JP2008204595A - Optical recording medium and recording film material - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a next-generation optical recording medium having two or more information layers having good reproduction durability and a good recording strategy margin even if an Sb-based eutectic material is used as a material of a recording film of a translucent information layer. <P>SOLUTION: The translucent information layer 16 has a recording film 18 and an interface layer 36 provided adjacent to the recording film on the side of the light incident surface. The recording film 18 is made of a phase change material having Sb<SB>x</SB>Te<SB>y</SB>Ge<SB>z</SB>elements and elemental ratios. Y satisfies 5≤y≤15 and z satisfies 5≤z≤15. When In having an elemental ratio of a is further added and x+y+z+a=100 holds, a satisfies 4≤a≤15. The interface layer 36 comprises of ZrO<SB>2</SB>-Cr<SB>2</SB>O<SB>3</SB>film thickness of which is in a range of from 2 nm to 10 nm on the optical incident face of the recording film 18. When ZrO<SB>2</SB>:Cr<SB>2</SB>O<SB>3</SB>=C:D (mol%), the compositional ratios ZrO<SB>2</SB>and Cr<SB>2</SB>O<SB>3</SB>in the ZrO<SB>2</SB>-Cr<SB>2</SB>O<SB>3</SB>film, holds, the C satisfies 20≤C≤90, and the D satisfies 10≤D≤80, and the C and the D satisfy C+D=100. The ZrO<SB>2</SB>contains 2 to 10% Y<SB>2</SB>O<SB>3</SB>. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to an optical recording medium called a next-generation DVD (digital versatile disk), in particular, an optical recording medium having two or more information layers made of a phase change material, and a recording film material for the optical recording medium. .

  As a next-generation DVD, for example, called a Blu-ray Disc (Blu-ray Disc, hereinafter abbreviated as BD), the recording / reproducing laser wavelength is 405 nm (blue), the numerical aperture NA = 0.85 (λ / An optical system using an optical system with NA ≦ 650 nm has been proposed.

  In such an optical disc drive for BD, as a standard for reproduction, in an optical pickup using a single mode laser, in order to reduce laser noise during signal reproduction, a high frequency of reproduction light at a frequency of several hundred MHz It is supposed to be superimposed.

  Here, in an optical disc drive such as a BD, a single mode oscillation semiconductor laser is used, and in order to reduce laser noise during signal reproduction, reproduction light is superimposed at a high frequency of several hundred MHz. General conditions for high frequency superposition are: frequency: 300 to 500 MHz, ratio: 3.0 to 8.0, and pulse width: 200 to 400 psec.

On the other hand, BD has proposed a rewritable optical recording medium having two information layers on one side,
In this two-layer optical recording medium, the L1 layer other than the information layer (L0 layer) farthest from the light incident surface side is translucent in order to transmit recording / reproducing light.

  From such a semi-transparent L1 layer, the amount of reflected light during reproduction becomes small, so the laser power during reproduction must be increased. In addition, BD uses laser light having a short wavelength as compared with a normal DVD, and its spot size is small, so that the energy density at the laser spot is very high.

  Therefore, in the next generation DVD having two or more layers, when a laser beam having a high reproduction power is irradiated, the heat radiation performance is low except for the L0 layer, and the reproduction durability of the recorded signal is lowered. Arise.

  In particular, in the rewritable phase change optical recording medium, there is a problem that an amorphous mark that is a recording signal is crystallized by irradiation with a laser beam having a high reproduction power during reproduction and the recording signal is easily lost. This problem is remarkable in the Sb eutectic phase change material mainly containing Sb.

  Therefore, conventionally, it has been considered difficult to use an Sb eutectic material as a recording film material of a translucent information layer of a BD rewritable multilayer optical recording medium.

  Further, when the Sb eutectic material is used as the recording film material of the translucent information layer of the rewritable multilayer BD, there is the following problem that the recording strategy margin at the time of recording becomes narrow. is there.

  The Sb eutectic material can easily increase the crystallization rate of the recording film, but a high cooling rate is required when forming an amorphous mark with a recording laser beam. If the cooling rate is not sufficient, recrystallization occurs during cooling after the recording film is melted, resulting in insufficient formation of amorphous marks.

  On the other hand, the medium structure must be rapidly cooled or the pulse width in the recording strategy for forming the amorphous mark must be narrowed so that no residual heat is generated during recording.

  However, in the two-layer semi-transparent information layer, in order to transmit recording / reproducing light, the recording film or the reflection layer has to be thinned, the heat dissipation is insufficient, and the total reflection information layer (L0 layer) ), The formation of an amorphous mark becomes insufficient.

