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- JP2008546690A5 JP2008546690A5 JP2008516890A JP2008516890A JP2008546690A5 JP 2008546690 A5 JP2008546690 A5 JP 2008546690A5 JP 2008516890 A JP2008516890 A JP 2008516890A JP 2008516890 A JP2008516890 A JP 2008516890A JP 2008546690 A5 JP2008546690 A5 JP 2008546690A5
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- 230000003647 oxidation Effects 0.000 claims description 60
- 238000007254 oxidation reaction Methods 0.000 claims description 60
- 150000001491 aromatic compounds Chemical class 0.000 claims description 41
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 claims description 31
- 239000012429 reaction media Substances 0.000 claims description 29
- 230000001590 oxidative Effects 0.000 claims description 26
- 239000007800 oxidant agent Substances 0.000 claims description 21
- KXKVLQRXCPHEJC-UHFFFAOYSA-N Methyl acetate Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 claims description 16
- CURLTUGMZLYLDI-UHFFFAOYSA-N carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 16
- 239000007787 solid Substances 0.000 claims description 16
- URLKBWYHVLBVBO-UHFFFAOYSA-N p-xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 claims description 14
- 239000002245 particle Substances 0.000 claims description 12
- 229910001882 dioxygen Inorganic materials 0.000 claims description 11
- 239000007791 liquid phase Substances 0.000 claims description 11
- MYMOFIZGZYHOMD-UHFFFAOYSA-N oxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 11
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 10
- 239000001569 carbon dioxide Substances 0.000 claims description 10
- UGFAIRIUMAVXCW-UHFFFAOYSA-N carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims description 10
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 9
- WPYMKLBDIGXBTP-UHFFFAOYSA-N Benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims description 8
- QQVIHTHCMHWDBS-UHFFFAOYSA-N Isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 claims description 8
- 239000002002 slurry Substances 0.000 claims description 8
- 229910002090 carbon oxide Inorganic materials 0.000 claims description 7
- 239000005711 Benzoic acid Substances 0.000 claims description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N Phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 claims description 4
- 235000010233 benzoic acid Nutrition 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims description 4
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 claims description 4
- 239000007789 gas Substances 0.000 claims description 3
- PNVDDTCIZTWBNJ-UHFFFAOYSA-N 1-oxofluorene-2,6-dicarboxylic acid Chemical compound C1=C(C(O)=O)C=C2C3=CC=C(C(=O)O)C(=O)C3=CC2=C1 PNVDDTCIZTWBNJ-UHFFFAOYSA-N 0.000 claims description 2
- DZFAKQZRZPHYLG-UHFFFAOYSA-N 4-(2-phenylethenyl)cyclohexa-2,4-diene-1,1-dicarboxylic acid Chemical compound C1=CC(C(=O)O)(C(O)=O)CC=C1C=CC1=CC=CC=C1 DZFAKQZRZPHYLG-UHFFFAOYSA-N 0.000 claims description 2
- 230000005540 biological transmission Effects 0.000 claims description 2
- 238000004090 dissolution Methods 0.000 claims description 2
- 238000007922 dissolution test Methods 0.000 claims description 2
- 239000012452 mother liquor Substances 0.000 claims description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 2
- 230000004083 survival Effects 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 description 15
- 150000001875 compounds Chemical class 0.000 description 6
- 230000037098 T max Effects 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- LPNBBFKOUUSUDB-UHFFFAOYSA-N P-Toluic acid Chemical compound CC1=CC=C(C(O)=O)C=C1 LPNBBFKOUUSUDB-UHFFFAOYSA-N 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 229910052803 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- PWHULOQIROXLJO-UHFFFAOYSA-N manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- ZWLPBLYKEWSWPD-UHFFFAOYSA-N O-Toluic acid Chemical compound CC1=CC=CC=C1C(O)=O ZWLPBLYKEWSWPD-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000005755 formation reaction Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000006011 modification reaction Methods 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N o-xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Description
