JP2008229703A - Method of manufacturing copper-coated aluminum wire and copper-coated aluminum wire - Google Patents

Method of manufacturing copper-coated aluminum wire and copper-coated aluminum wire Download PDF

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JP2008229703A
JP2008229703A JP2007076391A JP2007076391A JP2008229703A JP 2008229703 A JP2008229703 A JP 2008229703A JP 2007076391 A JP2007076391 A JP 2007076391A JP 2007076391 A JP2007076391 A JP 2007076391A JP 2008229703 A JP2008229703 A JP 2008229703A
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copper
wire
aluminum wire
coated aluminum
thickness
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Yosuke Ohata
要介 大畑
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Furukawa Electric Co Ltd
Fujikura Ltd
Viscas Corp
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Furukawa Electric Co Ltd
Fujikura Ltd
Viscas Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a copper-coated aluminum wire, by which the thickness of copper on the surface can be adjusted to arbitrary thickness and, further, the copper-coated aluminum wire whose area rate of copper is less than 10% can be manufactured at low cost. <P>SOLUTION: In the manufacturing process of the copper-coated aluminum wire including a copper coating step where a composite wire 3 of the copper-coated aluminum wire is manufactured by coating copper on an aluminum wire 1 and a drawing step where the composite wire of the copper-coated aluminum wire is thinned down to a prescribed diameter, the process has a copper layer polishing step where the thickness of the copper layer 2 is adjusted to a prescribed thickness by reducing the thickness of the copper layer 2. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、銅被覆アルミニウム線の製造方法に関し、特に、表面の銅の厚さを任意に調整できる銅被覆アルミニウム線の製造方法に関するものである。   The present invention relates to a method for producing a copper-coated aluminum wire, and more particularly to a method for producing a copper-coated aluminum wire capable of arbitrarily adjusting the thickness of copper on the surface.

従来、銅線よりも軽量で、且つ、高い導電性が要求されるハードディスク用ピックアップコイルや、CATV用同軸ケーブルの中心導体や、ヘッドホン用巻線等にアルミニウム線に銅を被覆した銅被覆アルミニウム線が使用されている。   Conventionally, copper coated aluminum wire with copper coated aluminum wire on pickup coil for hard disk, which is lighter than copper wire and requires high conductivity, central conductor of coaxial cable for CATV, winding for headphones, etc. Is used.

この銅被覆アルミニウム線は、表1に示すように、主として軽量化と導電率の兼ね合いから、横断面における銅の面積率が10%、15%、20%となるように銅とアルミニウム線とが複合されている。   As shown in Table 1, this copper-coated aluminum wire has a copper area ratio of 10%, 15%, and 20% so that the copper area ratio is 10%, 15%, and 20% mainly from the viewpoint of weight reduction and conductivity. It is compounded.

Figure 2008229703
Figure 2008229703

この銅被覆アルミニウム線は、通常以下の工程を経て製造される。
最初の工程は、被覆材である銅と心材であるアルミニウム線を複合化し、銅被覆アルミニウム線の複合線を製造する工程であり、造管方式またはパイプクラッド方式により行われている。
This copper-coated aluminum wire is usually manufactured through the following steps.
The first step is a step of producing a composite wire of a copper-coated aluminum wire by combining copper as a covering material and an aluminum wire as a core material, and is performed by a pipe making method or a pipe cladding method.

造管方式では、銅テープにアルミニウム線を縦添えし、このアルミニウム線を覆うように銅テープをロールフォーミングにより連続的に管状に形成し、銅テープの突き合わせ部を連続的に溶接する。管状に形成された銅テープを更にロールにより縮径することにより、銅テープが内側のアルミニウム線に密着して銅被覆アルミニウム線の複合線が製造される。   In the pipe making method, an aluminum wire is vertically attached to the copper tape, the copper tape is continuously formed into a tubular shape by roll forming so as to cover the aluminum wire, and the butted portion of the copper tape is continuously welded. By further reducing the diameter of the copper tape formed in a tubular shape with a roll, the copper tape is in close contact with the inner aluminum wire to produce a composite wire of copper-coated aluminum wire.

また、パイプクラッド方式では、所定厚さの銅パイプにその内径よりも若干細いアルミニウム線を挿入し、銅パイプとアルミニウム線を一体としてダイスにより伸線加工(線引き加工)することにより、両者が密着して銅被覆アルミニウム線の複合線が製造される。   In addition, in the pipe clad method, an aluminum wire slightly thinner than the inner diameter is inserted into a copper pipe of a predetermined thickness, and the copper pipe and the aluminum wire are integrated into a die and drawn (drawing) with a die, so that they are in close contact with each other Thus, a composite wire of copper-coated aluminum wire is manufactured.

