc., it is necessary to dispose in time at a place close to the main equipment in the workshop to reduce the production safety risk to the utmost extent.
At present, common gas treatment equipment is divided into a dry adsorption type, a water washing type, an electric heating water washing type, a plasma water washing type and the like, and particularly, in recent years, with the upgrading of processes in the manufacture of chips and solar cells, the application of plasma type tail gas treatment equipment is more and more popular. After other waste gases are treated by high-temperature combustion, a large amount of nitrogen oxide (NOx) waste gases are generated by the plasma equipment, and although the emission of other harmful gases is greatly reduced, a new pollution source is generated at the same time, so that the nitrogen oxides also need to be adsorbed.
CN113477043A discloses a tail gas treatment system, which comprises a pretreatment device, a spray device and a nitrogen oxide treatment device, wherein the pretreatment device can spray plasma, and tail gas enters from the top end of the pretreatment device, flows downwards through the spray device, and then flows upwards through the nitrogen oxide treatment device. However, the method of directly spraying and absorbing the cooling water is adopted, but as the cooling water absorbs dust, a large amount of waste water is formed, nitrogen oxides can be dissolved in the water to become acid liquor which can corrode equipment, and the treatment of a large amount of acidic waste water brings high cost.
There is therefore a need for an improved apparatus to address the above problems.
Disclosure of Invention
The utility model discloses a main aim at provides an absorption equipment is handled to tail gas plasma can avoid producing high temperature waste water beyond handling tail gas and nitrogen oxide, and makes things convenient for the waste matter to clear up.
The utility model discloses a following technical scheme realizes above-mentioned purpose: the utility model provides a tail gas plasma treatment absorption equipment, includes plasma high temperature reaction device, cooling device and the nitrogen oxide adsorption equipment that connects gradually, cooling device includes the shell and a plurality of tubulations of ventilating of vertical setting in the shell, the inside and outside of tubulation of ventilating each other do not communicate, the last mouth intercommunication of tubulation of ventilating plasma high temperature reaction device's inner chamber, the dust clearance chamber that can open from the lower part is communicated to the end opening of tubulation of ventilating, the lateral wall intercommunication in dust clearance chamber the import of nitrogen oxide adsorption equipment's lower part, be equipped with water inlet and delivery port on the shell, the water inlet with be connected with cooling water circle device between the delivery port.
Specifically, the top of the plasma high-temperature reaction device is provided with a plurality of air inlet pipe orifices.
Specifically, the side wall of the plasma high-temperature reaction device is provided with a heat insulation layer.
Specifically, the outlet of the dust cleaning cavity is simultaneously connected with two nitrogen oxide adsorption devices through a three-way switching valve.
Furthermore, the upper outlets of the two nitrogen oxide adsorption devices converge at the same exhaust port, and a gas detection device is arranged on the exhaust port.
Furthermore, a filter screen is arranged in the nitrogen oxide adsorption device, the filter screen divides the inner cavity of the nitrogen oxide adsorption device into a buffer cavity at the lower part and a packing cavity at the upper part, and adsorption packing is arranged in the packing cavity.
The utility model discloses technical scheme's beneficial effect is:
this equipment can utilize plasma high temperature reaction device to carry out pyrolysis to the tail gas that sends, then send out after cooling device cooling and nitrogen oxide absorbing device absorb, because the air current is lower before last through equipment, so the deposition position is located in the dust clearance chamber that can open, can carry out equipment maintenance very conveniently like this, can not produce waste water during the heat exchange moreover, can not increase the aftertreatment troublesome.
Drawings
FIG. 1 is a piping diagram of an absorption apparatus for plasma treatment of off-gas according to an embodiment.
The figures in the drawings represent:
1-a plasma high-temperature reaction device, 11-an air inlet pipe orifice and 12-a heat insulation layer;
2-cooling device, 21-shell, 211-water inlet, 212-water outlet, 22-ventilation tube nest and 23-dust cleaning cavity;
3a, 3 b-nitrogen oxide adsorption device, 31-filter screen, 32-buffer chamber, 33-adsorption filler;
4-cooling water circulation device;
5-a three-way switching valve;
6-gas detection device.
Detailed Description
The present invention will be described in further detail with reference to specific examples.
Example (b):
