JP2008216422A - Electrooptical device and manufacturing method of same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an electrooptical device wherein step difference is not generated in a color filter layer by adopting a technique different from a conventional one in a color filter of the electrooptical device and to provide its manufacturing method. <P>SOLUTION: The electrooptical device wherein an electrooptical substance 31 is disposed between a pair of substrates 10 and 20 has the color filter layer 23 disposed on the one substrate 10, formed by exposing and developing a photosensitive coloring agent having photosensitive coloring functions of a plurality of colors according to exposure wavelength distribution and including regions 23A, 23B, 23C and 23D of the plurality of colors. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to an electro-optical device and a method for manufacturing the electro-optical device, and more particularly, to a technique for forming a color filter layer of the electro-optical device.

  In general, color filters used in flat panel displays (FPDs) are formed by sequentially patterning filter materials and light-shielding materials of red, green, blue, black, etc. on a substrate to form filter regions and light-shielding regions. There is.

  However, in this method of forming a color filter in a plurality of steps, different color regions overlap each other at the peripheral edge, or a gap is formed between different color regions, so that color reproducibility and other optical properties can be achieved. In some cases, the characteristics deteriorated. In addition, when the above-described overlapping portion or gap is generated, a difference in thickness (a step) is generated in the color filter, and the thickness of the electro-optical material or the like may change depending on the location, which may reduce the display quality.

Therefore, a method for flattening the color filter layer by filling fine particles such as SiO ₂ by spin coating in the gaps between the filter regions (light-shielding regions) has been proposed (for example, see Patent Document 1 below). . In addition, a method has been proposed in which a step formed in a light shielding region between adjacent filter regions is corrected by a transparent resin film formed in an upper layer (see, for example, Patent Document 2 below).
JP-A-5-5875 JP-A-9-96808

  However, the above-described color filter flattening method requires a dedicated process different from the original color filter process in order to achieve the flattening of the color filter, which increases the manufacturing cost.

  In addition, since a method of compensating for the level difference generated in the color filter with another material is adopted, the flatness degree of the color filter becomes insufficient, and as a result, uniformity such as the thickness of the electro-optical material is sufficiently obtained. Therefore, there is a problem that the quality of the product cannot be improved.

  Therefore, the present invention solves the above-mentioned problems, and the problem is that an electric current in which no step is generated in the color filter layer by adopting a method different from the conventional color filter method in an electro-optical device. An optical device and a method for manufacturing the same are provided.

  In view of such circumstances, the electro-optical device of the present invention is an electro-optical device in which an electro-optical material is disposed between a pair of substrates, and is disposed on one of the substrates, and has a plurality of colors according to the exposure wavelength distribution. It is characterized by having a color filter layer including a plurality of color areas formed by exposing and developing a photosensitive color former having a photosensitive color development function.

  According to this invention, by forming a color filter layer formed by exposing and developing a photosensitive color former having at least a plurality of photosensitive color development functions corresponding to the exposure wavelength distribution, each color of the filter area and the light shielding area is formed. In addition, it is not necessary to separately form a colored layer and pattern it, so that the manufacturing process can be simplified. In addition, since the positional displacement of the filter region and the light shielding region does not occur, there is no overlap portion or gap at the boundary between them, so that the quality of the electro-optical device can be prevented from deteriorating.

  Here, as the photosensitive color former, as described below, a color coupler (so-called internal formula) previously mixed with a color coupler can be used. For example, it does not contain a color coupler and develops color at the color development stage of the development process. What is necessary is just to have photosensitivity and color developability as a function by including a photosensitizer and a color developing material, such as a type in which a coupler is introduced (so-called external type).

  In the present invention, it is preferable that the photosensitive color former includes a silver halide compound as a photosensitive agent and a plurality of color couplers as the color former. According to this, after the exposure is completed, a latent image is formed for each color with a photosensitive agent made of a silver halide compound, and a coloring coupler is reacted on the basis of the latent image to change into a dye. A region having a colored state corresponding to the exposure wavelength distribution can be formed. In particular, the development processing is facilitated by using a photosensitive color former in which a color coupler is previously incorporated. Such a method is capable of highly sensitive and highly saturated color development, and can easily cope with batch exposure.

  In the present invention, the photosensitive color former is preferably formed by blending the silver halide compound and the color coupler in a water-containing translucent substrate. According to this, exposure / development can be performed without any trouble by the water-containing translucent substrate. As the development processing, the desired color tone of the color filter and its stability can be ensured by surely solubilizing and eluting silver particles (and unnecessary couplers and the like if necessary) in the bleaching step of the development step. Here, examples of the water-containing light-transmitting substrate include emulsions containing gelatin, a water-containing acrylic resin, polyvinyl alcohol (PVA), and other hydrophilic colloids as main ingredients.

