JP2008307873A5 - - Google Patents

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Publication number
JP2008307873A5
JP2008307873A5 JP2007160790A JP2007160790A JP2008307873A5 JP 2008307873 A5 JP2008307873 A5 JP 2008307873A5 JP 2007160790 A JP2007160790 A JP 2007160790A JP 2007160790 A JP2007160790 A JP 2007160790A JP 2008307873 A5 JP2008307873 A5 JP 2008307873A5
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Japan
Prior art keywords
plasma
adherend
joining method
film
plasma polymerized
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JP2007160790A
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Japanese (ja)
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JP2008307873A (en
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Priority to JP2007160790A priority Critical patent/JP2008307873A/en
Priority claimed from JP2007160790A external-priority patent/JP2008307873A/en
Publication of JP2008307873A publication Critical patent/JP2008307873A/en
Publication of JP2008307873A5 publication Critical patent/JP2008307873A5/ja
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Claims (24)

基材上にそれぞれプラズマ重合膜を備えた第1の被着体および第2の被着体を用意する第1の工程と、
前記第1の被着体および前記第2の被着体の各プラズマ重合膜の表面にそれぞれエネルギーを付与して、該各プラズマ重合膜の表面を活性化させる第2の工程と、
該活性化させた各プラズマ重合膜の表面同士を密着させるように、前記第1の被着体と前記第2の被着体とを貼り合わせ、接合体を得る第3の工程とを有することを特徴とする接合方法。
A first step of preparing a first adherend and a second adherend each provided with a plasma polymerized film on a substrate;
A second step of applying energy to the surface of each plasma polymerized film of the first adherend and the second adherend to activate the surface of each plasma polymerized film;
A third step of bonding the first adherend and the second adherend to obtain a joined body so that the surfaces of the activated plasma polymerization films are brought into close contact with each other; The joining method characterized by this.
前記各プラズマ重合膜は、それぞれポリオルガノシロキサンを主材料として構成されている請求項1に記載の接合方法。   The bonding method according to claim 1, wherein each of the plasma polymerized films is composed of polyorganosiloxane as a main material. 前記ポリオルガノシロキサンは、オクタメチルトリシロキサンの重合物を主成分とするものである請求項2に記載の接合方法。   The joining method according to claim 2, wherein the polyorganosiloxane is mainly composed of a polymer of octamethyltrisiloxane. 前記各プラズマ重合膜の平均厚さは、それぞれ10〜10000nmである請求項1ないし3のいずれかに記載の接合方法。   The joining method according to any one of claims 1 to 3, wherein an average thickness of each plasma polymerization film is 10 to 10,000 nm. 前記第2の工程において、前記各プラズマ重合膜の表面に、それぞれエネルギー線を照射する請求項1ないし4のいずれかに記載の接合方法。   5. The bonding method according to claim 1, wherein, in the second step, the surface of each plasma polymerization film is irradiated with energy rays. 前記エネルギー線は、波長150〜300nmの紫外光である請求項5に記載の接合方法。   The bonding method according to claim 5, wherein the energy ray is ultraviolet light having a wavelength of 150 to 300 nm. 前記第2の工程は、大気雰囲気中で行われる請求項1ないし6のいずれかに記載の接合方法。   The joining method according to claim 1, wherein the second step is performed in an air atmosphere. 前記第3の工程の後、前記接合体に熱処理を施す工程を有する請求項1ないし7のいずれかに記載の接合方法。   The joining method according to claim 1, further comprising a step of performing a heat treatment on the joined body after the third step. 前記熱処理の温度は、25〜100℃である請求項8に記載の接合方法。   The bonding method according to claim 8, wherein a temperature of the heat treatment is 25 to 100 ° C. 前記第3の工程の後、前記接合体を加圧する工程を有する請求項1ないし9のいずれかに記載の接合方法。   The joining method according to claim 1, further comprising a step of pressurizing the joined body after the third step. 前記接合体を加圧する際の圧力は、1〜10MPaである請求項10に記載の接合方法。   The bonding method according to claim 10, wherein a pressure when the bonded body is pressurized is 1 to 10 MPa. 前記第2の工程の終了後、60分以内に、前記第3の工程を開始する請求項1ないし11のいずれかに記載の接合方法。   The joining method according to any one of claims 1 to 11, wherein the third step is started within 60 minutes after the end of the second step. 前記第1の被着体および前記第2の被着体は、それぞれ、あらかじめ前記各基材上にプラズマによる下地処理を施した後、該下地処理を施した領域に前記プラズマ重合膜を形成してなるものである請求項1ないし12のいずれかに記載の接合方法。   Each of the first adherend and the second adherend is preliminarily subjected to a base treatment with plasma on each of the substrates, and then the plasma polymerized film is formed in the region subjected to the base treatment. The joining method according to any one of claims 1 to 12, wherein the joining method is as follows. 前記2つの基材は、それぞれ剛性が異なっている請求項1ないし13のいずれかに記載の接合方法。   The joining method according to claim 1, wherein the two base materials have different rigidity. 2つの基材と、
