JP2009014191A - Sealing structure - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a sealing method permitting the transmission of electron beams and holding a vacuum for one year without a pump. <P>SOLUTION: A helium leak-tight film is metal-sealed on a flange to form a helium leak-tight device. The metal-sealing is actualized in such a manner that (I) an air-tight side sealing block, (1I) a metal gasket softer than each of a sealing block materia and a sealed film, (2III) the sealed film, (3IV) a high-pressure side sealing block are (4) built up in sequence and sealed. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

Detailed Description of the Invention

The technical field related to the present invention relates to a technology for extracting electrons, ions, and neutral particles from a vacuum to the atmosphere in an irradiation apparatus for electrons, ions, neutrons, and neutral particles.
In particular, the present invention relates to a mechanism for irradiating electrons, ions, neutrons, and neutral particles through the seal film to the object to be irradiated in the atmosphere or under reduced pressure, and a protection mechanism for the seal film and the electron source.

There are roughly five technical fields related to the present invention.
[1] A technique for irradiating a wide area with an electron beam, particularly a technique for extracting electrons emitted from an electron gun placed in a vacuum and irradiating the sample part under atmospheric pressure or reduced pressure.

The technology that takes out an electron beam into the atmosphere and irradiates it over a wide area is used in a wide range of industries.
1. High intensity high energy electron beam [several hundred mA to several A × several hundred kV to several MV]
2. 2. Medium intensity medium energy electron beam [several mA to several tens of mA × 100 kV to several hundred kV] for food processing or polymerization and crosslinking of plastic materials; Low-intensity low-energy electron beams [several hundred μA to several mA × several tens of kV to hundred kV] are applied to sterilization and curing of printed ink.

[2] Technology to irradiate a small area with electrons, especially technology to extract an electron beam into the atmosphere and irradiate a narrow area

Electron microscopes, repair devices, and electron gun welding are typical in this field. In these technical fields, the technology for extracting electrons into the atmosphere through the membrane has not yet reached a practical level, but some attempts such as electron microscopes have begun. ing.

1. Electron microscopes that use electrons instead of light are widely used in the fields of physical science, biology, and agriculture as a technology for viewing minute samples that are less than the resolution of optical microscopes.
In particular, Nikon is now being sold as an “environmental microscope” in which a sample in a water vapor atmosphere of 4000 Pa is observed with an electron microscope using a differential exhaust instead of passing through a membrane.

        On the other hand, Japanese Patent Application No. 2007-129844 describes a technique for realizing a scanning electron microscope by extracting an electron beam through the film into the atmosphere and scanning the beam.

        2. In the semiconductor device and flat panel display industry, repair devices that repair wire breaks and short circuits, or burn out and separate from other circuits are put to practical use, and electron guns are used to repair faults. Yes.

        However, the above apparatus performs electron beam irradiation by placing a sample in a vacuum.

        3. In electron welding, an electron beam is concentrated on a sample in a vacuum to weld the sample.

[3] Technology to irradiate samples with ions and neutral particles, especially technology to extract ions and neutral particles into the atmosphere and irradiate them

Techniques in this field include, for example, surface modification, ion electron microscopes, ion exposure apparatuses, Rutherford backscattering apparatuses, and the like. A technique for extracting GeV-accelerated particles into the atmosphere is used for cancer treatment, but a technique for extracting ions and neutral particles into the atmosphere with low energy is not common.

[4] Technology for protecting the sealing film used in the above [1], [2], [3]

[5] Technology for protecting electrons, ions, and neutral particle sources that irradiate electrons, ions, and neutral particles

For example, in electron beam vapor deposition, an electron beam emitted from an electron gun is applied to a sample in a crucible, heated and evaporated to coat the surface of an object to be processed.

Problems to be solved by the invention

Since the problems to be solved by the present patent are related to a wide range of fields, the problems in all fields will not be described in detail, but only the essential part of the problems and some typical fields. Explain as much as possible.

Explaining the core of the technology, it is easy to implement the technology described in this patent in the field mentioned in this patent.

Problem 1 to be Solved by the Invention

        Curing equipment Literature and page

A method for sealing the sealing film of the electron beam extraction portion with a sealing block will be described in detail with reference to the drawings, a printed ink curing apparatus which is an example of the prior art.

