JP2008292549A - Method for manufacturing substrate with coating film, color filter and method for manufacturing the same, and display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a substrate with a coating film, by which a coating film having high surface flatness is formed even when the coating film is formed on a face having irregularity. <P>SOLUTION: The method for manufacturing a substrate with a coating film includes: an application step of applying a coating liquid on a substrate having an irregular surface, on the surface where irregularity is present; and a drying step of drying the coating liquid applied on the substrate by cooling the substrate as well as reducing the ambient pressure. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a method for manufacturing a substrate with a coating film, a color filter, a method for manufacturing the same, and a display device.

In the manufacturing process of a semiconductor device, a liquid crystal display device or the like, a process of forming a coating film by applying a coating solution such as a resist solution is essential.
Various coating methods such as a slit coating method, a spin coating method, a slit & spin method, a knife coating method, a roll coating method, and a bead coating method are used as the coating method of the coating liquid. Here, even if it applies by any application method, the process of drying a coating film after application is required. Conventionally, an object to be dried such as a substrate coated with a coating solution has been heated and dried in an oven or a hot plate.

However, the above heating method requires a long time for drying, and as a result, the drying process is the rate-limiting step in the manufacturing process.
Therefore, in recent years, a vacuum drying method has been used as a method for shortening the time of the drying process. In this method, the substrate on which the coating film is formed is placed in a vacuum state, and the evaporation rate of the solvent is dramatically increased.

  Regarding the vacuum drying method, as a method for shortening the drying time of the object to be dried and improving the surface state of the object to be dried after drying, the vacuum is slightly lower than the degree of vacuum in which the evaporation rate of the solvent of the coating solution increases rapidly. The gas in the vacuum chamber is evacuated at a high speed until it reaches a certain degree, and then the gas in the vacuum chamber is evacuated at a low speed to gradually evaporate the solvent of the coating solution. A method of returning to atmospheric pressure is known (see, for example, Patent Document 1).

In addition, regarding the vacuum drying method, there is no defect such as foreign matter, pinholes and material aggregation on the surface, and there is no significant deterioration in development characteristics even when the process residence time is long. A drying method is known in which exhaust is performed over a period of 6 seconds or more until the degree of vacuum is 100 Torr (see, for example, Patent Document 2).
JP 2001-235277 A JP 2000-241623 A

  However, when a coating film is formed on a surface having unevenness, the surface of the formed coating film is affected by the unevenness of the base, and the flatness of the surface tends to be lowered.

This invention is made | formed in view of the above, and makes it a subject to achieve the following objectives.
That is, an object of the present invention is to provide a method for manufacturing a substrate with a coating film, which can form a coating film with high surface flatness even when a coating film is formed on a surface having irregularities. To do. In addition, the present invention provides a method for manufacturing a color filter in which the height of the stepped portion of the colored pattern generated on the part riding on the partition wall is reduced, and is less affected by the thickness of the partition wall and the flatness of the colored pattern is high. Another object is to provide a display device in which the occurrence of unevenness is suppressed.

As a result of intensive studies, the present inventor has obtained the knowledge that the above problem can be solved by specifying the drying conditions of the coating solution, and has completed the present invention based on the knowledge.
That is, specific means for solving the above problems are as follows.

<1> A coating process in which a coating liquid is applied to a surface of the substrate having irregularities on the surface where the irregularities are present, and drying in which the coated coating liquid is dried by cooling the substrate and reducing the atmosphere. A process for producing a substrate with a coating film.
<2> The said drying process is a manufacturing method of the board | substrate with a coating film as described in <1> characterized by cooling the said board | substrate to 5 to 20 degreeC.
<3> In the drying step, the atmosphere is reduced from atmospheric pressure to 1/10 of atmospheric pressure over 10 seconds or more, and the atmosphere reduced to 1/10 of atmospheric pressure is further reduced to 5 kPa or less. A process for producing a substrate with a coating film according to <1> or <2>.

<4> A method of manufacturing a substrate with a coating film according to any one of <1> to <3>, wherein a partition wall forming step of forming a partition wall on the substrate and a surface of the substrate on the side where the partition walls are formed A colored layer forming step of applying a coating solution comprising a colored curable composition and drying to form a colored layer, and exposing the developed colored layer and developing to form a colored pattern Forming a color filter.

<5> A color filter manufactured using the method for manufacturing a color filter according to <4>.
<6> A display device comprising the color filter according to <5>.

  ADVANTAGE OF THE INVENTION According to this invention, even when forming a coating film on the surface which has an unevenness | corrugation, the manufacturing method of the board | substrate with a coating film which can form a coating film with high surface flatness can be provided. In addition, according to the present invention, the height of the stepped portion of the colored pattern generated in the portion riding on the partition is reduced, and the method for producing a color filter that is less affected by the thickness of the partition and has high flatness of the colored pattern, and Thus, it is possible to provide a display device in which the occurrence of display unevenness is suppressed.

<< Manufacturing method of substrate with coating film >>
The manufacturing method of the board | substrate with a coating film of this invention cools the said board | substrate with the application | coating process which apply | coats a coating liquid to the surface at the side with the said unevenness | corrugation of the board | substrate which has an unevenness | corrugation on the surface, and the applied said coating liquid. And a drying step for drying under reduced pressure.
When a coating film is formed on a surface having unevenness, the surface of the formed coating film is affected by the unevenness of the base, and the unevenness of the base appears on the surface, and the flatness of the surface tends to decrease. is there.
Therefore, by forming the coating film using the manufacturing method of the substrate with the coating film having the above-described structure, even when the coating film is formed on the uneven surface, the coating film having high surface flatness is formed. be able to.

In the coating step, the coating liquid is applied to the surface of the substrate having unevenness on the surface where the unevenness exists.
As the coating solution, for example, a known coating solution such as a resin composition or a negative or positive resist solution can be used without particular limitation. For example, in the case of a color filter for a display device, a colored curable composition for forming a colored pixel, a curable composition for forming an overcoat film, and a dark curable composition for forming a resin black matrix. A composition or the like can be used.

  As a method for applying the coating solution, for example, known coating methods such as slit coating, spin coating, slit & spin coating, knife coating, roll coating, bead coating, etc. can be used without particular limitation. Among these, in the case of slit coating and slit & spin coating with little planarization effect, the planarization effect according to the present invention can be obtained more effectively.

  The substrate is not particularly limited, but is a known glass substrate such as a semiconductor substrate such as a semiconductor wafer, a soda glass substrate, a non-alkali glass substrate, a low expansion glass substrate, or a quartz glass substrate; a plastic substrate, a plastic film, or a plastic A sheet or the like can be used.

  There is no particular limitation on the form of the substrate having irregularities on the surface. In addition to the form in which a patterned structure is provided on the substrate using a metal material, a semiconductor material, an inorganic material, an organic material, etc., the substrate itself The surface may be etched in a pattern.

In the drying step, the coating liquid applied on the substrate is dried by cooling the substrate and reducing the atmosphere to which the applied coating liquid is exposed.
Here, there is no particular limitation on the form of cooling and depressurizing the atmosphere. In addition to the form of starting the cooling of the substrate and the depressurization of the atmosphere at the same time, after cooling the substrate in advance, the atmosphere around the subsequently cooled substrate May be reduced, or the atmosphere around the substrate may be reduced in advance, and the substrate may be subsequently cooled in the reduced pressure atmosphere. Among these, a mode in which the cooling of the substrate and the decompression of the atmosphere are started simultaneously is preferable.

In the present invention, “cooling the substrate” refers to lowering the substrate temperature by 3 ° C. or more with respect to the initial temperature. The decrease in the substrate temperature due to the reduced pressure of the atmosphere is not included in the concept of “cooling the substrate” here.
From the viewpoint of more effectively achieving the effects of the present invention, the substrate is preferably cooled to 20 ° C. or lower, more preferably 5 ° C. or higher to 20 ° C. or lower, and the dew point to 20 ° C. or lower. Is more preferable, and cooling to a dew point or higher and 15 ° C. or lower is particularly preferable. Here, the dew point refers to the temperature of the surface when the object cools and the surface begins to dew. For example, in an environment where the temperature is 23 ° C. and the humidity is 50%, the dew point is 11 to 13 ° C. The temperature of the substrate can be measured by attaching a thermocouple to the substrate.

  In addition, the atmosphere is depressurized by reducing the atmosphere from atmospheric pressure to 1/10 of the atmospheric pressure over 10 seconds or more and reducing the atmosphere reduced to 1/10 of the atmospheric pressure to 5 kPa or less. It is preferable to carry out by the method including a process. By reducing the pressure by the above method, a coating film having a flatter surface can be obtained.

For the drying in the drying step, for example, a form using a vacuum drying apparatus as shown in FIG. 1 is preferable.
FIG. 1 is a schematic view showing a cross section of the vacuum drying apparatus 10 in the preferred embodiment.
In the vacuum drying apparatus 10 shown in FIG. 1, a support base 14 is provided at the bottom of the vacuum chamber 12, and a cooling plate 16 for placing the substrate 20 coated with the coating liquid is in contact with the support base 14. Has been. Although not shown, the cooling plate 16 has an internal hollow structure, and the surface of the cooling plate 16 can be adjusted to a desired temperature (for example, 5 ° C. or more and 20 ° C. or less) by the supplied cooling water. Yes. Further, the vacuum chamber 12 has an opening / closing mechanism (not shown), and when the vacuum chamber 12 is opened, the substrate 20 coated with the coating liquid can be carried into the interior (or carried out to the outside). However, when the vacuum chamber 12 is closed, the atmosphere can be decompressed (hereinafter also referred to as “exhaust”).