次の工程では、得られた銅被覆アルミニウム線の複合線を伸線加工して所定の径に縮径化する。尚、伸線機は通常の銅線用と同じものが使用され、途中で加工歪みを除去するための熱処理が行われることもある。また、最終線径まで伸線加工を行ったものでは、用途に応じ、銅層やアルミニウム線を柔らかくするために熱処理を行う場合もある。   In the next step, the composite wire of the obtained copper-coated aluminum wire is drawn to reduce the diameter to a predetermined diameter. In addition, the same wire drawing machine as that for a normal copper wire is used, and a heat treatment for removing processing distortion may be performed in the middle. Further, in the case where the wire drawing is performed up to the final wire diameter, heat treatment may be performed to soften the copper layer or the aluminum wire depending on the application.

このような銅線被覆工程と伸線工程による銅被覆アルミニウム線の製造方法として、例えば、特許文献1が開示されている。
特開平11−57848号公報
As a method for producing a copper-coated aluminum wire by such a copper wire coating process and a wire drawing process, for example, Patent Document 1 is disclosed.
JP-A-11-57848

ところで、従来、表1に示す銅被覆アルミニウム線の内、銅面積率15%のものが最も多く製造されており、軽量化や製造の困難さの面より、銅面積率10%、20%の銅被覆アルミニウム線については、生産量は極めて少なかった。   By the way, of the copper-coated aluminum wires shown in Table 1, those with a copper area ratio of 15% have been most often manufactured. From the viewpoint of weight reduction and difficulty in manufacturing, the copper area ratio is 10% and 20%. For copper-coated aluminum wires, production was very small.

ところが、近年の更なる軽量化のため、銅面積率10%以下の銅被覆アルミニウム線のニーズが高まっている。また、用途の多様化から、例えば、銅面積率12%といった従来品の中間的な銅面積率を有する銅被覆アルミニウム線のニーズも高まってきている。   However, the need for copper-coated aluminum wires having a copper area ratio of 10% or less is increasing for further weight reduction in recent years. In addition, with the diversification of applications, there is an increasing need for a copper-coated aluminum wire having an intermediate copper area ratio of a conventional product such as a copper area ratio of 12%.

ところが、従来の製造方法では、伸線工程や熱処理工程において銅層の面積率を増減(調整)することは困難であり、よって、このようなニーズに対しては、銅線被覆工程において、要求される銅面積率に合わせた銅テープや銅パイプの厚さ、或いはアルミニウム線の径等をその都度選定することが行われていた。
このため、多様な銅面積率を有する銅被覆アルミニウム線の製造に際しては、それぞれの銅面積率に応じた銅テープや銅パイプやアルミニウム線が必要となるため、これら材料の保管や管理が煩雑となると共に、少量多種により材料費が高くなる等の問題があった。
However, in the conventional manufacturing method, it is difficult to increase / decrease (adjust) the area ratio of the copper layer in the wire drawing process or the heat treatment process. The thickness of the copper tape or copper pipe, the diameter of the aluminum wire, or the like in accordance with the copper area ratio is selected each time.
For this reason, when manufacturing copper-coated aluminum wires having various copper area ratios, copper tapes, copper pipes, and aluminum wires corresponding to the respective copper area ratios are required, which makes it difficult to store and manage these materials. In addition, there is a problem that the material cost increases due to the small amount of various kinds.

また、特に、銅面積率10%以下の銅被覆アルミニウム線の製造においては、銅層の厚さが極めて薄いため、従来の方法では製造が困難であった。   In particular, in the production of a copper-coated aluminum wire having a copper area ratio of 10% or less, since the copper layer is extremely thin, it has been difficult to produce by the conventional method.

例えば、造管方式により複合線を製造する場合は、極めて薄い銅テープをロールフォーミングにより連続的に成形しながら突き合わせ部を溶接するため、その成形条件や溶接条件は、銅面積率が10%を越える標準品に比べて極めて狭い範囲に限定されており、溶接欠陥が多いことから歩留まりも悪かった。
また、パイプクラッド方式の場合でも、薄肉の銅パイプとアルミニウム線の複合化は極めて難しく、銅パイプに曲がりや外傷が生じると、アルミニウム線の挿入時に銅パイプが簡単に裂けてしまうため、歩留まりは悪かった。
For example, when manufacturing a composite wire by a pipe making method, the butting portion is welded while continuously forming an extremely thin copper tape by roll forming, so the forming area and welding conditions are such that the copper area ratio is 10%. Compared to the standard product that exceeds, it is limited to a very narrow range, and because of many welding defects, the yield was also poor.
Even in the case of the pipe clad method, it is extremely difficult to combine thin copper pipes and aluminum wires, and if the copper pipes are bent or damaged, the copper pipes can be easily torn when the aluminum wires are inserted, so the yield is It was bad.

さらに、銅面積率10%以下の銅被覆アルミニウム線では、伸線工程における伸線条件も非常に厳密な管理が要求される。銅被覆アルミニウム線の伸線加工では、伸線加工度70%以下の初期段階では表面の銅層とアルミニウム線との密着性(接合性)が極めて悪く、また場所によってバラツキが大きいため、伸線加工中にアルミニウム線から銅層が剥離し、アルミニウム線が露出して断線することも多かった。   Furthermore, for a copper-coated aluminum wire having a copper area ratio of 10% or less, the wire drawing conditions in the wire drawing step are required to be very strictly controlled. In the wire drawing of copper-coated aluminum wire, the adhesion (bondability) between the copper layer on the surface and the aluminum wire is extremely poor at the initial stage where the wire drawing degree is 70% or less, and the variation varies depending on the location. During processing, the copper layer peeled off from the aluminum wire, and the aluminum wire was often exposed and disconnected.

