JP2008211188A5 - - Google Patents
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- Publication number
- JP2008211188A5 JP2008211188A5 JP2008011473A JP2008011473A JP2008211188A5 JP 2008211188 A5 JP2008211188 A5 JP 2008211188A5 JP 2008011473 A JP2008011473 A JP 2008011473A JP 2008011473 A JP2008011473 A JP 2008011473A JP 2008211188 A5 JP2008211188 A5 JP 2008211188A5
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor element
- semiconductor device
- circuit region
- resin layer
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims 34
- 239000011347 resin Substances 0.000 claims 7
- 229920005989 resin Polymers 0.000 claims 7
- 239000000758 substrate Substances 0.000 claims 5
- 230000000875 corresponding Effects 0.000 claims 3
Claims (10)
前記第1の半導体素子上に積層され、前記第1の半導体素子の外縁から突出している突出部を有する第2の半導体素子と、
を備え、
前記第2の半導体素子は第1の回路領域とこの第1の回路領域よりも高い温度に発熱しやすい第2の回路領域とを有し、この第2の回路領域が前記突出部を含むように配置されていることを特徴とする半導体装置。 A first semiconductor element;
A second semiconductor element stacked on the first semiconductor element and having a protruding portion protruding from an outer edge of the first semiconductor element;
With
The second semiconductor element has a first circuit region and a second circuit region that easily generates heat at a temperature higher than that of the first circuit region, and the second circuit region includes the protruding portion. A semiconductor device characterized in that the semiconductor device is disposed.
前記樹脂層は、前記第2の半導体素子の前記第2の回路領域を含む端部とこれに対応する前記樹脂層の側壁面との間隔がそれ以外の端部における間隔よりも短くなるように形成されていることを特徴とする請求項1に記載の半導体装置。 The first semiconductor element and the second semiconductor element are disposed on a substrate and sealed with a resin layer formed on the substrate,
The resin layer has an interval between the end portion including the second circuit region of the second semiconductor element and a corresponding side wall surface of the resin layer shorter than an interval at the other end portion. The semiconductor device according to claim 1, wherein the semiconductor device is formed.
至5のいずれかに記載の半導体装置。 The second semiconductor element is stacked on the first semiconductor element such that a plurality of sides of the second semiconductor element protrude from an outer edge of the first semiconductor element. The semiconductor device according to any one of 1 to 5.
前記電極部は前記第1の半導体素子と前記第2の半導体素子とが重畳する領域に配置されていることを特徴とする請求項1乃至8のいずれかに記載の半導体装置。 The second circuit region includes an electrode portion;
The semiconductor device according to claim 1, wherein the electrode portion is disposed in a region where the first semiconductor element and the second semiconductor element overlap each other.
前記電極部は前記突出部に配置されていることを特徴とする請求項1乃至8のいずれかに記載の半導体装置。 The second circuit region includes an electrode portion;
The semiconductor device according to claim 1, wherein the electrode portion is disposed on the protruding portion.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008011473A JP5193611B2 (en) | 2007-01-31 | 2008-01-22 | Semiconductor device |
US12/022,840 US7893539B2 (en) | 2007-01-31 | 2008-01-30 | Semiconductor apparatus and mobile apparatus |
CN2008101092128A CN101286507B (en) | 2007-01-31 | 2008-01-31 | Semiconductor apparatus and mobile apparatus |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007020683 | 2007-01-31 | ||
JP2007020683 | 2007-01-31 | ||
JP2008011473A JP5193611B2 (en) | 2007-01-31 | 2008-01-22 | Semiconductor device |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012279956A Division JP5431567B2 (en) | 2007-01-31 | 2012-12-21 | Semiconductor device |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2008211188A JP2008211188A (en) | 2008-09-11 |
JP2008211188A5 true JP2008211188A5 (en) | 2011-03-03 |
JP5193611B2 JP5193611B2 (en) | 2013-05-08 |
Family
ID=39787192
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008011473A Expired - Fee Related JP5193611B2 (en) | 2007-01-31 | 2008-01-22 | Semiconductor device |
JP2012279956A Expired - Fee Related JP5431567B2 (en) | 2007-01-31 | 2012-12-21 | Semiconductor device |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012279956A Expired - Fee Related JP5431567B2 (en) | 2007-01-31 | 2012-12-21 | Semiconductor device |
Country Status (2)
Country | Link |
---|---|
JP (2) | JP5193611B2 (en) |
CN (1) | CN101286507B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5535351B1 (en) | 2013-03-01 | 2014-07-02 | 株式会社東芝 | Semiconductor device |
JP6081229B2 (en) | 2013-03-01 | 2017-02-15 | 株式会社東芝 | Semiconductor device, wireless device, and storage device |
JP6004537B2 (en) | 2013-03-18 | 2016-10-12 | コベルコ建機株式会社 | jib |
KR102501845B1 (en) | 2021-02-08 | 2023-02-20 | 경희대학교 산학협력단 | Composition for skin regeneration and wound healing comprising the extract of Cynanchum wilfordii as an active ingredient |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05235113A (en) * | 1992-02-21 | 1993-09-10 | Toshiba Corp | Semiconductor device |
JPH06275752A (en) * | 1993-03-18 | 1994-09-30 | Hitachi Ltd | Cooling device for semiconductor device |
JP2001320014A (en) * | 2000-05-11 | 2001-11-16 | Seiko Epson Corp | Semiconductor device and its manufacturing method |
JP4554152B2 (en) * | 2002-12-19 | 2010-09-29 | 株式会社半導体エネルギー研究所 | Manufacturing method of semiconductor chip |
JP2005150456A (en) * | 2003-11-17 | 2005-06-09 | Oki Electric Ind Co Ltd | Semiconductor device and its manufacturing method |
JP2005268533A (en) * | 2004-03-18 | 2005-09-29 | Shinko Electric Ind Co Ltd | Laminated semiconductor device |
JP2006196709A (en) * | 2005-01-13 | 2006-07-27 | Sharp Corp | Semiconductor device and manufacturing method thereof |
JP2008177241A (en) * | 2007-01-16 | 2008-07-31 | Toshiba Corp | Semiconductor package |
-
2008
- 2008-01-22 JP JP2008011473A patent/JP5193611B2/en not_active Expired - Fee Related
- 2008-01-31 CN CN2008101092128A patent/CN101286507B/en not_active Expired - Fee Related
-
2012
- 2012-12-21 JP JP2012279956A patent/JP5431567B2/en not_active Expired - Fee Related
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