JP2008233139A - Semi-transmission type liquid crystal display panel and manufacturing method thereof - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a semi-transmission type liquid crystal display panel which is provided with a columnar spacer made of photoresist on an array substrate side and hardly causes a light leak, and the manufacturing method thereof. <P>SOLUTION: The semi-transmission type liquid crystal display panel 10A of the present invention comprises: an array substrate AR1 having a plurality of scan lines and signal lines 13 arranged in matrix, pixel electrodes 18 formed in positions defined by the scan lines 13 and signal lines 13, and reflection plates 16 each formed partially on the lower surface of a pixel electrode 18; and a columnar spacer 20 formed between the array substrate AR1 and a color filter substrate, and is characterized in that the columnar spacer 20 is formed on the side of the array substrate AR1, and a part of the reflection plate 16 which is not coated with the pixel electrode 18 is coated with an overcoat layer 21 which is formed of the same material with the columnar spacer 20 and shorter than the columnar spacer 20 in height. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

The present invention relates to a transflective liquid crystal display panel in which columnar spacers made of a photoresist for adjusting a cell gap are provided on the array substrate side, which hardly causes light leakage, and a manufacturing method thereof.

As a liquid crystal display panel used for a portable device in recent years, a transflective liquid crystal display panel having both transmissive and reflective properties is often used. This transflective liquid crystal display device has a transmissive part with a transparent electrode and a reflective part with a reflective layer in one pixel,
In a dark place, turn on the backlight and display the image using the transmissive part of the pixel area,
In bright places, images are displayed using external light at the reflecting part without turning on the backlight, so there is no need to turn on the backlight at all times, so power consumption can be greatly reduced. Has advantages.

On the other hand, in the liquid crystal display panel, a spacer is necessary in order to keep the distance between each pixel electrode and the counter electrode, that is, the thickness (cell gap) of the liquid crystal layer constant. If a columnar spacer made of photoresist is used as this spacer, it can be formed integrally with one substrate, and the height can be made constant and the display area can be avoided, so that the display image quality is good. It has the advantage of becoming.

Also in a transflective liquid crystal display panel, as disclosed in, for example, Patent Documents 1 and 2 below, columnar spacers made of a photoresist are used. This columnar spacer can be provided on the color filter substrate side (see Patent Document 1 below) or on the array substrate side (see Patent Document 2 below).
JP 2002-72220 A JP 2004-226612 A

However, the reflective part in the array substrate of the transflective liquid crystal display panel is transparent ITO.
A reflection plate made of, for example, aluminum or aluminum alloy is formed below the pixel electrode made of (Indium Thin Oxide) or the like. In order to prevent light leakage from the peripheral portion of the pixel electrode, the reflector is formed to be the same as or slightly larger than the normal pixel electrode.

On the other hand, an alkaline solution is usually used as a photoresist developer, but when a columnar spacer made of photoresist is formed on the surface of the array substrate of the transflective liquid crystal display panel,
It is necessary to develop the exposed photoresist by immersing it in an alkaline developer.

However, at the time of development, since the reflecting plate comes into contact with the developing solution, the reflecting plate and the pixel electrode come into contact with the alkaline developing solution at the same time. Therefore, a battery reaction occurs between the reflecting plate and the pixel electrode, and reflection occurs. The plate will dissolve. When the amount of dissolution of the reflection plate is large, the reflection plate is retracted inward from the periphery of the pixel electrode, and light from the backlight leaks to cause lighting defects.

The inventors have conducted various experiments to solve the problems of the above-described transflective liquid crystal display panel, and as a result, the reflecting plate does not come into contact with the developer during the development of the columnar spacer made of photoresist. The present inventors have found that this can be solved and have completed the present invention. That is, the present invention provides a transflective liquid crystal display panel with good display image quality, in which the reflection plate is prevented from being etched during the development of a columnar spacer made of a photoresist, and light leakage at the reflection portion is prevented, and the display An object is to provide a manufacturing method.

In order to solve the above-described object, a liquid crystal display panel of the present invention includes a plurality of scanning lines and signal lines arranged in a matrix, and pixel electrodes formed at respective positions partitioned by the scanning lines and signal lines. , An array substrate including a reflective plate partially formed on the lower surface of the pixel electrode, a color filter substrate provided to face the array substrate, and formed between the array substrate and the color filter substrate Columnar spacers made of a plurality of photoresists,
The columnar spacer is formed on the array substrate side, and the portion of the reflector that is not covered with the pixel electrode is an overcoat layer having a height lower than that of the columnar spacer formed of the same material as the columnar spacer. It is characterized by being coated.