  In the present invention, it is preferable that a first electrode and a second electrode are provided on the other substrate, and the electro-optical material is controlled by an electric field generated between the first electrode and the second electrode. According to this, it is not necessary to form an electrode on one substrate by generating an electric field between the first electrode and the second electrode formed on the other substrate to control the electro-optic material. Since the high-temperature process after forming the color filter layer can be easily eliminated, the heat resistance of the color filter layer becomes unnecessary. In general, the photosensitive color developing layer has many heat resistant temperatures of about 400 to 500 ° C. Therefore, with the above configuration, the choice of the photosensitive color developing layer increases, and good filter characteristics can be easily obtained. .

  In the present invention, it is preferable that no electrode is provided on the one substrate. According to this, since it is not necessary to form an electrode on one substrate, a high temperature process after the color filter layer is formed becomes unnecessary, and thus the heat resistance of the color filter layer becomes unnecessary. In general, the photosensitive color developing layer has many heat resistant temperatures of about 400 to 500 ° C. Therefore, with the above configuration, the choice of the photosensitive color developing layer increases, and good filter characteristics can be easily obtained. .

  In the present invention, an alignment mark that is formed on the one substrate with the photosensitive color former and is used for alignment with another member that is arranged to overlap the one substrate in a plane is provided. preferable. According to this, by forming the alignment mark with the photosensitive color former, it is possible to easily form a mark with high visibility, and there is an advantage that it is not necessary to provide another mark forming step. Here, the other member includes not only the other substrate disposed to face the one substrate but also various members disposed to overlap the one substrate in a plane.

  Next, an electronic apparatus according to the present invention includes any one of the above electro-optical devices. The electro-optical device is preferably configured as a display device. In this case, the electronic apparatus includes the electro-optical device in a display unit. Examples of this type of electronic device include a television receiver, various monitor devices, an electronic timepiece, a mobile phone, and a projector device.

  Next, an electro-optical device manufacturing method according to the present invention is an electro-optical device manufacturing method in which an electro-optical material is disposed between a pair of substrates, and a plurality of colors corresponding to an exposure wavelength distribution is provided on one of the substrates. A base material arranging step of arranging a photosensitive color former having a photosensitive color development function, and an exposure step of causing a plurality of regions to be exposed to light having a plurality of different wavelength distributions to cause the photosensitive color former to generate a photosensitive action. A developing step of developing the exposed photosensitive color former to develop a color developing action in the region and forming the filter region of a plurality of colors.

  In the present invention, in the exposure step, it is preferable that the regions of a plurality of colors are formed by performing batch exposure with light having a plurality of different wavelength distributions. According to this, since not only the arrangement process of the photosensitive color former but also the exposure process can be performed at a time, the electro-optical device can be manufactured more efficiently.

  In the present invention, an electrode forming step of forming the first electrode and the second electrode on the other substrate, the one substrate and the other substrate are bonded together, and the electro-optical material is disposed between the two substrates. And a panel forming step. According to this, one substrate is formed by forming the color filter layer on one substrate and forming the first electrode and the second electrode for applying an electric field to the electro-optic material on the other substrate. In this case, a structure requiring a high temperature process such as an electrode can be omitted.

  In the present invention, an alignment mark formed by exposure in the raw material exposure step and color development in the raw material color development step is provided in advance on the one substrate, and in the panel formation step, the alignment mark is placed on the other substrate. It is preferable to perform alignment between the pair of substrates by aligning with a predetermined position on the substrate. According to this, an alignment mark can be formed on a substrate without an electrode or the like without providing a dedicated process.

  Next, a color filter substrate for an electro-optical device according to the present invention has a plurality of colors formed by exposing a substrate and a photosensitive colorant that is disposed on the substrate and has a photosensitive color developing function of a plurality of colors according to an exposure wavelength. And a color filter layer including the region.

  Next, embodiments of the present invention will be described in detail with reference to the accompanying drawings. 1 to 4 are process cross-sectional views showing a color filter substrate used in the electro-optical device of this embodiment and a manufacturing process thereof.