このような銅層の剥離やアルミニウム線の断線は、銅面積率が低く、また、銅層が薄いほど発生し易く、よって、銅面積率10%以下の銅被覆アルミニウム線の製造では、歩留まりの極端な低下やコストアップは避けられないのが実情であった。   Such peeling of the copper layer and disconnection of the aluminum wire are more likely to occur as the copper area ratio is lower and the copper layer is thinner. Therefore, in the production of a copper-coated aluminum wire having a copper area ratio of 10% or less, the yield is low. The actual situation is that extreme reductions and cost increases are inevitable.

本発明は、上記問題に鑑みなされたもので、表面の銅層の厚さを任意の厚さに調整でき、さらには、銅面積率10%未満の銅被覆アルミニウム線を安価に製造できる銅被覆アルミニウム線の製造方法、およびこの銅被覆アルミニウム線の製造方法により製造された銅被覆アルミニウム線を提供することを目的としている。   The present invention has been made in view of the above problems, and can adjust the thickness of the copper layer on the surface to an arbitrary thickness, and can further produce a copper-coated aluminum wire having a copper area ratio of less than 10% at a low cost. It aims at providing the manufacturing method of an aluminum wire, and the copper covering aluminum wire manufactured by this manufacturing method of a copper covering aluminum wire.

すなわち、請求項1に記載の発明は、アルミニウム線に銅を被覆して銅被覆アルミニウム線の複合線を製造する銅被覆工程と、前記銅被覆アルミニウム線の複合線を所定の径まで細径化する伸線工程とを有する銅被覆アルミニウム線の製造工程において、前記銅の厚さを減少させ、所定の厚さに調整する銅層研磨工程を有することを特徴としている。   That is, the invention according to claim 1 is a copper coating step of manufacturing a composite wire of a copper-coated aluminum wire by coating copper on an aluminum wire, and reducing the composite wire of the copper-coated aluminum wire to a predetermined diameter. In the manufacturing process of the copper covering aluminum wire which has a wire drawing process to perform, it has the copper layer grinding | polishing process which reduces the thickness of the said copper and adjusts to predetermined thickness, It is characterized by the above-mentioned.

この銅の厚さを調整する銅層研磨工程は、銅被覆アルミニウム線の複合線を最終線径まで伸線加工する工程中に設けても良いし、または最終線径まで伸線加工した後に設けても良い。   The copper layer polishing step for adjusting the copper thickness may be provided during the step of drawing the composite wire of the copper-coated aluminum wire to the final wire diameter, or after the wire drawing to the final wire diameter. May be.

また、請求項2に記載の発明は、請求項1に記載の銅被覆アルミニウム線の製造方法において、前記銅の厚さ調整は、化学研磨、物理研磨、電解研磨のうち少なくとも1つの方法、または任意の2つ以上の方法の組み合わせにより行われることを特徴としている。   The invention described in claim 2 is the method for producing a copper-coated aluminum wire according to claim 1, wherein the copper thickness adjustment is performed by at least one of chemical polishing, physical polishing, and electrolytic polishing, or It is characterized by being performed by a combination of any two or more methods.

ここで化学研磨とは、化学研磨液を用いて化学的に銅層を薄くする方法であり、化学研磨液としては、例えば、硫酸/過酸化水素系、硫酸/水系、硫酸/重クロム酸ナトリウム系、過硫酸アンモニウム/水系、硫酸/硝酸系、硫酸/塩酸/硝酸系、シアン化ナトリウム/過酸化水素系、硫酸/塩酸系、塩化第二鉄/塩酸系、塩化第二鉄/水系、過酸化水素水/水系等の酸処理液が使用される。
物理研磨とは、例えば、砥石、または砥粒を介在する研磨布等の研磨材を銅被覆アルミニウム線に接触させながら相対移動させて物理的に薄くする方法であり、この他、サンドブラスト等の砥粒の運動エネルギーを利用するものでも良い。
電解研磨とは、例えば、NaCl、NaClO3、NaNO3等の電解液中で電気化学的に研磨する方法であり、電気メッキと逆の原理で銅を溶出させて薄くする方法である。
Here, chemical polishing is a method of chemically thinning the copper layer using a chemical polishing liquid. Examples of the chemical polishing liquid include sulfuric acid / hydrogen peroxide system, sulfuric acid / water system, and sulfuric acid / sodium dichromate. System, ammonium persulfate / water system, sulfuric acid / nitric acid system, sulfuric acid / hydrochloric acid / nitric acid system, sodium cyanide / hydrogen peroxide system, sulfuric acid / hydrochloric acid system, ferric chloride / hydrochloric acid system, ferric chloride / water system, peroxidation An acid treatment solution such as hydrogen water / water system is used.
Physical polishing is, for example, a method in which an abrasive such as a grindstone or a polishing cloth with abrasive grains is relatively moved while being in contact with a copper-coated aluminum wire and physically thinned. The thing using the kinetic energy of a grain may be used.
The electrolytic polishing is a method of electrochemical polishing in an electrolytic solution such as NaCl, NaClO 3 , NaNO 3, and the like, and is a method in which copper is eluted and thinned on the principle opposite to electroplating.