According to the transflective liquid crystal display panel having such a configuration, the portion of the reflector that is not covered with the pixel electrode is covered with the overcoat layer, so the columnar spacer made of the photoresist and the reflector when developing the overcoat layer. Will not be exposed. Therefore, an alkaline developer does not intervene between the reflector and the pixel electrode, and a battery action does not occur between the reflector and the pixel electrode, so that the reflector is not etched. Therefore, according to the transflective liquid crystal display panel of the present invention, it is possible to prevent light leakage from the backlight that occurs when the reflector is etched back like the conventional example, and suppress the occurrence of lighting defects. can do.

In addition, since the height of the overcoat layer is lower than the height of the columnar spacer, it is less likely to cause alignment liquid accumulation or alignment failure when forming the alignment film. The injection rate is less likely to be slow.

In the transflective liquid crystal display panel of the present invention, the overcoat layer may be integrated with the columnar spacer.

According to the transflective liquid crystal display panel of this aspect, since there is no gap between the overcoat layer and the columnar spacer, it is difficult for the developer to enter between the reflector and the pixel electrode during development. It is less etched.

In the transflective liquid crystal display panel of the present invention, the overcoat layer may be formed so as to cover the entire surface of the scanning lines, signal lines, and pixel electrodes.

According to the transflective liquid crystal display panel of this aspect, since the overcoat layer is difficult to peel off and the cell gap becomes uniform, a transflective liquid crystal display panel with high reliability and good display image quality can be obtained.

In the transflective liquid crystal display panel of the present invention, the overcoat layer may be formed separately from the columnar spacer.

According to the transflective liquid crystal display panel of this aspect, the columnar spacers do not necessarily have to be arranged in the vicinity of the overcoat layer, so that the degree of freedom in arranging the columnar spacers and the overcoat layer is increased.

Furthermore, in order to achieve the above object, the method for producing a transflective liquid crystal display panel according to any one of the above aspects of the present invention includes the following steps (1) to (4).
(1) A plurality of scanning lines and signal lines arranged in a matrix on the substrate, pixel electrodes formed at respective positions partitioned by the scanning lines and signal lines, and partially on the lower surface of the pixel electrodes A step of preparing an array substrate provided with a reflecting plate formed in (2), a step of forming a photoresist layer of a predetermined thickness on the surface of the array substrate, and (3) using a halftone mask,
Exposing the overcoat layer forming portion with a semi-translucent portion of the halftone mask and performing a predetermined exposure process on the columnar spacer forming portion; (4) developing the photoresist layer to develop the photoresist layer; Forming a columnar spacer and an overcoat layer;

In this method of manufacturing a transflective liquid crystal display panel, the patterns of the light transmitting part and the light shielding part of the halftone mask used are reversed depending on whether the photoresist is a positive type or a negative type. That is, in the case of using a positive type photoresist, the pattern of the columnar spacer forming portion is formed as a light transmitting portion, and the pattern of the portion not leaving the photoresist is formed as a light shielding portion. used. On the contrary, when using a negative type photoresist, the pattern of the columnar spacer forming portion is formed as a light shielding portion, and the pattern of the portion not leaving the photoresist is formed as a light transmitting portion. Is used.

According to the method for manufacturing a transflective liquid crystal display panel of this aspect, it is possible to manufacture a transflective liquid crystal display panel that exhibits the above-described effects with a single exposure.

Moreover, in order to achieve the said objective, the manufacturing method of the transflective liquid crystal display panel in any one of the said this invention is characterized by including the process of the following (1)-(5).
(1) A plurality of scanning lines and signal lines arranged in a matrix on the substrate, pixel electrodes formed at respective positions partitioned by the scanning lines and signal lines, and partially on the lower surface of the pixel electrodes (2) a step of forming a photoresist layer having a predetermined thickness on the surface of the array substrate, and (3) the columnar shape using a first mask. A step of performing a first exposure on the spacer formation portion, (4) a step of performing a second exposure on the columnar spacer formation portion and the overcoat layer formation portion using a second mask, (5 ) The step of forming the columnar spacer and the overcoat layer by developing the photoresist layer.