  In manufacturing the color filter substrate of the present embodiment, first, as shown in FIG. 1, a photosensitive color former 21 is disposed on a transparent substrate 20 made of glass, plastic or the like. The substrate 20 may not be transparent when a color filter layer described later is used in a reflective type, and the substrate surface may be formed of a material that constitutes a reflective surface, for example, a mirror surface or a white surface. . In addition, the photosensitive color former 21 includes a water-containing light-transmitting substrate, which is a so-called photographic emulsion, a water-containing acrylic resin such as gelatin or polyhydroxymethyl methacrylate, polyvinyl alcohol (PVA), In addition, various additives are prepared with hydrophilic colloid as the main ingredient. In the photosensitive color former 21, for example, a photosensitive agent such as a silver halide compound and a color former such as a color coupler are blended in the water-containing translucent substrate. Since the photosensitive color former of the present invention has a photosensitive color development function of a plurality of colors, it is preferable that a plurality of types of photosensitive agents having photosensitive characteristics in different wavelength regions are blended, and a photosensitive reaction corresponding to different wavelength regions. It is preferable to mix a plurality of types of color formers that develop colors corresponding to the above.

  Specific examples of the silver halide compound include silver chloride, silver chlorobromide, silver bromide, silver iodobromide or silver chloroiodobromide, and compounds thereof. As a photosensitizer, a plurality of photosensitizers having photosensitivity in a plurality of color wavelength ranges such as red photosensitivity, green photosensitivity, and blue photosensitivity may be blended.

  As the binder or protective colloid used in the emulsion layer of the light-sensitive material of the present invention, gelatin is advantageously used, but other hydrophilic colloids can also be used. For example, gelatin derivatives, graft polymers of gelatin and other polymers, albumin, casein proteins; cellulose derivatives such as hydroxyethyl cellulose, carboxymethyl cellulose, cellulose sulfates, sugar derivatives such as sodium alginate, starch derivatives; polyvinyl alcohol, polyvinyl Synthetic hydrophilic polymer materials such as alcohol partial acetals, poly-N-vinylpyrrolidone, polyacrylic acid, polymethacrylic acid, polyacrylamide, polyvinylimidazole, polyvinylpyrazole mono- or copolymers, and the like can be used.

  As the gelatin, in addition to general-purpose lime-processed gelatin, acid-processed gelatin and Journal of Japan Scientific Photography Association (Bull. Soc. Photo. Japan), No. An enzyme-treated gelatin as described in pages 16, 30 (1966) may be used, and a hydrolyzate of gelatin can also be used.

  On the other hand, as the color former, it is preferable to add a coupler that develops yellow, magenta, and cyan, respectively. For example, typical examples of yellow forming couplers include aylacetamide type compounds such as U.S. Pat. Nos. 3,933,501, 4,022,620, 4,326,024, The thing as described in 4,401,752 grade | etc., Is illustrated. Among those commonly used as yellow-forming couplers are α-acylactamide type compounds.

  The magenta-forming coupler is preferably a pyrazolone-type 5-pyrazolone-based or pyrazoloazole-based compound. For example, U.S. Pat. Nos. 4,310,619, 4,351,897, 3,061,432, 3,725,067, European Patent 73,636, etc. Things. Examples of the magenta-forming coupler include cyanoacetyl and indazolone systems in addition to the above-described pyrazole system.

  Further, as the cyan forming coupler, phenol-type and naphthol-type couplers such as 1-hydroxy-2-phenylamine type and 1-hydroxy-2-naphthahamide type are preferable. For example, U.S. Pat. No. 4,052,212, No. 4 No. 4,146,396, No. 4,228,233, No. 4,296,200, No. 2,369,929, No. 2,801,171, No. 2,772,162 2,895,826, 3,772,002, 3,758,308, 4,334,011, 4,327,173, etc. Is mentioned.

  The color coupler may be a 2-equivalent coupler or a 4-equivalent coupler, and may be an outer coupler or an inner coupler. The internal coupler may be either a water-soluble coupler or an oil-soluble coupler.

  Further, a plurality of color sensitizers and color formers exemplified above may be mixed to form a single layer, or sensitivities in different wavelength ranges such as a red-sensitive emulsion layer, a green-sensitive emulsion layer, and a blue-sensitive emulsion layer. Are separately formed, and one or a plurality of color formers corresponding to each of these layers may be included, and the photosensitive color former 21 may have a laminated structure (multilayer color sensitizer).

  Further, the light-shielding area may be formed by coloring all of the above-mentioned multiple color couplers (CMY), but it is formed by blending a black-forming coupler and coloring black with this black-forming coupler. Also good.

