JP2008522813A - 二酸化炭素雪装置 - Google Patents

二酸化炭素雪装置 Download PDF

Info

Publication number
JP2008522813A
JP2008522813A JP2007545702A JP2007545702A JP2008522813A JP 2008522813 A JP2008522813 A JP 2008522813A JP 2007545702 A JP2007545702 A JP 2007545702A JP 2007545702 A JP2007545702 A JP 2007545702A JP 2008522813 A JP2008522813 A JP 2008522813A
Authority
JP
Japan
Prior art keywords
carbon dioxide
snow
capillary
segment
generation system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
JP2007545702A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008522813A5 (enExample
Inventor
デイビッド ピー. ジャクソン,
Original Assignee
クール クリーン テクノロジーズ, インコーポレイテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by クール クリーン テクノロジーズ, インコーポレイテッド filed Critical クール クリーン テクノロジーズ, インコーポレイテッド
Priority claimed from PCT/US2005/044863 external-priority patent/WO2006065725A1/en
Publication of JP2008522813A publication Critical patent/JP2008522813A/ja
Publication of JP2008522813A5 publication Critical patent/JP2008522813A5/ja
Ceased legal-status Critical Current

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C1/00Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
    • B24C1/003Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods using material which dissolves or changes phase after the treatment, e.g. ice, CO2

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Cleaning In General (AREA)
  • Carbon And Carbon Compounds (AREA)
JP2007545702A 2004-12-13 2005-12-13 二酸化炭素雪装置 Ceased JP2008522813A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US63523004P 2004-12-13 2004-12-13
PCT/US2005/044863 WO2006065725A1 (en) 2004-12-13 2005-12-13 Carbon dioxide snow apparatus

Publications (2)

Publication Number Publication Date
JP2008522813A true JP2008522813A (ja) 2008-07-03
JP2008522813A5 JP2008522813A5 (enExample) 2009-02-05

Family

ID=38292756

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007545702A Ceased JP2008522813A (ja) 2004-12-13 2005-12-13 二酸化炭素雪装置

Country Status (3)

Country Link
EP (1) EP1824614A4 (enExample)
JP (1) JP2008522813A (enExample)
MX (1) MX2007007079A (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013078735A (ja) * 2011-10-05 2013-05-02 Air Water Inc ドライアイススノー噴射装置およびドライアイススノーの噴射方法
JP2015050402A (ja) * 2013-09-04 2015-03-16 株式会社ディスコ 洗浄手段を備えた切削装置
JP2015518415A (ja) * 2012-03-30 2015-07-02 デュール システムズ ゲゼルシャフト ミット ベシュレンクテル ハフツング 塗装設備用ドライアイス洗浄手段
JP2016511135A (ja) * 2012-12-18 2016-04-14 ポステック アカデミー‐インダストリー ファウンデーション 超高速均一ナノ粒子生成ノズル、生成装置および生成方法
JP2016533517A (ja) * 2013-09-27 2016-10-27 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学装置、特にプラズマ光源またはeuvリソグラフィ装置
JP7447345B1 (ja) 2023-07-28 2024-03-11 リックス株式会社 ドライアイス噴射装置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019125443A1 (en) 2017-12-20 2019-06-27 Halliburton Energy Services, Inc. Capture and recycling methods for non-aqueous cleaning materials
DE102019108289A1 (de) * 2019-03-29 2020-10-01 acp systems AG Vorrichtung zum Erzeugen eines CO2-Schnee-Strahls

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1993696A (en) * 1932-05-09 1935-03-05 C O Two Fire Equipment Co Fire extinguishing apparatus
JPH1172278A (ja) * 1997-07-14 1999-03-16 Praxair Technol Inc 液体二酸化炭素から微粉雪粒子を生成する装置
JP2000035269A (ja) * 1989-03-01 2000-02-02 Polar Technol Internatl Pty Ltd 雪の形成方法及び装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2978187A (en) * 1959-01-23 1961-04-04 Chemetron Corp Carbon dioxide fire extinguishing nozzle
US5456629A (en) * 1994-01-07 1995-10-10 Lockheed Idaho Technologies Company Method and apparatus for cutting and abrading with sublimable particles