FIG. 9 is a schematic view showing the structure of an apparatus used for curing a printed ink, which is an example of the prior art, and for polymerizing a plastic material.

101 is a vacuum vessel, 102 is an accelerating electrode constructed in multiple stages, 103 is an insulator, 104 is a linear electron source for electron emission, 105 is an extraction electrode, 106 is an electron beam extraction unit, 107 is a vacuum pump, 108 is A voltage of about 150 kV is supplied to ground with a high-voltage power supply.

An electron beam 109 emitted from the linear electron source 104 is extracted by the extraction electrode 105, accelerated by the acceleration electrode 102, and extracted through the electron beam extraction unit 106 to the atmosphere.

The extracted electrons 109 collide with the sample 110 having the ground potential, and the resin is polymerized to be cured and the ink of the printed matter is rapidly dried.

The collision energy is about 150 keV provided by the supply voltage from the high voltage power source 108 applied to the linear electron source 104.

The electron beam extraction unit 106 is mainly composed of a thin titanium foil of about 10 μm (referred to as a seal film in the present patent),
Despite the fact that the titanium foil itself is helium leak tight, conventionally, the titanium foil has been sealed with a rubber O-ring such as Viton that is not helium leak tight.

FIG. 10 shows the structure of a seal with an O-ring. 211 is a seal press (seal block) that presses and seals the seal film 215 and is formed integrally with the beam 212.

The seal retainer 211 is sealed by fastening with a fastener (not shown) such as bolts and nuts between two Viton O-rings 220 sandwiching the seal film 215 together with the seal base 210.

The core part of the above problem will be described with reference back to FIG.

The electron beam 109 is accelerated by the acceleration electrode 102 in a vacuum and reaches the electron beam extraction unit 106.

The atmosphere and vacuum are insulated by a titanium foil provided in the electron beam extraction unit 106.

The thickness of the titanium foil is selected to be the lowest allowable value from the electron beam energy, and the energy loss there is minimized.

The numerical values are 2 μm to 4 μm for 50 keV to 100 keV electron beams, 5 μm to 12 μm for 100 keV to 300 keV electron beams, and 20 μm or more for 300 keV to several MeV.

All these thin film vacuum seals use organic O-rings.

The O-ring has a larger amount of degassing in vacuum than the metal gasket, and has a large air permeability in the atmosphere.
It can also be decomposed or cured by radiation or heat.

For this reason, the vacuum vessel 101 containing the acceleration electrode 102 is always provided with a vacuum exhaust pump 107.

This pump is heavy and has a limited degree of freedom in installation posture, takes time to start, and is expensive.

For this reason, printed ink curing devices and other electron beam-related devices have not been made compact and portable and widely spread.

Thus, the problem to be solved is the realization of a technique that makes the seal completely helium leak tight and omits the exhaust pump.

Another subject of the present patent is the protection of the helium leaktight film described below.

Another problem to be solved by the invention

Vapor and bumping from the electron beam irradiation sample adheres to the thin film of the electron beam extraction part, and the thin film is destroyed.

Returning to FIG. 9 again, another problem will be described.

When electrons emitted from the acceleration electrode 102 pass through the sealing film of the electron extraction unit 106 and are irradiated onto the sample 110,
When the temperature of the sample rises suddenly and bumping occurs, and when the temperature of the sample becomes high, vapor always comes out of the sample.

For this reason, the vapor coming out of the sample and the solid or liquid coming out of bumping directly hit the thin titanium foil of the electron beam extraction unit 106,
Titanium foil is destroyed and the inside of the vacuum vessel 101 is returned to atmospheric pressure.

This is the second issue.

Another subject of this patent is the protection of beam generation mechanisms such as electron guns and ion guns.

Problem 3 to be Solved by the Invention

In the vapor deposition apparatus, it is necessary to place the sample in a vacuum, and it is not necessary to use a thin titanium foil for maintaining the vacuum, but there are the following problems.

Vapor from the evaporating substance in the crucible where the electron beam pours down, solids, liquids, vapor, etc. emitted by bumping reach the electron emission mechanism,
There is a problem that it adheres to the electron emission mechanism or causes an abnormal discharge to destroy the electron emission mechanism.