  The photographic emulsion containing silver halide used in the present technology contains various compounds for the purpose of preventing fogging during the production process, storage or photographic processing of the light-sensitive material, or stabilizing the photographic performance. be able to. That is, azoles such as benzothiazolium salts, nitroimidazoles, nitrobenzimidazoles, chlorobenzimidazoles, bromobenzimidazoles, mercaptothiazoles, mercaptobenzthiazoles, mercaptobenzimidazoles, mercaptothiadiazoles, aminotriazoles Benzotriazoles, nitrobenzotriazoles, mercaptotetrazoles (especially 1-phenyl-5-mercaptotetrazole); mercaptopyrimidines, mercaptotriazines; thioketo compounds such as oxadoline thione; Dens, tetraazaindenes (especially 4-hydroxy substituted (1,3,3a, 7) tetraazaindenes), pentaazaindenes, etc .; Emissions Zen thio sulfonic acid, benzenesulfonic fins acid, known as antifoggants or stabilizers such as benzenesulfonic acid amide, can be added to many compounds.

  The photosensitive color former 21 preferably contains various sensitizers. Also, coating aids, antistatic properties, slipperiness improvement, emulsification dispersion, adhesion prevention, and photographic property improvements (for example, development acceleration, high contrast, One or more surfactants may be included for various purposes such as sensitization.

  A water-soluble dye may be contained in the hydrophilic colloid layer as a filter dye or for various purposes such as prevention of irradiation or halation. As such dyes, oxonol dyes, hexoxonol dyes, styryl dyes, merocyanine dyes, anthraquinone dyes, and azo dyes are preferably used, and cyanine dyes, azomethine dyes, triarylmethine dyes, and phthalocyanine dyes are also useful. An oil-soluble dye can be emulsified by an oil-in-water dispersion method and added to the hydrophilic colloid layer.

  In addition, as a method for arranging the photosensitive color former 21 on the substrate 20, a spin coating method, a printing method such as screen printing, a roll coating method using a coating roller, a coating method using a dispenser, or a photosensitive color former in advance. The sheet can be made into a sheet and attached to the substrate, or any other coating method can be used. Further, the thickness of the layer of the photosensitive color former is not particularly limited, but is preferably 5 to 30 μm and particularly preferably within the range of 10 to 20 μm in order to ensure sufficient saturation as a color filter. .

  The photosensitive color former 21 is preferably disposed on the entire surface (inner surface) of the substrate 20. In the present embodiment, an effect is obtained that it is not necessary to perform film formation or patterning processing for each filter color as in the prior art. However, by arranging the photosensitive color former 21 on the entire surface of the substrate 20, A further advantage is obtained in that it is not necessary to perform a selective coating method for selective placement or a patterning process for removing unnecessary portions.

  Next, as shown in FIG. 2, the photosensitive color former 21 is collectively exposed using a light source (not shown) and a color mask 22 formed in advance. The color mask 22 has mask regions 22A, 22B, 22C, and 22D corresponding to a plurality of regions (filter regions and light shielding regions) to be formed in the color filter. For example, the mask regions 22A, 22B, and 22C are optical filters corresponding to red, green, and blue, and the mask region 22D is a light shielding filter that corresponds to black.

  Here, instead of performing batch exposure using the color mask 22, exposure using a mask having translucency only in a predetermined region and light having a predetermined wavelength distribution corresponding thereto is different from a different mask. It is also possible to sequentially expose with light. Even in the case of sequential exposure as described above, the photosensitive color former 21 to be exposed is common.

  Next, the photosensitive color former 21 exposed as described above is developed to form a color filter layer 23 having filter regions 23A, 23B, 23C and a light shielding region 23D as shown in FIG. For example, the filter area 23A is a red filter, the filter area 23B is a green filter, the filter area 23C is a blue filter, and the light shielding area 23D is a black light shielding portion. The plurality of regions in the color filter layer 23 preferably include regions having at least two different colors, and particularly preferably include regions having three or more different colors. Actually, when full-color display is performed, it is desirable to include filter regions of three or four colors.

  In the above development step, when the photosensitive color former 21 formed by blending the silver halide compound and the color coupler in the water-containing translucent substrate as described above is used, the latent image by exposure is usually reacted. Black and white development stage to produce silver particles, reversal processing stage to form a latent image on the unexposed area, color development stage to color the latent image part in the reversal processing stage by changing the color coupler to a dye Then, a bleaching step is performed in which the produced silver particles (and unnecessary couplers, etc., if necessary) are solubilized and eluted by washing with water. In the final bleaching step, silver particles are removed using the water content of the light-transmitting substrate.

  Finally, as shown in FIG. 4, a transparent protective film 24 is formed on the color filter layer 23 with an acrylic resin or the like. The protective film 24 protects the color filter layer 23 and prevents foreign matter from entering. Note that the protective film 24 is not necessary when the color filter layer 23 has sufficient resistance, or when there is no influence from the portion in contact with the color filter layer 23.