ここで図6〜7を参照し、液相供給物流を反応ゾーン28内に導入するための代替のシステムを説明する。この態様において、供給物流は4つの異なる高さで反応ゾーン28内に導入する。各高さは、それぞれの供給物分配システム76a,b,c,dを備える。各供給物分配システム76は、主供給管路78および連結管(manifold)80を含む。各連結管80は、容器シェル22の反応ゾーン28内に延びる挿入管路86,88にそれぞれ連結した少なくとも2つの出口82,84を備える。各挿入管路86,88は、供給物流を反応ゾーン28内に放出するためのそれぞれの供給物開口87,89を与える。供給物開口87,89は、好ましくは、実質的に同様の直径約7センチメートル未満、より好ましくは約0.25から約5センチメートルの範囲、および最も好ましくは0.4から2センチメートルの範囲を有する。各供給物分配システム76a,b,c,dの供給物開口87,89は、反対の方向で供給物流を反応ゾーン28内に導入するように直径方向において反対側にあることが好ましい。さらに、隣接する供給物分配システム76の、直径方向において反対側の供給物開口87,89は、相対的に互いに90度回転させた方向であることが好ましい。操作においては、液相供給物流は、主供給物管路78に充填し、続いて連結管80に入る。連結管80は、供給物流を、反応器20の反対側で供給物開口87,89を経由して同時に導入するために均等に分配する。 With reference now to FIGS. 6-7, an alternative system for introducing a liquid phase feed stream into reaction zone 28 will be described. In this embodiment, the feed stream is introduced into the reaction zone 28 at four different heights. Each height includes a respective feed distribution system 76a, b, c, d. Each feed distribution system 76 includes a main supply line 78 and a manifold 80. Each connecting tube 80 includes at least two outlets 82, 84 connected to insertion conduits 86, 88 that extend into the reaction zone 28 of the vessel shell 22, respectively. Each insertion line 86, 88 provides a respective feed opening 87, 89 for discharging the feed stream into the reaction zone 28. Feed openings 87, 89 are preferably substantially less than about 7 centimeters in diameter, more preferably in the range of about 0.25 to about 5 centimeters, and most preferably in the range of 0.4 to 2 centimeters. Have a range. The feed openings 87, 89 of each feed distribution system 76a, b, c, d are preferably diametrically opposed so as to introduce the feed stream into the reaction zone 28 in the opposite direction. Furthermore, the feed openings 87 , 89 on the opposite diametrical side of adjacent feed distribution systems 76 are preferably in a direction that is rotated 90 degrees relative to each other. In operation, the liquid phase feed stream fills the main feed line 78 and then enters the connecting line 80. The connecting tube 80 distributes the feed stream evenly for simultaneous introduction on the opposite side of the reactor 20 via feed openings 87, 89.
本発明のある態様において、反応ゾーン内に導入される全易酸化性化合物の少なくとも約10質量パーセントを酸化剤スパージャー経由で導入することが好ましく、より好ましくは易酸化性化合物の少なくとも約40質量パーセントを反応ゾーン内に酸化剤スパージャー経由で導入し、そして最も好ましくは易酸化性化合物の少なくとも80質量パーセントを反応ゾーン内に酸化剤スパージャー経由で導入する。易酸化性化合物の全部または一部を反応ゾーン内に酸化剤スパージャー経由で導入する場合、反応ゾーン内に導入される全分子酸素の少なくとも約10質量パーセントを同じ酸化剤スパージャー経由で導入することが好ましく、より好ましくは、分子酸素の少なくとも約40質量パーセントを同じ酸化剤スパージャー経由で導入し、そして最も好ましくは分子酸素の少なくとも80質量パーセントを同じ酸化剤スパージャー経由で導入する。易酸化性化合物の相当多くの部分が反応ゾーン内に酸化剤スパージャー経由で導入される場合、1つ以上の温度感知装置(例えば熱電対)を酸化剤スパージャー内に配置することが好ましい。このような温度検知器を採用して、酸化剤スパージャー内の温度が危険な程に高くならないことを確認する助けとすることができる。 In certain embodiments of the present invention, it is preferred to introduce at least about 10 weight percent of all oxidizable compounds introduced into the reaction zone via an oxidant sparger, more preferably at least about 40 weight of oxidizable compounds. Percent is introduced into the reaction zone via an oxidant sparger, and most preferably at least 80 weight percent of the oxidizable compound is introduced into the reaction zone via an oxidant sparger. When all or part of the oxidizable compound is introduced into the reaction zone via an oxidant sparger, at least about 10 weight percent of all molecular oxygen introduced into the reaction zone is introduced via the same oxidant sparger. it is preferred, more preferably, at least about 40 weight percent of the molecular oxygen introduced via the same oxidant sparger, and most preferably introducing at least 80 weight percent of the molecular oxygen through the same oxidant sparger. Where a significant portion of the oxidizable compound is introduced into the reaction zone via the oxidant sparger, it is preferred to place one or more temperature sensing devices (eg, thermocouples) within the oxidant sparger. Such a temperature detector can be employed to help ensure that the temperature in the oxidant sparger does not become dangerously high.