as shown in fig. 1, the utility model discloses a tail gas plasma treatment absorption equipment, including the plasma high temperature reaction device 1 that connects gradually, cooling device 2 and nitrogen oxide adsorption equipment 3a, cooling device 2 includes shell 21 and a plurality of tubulation 22 of ventilating of vertical setting in shell 21, the inside and outside each other of tubulation 22 of ventilating communicates, the inner chamber of the last mouthful intercommunication plasma high temperature reaction device 1 of tubulation 22 of ventilating, the dust clearance chamber 23 that can open from the lower part is managed 22's end opening intercommunication one of ventilating, the dust clearance chamber 23 communicates nitrogen oxide adsorption equipment 3 a's lower part import, be equipped with water inlet 211 and delivery port 212 on the shell 21, be connected with cooling water circle device 4 between water inlet 211 and the delivery port 212. The tail gas passes through the plasma high-temperature reaction device 1 from top to bottom, a plasma torch with the temperature as high as ten thousand degrees can be generated in the plasma high-temperature reaction device 1, the average temperature in the cavity can reach 1600-3000 ℃, and therefore almost all the tail gas can be instantaneously decomposed when entering the high-temperature cracking cavity; the high-temperature waste gas after the subsequent decomposition passes down the cooling temperature reducing device 2, the cooling temperature reducing device 2 is a heat exchanger structure, the heat in the waste gas is transferred to the cooling water flowing in the shell 21 through the ventilating tube array 22, the heated cooling water is supplied to the cooling temperature reducing device 2 again after being cooled by the cooling water circulating device 4, because the inner side and the outer side of the ventilating tube array 22 are not communicated with each other, only heat is exchanged, and therefore the waste gas is not directly contacted with the cooling water, and a large amount of acid waste water cannot be generated in the process. If dust is generated in the ventilating tubes 22 in the cooling process, most of the dust directly falls into the dust cleaning cavity 23 along the vertical direction, the dust can be discharged as long as the dust cleaning cavity 23 is opened periodically, and the ventilating tubes 22 can be dredged conveniently. The cooled exhaust gas passes through the nitrogen oxide adsorption device 3a from bottom to top again, if nitrogen oxide is produced in the exhaust gas due to high-temperature reaction, then when passing through the nitrogen oxide adsorption device 3a, this part of harmful gas will be absorbed, and can not discharge to the atmosphere. Therefore, the equipment can utilize the plasma high-temperature reaction device 1 to carry out pyrolysis on the delivered tail gas, then the tail gas is cooled by the cooling and cooling device 2 and is delivered after being absorbed by the nitrogen oxide absorption device 3a, and because the airflow passes through the equipment from bottom to top, the dust deposition position is positioned in the dust cleaning cavity 23 which can be opened, so that the equipment can be conveniently maintained, and no waste water is generated during heat exchange, and the post-treatment trouble is not increased.
As shown in fig. 1, the top of the plasma high temperature reaction apparatus 1 is provided with a plurality of gas inlet nozzles 11. For a manufacturing enterprise, the types of the generated tail gas may not be unique, such as acid gas, alkaline gas, organic gas, flammable gas, etc., and different tail gases may also react violently if mixed in advance, which is dangerous, so it is safer to separately introduce the tail gas into the plasma high temperature reaction apparatus 1 through different gas inlet pipes 11 and then process the tail gas.
As shown in fig. 1, the side wall of the plasma high-temperature reaction apparatus 1 has a heat insulating layer 12. Since the temperature in the plasma high-temperature reaction device 1 is high, the thermal insulation layer 12 is needed to reduce the heat conduction loss on one hand and reduce the temperature of the outer wall on the other hand, so as to prevent scalding of operators.
As shown in fig. 1, the outlet of the dust cleaning chamber 23 is simultaneously connected to two nitrogen oxide adsorption apparatuses 3a, 3b through a three-way switching valve 5. When the previous nitrogen oxide adsorption device 3a is found to be saturated in adsorption, the three-way switching valve 5 can be used for switching to communicate with the other nitrogen oxide adsorption device 3b, the nitrogen oxide adsorption device 3a can replace the adsorption filler 33, and vice versa, so that excessive harmful gas is prevented from being exhausted into the atmosphere when the nitrogen oxide adsorption device is not in time for treatment.
As shown in fig. 1, the upper outlets of the two nitrogen oxide adsorption devices 3a and 3b are merged into the same exhaust port, and a gas detection device 6 is provided on the exhaust port. The gas detection device 6 can directly detect gas components discharged into the atmosphere, if nitrogen oxides overflow, the adsorption capacity of the nitrogen oxide adsorption device 3a or the nitrogen oxide adsorption device 3b can be represented to be saturated, and therefore the three-way switching valve 5 can be alarmed or directly driven to complete pipeline switching at the first time.
As shown in fig. 1, a filter screen 31 is provided in the nitrogen oxide adsorption device 3a, the filter screen 31 divides an inner cavity of the nitrogen oxide adsorption device 3a into a buffer chamber 32 at a lower portion and a packing chamber at an upper portion, and an adsorption packing 33 is provided in the packing chamber. When gas just enters the nitrogen oxide adsorption device 3a, the pressure in the buffer cavity 32 is released, and then the airflow uniformly goes upwards through the adsorption filler 33 at the filter screen 31, so that the adsorption filler 33 is fully contacted with the gas, and the problem of reduction of the effective utilization rate of the adsorption filler 33 is avoided. The nitrogen oxide adsorption device 3b has the same structure as the nitrogen oxide adsorption device 3a, and will not be described in detail.
What has been described above are only some embodiments of the invention. For those skilled in the art, without departing from the inventive concept, several modifications and improvements can be made, which are within the scope of the invention.