  In addition, in the case of laser light emission, the rise and fall times of the light emission take about 1.5 nsec to 3 nsec. Therefore, even if the pulse width of the laser pulse is set to a time shorter than the above light emission time, light emission is possible. Therefore, the recording film is required to be able to record even with a recording pulse width wider than that described above.

  However, since the Sb eutectic material requires a high cooling rate as described above, recrystallization occurs when recording with a recording strategy having a large pulse width, and it is difficult to record correctly.

  In Patent Document 1, it is possible to cope with stability of an amorphous mark and a wide range of linear velocities in an SbTe eutectic recording film material. In the invention described in Patent Document 1, λ / NA ≦ 650 nm. It is difficult to ensure reproduction durability with high reproduction power in an optical system.

Japanese Patent No. 3899770

  The present invention has been made in view of the above problems. As a next-generation DVD, even when an Sb eutectic material is used for a semitransparent information layer under recording conditions of λ / NA ≦ 650 nm, It is an object of the present invention to provide a next-generation optical recording medium excellent in recording strategy margin and a recording film material for the optical recording medium.

  As a result of diligent research, the present inventor has substituted a part of Sb of Sb eutectic material with In as a recording film material of a semi-transmissive information layer of a next generation optical recording medium having two or more information layers. It was found that when the layer adjacent to the recording film contains at least Cr and O and the thickness of each layer constituting the optical recording medium is adjusted, the amorphous mark is difficult to crystallize and the reproduction durability can be increased. . It has also been found that amorphous marks can be easily formed and a recording strategy margin during recording can be widened.

  That is, the above-described problems can be solved by the following embodiments.

(1) A substrate, a first information layer provided on the light incident surface side of the laser beam in the substrate, and at least one layer semi-transparent provided further on the light incident surface side than the first information layer The semi-transmissive information layer includes a recording film made of a phase change material having an element of Sb _x Te _y Ge _z and a composition ratio, and the y is 5 ≦ y. ≦ 15, z is 5 ≦ z ≦ 15, and the recording film can be rewritten by an optical system of λ / NA ≦ 650 nm, where NA is the numerical aperture of the objective lens and λ is the wavelength of the laser beam. An optical recording medium, wherein the recording film is further added with In having a composition ratio of a, and when x + y + z + a = 100, 4 ≦ a ≦ 15.

  (2) The optical recording medium according to (1), wherein x = −0.713 × a + b when the relationship between x and a in the composition ratio is 77 ≦ b ≦ 84.

  (3) The optical recording medium, wherein the recording film has a thickness of 3 nm to 7 nm.

  (4) The transflective information layer is configured to include a reflective layer on the side opposite to the light incident surface side of the laser beam of the recording film, and the thickness of the reflective layer is from 8 nm to 16 nm. The optical recording medium according to any one of (1) to (3).

  (5) The transflective information layer includes an interface layer in contact with the light incident surface side of the recording film, and the interface layer includes at least Cr and O. (1) to (4) The optical recording medium according to any one of the above.

  (6) The semi-transmissive information layer includes a heat radiation layer, a dielectric layer, an interface layer, and a recording film in that order from the light incident surface side of the laser beam, and the heat radiation layer is made of AlN. (1) The optical recording medium according to any one of (5).

(7) The interface layer is made of a ZrO ₂ —Cr ₂ O ₃ film, and the thickness of the ZrO ₂ —Cr ₂ O ₃ film is 2 nm to 10 nm. The optical recording medium described.

(8) When the composition ratio of the ZrO ₂ —Cr ₂ O ₃ film is ZrO ₂ : Cr ₂ O ₃ = C: D (mol%), 20 ≦ C ≦ 90 and 10 ≦ D ≦ 80 and C + D The optical recording medium according to (7), wherein = 100.

(9) the ZrO ₂ comprises _Y 2 _{O 3,} the composition ratio of ZrO ₂ and _Y 2 _{O 3} in the _{ZrO 2, ZrO 2: Y 2} O 3 = 100-x: x (mol%) and The optical recording medium according to (7) or (8), wherein 2 ≦ x ≦ 10.