典型的には、T−max水平方向スライスは、反応媒体36の中心近傍に位置することになり、一方T−min水平方向スライスは、反応媒体36の底部近傍に位置することになる。好ましくは、T−min水平方向スライスは、15の最も下の水平方向スライスのうち最下の10の水平方向スライスの1つである。最も好ましくは、T−min水平方向スライスは、15の最も下の水平方向スライスのうち最下の5の水平方向スライスの1つである。例えば、図28は、T−min水平方向スライスを、反応器20の底部から2番目の水平方向スライスとして示す。好ましくは、T−max水平方向スライスは、30の離散水平方向スライスのうち中央の20の水平方向スライスの1つである。最も好ましくは、T−max水平方向スライスは、30の離散水平方向スライスのうち中央の14の水平方向スライスの1つである。例えば、図28は、T−max水平方向スライスを、反応器20の底部から20番目の水平方向スライス(すなわち中央の10の水平方向スライスの1つ)として示す。T−min水平方向スライスとT−max水平方向スライスとの間の垂直方向の間隔は、少なくとも約2Wであることが好ましく、より好ましくは少なくとも約4W、および最も好ましくは少なくとも6Wである。T−min水平方向スライスとT−max水平方向スライスとの間の垂直方向の間隔は、少なくとも約0.2Hであることが好ましく、より好ましくは少なくとも約0.4H、および最も好ましくは少なくとも0.6Hである。 Typically, the T-max horizontal slice will be located near the center of the reaction medium 36, while the T-min horizontal slice will be located near the bottom of the reaction medium 36. Preferably, the T-min horizontal slice is one of the bottom 10 horizontal slices of the 15 bottom horizontal slices. Most preferably, the T-min horizontal slice is one of the bottom 5 horizontal slices of the 15 bottom horizontal slices. For example, FIG. 28 shows a T-min horizontal slice as the second horizontal slice from the bottom of the reactor 20. Preferably, the T-max horizontal slice is one of the central 20 horizontal slices of the 30 discrete horizontal slices. Most preferably, the T- max horizontal slice is one of the central 14 horizontal slices of the 30 discrete horizontal slices. For example, FIG. 28 shows a T-max horizontal slice as the 20th horizontal slice from the bottom of the reactor 20 (ie, one of the central 10 horizontal slices). The vertical spacing between the T-min horizontal slice and the T-max horizontal slice is preferably at least about 2W, more preferably at least about 4W, and most preferably at least 6W. The vertical spacing between the T-min horizontal slice and the T-max horizontal slice is preferably at least about 0.2H, more preferably at least about 0.4H, and most preferably at least about 0.1. 6H.
溶媒または易酸化性化合物のいずれの起源でも、商業的用途の変換では、全体的な反応活性のレベルを得るために採用される温度、金属、ハロゲン、pHで測定される反応媒体の酸性度、水濃度の具体的な組合せが幅広くばらつくことに関わらず、炭素酸化物の生成が全体的な反応活性のレベルに強く関係することを発明者らは見出した。発明者らは、キシレンの部分酸化について、反応媒体の中間高さ、反応媒体の底部、および反応媒体の頂部でのトルイル酸の液相濃度を用いて全体的な反応活性のレベルを評価することが有用であることを見出した。 For either commercial or oxidizable compound origin, in conversion for commercial use, the reaction medium acidity measured in temperature, metal, halogen , pH employed to obtain the overall level of reaction activity. The inventors have found that the formation of carbon oxides is strongly related to the overall level of reaction activity, regardless of the wide variation in specific combinations of water concentrations. We evaluate the overall level of reaction activity for partial oxidation of xylene using the intermediate height of the reaction medium, the bottom of the reaction medium, and the liquid phase concentration of toluic acid at the top of the reaction medium. Found useful.
