JP2008209583A - Manufacturing method of coated film - Google Patents

Manufacturing method of coated film Download PDF

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JP2008209583A
JP2008209583A JP2007045256A JP2007045256A JP2008209583A JP 2008209583 A JP2008209583 A JP 2008209583A JP 2007045256 A JP2007045256 A JP 2007045256A JP 2007045256 A JP2007045256 A JP 2007045256A JP 2008209583 A JP2008209583 A JP 2008209583A
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coating
film
microcapsule
microcapsules
electrode
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Junichi Arai
潤一 新井
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Toppan Inc
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Toppan Printing Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a coated film which does not produce such a problem as to make a coated film thickness uneven when foreign matter is attached to the back surface of a film base material, or when the foreign matter is attached to the surface of a coating stage. <P>SOLUTION: The manufacturing method of a coated film is characterized in that, with respect to a coating method of evenly applying coating liquid in which microcapsules are dispersed on the surface to be coated of the film base material, the surface of the coating stage brought into contact with the back surface of the film base material is provided with a shape continuously having innumerable hollows, wherein diameters or breadths of the hollows and spaces of the adjacent hollows are 400% or less of the average particle size of the microcapsules. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、マイクロカプセル型電気泳動表示装置などの表示部材である塗工フィルムの製造方法であり、フィルムを主材料とした積層体に関する。   The present invention relates to a method for producing a coated film, which is a display member such as a microcapsule type electrophoretic display device, and relates to a laminate comprising a film as a main material.

近年、電気泳動現象を利用した表示装置のひとつとして、マイクロカプセル型電気泳動方式が実用化されている。この方式の表示装置は、透明溶媒が満たされたマイクロカプセル中に正・負に帯電した黒い粒子と白い粒子を入れ、外部電圧の印加によってそれぞれの粒子を表示面に引き上げて画像を形成するものである。   In recent years, a microcapsule type electrophoresis system has been put to practical use as one of display devices utilizing the electrophoresis phenomenon. In this type of display device, positive and negatively charged black particles and white particles are placed in microcapsules filled with a transparent solvent, and an image is formed by pulling up each particle to the display surface by applying an external voltage. It is.

マイクロカプセルの粒径は数十μm〜数百μmであり、このマイクロカプセルを透明なバインダーに分散させた塗工液(11)は、インクのように塗工することができる(図1)。透明フィルム基材(1)上に形成した透明導電層(2)の面に、この塗工液(11)を塗工して表示層(3)を形成し、得られた積層体を背面電極(6)としてアクティブマトリクス駆動用の電極回路を形成した基材に貼り合わせると、例えば特許文献1に示すようなアクティブマトリクス電気泳動表示装置を得ることができる(図9)。   The particle size of the microcapsules is several tens of μm to several hundreds of μm, and the coating liquid (11) in which the microcapsules are dispersed in a transparent binder can be applied like ink (FIG. 1). The display layer (3) is formed by coating the coating liquid (11) on the surface of the transparent conductive layer (2) formed on the transparent film substrate (1), and the resulting laminate is used as the back electrode. When (6) is attached to a base material on which an active matrix driving electrode circuit is formed, an active matrix electrophoretic display device as shown in, for example, Patent Document 1 can be obtained (FIG. 9).

また、背面電極(6)としてセグメント電極、単純マトリックス電極等の電気回路が形成されている電極基板または電極フィルムに貼り合わせた場合には、パッシブマトリクス電気泳動表示装置を得ることができる。   Moreover, when it adheres to the electrode substrate or electrode film in which electric circuits, such as a segment electrode and a simple matrix electrode, are formed as a back electrode (6), a passive matrix electrophoretic display device can be obtained.