(10) When the composition ratio of the ZrO ₂ —Cr ₂ O ₃ film is ZrO ₂ : Cr ₂ O ₃ = C: D (mol%), 20 ≦ C ≦ 90 and 10 ≦ D ≦ 80 and C + D The optical recording medium according to (7), wherein = 100. (9) Substrate, first information layer provided on the light incident surface side of the laser beam on the substrate, and at least one layer of semi-transmissive information provided on the light incident surface side further than the first information And the semi-transmissive information layer includes a recording film rewritable by an optical system of λ / NA ≦ 650 nm, where NA is the numerical aperture of the objective lens and λ is the wavelength of the laser beam, An optical recording medium comprising a protective layer in contact with the recording film on the substrate side, wherein the recording film is made of an Sb eutectic phase change material containing Sb as a main component, An optical recording medium, wherein the layer contains at least Cr and O.

(11) It is made of an element of Sb _x Te _y Ge _z and a phase change material having a composition ratio, y is 5 ≦ y ≦ 15, z is 5 ≦ z ≦ 15, and the numerical aperture of the objective lens is NA , A recording film material for an optical recording medium constituting a recording film that can be rewritten by an optical system of λ / NA ≦ 650 nm when the wavelength of the laser beam is λ, and In of composition ratio a is further added, and x + y + z + a Recording film material, wherein 4 ≦ a ≦ 15 when 100 = 100.

  In the optical recording medium of the present invention, a part of Sb of the Sb eutectic material used as the recording film material is replaced with In, and the layer adjacent to the recording film contains at least Cr and O, By adjusting the thickness of each of the layers, a translucent information layer capable of high-speed recording with excellent reproduction durability and a recording strategy margin can be realized.

An optical recording medium according to the best mode includes a substrate, a first information layer (L0 layer) provided on the light incident surface side of the laser beam on the substrate, and a light incident surface further than the first information layer. At least one semi-transmissive information layer (L1 layer) provided on the side, the semi-transmissive information layer comprising a recording film material having an element of Sb _x Te _y Ge _z and a composition ratio It is configured to include a film. This recording film material is a phase change material, where y is 5 ≦ y ≦ 15, z is 5 ≦ z ≦ 15, the numerical aperture of the objective lens is NA, and the wavelength of the laser beam is λ. When the recording film can be rewritten by an optical system of λ / NA ≦ 650 nm, and In of composition ratio a is further added and x + y + z + a = 100, 4 ≦ a ≦ 15.

  As a configuration example of the translucent information layer, a first dielectric layer, a reflective layer, a protective layer, a recording film (layer), an interface layer, a second dielectric layer, and a heat dissipation layer are sequentially laminated from the substrate side. Can be mentioned.

The first dielectric layer is provided for protecting the reflective layer and adjusting the light transmittance, and the material is not particularly limited. Ti, Zr, Hf, Ta, Si, Al, Mg, Y, Ce, Zn An oxide, nitride, sulfide, carbide, fluoride, or a composite thereof containing at least one metal selected from In, Cr, Nb, or the like is used. In the best embodiment, it is made of a material containing zirconium oxide (ZrO ₂ ) as a main component, or TiO ₂ , and preferably made of ZrO ₂ , Cr ₂ O ₃ and Al ₂ O ₃ , or TiO ₂ . The main component here means that the molar ratio to the whole is 50% or more. The thickness D1 of the first dielectric layer is preferably 5 nm ≦ D1 ≦ 60 nm. If the thickness is less than 5 nm, the protection of the reflective layer is insufficient, and if it is thicker than 60 nm, the light transmittance is out of the preferred range. The first dielectric layer may be a stack of two or more dielectric layers.

  The reflective layer is provided for heat dissipation and light interference effect, and an Ag alloy is preferably used as the material. The thickness Tr of the reflective layer for making the information layer a semi-transmissive structure is 0 nm <Tr <30 nm. In order to obtain the optimum reflection / light transmittance, 8 nm ≦ Tr ≦ 16 nm is preferable. When the thickness Tr of the reflective layer is 0 nm, a heat dissipation effect cannot be obtained, and when the thickness is 30 nm or more, the transmittance is lowered and recording on the L0 layer becomes difficult.

The protective layer protects the recording film and controls heat dissipation to the reflective layer. The material of the protective layer is made to contain at least Cr and O, preferably made of Cr, Zr and O, more preferably made of at least Cr ₂ O ₃ and ZrO ₂ . Cr ₂ O ₃ increases the crystallization rate, and ZrO ₂ decreases the film stress. Although the ratio of Cr ₂ O ₃ tends enhance high crystallization rate, the ratio is too high light transmittance is reduced. A preferable ratio of Cr ₂ O ₃ constituting the protective layer is 30 mol% or more and 80 mol% or less, and a ratio of ZrO ₂ is 20 mol% or more and 60 mol% or less. ZrO ₂ is preferably stabilized ZrO ₂ containing a rare earth oxide of several mol%. As the rare earth oxide, Y ₂ O ₃ is preferable, and the ratio of Y ₂ O _{3 in} 100 mol% of stabilized ZrO ₂ is 2 mol% or more and 10 mol% or less.

