JP2009016678A5 - - Google Patents

Download PDF

Info

Publication number
JP2009016678A5
JP2009016678A5 JP2007178862A JP2007178862A JP2009016678A5 JP 2009016678 A5 JP2009016678 A5 JP 2009016678A5 JP 2007178862 A JP2007178862 A JP 2007178862A JP 2007178862 A JP2007178862 A JP 2007178862A JP 2009016678 A5 JP2009016678 A5 JP 2009016678A5
Authority
JP
Japan
Prior art keywords
movable
stage apparatus
levitation
linear motor
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007178862A
Other languages
Japanese (ja)
Other versions
JP2009016678A (en
JP4962779B2 (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2007178862A priority Critical patent/JP4962779B2/en
Priority claimed from JP2007178862A external-priority patent/JP4962779B2/en
Publication of JP2009016678A publication Critical patent/JP2009016678A/en
Publication of JP2009016678A5 publication Critical patent/JP2009016678A5/ja
Application granted granted Critical
Publication of JP4962779B2 publication Critical patent/JP4962779B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Claims (13)

少なくとも3個づつ可動台に対向するように配置された浮上用電磁石を具備した固定台と、前記浮上用電磁石により非接触磁気浮上方式により支持される可動台と、前記可動台に具備された浮上制御用のギャップセンサと、前記可動台の中央に配置された2次元リニアセンサと、前記可動台を駆動するリニアモータとを備え、前記可動台の重心位置近傍の位置を検出する光学式計測手段を備えたことを特徴とするステージ装置。 A fixed base provided with at least three levitation electromagnets arranged to face the movable base, a movable base supported by the non-contact magnetic levitation method with the levitation electromagnet, and a levitation provided in the movable base a gap sensor for control, and the two-dimensional linear sensor arranged in the center of the carriage, e Bei a linear motor for driving the carriage, optical measurement to detect the position near the center of gravity of the carriage A stage apparatus comprising means. 前記可動台のX軸方向の変位を計測するために、前記可動台のY軸方向の移動方向に平行な前記固定台および前記可動台の一面に開口部を備えたことを特徴とする請求項1記載のステージ装置。   The opening is provided on one surface of the fixed base and the movable base parallel to the moving direction of the movable base in the Y-axis direction in order to measure the displacement of the movable base in the X-axis direction. The stage apparatus according to 1. 前記可動台の前記開口部は、前記固定台の前記開口部よりも前記可動台のY軸方向の移動方向について大きく形成されたことを特徴とする請求項1または2に記載のステージ装置。 The opening of the movable block, the stage apparatus according to claim 1 or 2, characterized in that said than the opening of the fixing stand is larger for a moving direction of the movable table in the Y-axis direction. 前記可動台の前記開口部は、前記可動部の前記重心位置に対して対称構造に形成されたことを特徴とする請求項1乃至3のいずれか1つに記載のステージ装置。 The opening of the movable block, the stage apparatus according to any one of claims 1 to 3, characterized in that formed in the symmetrical structure with respect to the center of gravity of the movable portion. 前記可動台の前記重心位置近傍に、前記光学式計測手段の反射ミラーが備えられたことを特徴とする請求項1乃至4のいずれか1つに記載のステージ装置。 In the vicinity of the center of gravity of the movable table, the stage apparatus according to any one of claims 1 to 4, characterized in that the reflecting mirror of the optical measuring means is provided. 前記リニアモータは、Y軸方向に前記可動台を移動させるY軸リニアモータと、X軸方向に前記可動台を移動させるX軸リニアモータとを備え、前記Y軸リニアモータの電機子は、前記固定台の内側壁に取り付けられ、前記X軸リニアモータの電機子は、前記固定台の内上壁に取り付けられたことを特徴とする請求項1乃至5のいずれか1つに記載のステージ装置。 The linear motor includes a Y-axis linear motor that moves the movable base in the Y-axis direction, and an X-axis linear motor that moves the movable base in the X-axis direction. The armature of the Y-axis linear motor includes the armature 6. The stage apparatus according to claim 1 , wherein the stage device is attached to an inner wall of a fixed base, and an armature of the X-axis linear motor is attached to an inner upper wall of the fixed base. . 前記Y軸リニアモータは、前記電機子が前記固定台の内側壁に取り付けられ、前記電機子を上下方向から挟み込むように配置された永久磁石からなることを特徴とする請求項6記載のステージ装置。   