本発明をその好ましい態様を特に参照して詳細に説明したが、本発明の精神および範囲に含まれる範囲で変更および改変を行うことが可能であることが理解されよう。
[1] (a)芳香族化合物を酸化反応器に供給すること、
(b)前記酸化反応器に含まれる多相反応媒体の液相における前記芳香族化合物の少なくとも一部の、二酸化炭素,一酸化炭素,および/または酢酸メチルを生成する酸化によって粗テレフタル酸を生成させること、ならびに
(c)前記酸化の間、以下の特定範囲の以下の操作比率:
(i)生成される炭素酸化物のモル数の、供給される前記芳香族化合物のモル数に対する比を、約0.02:1から約0.24:1の範囲に維持すること、
(ii)生成される前記二酸化炭素のモル数の、供給される前記芳香族化合物のモル数に対する比を、約0.01:1から約0.21:1の範囲に維持すること、
(iii)生成される前記一酸化炭素のモル数の、供給される前記芳香族化合物のモル数に対する比を、約0.005:1から約0.09:1の範囲に維持すること、
(iv)生成される前記酢酸メチルのモル数の、供給される前記芳香族化合物のモル数に対する比を、約0.005:1から約0.09:1の範囲に維持すること、
のうち1つ以上を維持することを含む方法。
[2] 生成される炭素酸化物のモル数の、供給される前記芳香族化合物のモル数に対する前記比を、約0.02:1から約0.24:1の範囲に維持する、上記[1]に記載の方法。
[3] 生成される前記二酸化炭素のモル数の、供給される前記芳香族化合物のモル数に対する前記比を、約0.01:1から約0.21:1の範囲に維持する、上記[1]に記載の方法。
[4] 生成される前記一酸化炭素のモル数の、供給される前記芳香族化合物のモル数に対する前記比を、約0.005:1から約0.09:1の範囲に維持する、上記[1]に記載の方法。
[5] 生成される前記酢酸メチルのモル数の、供給される前記芳香族化合物のモル数に対する前記比を、約0.005:1から約0.09:1の範囲に維持する、上記[1]に記載の方法。
[6] 生成される炭素酸化物のモル数の供給される前記芳香族化合物のモル数に対する前記比を約0.02:1から約0.24:1の範囲に維持し、生成される前記二酸化炭素のモル数の供給される前記芳香族化合物のモル数に対する前記比を約0.01:1から約0.21:1の範囲に維持し、生成される前記一酸化炭素のモル数の供給される前記芳香族化合物のモル数に対する前記比を約0.005:1から約0.09:1の範囲に維持し、生成される前記酢酸メチルのモル数の供給される前記芳香族化合物のモル数に対する前記比を約0.005:1から約0.09:1の範囲に維持する、上記[1]に記載の方法。
[7] 前記操作比率のうち少なくとも1つを少なくとも12時間維持する、上記[1]に記載の方法。
[8] 前記操作比率のうち少なくとも2つを少なくとも12時間維持する、上記[1]に記載の方法。
[9] 前記操作比率のうち少なくとも3つを少なくとも12時間維持する、上記[1]に記載の方法。
[10] 前記操作比率の全てを少なくとも12時間維持する、上記[1]に記載の方法。
[11] 生成される炭素酸化物のモル数の供給される前記芳香族化合物のモル数に対する前記比を約0.05:1から約0.19:1の範囲に維持し、生成される前記二酸化炭素のモル数の供給される前記芳香族化合物のモル数に対する前記比を約0.04:1から約0.16:1の範囲に維持し、生成される前記一酸化炭素のモル数の供給される前記芳香族化合物のモル数に対する前記比を約0.015:1から約0.05:1の範囲に維持し、生成される前記酢酸メチルのモル数の供給される前記芳香族化合物のモル数に対する前記比を約0.01:1から約0.07:1の範囲に維持する、上記[1]に記載の方法。
[12] 前記操作比率の全てを少なくとも36時間維持する、上記[1]に記載の方法。
[13] 前記芳香族化合物が、パラキシレン、メタキシレン、パラトルアルデヒド、メタトルアルデヒド、パラトルイル酸、メタトルイル酸、アセトアルデヒド、およびこれらの2種以上の組合せからなる群から選択される、上記[1]に記載の方法。
[14] 前記芳香族化合物がパラキシレンである、上記[1]に記載の方法。
[15] 前記酸化によって前記芳香族化合物の少なくとも約50モルパーセントをテレフタル酸に変換させる、上記[1]に記載の方法。
[16] 前記酸化によって前記芳香族化合物の少なくとも約10質量パーセントが前記反応媒体中で固体を形成する、上記[1]に記載の方法。
[17] 前記酸化が熱を発生させ、前記酸化によって発生した熱の約50パーセント未満を熱交換面により前記反応媒体から除去する、上記[1]に記載の方法。
[18] 酸化剤流を前記酸化反応器に供給することを含み、前記酸化剤流が約50モルパーセント未満の分子酸素を含む、上記[1]に記載の方法。
[19] 前記酸化反応器が気泡塔反応器である、上記[1]に記載の方法。
[20] 前記反応媒体が固相、液相および気相を含む、上記[1]に記載の方法。
[21] 前記芳香族化合物がパラキシレンであり、前記酸化によって前記パラキシレンの少なくとも約90モルパーセントをテレフタル酸に変換し、前記酸化によって前記パラキシレンの少なくとも約50質量パーセントが前記反応媒体中に固体テレフタル酸を形成し、前記酸化によって熱が発生し、前記酸化によって発生した熱の約30パーセント未満を熱交換面により前記反応媒体から除去し、前記方法が、酸化剤流を前記反応器に供給することを含み、前記酸化剤流が約15から約30モルパーセントの分子酸素を含む、上記[1]に記載の方法。