先行技術文献は以下の通り。
特開2000−221546号公報
Prior art documents are as follows.
JP 2000-221546 A

しかし、マイクロカプセルの塗工液(11)を、透明フィルム基材(1)上に形成した透明電極層(2)(以下、透明電極層(2)/透明フィルム基材(1)の積層体を、フィルム基材(12)と呼ぶ)の上に塗工する際、フィルム基材(12)の裏面(12b)にゴミなどの異物(15)が付着していた場合、または塗工ステージ(14)の表面に異物が付着していた場合、塗工の膜厚が不均一になる問題が生じる(図2)。   However, a transparent electrode layer (2) (hereinafter referred to as transparent electrode layer (2) / transparent film substrate (1) laminate formed by applying the microcapsule coating liquid (11) on the transparent film substrate (1). Is coated on the film substrate (12)) when foreign matter (15) such as dust adheres to the back surface (12b) of the film substrate (12), or the coating stage ( When foreign matter is attached to the surface of 14), there arises a problem that the film thickness of the coating becomes non-uniform (FIG. 2).

これは、フィルム基材(12)の裏面(12b)と塗工ステージ(14)の間にゴミなどの異物(15)が存在すると、その異物(15)がフィルム基材(12)を押し上げ、塗工液(11)の吐出口(13)との距離を狭め、最終的にその異物の位置を中心とした周辺で塗工厚が減少するためである。マイクロカプセル塗工液(11)の場合、塗工厚の減少により、最終的にはマイクロカプセルの緻密性が低下した点状の塗工ムラ(16)となる(図3、図4)。   This is because, when foreign matter (15) such as dust exists between the back surface (12b) of the film base (12) and the coating stage (14), the foreign matter (15) pushes up the film base (12), This is because the distance from the discharge port (13) of the coating liquid (11) is narrowed, and the coating thickness is finally reduced around the position of the foreign matter. In the case of the microcapsule coating liquid (11), due to the decrease in the coating thickness, finally the dot-like coating unevenness (16) in which the density of the microcapsules is reduced (FIGS. 3 and 4).

マイクロカプセルが分散された様な塗工液(11)はチキソ性が高いため、塗工の際に一度発生した不均一な塗工ムラは、その後も平面化、均一化することはない。それ故に、塗工液(11)を乾燥させて溶媒を蒸発させて形成される塗膜もまた不均一なムラ状に形成されてしまう。   Since the coating liquid (11) in which the microcapsules are dispersed has high thixotropy, the uneven coating unevenness once generated during coating is not flattened or made uniform thereafter. Therefore, the coating film formed by drying the coating liquid (11) and evaporating the solvent is also formed in a non-uniform uneven shape.

上記の課題を解決するため、
本発明は、マイクロカプセルが分散された塗工液(11)をフィルム基材(12)の塗
工面(12a)に均一塗布する塗工方法において、前記フィルム基材(12)の裏面(12b)に接する塗工ステージ(14)の表面が、連続的に無数のくぼみを持つ形状であり、そのくぼみの径または幅、及び隣り合うくぼみの間隔が、マイクロカプセルの平均粒子経の400%以下とする。
To solve the above problem,
The present invention provides a coating method (11) in which a microcapsule-dispersed coating liquid (11) is uniformly applied to a coating surface (12a) of a film substrate (12), and the back surface (12b) of the film substrate (12). The surface of the coating stage (14) in contact with the surface has an infinite number of indentations, and the diameter or width of the indentations and the interval between adjacent indentations are 400% or less of the average particle diameter of the microcapsules. To do.

本発明によれば、塗工の際にフィルム基材(12)の裏面(12b)に付着した異物が塗工ステージ(14)のくぼみに入り込み、異物がフィルム基材(12)を押し上げることが少なくなるためである(図8)。   According to the present invention, foreign matter adhering to the back surface (12b) of the film substrate (12) during coating enters the recess of the coating stage (14), and the foreign matter pushes up the film substrate (12). This is because it decreases (FIG. 8).