また、請求項3に記載の発明は、請求項1または請求項2の何れかに記載の銅被覆アルミニウム線の製造方法により製造したことを特徴とする銅面積率10%未満の銅被覆アルミニウム線である。   The invention according to claim 3 is produced by the method for producing a copper-coated aluminum wire according to any one of claims 1 and 2, and is a copper-coated aluminum wire having a copper area ratio of less than 10%. It is.

本発明によれば、表面の銅の厚さを任意に調整する銅層研磨工程を設けたので、初工程では生産性の良い銅面積率の大きな銅被覆アルミニウム線を製造すると共に、伸線加工の途中、または最終線径まで伸線加工した後に、上記銅層研磨工程において銅の厚さを減少させることにより、銅面積率の小さい銅被覆アルミニウム線を製造することが可能となる。   According to the present invention, since the copper layer polishing step for arbitrarily adjusting the thickness of the copper on the surface is provided, in the first step, a copper-coated aluminum wire having a high productivity and a large copper area ratio is manufactured, and the wire drawing process is performed. It is possible to manufacture a copper-coated aluminum wire having a small copper area ratio by reducing the thickness of copper in the copper layer polishing step after the wire drawing process to the final wire diameter.

この結果、銅面積率15%、20%といった従来の標準的な銅被覆アルミニウム線を元材料として、これらの中間的な任意の銅面積率(例えば、銅面積率12%)の銅被覆アルミニウム線は元より、銅面積率10%未満の銅被覆アルミニウム線を、安価に、且つ高い歩留まりで製造することができる。これにより、多様化する銅被覆アルミニウム線の各用途に十分対処できると共に、銅被覆アルミニウム線の更なる軽量化を図ることができる。   As a result, a copper-clad aluminum wire having an intermediate copper area ratio (for example, a copper area ratio of 12%) is obtained using a conventional standard copper-coated aluminum wire such as a copper area ratio of 15% or 20% as a base material. As a matter of course, a copper-coated aluminum wire having a copper area ratio of less than 10% can be manufactured at a low cost and with a high yield. Thereby, it is possible to sufficiently cope with various uses of the copper-coated aluminum wire that is diversified and to further reduce the weight of the copper-coated aluminum wire.

以下、本発明による銅被覆アルミニウム線の製造方法の実施形態を図面に基づいて説明する。   Hereinafter, an embodiment of a manufacturing method of a copper covering aluminum wire by the present invention is described based on a drawing.

図1は本実施形態による銅被覆アルミニウム線の製造工程を示している。
図1に示すように、初工程の銅被覆工程では、公知の造管方式やパイプクラッド方式により、芯材であるアルミニウム線1に銅層2が形成されることにより銅被覆アルミニウム線の複合線3が製造され、次に、この銅被覆アルミニウム線の複合線3を伸線工程において所定の径まで細径化して、原線4が製造される。
FIG. 1 shows a manufacturing process of a copper-coated aluminum wire according to the present embodiment.
As shown in FIG. 1, in the first copper coating process, a copper layer 2 is formed on an aluminum wire 1 that is a core material by a known pipe making method or pipe cladding method, thereby forming a composite wire of copper-coated aluminum wire. 3 is manufactured, and then the composite wire 3 of the copper-coated aluminum wire is thinned to a predetermined diameter in the wire drawing step, and the original wire 4 is manufactured.

上記銅被覆工程と伸線工程は、従来方法と同様であるが、本実施形態では、伸線工程の最後、或いは伸線工程の途中に新たに銅層研磨工程を設けて原線4の銅層2を研磨することにより、銅面積率が所定の値に調整された製品線5を製造するようにしている。   The copper coating process and the wire drawing process are the same as those of the conventional method, but in this embodiment, a copper layer polishing process is newly provided at the end of the wire drawing process or in the middle of the wire drawing process, so The product line 5 in which the copper area ratio is adjusted to a predetermined value is manufactured by polishing the layer 2.

以下、図2〜図4に基づいて銅層研磨工程における原線4の銅層2の厚さ調整方法を説明する。   Hereinafter, a method for adjusting the thickness of the copper layer 2 of the original wire 4 in the copper layer polishing step will be described with reference to FIGS.