[22] 前記反応媒体の液相中のパラトルイル酸の濃度が約8,000ppmw未満である、上記[1]に記載の方法。
[23] スラリーを前記酸化反応器から取出すことをさらに含み、前記スラリーが液体母液および前記粗テレフタル酸の固体粒子を含み、前記スラリーの代表試料が、組合された固体および液体のスラリー成分に基づいて、以下の特徴:
(v)約1,500ppmw未満のイソフタル酸(IPA)を含む、
(vi)約500ppmw未満のフタル酸(PA)を含む、
(vii)約500ppmw未満のトリメリット酸(TMA)を含む、
(viii)約2,000ppmw未満の安息香酸(BA)を含む、
のうち1つ以上を有する、上記[1]に記載の方法。
[24] 前記酸化反応器からの乾燥オフガス中の前記二酸化炭素の量が約0.1から約1.5モルパーセントの範囲であり、前記酸化反応器からの乾燥オフガス中の前記一酸化炭素の量が約0.05から約0.6モルパーセントの範囲であり、前記酸化反応器からの乾燥オフガス中の前記分子酸素の量が約0.1から約6モルパーセントの範囲である、上記[1]に記載の方法。
[25] 前記反応媒体を経由した芳香族化合物のモル残存比率が、約98から約99.9パーセントの範囲である、上記[1]に記載の方法。
[26] 前記酸化を、コバルトを含む触媒系の存在下で行う、上記[1]に記載の方法。
[27] 前記触媒系が、臭素およびマンガンをさらに含む、上記[17]に記載の方法。
[28] 前記粗テレフタル酸の実質的部分が固体粒子として存在し、前記粗テレフタル酸粒子の代表試料が、以下の特徴:
(ix)約12ppmw未満の4,4−ジカルボキシスチルベン(4,4−DCS)を含む、
(x)約800ppmw未満のイソフタル酸(IPA)を含む、
(xi)約100ppmw未満の2,6−ジカルボキシフルオレノン(2,6−DCF)を含む、
(xii)340ナノメートルでの透過率パーセント(%T 340 )が約25を超える、
のうち1つ以上を有する、上記[1]に記載の方法。
[29] 前記粗テレフタル酸の実質的部分が固体粒子として存在し、前記粗テレフタル酸粒子の代表試料が、本明細書で定義する時限溶解試験を受けた際に、1分間でTHF中に少なくとも約500ppmの濃度に溶解する、上記[1]に記載の方法。
[30] 前記粗テレフタル酸の実質的部分が固体粒子として存在し、前記粗テレフタル酸の代表試料の、本明細書で定義する時限溶解モデルにより決定される時間定数“C”が約0.5逆数分を超える、上記[1]に記載の方法。
[31] 前記粗テレフタル酸の少なくとも一部を二次酸化反応器において酸化させることをさらに含む、上記[1]に記載の方法。
[32] (a)芳香族化合物を酸化反応器に供給すること、
(b)前記芳香族化合物の少なくとも一部を、前記酸化反応器に含まれる多相反応媒体の液相において酸化させることによって粗テレフタル酸を生成させること、ならびに
(c)前記酸化の間、前記芳香族化合物のモル残存比率を約98パーセント超に維持すること、
を含む方法。
[33] 前記モル残存比率を約98.5から約99.8パーセントの範囲に維持する、上記[32]に記載の方法。
[34] 前記モル残存比率を約99から約99.7パーセントの範囲に維持する、上記[32]に記載の方法。
[35] 前記芳香族化合物が、パラキシレン、メタキシレン、パラトルアルデヒド、メタトルアルデヒド、パラトルイル酸、メタトルイル酸、アセトアルデヒド、およびこれらの2種以上の組合せからなる群から選択される、上記[32]に記載の方法。
[36] 前記酸化によって前記芳香族化合物の少なくとも約50モルパーセントをテレフタル酸に変換させる、上記[32]に記載の方法。
[37] 前記酸化によって前記芳香族化合物の少なくとも約10質量パーセントが前記反応媒体中で固体を形成する、上記[32]に記載の方法。
[38] 前記酸化が熱を発生させ、前記酸化によって発生した熱の約50パーセント未満を熱交換面により前記反応媒体から除去する、上記[32]に記載の方法。
[39] 酸化剤流を前記酸化反応器に供給することを含み、前記酸化剤流が約50モルパーセント未満の分子酸素を含む、上記[32]に記載の方法。
[40] 前記モル残存比率を少なくとも12時間維持する、上記[32]に記載の方法。
[41] 前記酸化反応器が気泡塔反応器である、上記[32]に記載の方法。
[42] 前記反応媒体が固相、液相および気相を含む、上記[32]に記載の方法。
[43] 前記芳香族化合物がパラキシレンであり、前記酸化によって前記パラキシレンの少なくとも約90モルパーセントをテレフタル酸に変換させ、前記酸化によって前記パラキシレンの少なくとも約50質量パーセントが前記反応媒体中に固体テレフタル酸を形成し、前記酸化によって熱が発生し、前記酸化によって発生した熱の約30パーセント未満を熱交換面により前記反応媒体から除去し、前記方法が、酸化剤流を前記反応器に供給することを含み、前記酸化剤流が約15から約30モルパーセントの分子酸素を含み、前記モル残存比率を少なくとも36時間維持する、上記[32]に記載の方法。
[44] 前記反応媒体の液相中のパラトルイル酸の濃度が約8,000ppmw未満である、上記[32]に記載の方法。
[45] 前記酸化を、コバルト、臭素およびマンガンを含む触媒系の存在下で行う、上記[32]に記載の方法。
[46] 前記粗テレフタル酸の少なくとも一部を二次酸化反応器において酸化させることをさらに含む、上記[32]に記載の方法。
The invention has been described in detail with particular reference to preferred embodiments thereof, but it will be understood that variations and modifications can be effected within the spirit and scope of the invention.