塗工ステージ(14)のくぼみの径または幅が大きいほど、大きな異物を取り込む効果は大きいが、逆にそのくぼみにフィルム基材(12)が落ち込み、塗工厚に影響して厚さの不均一性を生じさせる。また、隣り合うくぼみの間隔が広いとフィルム基材(12)と異物(15)が接触する確率が高くなる。そのため、くぼみの径または幅、及び隣り合うくぼみの間隔が、マイクロカプセルの平均粒子経の400%以下とすることが好ましい。   The larger the indentation diameter or width of the coating stage (14), the greater the effect of taking in large foreign matter, but conversely, the film substrate (12) falls into the indentation, affecting the coating thickness and reducing the thickness. Create uniformity. Moreover, when the space | interval of an adjacent hollow is wide, the probability that a film base material (12) and a foreign material (15) will contact will become high. Therefore, it is preferable that the diameter or width of the recesses and the interval between adjacent recesses be 400% or less of the average particle size of the microcapsules.

また、塗工ステージ(14)のくぼみは、例えば点状または円形状(図5)でも可能であるが、ストライプ状(図6)、格子状(図7)でも可能である。   Further, the depression of the coating stage (14) can be, for example, a dot shape or a circular shape (FIG. 5), but can also be a stripe shape (FIG. 6) or a lattice shape (FIG. 7).

また、くぼみの深さは、最も影響のある異物の大きさなどから任意で選択することが可能である。   Further, the depth of the indentation can be arbitrarily selected from the size of the most influential foreign matter.

マイクロカプセルの塗工液(11)を塗布する方法としては、マイクロカプセルとバインダー樹脂、溶媒の塗工液(11)をワイヤーバーコート、スロットダイコート、リップダイコート、コンマコート、ブレードコート、グラビアコートなどにより塗工し、その後、乾燥することで得られる。   As a method for applying the microcapsule coating liquid (11), the microcapsule and binder resin, and the solvent coating liquid (11) are wire bar coat, slot die coat, lip die coat, comma coat, blade coat, gravure coat, etc. It is obtained by coating with, and then drying.

塗工ステージ(14)としては、平面状のステージとロール状のステージがある。例えば、平面状のステージにフィルム基材(12)を設置してスロットダイコートで塗工する方法(図1)や、ロール状のステージにロール状のフィルム基材を巻取りながら、コンマコートで塗工する方法などがある。   As the coating stage (14), there are a planar stage and a roll stage. For example, a film base (12) is set on a flat stage and coated with slot die coating (FIG. 1), or a roll-shaped film base is wound on a roll stage and coated with a comma coat. There are methods to work.

本発明の表示装置の基本構成である。   1 is a basic configuration of a display device of the present invention.

前面透明フィルム基材(1)/前面透明導電層(2)/表示層(3)/背面金属導電層(4)/背面フィルム基材(5)の積層体に関して説明する。   The laminate of the front transparent film substrate (1) / front transparent conductive layer (2) / display layer (3) / back metal conductive layer (4) / back film substrate (5) will be described.

透明基材(1)は表示装置の積層体の表面に位置する。そのため透明性の高いことが必要であり、透明電極(2)やマイクロカプセル型電気泳動表示層(3)の担体となりうることが必要である。この様な基材としては、ポリエチレンテレフタレート、ポリメタクリル酸メチル、ポリカーボネート、ポリエチレンナフタレート、ポリプロピレン、ナイロン−6、ナイロン−66、ポリ塩化ビニリデン、ポリエーテルスルフォン等の透明高分子フィルム、やガラス板などを用いることができる。   The transparent substrate (1) is located on the surface of the laminate of the display device. Therefore, high transparency is required, and it is necessary to be able to be a carrier for the transparent electrode (2) and the microcapsule type electrophoretic display layer (3). Examples of such a substrate include transparent polymer films such as polyethylene terephthalate, polymethyl methacrylate, polycarbonate, polyethylene naphthalate, polypropylene, nylon-6, nylon-66, polyvinylidene chloride, and polyethersulfone, and glass plates. Can be used.