図2は、化学研磨による銅層2の厚さ調整の一例を示している。
図2に示すように、原線リール6から繰り出された原線4は、脱脂、水洗、酸洗い、水洗の各工程を経た後、化学研磨工程において表面の銅層2が化学研磨液によって溶解され、銅層2の厚さが調整される。銅層2の厚さ調整後、原線4は水洗、中和、防錆の各工程を経て製品線5として製品巻取リール7に巻き取られる。
FIG. 2 shows an example of adjusting the thickness of the copper layer 2 by chemical polishing.
As shown in FIG. 2, the original wire 4 fed out from the original wire reel 6 is subjected to degreasing, water washing, pickling and water washing steps, and then the surface copper layer 2 is dissolved by the chemical polishing liquid in the chemical polishing step. Then, the thickness of the copper layer 2 is adjusted. After adjusting the thickness of the copper layer 2, the original wire 4 is wound around a product take-up reel 7 as a product wire 5 through steps of washing with water, neutralization, and rust prevention.

化学研磨液としては、例えば、硫酸/過酸化水素系、硫酸/水系、硫酸/重クロム酸ナトリウム系、過硫酸アンモニウム/水系、硫酸/硝酸系、硫酸/塩酸/硝酸系、シアン化ナトリウム/過酸化水素系、硫酸/塩酸系、塩化第二鉄/塩酸系、塩化第二鉄/水系、過酸化水素水/水系等の酸処理液が使用される。   Examples of chemical polishing liquids include sulfuric acid / hydrogen peroxide, sulfuric acid / water, sulfuric acid / sodium dichromate, ammonium persulfate / water, sulfuric acid / nitric acid, sulfuric acid / hydrochloric acid / nitric acid, sodium cyanide / peroxide. Acid treatment solutions such as hydrogen, sulfuric acid / hydrochloric acid, ferric chloride / hydrochloric acid, ferric chloride / water, hydrogen peroxide / water are used.

次に 図3は、物理研磨による銅層2の厚さ調整の一例を示している。
図3に示すように、原線リール6から繰り出された原線4は、物理研磨工程において表面の銅層2が削り取られることにより、銅層2の厚さ調整が行われる。銅層2の厚さ調整後、原線4は水洗、中和、水洗、防錆の各工程を経て製品線5として製品巻取リール7に巻き取とられる。
Next, FIG. 3 shows an example of the thickness adjustment of the copper layer 2 by physical polishing.
As shown in FIG. 3, the thickness of the copper layer 2 is adjusted by stripping off the copper layer 2 on the surface of the primary wire 4 fed from the primary reel 6 in the physical polishing process. After adjusting the thickness of the copper layer 2, the original wire 4 is wound around the product take-up reel 7 as a product wire 5 through the steps of water washing, neutralization, water washing, and rust prevention.

物理研磨工程では、例えば、砥石、または砥粒を介在する研磨布等による研磨や、サンドブラストの吹き付け等による研磨が行われる。研磨の際、原線4の表面に傷を付けないよう、砥石、砥粒等の研磨材はきめ細かいものが用いられている。   In the physical polishing step, for example, polishing with a grindstone or a polishing cloth interposing abrasive grains, polishing by sandblasting, or the like is performed. At the time of polishing, a fine polishing material such as a grindstone and abrasive grains is used so as not to damage the surface of the original wire 4.

次に、図4は、電解研磨による銅層2の厚さ調整の一例を示している。
図3に示すように、原線リール6から繰り出された原線4は、脱脂、水洗、酸洗い、水洗の各工程を経た後、電解研磨工程において、表面の銅層2を電解液で溶出させることにより、銅層2の厚さが調整される。銅層2の厚さ調整後、原線4は水洗、中和、水洗、防錆の各工程を経て製品線5として製品巻取リール7に巻き取られる。
Next, FIG. 4 shows an example of adjusting the thickness of the copper layer 2 by electropolishing.
As shown in FIG. 3, the original wire 4 fed out from the original reel 6 is subjected to degreasing, water washing, pickling and water washing steps, and then the surface copper layer 2 is eluted with an electrolytic solution in the electrolytic polishing step. By doing so, the thickness of the copper layer 2 is adjusted. After adjusting the thickness of the copper layer 2, the original wire 4 is wound around a product take-up reel 7 as a product wire 5 through steps of water washing, neutralization, water washing, and rust prevention.

電解研磨工程では、電解液として、例えば、NaCl、NaClO3、NaNO3等が用いられ、電気メッキと逆の原理で銅を溶出させる。 In the electrolytic polishing process, for example, NaCl, NaClO 3 , NaNO 3 or the like is used as an electrolytic solution, and copper is eluted on the principle opposite to that of electroplating.

以上、本実施形態の銅被覆アルミニウム線の製造方法における銅層研磨工程では、上述した化学研磨と物理研磨と電解研磨の内の任意2つ以上を組み合わせるようにしても良い。
例えば、先ず、物理研磨により銅層2の厚さを大まかに減少させておいて、その後、化学研磨または電解研磨にて銅層2の厚さを微調整するようにしても良く、或いは、その逆の手順で銅層2の厚さを調整しても良い。
As described above, in the copper layer polishing step in the method for producing a copper-coated aluminum wire of this embodiment, any two or more of the above-described chemical polishing, physical polishing, and electrolytic polishing may be combined.
For example, first, the thickness of the copper layer 2 may be roughly reduced by physical polishing, and then the thickness of the copper layer 2 may be finely adjusted by chemical polishing or electrolytic polishing. The thickness of the copper layer 2 may be adjusted by the reverse procedure.