One end of an exhaust pipe 30 including an orifice valve 22, a main valve 24, a mechanical booster pump 26 (MB Pump), and a rotary pump 28 (PR Pump) is connected to the bottom of the vacuum chamber 12. Further, one end of the exhaust pipe 32 is connected to the bottom of the vacuum chamber 12, and the other end is connected between the mechanical booster pump 26 and the rotary pump 28 of the exhaust pipe 30.
With the above structure, the inside of the vacuum chamber 12 can be evacuated from the side of the exhaust pipe 30 not connected to the vacuum chamber 12. Further, at the time of exhaust, the exhaust speed can be adjusted by adjusting the orifice valve 22.
The vacuum chamber 12 is connected to an air supply pipe 36 having a vent valve 34 for returning the evacuated vacuum chamber 12 to atmospheric pressure, and further measures the degree of vacuum in the vacuum chamber 12. The vacuum gauge 38 is provided.

Next, the example in the case of performing the drying process in this invention using the vacuum-drying apparatus 10 shown in FIG. 1 is demonstrated.
First, in a state where the vent valve 34 and the vacuum chamber 12 are opened and the main valve 24 is closed, the substrate 20 coated with the coating liquid is loaded into the vacuum chamber 12 at atmospheric pressure and placed on the cooling plate 16. . At this time, it is preferable that the surface of the substrate 20 coated with the coating liquid is placed so that the surface opposite to the surface coated with the coating liquid is in contact with the surface of the cooling plate 16. In the case of this form, for example, the substrate temperature can be measured by attaching a thermocouple to the opposite surface. The temperature of the surface of the cooling plate 16 is adjusted to the temperature (attainment temperature) for cooling the substrate.

Next, the vent valve 34 and the vacuum chamber 12 are closed, the main valve 24 is opened, and evacuation in the vacuum chamber 12 is started by the mechanical booster pump 26 and the rotary pump 28. Immediately after the start of exhaust, the orifice valve 22 is adjusted and exhausted slowly over 10 seconds from atmospheric pressure to 1/10 (10 kPa) of atmospheric pressure. After the degree of vacuum in the vacuum chamber 12 is reduced to 1/10 of the atmospheric pressure, the orifice valve 22 is fully opened and exhausted to 5 kPa or less.
By the above, the coating liquid apply | coated on the board | substrate is dried and a board | substrate with a coating film is produced.
After evacuation until the degree of vacuum in the vacuum chamber 12 becomes 5 kPa or less, first, the main valve 24 is closed, the vent valve 34 is opened, then the vacuum chamber 12 is opened, and the substrate 20 coated with the coating liquid is removed from the vacuum chamber 12. 12 is taken out.

As mentioned above, although the manufacturing method of the board | substrate with a coating film of this invention was demonstrated, in this manufacturing method, processes other than the said process, such as a heat treatment process, may be provided.
In addition, the method for manufacturing a substrate with a coating liquid according to the present invention is provided with unevenness on the surface (for example, a wiring pattern, a groove for forming a wiring pattern, a partition such as a black matrix, a colored pattern, Etc.) can be applied to any application for forming a coating film (eg, a photoresist film, a colored layer, a planarizing film, an overcoat film, etc.) on a substrate having a substrate surface. It is possible to form a coating film having a high surface flatness, in which the influence of the unevenness is reduced.

≪Color filter and its manufacturing method≫
The method for producing a color filter of the present invention uses the above-described method for producing a substrate with a coating film on the surface of the substrate on which the partition wall is formed, and a color curable property. A colored layer forming step of applying a coating liquid comprising the composition and drying to form a colored layer; and a colored pattern forming step of exposing the developed colored layer and developing to form a colored pattern. Configured.
Further, the color filter of the present invention is produced by the method for producing a color filter.

In general, when a colored curable composition is applied to the partition forming surface side on the substrate, and a colored pattern is formed by exposure and development, the surface of the formed colored pattern is a convex shape that is a base film of the colored pattern. Under the influence of the partition wall, the portion that rides on the partition wall tends to rise. Hereinafter, this phenomenon will be described with reference to FIG.
FIG. 2 is a cross-sectional view schematically showing a color filter produced by applying a colored curable composition on the surface of the substrate 40 where the partition wall 42 is formed, exposing and developing to form a colored pattern 44. In FIG. 2, under the influence of the partition wall 42 having a thickness D, a convex portion (stepped portion) having a height h is generated at a location where the colored pattern 44 rides on the partition wall 42.
Note that FIG. 2 shows a cross section of a portion where the pattern edge of the colored pattern 44 does not exist on the partition wall 42. Of course, a stepped portion is formed at the place where the pattern runs on the partition wall.
When the height h of the stepped portion where the coloring pattern rides on the partition wall is large, the variation in cell gap when used in a liquid crystal display device increases, which causes display unevenness. As a technique for suppressing the height h of the stepped portion, a technique for polishing the surface of the colored pattern after forming the colored pattern is known. However, this technique has a polishing step, so that the productivity is reduced and the cost is high. Become.

Therefore, when a color filter is produced using the method for producing a color filter of the present invention, the height of the stepped portion of the colored pattern generated in the portion that rides on the partition is reduced. That is, the rising of the colored pattern generated in the portion that rides on the partition is reduced. For this reason, it is possible to obtain a color filter which is not easily affected by the thickness of the partition wall and has high flatness of the colored pattern at a low cost without providing a polishing step.
Furthermore, in the method for producing a color filter of the present invention, when a pigment-dispersed colored curable composition is used as the colored curable composition, it is dried at a low temperature. Generation of defects such as foreign matter, pinholes, and material aggregation can be suppressed.
Hereafter, each process of the color filter of this invention is demonstrated in detail.

<Partition forming process>
In the partition forming step in the present invention, the partition is formed on the substrate.
As the substrate, a substrate similar to the substrate described in the section of the method for manufacturing a substrate with a coating film described above can be used. Moreover, the said partition means the structure which divides on a board | substrate, For example, the black matrix in the color filter for liquid crystal display devices is mentioned. The method for forming the black matrix is not particularly limited, and the black matrix can be formed using a known technique such as photolithography or etching.

Examples of the black matrix include a black matrix formed using a metal film such as chromium and a so-called resin black matrix formed using a dark color resin composition. Among these, the resin black matrix has a lower optical density per unit film thickness than a black matrix formed using a metal film, and thus it is necessary to increase the film thickness in order to ensure a high optical density. For this reason, when the resin black matrix is formed as the partition wall in the color filter manufacturing method of the present invention, the planarization effect according to the present invention can be obtained more effectively.
Hereinafter, an example of a method for forming a resin black matrix will be described.

The method for forming the resin black matrix is not particularly limited, but a method of patterning into a desired shape using a known photolithography method is preferable as described below.
That is,
(A) The dark color resin composition is formed by applying a dark color resin composition on a substrate, or using a transfer material provided with a dark color resin composition layer composed of the dark color resin composition on a temporary support. A dark color resin composition layer forming step of forming a dark color resin composition layer on the substrate by transferring the physical layer onto the substrate; and (b) exposing the dark color resin composition layer formed on the substrate. An exposure process to
(C) a developing step of developing the dark resin composition layer after exposure;
A method comprising: Furthermore, you may provide other processes, such as post exposure and heat processing, as needed.

In the present invention, the method of forming the dark color resin composition layer on the substrate by applying the dark color resin composition on the substrate may be simply referred to as “coating method”. The application method is not particularly limited, and a known method such as slit coating can be used.
In the present invention, the method of forming the dark color resin composition layer on the substrate by transferring the dark color resin composition layer of the transfer material described above onto the substrate may be simply referred to as “transfer method”. . There is no particular limitation on the transfer method, and a known method can be used.
Of these, the transfer method is preferred from the viewpoint of the layer thickness uniformity of the formed dark color resin composition layer and the viewpoint of cost reduction.

  Further, from the viewpoint of more effectively obtaining the planarization effect according to the present invention, the thickness of the resin black matrix is preferably 1.5 μm or less, and more preferably in the range of 0.4 μm to 1.5 μm. . When the film thickness is 0.4 μm or more, the black matrix can have a higher light-shielding property (that is, a higher optical density (OD) can be ensured). The height of the stepped portion generated at the place where the vehicle rides can be further reduced. The film thickness of the resin black matrix can be measured using a contact surface roughness meter P-10 (manufactured by TENCOR).

(Dark color resin composition)
The dark resin composition is not particularly limited, but from the viewpoint of suppressing the film thickness of the resin black matrix to 1.5 μm or less, a dark resin composition having a high optical density (OD value) per unit film thickness is used. It is preferable to use it. From the viewpoint of the optical density, examples of the dark resin composition include paragraph numbers [0012] to [0016] of JP-A-2004-240039 and JP-A-2005-17322 [0017] to [0059]. A dark color resin composition containing fine metal particles, such as the coloring composition for producing a black matrix described in 1), can be suitably used.