  The preferred film thickness Trec of the recording film (layer) is 3 nm ≦ Trec ≦ 7 nm. If the film thickness Trec is less than 3 nm, the crystallization speed decreases, and erasure (crystallization) of the amorphous mark becomes difficult. If the film thickness Trec is thicker than 7 nm, the transmittance is lowered and recording on the L0 layer becomes difficult. Further, when the film thickness of the recording film is increased, excessive heat is accumulated in the recording film itself during recording, and the recording characteristics are deteriorated.

  Accordingly, the light transmittance at the recording wavelength of the entire transflective information layer is set to be 30% or more and 80% or less. If the light transmittance of the semi-transmissive information layer is less than 30%, it becomes difficult to record on the information layer farthest from the light incident surface of the laser beam, and if it exceeds 80%, it becomes difficult to record on the semi-transmissive information layer. Because. This is a general condition required for a translucent information layer.

  The recording film (layer) is composed of at least Sb, Te, and Ge. A part of Sb is replaced with In. Further, it may contain at least one additive component selected from Mg, Al, Si, Mn, Zn, Ga, Sn, Bi and the like.

The interface layer controls the crystallization speed and reproduction durability of the recording film. The material for the interface layer contains at least Zr, Cr, and O, and is preferably composed of ZrO ₂ and Cr ₂ O ₃ . Cr ₂ O ₃ increases the crystallization speed and reproduction durability, and ZrO ₂ increases the transparency of the film. If the ratio of Cr ₂ O ₃ is too high, the transparency of the film is lowered and the transmissivity of the semi-transmissive information layer is lowered. When the ratio of ZrO ₂ is too high, the crystallization speed and the reproduction durability are lowered. A preferable ratio of Cr ₂ O ₃ constituting the interface layer is 10 mol% or more and 80 mol% or less, and a ratio of ZrO ₂ is 20 mol% or more and 90 mol% or less. Similar to the protective layer, ZrO ₂ is preferably stabilized ZrO ₂ containing several mol% of rare earth oxide. As the rare earth oxide, Y ₂ O ₃ is preferable, and the ratio of Y ₂ O _{3 in} 100 mol% of stabilized ZrO ₂ is 2 mol% or more and 10 mol% or less.

The second dielectric layer adjusts optical characteristics and controls heat dissipation from the recording film to the heat dissipation layer. The material is not particularly limited, and is an oxide or nitride containing at least one metal selected from Ti, Zr, Hf, Ta, Si, Al, Mg, Y, Ce, Zn, In, Cr, Nb, and the like. Sulphides, sulfides, carbides, fluorides, or composites thereof. Preferably, it is formed by a mixture of ZnS and SiO ₂ . A preferred molar ratio of ZnS to SiO ₂ is between ZnS: SiO ₂ = 50: 50 and ZnS: SiO ₂ = 95: 5. Outside this range, the refractive index of the mixture of ZnS and SiO ₂ changes, making it difficult to adjust the optical characteristics. The thickness D ₂ of the second dielectric layer is preferably 5 nm ≦ D ₂ ≦ 50 nm. If the thickness is less than 5 nm, it is difficult to protect the recording film and adjust the optical characteristics. If the thickness is more than 50 nm, the heat dissipation from the recording film to the heat dissipation layer is deteriorated.

The heat dissipation layer is for controlling the heat dissipation from the recording film, enhancing the cooling effect of the recording film, and facilitating the accurate formation of the amorphous mark. The material is not particularly limited, but a material having higher thermal conductivity than the material of the second dielectric layer is preferable, and AlN, SiN, BN, Al ₂ O ₃ , TiO ₂ are preferred.
Etc. are preferred. In the best embodiment, it is formed by AlN. A preferred thickness Theat of the heat dissipation layer is 15 nm ≦ Theat ≦ 150 nm. When the heat dissipation layer thickness Theat is less than 15 nm, the heat dissipation effect from the recording film is reduced, and when the heat dissipation layer thickness Theat exceeds 150 nm, the time required for film formation becomes longer, leading to a decrease in productivity. .

  The first and second dielectric layers may be composed of a single layer or a plurality of two or more dielectric layers.

