JP2009026977A5 - - Google Patents

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Publication number
JP2009026977A5
JP2009026977A5 JP2007189042A JP2007189042A JP2009026977A5 JP 2009026977 A5 JP2009026977 A5 JP 2009026977A5 JP 2007189042 A JP2007189042 A JP 2007189042A JP 2007189042 A JP2007189042 A JP 2007189042A JP 2009026977 A5 JP2009026977 A5 JP 2009026977A5
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JP
Japan
Prior art keywords
lens
object side
optical system
projection optical
radius
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007189042A
Other languages
English (en)
Japanese (ja)
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JP2009026977A (ja
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Publication date
Application filed filed Critical
Priority to JP2007189042A priority Critical patent/JP2009026977A/ja
Priority claimed from JP2007189042A external-priority patent/JP2009026977A/ja
Publication of JP2009026977A publication Critical patent/JP2009026977A/ja
Publication of JP2009026977A5 publication Critical patent/JP2009026977A5/ja
Pending legal-status Critical Current

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JP2007189042A 2007-07-20 2007-07-20 投影光学系及びそれを有する露光装置 Pending JP2009026977A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007189042A JP2009026977A (ja) 2007-07-20 2007-07-20 投影光学系及びそれを有する露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007189042A JP2009026977A (ja) 2007-07-20 2007-07-20 投影光学系及びそれを有する露光装置

Publications (2)

Publication Number Publication Date
JP2009026977A JP2009026977A (ja) 2009-02-05
JP2009026977A5 true JP2009026977A5 (cg-RX-API-DMAC10.html) 2010-09-02

Family

ID=40398508

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007189042A Pending JP2009026977A (ja) 2007-07-20 2007-07-20 投影光学系及びそれを有する露光装置

Country Status (1)

Country Link
JP (1) JP2009026977A (cg-RX-API-DMAC10.html)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4510494B2 (ja) * 2004-03-29 2010-07-21 キヤノン株式会社 露光装置
US7324185B2 (en) * 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101504765B1 (ko) * 2005-05-12 2015-03-30 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법

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