(Transfer material)
In the transfer material, a dark color resin composition layer is provided on a temporary support using at least a dark color resin composition. By pressing the transfer material onto the substrate, the dark color resin composition layer can be transferred onto the substrate.
The transfer material is preferably configured in the form of a photosensitive resin transfer material described in JP-A-5-72724, that is, an integrated film (integrated film). As an example of the structure of the integral film, there may be mentioned a structure in which a temporary support / thermoplastic resin layer / intermediate layer / dark color resin composition layer / protective film are laminated in this order.
As a method for producing the temporary support, the thermoplastic resin layer, the intermediate layer, the protective film, and the transfer material, those described in paragraphs [0023] to [0066] of JP-A-2005-3861 are preferable. It is done.

<Colored layer forming step>
In the colored layer forming step in the present invention, a coating liquid composed of a colored curable composition described later is applied to the surface of the substrate on which the partition walls are formed, using the above-described method for manufacturing a substrate with a coating film, and then dried. To form a colored layer.

The application method is not particularly limited, and a known method such as spin coating, slit coating, slit & spin coating or the like can be used. As a specific method of slit coating, for example, a slit coating type coating method described in JP-A No. 2000-126664 is suitable.
About the method of drying, it is as having demonstrated with the manufacturing method of the above-mentioned board | substrate with a coating film, and it is the same also about a preferable range and a preferable form.

  In the colored layer forming step in the present invention, pre-baking (heat treatment) may be performed after drying. A known heating means such as a hot plate or an oven can be used for the pre-baking.

<Coloring pattern formation process>
In the colored pattern forming step in the present invention, the formed colored layer is exposed and developed to form a colored pattern.

  The exposure can be performed by a known method of irradiating the coating film with radiation through a predetermined mask pattern. As the radiation used at this time, ultraviolet rays such as g-line, h-line and i-line are particularly preferably used.

The development can be performed by removing a non-cured part after exposure (non-exposed part in the case of a negative type) with a developer (alkaline aqueous solution or the like).
Any developer can be used as long as it dissolves the coating film in the non-cured portion and does not dissolve the cured portion. Specifically, a combination of various organic solvents or an alkaline aqueous solution can be used.
The development temperature is preferably 20 ° C. to 30 ° C., and the development time is preferably 20 to 90 seconds.

  Examples of the alkaline aqueous solution include sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium oxalate, sodium metasuccinate, aqueous ammonia, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide, Concentration of an alkaline compound such as tetraethylammonium hydroxide, choline, pyrrole, piperidine, 1,8-diazabicyclo- [5,4,0] -7-undecene, in a concentration of 0.001 to 10% by mass, preferably 0.01 to An alkaline aqueous solution dissolved so as to be 1% by mass is used. In addition, when using the developing solution which consists of such alkaline aqueous solution, generally it wash | cleans (rinse) with water after image development.

In the case of forming a colored pattern using a negative colored curable composition, post-exposure may be performed after the development and before post-baking described later in order to further promote the curing of the colored pattern. .
As the light source used for the post-exposure, any light source capable of irradiating light in a wavelength region that can cure the colored layer (for example, 365 nm, 405 nm) can be appropriately selected and used.
Specifically, an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a metal halide lamp, etc. are mentioned.
The exposure may be an exposure to compensate for the exposure, is usually in the 50 to 5000 mJ / cm ^2, preferably not 200~2000mJ / cm ^2, more preferably a 500~1000mJ / cm ^2.

In the colored pattern forming step in the present invention, post-baking may be performed after development.
As the post-baking method, various conventionally known methods can be used. That is, for example, a method of storing a plurality of substrates in a cassette and processing them with a convection oven, a method of processing one by one with a hot plate, a method of processing with an infrared heater, and the like.

  Further, the post-bake temperature is preferably 150 to 280 ° C., more preferably 180 to 250 ° C., from the viewpoint of more effectively obtaining the effects of the present invention. Although heating time changes with the said baking temperature, when the baking temperature is 230 degreeC from the said viewpoint, 10 to 120 minutes are preferable and 30 to 90 minutes are more preferable.

<Others>
The manufacturing method of the color filter of the present invention includes other steps such as a step of forming an arbitrary element (overcoat film, transparent electrode film (for example, ITO film), columnar spacer, alignment control projection pattern, etc.). It may be done.

  The color pattern of the color filter in the present invention may be only one color or a plurality of colors (for example, three colors of red, green, and blue). In the case of a plurality of colors, the above-described colored layer forming step and the colored pattern forming step may be applied to any one color, but the above-described colored layer forming step and the colored pattern forming step are applied to two or more colors. May be.

≪Colored curable composition≫
There is no limitation in particular as a colored curable composition in this invention, A well-known colored curable composition can be selected suitably and can be used. For example, a colored curable composition containing a colorant, a resin, and a photosensitizer (photopolymerization initiator or photoacid generator) and further containing a polymerizable compound or a solvent can be used as necessary.
Regarding each component such as a colorant, a resin, a photosensitive agent (photopolymerization initiator or photoacid generator), a polymerizable compound, and a solvent, paragraph numbers [0016] to [0088] of JP-A-2003-241368, The components described in paragraph numbers [0025] to [0109] of JP-A-2005-70152 can be appropriately selected and used.

<Colorant>
As the colorant, for example, various conventionally known dyes and pigments can be used singly or in combination. The colorant is preferably a pigment from the viewpoint of light resistance.

  As the pigment, various conventionally known inorganic pigments or organic pigments can be used. Further, considering that it is preferable to have a high transmittance, whether it is an inorganic pigment or an organic pigment, it is preferable to use a fine one as much as possible, and considering the handling properties, the average particle diameter of the pigment is 0.01 μm to 0.1 μm is preferable, and 0.01 μm to 0.05 μm is more preferable. Examples of the inorganic pigment include metal compounds represented by metal oxides, metal complex salts, and the like. Specifically, iron, cobalt, aluminum, cadmium, lead, copper, titanium, magnesium, chromium, zinc And metal oxides such as antimony, and composite oxides of the above metals.

As an organic pigment, for example,
C. I. Pigment Yellow 11, 24, 31, 53, 83, 93, 99, 108, 109, 110, 138, 139, 147, 150, 151, 154, 155, 167, 180, 185, 199,;
C. I. Pigment orange 36, 38, 43, 71;
C. I. Pigment Red 81, 105, 122, 149, 150, 155, 171, 175, 176, 177, 209, 220, 224, 242, 254, 255, 264, 270;
C. I. Pigment violet 19, 23, 32, 39;
C. I. Pigment blue 1, 2, 15, 15: 1, 15: 3, 15: 6, 16, 22, 60, 66;
C. I. Pigment green 7, 36, 37;
C. I. Pigment brown 25, 28;
C. I. Pigment black 1, 7;
Examples thereof include carbon black.

  In the present invention, those having a basic N atom in the structural formula of the pigment can be preferably used. These pigments having a basic N atom exhibit good dispersibility in the composition of the present invention. Although the cause is not fully elucidated, it is presumed that the good affinity between the photosensitive polymerization component and the pigment has an influence.

  Examples of the pigment that can be preferably used in the present invention include the following. However, the present invention is not limited to these.

C. I. Pigment Yellow 11, 24, 108, 109, 110, 138, 139, 150, 151, 154, 167, 180, 185
C. I. Pigment orange 36, 71,
C. I. Pigment Red 122, 150, 171, 175, 177, 209, 224, 242, 254, 255, 264
C. I. Pigment violet 19, 23, 32,
C. I. Pigment Blue 15: 1, 15: 3, 15: 6, 16, 22, 60, 66,
C. I. Pigment Black 1

  These organic pigments can be used alone or in various combinations in order to increase color purity. Specific examples of the above combinations are shown below. For example, as a pigment for a red pattern, an anthraquinone pigment, a perylene pigment, a diketopyrrolopyrrole pigment alone or at least one of them, a disazo yellow pigment, an isoindoline yellow pigment, a quinophthalone yellow pigment or perylene A mixture with a red pigment can be used. For example, as an anthraquinone pigment, C.I. I. Pigment red 177, and perylene pigments include C.I. I. Pigment red 155, C.I. I. Pigment Red 224, and diketopyrrolopyrrole pigments include C.I. I. Pigment red 254, and C.I. I. Mixing with Pigment Yellow 139 is preferred. The mass ratio of the red pigment to the yellow pigment in the red pattern pigment is preferably 100: 5 to 100: 50. When the mass ratio is 100: 5 or more, the light transmittance of 400 nm to 500 nm can be further reduced, and the color purity can be further improved. In addition, when the ratio is 100: 50 or less, a phenomenon in which the dominant wavelength becomes a short wavelength and a phenomenon in which the deviation from the NTSC target hue increases can be more effectively suppressed. In particular, the mass ratio is optimally in the range of 100: 10 to 100: 30. In the case of a combination of red pigments, it can be adjusted in accordance with the chromaticity.

  As the pigment for the green pattern, a halogenated phthalocyanine pigment can be used alone, or a mixture thereof with a disazo yellow pigment, a quinophthalone yellow pigment, an azomethine yellow pigment, or an isoindoline yellow pigment. For example, C.I. I. Pigment Green 7, 36, 37 and C.I. I. Pigment yellow 83, C.I. I. Pigment yellow 138, C.I. I. Pigment yellow 139, C.I. I. Pigment yellow 150, C.I. I. Pigment yellow 180 or C.I. I. Mixing with Pigment Yellow 185 is preferred. The mass ratio of the green pigment to the yellow pigment in the green pattern pigment is preferably 100: 5 to 100: 150. When the mass ratio is 100: 5 or more, the light transmittance of 400 nm to 450 nm can be further reduced, and the color purity can be further improved. In addition, when the ratio is 100: 150 or less, a phenomenon in which the dominant wavelength becomes a long wavelength and a phenomenon in which the deviation from the NTSC target hue becomes large can be more effectively suppressed. The mass ratio is particularly preferably in the range of 100: 30 to 100: 120.