  In the present embodiment, as described above, exposure is performed with a different wavelength distribution for each region of the photosensitive color former 21 that is common, and then development processing is performed, so that the filter regions 23A, 23B, and 23C of a plurality of colors and the light shielding are performed. Since the color filter layer 23 having the region 23D can be formed, the manufacturing process of the color filter layer is simplified, and no positional deviation occurs in each region of the color filter layer 23. There is no step. Therefore, even when another structure is formed on the color filter layer 23, it is possible to prevent problems associated with the positional deviation and the step.

  Next, an embodiment of the electro-optical device according to the invention will be described with reference to FIGS. The color filter layer 23 formed as described above can be widely used as a color filter of various electro-optical devices including a liquid crystal display device. In particular, one substrate called a lateral electric field method is used. It is preferably used for an electro-optical device that does not require an electrode formed thereon. As an example, there is a horizontal electric field type liquid crystal display device that includes two types of electrodes for applying an electric field to liquid crystal only on the other substrate without an electrode on one substrate. In the following, this horizontal electric field type liquid crystal display device will be described as an example.

  FIG. 5 is a schematic longitudinal sectional view schematically showing the overall configuration of a liquid crystal display panel 100 constituting a liquid crystal display device which is an example of the electro-optical device of the present invention. The liquid crystal display panel 100 is configured by forming a cell structure by bonding transparent substrates 10 and 20 made of glass, plastic, or the like via a sealing material 30 and enclosing a liquid crystal 31 therein. Here, as shown in FIG. 5, the substrate 10 has a protruding portion 10 </ b> T that protrudes outward from the outer edge of the substrate 20. A polarizing plate 19 is installed on the outer surface of the substrate 10, and a polarizing plate 29 is installed on the outer surface of the substrate 20.

  In the liquid crystal display panel 100, generally, an illuminating device (planar light source) (not shown) is disposed adjacent to the substrate 10 as a backlight, and the illumination light emitted from the illuminating device is applied to the polarizing plate 19 and the substrate. 10, the liquid crystal 31, the substrate 20, and the polarizing plate 29 are sequentially passed to modulate the light for each sub-pixel P. As a result, a desired image is formed in the display region 100 </ b> A. Further, a diffusion sheet and a prism sheet (not shown) are provided between the lighting device and the substrate 10. The diffusion sheet has a role of diffusing illumination light emitted from the illumination device in all directions. The prism sheet has a role of condensing illumination light on the liquid crystal display panel 100.

  Here, the internal structure of the liquid crystal display panel 100 will be described. The liquid crystal display panel 100 is a horizontal electric field type liquid crystal display panel. FIG. 6A shows an enlarged longitudinal sectional view of the liquid crystal display panel 100 in one sub-pixel P. Here, as an example, it is assumed that the liquid crystal display panel 100 is an FFS (Fringe Field Switching) type liquid crystal display panel. However, the horizontal electric field mode may be a liquid crystal display panel of another type such as an IPS (In-plane Switching) method.

  As described above, the liquid crystal display panel 100 is configured by disposing the liquid crystal 31 between the substrate 10 and the substrate 20. On the inner surface of the substrate 10, a common electrode 11 is formed in a planar shape by a transparent conductor such as ITO. On the inner surface of the common electrode 11, an insulating layer 12 is formed in a planar shape with acrylic resin or the like to cover the common electrode 11. A pixel electrode 13 is formed on the inner surface of the insulating layer 12 by a transparent conductor such as ITO. An alignment mark 18 is formed in a partial region on the inner surface of the substrate 10 (in the illustrated example, a region outside the sealing material 30). The alignment mark 18 is a mark used for alignment when the substrates 10 and 20 are bonded together with an alignment mark 28 described later.

  On the other hand, on the inner surface of the substrate 20, the color filter layer 23 including the filter regions 23A, 23B, 23C and the light shielding region 23D is formed. A protective film 24 is formed on the inner surface of the color filter layer 23 as necessary, and an alignment film 25 is formed on the inner surface. An alignment mark 28 having at least one of brightness and hue different from the surroundings is provided in a partial region of the color filter layer 23 (in the illustrated example, the region outside the sealing material 30). The alignment mark 28 corresponds to the alignment mark 18 described above. It is formed in the position (position where alignment is possible).

  FIG. 6B shows a plan view of the pixel electrode 13. As shown in FIG. 6B, the pixel electrode 13 has a comb shape. Specifically, the pixel electrode 13 is configured in a straight line, and includes conductive portions 13a, 13b, 13c, 13d, and 13e, which are arranged in a stripe shape. The plurality of conductive portions are integrated. The liquid crystal display panel 100 generates a horizontal electric field (lateral electric field) E between the conductive portions 13 a to 13 e of the pixel electrode 13 and the common electrode 11.