In order to prevent this, in the vapor deposition apparatus, the electron gun is turned 180 ° opposite to the sample or rotated 270 °.
Even so, there is a problem that the evaporating substance comes to the electron gun due to scattering or the like, thereby shortening the life of the electron gun.

Problem 4 to be Solved by the Invention

Seal with a thin membrane with acceptable leakage

Even in the case of a thin film having a leak, the amount of leak is remarkably reduced as compared with the case without a film, so that the load on the exhaust pump and the electron gun are remarkably reduced as compared with the case without a film.

When the film is not provided on the φ1 mm orifice, the gas enters the orifice at 300 m / sec. Therefore, the amount of leakage is 3 × 10 4 square cm × 60 min × 3.14 × 10 −2 or about 4 The amount of leakage is x10 4th of the sccm, and three to four stages of differential exhaust are required to protect the electron gun.

Examples of this include, for example, Patent Literature 1 and Patent Literature 2. Patent Literature 2 employs a four-stage orifice and differential exhaust, which is not realistic.

On the other hand, Patent Document 1 discloses a method of sealing using a collodion film that is not leak tight, and avoids this problem.

JP 2006-147430 A JP 2006-190578 A

As described above, a thin electron-permeable film that is not helium leak tight greatly reduces the burden on the exhaust pump. However, as described in Patent Document 1, the film is very thin, and a thin film is formed in a certain area. It is difficult to seal accurately with an O-ring.

This is because if the atmospheric pressure is applied to a thin film because the seal portion is small, the pressing pressure of the O-ring may lose the atmospheric pressure and leak from the end.

As described above, the method of Patent Document 1 has some problems and is not put into practical use.

Problem 5 to be Solved by the Invention

When irradiating a large area with an electron beam, a particular problem occurs.

That is, the area of the sealing film provided in the electron beam extraction portion needs to be large, but if the film is thin, the area that can withstand atmospheric pressure becomes narrow.

As a countermeasure, in a resin curing apparatus on the market, a seal film is supported by beams provided at intervals of 8 mm so that a thin film made of titanium is not broken.

However, it is difficult to increase the number of beams because electrons disappear in the beam,
Since the titanium film is supported by a small number, the thickness of the titanium film cannot be reduced.

The only electrons that can pass through the thick film are high-energy high-speed electrons, and there is no device that supplies a low-energy electron beam over a large area.

However, beryllium is much easier to pass electrons than titanium, and devices using beryllium as a sealing film have recently been put on the market.

Beryllium has a much lower probability of electron collisions than other materials, but beryllium oxide has the problem of affecting the lungs.

The present invention has been made to solve such problems,
Helium leak tight thin film sealing method, more widely thin film sealing method that can withstand vacuum, thin beam structure that can increase the area of the thin film, and thin from the projectiles irradiated with electrons and ions An object is to provide a mechanism for protecting a film, an electron gun, and an ion gun.

Means for solving the problem

The present invention has been made to overcome such problems.

The solution to Problem 1 and Problem 4 is solved by performing a metal seal,
The solution to Problem 2 and Problem 3 can be prevented by installing a thin film in front of the sample,
The solution to the problem 5 was solved by focusing on the fact that the beam supporting the sealing film can be prevented by the teacher's nourishment.

That is, the invention described in claim 1 has the following configuration.

Seal structure having a structure for achieving a helium leak tight hermetic seal by sandwiching a seal film between metal or ceramic sealing blocks

The invention described in claim 2 has the following configuration.

In a sealing structure that achieves a helium leak tight hermetic seal by sandwiching a sealing film between metal or ceramic sealing blocks,
The following order: I.D. A metal gasket that is softer than both the sealing block material and the sealing membrane,
II. Sealing membrane,
III. Seal structure having a structure in which the high pressure side sealing blocks are stacked and sealed in order.

The invention described in claim 3 has the following configuration.

