JP2008504550A - 分析方法 - Google Patents
分析方法 Download PDFInfo
- Publication number
- JP2008504550A JP2008504550A JP2007518694A JP2007518694A JP2008504550A JP 2008504550 A JP2008504550 A JP 2008504550A JP 2007518694 A JP2007518694 A JP 2007518694A JP 2007518694 A JP2007518694 A JP 2007518694A JP 2008504550 A JP2008504550 A JP 2008504550A
- Authority
- JP
- Japan
- Prior art keywords
- substance
- phase change
- point
- image
- measurement
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
- G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
- G21F9/04—Treating liquids
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
- G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
- G21F9/04—Treating liquids
- G21F9/20—Disposal of liquid waste
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
- G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
- G21F9/28—Treating solids
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
- G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
- G21F9/28—Treating solids
- G21F9/30—Processing
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N2021/1761—A physical transformation being implied in the method, e.g. a phase change
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N2021/1765—Method using an image detector and processing of image signal
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N2021/8477—Investigating crystals, e.g. liquid crystals
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N25/00—Investigating or analyzing materials by the use of thermal means
- G01N25/14—Investigating or analyzing materials by the use of thermal means by using distillation, extraction, sublimation, condensation, freezing, or crystallisation
- G01N25/147—Investigating or analyzing materials by the use of thermal means by using distillation, extraction, sublimation, condensation, freezing, or crystallisation by cristallisation
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- General Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Investigating Or Analyzing Materials Using Thermal Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
Description
均質な溶媒/溶質混合物については溶解および結晶化の温度の正確な測定値を得ることが可能である。このように、この方法は大きな汎用性を示し、そして広範囲の危険物にわたる広い適用性に対して可能性を有する。
Claims (16)
- 危険物の相変化特性を測定するための方法であって、前記物質の試料の像を光学的に記録し、そして前記像を客観的に評価することを含んでなる方法。
- 前記相変化特性が固体/液体あるいは液体/固体の相変化に関する請求項1に記載の方法。
- 危険物の結晶化点、溶解点、融解点および固化点の少なくとも1つを測定するための請求項1あるいは2に記載の方法。
- 像の前記光学的記録が離れた場所に置かれているカメラによって行われる請求項1、2あるいは3に記載の方法。
- 前記像の前記客観的評価がコンピューターによって行われる請求項1〜4のいずれか一つに記載の方法。
- コンピューターによる前記評価が相変化の温度において変曲点を示すグラフの生成を容易とする請求項5に記載の方法。
- 選択された加熱あるいは冷却サイクルの印加が可能となるように温度を正確に制御することができる単離された容器の中に評価対象の物質を導入することを含んでなる請求項1〜6のいずれかに記載の方法。
- 前記容器が評価対象の物質の20mlを超えない容積を保持する請求項7に記載の方法。
- 前記容積が5〜15mlの領域にある請求項8に記載の方法。
- 前記容積が約10mlである請求項9に記載の方法。
- 前記危険物が放射性物質を含んでなる請求項1〜10のいずれかに記載の方法。
- 前記物質が高放射性物質を収容するように設計されたHAセル内の容器中に置かれる請求項11に記載の方法。
- 前記物質が液体状態で容器の中に導入され、そして結晶化点または固化点の測定を容易とするために制御された冷却条件下で観察される請求項1〜12のいずれか一つに記載の方法。
- 前記物質が固体状態で容器の中に導入され、そして融解点または溶解点の測定を容易とするように制御された加熱サイクル下で観察される請求項1〜12のいずれかに記載の方法。
- 前記試料の不安定な域幅の確保を容易とするために、不均質な溶媒/溶質混合物の結晶化点と再溶解点の両方の測定に適用される請求項1〜14のいずれかに記載の方法。
- 固定温度における誘導時間および溶解速度の測定に適用される請求項1〜14のいずれか一つに記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB0414809.4A GB0414809D0 (en) | 2004-07-02 | 2004-07-02 | Analytical method |
PCT/GB2005/002578 WO2006003404A1 (en) | 2004-07-02 | 2005-07-01 | Analytical method |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008504550A true JP2008504550A (ja) | 2008-02-14 |
JP2008504550A5 JP2008504550A5 (ja) | 2008-08-14 |
Family
ID=32843428