  In this optical disk drive for recording and reproducing optical recording media, a single mode oscillation semiconductor laser is used, and in order to reduce laser noise during signal reproduction, reproduction light is superimposed at a high frequency of several hundred MHz. ing. General conditions for high frequency superposition are: frequency: 300 to 500 MHz, ratio: 3.0 to 8.0, and pulse width: 200 to 400 psec. In a BD having two or more information layers, the reproduction power is preferably 0.7 mW or more, the frequency is 360 MHz or more, the ratio is 6.3 or more, and the pulse width is 270 psec or more. Below this value, the reproduction signal characteristics deteriorate due to laser noise due to the influence of the return light to the semiconductor laser (Laser Diode: LD). Further, due to limitations of the high frequency superimposing circuit, the upper limit of the high frequency superimposing condition is: frequency: 500 MHz, Ratio: 8.0, pulse width: 350 psec.

[Example 1]
Hereinafter, an optical recording medium 10 according to the first embodiment of the present invention will be described in detail with reference to FIG.

  The optical recording medium 10 includes a substrate 12, a first information layer 14 provided on the light incident surface side of the laser beam on the substrate 12 (upper side in FIG. 1), and further than the first information layer 14. A second information layer (semi-transmissive information layer) 16 which is a semi-transmissive information layer provided on the light incident surface side, and the second information layer (semi-transmissive information layer) 16 is a recording layer. The film 18 includes an interface layer 36 provided adjacent to the light incident surface side of the recording film 18 and a protective layer 20 provided adjacent to the substrate 12 side.

  A spacer layer 22 is provided between the first information layer 14 and the second information layer (semi-transmissive information layer) 16, and the light incident surface side of the second information layer (semi-transmissive information layer) 16 is provided. Is provided with a cover layer 24.

The second information layer (semi-transmissive information layer) 16 is a first dielectric made of a ZrO ₂ —Cr ₂ O ₃ —Al ₂ O ₃ (65:10:25 mol%) film having a thickness of 5 nm from the spacer layer 22 side. A main layer 26, a reflective layer 28 made of an AgCu film with a thickness of 12 nm, a protective layer 20 made of a ZrO ₂ —Cr ₂ O ₃ (50:50 mol%) film with a thickness of 4 nm, and Sb with a thickness of 6 nm. An interface comprising a recording film 18 made of an Sb eutectic phase change material as a component and a ZrO ₂ —Y ₂ O ₃ —Cr ₂ O ₃ (48.5: 1.5: 50 mol%) film having a thickness of 5 nm. A layer 36, a second dielectric layer 32 made of a ZnS—SiO ₂ (80:20 mol%) film having a thickness of 13 nm, and a heat dissipation layer 34 made of an AlN film having a thickness of 45 nm are formed in this order by sputtering. It is configured.

  The substrate 12 is made of polycarbonate having a thickness of 1.1 mm, the spacer layer 22 has a thickness of 25 μm, and the cover layer 24 is formed to a thickness of 75 μm by spin coating using an ultraviolet curable resin. Yes. The cover layer 24 is formed after the second information layer is crystallized on the entire surface by an initializer.

  Samples 1 to 11 of the optical recording medium under the above conditions were prepared using a sputtering target having the composition shown in Table 1 as a recording film material constituting the recording film 18.

Here, x, y, z, and a are values indicating the composition ratio of Sb, Te, Ge, and In, respectively, and the element and composition ratio of the optical recording medium are represented as (Sb _x Te _y Ge _z ) + In _a. X + y + z + a = 100 is satisfied. Further, the relationship between the In amount (a) and the Sb amount (x) can be expressed by the following equation.

  x = −0.713 × a + b

  The value of b in the above formula is b shown in Table 1. FIG. 2 is a graph showing the relationship between the In amount (a) and the Sb amount (x) when b = 80.09 in the above calculation formula. In FIG. 2, the horizontal axis represents the In amount (a) and the vertical axis represents the Sb amount (x). Note that the value of b can be arbitrarily determined.