具体的な例として、銅被覆アルミニウム線をハードディスク用ピックアップコイルやヘッドホン用巻線等に用いる場合は、コイルの外径はおよそ0.2mm以下であるから、減少させる銅層2の厚みは数μmのレベルとなる。従って、この場合は、先ず、化学研磨により銅層2を数μm単位で薄くし、更に次工程の電解研磨により銅層表面にエナメル等の被覆を行うための平滑化を図るようにする。
また、別の具体例として、銅被覆アルミニウム線をCATV用同軸ケーブルの中心導体等に用いる場合は、その外径はおよそ1.0mm以上であるから、減少させる銅層の厚みは数十μmのレベルとなる。従って、この場合は、先ず物理研磨により銅層2を大きく削って厚さを減少させ、次いで化学研磨または電解研磨により銅層2の厚さを微調整しながら表面の平滑化を図るようにする。
As a specific example, when a copper-coated aluminum wire is used for a hard disk pickup coil, a headphone winding or the like, the outer diameter of the coil is approximately 0.2 mm or less, so the thickness of the copper layer 2 to be reduced is several μm. It becomes the level of. Therefore, in this case, first, the copper layer 2 is thinned by several μm by chemical polishing, and further, smoothing is performed for coating the surface of the copper layer with enamel etc. by electrolytic polishing in the next step.
As another specific example, when a copper-coated aluminum wire is used as a central conductor of a coaxial cable for CATV, etc., the outer diameter is about 1.0 mm or more. Become a level. Therefore, in this case, the copper layer 2 is first sharply cut by physical polishing to reduce the thickness, and then the surface is smoothed while finely adjusting the thickness of the copper layer 2 by chemical polishing or electrolytic polishing. .

このように、本実施形態によれば、銅被覆アルミニウム線の製造工程において、表面の銅層2の厚さを任意に調整する銅層研磨工程を設けたので、初工程の銅被覆工程では生産性の良い銅面積率の大きな銅被覆アルミニウム線の複合線3を製造すると共に、伸線加工の途中、または最終線径まで伸線加工した後に、上記銅層研磨工程において銅層2の厚さを減少させることにより、銅面積率の小さい銅被覆アルミニウム線(すなわち、製品線5)を製造することが可能となる。   Thus, according to this embodiment, since the copper layer polishing step for arbitrarily adjusting the thickness of the copper layer 2 on the surface is provided in the manufacturing process of the copper-coated aluminum wire, the first copper coating step is a production process. In addition to producing a composite wire 3 of a copper-coated aluminum wire having a good copper area ratio, the thickness of the copper layer 2 in the copper layer polishing step after the wire drawing process or after drawing to the final wire diameter. It is possible to manufacture a copper-coated aluminum wire (that is, product line 5) having a small copper area ratio.

この結果、銅面積率15%、20%といった従来の標準的な銅被覆アルミニウム線を元材料として、これらの中間的な任意の銅面積率(例えば、銅面積率12%)の銅被覆アルミニウム線は元より、銅面積率10%未満の銅被覆アルミニウム線を安価に且つ、高い歩留まりで製造することができる。これにより、多様化する銅被覆アルミニウム線の各用途に十分対処できると共に、銅被覆アルミニウム線の更なる軽量化を図ることができる。
尚、銅被覆アルミニウム線の表面性としては、その後のエナメル等の絶縁層被覆作業や取り扱い時の破壊の起点を減らす理由などから、より平滑である方が好ましく、このためには化学研磨または電解研磨を用いるのが好ましい。
As a result, a copper-clad aluminum wire having an intermediate copper area ratio (for example, a copper area ratio of 12%) is obtained using a conventional standard copper-coated aluminum wire such as a copper area ratio of 15% or 20% as a base material. As a matter of course, a copper-coated aluminum wire having a copper area ratio of less than 10% can be manufactured at a low cost and with a high yield. Thereby, it is possible to sufficiently cope with various uses of the copper-coated aluminum wire that is diversified and to further reduce the weight of the copper-coated aluminum wire.
The surface property of the copper-coated aluminum wire is preferably smoother for reasons such as the subsequent coating of an insulating layer such as enamel and the reason for reducing the starting point of breakage during handling. It is preferable to use polishing.

以下、本発明による銅被覆アルミニウム線の製造方法の実施例を説明する。尚、本発明は、これらの実施例に限定されるものではないことは勿論である。
(実施例1)
Hereinafter, the Example of the manufacturing method of the copper covering aluminum wire by this invention is described. Needless to say, the present invention is not limited to these examples.
Example 1

銅被覆アルミニウム線の化学研磨として、H2SO4/H22系(硫酸/過酸化水素系)の化学研磨液を用い、外径φ0.114mm、銅面積率5%の銅被覆アルミニウム線を製造した。その製造工程を表2に示す。 For chemical polishing of copper-coated aluminum wires, H 2 SO 4 / H 2 O 2 -based (sulfuric acid / hydrogen peroxide-based) chemical polishing solution is used. Manufactured. The manufacturing process is shown in Table 2.