  Returning to FIG. 5 and continuing the description, in the liquid crystal display panel 100 configured as described above, a plurality of sub-pixels P are arranged in the display region 100A. The sub-pixel P includes any one of the filter regions 23A, 23B, and 23C of the color filter layer 23, and occupies a plane range corresponding to these regions. Further, an inter-pixel region G formed by the light-shielding region 23D is formed between the sub-pixels P, and the portion is shielded by the light-shielding region 23D, so that the control by the electric field E is insufficient in the inter-pixel region G. The light leakage due to the alignment state of the liquid crystal 31 is prevented, and the display quality is ensured.

  Here, in the illustrated example, the color filter layer 23 is formed entirely on the inner surface of the substrate 20, thereby eliminating the need for a selective coating method or patterning process in the formation process of the color filter layer 23. It is possible. However, the color filter layer 23 may be limited to the inner region of the sealing material 30 depending on the adhesion to the sealing material 30, the thickness of the liquid crystal 31, and the like.

  Further, on the surface of the projecting portion 10T of the substrate 10, a drive circuit 32 that is a liquid crystal drive IC (driver) is directly arranged by a COG (Chip On Glass) technique. At the end of the liquid crystal display panel 100, an FPC (Flexible Printed Circuit) 33, which is a flexible substrate, is disposed. Further, on the surface of the overhanging portion 10T of the substrate 10, wirings 15, 16, and 17 are formed, for example, by patterning a copper foil by a photoetching method or the like. Some terminals of the drive circuit 32 are electrically connected to the FPC 33 through the wiring 17 formed on the projecting portion 10T of the substrate 10.

  The common electrode 11 is electrically connected to a common potential terminal (COM terminal) of the drive circuit 32 through the wiring 15 formed on the projecting portion 10T of the substrate 10. The pixel electrode 13 is connected to a part of a terminal of the drive circuit 32 through a wiring 16 formed on the overhanging portion 10T of the substrate 10 (formed at a cross-sectional position different from the cross section of FIG. 5 where the wiring 15 is shown). Electrically connected. The drive circuit 32 controls the magnitude of the electric field E based on a control signal supplied from an external electronic device via the FPC 33. In the horizontal electric field type liquid crystal display panel 100, by controlling the magnitude of the electric field E, the alignment state of the liquid crystal molecules in the liquid crystal 31 is changed, and the gradation on the display screen is changed.

  As can be seen from the above, in the horizontal electric field type liquid crystal display panel 100, electrodes for forming the electric field E such as the pixel electrode 13 and the common electrode 11 are formed only on the inner surface of the substrate 10. No electrode is formed on the inner surface. Therefore, for example, the color filter layer 23 formed on the inner surface of the substrate 20 which is a color filter substrate does not need to be subjected to an electrode forming process on the inner surface, and in particular, for forming a transparent conductor such as ITO. It is not affected by the necessary high temperature process, for example, temperatures exceeding 400 ° C. In addition, the formation process of the alignment film 25 is sufficient at most about 200-400 degreeC heating.

  As a result, in the liquid crystal display panel 100 according to the present embodiment, since the color filter layer 23 formed as described above is not exposed to high temperatures, even the configuration mainly composed of the above water-containing translucent substrate is qualitative. Will not be affected. Therefore, the choice of material for the color filter layer 23 is widened, and it becomes easy to optimize the light transmission characteristics.

  Further, in the present embodiment, by using the color filter layer 23 described above, the surface of the color filter layer 23 can be configured so as not to have a step, so that the uniformity of the thickness of the liquid crystal 31 can be improved. As a result, display quality can be improved.

  (Manufacturing method of liquid crystal device)

  Next, a method for manufacturing the liquid crystal display panel 100 according to the present embodiment will be described. First, as shown in FIG. 5, as a substrate forming step, the common electrode 11, the insulating film 12, the pixel electrode 13, the wirings 15, 16, and 17 are formed on the inner surface of the substrate 10, and on the inner surface of the substrate 20. Then, the color filter layer 23, the protective film 24, and the alignment film 25 are formed.

  At this time, the alignment mark 18 is formed on the inner surface of the substrate 10 (in the illustrated example, the region outside the sealing material 30). The alignment mark 18 can be formed simultaneously with any process for forming a structure on the inner surface of the substrate 10. For example, in the illustrated example, the alignment mark 18 is formed of the same material simultaneously with the formation process of the common electrode 11 or the pixel electrode 13.