7. The stage apparatus according to claim 6, wherein the Y-axis linear motor is composed of a permanent magnet having the armature attached to an inner wall of the fixed base and arranged to sandwich the armature from above and below. . 前記X軸リニアモータは、前記電機子が前記固定台の内上壁に取り付けられ、前記電機子に対向するように永久磁石が配置されたことを特徴とする請求項6記載のステージ装置。   The stage apparatus according to claim 6, wherein the X-axis linear motor has the armature attached to an inner upper wall of the fixed base, and a permanent magnet disposed so as to face the armature. 前記X軸リニアモータと、前記Y軸リニアモータに用いられる前記永久磁石はともに取り付け部材に取り付けられて、前記可動台に前記取り付け部材が締結されていることを特徴とする請求項6乃至8に記載のステージ装置。 Wherein the X-axis linear motor, said attached to both the attachment member is a permanent magnet used in the Y-axis linear motors, the claims 6 to 8 wherein the mounting member to the movable platform is characterized in that it is fastened The stage apparatus as described. 少なくとも3個づつ可動台に対向するように配置された浮上用電磁石を具備した固定台と、前記浮上用電磁石により非接触磁気浮上方式により支持される可動台と、前記可動台に具備された浮上制御用のギャップセンサと、前記可動台の中央に配置された2次元リニアセンサと、前記可動台を駆動するリニアモータとを備え、前記ギャップセンサが、低精度ギャップセンサとZ軸光学式計測手段からなり、前記可動台と前記固定台間のギャップを計測し、前記可動台の浮上時に前記低精度ギャップセンサの信号を用いて浮上制御し、浮上後に前記Z軸光学式計測手段の信号を用いて浮上制御するようにしたことを特徴とするステージ装置の制御方法。 A fixed base provided with at least three levitation electromagnets arranged to face the movable base, a movable base supported by the non-contact magnetic levitation method with the levitation electromagnet, and a levitation provided in the movable base a gap sensor for control, and the two-dimensional linear sensor arranged in the center of the carriage, e Bei a linear motor for driving the movable table, wherein the gap sensor, low precision gap sensor and Z-axis optical measurement And measuring the gap between the movable table and the fixed table, and controlling the levitation using the signal of the low-precision gap sensor when the movable table ascends. A method for controlling a stage apparatus, wherein the flying height control is performed using the stage apparatus. 前記固定台に備えた直動アクチュエータは、前記固定台に備えた回転検出ギャップセンサの検出信号に基づいて、回転補正し、回転補正後に前記可動台が浮上するようにしたことを特徴とする請求項10記載のステージ装置の制御方法。   The linear motion actuator provided in the fixed base is rotationally corrected based on a detection signal of a rotation detection gap sensor provided in the fixed base, and the movable base is floated after the rotational correction. Item 15. A method for controlling a stage apparatus according to Item 10. 少なくとも3個づつ可動台に対向するように配置された浮上用電磁石を具備した固定台と、前記浮上用電磁石により非接触磁気浮上方式により支持される可動台と、前記可動台に具備された浮上制御用のギャップセンサと、前記可動台の中央に配置された2次元リニアセンサと、前記可動台を駆動するリニアモータとを備え、前記可動台は、前記2次元リニアセンサの信号をもとに駆動され、前記可動台の位置決め時には、センサ信号がX軸用光学式計測手段およびY軸光学式計測手段の信号が用いられることを特徴とするステージ装置の制御方法。 A fixed base provided with at least three levitation electromagnets arranged to face the movable base, a movable base supported by the non-contact magnetic levitation method with the levitation electromagnet, and a levitation provided in the movable base based and gap sensors for control, and the two-dimensional linear sensor arranged in the center of the carriage, e Bei a linear motor for driving the movable table, the movable table is a signal of the two-dimensional linear sensor The stage apparatus control method is characterized in that the signals of the X-axis optical measuring means and the Y-axis optical measuring means are used as sensor signals when the movable table is positioned. 請求項1に記載の前記ステージ装置であって、前記ステージ装置によって被搬送物を位置決めすることを特徴とする露光装置。   The exposure apparatus according to claim 1, wherein an object to be conveyed is positioned by the stage apparatus.
JP2007178862A 2007-07-06 2007-07-06 STAGE DEVICE, FLOAT CONTROL METHOD, AND EXPOSURE DEVICE USING STAGE DEVICE Expired - Fee Related JP4962779B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007178862A JP4962779B2 (en) 2007-07-06 2007-07-06 STAGE DEVICE, FLOAT CONTROL METHOD, AND EXPOSURE DEVICE USING STAGE DEVICE