Also in this method of manufacturing a transflective liquid crystal display panel, the patterns of the light transmitting portion and the light blocking portion of the first and second masks are reversed depending on whether the photoresist is positive or negative. That is, when a positive photoresist is used, the first mask in which the columnar spacer forming portion is formed as a light transmitting portion, the columnar spacer forming portion and the overcoat layer forming portion are formed as a light transmitting portion. A second mask is used. vice versa,
When using a negative type photoresist, a first mask in which a columnar spacer forming portion is formed as a light shielding portion, and a second mask in which a columnar spacer forming portion and an overcoat layer forming portion are formed as a light shielding portion. Is used.

According to the method of manufacturing a transflective liquid crystal display panel of this aspect, two masks and two exposures are required, but a single development process is performed without using a special mask such as a halftone mask. The transflective liquid crystal display panel of the present invention that exhibits the effects as described above can be manufactured.

The method for manufacturing a transflective liquid crystal display panel according to the present invention is characterized in that, in the method for manufacturing a transflective liquid crystal display panel, the first exposure and the second exposure are performed in an exposure apparatus. To do.

According to the method of manufacturing a transflective liquid crystal display panel of this aspect, predetermined exposure can be continuously performed at a high speed by properly using two types of masks arranged in the exposure apparatus, and a single development process is performed. Thus, it is possible to manufacture the transflective liquid crystal display panel of the present invention that exhibits the effects as described above.

Hereinafter, specific examples of the transflective liquid crystal display panel and the manufacturing method thereof according to the present invention will be described in detail with reference to the drawings. However, the following embodiments are described by taking a liquid crystal display panel and a manufacturing method thereof for embodying the technical idea of the present invention as examples, and are not intended to specify the present invention. The present invention can be equally applied to various modifications without departing from the technical idea shown in the claims.

1 is a plan view of several pixels of the array substrate in the transflective liquid crystal display panel of Example 1, and FIG. 2 is a schematic cross-sectional view corresponding to the line AA in FIG. FIG. 3 is a schematic diagram for explaining a method for forming the columnar spacers of the first embodiment.

As shown in FIGS. 1 and 2, the array substrate AR1 of the transflective liquid crystal display panel 10A according to the first embodiment includes a plurality of scanning lines 12 and signal lines 13 provided in a matrix on the transparent substrate 11. A region surrounded by the scanning lines 12 and the signal lines 13 and an interlayer film 14 covering the surfaces of the scanning lines 12 and the signal lines 13 are provided. On the surface of the interlayer film 14, a reflecting plate 16 made of, for example, aluminum metal is formed in the reflecting portion 15. For example, ITO (Indium Thin Oxide) is formed on the surface of the reflecting plate 16 and the surface of the interlayer film 14 of the transmitting portion 17. A pixel electrode 18 made of is formed. Note that fine irregularities are formed on the surface of the interlayer film 14 of the reflecting portion 15 so that the reflected light is diffused, but these irregularities are not shown.

The reflecting plate 16 is formed by forming an aluminum metal film over the entire surface of the interlayer film 14,
It is manufactured by etching so as to have a predetermined pattern by photolithography. In order to prevent light leakage from between the reflection plate 16 and the scanning line 12 and the signal line 13, the reflection plate 16 slightly overlaps the scanning line 12 and the signal line 13 in plan view in the reflection unit 15. Is formed.

Further, the pixel electrode 18 is formed so as to cover the entire surface of the reflecting plate 16 and the exposed surface of the interlayer film.
After a thin film made of TO is formed, it is formed by etching so as to form a predetermined pattern by photolithography. At this time, the pixel electrode 18 is formed so as to slightly overlap the scanning line 12 and the signal line 13 in the transmissive portion 17 and slightly smaller than the reflecting plate in the reflecting portion 15.

Next, in the transflective liquid crystal display panel 10A according to the first embodiment, the reflection unit 15 side is provided for every several sub-pixels, for example, every three sub-pixels when three types of color filter layers of R, G, and B are used. Columnar spacers 20 are formed on the substrate. A person skilled in the art can arbitrarily set the formation position of the columnar spacer 20. In order to prevent the surface of the reflecting plate 16 from being exposed, a portion of the reflecting plate 16 that is not covered with the pixel electrode 18 has a height higher than that of the columnar spacer 20 that is integrally formed of the same material as the columnar spacer 20. Covered with a low overcoat layer 21.