透明電極(2)は、透明性が高く、電極を形成することのできる導電性物質なら特に制限はないが、透明性や実用化の側面からITO(Indium Tin Oxide)、ZnO、SnO2などの金属酸化物透明材料を乾式成膜法で形成することが好ましい。乾式成膜法としては、真空蒸着法、スパッタ蒸着法、イオンプレーティング法、レーザー蒸着法、イオンビーム蒸着法が挙げられる。 The transparent electrode (2) is not particularly limited as long as it is highly conductive and can form an electrode. However, from the viewpoint of transparency and practical use, ITO (Indium Tin Oxide), ZnO, SnO 2, etc. It is preferable to form the metal oxide transparent material by a dry film forming method. Examples of the dry film forming method include a vacuum vapor deposition method, a sputter vapor deposition method, an ion plating method, a laser vapor deposition method, and an ion beam vapor deposition method.

背面電極(4)としては、アクティブマトリックス電極、セグメント電極、単純マトリックス電極等の電気回路が形成されている電極基板または電極フィルムを用いることができる。   As the back electrode (4), an electrode substrate or an electrode film on which an electric circuit such as an active matrix electrode, a segment electrode, or a simple matrix electrode is formed can be used.

マイクロカプセル型電気泳動表示層(3)は、マイクロカプセル、バインダー、溶媒等からなる塗工液(11)を塗布することによって得られる。このマイクロカプセル内には絶縁性の電気泳動分散媒中に黒色電気泳動粒子および白色電気泳動粒子の帯電粒子が分散されており、正か負かのいずれかに帯電させている。   The microcapsule type electrophoretic display layer (3) can be obtained by applying a coating liquid (11) composed of microcapsules, a binder, a solvent and the like. In the microcapsules, charged particles of black electrophoretic particles and white electrophoretic particles are dispersed in an insulating electrophoretic dispersion medium, and are charged either positively or negatively.

上述した基本構成である透明基材(1)/透明電極(2)/マイクロカプセル型電気泳動表示層(3)/背面電極(4)において、透明電極(1)と背面電極(4)の間に電圧を印加し、透明電極側を負極、背面板側を正極とした場合、負に帯電した粒子が背面電極側に引かれ、正に帯電した粒子が透明電極側に引かれることにより、画像表示が可能となる。   In the transparent base material (1) / transparent electrode (2) / microcapsule type electrophoretic display layer (3) / back electrode (4), which is the basic configuration described above, between the transparent electrode (1) and the back electrode (4). When the transparent electrode side is a negative electrode and the back plate side is a positive electrode, negatively charged particles are drawn to the back electrode side, and positively charged particles are drawn to the transparent electrode side. Display is possible.

マイクロカプセル型電気泳動表示層(3)の構成材料に関し説明する。   The constituent material of the microcapsule type electrophoretic display layer (3) will be described.

黒色電気泳動粒子は、アニリンブラック、カーボンブラック等の黒色顔料などを使用する。白色電気泳動粒子は、酸化チタンや酸化アルミニウム、酸化亜鉛、硫化亜鉛等の無機顔料の他、ガラスあるいは樹脂等の微粉末、さらにはこれらの複合体などを使用する。   As the black electrophoretic particles, black pigments such as aniline black and carbon black are used. The white electrophoretic particles use inorganic pigments such as titanium oxide, aluminum oxide, zinc oxide, and zinc sulfide, fine powders such as glass or resin, and composites thereof.