  These samples will be described. Samples 1 to 4 are in the range of 5 ≦ y ≦ 15, 5 ≦ z ≦ 15, 4 ≦ a ≦ 15, and the ratio of In is in the relationship of sample 1 <sample 2 <sample 3 <sample 4. Further, b = 80.1. Samples 5 and 6 are in the range of 5 ≦ y ≦ 15 and 5 ≦ z ≦ 15, but a <4. Further, b = 80.1. In sample 5, a = 0.0, that is, In is not included. Sample 7 is in the range of 5 ≦ y ≦ 15 and 5 ≦ z ≦ 15, but 15 <a. Further, b = 80.1. Sample 8 is in the range of 5 ≦ z ≦ 15 and 4 ≦ a ≦ 15, but y = 0.0, that is, Te is not included. Further, b = 86.2. Sample 9 is in the range of 5 ≦ z ≦ 15, 4 ≦ a ≦ 15, but 15 <y. Further, b = 75. Sample 10 is in the range of 4 ≦ a ≦ 15, but 15 <z and y = 0.0, that is, Te is not included. Further, b = 83.3. Sample 11 is in the range of 4 ≦ a ≦ 15, but z <5 and y = 0.0, ie, Te is not included. Further, b = 93.8. These relationships are shown in Table 2. In the determination, a case where it was within the range of 5 ≦ y ≦ 15, 5 ≦ z ≦ 15, 4 ≦ a ≦ 15 was evaluated as ◯, and a case where it was out of the range was evaluated as ×.

  In order to evaluate these samples, recording was performed with an (1, 7) RLL (Run Length Limited) signal using an optical system of λ = 405 nm and NA = 0.85. The linear velocity of recording and reproduction is 1 × speed = 4.92 m / s, 2 × speed = 9.84 m / s.

  Recording at a double speed of BD-RE is performed at a linear velocity of 9.84 m / s. In order to perform recording / erasing at the double speed, the linear velocity (crystallization speed) of the medium needs to be within a certain range. If the medium linear velocity is lower than this range, the mark cannot be erased. If the medium linear velocity is too high, mark formation becomes difficult due to recrystallization after recording dissolution. Therefore, the linear velocity of the medium needs to be 10 m / s to 18 m / s. The linear velocity was evaluated by obtaining the medium linear velocity.

  An 8T single mark was recorded at 1 × speed or 2 × speed, and DC erasure was performed once with an erasing power of 4 mW while changing the linear velocity to obtain the erasing rate of the 8T mark. The maximum erasing linear velocity at which this erasing rate is 25 dB or more was defined as the linear velocity of this medium. For samples that could not be recorded, “recording impossible” was described in the column of the linear velocity LV. Here, “not recordable” means that the crystallization speed is too high and mark formation is difficult, that is, the medium linear velocity is too high.

  The results are shown in Table 3. As described above, the determination was made ◯ for samples with a linear velocity of 10 m / s to 18 m / s, and x when the linear velocity was in a range other than the above or when recording was not possible.

  From Table 3, at least when samples 1 to 6, that is, the composition of the recording film material is in the range of 5 ≦ y ≦ 15, 5 ≦ z ≦ 15, and a ≦ 15, the linear velocity is 10 m / s. It was found to be in the range of ~ 18 m / s.

  Next, the reproduction durability was evaluated. The conditions for high-frequency superimposition of reproduction light are: frequency: 400 MHz, Ratio: 6.5, pulse width: 270 psec at reproduction light power of 0.7 mW. Signals were recorded at 2 × speed and reproduced at 1 × speed to measure jitter. Next, double-speed playback was performed 10,000 times while changing the playback power Pr, and finally jitter measurement was performed at 1-speed playback to examine the amount of jitter change. Table 4 shows the amount of jitter degradation in the case of 10,000 playbacks with Pr = 1.0 mW. The determination was made ◯ if there was no jitter deterioration after 10,000 times playback under the condition of reproduction power Pr = 0.7 mW at double speed, and × if jitter deterioration was observed.

  In addition, when the signal was recorded at 2 × speed, the sample whose media linear velocity was slow and difficult to erase was described as “impossible to erase” in the column of jitter deterioration amount, and the media linear velocity was too fast. For samples for which signals could not be recorded, “recording impossible” was described in the column of jitter deterioration. For these samples, the amount of jitter degradation could not be measured. Further, since the jitter deterioration amount of Sample 8 was 10% or more, “> 10” was described.

  From Table 4, when Samples 1 to 6, that is, the composition of the recording film material is in the range of 5 ≦ y ≦ 15, 5 ≦ z ≦ 15, and a ≦ 15, the reproduction durability is excellent. I understood. Further, from the results of samples 1 to 4, it was found that the jitter deterioration amount has a relationship of sample 1> sample 2> sample 3 = sample 4. Accordingly, it has been found that the greater the In amount, the smaller the jitter degradation at a high reproduction power.

