JP2009026977A5 - - Google Patents
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- JP2009026977A5 JP2009026977A5 JP2007189042A JP2007189042A JP2009026977A5 JP 2009026977 A5 JP2009026977 A5 JP 2009026977A5 JP 2007189042 A JP2007189042 A JP 2007189042A JP 2007189042 A JP2007189042 A JP 2007189042A JP 2009026977 A5 JP2009026977 A5 JP 2009026977A5
- Authority
- JP
- Japan
- Prior art keywords
- lens
- object side
- optical system
- projection optical
- radius
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 230000003287 optical Effects 0.000 claims 18
- 238000011084 recovery Methods 0.000 claims 5
- 239000007788 liquid Substances 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 1
Claims (12)
最も前記第二の物体側に配置されたレンズの前記第一の物体側の面が屈折力を有し、
前記レンズの前記第二の物体側の面における投影領域が当該投影光学系の光軸を含まず、
前記レンズの前記第二の物体側の面は前記光軸を含み、前記レンズの第一の物体側の面における有効領域よりも小さい事を特徴とする投影光学系。 A projection optical system that projects an image of a pattern of a first object onto a second object,
The first object side surface of the lens arranged closest to the second object side has a refractive power,
The projection area on the second object side surface of the lens does not include the optical axis of the projection optical system,
2. The projection optical system according to claim 1, wherein the second object side surface of the lens includes the optical axis and is smaller than an effective area on the first object side surface of the lens.
前記投影光学系が請求項１乃至６のいずれか１項に記載の投影光学系である事を特徴とする露光装置。 A projection optical system that projects an image of a pattern of a first object onto a second object, and a liquid between a lens disposed closest to the second object of the projection optical system and the second object An exposure apparatus for exposing the second object via
An exposure device which is a projection optical system according to any one of the projection optical system according to claim 1 to 6.
前記供給ノズルの供給口と前記光軸との距離は、前記レンズの前記第一の物体側の面の外径半径未満である事を特徴とする請求項７に記載の露光装置。 A supply nozzle for supplying the liquid between the lens and the second object;
8. The exposure apparatus according to claim 7, wherein a distance between the supply port of the supply nozzle and the optical axis is less than an outer radius of the surface of the lens on the first object side.
前記回収ノズルの回収口と前記光軸との距離は、前記レンズの前記第一の物体側の面の外径半径未満である事を特徴とする請求項７乃至９のいずれか１項に記載の露光装置。 A recovery nozzle for recovering the liquid between the lens and the second object;
The distance of the recovery port of the recovery nozzle and the optical axis, according to any one of claims 7 to 9, characterized in that is less than an outer diameter radius of the first object-side surface of the lens Exposure equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007189042A JP2009026977A (en) | 2007-07-20 | 2007-07-20 | Projection optical system, and exposure apparatus with the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007189042A JP2009026977A (en) | 2007-07-20 | 2007-07-20 | Projection optical system, and exposure apparatus with the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009026977A JP2009026977A (en) | 2009-02-05 |
| JP2009026977A5 true JP2009026977A5 (en) | 2010-09-02 |
Family
ID=40398508
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007189042A Pending JP2009026977A (en) | 2007-07-20 | 2007-07-20 | Projection optical system, and exposure apparatus with the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2009026977A (en) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4510494B2 (en) * | 2004-03-29 | 2010-07-21 | キヤノン株式会社 | Exposure equipment |
| US7324185B2 (en) * | 2005-03-04 | 2008-01-29 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| EP3232270A3 (en) * | 2005-05-12 | 2017-12-13 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
-
2007
- 2007-07-20 JP JP2007189042A patent/JP2009026977A/en active Pending
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