In a sealing structure that achieves a helium leak tight hermetic seal by sandwiching a sealing film between metal or ceramic sealing blocks,
The following order: I.D. Sealing block on the airtight side II. A metal gasket that is softer than both the sealing block material and the sealing membrane,
III. Sealing membrane,
IV. I. Overlap the seals in the order of the high pressure side sealing blocks or I. Sealing block on the airtight side,
II. A metal gasket that is softer than both the sealing block material and the sealing membrane,
III. Sealing membrane,
IV. Block for high pressure side I. Sealing block on the airtight side,
II. Metal gasket, softer than sealing block material and sealing membrane,
III. Sealing membrane,
IV. A metal gasket that is softer than both the sealing block material and the sealing membrane,
V. Seal structure having a structure in which the high pressure side sealing blocks are stacked and sealed in order.

The invention described in claim 4 has the following configuration.

A seal film is brazed to leak tight, or diffusion bonded, or room temperature diffusion bonded, or metal bonded to a metal or ceramic sealing block, brazed to such leak tight, diffusion bonded, room temperature diffusion bonded, or metal bonded. Seal structure with a structure that uses sealed parts to seal

The invention according to claim 5 has the following configuration.

In a seal structure having a seal film that can withstand atmospheric pressure and a beam for preventing the swelling of the seal film,
The beam supporting the sealing film is in a lattice shape having an arbitrary crossing angle,
The cross-sectional area ratio of intersecting beams is 10 9 or less, 10 10 or more,
Desirably, a seal structure having a structure of 10 7 or less and 10 4 or more

The invention described in claim 6 has the following configuration.

A seal structure comprising a structure in which the beam supporting the seal film according to claim 5 is on the atmosphere side.

The invention described in claim 7 has the following configuration.

The seal structure according to claim 1, claim 2, claim 3, claim 4, claim 5, or claim 6, wherein the seal film is an electron beam or ion, Or a seal structure having a membrane that allows neutrons or neutral particles to pass through

The invention described in claim 8 has the following configuration.

A film is provided between the electron beam or ion or neutron or neutral particle generator and the non-irradiated material irradiated with the electron beam or ion or neutron or neutral particle. Electron beam, ion, neutron, or neutral particle generator

The invention described in claim 9 has the following configuration.

An electron gun, an electron microscope, an electron irradiation device, an ion gun, an ion microscope, an ion irradiation device, a repair device, a neutron gun, a neutral gun comprising at least one type of the seal structure according to any one of claims 1 to 8. Turn after the particle gun

The invention's effect

According to the invention of the present application, electrons are irradiated with low energy of about 100 keV while using only a getter agent and keeping the sample from low pressure to atmospheric pressure while keeping the electron source, ion source and neutral particle source at a high vacuum. This is preferable because the electron source can be kept in a vacuum without using a pump, and the lifetime of the electron source can be extended as well as downsizing of the apparatus.

In particular, X-rays are too low at low energy, which is preferable because the use of lead harmful to the human body necessary for X-ray countermeasures can be reduced.

Moreover, according to this invention, since a sealing film | membrane, an electron source, an ion source, and a neutral particle source can be protected from bumping accompanying the heating of a sample, it is preferable.

Effect of Invention 1

Action 1 of the invention relates to a sealing method of a sealing film.

To briefly summarize the outline of the problems already described, the sealing film is made of helium leak tight film such as titanium foil or glassy carbon, and when sealing this film, it is sealed with organic rubber such as Viton. Because of the small leak from the O-ring, it is necessary to operate the pump.

When titanium foil is attached to the electron beam take-out portion, this problem can be eliminated if it can be hermetically sealed using a metallic gasket instead of the organic O-ring.

This is because the transmittance of gas molecules or atoms in the atmosphere of the metal gasket is almost zero.

A metal gasket is used to seal to helium leak tight, and the accelerator vacuum system is degassed while being evacuated for a long time at a high temperature of 200 ° C. or higher.

When degassing is completed, the getter for evacuation installed in the same system is activated, and the vacuum line connecting the external evacuation system and the accelerator vacuum system is closed.

Since this sealed device is helium leak tight, high vacuum and ultra high vacuum can be maintained without a pump for one year if a non-deposition getter is provided.

This method is the same as the normal vacuum tube vacuum sealing method except that it is hermetically sealed using a titanium foil for extracting electron beams.

Moreover, the flange used for the airtight attachment of the titanium foil of the present invention has the same shape as the structure for achieving airtightness between the flanges by interposing a commercially available metal gasket, and the same gasket is used.