A method of forming the columnar spacer 20 and the overcoat layer 21 will be described with reference to FIG.
First, an array substrate AR1 in which the reflecting plate 16 and the pixel electrode 18 are formed on the surface of the interlayer film 14 is prepared, and a photoresist layer 25 having a predetermined thickness is formed over the entire surface of the array substrate AR1. The photoresist layer 25 is formed to have the same height as a predetermined cell gap.

Next, exposure is performed for a predetermined time using a halftone mask 26 having a predetermined pattern. The halftone mask 26 includes a light transmissive part 27, a semi-light transmissive part 28, and a light shielding part 29. Of these, the semi-translucent portion 28 has a predetermined light transmittance. For example, when the photoresist layer 25 is made of a positive resist, the light transmissive portion 27 is formed by the columnar spacer 20.
The semi-translucent portion 28 includes the pattern of the overcoat layer 21.
When a negative photoresist is used, the light-shielding portion 29 has a pattern of columnar spacers 20, and the semi-transparent portion 28 has a pattern of overcoat layer 21. In the following description, it is assumed that a positive resist is used.

When this halftone mask 26 is used to expose the positive photoresist layer 25,
As shown in FIG. 3, when the photoresist layer 25 exposed by the light transmitted through the light transmissive portion 27 is completely exposed, the photoresist layer 25 exposed by the light transmitted through the semi-transparent portion 28. Is only partially sensitive. Thereafter, when the photoresist layer 25 is developed using an alkaline developer, the columnar spacer 20 and the overcoat layer 21 are formed at the same time, but the pixel electrode 18 is exposed as the development proceeds. However, since the reflection plate 16 is covered with the overcoat layer 21, the developer does not short-circuit between the reflection plate 16 and the pixel electrode 18.

Therefore, since no battery action occurs between the reflector 16 and the pixel electrode 18 during development, the reflector 16 is not eroded, and the reflector 16 is eroded by the developer as in the conventional example. This prevents light leakage that occurs. According to the manufacturing method of the columnar spacer 20 and the overcoat layer 21 using the halftone mask 26 of the first embodiment, the columnar spacer 20 and the overcoat layer 21 can be formed by one exposure. Will be very good.

In addition, as the transflective liquid crystal display panel 10A of Example 1, an example in which the columnar spacer 20 and the overcoat layer 21 are integrated is shown, but the columnar spacer 20 and the overcoat layer 21 are different. You may make it a body. Although an example using the positive type photoresist layer 25 is shown here, a negative type photoresist layer can also be used. In this case, as the halftone mask, the halftone mask 26 shown in FIG. 3 may be used in which the arrangement of the light transmitting portion 27 and the light shielding portion 29 is reversed.

[Comparative example]
In Example 1, the overcoat layer 21 is used to prevent the reflection plate 16 from being exposed during development.
In the comparative example, a semi-transmissive liquid crystal display panel 10B was formed with columnar spacers without forming an overcoat layer as in the conventional example. The configuration in the vicinity of the columnar spacer of the transflective liquid crystal display panel 10B of this comparative example will be described with reference to FIG. 4 is shown in FIG.
The same reference numerals are given to the same components as those of the transflective liquid crystal display panel 10A of the first embodiment, and the detailed description thereof will be omitted. Further, the plan view of several pixels of the array substrate in the transflective liquid crystal display panel of the comparative example is not illustrated because it is not substantially different from that shown in FIG. 1 except that the overcoat layer is not present.

The columnar spacer 20 of Comparative Example 1 is formed as follows. First, an array substrate AR2 in which a reflecting plate 16 and a pixel electrode 18 are formed on the surface of the interlayer film 14 is prepared. This array substrate AR
Then, a positive type photoresist layer 25 having a predetermined thickness is formed over the entire surface. The thickness of the photoresist layer 25 is formed to the same height as a predetermined cell gap width. The steps up to here are the same as those in the first embodiment.

Next, exposure is performed for a predetermined time using a mask having a predetermined pattern. As the mask having the predetermined pattern, the half-tone mask 26 used in the first embodiment, in which the semi-translucent portion 28 becomes a light-shielding portion, is used. . That is, in the mask of the predetermined pattern used in the comparative example, only the portion where the columnar spacer 20 is formed is a light transmissive portion, and all other portions are light shielding portions.

When the photoresist layer 25 is developed with an alkaline developer after exposure, the columnar spacer 20
Is formed in a normal shape, but as development proceeds, both the reflector 16 and the pixel electrode 18 are exposed to the developer. As a result, the reflector 16 and the pixel electrode 18 are short-circuited via an alkaline developer, and a battery reaction occurs between the reflector 16 and the pixel electrode 18.

