JP2008304701A5 - - Google Patents

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Publication number
JP2008304701A5
JP2008304701A5 JP2007151676A JP2007151676A JP2008304701A5 JP 2008304701 A5 JP2008304701 A5 JP 2008304701A5 JP 2007151676 A JP2007151676 A JP 2007151676A JP 2007151676 A JP2007151676 A JP 2007151676A JP 2008304701 A5 JP2008304701 A5 JP 2008304701A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007151676A
Other versions
JP2008304701A (ja
JP5391529B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2007151676A external-priority patent/JP5391529B2/ja
Priority to JP2007151676A priority Critical patent/JP5391529B2/ja
Priority to CN201410354369.2A priority patent/CN104122612B/zh
Priority to TW103102369A priority patent/TWI545351B/zh
Priority to TW096142138A priority patent/TWI448736B/zh
Priority to TW103125350A priority patent/TWI518376B/zh
Priority to CN2007800514959A priority patent/CN101611332B/zh
Priority to TW105114333A priority patent/TWI598638B/zh
Priority to KR1020157003702A priority patent/KR101541288B1/ko
Priority to KR1020147002312A priority patent/KR101541287B1/ko
Priority to CN201210109843.6A priority patent/CN102628969B/zh
Priority to CN 201110020355 priority patent/CN102176079B/zh
Priority to KR1020127017847A priority patent/KR101414004B1/ko
Priority to KR1020147002311A priority patent/KR101456522B1/ko
Priority to KR1020097017337A priority patent/KR101193615B1/ko
Priority to TW103102368A priority patent/TWI536047B/zh
Priority to TW103102372A priority patent/TWI536048B/zh
Priority to TW103102364A priority patent/TWI530713B/zh
Priority to PCT/JP2007/071635 priority patent/WO2008102487A1/ja
Publication of JP2008304701A publication Critical patent/JP2008304701A/ja
Publication of JP2008304701A5 publication Critical patent/JP2008304701A5/ja
Publication of JP5391529B2 publication Critical patent/JP5391529B2/ja
Application granted granted Critical
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2007151676A 2007-02-21 2007-06-07 凹凸パターン形成シートの製造方法 Expired - Fee Related JP5391529B2 (ja)

Priority Applications (18)

Application Number Priority Date Filing Date Title
JP2007151676A JP5391529B2 (ja) 2007-06-07 2007-06-07 凹凸パターン形成シートの製造方法
CN 201110020355 CN102176079B (zh) 2007-02-21 2007-11-07 凹凸图案形成片及其制造方法
KR1020147002311A KR101456522B1 (ko) 2007-02-21 2007-11-07 요철 패턴 형성 시트 및 그 제조 방법
TW096142138A TWI448736B (zh) 2007-02-21 2007-11-07 凹凸圖案形成片及其製造方法
TW103125350A TWI518376B (zh) 2007-02-21 2007-11-07 凹凸圖案形成片及其製造方法
CN2007800514959A CN101611332B (zh) 2007-02-21 2007-11-07 凹凸图案形成片及其制造方法
TW105114333A TWI598638B (zh) 2007-02-21 2007-11-07 光擴散體
KR1020157003702A KR101541288B1 (ko) 2007-02-21 2007-11-07 요철 패턴 형성 시트 및 그 제조 방법
KR1020147002312A KR101541287B1 (ko) 2007-02-21 2007-11-07 요철 패턴 형성 시트 및 그 제조 방법
CN201210109843.6A CN102628969B (zh) 2007-02-21 2007-11-07 凹凸图案形成片的制造方法
CN201410354369.2A CN104122612B (zh) 2007-02-21 2007-11-07 凹凸图案形成片及其制造方法
KR1020127017847A KR101414004B1 (ko) 2007-02-21 2007-11-07 요철 패턴 형성 시트 및 그 제조 방법
TW103102369A TWI545351B (zh) 2007-02-21 2007-11-07 凹凸圖案形成片及其製造方法
KR1020097017337A KR101193615B1 (ko) 2007-02-21 2007-11-07 요철 패턴 형성 시트 및 그 제조 방법
TW103102368A TWI536047B (zh) 2007-02-21 2007-11-07 擴散導光體及背光單元
TW103102372A TWI536048B (zh) 2007-02-21 2007-11-07 凹凸圖案形成片及其製造方法
TW103102364A TWI530713B (zh) 2007-02-21 2007-11-07 凹凸圖案形成片及其製造方法
PCT/JP2007/071635 WO2008102487A1 (ja) 2007-02-21 2007-11-07 凹凸パターン形成シートおよびその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007151676A JP5391529B2 (ja) 2007-06-07 2007-06-07 凹凸パターン形成シートの製造方法

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2013171757A Division JP5682841B2 (ja) 2013-08-21 2013-08-21 光拡散体製造用工程シート原版および光拡散体の製造方法
JP2013171758A Division JP5884790B2 (ja) 2013-08-21 2013-08-21 凹凸パターン形成シートの製造方法、光拡散体製造用工程シート原版ならびに光拡散体の製造方法

Publications (3)

Publication Number Publication Date
JP2008304701A JP2008304701A (ja) 2008-12-18
JP2008304701A5 true JP2008304701A5 (ja) 2010-05-13
JP5391529B2 JP5391529B2 (ja) 2014-01-15

Family

ID=40233488

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007151676A Expired - Fee Related JP5391529B2 (ja) 2007-02-21 2007-06-07 凹凸パターン形成シートの製造方法

Country Status (1)

Country Link
JP (1) JP5391529B2 (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5277842B2 (ja) * 2008-09-30 2013-08-28 王子ホールディングス株式会社 光拡散シート
FR2944146B1 (fr) * 2009-04-02 2011-11-11 Saint Gobain Procede de fabrication d'une structure a surface texturee pour un dispositif a diode electroluminescente organique, et structure a surface texturee pour oled
JP5699726B2 (ja) * 2010-06-23 2015-04-15 王子ホールディングス株式会社 有機ｅｌ素子の製造方法。
JP5764963B2 (ja) * 2011-02-17 2015-08-19 王子ホールディングス株式会社 光拡散体用凹凸パターン形成ロールモールド及び光拡散体の製造方法
JP5822192B2 (ja) * 2011-08-08 2015-11-24 学校法人東京理科大学 幾何微細凹凸構造の作製方法
WO2014002850A1 (ja) * 2012-06-26 2014-01-03 王子ホールディングス株式会社 光拡散性シート
JP5673706B2 (ja) * 2013-02-27 2015-02-18 王子ホールディングス株式会社 微細凹凸シートの製造方法
JP6515759B2 (ja) * 2014-09-17 2019-05-22 王子ホールディングス株式会社 表面微細凹凸体および表面微細凹凸体の製造方法
JP6690292B2 (ja) * 2016-02-23 2020-04-28 大日本印刷株式会社 樹脂フィルム、積層体および包装材料

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03142401A (ja) * 1989-10-30 1991-06-18 Asahi Chem Ind Co Ltd 合成樹脂層，光透過拡散板およびそれらの製造法
JP3491467B2 (ja) * 1996-10-25 2004-01-26 松下電工株式会社 光拡散板およびその製造方法
JP2006003647A (ja) * 2004-06-17 2006-01-05 Nippon Paint Co Ltd 凹凸層形成用コーティング組成物および反射板の製造方法
JP2006227267A (ja) * 2005-02-17 2006-08-31 Sharp Corp 反射型表示装置

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