  On the other hand, an alignment mark 28 is formed on the inner surface of the substrate 20 (in the illustrated example, the region outside the sealing material 30), which forms a structure on the inner surface of the substrate 20. For example, in the case of the illustrated example, the alignment mark 28 is formed of the same material as the color filter layer 23. Specifically, In the exposure process shown in FIG. 2, a pattern corresponding to the alignment mark 28 is incorporated into the exposure pattern constituted by the color mask 22 and the like, so that a part of the color filter layer 23 is surrounded by the pattern after the development process shown in FIG. Alignment marks 28 having different light transmission characteristics (for example, characteristics having different brightness and hue) are formed.

  Next, as a display panel manufacturing process, the two substrates 10 and 20 are bonded together via the sealing material 30. At this time, alignment of the substrates 10 and 20 is performed by aligning the alignment mark 28 with the alignment mark 18 before the bonding. The alignment can also be performed by aligning the alignment mark 28 with another structure such as wiring and terminals on the inner surface of the substrate 10 instead of providing the alignment mark 18.

  Thereafter, the liquid crystal 31 is sealed between the two bonded substrates 10 and 20 and is electrically connected to the wirings 15, 16 and 17 patterned on the protruding portion 10 </ b> T of the substrate 10. The drive circuit 32 and the FPC 33 are arranged on the substrate 10 and mounted by the Chip On Glass) technology.

  In the above manufacturing method, the case where the horizontal electric field type liquid crystal display panel 100 is manufactured has been described as an example, but the color filter layer 23 is formed by forming the horizontal electric field type electro-optical panel in this way. Since it is not necessary to perform a high-temperature process exceeding 400 ° C. later, the allowable range of heat resistance of the color filter layer 23 is widened, and the optical characteristics can be optimized.

  However, even if it is not said structure, it can respond by reducing the process after formation of the color filter layer 23 at low temperature. For example, even when an electrode is formed on the color filter layer 23 on the inner surface of the substrate 20 with a transparent conductor such as ITO, a high temperature process can be avoided by forming the electrode as an amorphous transparent conductive film. it can. A transparent conductive film can also be formed by a low temperature process by forming a zinc oxide thin film by film formation from zinc vapor using oxygen plasma. On the other hand, even with a metal electrode used in a reflective panel or the like, it is possible to form an electrode at a low temperature by sputtering or vapor deposition.

[Electronics]
Finally, an embodiment in which the electro-optical device according to each embodiment described above is mounted on an electronic apparatus will be described. This electronic device is an electronic device in which the liquid crystal display panel 100 is mounted on a display unit, and FIG. 7 is a schematic configuration diagram showing an overall configuration of a control system (display control system) for a liquid crystal display device in the electronic device. is there. The electronic device shown here includes a display information output source 291, a display information processing circuit 292, a power supply circuit 293, a timing generator 294, and a light source control circuit 295 that supplies power to the backlight 140. 290. Further, the liquid crystal display device is provided with the liquid crystal display panel 100 having the above-described configuration, a drive circuit 132 for driving the liquid crystal display panel 100, and a backlight 140 for illuminating the liquid crystal display panel 100. . The drive circuit 132 includes electronic components that are directly mounted on the liquid crystal display panel 100 as described above. In addition to the above-described aspect, the drive circuit 132 is a circuit formed on the substrate surface of the liquid crystal display panel 100. A pattern or a semiconductor IC chip or a circuit pattern mounted on a circuit board (the FPC 133 described above) conductively connected to the liquid crystal display panel 100 can also be used.

  The display information output source 291 includes a memory such as a ROM (Read Only Memory) or a RAM (Random Access Memory), a storage unit such as a magnetic recording disk or an optical recording disk, and a tuning circuit that tunes and outputs a digital image signal. The display information is supplied to the display information processing circuit 292 in the form of an image signal or the like of a predetermined format based on various clock signals generated by the timing generator 294.

  The display information processing circuit 292 includes various known circuits such as a serial-parallel conversion circuit, an amplification / inversion circuit, a rotation circuit, a gamma correction circuit, and a clamp circuit, and executes processing of input display information to obtain image information. Are supplied to the drive circuit 132 together with the clock signal CLK. The drive circuit 132 includes a scanning line drive circuit, a signal line drive circuit, and an inspection circuit. The power supply circuit 293 supplies a predetermined voltage to each of the above-described components.

  The light source control circuit 295 supplies power to the light source of the backlight 140 based on the voltage supplied from the power supply circuit 293, and controls whether or not the light source is turned on and its brightness based on a predetermined control signal. ing.