[1] (a) supplying an aromatic compound to the oxidation reactor;
(B) Producing crude terephthalic acid by oxidation of producing at least part of the aromatic compound in the liquid phase of the multiphase reaction medium contained in the oxidation reactor to produce carbon dioxide, carbon monoxide, and / or methyl acetate. As well as
(C) During the oxidation, the following operating ratios in the following specific ranges:
(I) maintaining the ratio of the number of moles of carbon oxide produced to the number of moles of said aromatic compound supplied in the range of about 0.02: 1 to about 0.24: 1;
(Ii) maintaining the ratio of the number of moles of carbon dioxide produced to the number of moles of aromatic compound supplied in the range of about 0.01: 1 to about 0.21: 1;
(Iii) maintaining a ratio of moles of the carbon monoxide produced to moles of the aromatic compound fed in the range of about 0.005: 1 to about 0.09: 1;
(Iv) maintaining the ratio of the number of moles of the methyl acetate produced to the number of moles of the aromatic compound fed in the range of about 0.005: 1 to about 0.09: 1;
Maintaining one or more of the methods.
[2] maintaining the ratio of the number of moles of carbon oxide produced to the number of moles of the aromatic compound fed in the range of about 0.02: 1 to about 0.24: 1 1].
[3] maintaining the ratio of the number of moles of carbon dioxide produced to the number of moles of aromatic compound supplied in the range of about 0.01: 1 to about 0.21: 1. 1].
[4] maintaining the ratio of moles of the carbon monoxide produced to moles of the aromatic compound supplied in the range of about 0.005: 1 to about 0.09: 1. The method according to [1].
[5] maintaining the ratio of the number of moles of the methyl acetate produced to the number of moles of the aromatic compound fed in the range of about 0.005: 1 to about 0.09: 1. 1].
[6] Maintaining the ratio of the number of moles of carbon oxide produced to the number of moles of the aromatic compound supplied in the range of about 0.02: 1 to about 0.24: 1 Maintaining the ratio of moles of carbon dioxide to moles of the aromatic compound supplied in the range of about 0.01: 1 to about 0.21: 1 and the number of moles of carbon monoxide produced. Maintaining the ratio to moles of the aromatics fed in the range of about 0.005: 1 to about 0.09: 1, and feeding the aromatics of moles of methyl acetate produced The method of [1] above, wherein the ratio to the number of moles is maintained in the range of about 0.005: 1 to about 0.09: 1.
[7] The method according to [1] above, wherein at least one of the operation ratios is maintained for at least 12 hours.
[8] The method according to [1] above, wherein at least two of the operation ratios are maintained for at least 12 hours.
[9] The method according to [1] above, wherein at least three of the operation ratios are maintained for at least 12 hours.
[10] The method according to [1] above, wherein all the operation ratios are maintained for at least 12 hours.
[11] Maintaining the ratio of the number of moles of carbon oxide produced to the number of moles of the aromatic compound supplied in the range of about 0.05: 1 to about 0.19: 1 Maintaining the ratio of moles of carbon dioxide to moles of the aromatic compound supplied in the range of about 0.04: 1 to about 0.16: 1; Maintaining said ratio to moles of said aromatics fed in a range of about 0.015: 1 to about 0.05: 1, and feeding said aromatics of moles of said methyl acetate produced The method of [1] above, wherein the ratio to the number of moles is maintained in the range of about 0.01: 1 to about 0.07: 1.
[12] The method according to [1] above, wherein all the operation ratios are maintained for at least 36 hours.
[13] Said [1 ] Method.
[14] The method according to [1] above, wherein the aromatic compound is para-xylene.
[15] The method according to [1], wherein the oxidation converts at least about 50 mole percent of the aromatic compound to terephthalic acid.
[16] The method of [1] above, wherein the oxidation causes at least about 10 weight percent of the aromatic compound to form a solid in the reaction medium.
[17] The method of [1] above, wherein the oxidation generates heat and less than about 50 percent of the heat generated by the oxidation is removed from the reaction medium by a heat exchange surface.
[18] The method of [1] above, comprising supplying an oxidant stream to the oxidation reactor, wherein the oxidant stream comprises less than about 50 mole percent molecular oxygen.
[19] The method according to [1] above, wherein the oxidation reactor is a bubble column reactor.
[20] The method according to [1] above, wherein the reaction medium includes a solid phase, a liquid phase, and a gas phase.
[21] The aromatic compound is para-xylene, the oxidation converts at least about 90 mole percent of the para-xylene to terephthalic acid, and the oxidation results in at least about 50 weight percent of the para-xylene being in the reaction medium. Forming solid terephthalic acid, heat is generated by the oxidation, and less than about 30 percent of the heat generated by the oxidation is removed from the reaction medium by a heat exchange surface, and the method includes transferring an oxidant stream to the reactor. The method of [1] above, wherein the oxidant stream comprises about 15 to about 30 mole percent molecular oxygen.
[22] The method according to [1] above, wherein the concentration of p-toluic acid in the liquid phase of the reaction medium is less than about 8,000 ppmw.
[23] further comprising removing slurry from the oxidation reactor, wherein the slurry comprises a liquid mother liquor and solid particles of the crude terephthalic acid, and the representative sample of the slurry is based on a combined solid and liquid slurry component The following features:
(V) containing less than about 1,500 ppmw isophthalic acid (IPA);
(Vi) containing less than about 500 ppmw phthalic acid (PA),
(Vii) containing less than about 500 ppmw trimellitic acid (TMA),
(Viii) comprises less than about 2,000 ppmw benzoic acid (BA),
The method according to [1] above, comprising one or more of the following.