  As a pigment for a blue pattern, a phthalocyanine pigment can be used alone or a mixture of this and a dioxazine purple pigment can be used. For example, C.I. I. Pigment blue 15: 6 and C.I. I. A mixture with Pigment Violet 23 is preferred. The mass ratio of the blue pigment to the violet pigment in the blue pattern pigment is preferably 100: 0 to 100: 30, and more preferably 100: 10 or less.

  Among them, as colorants, triallylmethane, anthraquinone, azomethine, benzylidene, oxonol, cyanine, phenothiazine, pyrrolopyrazole azomethine, xanthene, phthalocyanine, benzopyran, indigo, pyrazoleazo A colorant selected from anilinoazo, pyrazolotriazole azo, pyridone azo, and anthrapyridone is preferred.

The colorant that can be used in the present invention is a dye or a pigment having an average particle size r (unit: nm) satisfying 20 ≦ r ≦ 300, preferably 125 ≦ r ≦ 250, particularly preferably 30 ≦ r ≦ 200. desirable. By using such a pigment having an average particle diameter r, red and green pixels having a high contrast ratio and a high light transmittance can be obtained. The “average particle diameter” as used herein means the average particle diameter of secondary particles in which primary particles (single microcrystals) of the pigment are aggregated.
In addition, the particle size distribution of the secondary particles of the pigment that can be used in the present invention (hereinafter, simply referred to as “particle size distribution”) is 70% by mass of the secondary particles falling within (average particle size ± 100) nm. As mentioned above, it is desirable that it is 80 mass% or more.

  The pigment having the above average particle size and particle size distribution is preferably a commercially available pigment mixed with other pigments (optionally the average particle size usually exceeds 300 nm) optionally used with a dispersant and a solvent. As a pigment mixed liquid, it can prepare by mixing and disperse | distributing, grind | pulverizing, for example using grinders, such as a bead mill and a roll mill. The pigment thus obtained is usually in the form of a pigment dispersion.

As content of the coloring agent contained in the colored curable composition in this invention, it is preferable that it is 25-95 mass% in the total solid of a colored curable composition, and 30-90 mass% is more preferable. 40 to 80% by mass is more preferable.
If the content of the colorant is within the above range, more appropriate chromaticity can be obtained when the color filter is produced. In addition, if the content of the colorant is within the above range, the phenomenon that the photocuring does not proceed sufficiently and the strength as a film is lowered, and the phenomenon that the development latitude during alkali development is narrowed is more effectively prevented. it can.

<Dispersant>
When the colored curable composition in this invention contains a pigment as a coloring agent, it is preferable to add a dispersing agent from a viewpoint of improving the dispersibility of this pigment.

Dispersants (pigment dispersants) that can be used in the present invention include polymer dispersants [for example, polyamidoamines and salts thereof, polycarboxylic acids and salts thereof, high molecular weight unsaturated acid esters, modified polyurethanes, modified polyesters, modified polymers. (Meth) acrylate, (meth) acrylic copolymer, naphthalene sulfonic acid formalin condensate], polyoxyethylene alkyl phosphate ester, polyoxyethylene alkyl amine, alkanol amine, pigment derivative and the like.
The polymer dispersant can be further classified into a linear polymer, a terminal-modified polymer, a graft polymer, and a block polymer according to the structure.

  The polymer dispersant is adsorbed on the surface of the pigment and acts to prevent reaggregation. Therefore, a terminal-modified polymer, a graft polymer and a block polymer having an anchor site to the pigment surface can be mentioned as preferred structures. On the other hand, the pigment derivative has an effect of promoting the adsorption of the polymer dispersant by modifying the pigment surface.

  Specific examples of the pigment dispersant that can be used in the present invention include “Disperbyk-101 (polyamidoamine phosphate), 107 (carboxylic acid ester), 110 (copolymer containing an acid group), 130 (polyamide) manufactured by BYK Chemie. ), 161, 162, 163, 164, 165, 166, 170 (polymer copolymer) ”,“ BYK-P104, P105 (high molecular weight unsaturated polycarboxylic acid) ”,“ EFKA 4047, 4050, 4010, manufactured by EFKA, 4165 (polyurethane series), EFKA4330, 4340 (block copolymer), 4400, 4402 (modified polyacrylate), 5010 (polyesteramide), 5765 (high molecular weight polycarboxylate), 6220 (fatty acid polyester), 6745 (phthalocyanine) Derivatives), 6750 (azo) "Adisper PB821, PB822" manufactured by Ajinomoto Fan Techno Co., "Floren TG-710 (urethane oligomer)" manufactured by Kyoeisha Chemical Co., "Polyflow No. 50E, No. 300 (acrylic copolymer)", “Disparon KS-860, 873SN, 874, # 2150 (aliphatic polycarboxylic acid), # 7004 (polyetherester), DA-703-50, DA-705, DA-725” manufactured by Enomoto Kasei Co., Ltd., Kao “Demol RN, N (Naphthalenesulfonic acid formalin polycondensate), MS, C, SN-B (aromatic sulfonic acid formalin polycondensate)”, “Homogenol L-18 (polymer polycarboxylic acid)”, “ Emulgen 920, 930, 935, 985 (polyoxyethylene nonylphenyl ether) ”,“ acetamine 86 (stearylamine acetate) ", Lubrizol" Solsperse 5000 (phthalocyanine derivative), 22000 (azo pigment derivative), 13240 (polyesteramine), 3000, 17000, 27000 (polymer having a functional part at the end), 24000, 28000, 32000, 38500 (graft type polymer) ”,“ Nikkor T106 (polyoxyethylene sorbitan monooleate), MYS-IEX (polyoxyethylene monostearate) ”manufactured by Nikko Chemicals, and the like.

  These dispersants may be used alone or in combination of two or more. In the present invention, it is particularly preferable to use a combination of a pigment derivative and a polymer dispersant.

As content of the dispersing agent in this invention, it is preferable that it is 1-80 mass% with respect to a pigment, 5-70 mass% is more preferable, and 10-60 mass% is still more preferable.
Specifically, if a polymer dispersant is used, the amount of use thereof is preferably in the range of 5 to 100% by mass, more preferably in the range of 10 to 80% by mass with respect to the pigment. In the case of using a pigment derivative, the amount used is preferably in the range of 1 to 30% by mass, more preferably in the range of 3 to 20% by mass, based on the pigment, A range of 15% by mass is particularly preferable.

  In the present invention, when using a pigment as a colorant and a dispersant, from the viewpoint of curing sensitivity and color density, the total content of the colorant and the dispersant is the total solid content constituting the colored curable composition. On the other hand, it is preferably 30% by mass or more and 90% by mass or less, more preferably 40% by mass or more and 85% by mass or less, and further preferably 50% by mass or more and 80% by mass or less.

<Resin>
The resin is preferably, for example, a linear organic high molecular polymer that is soluble in an organic solvent. Examples of such linear organic high molecular polymers include polymers having a carboxylic acid in the side chain, such as JP-A-59-44615, JP-B-54-34327, JP-B-58-12577, and JP-B-54-. No. 25957, JP-A-59-53836, JP-A-59-71048, methacrylic acid copolymer, acrylic acid copolymer, itaconic acid copolymer, crotonic acid copolymer, etc. Examples thereof include polymers, maleic acid copolymers, partially esterified maleic acid copolymers, and acidic cellulose derivatives having a carboxylic acid in the side chain are also useful.

  Among these various resins, from the viewpoint of heat resistance, a polyhydroxystyrene resin, a polysiloxane resin, an acrylic resin, an acrylamide resin, and an acrylic / acrylamide copolymer resin are preferable. Acrylic resins, acrylamide resins, and acrylic / acrylamide copolymer resins are preferred.

As the acrylic resin, a copolymer comprising monomers selected from benzyl (meth) acrylate, (meth) acrylic acid, hydroxyethyl (meth) acrylate, (meth) acrylamide, and the like, for example, benzyl methacrylate / methacrylic acid, Each copolymer such as benzyl methacrylate / benzylmethacrylamide, KS resist-106 (manufactured by Osaka Organic Chemical Industry Co., Ltd.), cyclomer P series (manufactured by Daicel Chemical Industries, Ltd.) and the like are preferable.
By dispersing the colorant in these binders at a high concentration, it is possible to impart adhesion to the lower layer and the like, which also contributes to the coated surface shape during spin coating and slit coating.

The weight average molecular weight of the resin is preferably 5,000 or more, more preferably 10,000 to 300,000, and the number average molecular weight is preferably 1,000 or more, more preferably 2, The range is from 000 to 250,000. The polydispersity (weight average molecular weight / number average molecular weight) is preferably 1 or more, and more preferably 1.1 to 10.
These polymers may be random polymers, block polymers, graft polymers or the like.

  As addition amount of the said resin, it is preferable that it is the range of 5-20 mass% in the total solid of the colored curable composition in this invention, and 5-12 mass% is more preferable.