Moreover, although the pixel electrode made of ITO or the like is insoluble in the alkaline developer, the concentration of the alkaline developer is high, so that the reflector 16 made of aluminum metal or the like is rapidly dissolved by the battery reaction. Therefore, as indicated by reference symbol X in FIG. 4, the reflector 16 may be retracted to the inside of the peripheral edge of the pixel electrode 18. If the retraction amount is large, the pixel electrode 18 is light transmissive, and therefore a portion not shielded by the reflecting plate 16 is generated between the pixel electrode 18 and the scanning line 12 or the signal line 13, and light leakage occurs from this portion. Will come to do. This light leakage appears as a lighting defect, leading to a deterioration in display image quality.

A transflective liquid crystal display panel of Example 2 will be described with reference to FIGS. 5 is a plan view of several pixels of the array substrate in the transflective liquid crystal display panel of Example 2, and FIG. 6 is a schematic cross-sectional view corresponding to the line BB in FIG.

In the transflective liquid crystal display panel 10C of Example 2, the overcoat layer 21 is formed by using the scanning line 1
2. The same as in the case of the transflective liquid crystal display panel 10A of Example 1, except that the entire surface of the signal line 13 and the pixel electrode 18 is covered. Therefore, the same reference numerals are given to the same components as those of the transflective liquid crystal display panel 10A of Embodiment 1, and the detailed description thereof is omitted.

Further, the columnar spacer 20 and the overcoat layer 21 in the transflective liquid crystal display panel 10C of the second embodiment are obtained by replacing the light-shielding portion 29 with the semi-transmissive portion 28 in the halftone mask 26 used in the first embodiment. By using (see FIG. 3), it can be manufactured by the same process as in the first embodiment. Therefore, the description about the specific manufacturing method is abbreviate | omitted.

According to the transflective liquid crystal display panel 10C of Example 2, since the overcoat layer 21 is formed over the entire surface of the array substrate AR3, the overcoat layer 21 is difficult to peel off and the cell gap is uniform. Therefore, the transflective liquid crystal display panel 10C having high reliability and good display image quality can be obtained.

As the transflective liquid crystal display panel of Example 3, the transflective liquid crystal display panel 10 of Example 1 is used.
A columnar spacer 20 and an overcoat layer 21 having the same configuration as A were prepared by using two normal masks each having a different pattern without using a halftone mask, and performing exposure twice. A manufacturing process of the columnar spacer 20 and the overcoat layer 21 in the transflective liquid crystal display panel 10D of Example 3 will be described with reference to FIG. FIG. 7 is a schematic cross-sectional view of a portion corresponding to the line AA of FIG. 1 in the liquid crystal display panel 10D of the third embodiment. The same components as those of the transflective liquid crystal display panel 10A of the first embodiment are shown in FIG. The same reference numerals are assigned and detailed description thereof is omitted.

The columnar spacer 20 of Example 3 is formed as follows. First, an array substrate AR4 (not shown) having a reflecting plate 16 and a pixel electrode 18 formed on the surface of the interlayer film 14 is prepared, and a positive photoresist layer having a predetermined thickness over the entire surface of the array substrate AR4. 25 is formed.
The thickness of the photoresist layer 25 is formed to the same height as a predetermined cell gap width. The steps up to here are the same as those in the first embodiment.

Next, the first exposure is performed using the first mask 30 having a pattern in which the columnar spacer 20 is formed as a light-transmitting portion 31 and the other portions as light-shielding portions 32. At this time, it is sufficiently exposed so that the columnar spacer 20 can be completely formed. Thereafter, the second exposure is performed immediately using the second mask 33 without developing. As the second mask 33, a mask having a pattern in which the column spacers 20 and the overcoat layer 21 are formed as light-transmitting portions 34 and the other portions as light-shielding portions 35 is used. At this time, the exposure amount is reduced in consideration of film reduction.

Thereafter, development is performed with an alkaline developer in the same manner as in the first embodiment, so that the columnar spacer 20 and the overcoat layer 21 having the same configuration as the transflective liquid crystal display panel 10A in the first embodiment are provided. A transmissive liquid crystal display panel 10D is obtained.