電気泳動分散媒は、帯電粒子が良好、かつ、安定に帯電することができる絶縁性液体、つまり、実質的に水に不溶の有機溶媒から形成される。例えば、ドデカノール、ウンデカノール等の長鎖アルコール系溶媒や、ジブチルケトン、メチルイソブチルケトン等の多炭素ケトン類や、ペンタン、ヘキサン、オクタン等の脂肪族炭化水素や、シクロヘキサン、メチルシクロヘキサン等の脂環式炭化水素や、ベンゼン、トルエン、キシレン、ヘキシルベンゼン、ブチルベンゼン、オクチルベンゼン、ノニルベンゼン、デシルベンゼン、ウンデシルベンゼン、ドデシルベンゼン、トリデシルベンゼン、テトラデシルベンゼン等の長鎖アルキル基を有するベンゼン類等の芳香族炭化水素や、塩化メチレン、クロロホルム、四塩化炭素、1,2−ジクロロエタン等のハロゲン化炭化水素や、シリコーンオイル、オリーブオイル等の種々の油類のいずれか単体、あるいはこれらの混合物が挙げられる。この分散媒は、染料などの着色剤を溶解または分散させることで着色することもできる。   The electrophoretic dispersion medium is formed of an insulating liquid that has good charged particles and can be stably charged, that is, an organic solvent that is substantially insoluble in water. For example, long-chain alcohol solvents such as dodecanol and undecanol, polycarbon ketones such as dibutyl ketone and methyl isobutyl ketone, aliphatic hydrocarbons such as pentane, hexane and octane, and alicyclic groups such as cyclohexane and methylcyclohexane Benzenes with long-chain alkyl groups such as hydrocarbons, benzene, toluene, xylene, hexylbenzene, butylbenzene, octylbenzene, nonylbenzene, decylbenzene, undecylbenzene, dodecylbenzene, tridecylbenzene, tetradecylbenzene, etc. Aromatic hydrocarbons, halogenated hydrocarbons such as methylene chloride, chloroform, carbon tetrachloride and 1,2-dichloroethane, and various oils such as silicone oil and olive oil, or a mixture thereof. Be mentionedThis dispersion medium can also be colored by dissolving or dispersing a colorant such as a dye.

マイクロカプセルを形成する材料としては、光を十分に透過させる材料が好ましく、具体的には、尿素−ホルムアルデヒド樹脂、メラミン−ホルムアルデヒド樹脂、ポリエステル樹脂、ポリウレタン樹脂、ポリエチレン樹脂、ポリスチレン樹脂、ポリアミド樹脂、アクリル酸エステル樹脂、メタクリル酸エステル樹脂、酢酸ビニル樹脂、ゼラチン等が挙げられる。これらを単独、あるいは、2種以上混合して使用することも可能である。   The material for forming the microcapsules is preferably a material that transmits light sufficiently. Specifically, urea-formaldehyde resin, melamine-formaldehyde resin, polyester resin, polyurethane resin, polyethylene resin, polystyrene resin, polyamide resin, acrylic resin are preferable. Examples include acid ester resins, methacrylic ester resins, vinyl acetate resins, and gelatin. These may be used alone or in combination of two or more.

以下に、本発明の具体的な実施例を示す。   Specific examples of the present invention are shown below.

実施例では、何れも以下のフィルム基材とマイクロカプセル塗工液(11)、及び加工条件を適用した。   In the examples, the following film base material, microcapsule coating liquid (11), and processing conditions were all applied.

ポリエチレンテレフタレート(PET)からなる透明フィルム基材(1)に透明電極層(2)としてITO層をスパッタリング法により成膜し、透明フィルム基材(1)/透明電極(2)の積層体からなるフィルム基材(12)を得た。透明フィルム基材は、100μm厚、350mm角である。   An ITO layer is formed by sputtering as a transparent electrode layer (2) on a transparent film substrate (1) made of polyethylene terephthalate (PET), and consists of a laminate of transparent film substrate (1) / transparent electrode (2). A film substrate (12) was obtained. The transparent film substrate is 100 μm thick and 350 mm square.

平均粒子径が80μmのマイクロカプセル、バインダー、溶媒の成分を70/5/25重量%の重量比で攪拌してマイクロカプセル塗工液(11)を調合した。   The microcapsule coating liquid (11) was prepared by stirring the components of microcapsules having an average particle size of 80 μm, a binder and a solvent at a weight ratio of 70/5/25 wt%.

塗工方法としてはスロットダイコートを用い、塗工後のマイクロカプセル塗工液(11)は、90℃5分の条件で乾燥させた。   As a coating method, slot die coating was used, and the microcapsule coating liquid (11) after coating was dried at 90 ° C. for 5 minutes.