<Photopolymerization initiator>
As said photoinitiator, the compound which decomposes | disassembles with light and starts and accelerates | stimulates the polymerization of the polymeric compound mentioned later is mentioned, for example. Especially, it is preferable that it has absorption in the area | region of wavelength 300-500 nm. Moreover, a photoinitiator can be used individually or in combination of 2 or more types.

  Examples of the photopolymerization initiator include organic halogenated compounds, oxydiazole compounds, carbonyl compounds, ketal compounds, benzoin compounds, acridine compounds, organic peroxide compounds, azo compounds, coumarin compounds, azide compounds, metallocene compounds, biimidazoles. Compounds, organic borate compounds, disulfone compounds, oxime ester compounds, onium salt compounds, and acylphosphine (oxide) compounds.

  The photopolymerization initiator is most preferably at least one compound selected from the group consisting of a trihalomethyltriazine compound, a biimidazole compound, and an oxime compound, and most preferably a biimidazole compound, from the viewpoint of increasing sensitivity. .

As the biimidazole compound, for example, a hexaarylbiimidazole compound is preferable.
As the hexaarylbiimidazole compound, for example, JP-B-6-29285, US Pat. Nos. 3,479,185, 4,311,783, 4,622,286, etc. And, specifically, 2,2′-bis (o-chlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (o-bromophenyl) )) 4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (o, p-dichlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2 ′ -Bis (o-chlorophenyl) -4,4 ', 5,5'-tetra (m-methoxyphenyl) biidazole, 2,2'-bis (o, o'-dichlorophenyl) -4,4', 5,5 '-Tetraphenylbiimidazole, 2,2'- (O-nitrophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (o-methylphenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole 2,2′-bis (o-trifluorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole and the like.

  As content of a photoinitiator, it is preferable that it is 0.1-50 mass% with respect to the total solid of a colored curable composition from a viewpoint which acquires the effect by this invention more effectively, More preferably It is 0.1-30 mass%, Most preferably, it is 0.3-20 mass%. Within this range, good sensitivity and pattern formability can be obtained.

<Polymerizable compound>
Examples of the polymerizable compound include addition polymerizable compounds having at least one ethylenically unsaturated double bond. Among these, compounds selected from compounds having at least one, preferably two or more terminal ethylenically unsaturated bonds are preferred. Such a compound group is widely known in the industrial field, and can be used without any particular limitation in the present invention.
These have chemical forms such as monomers, prepolymers, i.e. dimers, trimers and oligomers, or mixtures thereof and copolymers thereof. Examples of monomers and copolymers thereof include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.), and esters and amides thereof. In this case, an ester of an unsaturated carboxylic acid and an aliphatic polyhydric alcohol compound, or an amide of an unsaturated carboxylic acid and an aliphatic polyvalent amine compound is used.

In addition, an addition reaction product of an unsaturated carboxylic acid ester or amide having a nucleophilic substituent such as a hydroxyl group, amino group or mercapto group with a monofunctional or polyfunctional isocyanate or epoxy, and monofunctional or polyfunctional A dehydration condensation reaction product with a functional carboxylic acid is also preferably used.
Further, an addition reaction product of an unsaturated carboxylic acid ester or amide having an electrophilic substituent such as an epoxy group or an epoxy group with a monofunctional or polyfunctional alcohol, amine or thiol, a halogen group or In addition, a substitution reaction product of an unsaturated carboxylic acid ester or amide having a leaving substituent such as a tosyloxy group and a monofunctional or polyfunctional alcohol, amine or thiol is also suitable.
As another example, it is also possible to use a group of compounds substituted with unsaturated phosphonic acid, styrene, vinyl ether or the like instead of the unsaturated carboxylic acid.

  Specific examples of the monomer of an ester of an aliphatic polyhydric alcohol compound and an unsaturated carboxylic acid include acrylic acid esters such as ethylene glycol diacrylate, triethylene glycol diacrylate, 1,3-butanediol diacrylate, and tetramethylene glycol. Diacrylate, propylene glycol diacrylate, neopentyl glycol diacrylate, trimethylolpropane triacrylate, trimethylolpropane tri (acryloyloxypropyl) ether, trimethylolethane triacrylate, hexanediol diacrylate, 1,4-cyclohexanediol diacrylate , Tetraethylene glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate , Pentaerythritol tetraacrylate, dipentaerythritol diacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol tetraacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate, tri (acryloyloxyethyl) isocyanurate, polyester acrylate oligomer, isocyanuric acid There are EO-modified triacrylate and the like.

  The content of the polymerizable compound is preferably 5 to 50% by mass, more preferably 7 to 40% by mass, and more preferably 10 to 35% by mass in the solid content of the colored curable composition in the present invention. More preferably.

<Solvent>
Examples of the solvent include acetone, methyl ethyl ketone, cyclohexane, ethyl acetate, ethylene dichloride, tetrahydrofuran, toluene, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol dimethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, acetylacetone. , Cyclohexanone, diacetone alcohol, ethylene glycol monomethyl ether acetate, ethylene glycol ethyl ether acetate, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether acetate, 3-methoxypropanol, methoxymethoxyethanol, diethylene glycol monomethyl ether, di Tylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, 3-methoxypropyl acetate, N, N-dimethylformamide, dimethyl sulfoxide, γ-butyrolactone, methyl lactate, lactic acid Examples include ethyl.
These solvents can be used alone or in combination. When the colored curable composition contains a solvent, the solid content in the colored curable composition is preferably 2 to 60% by mass.

<Other ingredients>
(Sensitizer)
The colored curable composition in the present invention may contain at least one sensitizer.
As the sensitizer, a radical initiator that is sensitized by an electron transfer mechanism or an energy transfer mechanism is preferable.
Examples of the sensitizer include those belonging to the compounds listed below and having an absorption wavelength in a wavelength region of 300 nm to 450 nm.
Examples of preferred sensitizers include those belonging to the following compounds and having an absorption wavelength in the range of 330 nm to 450 nm.

  Examples of the sensitizer include polynuclear aromatics (for example, phenanthrene, anthracene, pyrene, perylene, triphenylene, 9,10-dialkoxyanthracene), xanthenes (for example, fluorescein, eosin, erythrosine, rhodamine B). , Rose Bengal), thioxanthones (isopropylthioxanthone, diethylthioxanthone, chlorothioxanthone), cyanines (eg thiacarbocyanine, oxacarbocyanine), merocyanines (eg merocyanine, carbomerocyanine), phthalocyanines, thiazines (eg, Thionine, methylene blue, toluidine blue), acridines (eg, acridine orange, chloroflavin, acriflavine), anthraquinones (eg, anthraquinone) Squariums (eg, squalium), coumarins (eg, 7-diethylamino-4-methylcoumarin), ketocoumarins, phenothiazines, phenazines, styrylbenzenes, azo compounds, diphenylmethane, triphenylmethane, distyrylbenzenes, carbazole , Porphyrins, spiro compounds, quinacridone, indigo, styryl, pyrylium compounds, pyromethene compounds, pyrazolotriazole compounds, benzothiazole compounds, barbituric acid derivatives, thiobarbituric acid derivatives, acetophenone, benzophenone, thioxanthone, Michler's ketone and other aromatics Examples include ketone compounds and heterocyclic compounds such as N-aryloxazolidinones.

  As examples of more preferable sensitizers, for example, sensitizing dyes described in JP-A-2006-274076, paragraphs 0125 to 0137 and JP-A-2006-91479, paragraphs 0151 to 0185 can be appropriately selected and used.

  The content of the sensitizer is preferably 0.1% by mass to 20% by mass, more preferably 0.1% by mass to 20% by mass in the total solid content of the colored curable composition, and 0.2% by mass. -20 mass% is still more preferable.

(Co-sensitizer)
The colored curable composition in the present invention may contain at least one co-sensitizer.
Examples of the co-sensitizer include amines such as M.I. R. Sander et al., “Journal of Polymer Society”, Vol. 10, 3173 (1972), Japanese Patent Publication No. 44-20189, Japanese Patent Publication No. 51-82102, Japanese Patent Publication No. 52-134692, Japanese Patent Publication No. 59-138205. No. 60-84305, JP-A 62-18537, JP-A 64-33104, Research Disclosure 33825, and the like. Specific examples include triethanolamine. P-dimethylaminobenzoic acid ethyl ester, p-formyldimethylaniline, p-methylthiodimethylaniline and the like.

  Other examples of co-sensitizers include thiols and sulfides such as thiol compounds described in JP-A-53-702, JP-B-55-500806, JP-A-5-142772, No. 56-75643, such as 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzimidazole, 2-mercapto-4 (3H) -quinazoline, β-mercapto. And naphthalene.

  Other examples of the co-sensitizer include amino acid compounds (eg, N-phenylglycine), organometallic compounds described in JP-B-48-42965 (eg, tributyltin acetate), JP-B 55- Examples include a hydrogen donor described in Japanese Patent No. 34414, a sulfur compound (eg, trithiane) described in Japanese Patent Laid-Open No. 6-308727, and the like.

  The total content of the co-sensitizer is preferably in the range of 0.2 to 30% by mass, more preferably in the range of 0.5 to 25% by mass, based on the total solid content of the colored curable composition. The range of ˜20% by mass is more preferable.