In Example 3, the half-tone type liquid crystal display panel 1 of Example 1 is used by exposing twice using two normal masks each having a different pattern without using a halftone mask.
Although an example in which the columnar spacer 20 and the overcoat layer 21 having the same configuration as 0A were produced,
It can also be produced using an exposure apparatus having two types of masks. In this case, two types of masks having patterns corresponding to the first mask 30 and the second mask 33 shown in FIG. 7 are built in the exposure apparatus, respectively, and the masks are used selectively in the exposure apparatus. A predetermined exposure process may be performed. Since the exposure in the exposure apparatus can be continuously performed at a high speed, the processing time is shortened.

4 is a plan view of several pixels of an array substrate in the transflective liquid crystal display panel of Example 1. FIG. It is a schematic cross section corresponding to the AA line of FIG. 3 is a schematic diagram illustrating a method for forming a columnar spacer in Example 1. FIG. It is a schematic cross section of the columnar spacer formation part corresponding to FIG. 2 of a comparative example. 6 is a plan view of several pixels of an array substrate in a transflective liquid crystal display panel of Example 2. FIG. It is a schematic cross section corresponding to the BB line of FIG. It is a schematic cross section of the part corresponding to the AA line of FIG. 1 in the liquid crystal display panel of Example 3.

Explanation of symbols

10A to 10D: Transflective liquid crystal display panel, 11: Transparent substrate, 12: Scan line, 13: Signal line, 14: Interlayer film, 15: Reflector, 16: Reflector, 17: Transmitter, 18: Pixel electrode , 20
: Columnar spacer, 21: Overcoat layer, 25: Photoresist layer, 26: Halftone mask, 27: Light transmissive part, 28: Semi-translucent part, 29: Light-shielding part, 30: First mask, 31: Light transmissive part, 32: Light shielding part, 33: Second mask, 34: Light transmissive part, 35: Light shielding part

Claims (7)

A plurality of scanning lines and signal lines arranged in a matrix, pixel electrodes formed at respective positions partitioned by the scanning lines and signal lines, and a reflector partially formed on the lower surface of the pixel electrode An array substrate, a color filter substrate provided to face the array substrate, and a columnar spacer made of a plurality of photoresists formed between the array substrate and the color filter substrate,
The columnar spacer is formed on the array substrate side, and a portion of the reflector that is not covered with the pixel electrode is covered with an overcoat layer that is lower than the columnar spacer formed of the same material as the columnar spacer. A transflective liquid crystal display panel. The transflective liquid crystal display panel according to claim 1, wherein the overcoat layer is integrated with the columnar spacer. 3. The transflective liquid crystal display panel according to claim 1, wherein the overcoat layer is formed so as to cover the entire surface of the scanning lines, signal lines, and pixel electrodes. The transflective liquid crystal display panel according to claim 1, wherein the overcoat layer is formed separately from the columnar spacer. The method of manufacturing a transflective liquid crystal display panel according to any one of claims 1 to 4, comprising the following steps (1) to (4).
(1) A plurality of scanning lines and signal lines arranged in a matrix on the substrate, pixel electrodes formed at respective positions partitioned by the scanning lines and signal lines, and partially on the lower surface of the pixel electrodes A step of preparing an array substrate comprising a reflector formed in
(2) forming a photoresist layer having a predetermined thickness on the surface of the array substrate;
(3) using a halftone mask, exposing the overcoat layer forming portion with a semi-transparent portion of the halftone mask and performing a predetermined exposure process on the columnar spacer forming portion;
(4) A step of forming the columnar spacer and the overcoat layer by developing the photoresist layer. The method of manufacturing a transflective liquid crystal display panel according to any one of claims 1 to 4, comprising the following steps (1) to (5).
(1) A plurality of scanning lines and signal lines arranged in a matrix on the substrate, pixel electrodes formed at respective positions partitioned by the scanning lines and signal lines, and partially on the lower surface of the pixel electrodes A step of preparing an array substrate comprising a reflector formed in
(2) forming a photoresist layer having a predetermined thickness on the surface of the array substrate;
(3) A step of performing a first exposure on the columnar spacer forming portion using a first mask;
(4) performing a second exposure on the columnar spacer formation portion and the overcoat layer formation portion using a second mask;
(5) A step of forming the columnar spacer and the overcoat layer by developing the photoresist layer. 7. The first exposure and the second exposure are performed in an exposure apparatus.
A method for producing a transflective liquid crystal display panel as described in 1. above.

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