  Finally, jitter was measured when double-speed recording was performed by changing the multi-pulse (Tmp) width of the recording strategy. Table 5 shows the jitter when the Tmp width is 3.375 nsec. In the determination, a case where the jitter is 8.5% or less is indicated by ◯, and a case where the jitter is higher than 8.5% is indicated by ×.

  For samples that could not be erased, jitter could not be measured, and therefore “erasable” was described in the jitter column. From Table 5, when the composition of Samples 1 to 4, that is, the recording film material is in the range of 5 ≦ y ≦ 15, 5 ≦ z ≦ 15, 4 ≦ a ≦ 15, the jitter value is good. I understood it. It was also found that the greater the In, the better the jitter value even with a wider pulse width.

  Table 6 shows the comprehensive judgment that summarizes the judgment results obtained by the respective evaluation methods. In the overall judgment, the judgments for which the linear velocity, the reproduction durability, and the Tmp margin of the jitter were all “good” were given as “good”, and the judgment was made even if one judgment was “poor”.

  According to Table 6, when the structures of Samples 1 to 4, that is, the recording film material are in the ranges of 5 ≦ y ≦ 15, 5 ≦ z ≦ 15, 4 ≦ a ≦ 15, the reproduction durability and the recording strategy It was found that a next generation optical recording medium having an excellent margin can be realized.

  From the above, if the value of a is small, the Tmp margin is deteriorated, and if it is too large, the erasure rate is lowered and rewriting at double speed cannot be performed. Further, if the value of y is small, the reproduction durability is lowered, and if it is too large, the erasure rate is lowered and rewriting at double speed cannot be performed. Furthermore, if the value of z is small, the crystallization speed is too high and mark formation at double speed becomes difficult, and if it is too large, the erasure rate decreases and rewriting at double speed cannot be performed.

  Further, as a result of the above evaluation and other experiments by the present inventors, when the value of b is in the range of 77 ≦ b ≦ 84, next generation light having excellent reproduction durability and recording strategy margin. It was found that a recording medium can be realized. A graph showing the relationship between the In amount (a) and the Sb amount (x) when the value of b is within the above range is shown in FIG. In FIG. 3, the horizontal axis represents the In amount (a), the vertical axis represents the Sb amount (x), and the In amount (a) and the Sb amount (x) in the case of b = 77 and 84, as in FIG. The relationship is shown by a straight line. A portion surrounded by these two straight lines corresponds to 77 ≦ b ≦ 84. Furthermore, when the result of the evaluation shows that the optical recording medium according to Example 1 of the present invention is in the range of 4 ≦ a ≦ 15, the result of 4 ≦ a ≦ 15 is shown in FIG. , The portion indicated by diagonal lines.

[Comparative Example 1]
A sample 12 having the same recording film composition as that of the sample 2 of Example 1 and having a film thickness of the second dielectric layer 32 of 40 nm without providing the heat dissipation layer 34 was produced. The linear velocity was determined in the same manner as in Example 1. Sample 12 had the same linear velocity as sample 2.

  Next, the reproduction durability was evaluated in the same manner as in Example 1. In Sample 12, when reproduction at a double speed of Pr = 1.0 mW was performed 10,000 times, the amorphous mark crystallized and the signal disappeared. In addition, the deterioration of jitter was confirmed even when reproduction at double speed was performed 10,000 times with Pr = 0.7 mW. Therefore, if the same determination as shown in Table 3 is performed, the determination of the sample 12 is x.

  From the above, it has been found that the existence of the heat dissipation layer 34 made of the AlN layer contributes to the improvement of the reproduction durability of the optical recording medium. Therefore, it has been found that the heat dissipation layer 34 is indispensable for the second information layer 16.

[Comparative Example 2]
For samples 1 to 6 and 8 of Example 1, reproduction durability evaluation with reproduction light under the following high-frequency superposition conditions was performed. The high frequency superposition conditions of this comparative example are: frequency: 400 MHz, Ratio: 6.0, pulse width: 220 psec at reproduction light power of 0.7 mW. This is a narrow ratio width and pulse width as compared with the high frequency superposition condition of the first embodiment. As a result of the evaluation of reproduction durability, no jitter deterioration was observed in both reproduction at 10,000 times with reproduction light power Pr = 1.0 mW at 2 × speed and reproduction at 10,000 times with Pr = 0.7 mW at 2 × speed.

  As described above, when the Ratio width and pulse width of high frequency superimposition are narrow, reproduction deterioration does not occur. However, as described above, the signal characteristics of the reproduction light deteriorate due to the influence of laser noise. Further, if the ratio width and pulse width of high frequency superposition are large, reproduction deterioration does not occur. However, as described above, due to the limitation of the high frequency superposition circuit, the upper limit of the high frequency superposition condition is: frequency: 500 MHz, ratio: 8.0, pulse Width: 350 psec. When this upper limit is exceeded, reproduction degradation is significant.