(Polymerization inhibitor)
The colored curable composition in the present invention may contain at least one polymerization inhibitor.
Examples of the thermal polymerization inhibitor that can be used in the present invention include hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4′-thiobis (3-methyl-6). -T-butylphenol), 2,2'-methylenebis (4-methyl-6-t-butylphenol), N-nitrosophenylhydroxyamine primary cerium salt and the like.

  The addition amount of the thermal polymerization inhibitor is preferably about 0.01% by mass to about 5% by mass with respect to the mass of the entire composition. If necessary, a higher fatty acid derivative such as behenic acid or behenic acid amide may be added to prevent polymerization inhibition due to oxygen, and it may be unevenly distributed on the surface of the photosensitive layer in the course of drying after coating. . The amount of the higher fatty acid derivative added is preferably about 0.5% by mass to about 10% by mass of the total composition.

(Adhesion improver)
The colored curable composition in the present invention may contain at least one adhesion improver.
In the present invention, it is preferable to add an adhesion improver in order to improve adhesion to a hard surface (substrate) as a base material. Examples of the adhesion improver include a silane coupling agent and a titanium coupling agent.

Examples of the silane coupling agent include γ- (2-aminoethyl) aminopropyltrimethoxysilane, γ- (2-aminoethyl) aminopropyldimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxy. Silane, γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-methacryloxypropyltrimethoxysilane, γ-methacryloxypropyltriethoxysilane, γ-acryloxypropyltrimethoxysilane, γ-acryloxypropyl Triethoxysilane, γ-isocyanatopropyltrimethoxysilane, γ-isocyanatopropyltriethoxysilane, N-β- (N-vinylbenzylaminoethyl) -γ-aminopropyltrimethoxysilane / hydrochloride, γ-glycidoxypro Pyrtrimethoxysilane, γ-glycidoxypropyltriethoxysilane, aminosilane, γ-mercaptopropyltrimethoxysilane, γ-mercaptopropyltriethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, vinyltriacetoxysilane, γ- Chloropropyltrimethoxysilane, hexamethyldisilazane, γ-anilinopropyltrimethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (β-methoxyethoxy) silane, octadecyldimethyl [3- (trimethoxysilyl) propyl ] Ammonium chloride, γ-chloropropylmethyldimethoxysilane, γ-mercaptopropylmethyldimethoxysilane, methyltrichlorosilane, dimethyldichlorosilane, trimethyl Chlorosilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, bisallyltrimethoxysilane, tetraethoxysilane, bis (trimethoxysilyl) hexane, phenyltrimethoxysilane, N- (3-acryloxy-2-hydroxy Propyl) -3-aminopropyltriethoxysilane, N- (3-methacryloxy-2-hydroxypropyl) -3-aminopropyltriethoxysilane, (methacryloxymethyl) methyldiethoxysilane, (acryloxymethyl) methyldimethoxysilane , Etc.
Among them, γ-methacryloxypropyltrimethoxysilane, γ-methacryloxypropyltriethoxysilane, γ-acryloxypropyltrimethoxysilane, γ-acryloxypropyltriethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-aminopropyltri Ethoxysilane and phenyltrimethoxysilane are preferred, and γ-methacryloxypropyltrimethoxysilane is most preferred.

  The addition amount of the adhesion improver is preferably 0.5 to 30% by mass and more preferably 0.7 to 20% by mass in the total solid content of the colored curable composition.

(Other additives)
Furthermore, in this invention, you may add well-known additives, such as an inorganic filler, a plasticizer, and a fat-sensitizing agent, in order to improve the physical property of a cured film.
Examples of plasticizers include dioctyl phthalate, didodecyl phthalate, triethylene glycol dicaprylate, dimethyl glycol phthalate, tricresyl phosphate, dioctyl adipate, dibutyl sebacate, and triacetyl glycerin. 10 mass% or less can be added with respect to the total mass of the compound which has an ionic unsaturated double bond, and a binder.

≪Display device≫
The display device of the present invention includes a color filter manufactured by the above-described method for manufacturing a color filter of the present invention.
With such a configuration, variation in cell gap can be suppressed, and thus a display device with excellent display quality in which display unevenness is suppressed can be obtained.

  Examples of the display device include a liquid crystal display device, a plasma display display device, an EL display device, and a CRT display device. For the definition of display devices and explanation of each display device, refer to “Electronic Display Devices (Akio Sasaki, published by Industrial Research Institute 1990)”, “Display Devices (Junaki Ibuki, Industrial Books Co., Ltd.) Issue)). Among these, a liquid crystal display device is preferable.

In addition, the liquid crystal display device generally includes various members such as a counter substrate such as a TFT substrate, a polarizing plate, a retardation film, a backlight, a spacer, a viewing angle compensation film, an antireflection film, a light diffusion film, and an antiglare film. Can be configured.
For example, “'94 Liquid Crystal Display Peripheral Materials and Chemicals Market” (Kentaro Shima, CMC Co., Ltd., published in 1994), “2003 Current Status and Future Prospects of LCD Related Markets (Volume 2)” (Table) Yoshiyoshi, Fuji Chimera Research Institute, Ltd., 2003, etc.).

  The liquid crystal display device is described in, for example, “Next Generation Liquid Crystal Display Technology” (edited by Tatsuo Uchida, Industrial Research Committee, published in 1994). The display device of the present invention is not particularly limited, and can be applied to various types of liquid crystal display devices described in, for example, the “next generation liquid crystal display technology”. Among these, it is particularly effective for a color TFT liquid crystal display device.

  The color TFT liquid crystal display device is described in, for example, “Color TFT liquid crystal display” (Kyoritsu Publishing Co., Ltd., issued in 1996). Furthermore, the present invention can also be applied to a liquid crystal display device with a wide viewing angle, such as a horizontal electric field driving method such as IPS and a pixel division method such as MVA. These methods are described in, for example, “EL, PDP, LCD Display -Technology and Latest Trends in the Market-” (Toray Research Center Research Division, p. 43, issued in 2001).

  There is no restriction | limiting in particular as a display system of the liquid crystal display device of this invention, According to the objective, it can select suitably. For example, ECB (Electrically Controlled Birefringence), TN (Twisted Nematic), OCB (Optically Compensatory Bend), VA (Vertically Aligned), PVA (Patterned Vertically Aligned), MVA (Multi-domain Vertically Aligned), HAN (Hybrid Aligned Nematic) , STN (Super Twisted Nematic), IPS (In-Plane Switching), GH (Guest Host), FLC (ferroelectric liquid crystal), AFLC (antiferroelectric liquid crystal), PDLC (polymer dispersion type liquid crystal), etc. Suitable for method Possible it is.

  EXAMPLES Hereinafter, although an Example demonstrates this invention further more concretely, this invention is not limited to a following example. For example, in the following example, a substrate having a size of 100 mm × 100 mm is used, but the present invention can be similarly applied to a large substrate exceeding 1000 × 1000 mm. The following examples were conducted under conditions of an air temperature of 23 ° C., a humidity of 50%, and a dew point of 13 ° C.

[Example 1]
≪Preparation of color filter≫
<Formation of resin black matrix>
A non-alkali glass substrate (OA-10, manufactured by Nippon Electric Glass Co., Ltd.) having a size of 100 mm × 100 mm × 0.7 mm was washed with a UV cleaning device, then brush-cleaned with a cleaning agent, and further ultrasonically cleaned with ultrapure water. This substrate was heat treated at 120 ° C. for 3 minutes to stabilize the surface state. And after cooling this substrate and adjusting the temperature to 23 ° C., a V-259 black resist material (dark color resin composition) manufactured by Nippon Steel Chemical Co., Ltd. on a glass substrate coater having a slit-like nozzle on the temperature-adjusted substrate. ) Was applied. The coating speed at this time was 100 mm / sec, and the distance (clearance) between the substrate and the tip of the coating head was 250 μm. After the application, it was baked in an oven at 120 ° C. for 3 minutes to obtain a dark resin layer K1.
Next, using a proximity type exposure machine having an ultrahigh pressure mercury lamp, the dark color resin layer K1 was subjected to pattern exposure at an exposure amount of 300 mJ / cm ² . In this pattern exposure, a substrate on which the dark resin layer K1 is formed and a hard mask (quartz exposure mask having a black matrix pattern) in which stripes having a width of 30 μm are arranged at a pitch of 100 μm, a mask surface and the dark resin layer K1. The distance between was set to 200 μm.
Next, pure water is sprayed on the surface of the dark-colored resin layer K1 that has been subjected to pattern exposure to uniformly wet the surface of the dark-colored resin layer K1, and then a KOH-based developer (KOH, containing a nonionic surfactant, Product name: CDK-1, Fuji Film Electronics Materials Co., Ltd.) was diluted 100 times, and shower developed at 23 ° C. for 80 seconds with a nozzle pressure of 0.04 MPa to obtain a patterning image. Subsequently, ultrapure water was sprayed onto the patterning image forming surface on the substrate with an ultrahigh pressure cleaning nozzle at a pressure of 9.8 MPa to remove residues, and ultrapure water was sprayed from both sides with a shower nozzle to adhere. The developer and the dissolved product of the dark color resin layer K1 were removed, and the liquid was removed with an air knife. Thereafter, the substrate after draining was heat-treated at 220 ° C. for 30 minutes to obtain a resin black matrix (substrate with resin black matrix). The film thickness of the obtained resin black matrix was 0.8 μm.