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007178862A JP4962779B2 (en) 2007-07-06 2007-07-06 STAGE DEVICE, FLOAT CONTROL METHOD, AND EXPOSURE DEVICE USING STAGE DEVICE

Publications (3)

Publication Number Publication Date
JP2009016678A JP2009016678A (en) 2009-01-22
JP2009016678A5 true JP2009016678A5 (en) 2011-06-16
JP4962779B2 JP4962779B2 (en) 2012-06-27

Family

ID=40357205

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007178862A Expired - Fee Related JP4962779B2 (en) 2007-07-06 2007-07-06 STAGE DEVICE, FLOAT CONTROL METHOD, AND EXPOSURE DEVICE USING STAGE DEVICE

Country Status (1)

Country Link
JP (1) JP4962779B2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011108170A1 (en) * 2010-03-04 2011-09-09 株式会社安川電機 Stage device
CN102307031A (en) * 2011-09-08 2012-01-04 中南大学 Magnetic suspension linear motion platform based on combination of permanent magnets and electromagnets
CN103199046B (en) * 2012-01-05 2015-09-09 沈阳新松机器人自动化股份有限公司 Wafer notch edge center prealignment method
CN103551860B (en) * 2013-11-04 2015-09-23 南通大学 A kind of magnetic suspension bearing structure of linear feed unit
CN108389821A (en) * 2018-05-04 2018-08-10 成都华聚科技有限公司 A kind of wafer individually picks and places and precise positioning mechanism with MASK

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3011813B2 (en) * 1992-02-24 2000-02-21 キヤノン株式会社 Moving stage
JP4078485B2 (en) * 2002-10-31 2008-04-23 株式会社ニコン Exposure apparatus, stage apparatus, and control method for stage apparatus
JP2004228473A (en) * 2003-01-27 2004-08-12 Canon Inc Movable stage device
JP4487168B2 (en) * 2003-05-09 2010-06-23 株式会社ニコン Stage apparatus, driving method thereof, and exposure apparatus
JP2005011914A (en) * 2003-06-18 2005-01-13 Canon Inc Reflector type mask and aligner
JP4393150B2 (en) * 2003-10-01 2010-01-06 キヤノン株式会社 Exposure equipment
JP2005150527A (en) * 2003-11-18 2005-06-09 Canon Inc Holding device, exposure device and manufacturing method using the same
JP2006253572A (en) * 2005-03-14 2006-09-21 Nikon Corp Stage apparatus, exposure apparatus, and device manufacturing method
JP4699071B2 (en) * 2005-04-01 2011-06-08 株式会社安川電機 Stage apparatus and exposure apparatus therefor
JP2007053244A (en) * 2005-08-18 2007-03-01 Yaskawa Electric Corp Stage equipment and its exposure device
JP4594841B2 (en) * 2005-10-12 2010-12-08 住友重機械工業株式会社 Stage device and control method thereof
JP5105197B2 (en) * 2006-09-29 2012-12-19 株式会社ニコン MOBILE BODY SYSTEM, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

Similar Documents

Publication Publication Date Title
US8915124B2 (en) Surface texture measuring apparatus
CN104105941B (en) Coordinate measuring machine with restrained counterweight
US9494413B2 (en) Probe holder for measuring system
JP2009016678A5 (en)
JPH0626808A (en) Sensor target
JP2009524237A5 (en)
US9479040B2 (en) High-resolution positioning device
JP6440740B2 (en) Device for holding, positioning and / or moving objects
KR100919391B1 (en) Stage apparatus
JP3940277B2 (en) Stage equipment
JP7016289B2 (en) Stage equipment, charged particle beam equipment and vacuum equipment
JP4962779B2 (en) STAGE DEVICE, FLOAT CONTROL METHOD, AND EXPOSURE DEVICE USING STAGE DEVICE
JP5337547B2 (en) Coating device
JP4699071B2 (en) Stage apparatus and exposure apparatus therefor
JP2009016680A5 (en)
JP2006287098A (en) Positioning device
JP2009016679A5 (en)
JP2007331086A (en) Stage device
JP3732763B2 (en) Stage equipment
CN211877061U (en) Detection device
JP2008090718A (en) Positioning device
JP5506207B2 (en) Stage apparatus, exposure apparatus, and device manufacturing method
JP2007114121A (en) Position detection device, interchangeable lens, and camera
JP6261185B2 (en) Lifting module and lifting device using the lifting module
JP5886084B2 (en) Stage equipment