表2に示すように、初工程の銅被覆工程では、造管方式により外径φ9.5mmのアルミニウム線に厚さ0.4mmの銅テープを被覆し、溶接して、外径φ10mm、銅面積率15%の銅被覆アルミニウム線の複合線を製造した。
次に、伸線工程において、この銅被覆アルミニウム線の複合線を外径φ0.12mmまで伸線加工し、これを原線とした。
次に、銅層研磨工程(化学研磨工程)では、組成5〜7%H2SO4/10〜12%H22、温度40〜50℃の研磨液を用い、図2の工程に準じて上記原線の化学研磨を行った。この化学研磨工程では、外径φ0.12mmの原線が最終製品線でφ0.114mmとなるように研磨処理時間を微調整した。
As shown in Table 2, in the first copper coating process, an aluminum wire having an outer diameter of 9.5 mm is coated with a copper tape having a thickness of 0.4 mm and welded to form an outer diameter of 10 mm and a copper area. A composite wire of 15% copper coated aluminum wire was produced.
Next, in the wire drawing step, this copper-coated aluminum wire composite wire was drawn to an outer diameter of φ0.12 mm, and this was used as the original wire.
Next, the copper layer polishing process (chemical polishing step), the composition 5~7% H 2 SO 4 / 10~12 % H 2 O 2, the polishing liquid temperature 40 to 50 ° C. using, according to the step of FIG. Then, the raw wire was chemically polished. In this chemical polishing step, the polishing time was finely adjusted so that the original wire having an outer diameter of φ0.12 mm was φ0.114 mm in the final product line.

上記工程を経て製造された製品線について、横断面から銅層の平均厚さを測定し、全断面積から銅の面積比率を計算した。計算の結果、銅面積率は5.1%となり、導電率の測定結果とも一致し、目標を満足するものが得られた。
(実施例2)
About the product line manufactured through the said process, the average thickness of the copper layer was measured from the cross section, and the area ratio of copper was calculated from the total cross-sectional area. As a result of the calculation, the copper area ratio was 5.1%, which coincided with the measurement result of the conductivity, and the one satisfying the target was obtained.
(Example 2)

Figure 2008229703
Figure 2008229703

物理研磨の研磨材として、GC#1000とPVA(ポリビニルアルコール)を分散混合して固めたPVA弾性砥石(日本特殊研砥社製)を用い、また、電解研磨の電解液としてNaCl系を用い、外径φ0.205mm、銅面積率5%の銅被覆アルミニウム線を製造した。その製造工程を表3に示す。   As a polishing material for physical polishing, a PVA elastic grindstone (manufactured by NIPPON KENKEN) made by dispersing and mixing GC # 1000 and PVA (polyvinyl alcohol) is used, and a NaCl system is used as an electrolytic solution for electrolytic polishing. A copper-coated aluminum wire having an outer diameter of 0.205 mm and a copper area ratio of 5% was produced. The manufacturing process is shown in Table 3.

表3に示すように、初工程の銅被覆工程では、実施例1と同様、造管方式により外径φ9.5mmのアルミニウム線に厚さ0.4mmの銅テープを被覆し溶接して、外径φ10mm、銅面積率15%の銅被覆アルミニウム線の複合線を製造した。
次に、伸線工程において、この銅被覆アルミニウム線の複合線を外径φ0.217mmまで伸線加工し、これを原線とした。
次に、銅層研磨工程では、先ず上記原線に対して物理研磨を行い、原線を外径φ0.207mm、銅面積率6〜7%に加工した。物理研磨の条件としては、線速200m/min、張力2.0kgfにて原線を走行させると共に、上記PVA弾性砥石を原線に押圧させ、図3の工程に準じて物理研磨を行った。
As shown in Table 3, in the first copper coating step, as in Example 1, an aluminum wire having an outer diameter of 9.5 mm was coated with a copper tape having a thickness of 0.4 mm and welded by a pipe making method. A composite wire of copper-coated aluminum wire having a diameter of 10 mm and a copper area ratio of 15% was manufactured.
Next, in the wire drawing step, the copper-coated aluminum wire composite wire was drawn to an outer diameter of φ0.217 mm, which was used as the original wire.
Next, in the copper layer polishing step, first, physical polishing was performed on the original wire, and the original wire was processed into an outer diameter φ0.207 mm and a copper area ratio of 6 to 7%. As physical polishing conditions, the original wire was run at a linear speed of 200 m / min and a tension of 2.0 kgf, and the PVA elastic grindstone was pressed against the original wire, and physical polishing was performed according to the process of FIG.