The present invention is characterized in that the titanium foil is placed between the flange on the atmosphere side and the metal gasket.

The metal gasket used at this time must be softer than the flange and titanium foil.

When such a soft metal gasket is used and the flange sandwiched between the titanium foils is tightened with bolts and nuts, the convex ends of both flanges bite into the metal gasket.

At this time, the metal gasket facing the microscopic fine shape of the convex end portion of the atmosphere side flange is imprinted through the titanium foil, and the helium leak tight seal is completed, and further advantages are born.

When tightening both flanges with bolts and nuts, the titanium foil wrinkles that existed before tightening are completely eliminated by light tightening.

This is because when the titanium foil window peripheral seal portion bites into the metal gasket, the entire foil is uniformly pulled from the peripheral portion.

Since wrinkles are eliminated, unevenness of the intensity of the electron beam passing through the titanium foil is eliminated, and at the same time, local heating of the titanium foil is eliminated, so that it is most convenient as an electron beam extraction foil.

Effect of Invention 2

Action 2 of the present invention relates to a method for protecting a sealing film and an electron source from bumping from a sample and vapor.

The problem of flying objects from the sample could not be completely avoided even if the electron source was directed to the sample by a magnetic field with the electron source directed in the opposite direction at 180 ° C. so that the electron source could not be directly seen from the sample.

In particular, when using a helium leak tight seal film that transmits an electron beam and the sample is irradiated with an electron beam in the atmosphere, the distance between the sample and the seal film is short and the seal film is very thin. Therefore, the sealing film is easily broken by flying objects from the sample.

A protective film may be placed between the sample and the seal film or the electron source, but the thick film does not transmit the electron beam, and the electron beam is blocked by the protective film.

This film does not need to be leak tight, and it is sufficient that it can prevent flying objects from the sample.

Even if the protective film is not thin, if the specific gravity per unit surface area is small, the electron beam passes through the protective film with almost no trapping by the protective film.

As such a film, for example, a carbon fiber of about 1 micron is scooped up like a Japanese paper, and a film of carbon nanotubes is also available as a thin film. The film is suitable for the purpose of use.

Effect 3 of the Invention

As shown in the graph of FIG. 7, the permeable membrane becomes thinner when the electron energy is lowered.

Graph 1 shows the relationship between the electron energy and the maximum transmission film thickness (the thickest film thickness through which electrons are transmitted even a little). 100 keV transmits only half the thickness compared to 150 keV.

Therefore, it is necessary to make the film thinner in order to reduce the voltage, but if the film is made thinner, the film cannot withstand atmospheric pressure.

In order to avoid this problem, it is convenient to take out the electron beam into the atmosphere by supporting the sealing film with a carbon tube or carbon nanotube having a stress resistance higher than that of iron and having a light specific gravity and allowing easy passage of electrons.

The operation of the invention is as described above, and will be described in detail based on the following examples.

Titanium foils of 8 microns thickness and 5 microns thickness were attached to a vacuum flange using a commercially available metal gasket, and a helium leak test was performed to confirm airtightness.

This will be described with reference to FIG. 1 as a preferred first embodiment of the present invention.

In FIG. 1, 1 is an ICF70 flange (SUS304) [atmosphere side sealing block], 2 is a titanium foil (8 microns) [sealing film], 3 is a copper gasket [soft sealant], and 4 is an ICF70 flange (SUS304). ) [Block for vacuum side sealing].

The amount of leakage at this time is 10 −11 power Pascal / second or less, and after sufficient exhaustion, if the leakage gas is adsorbed with a non-evaporable getter, the apparatus can be operated without a pump for one year.

An example in which titanium foil is metal-sealed to helium leak tight has not yet been reported except for the demonstration experiment of the present invention.

FIG. 2 shows a second embodiment, in which 51 is an atmosphere side sealing block [1/2 inch VCR (SWAGELOK SUS316)], 52 is a sealing film [titanium foil (5 microns)], 53 is a soft sealing material [ A copper gasket, a nickel gasket, an indium gasket, or a gasket made of a solder material], and 54 is a vacuum side sealing block [1/2 inch VCR (SWAGELOK SUS316)].

Sealing can also be performed at triangular corners, but the sealing surface can also be R as in this embodiment.