塗工厚の均一性の評価には、上記の条件で50枚の塗工を実施した後、透過光を通して塗工の濃淡を目視で判断した。点状で塗工厚が薄いポイントはその数を数えた。   For the evaluation of the uniformity of the coating thickness, 50 coatings were carried out under the above conditions, and then the density of the coating was visually determined through transmitted light. The number of points with a thin coating thickness was counted.

平面状であり、径及び間隔が50、150、300μmの円形状のくぼみが連続的に点在する塗工ステージの上に、フィルム基材を設置して、マイクロカプセル塗工液(11)を塗工した。その後、マイクロカプセルの塗工面を、透過光を通して観察した。   A film substrate is placed on a coating stage that is flat and is continuously dotted with circular recesses having diameters and intervals of 50, 150, and 300 μm, and a microcapsule coating solution (11) is prepared. Coated. Thereafter, the coated surface of the microcapsule was observed through transmitted light.

平面状であり、径及び間隔が50、150、300μmのストライプ状のくぼみが連続的に点在する塗工ステージの上に、フィルム基材を設置して、マイクロカプセル塗工液(11)を塗工した。その後、マイクロカプセルの塗工面を、透過光を通して観察した。   A film substrate is placed on a coating stage that is flat and has continuous indentations with stripes having a diameter and interval of 50, 150, and 300 μm, and a microcapsule coating solution (11) is prepared. Coated. Thereafter, the coated surface of the microcapsule was observed through transmitted light.

(比較例1)
平面状であり鏡面の塗工ステージの上に、フィルム基材を設置して、マイクロカプセル塗工液(11)を塗工した。その後、マイクロカプセルの塗工面を、透過光を通して観察した。
(Comparative Example 1)
A film substrate was placed on a flat and mirror-coated stage, and a microcapsule coating solution (11) was applied. Thereafter, the coated surface of the microcapsule was observed through transmitted light.

(比較例2)
平面状であり、径及び間隔が800μmの円形状のくぼみが連続的に点在する塗工ステージの上に、フィルム基材を設置して、マイクロカプセル塗工液(11)を塗工した。その後、マイクロカプセルの塗工面を、透過光を通して観察した。
(Comparative Example 2)
A film substrate was placed on a coating stage that was flat and was continuously dotted with circular recesses having a diameter and interval of 800 μm, and the microcapsule coating liquid (11) was applied. Thereafter, the coated surface of the microcapsule was observed through transmitted light.

(比較例3)
平面状であり、径及び間隔が800μmのストライプ状のくぼみが連続的に点在する塗工ステージの上に、フィルム基材を設置して、マイクロカプセル塗工液(11)を塗工した。その後、マイクロカプセルの塗工面を、透過光を通して観察した。
(Comparative Example 3)
A film substrate was placed on a coating stage which was flat and striped in the form of stripes having a diameter and interval of 800 μm, and the microcapsule coating liquid (11) was applied. Thereafter, the coated surface of the microcapsule was observed through transmitted light.

実施例1〜2、比較例1〜3の結果を表1に示す。何れも異物による点状の塗工ムラ(16)が発生したが、従来の塗工方法である比較例1と比べて、実施例1及び2ではその発生数が約3割に減少した。一方で、比較例2及び3では点状の塗工ムラ(16)は減少したが、塗工ステージのくぼみ形状が投影された塗工ムラ(16)が全面に発生した。   The results of Examples 1-2 and Comparative Examples 1-3 are shown in Table 1. In all cases, spot-like coating unevenness (16) due to foreign matter occurred, but the number of occurrences in Examples 1 and 2 decreased to about 30% compared to Comparative Example 1 which is a conventional coating method. On the other hand, in Comparative Examples 2 and 3, the dot-like coating unevenness (16) was reduced, but the coating unevenness (16) on which the hollow shape of the coating stage was projected occurred on the entire surface.