[24] The amount of carbon dioxide in the dry offgas from the oxidation reactor ranges from about 0.1 to about 1.5 mole percent, and the amount of carbon monoxide in the dry offgas from the oxidation reactor. The amount ranges from about 0.05 to about 0.6 mole percent and the amount of molecular oxygen in the dry offgas from the oxidation reactor ranges from about 0.1 to about 6 mole percent. 1].
[25] The method according to [1] above, wherein the molar residual ratio of the aromatic compound via the reaction medium is in the range of about 98 to about 99.9 percent.
[26] The method according to [1] above, wherein the oxidation is performed in the presence of a catalyst system containing cobalt.
[27] The method according to [17] above, wherein the catalyst system further comprises bromine and manganese.
[28] A substantial portion of the crude terephthalic acid is present as solid particles, and a representative sample of the crude terephthalic acid particles has the following characteristics:
(Ix) comprising less than about 12 ppmw of 4,4-dicarboxystilbene (4,4-DCS);
(X) containing less than about 800 ppmw isophthalic acid (IPA);
(Xi) less than about 100 ppmw 2,6-dicarboxyfluorenone (2,6-DCF),
(Xii) the percent transmission at 340 nanometers (% T 340 ) is greater than about 25;
The method according to [1] above, comprising one or more of the following.
[29] A substantial portion of the crude terephthalic acid is present as solid particles and a representative sample of the crude terephthalic acid particles is at least in THF for 1 minute when subjected to a timed dissolution test as defined herein. The method according to [1] above, wherein the method is dissolved at a concentration of about 500 ppm.
[30] A substantial portion of the crude terephthalic acid is present as solid particles and a representative sample of the crude terephthalic acid has a time constant “C” determined by a timed dissolution model as defined herein of about 0.5. The method according to [1] above, which exceeds the reciprocal minutes.
[31] The method according to [1], further comprising oxidizing at least a part of the crude terephthalic acid in a secondary oxidation reactor.
[32] (a) supplying an aromatic compound to the oxidation reactor;
(B) generating crude terephthalic acid by oxidizing at least a portion of the aromatic compound in the liquid phase of the multiphase reaction medium contained in the oxidation reactor; and
(C) maintaining a molar residual ratio of the aromatic compound greater than about 98 percent during the oxidation;
Including methods.
[33] The method of [32] above, wherein the molar residual ratio is maintained in the range of about 98.5 to about 99.8 percent.
[34] The method of [32] above, wherein the molar residual ratio is maintained in the range of about 99 to about 99.7 percent.
[35] Said [32 ] Method.
[36] The method of [32] above, wherein the oxidation converts at least about 50 mole percent of the aromatic compound to terephthalic acid.
[37] The method of [32] above, wherein the oxidation causes at least about 10 weight percent of the aromatic compound to form a solid in the reaction medium.
[38] The method of [32] above, wherein the oxidation generates heat and less than about 50 percent of the heat generated by the oxidation is removed from the reaction medium by a heat exchange surface.
[39] The method of [32] above, comprising feeding an oxidant stream to the oxidation reactor, wherein the oxidant stream comprises less than about 50 mole percent molecular oxygen.
[40] The method according to [32], wherein the molar residual ratio is maintained for at least 12 hours.
[41] The method according to [32] above, wherein the oxidation reactor is a bubble column reactor.
[42] The method according to [32] above, wherein the reaction medium comprises a solid phase, a liquid phase, and a gas phase.
[43] The aromatic compound is para-xylene, the oxidation converts at least about 90 mole percent of the para-xylene to terephthalic acid, and the oxidation results in at least about 50 weight percent of the para-xylene being in the reaction medium. Forming solid terephthalic acid, heat is generated by the oxidation, and less than about 30 percent of the heat generated by the oxidation is removed from the reaction medium by a heat exchange surface, and the method includes transferring an oxidant stream to the reactor. The method of [32] above, wherein the oxidant stream comprises about 15 to about 30 mole percent molecular oxygen and the molar residual ratio is maintained for at least 36 hours.
[44] The method according to [32] above, wherein the concentration of p-toluic acid in the liquid phase of the reaction medium is less than about 8,000 ppmw.
[45] The method according to [32] above, wherein the oxidation is carried out in the presence of a catalyst system containing cobalt, bromine and manganese.
[46] The method according to [32], further comprising oxidizing at least a part of the crude terephthalic acid in a secondary oxidation reactor.