FIG. 3 shows a third embodiment, wherein 1 is an atmosphere side sealing block [ICF70 flange (SUS304)], 2 is a sealing film [titanium foil (8 microns)], 3a is an atmosphere side soft sealing material (copper gasket), 3b is a vacuum side soft sealing material [copper gasket], and 4 is a vacuum side sealing block.

It should be noted that the triangular protrusion of the sealing block is shifted between the atmosphere side and the vacuum side.

FIG. 4 shows a fourth embodiment. Reference numeral 10 denotes a large area vacuum side sealing block [SUS304] in which a large area sealing film 15 is metal-bonded to helium leak tight at a brazing portion 13.

Reference numeral 12 denotes a beam that supports the large-area seal film 15, which is integrally formed with the large-area vacuum-side sealing block [SUS304] 10, and the seal film 15 withstands atmospheric pressure together with a beam (made of carbon fiber) 14 that intersects the beam. Thus, the sealing film 14 is supported.

The details of the brazing part 13 are described as three parts as B part detail 1, B part detail 2, and B part detail 3, but are not limited thereto.

Part B detail 1 is the seal film 15 and carbon fiber brazed together on a large area vacuum side sealing block. In this case, 11 does not need to be a sealing block, but merely serves as a protective cover for the brazing portion 13, and may be omitted.

In part B detail 2, the sealing film 15 is brazed to the large area atmosphere-side sealing block 11 and the beam 14 made of carbon fiber material is fastened to the large area vacuum-side sealing block 10.

In this case, the large-area air-side sealing block 11 and the large-area vacuum-side sealing block 10 need to be metal-sealed with the soft sealing material 3 interposed therebetween.

Part B detail 3 is obtained by brazing a seal film 15 and a carbon tube beam 14 between a large area atmosphere side seal block 11 and a large area vacuum side seal block 10.

When performing brazing, diffusion bonding, room temperature diffusion bonding, adhesion with helium leak tight adhesive (for example, Kapton adhesive), the important point is to prevent the sealing film 15 from wrinkling. is there.

If the sealing film 15 is wrinkled before joining, the film is often torn during the joining operation. Even if the film is not torn, if atmospheric pressure is applied or an electron beam or the like is transmitted, heat or atmospheric pressure stress may occur. Torn.

In addition, if the seal film and the sealing block are not made of a material having a similar coefficient of thermal expansion, the seal film will be broken due to the temperature rise during transmission of the beam, so care must be taken.

FIG. 5 shows a fifth embodiment in which the carbon fiber beams 14 and 16 are arranged in a lattice shape. Since the carbon fiber beams 14 and 16 are formed in a lattice shape, the force for supporting the seal film 15 becomes larger.

FIG. 6 shows a film 50 made by scrubbing a carbon tube 51 so as to scrub the Japanese paper in the sixth embodiment.

If this film 50 is placed between the electron gun and the sample for vapor deposition so as to surround the electron gun, the electron gun will not break down due to scattered matter due to bumping of the sample.

The helium leak tight vacuum sealing technology that can extract electrons and ions from the vacuum to the atmosphere disclosed here can maintain the device in a high vacuum without a pump for one year using only the getter material, and the exhaust system can be omitted. It is expected to be used in a wide range of fields, such as a reduction in price, a reduction in running cost, a reduction in the installation area, and the ease of use of the device.

In addition, the other vacuum sealing film and the protective film for protecting the electron source disclosed here prevent the vacuum sealing from being broken or the electron gun from being destroyed, and make the electron and ion extraction technology practical. It is expected not only to increase the market value of the technology based on this patent, but also to contribute to improving the reliability of existing technologies such as vapor deposition.