  FIG. 8 shows a mobile phone which is an embodiment of an electronic apparatus according to the present invention. A cellular phone 1000 shown here includes an operation unit 1001 provided with a plurality of operation buttons, a mouthpiece, and the like, and a display unit 1002 provided with a mouthpiece and the like, and the liquid crystal display panel described above is provided inside the display unit 1002. 100 is incorporated. The display area 100A (see FIG. 5) of the liquid crystal display panel 100 can be visually recognized on the surface (inner surface) of the display unit 1002. In this case, the display control circuit 290 for controlling the liquid crystal display panel 100 is provided inside the mobile phone 1000. This display control circuit 290 determines the display mode of the liquid crystal display panel 100.

  In addition to the mobile phone shown in FIG. 8, examples of the electronic apparatus according to the present invention include a liquid crystal television, a car navigation device, a pager, an electronic notebook, a calculator, a workstation, a videophone, and a POS terminal. And the liquid crystal display device which concerns on this invention can be used as a display part of these various electronic devices.

  Note that the present invention is not limited to the illustrated examples described above, and various modifications can be made without departing from the scope of the present invention. For example, in the above-described embodiment, the liquid crystal display device including the liquid crystal display panel has been described. However, the present invention is not limited to the liquid crystal display device, and other electro-optical devices such as an organic electroluminescence display device and an electrophoretic display device. It may be a device.

FIG. 5 is a schematic process diagram illustrating a method for manufacturing a color filter substrate according to an embodiment. FIG. 5 is a schematic process diagram illustrating a method for manufacturing a color filter substrate according to an embodiment. FIG. 5 is a schematic process diagram illustrating a method for manufacturing a color filter substrate according to an embodiment. FIG. 5 is a schematic process diagram illustrating a method for manufacturing a color filter substrate according to an embodiment. 1 is a schematic longitudinal sectional view showing a structure of a liquid crystal display panel of an embodiment. FIG. 2 is an enlarged longitudinal sectional view (a) and an enlarged plan view (b) showing a structure of a sub-pixel of the liquid crystal display panel of the embodiment. 1 is a schematic configuration diagram illustrating a display control circuit of an electronic apparatus according to an embodiment. 1 is a schematic perspective view illustrating an example of an electronic apparatus according to an embodiment.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10, 20 ... Substrate, 11 ... Common electrode, 12 ... Insulating layer, 13 ... Pixel electrode, 15, 16, 17 ... Wiring, 18 ... Alignment mark, 19 ... Polarizing plate, 21 ... Photosensitive color former, 22 ... Color mask 23 ... Color filter layer, 23A, 23B, 23C ... Filter area, 23D ... Light shielding area, 24 ... Protective film, 25 ... Alignment film, 28 ... Alignment mark, 29 ... Polarizing plate, 100 ... Liquid crystal display panel (electro-optical panel) ), 30 ... Sealing material, 31 ... Liquid crystal, 32 ... Drive circuit, 33 ... FPC, 290 ... Display control circuit, 1000 ... Electronic equipment (mobile phone)

Claims (9)

  In an electro-optical device in which an electro-optical material is disposed between a pair of substrates, a photosensitive colorant that is disposed on one of the substrates and has a photosensitive color developing function of a plurality of colors according to an exposure wavelength distribution is exposed and developed. An electro-optical device comprising a color filter layer including a plurality of color regions.   2. The electro-optical device according to claim 1, wherein the photosensitive color former includes a silver halide compound as a photosensitive agent and a plurality of color couplers as the color former.   3. The electro-optical device according to claim 2, wherein the photosensitive color former is obtained by blending the silver halide compound and the color coupler in a water-containing translucent substrate.   4. The electro-optical material according to claim 1, further comprising a first electrode and a second electrode on the other substrate, wherein the electro-optic material is controlled by an electric field generated between the first electrode and the second electrode. The electro-optical device according to one item.   The electro-optical device according to claim 1, wherein no electrode is provided on the one substrate.   An alignment mark formed on the one substrate with the photosensitive color former and used for alignment with another member arranged to overlap the one substrate in a plane is provided. Item 6. The electro-optical device according to any one of Items 1 to 5.   An electronic apparatus comprising the electro-optical device according to any one of claims 1 to 6. In a method for manufacturing an electro-optical device in which an electro-optical material is disposed between a pair of substrates,
On the one substrate, a base agent arrangement step of arranging a photosensitive color former having a photosensitive color development function of a plurality of colors according to the exposure wavelength distribution;
An exposure step of exposing a plurality of regions with light having a plurality of different wavelength distributions to produce a photosensitive action by the photosensitive color former;
Developing the exposed photosensitive color former to cause color development in the region, and forming the region of a plurality of colors;
An electro-optical device manufacturing method comprising:   9. The method of manufacturing an electro-optical device according to claim 8, wherein, in the exposure step, the regions of a plurality of colors are formed by performing batch exposure with light having a plurality of different wavelength distributions.

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