プラズマ重合膜と、を有し、
前記2つの基材が、前記プラズマ重合膜を介して接合されていることを特徴とする接合体。
Two substrates,
A plasma polymerization film,
The joined body, wherein the two base materials are joined via the plasma polymerization film.
前記プラズマ重合膜は、前記2つの基材の表面にそれぞれあらかじめ形成されたプラズマ重合膜同士を、接合してなるものである請求項15に記載の接合体。 The joined body according to claim 15 , wherein the plasma polymerized film is formed by joining plasma polymerized films formed on the surfaces of the two base materials in advance. 前記2つの基材間の接合強度は5MPa以上である請求項15または16に記載の接合体。 The joined body according to claim 15 or 16 , wherein the joining strength between the two base materials is 5 MPa or more. インク室基板と、An ink chamber substrate;
前記インク室基板の一方の面に設けられ、インクをインク滴として吐出するノズル孔を備えたノズル板と、A nozzle plate provided on one surface of the ink chamber substrate and provided with nozzle holes for discharging ink as ink droplets;
前記インク室基板の他方の面に設けられた振動板と、A diaphragm provided on the other surface of the ink chamber substrate;
を備えるヘッド本体を有し、Having a head body comprising
前記インク室基板と前記ノズル板との間および前記インク室基板と前記振動板との間のうちの少なくとも一方が、プラズマ重合膜を介して接合されていることを特徴とする液滴吐出ヘッド。A liquid droplet ejection head, wherein at least one of the ink chamber substrate and the nozzle plate and the ink chamber substrate and the vibration plate are joined via a plasma polymerization film.
前記液滴吐出ヘッドは、前記ヘッド本体を収納する基体を備え、該基体と前記ノズル板との間が、前記プラズマ重合膜で接合されている請求項18に記載の液滴吐出ヘッド。The liquid droplet ejection head according to claim 18, wherein the liquid droplet ejection head includes a base body that houses the head main body, and the base body and the nozzle plate are joined by the plasma polymerization film. 前記インク室基板、前記ノズル板、前記振動板および前記基体のうち、接合されるそれぞれの面に、あらかじめ前記プラズマ重合膜を形成し、該プラズマ重合膜同士を接合してなるものである請求項19に記載の液滴吐出ヘッド。The plasma polymerized film is formed in advance on each surface to be bonded among the ink chamber substrate, the nozzle plate, the vibration plate, and the substrate, and the plasma polymerized films are bonded to each other. 19. A liquid droplet ejection head according to item 19. 前記プラズマ重合膜は、ポリオルガノシロキサンを含むものである請求項18ないし20のいずれかに記載の液滴吐出ヘッド。21. The liquid droplet ejection head according to claim 18, wherein the plasma polymerized film contains polyorganosiloxane. 前記ポリオルガノシロキサンは、オクタメチルトリシロキサンの重合物を成分とするものである請求項21に記載の液滴吐出ヘッド。The liquid droplet ejection head according to claim 21, wherein the polyorganosiloxane contains a polymer of octamethyltrisiloxane as a component. 前記プラズマ重合膜の平均厚さは、10〜10000nmである請求項18ないし22のいずれかに記載の液滴吐出ヘッド。The droplet discharge head according to any one of claims 18 to 22, wherein an average thickness of the plasma polymerization film is 10 to 10,000 nm. 請求項18ないし23のいずれかに記載の液滴吐出ヘッドを備えることを特徴とする液滴吐出装置。 24. A droplet discharge apparatus comprising the droplet discharge head according to any one of claims 18 to 23 .
JP2007160790A 2007-06-18 2007-06-18 Bonding method, bonding body, droplet discharge head, and droplet discharge apparatus Withdrawn JP2008307873A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007160790A JP2008307873A (en) 2007-06-18 2007-06-18 Bonding method, bonding body, droplet discharge head, and droplet discharge apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007160790A JP2008307873A (en) 2007-06-18 2007-06-18 Bonding method, bonding body, droplet discharge head, and droplet discharge apparatus

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JP2008307873A JP2008307873A (en) 2008-12-25
JP2008307873A5 true JP2008307873A5 (en) 2010-07-01

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4697253B2 (en) 2008-04-01 2011-06-08 セイコーエプソン株式会社 Bonding method, droplet discharge head, bonded body, and droplet discharge apparatus
JP4674619B2 (en) 2008-07-29 2011-04-20 セイコーエプソン株式会社 Nozzle plate, nozzle plate manufacturing method, droplet discharge head, and droplet discharge apparatus
JP5625470B2 (en) * 2010-05-10 2014-11-19 セイコーエプソン株式会社 Joining method
CN102001615B (en) * 2010-09-02 2012-05-09 浙江大学 Method for preparing high polymer nanofluidic chip
JP7239134B2 (en) * 2018-05-18 2023-03-14 国立大学法人大阪大学 Joined body of resin material and metal material and manufacturing method thereof

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