It is sectional drawing of the electron permeable helium leak tight seal structure which concerns on Example 1 of this invention. It is sectional drawing of the electron permeable helium leak tight seal structure based on Example 2 of this invention. It is sectional drawing of the electron-permeable helium leak tight seal structure based on Example 3 of this invention. It is a figure which shows the structure of the beam which supports the seal structure and sealing film which are helium leak tight with the large area based on Example 4 of this invention. It is. It is a figure which shows the structure of the beam which supports the seal structure and sealing film which are helium leak tight with the large area based on Example 5 of this invention. It is a protective film which protects the sealing film and electron gun which concern on Example 6 of this invention. It is a graph which shows the relationship between the energy of the electron of an electron beam, and the thickness of the largest film | membrane which can permeate | transmit. It is a block diagram of the ink curing device for printing using this invention. It is a block diagram of the conventional ink curing device for printing. It is a figure which shows the sealing system of the conventional ink curing device for printing. DESCRIPTION OF SYMBOLS 1 Block for atmosphere side seal [ICF70 flange (SUS304)] 2 Seal film [Titanium foil (8 micron)] 3 Soft seal material [Copper gasket] 4 Block for vacuum side seal 10 Block for large area vacuum side seal 11 Large area air Block for side seal 12 Beam 13 Brazed portion of seal film 14 Crossing beam [carbon fiber] 15 Large area seal film 52 Titanium film 3a Air side soft seal material [copper gasket] 3b Vacuum side soft seal material [copper gasket] 51 Atmosphere side sealing block [1/2 inch VCR (SWAGELOK SUS316)] 52 Seal film [Titanium foil (5 microns)] 53 Soft sealing material [Copper gasket or Nickel gasket] 54 Vacuum side sealing block [1/2 inch V R (SWAGELOK SUS316)] 101 Vacuum vessel 102 Accelerating electrode 103 Insulator 104 Linear electron source 105 Extraction electrode 106 Electron beam extraction unit 107 Vacuum pump 108 High voltage power supply 109 Electron beam 110 Sample 111 Non-evaporable getter 210 Seal stand [Block for sealing 211 Seal holder [block for seal] 212 Beam 215 Seal film 220 O-ring made by Viton

Claims (9)

A sealing structure characterized by achieving a helium leak tight hermetic seal by sandwiching a sealing film between metal or ceramic sealing blocks In a sealing structure that achieves a helium leak tight hermetic seal by sandwiching a sealing film between metal or ceramic sealing blocks,
The following order: I.D. A metal gasket that is softer than both the sealing block material and the sealing membrane,
II. Sealing membrane,
III. Seal structure characterized by overlapping and sealing in order of high-pressure side sealing blocks In a sealing structure that achieves a helium leak tight hermetic seal by sandwiching a sealing film between metal or ceramic sealing blocks,
The following order: I.D. Sealing block on the airtight side II. A metal gasket that is softer than both the sealing block material and the sealing membrane,
III. Sealing membrane,
IV. I. Overlap the seals in the order of the high pressure side sealing blocks or I. Sealing block on the airtight side,
II. A metal gasket that is softer than both the sealing block material and the sealing membrane,
III. Sealing membrane,
IV. A metal gasket that is softer than both the sealing block material and the sealing membrane,
V. Seal structure characterized by overlapping and sealing in order of high-pressure side sealing blocks A seal film is brazed to leak tight, or diffusion bonded, or room temperature diffusion bonded, or metal bonded to a metal or ceramic sealing block, brazed to such leak tight, diffusion bonded, room temperature diffusion bonded, or metal bonded. Seal structure characterized by sealing with the use of new parts In a seal structure having a seal film that can withstand atmospheric pressure and a beam for preventing the swelling of the seal film,
The beam supporting the sealing film is in a lattice shape having an arbitrary crossing angle,
The cross-sectional area ratio of intersecting beams is 10 9 or less, 10 10 or more,
Desirably, the seal structure is 10 7 or less and 10 4 or more The seal structure according to claim 5, wherein the beam supporting the seal film is on the vacuum side. The seal structure according to claim 1, claim 2, claim 3, claim 4, claim 5, or claim 6, wherein the seal film is an electron beam or ion, Alternatively, a sealing structure characterized by being a film that allows neutrons or neutral particles to pass therethrough A film is provided between the electron beam, ion, neutron, or neutral particle generator and the non-irradiated material irradiated with the electron beam, ion, neutron, or neutral particle. Electron beam, ion, neutron, or neutral particle generator An electron gun, an electron microscope, an electron irradiation device, an ion gun, an ion microscope, an ion irradiation device, a repair device, comprising at least one kind of the seal structure according to any one of claims 1 to 8. Neutron gun, neutral particle gun

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