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007518694A Pending JP2008504550A (ja) | 2004-07-02 | 2005-07-01 | 分析方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20080137708A1 (ja) |
EP (1) | EP1774535B1 (ja) |
JP (1) | JP2008504550A (ja) |
GB (1) | GB0414809D0 (ja) |
WO (1) | WO2006003404A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103456376B (zh) * | 2013-09-05 | 2016-04-13 | 上海核工程研究设计院 | 非能动核电厂钢制安全壳热移出过程的比例分析方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002503328A (ja) * | 1997-06-06 | 2002-01-29 | サイエンス アプリケイションズ インターナショナル コーポレイション | 高温廃棄物処理の方法およびシステム |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3329022A (en) * | 1963-11-04 | 1967-07-04 | Emerson Electric Co | Temperature measurement by sublimation of layers of radioactive material |
US4657169A (en) * | 1984-06-11 | 1987-04-14 | Vanzetti Systems, Inc. | Non-contact detection of liquefaction in meltable materials |
EP0349166A3 (en) * | 1988-06-29 | 1990-07-25 | Westinghouse Electric Corporation | A system and method for monitoring procedure execution |
ATE96544T1 (de) * | 1989-05-16 | 1993-11-15 | Bizhan Rahimzadeh | Feststellung der temperatur, bei der ein stoff von einer phase wechselt. |
FI86341C (fi) * | 1989-06-19 | 1992-08-10 | Wallac Oy | Indikatormaterial foer radioaktiv straolning. |
US5092679A (en) * | 1990-12-14 | 1992-03-03 | Brotz Gregory R | Melting point determination apparatus and method |
DE9304076U1 (ja) * | 1993-03-19 | 1993-07-22 | Fredart Sondermaschinen Gmbh, 4000 Duesseldorf, De | |
JP3169036B2 (ja) * | 1993-06-04 | 2001-05-21 | 株式会社日立製作所 | プラント監視診断システム、プラント監視診断方法および非破壊検査診断方法 |
US5424042A (en) * | 1993-09-13 | 1995-06-13 | Mason; J. Bradley | Apparatus and method for processing wastes |
US6355904B1 (en) | 1996-06-07 | 2002-03-12 | Science Applications International Corporation | Method and system for high-temperature waste treatment |
US5758968A (en) * | 1996-07-15 | 1998-06-02 | Digimelt Inc. | Optically based method and apparatus for detecting a phase transition temperature of a material of interest |
US6536944B1 (en) * | 1996-10-09 | 2003-03-25 | Symyx Technologies, Inc. | Parallel screen for rapid thermal characterization of materials |
US6231228B1 (en) * | 1999-04-08 | 2001-05-15 | Gregory R. Brotz | Melting point determination apparatus and method |
US6443616B1 (en) * | 1999-05-13 | 2002-09-03 | Gregory R. Brotz | Material melting point determination apparatus |
WO2003069292A1 (de) * | 2002-02-12 | 2003-08-21 | Imb Institut Für Molekulare Biotechnologie E. V. | Anordnung zur messung von wärmemengen bei gleichzeitiger messung der verdampfungs- und/oder kondensationskinetik von kleinsten flüssigkeitsmengen zur bestimmung thermodynamischer parameter |
-
2004
- 2004-07-02 GB GBGB0414809.4A patent/GB0414809D0/en not_active Ceased
-
2005
- 2005-07-01 EP EP05766665A patent/EP1774535B1/en not_active Expired - Fee Related
- 2005-07-01 JP JP2007518694A patent/JP2008504550A/ja active Pending
- 2005-07-01 US US11/630,876 patent/US20080137708A1/en not_active Abandoned
- 2005-07-01 WO PCT/GB2005/002578 patent/WO2006003404A1/en active Application Filing
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002503328A (ja) * | 1997-06-06 | 2002-01-29 | サイエンス アプリケイションズ インターナショナル コーポレイション | 高温廃棄物処理の方法およびシステム |
Also Published As
Publication number | Publication date |
---|---|
WO2006003404A1 (en) | 2006-01-12 |
EP1774535B1 (en) | 2008-10-29 |
EP1774535A1 (en) | 2007-04-18 |
GB0414809D0 (en) | 2004-08-04 |
US20080137708A1 (en) | 2008-06-12 |
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