Figure 2008209583
Figure 2008209583

マイクロカプセル塗工液の塗工方法の1例を示す模式図である。It is a schematic diagram which shows one example of the coating method of a microcapsule coating liquid. 異物が存在した場合の塗工状態の一例を示す模式図である。It is a schematic diagram which shows an example of the coating state when a foreign material exists. 異物が存在した場合の塗工状態の一例を示す模式図である。It is a schematic diagram which shows an example of the coating state when a foreign material exists. 異物が存在した場合の塗工状態の一例を示す模式図である。It is a schematic diagram which shows an example of the coating state when a foreign material exists. 塗工ステージの1例を示す模式図である。It is a schematic diagram which shows an example of a coating stage. 塗工ステージの1例を示す模式図である。It is a schematic diagram which shows an example of a coating stage. 塗工ステージの1例を示す模式図である。It is a schematic diagram which shows an example of a coating stage. 本発明の実施例1を示す模式図である。It is a schematic diagram which shows Example 1 of this invention. マイクロカプセル型電気泳動表示装置を示す模式図である。It is a schematic diagram which shows a microcapsule-type electrophoretic display device.

符号の説明Explanation of symbols

1 前面透明フィルム基材
2 前面透明導電層
3 表示層
4 背面金属導電層
5 背面フィルム基材
6 背面電極
8 前面板
11 マイクロカプセル塗工液
12 フィルム基材
12a 塗工面
12b 裏面
14 塗工ステージ
15 異物
16 塗工ムラ
20 くぼみ
21 塗工治具
22 吐出口
DESCRIPTION OF SYMBOLS 1 Front transparent film base material 2 Front transparent conductive layer 3 Display layer 4 Back surface metal conductive layer 5 Back surface film base material 6 Back electrode 8 Front plate 11 Microcapsule coating liquid 12 Film base material 12a Coating surface 12b Back surface 14 Coating stage 15 Foreign object 16 Coating unevenness 20 Recess 21 Coating jig 22 Discharge port

Claims (1)

マイクロカプセルが分散された塗工液をフィルム基材の塗工面に均一塗布する塗工方法において、前記フィルム基材の裏面に接する塗工ステージの表面が、連続的に無数のくぼみを持つ形状であり、そのくぼみの径または幅、及び隣り合うくぼみの間隔が、マイクロカプセルの平均粒子経の400%以下であることを特徴とする塗工フィルムの製造方法。   In the coating method in which the coating liquid in which the microcapsules are dispersed is uniformly applied to the coating surface of the film substrate, the surface of the coating stage in contact with the back surface of the film substrate has a shape with infinitely continuous depressions. A method for producing a coated film, wherein the diameter or width of the recesses and the interval between adjacent recesses are 400% or less of the average particle size of the microcapsules.
JP2007045256A 2007-02-26 2007-02-26 Manufacturing method of coated film Pending JP2008209583A (en)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11267986A (en) * 1998-03-23 1999-10-05 Murata Mfg Co Ltd Sheet sucking plate
JP2003005197A (en) * 2001-06-26 2003-01-08 Victor Co Of Japan Ltd Method and device for producing liquid crystal display element
JP2005087878A (en) * 2003-09-17 2005-04-07 Nippon Shokubai Co Ltd Production method for microcapsule-carrying sheet
JP2006027795A (en) * 2004-07-14 2006-02-02 Toshiba Corp Sucking device, method of carrying plate-like member, and method of manufacturing liquid crystal display
JP2006337503A (en) * 2005-05-31 2006-12-14 Bridgestone Corp Manufacturing method of panel for displaying information and base stand used for same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11267986A (en) * 1998-03-23 1999-10-05 Murata Mfg Co Ltd Sheet sucking plate
JP2003005197A (en) * 2001-06-26 2003-01-08 Victor Co Of Japan Ltd Method and device for producing liquid crystal display element
JP2005087878A (en) * 2003-09-17 2005-04-07 Nippon Shokubai Co Ltd Production method for microcapsule-carrying sheet
JP2006027795A (en) * 2004-07-14 2006-02-02 Toshiba Corp Sucking device, method of carrying plate-like member, and method of manufacturing liquid crystal display
JP2006337503A (en) * 2005-05-31 2006-12-14 Bridgestone Corp Manufacturing method of panel for displaying information and base stand used for same

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