<Formation of colored layer (green layer G1)>
The substrate with the resin black matrix obtained above was cleaned with a UV cleaning device, and then rinsed with ultrapure water. Next, the substrate with resin black matrix after the rinse cleaning was heat-treated at 120 ° C. for 3 minutes to stabilize the surface state, and then cooled to adjust the substrate temperature to 23 ° C.
Next, the green curable composition G1 prepared by the method described later is applied to a glass substrate coater having slit-like nozzles on the surface of the substrate whose temperature is adjusted to 23 ° C. where the resin black matrix is formed. Then, slit coating was performed under the following conditions.

~ Slit application condition ~
・ Application speed: 100mm / sec
-Distance (clearance) between substrate and coating head tip: 250 μm
・ Application temperature: 23 ℃

Next, using the vacuum drying apparatus as shown in FIG. 1, the applied green curable composition G1 was dried as follows (drying step).
First, the vent valve 34 is opened, the vacuum chamber 12 with the main valve 24 closed is opened, and the substrate 20 (hereinafter simply referred to as “substrate 20”) on which the coating liquid (green curable composition G1) has been applied. ”) And was placed on the cooling plate 16 whose temperature was adjusted so that the surface temperature was 13 ° C. At this time, it was placed so that the surface opposite to the surface to which the coating liquid was applied was in contact with the surface of the cooling plate 16. Further, a thermocouple was attached to the surface opposite to the surface on which the coating liquid was applied (the surface on the side in contact with the surface of the cooling plate 16), and the substrate temperature was measured using this thermocouple.

  After placing the substrate 20 on the cooling plate 16, the vacuum chamber 12 was closed, the vent valve 34 was closed, the main valve 24 was opened, and evacuation in the vacuum chamber 12 was started. At this time, the orifice valve 22 was adjusted so that the vacuum was exhausted over 9 seconds until the degree of vacuum was 60 kPa. Next, the orifice valve 22 was fully opened to exhaust the vacuum to 1 kPa or less, and held for 5 seconds after reaching the vacuum of 1 kPa or less. Thereafter, at the same time when the substrate 20 was separated from the cooling plate 16, the vent valve 34 was opened, and the vacuum chamber 12 was further opened to carry out the substrate 20.

FIG. 3 is a graph showing temporal changes in the degree of vacuum in the vacuum chamber and the substrate temperature in the drying step.
In FIG. 3, the horizontal axis represents the elapsed time (unit: seconds) from the start of exhaust in the vacuum chamber, the left vertical axis represents the degree of vacuum in the vacuum chamber (unit: kPa), and the right vertical axis represents coating. It represents the temperature of the substrate on which the liquid has been applied. The measurement result of the degree of vacuum is represented by a rhombus plot, and the measurement result of the substrate temperature is represented by a triangle plot.

As shown in FIG. 3, the degree of vacuum in the vacuum chamber gradually changed to 60 kPa until 9 seconds after the start of evacuation in the vacuum chamber, and rapidly changed after 10 seconds. Specifically, the pressure was reduced to 10 kPa, which is 1/10 of the atmospheric pressure, over 11 to 12 seconds. Further, the degree of vacuum became 1 kPa or less when 13 seconds passed, and was maintained for 5 seconds in the state of 1 kPa or less, and then returned to atmospheric pressure in 3 seconds.
On the other hand, the substrate temperature was 25 ° C. at the start of evacuation, but began to decrease at the same time as the start of evacuation, and reached 13 ° C. after 4 seconds from the start of evacuation. Thereafter, the temperature rose to 24 ° C. over 2 seconds.

By the above, the green curable composition G1 was dried and the green layer G1 was formed on the board | substrate with a resin black matrix, and the board | substrate with the green layer G1 was obtained as a board | substrate with a coating film.
Thereafter, the formed green layer G1 was pre-baked at 120 ° C. for 3 minutes. The film thickness of the green layer G1 after pre-baking was 2.0 μm.

<Formation of colored pattern (green pattern G1)>
Next, the green layer G1 formed as described above was exposed and developed as follows to obtain a green pattern G1.

First, using a proximity type exposure machine (manufactured by Hitachi High-Tech Electronics Engineering Co., Ltd.) having an ultra-high pressure mercury lamp, a substrate with a green layer G1 and a mask (quartz exposure mask having a green pixel pattern) were set up vertically. In the state, the distance between the mask surface and the green layer G1 was set to 200 μm, and pattern exposure was performed with an exposure amount of 120 mJ / cm ² . The pattern exposure was performed by reducing the atmosphere in the exposure machine to 0.04 MPa.

Next, pure water is sprayed with a shower nozzle to uniformly wet the surface of the green layer G1, and then a KOH developer (KOH, containing nonionic surfactant, trade name: CDK-1, Fuji Film Electronics) The material was a 100-fold diluted solution at 80 ° C. for 80 seconds with a flat nozzle pressure of 0.04 MPa to obtain a patterning image. Subsequently, ultrapure water was sprayed onto the patterning image forming surface on the substrate with an ultrahigh pressure cleaning nozzle at a pressure of 9.8 MPa to remove residues, and ultrapure water was sprayed from both sides with a shower nozzle to adhere. The developing solution and the dissolved substance of the green layer G1 were removed, and the liquid was removed with an air knife. Thereafter, post-exposure was performed on the substrate after draining with an exposure amount of 500 mJ / cm ² from the patterning image non-formation surface side. Thereafter, the substrate with the patterned image after the post-exposure was subjected to a heat treatment (post-bake) at 230 ° C. for 30 minutes to obtain a green pattern G1.
As described above, a single color green color filter (color filter substrate) having a resin black matrix and a green pattern G1 on the substrate was obtained.

  Furthermore, a three-color color filter (color filter substrate) having a resin black matrix, a red pattern, a green pattern, and a blue pattern on the substrate can be produced as follows.

<Formation of red pattern>
In the formation of the green pattern G1, the green curable composition G1 is replaced with a red curable composition R1 that can be prepared by the method described later, and a quartz exposure mask having a green pixel pattern is used instead of a quartz exposure mask having a red pixel pattern. A red pattern can be formed by the same method as the formation of the green pattern G1 except that the mask is replaced.

<Formation of blue pattern>
In the formation of the green pattern, the green curable composition G1 is replaced with a blue curable composition B1 that can be prepared by a method described later, and a quartz exposure mask having a green pixel pattern is replaced with a quartz exposure mask having a blue pixel pattern. A blue pattern can be formed by the same method as the formation of the green pattern G1 except that it is replaced.

  As described above, a three-color filter having a resin black matrix, a red pattern, a green pattern, and a blue pattern on the substrate can be obtained.

≪Preparation of colored curable composition≫
Hereinafter, the preparation method of the above-mentioned green curable composition G1, red curable composition R1, and green curable composition B1 is demonstrated.

<Preparation of green curable composition G1>
(Preparation of pigment dispersion G1)
As a pigment, C.I. I. Pigment Green 36 and C.I. I. 40 parts by mass of a 30/70 (mass ratio) mixture with Pigment Yellow 219, and 10 parts by mass (approximately 4. 51 parts by mass) and 150 parts by mass of ethyl 3-ethoxypropionate as a solvent were mixed and dispersed by a bead mill for 15 hours to prepare a pigment dispersion G1.
With respect to the obtained pigment dispersion G1, the average particle diameter of the pigment was measured by a dynamic light scattering method and found to be 200 nm.

(Preparation of green curable composition G1)
The components of the following composition G-1 were mixed and dissolved to prepare a green curable composition G1.
-Composition G-1
-Pigment dispersion G1 ... 600 parts by mass-Alkali-soluble resin (benzyl methacrylate / methacrylic acid / hydroxyethyl methacrylate copolymer, molar ratio: 80/10/10, Mw: 10,000) ... 190 parts by mass Pentaerythritol hexaacrylate [polymerizable compound] 60 parts by mass. 2,2′-bis (2-chlorophenyl) -4,4 ′, 5,5′-tetraphenyl-1,2′-biimidazole [light Polymerization initiator] ... 60 parts by mass / compound 1 below [sensitizer] ... 40 parts by mass / compound 2 below (co-sensitizer) ... 40 parts by mass / surfactant (trade name: Tetra Nick 150R1, BASF Corp.) ... 1 part by mass / propylene glycol monomethyl ether acetate [solvent] ... 1000 parts by mass / gamma-methacryloxypropi Lutriethoxysilane [Adhesion improver] ・ ・ ・ 5 parts by mass

<Preparation of red curable composition R1>
In the preparation of the green curable composition G1, C.I. I. Pigment Green 36 and C.I. I. 30/70 (mass ratio) mixture with CI Pigment Yellow 219 I. Pigment red 254 and C.I. I. The red curable composition R1 can be prepared by the same method as the green curable composition G1 except that it is replaced with a 70/30 (mass ratio) mixture with CI pigment red 177.

<Preparation of blue curable composition B1>
In the preparation of the green curable composition G1, C.I. I. Pigment Green 36 and C.I. I. 30/70 (mass ratio) mixture with CI Pigment Yellow 219 I. Pigment blue 15: 6 and C.I. I. The blue curable composition B1 can be prepared by the same method as the green curable composition G1 except that the mixture is replaced with an 80/20 (mass ratio) mixture with pigment violet 23.