Claims (19)
(b)前記酸化反応器に含まれる多相反応媒体の液相における前記芳香族化合物の少なくとも一部の、二酸化炭素,一酸化炭素,および/または酢酸メチルを生成する酸化によって粗テレフタル酸を生成させること、ならびに
(c)前記酸化の間、以下の特定範囲の以下の操作比率:
(i)生成される炭素酸化物のモル数の、供給される前記芳香族化合物のモル数に対する比を、0.02:1から0.24:1の範囲に維持すること、
(ii)生成される前記二酸化炭素のモル数の、供給される前記芳香族化合物のモル数に対する比を、0.01:1から0.21:1の範囲に維持すること、
(iii)生成される前記一酸化炭素のモル数の、供給される前記芳香族化合物のモル数に対する比を、0.005:1から0.09:1の範囲に維持すること、
(iv)生成される前記酢酸メチルのモル数の、供給される前記芳香族化合物のモル数に対する比を、0.005:1から0.09:1の範囲に維持すること、
のうち1つ以上を維持することを含む方法。 (A) supplying an aromatic compound to the oxidation reactor;
(B) Producing crude terephthalic acid by oxidation of producing at least part of the aromatic compound in the liquid phase of the multiphase reaction medium contained in the oxidation reactor to produce carbon dioxide, carbon monoxide, and / or methyl acetate. And (c) during the oxidation, the following operating ratios of the following specific ranges:
(I) The ratio of the number of moles of carbon oxide produced to the number of moles of the aromatic compound supplied is set to 0 . 02: 1 or, et al. 0. Maintaining in the 24: 1 range,
(Ii) the number of moles of the carbon dioxide produced, the ratio moles of said aromatic compound fed, 0. 01: 1 or, et al. 0. Maintaining in the 21: 1 range,
(Iii) The ratio of the number of moles of the carbon monoxide produced to the number of moles of the aromatic compound supplied is 0 . 005: 1 or et al. 0. Maintaining a range of 09: 1,
(Iv) The ratio of the number of moles of the methyl acetate produced to the number of moles of the aromatic compound supplied is 0 . 005: 1 or et al. 0. Maintaining a range of 09: 1,
Maintaining one or more of the methods.
(v)1,500ppmw未満のイソフタル酸(IPA)を含む、
(vi)500ppmw未満のフタル酸(PA)を含む、
(vii)500ppmw未満のトリメリット酸(TMA)を含む、
(viii)2,000ppmw未満の安息香酸(BA)を含む、
のうち1つ以上を有する、請求項1に記載の方法。 Removing a slurry from the oxidation reactor, the slurry comprising a liquid mother liquor and solid particles of the crude terephthalic acid, a representative sample of the slurry based on the combined solid and liquid slurry components: Features:
(V ) comprises less than 1,500 ppmw isophthalic acid (IPA),
(Vi ) containing less than 500 ppmw phthalic acid (PA),
(Vii ) containing less than 500 ppmw trimellitic acid (TMA),
(Viii ) containing less than 2,000 ppmw benzoic acid (BA),
The method of claim 1, comprising one or more of:
(ix)12ppmw未満の4,4−ジカルボキシスチルベン(4,4−DCS)を含む、
(x)800ppmw未満のイソフタル酸(IPA)を含む、
(xi)100ppmw未満の2,6−ジカルボキシフルオレノン(2,6−DCF)を含む、
(xii)340ナノメートルでの透過率パーセント(%T340)が25を超える、
のうち1つ以上を有する、請求項1に記載の方法。 A substantial portion of the crude terephthalic acid is present as solid particles, and a representative sample of the crude terephthalic acid particles has the following characteristics:
(Ix ) comprising less than 12 ppmw of 4,4-dicarboxystilbene (4,4-DCS),
(X ) containing less than 800 ppmw of isophthalic acid (IPA),
(Xi ) comprises less than 100 ppmw of 2,6-dicarboxyfluorenone (2,6-DCF),
(Xii) 340 percent transmission at the nanometer (% T 340) is more than 2 5,
The method of claim 1, comprising one or more of:
(b)前記芳香族化合物の少なくとも一部を、前記酸化反応器に含まれる多相反応媒体の液相において酸化させることによって粗テレフタル酸を生成させること、ならびに
(c)前記酸化の間、前記芳香族化合物のモル残存比率を98パーセント超に維持すること、
を含む方法。 (A) supplying an aromatic compound to the oxidation reactor;
(B) generating crude terephthalic acid by oxidizing at least a portion of the aromatic compound in the liquid phase of the multiphase reaction medium contained in the oxidation reactor; and (c) during the oxidation, Maintaining the molar residual ratio of aromatics above 98 percent;
Including methods.
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- 2006-05-24 MX MX2007015665A patent/MX2007015665A/en active IP Right Grant
- 2006-05-24 JP JP2008516890A patent/JP2008546690A/en active Pending
- 2006-05-24 EP EP06771091.3A patent/EP1890991B1/en active Active
- 2006-05-24 ES ES06771091.3T patent/ES2560243T3/en active Active
- 2006-05-24 BR BRPI0612252A patent/BRPI0612252B1/en active IP Right Grant
- 2006-05-24 PL PL06771091T patent/PL1890991T3/en unknown
- 2006-05-24 CA CA002611662A patent/CA2611662A1/en not_active Abandoned
- 2006-05-24 CN CN200680021361.8A patent/CN101198578B/en active Active
- 2006-05-24 WO PCT/US2006/020120 patent/WO2006138029A1/en active Application Filing
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