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1993696A (en) * 1932-05-09 1935-03-05 C O Two Fire Equipment Co Fire extinguishing apparatus
JP2000035269A (ja) * 1989-03-01 2000-02-02 Polar Technol Internatl Pty Ltd 雪の形成方法及び装置
JPH1172278A (ja) * 1997-07-14 1999-03-16 Praxair Technol Inc 液体二酸化炭素から微粉雪粒子を生成する装置

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013078735A (ja) * 2011-10-05 2013-05-02 Air Water Inc ドライアイススノー噴射装置およびドライアイススノーの噴射方法
JP2015518415A (ja) * 2012-03-30 2015-07-02 デュール システムズ ゲゼルシャフト ミット ベシュレンクテル ハフツング 塗装設備用ドライアイス洗浄手段
US10279453B2 (en) 2012-03-30 2019-05-07 Durr Systems Gmbh Dry-ice cleaning in a painting installation
JP2016511135A (ja) * 2012-12-18 2016-04-14 ポステック アカデミー‐インダストリー ファウンデーション 超高速均一ナノ粒子生成ノズル、生成装置および生成方法
JP2015050402A (ja) * 2013-09-04 2015-03-16 株式会社ディスコ 洗浄手段を備えた切削装置
JP2016533517A (ja) * 2013-09-27 2016-10-27 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学装置、特にプラズマ光源またはeuvリソグラフィ装置
JP7447345B1 (ja) 2023-07-28 2024-03-11 リックス株式会社 ドライアイス噴射装置
JP2025019419A (ja) * 2023-07-28 2025-02-07 リックス株式会社 ドライアイス噴射装置

Also Published As

Publication number Publication date
EP1824614A4 (en) 2012-08-29
EP1824614A1 (en) 2007-08-29
MX2007007079A (es) 2007-12-07

Similar Documents

Publication Publication Date Title
US7293570B2 (en) Carbon dioxide snow apparatus
US7451941B2 (en) Dense fluid spray cleaning process and apparatus
JP3616105B2 (ja) 少量の液体材料を分配するための方法及び装置
US8235580B2 (en) Reclaim function for semiconductor processing systems
EP0712693B1 (en) Nozzle apparatus for producing aerosol
US8926858B2 (en) Method of forming cryogenic fluid composition
JP4151796B1 (ja) バリ取り洗浄装置およびバリ取り洗浄方法
US6332470B1 (en) Aerosol substrate cleaner
EP0712691B1 (en) Apparatus for producing cryogenic aerosol
US5400603A (en) Heat exchanger
US20140196749A1 (en) Cryogenic liquid cleaning apparatus and methods
WO2001074538A1 (en) Dense fluid spray cleaning process and apparatus
JP2008522813A (ja) 二酸化炭素雪装置
WO2002009894A2 (en) Gas-vapor cleaning method and system therefor
KR20160110413A (ko) 고압 워터제트 절단 헤드 시스템, 구성요소 및 관련 방법
EP2542384A1 (en) Abrasive jet systems, including abrasive jet systems utilizing fluid repelling materials, and associated methods
EP0631846B1 (en) Mounting apparatus for cryogenic aerosol cleaning
US20240399425A1 (en) Method and apparatus to enable droplet jet cleaning at elevated temperature
JP2006066793A (ja) ウエハ洗浄方法及びその装置
EP0713071A1 (en) Heat exchanger
KR0122874B1 (ko) 에어로졸 생성용 노즐장치
WO2009098554A1 (en) Process vacuum for semiconductor manufacturing wet chemical processes
JP2025141088A (ja) ノズルユニット
CN101208773A (zh) 用于清洁利用激光束处理的电子元件的方法和装置
HK1063761A (en) Pressure vessel systems and methods for dispensing liquid chemical compositions

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20081211

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20081211

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20111109

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120208

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120301

A045 Written measure of dismissal of application [lapsed due to lack of payment]

Free format text: JAPANESE INTERMEDIATE CODE: A045

Effective date: 20120727