≪Production of liquid crystal display device≫
A liquid crystal panel for evaluation can be manufactured using the RGB color filter substrate described above. Hereinafter, the procedure of the VA mode liquid crystal cell (liquid crystal panel) for vertically aligning the liquid crystal material will be described.

<Formation of transparent electrode film>
The color filter substrate is cleaned with a UV cleaning device and then rinsed with ultrapure water. The color filter substrate after the rinse cleaning is heat-treated at 120 ° C. for 3 minutes to stabilize the surface state. An ITO thin film is formed on the substrate by an ITO target using a ULVAC vacuum sputtering apparatus. By setting the film forming temperature to 200 ° C. and the O ₂ / Ar flow rate ratio to 1.2, an ITO thin film (transparent electrode film) having a surface resistance of 20Ω / □ or less and a transmittance of 97% (550 nm) can be obtained.

<Fabrication of counter substrate>
A transparent glass substrate (Nippon Electric Glass Co., Ltd. OA-10) is cleaned with a UV cleaning device, then brush-cleaned with a cleaning agent, and further ultrasonically cleaned with ultrapure water. The substrate is heat treated at 120 ° C. for 3 minutes to stabilize the surface state. Next, a transparent conductive film is formed by the same method as described for the formation of the transparent electrode to obtain a counter substrate.

<Formation of alignment layer>
A polyimide alignment layer is formed on the color filter and the transparent conductive film of the counter substrate. As the alignment material, JSR polyimide JALS204 is used, and is selectively applied to the region where the pixel electrode is disposed by an inkjet method. After coating, pre-baking is performed for 15 minutes in an atmosphere at 80 ° C., and baking is further performed at 200 ° C. for 60 minutes. Thereby, an alignment layer having a thickness of about 0.5 μm is obtained.

<Formation of seal pattern>
A seal pattern is formed around the counter substrate. Specifically, an epoxy resin containing 1 wt% of spacer particles (Strectbond XN-21S manufactured by Nissan Chemical Industries) is printed with a seal dispenser device with a portion corresponding to the liquid crystal injection port opened in a predetermined area surrounding the display area. To do. This is calcined at 80 ° C. for 30 minutes.

<Spacer dispersion>
The display area surrounded by the seal pattern on the counter substrate is sprayed using a dry spacer spraying device. As the scattering spacer material, a spacer material having a particle size of 5 μm is used.

<Overlay>
While aligning so that the counter substrate and the color filter substrate overlap at the correct position, they are aligned with the overlay device. In this state, while applying a pressure of 0.03 Mpa, the bonded glass substrate is heat-treated at 180 ° C. for 90 minutes to cure the sealing agent, thereby obtaining a laminate of two glass substrates. A balloon-type baking apparatus is used for baking.

<Liquid crystal injection>
A liquid crystal material is injected into the glass substrate laminate using a liquid crystal injection device. The liquid crystal material is MLC-6608 manufactured by Merck Co., Ltd., which is put in a liquid crystal dish, and deaerated while being held in a vacuum chamber with a substrate laminate for 60 min under a vacuum of 10 ⁻¹ Pa. After sufficiently evacuating the vacuum, the portion of the inlet provided in the seal is immersed in liquid crystal, and then returned to atmospheric pressure and held for 180 minutes to fill the gap between the glass substrates. Thereafter, the substrate laminate is taken out from the injection device, and a UV curable epoxy adhesive is applied to the injection port portion and cured to obtain a liquid crystal cell.

<Polarizing plate pasting>
A polarizing plate HLC2-2518 manufactured by Sanlitz Co., Ltd. is attached to both surfaces of the liquid crystal cell in an arrangement in which the absorption axes are orthogonal to each other to obtain a liquid crystal panel.

  The liquid crystal panel described above is manufactured using a color filter in which the height of the stepped portion of the colored pattern generated on the part that runs on the partition is reduced, the thickness of the partition is less affected, and the flatness of the colored pattern is high. Therefore, the variation in the cell gap is small and the occurrence of display unevenness is suppressed.

≪Evaluation (step measurement) ≫
With respect to the green pattern G1 of the green single color filter obtained as described above, the level difference of the level difference formed on the portion of the green color filter G1 on the resin black matrix was measured (height h in FIG. 2). The level difference was measured using a contact type surface roughness meter P-10 (manufactured by TENCOR).
The measurement results are shown in Table 1.

[Example 2]
In Example 1, when the green curable composition G1 was dried, the orifice valve was fully opened simultaneously with the start of evacuation in the vacuum chamber, and the green was evacuated to a vacuum degree of 1 kPa or less in 5 seconds. A monochromatic color filter was prepared and evaluated in the same manner as in Example 1. The evaluation results are shown in Table 1.

Further, FIG. 4 shows temporal changes in the degree of vacuum in the vacuum chamber and the substrate temperature at this time.
As shown in FIG. 4, the degree of vacuum in the vacuum chamber reaches 10 kPa, which is 1/10 of the atmospheric pressure after 3 seconds from the start of evacuation in the vacuum chamber, becomes 1 kPa or less after 5 seconds, and is 1 kPa or less. The state was kept for another 13 seconds, and then returned to atmospheric pressure in 3 seconds.
On the other hand, the substrate temperature showed the same behavior as in Example 1.

[Comparative Example 1]
In Example 1, the green curable composition G1 was dried in the same manner as in Example 1 except that the temperature in the cooling plate was adjusted to evacuate the vacuum chamber while maintaining the substrate temperature at 23 ° C. A monochromatic color filter was prepared and evaluated in the same manner as in Example 1. The evaluation results are shown in Table 1.

Further, FIG. 5 shows temporal changes in the degree of vacuum in the vacuum chamber and the substrate temperature at this time.
As shown in FIG. 5, the degree of vacuum in the vacuum chamber showed the same behavior as in Example 1.
On the other hand, the substrate temperature was about 25 ° C. at the start of evacuation, but at the same time as the start of evacuation, the substrate temperature dropped by 2 ° C. to 23 ° C. and was maintained at 23 ° C. for 17 seconds.

[Comparative Example 2]
In Example 1, when the green curable composition G1 was dried, the temperature in the cooling plate was adjusted to evacuate the vacuum chamber while maintaining the substrate temperature at 23 ° C., and the evacuation in the vacuum chamber started. Immediately thereafter, the orifice valve was fully opened, and a green color filter was prepared in the same manner as in Example 1 except that the vacuum was exhausted to 1 kPa or less in 5 seconds. Evaluation was performed in the same manner as in Example 1. The evaluation results are shown in Table 1.

Further, FIG. 6 shows temporal changes in the degree of vacuum in the vacuum chamber and the substrate temperature at this time.
As shown in FIG. 6, the degree of vacuum in the vacuum chamber showed the same behavior as in Example 2, and the substrate temperature showed the same behavior as in Comparative Example 1.

  As shown in Table 1, the color filters of Examples 1 and 2 in which the substrate was cooled and dried by reducing the atmosphere, the height of the stepped portion of the colored pattern was small, and the flatness was excellent.

It is a conceptual diagram which shows the vacuum dryer which can be used for one form of this invention. It is sectional drawing which represented typically the color filter produced by forming a coloring pattern in the partition formation surface on a board | substrate. 4 is a graph showing temporal changes in the degree of vacuum in the vacuum chamber and the substrate temperature in Example 1. 6 is a graph showing temporal changes in the degree of vacuum in a vacuum chamber and the substrate temperature in Example 2. 6 is a graph showing temporal changes in the degree of vacuum in a vacuum chamber and the substrate temperature in Comparative Example 1. 10 is a graph showing temporal changes in the degree of vacuum in the vacuum chamber and the substrate temperature in Comparative Example 2.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Vacuum dryer 12 Vacuum chamber 16 Cooling plate 20 The board | substrate 22 with which the coating liquid was apply | coated Orifice valve 24 Main valve 26 Mechanical booster pump 28 Rotary pump 30 Exhaust pipe 32 Exhaust pipe 34 Vent valve 38 Vacuum gauge 40 Substrate 42 Partition wall 44 Coloring pattern

Claims (6)

An application step of applying a coating liquid to a surface of the substrate having unevenness on the surface where the unevenness exists;
A drying step of drying the applied coating solution by cooling the substrate and reducing the atmosphere.
The manufacturing method of the board | substrate with a coating film which has this.   The said drying process cools the said board | substrate to 5 to 20 degreeC, The manufacturing method of the board | substrate with a coating film of Claim 1 characterized by the above-mentioned.   The drying step is a step of reducing the atmosphere from atmospheric pressure to 1/10 of atmospheric pressure over 10 seconds, a step of reducing the atmosphere reduced to 1/10 of atmospheric pressure to 5 kPa or less, and The manufacturing method of the board | substrate with a coating film of Claim 1 or Claim 2 characterized by the above-mentioned. A partition formation step of forming a partition on the substrate;
The coating liquid which consists of a colored curable composition is apply | coated to the surface at the side in which the partition of the said board | substrate was formed using the manufacturing method of the board | substrate with a coating film of any one of Claims 1-3. A colored layer forming step of drying to form a colored layer;
A colored pattern forming step of exposing the developed colored layer and developing to form a colored pattern; and
The manufacturing method of the color filter which has this.   The color filter manufactured using the manufacturing method of the color filter of Claim 4.   A display device comprising the color filter according to claim 5.

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