物理研磨を行った原線について、横断面から銅層の平均厚さを測定し、全断面積から銅の面積比率を計算した。計算の結果、銅面積率は6.5%となり、導電率の測定計結果とも一致した。
次に、物理研磨を終えた原線に対し、図4の工程に準じて電解研磨を行い、外径φ0.205mm、銅面積率5%の製品線を製造した。
電解研磨の条件として、70℃に加熱したNaCl電解液に原線を走行させ、電流密度2〜5A/dm2となるように電解時間を調整した。
About the original wire which performed physical polishing, the average thickness of the copper layer was measured from the cross section, and the area ratio of copper was calculated from the total cross section. As a result of the calculation, the copper area ratio was 6.5%, which was consistent with the conductivity measurement result.
Next, electrolytic polishing was performed on the original wire after the physical polishing in accordance with the process of FIG. 4 to produce a product line having an outer diameter of 0.205 mm and a copper area ratio of 5%.
As conditions for electropolishing, a raw wire was run through a NaCl electrolyte heated to 70 ° C., and the electrolysis time was adjusted so that the current density was 2 to 5 A / dm 2 .

上記工程を経て製造された製品線について、横断面から銅層の平均厚さを測定し、全断面積から銅の面積比率を計算した。計算の結果、銅面積率は5.2%となり、導電率の測定結果とも一致し、目標を満足するものが得られた。   About the product line manufactured through the said process, the average thickness of the copper layer was measured from the cross section, and the area ratio of copper was calculated from the total cross-sectional area. As a result of the calculation, the copper area ratio was 5.2%, which coincided with the measurement result of the conductivity, and the one satisfying the target was obtained.

Figure 2008229703
Figure 2008229703

本発明の製造方法により得られる銅被覆アルミニウム線は、軽量で、且つ高い導電性を有するため、ハードディスク用ピックアップコイル、CATV用同軸ケーブル中心導体、ヘッドホン用巻線等に広く使用することができる。   Since the copper-coated aluminum wire obtained by the production method of the present invention is lightweight and has high conductivity, it can be widely used for a pickup coil for a hard disk, a coaxial cable center conductor for CATV, a winding for headphones, and the like.

本発明による銅被覆アルミニウム線の製造方法を示す工程図である。It is process drawing which shows the manufacturing method of the copper covering aluminum wire by this invention. 本発明による銅被覆アルミニウム線の製造方法における化学研磨工程を示す図である。It is a figure which shows the chemical polishing process in the manufacturing method of the copper covering aluminum wire by this invention. 本発明による銅被覆アルミニウム線の製造方法における物理研磨工程を示す図である。It is a figure which shows the physical polishing process in the manufacturing method of the copper covering aluminum wire by this invention. 本発明による銅被覆アルミニウム線の製造方法における電解研磨工程を示す図である。It is a figure which shows the electropolishing process in the manufacturing method of the copper covering aluminum wire by this invention.

符号の説明Explanation of symbols

1 アルミニウム線
2 銅(銅層)
3 銅被覆アルミニウム線の複合線
1 Aluminum wire 2 Copper (copper layer)
3 Composite wire of copper-coated aluminum wire

Claims (3)

アルミニウム線に銅を被覆して銅被覆アルミニウム線の複合線を製造する銅被覆工程と、前記銅被覆アルミニウム線の複合線を所定の径まで細径化する伸線工程とを有する銅被覆アルミニウム線の製造工程において、
前記銅の厚さを減少させ、所定の厚さに調整する銅層研磨工程を有することを特徴とする銅被覆アルミニウム線の製造方法。
A copper-coated aluminum wire having a copper coating step of manufacturing a composite wire of a copper-coated aluminum wire by coating copper on the aluminum wire, and a wire drawing step of reducing the composite wire of the copper-coated aluminum wire to a predetermined diameter In the manufacturing process of
A method for producing a copper-coated aluminum wire, comprising: a copper layer polishing step for reducing the thickness of the copper and adjusting it to a predetermined thickness.
前記銅の厚さ調整は、化学研磨、物理研磨、電解研磨のうち少なくとも1つの方法、または任意の2つ以上の方法の組み合わせにより行われることを特徴とする請求項1に記載の銅被覆アルミニウム線の製造方法。 2. The copper-coated aluminum according to claim 1, wherein the copper thickness adjustment is performed by at least one of chemical polishing, physical polishing, and electrolytic polishing, or a combination of any two or more methods. Wire manufacturing method. 請求項1または請求項2の何れかに記載の銅被覆アルミニウム線の製造方法により製造したことを特徴とする銅面積率10%未満の銅被覆アルミニウム線。 A copper-coated aluminum wire having a copper area ratio of less than 10%, which is produced by the method for producing a copper-coated aluminum wire according to claim 1.
JP2007076391A 2007-03-23 2007-03-23 Method of manufacturing copper-coated aluminum wire and copper-coated aluminum wire Pending JP2008229703A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011194439A (en) * 2010-03-19 2011-10-06 Fujikura Ltd Method of manufacturing copper-clad aluminum wire
WO2018164134A1 (en) * 2017-03-10 2018-09-13 株式会社フジクラ Wire and method for manufacturing same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011194439A (en) * 2010-03-19 2011-10-06 Fujikura Ltd Method of manufacturing copper-clad aluminum wire
WO2018164134A1 (en) * 2017-03-10 2018-09-13 株式会社フジクラ Wire and method for manufacturing same
CN110382128A (en) * 2017-03-10 2019-10-25 株式会社藤仓 Electric wire and its manufacturing method

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