Claims (6)

1. The utility model provides a tail gas plasma treatment absorption equipment, includes plasma high temperature reaction device (1), cooling device (2) and nitrogen oxide adsorption equipment (3 a) that connect gradually, its characterized in that: the cooling device (2) comprises a shell (21) and a plurality of ventilating tubes (22) vertically arranged in the shell (21), the inner side and the outer side of the ventilating tubes (22) are not communicated with each other, the upper opening of the ventilating tubes (22) is communicated with the inner cavity of the plasma high-temperature reaction device (1), the lower opening of the ventilating tubes (22) is communicated with a dust cleaning cavity (23) which can be opened from the lower part, the side wall of the dust cleaning cavity (23) is communicated with the lower inlet of the nitrogen oxide adsorption device (3 a), a water inlet (211) and a water outlet (212) are formed in the shell (21), and a cooling water circulation device (4) is connected between the water inlet (211) and the water outlet (212).
2. The exhaust gas plasma treatment absorption apparatus according to claim 1, wherein: the top of the plasma high-temperature reaction device (1) is provided with a plurality of air inlet pipe orifices (11).
3. The exhaust gas plasma treatment absorption apparatus according to claim 1, wherein: the side wall of the plasma high-temperature reaction device (1) is provided with a heat insulation layer (12).
4. The exhaust gas plasma treatment absorption apparatus according to claim 1, wherein: the outlet of the dust cleaning cavity (23) is simultaneously connected with two nitrogen oxide adsorption devices (3 a, 3 b) through a three-way switching valve (5).
5. The exhaust gas plasma treatment absorption apparatus according to claim 4, wherein: the upper outlets of the two nitrogen oxide adsorption devices (3 a and 3 b) are converged at the same exhaust port, and a gas detection device (6) is arranged on the exhaust port.
6. The exhaust gas plasma treatment absorption apparatus according to claim 1 or 4, wherein: be equipped with filter screen (31) in nitrogen oxide adsorption equipment (3 a), filter screen (31) will nitrogen oxide adsorption equipment's (3 a) inner chamber is separated for cushion chamber (32) of lower part and the packing chamber on upper portion, be provided with in the packing chamber and adsorb filler (33).
CN202221460870.3U 2022-06-13 2022-06-13 Tail gas plasma treatment absorption equipment Active CN217119830U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202221460870.3U CN217119830U (en) 2022-06-13 2022-06-13 Tail gas plasma treatment absorption equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202221460870.3U CN217119830U (en) 2022-06-13 2022-06-13 Tail gas plasma treatment absorption equipment

Publications (1)

Publication Number Publication Date
CN217119830U true CN217119830U (en) 2022-08-05

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Application Number Title Priority Date Filing Date
CN202221460870.3U Active CN217119830U (en) 2022-06-13 2022-06-13 Tail gas plasma treatment absorption equipment

Country Status (1)

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CN (1) CN217119830U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115350560A (en) * 2022-08-29 2022-11-18 星烁(苏州)电子科技有限公司 Dry-type tail gas treatment device capable of automatically replacing adsorbent

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115350560A (en) * 2022-08-29 2022-11-18 星烁(苏州)电子科技有限公司 Dry-type tail gas treatment device capable of automatically replacing adsorbent
CN115350560B (en) * 2022-08-29 2023-10-31 星烁(苏州)电子科技有限公司 Dry tail gas treatment device capable of automatically replacing adsorbent

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