[Example 2]
Samples 13 to 17 having the same recording film composition as that of the sample 2 of Example 1 and the thickness of the interface layer 36 being changed were produced. The linear velocity of these samples was determined in the same manner as in Example 1. As for the reproduction durability, as in Example 1, the reproduction was performed 10,000 times at a double speed under the condition of Pr = 0.7 mW. The results are shown in Table 7. In Table 7, as in Table 4, when the signal was recorded at the double speed, the sample 13 whose medium linear velocity was slow and difficult to erase was described as “unerasable” in the column of the reproduction durability judgment. did.

  From Table 7, the following was found. The thickness of the interface layer 36 was 0 nm, that is, the sample 13 without the interface layer 36 was difficult to erase, and the reproduction durability could not be determined. Sample 14 in which the thickness of the interface layer 36 is 1 nm has an improved crystallization speed as compared with sample 13 and can secure a linear speed that can be erased at a double speed, but reproduction degradation was observed. Sample 15 having a thickness of interface layer 36 of 2 nm, sample 16 having a thickness of 3 nm, and sample 17 having a thickness of 10 nm were able to secure an erasable linear velocity, and no reproduction deterioration was observed. Therefore, the thickness of the interface layer 36 that can achieve both the erasable linear velocity and the reproduction durability is 2 nm or more. From the viewpoint of film formation time and mass productivity, the upper limit of the thickness of the interface layer 36 is 10 nm.

  From this result, it has become clear that it is difficult to make the crystallization speed and reproduction durability of the second information layer 16 compatible with double speed recording and double speed reproduction only with the InSbTeGe recording film composition.

[Example 3]
Samples 18 to 21 in which the composition of the ZrO ₂ —Cr ₂ O ₃ film constituting the interface layer 36 was changed with the thickness of the interface layer 36 having the same recording film composition as the sample 2 of Example 1 being 5 nm Produced. ZrO ₂ used here is stabilized ZrO ₂ having a composition containing ₃ mol% of Y ₂ O ₃ (ZrO ₂ : Y ₂ O ₃ = 97: 3 mol%). The linear velocity of these samples was determined in the same manner as in Example 1. The linear velocity of all samples was 12 m / s or more, and erasing at double speed was possible. As for the reproduction durability, as in Example 1, reproduction was performed 10,000 times at a double speed under the condition of Pr = 0.7 mW. . The results are shown in Table 8. In Table 8, for samples in which many film defects were observed in the interface layer 36, “large film defects” was described in the column of reproduction durability.

As shown in Table 8, jitter deterioration was observed in the sample 18 having the interface layer 36 made of only ZrO ₂ : Cr ₂ O ₃ = 100: 0, that is, stabilized ZrO ₂ . Further, ZrO ₂ : Cr ₂ O ₃ = 0: 100, that is, in the sample 21 having the interface layer 36 made of only Cr ₂ O ₃ , film defects frequently occur and it is considered that there is a problem in practical use. In addition, the sample 19 having the interface layer 36 of ZrO ₂ : Cr ₂ O ₃ = 90: 10 and the sample 20 having the interface layer 36 of ZrO ₂ : Cr ₂ O ₃ = 20: 80 showed no jitter deterioration. .

Therefore, the preferable composition ratio of the ZrO ₂ —Cr ₂ O ₃ film constituting the interface layer 36 is 20 ≦ C ≦ 90 and 10 ≦ when ZrO ₂ : Cr ₂ O ₃ = C: D (mol%). It was found that D ≦ 80 and C + D = 100.

[Example 4]
A sample in which the film thickness of the recording film 18 was changed with the same recording film composition as Sample 2 of Example 1 was produced. When the recording film thickness was 8 nm, the crystallization speed was too high and recording was difficult. Further, when the recording film thickness was 2 nm, the crystallization rate was slow and erasure was difficult.

  Therefore, it was found that the preferred film thickness of the recording film 18 is 3 nm or more and 7 nm or less.

[Example 5]
Samples 22 to 26 having the same recording film composition as that of Sample 2 of Example 1 but with the thickness of the reflective layer 28 changed were produced. The reproduction durability and jitter Tmp margin of each sample were evaluated in the same manner as in Example 1. The results are shown in Table 9.

  Sample 22 with a reflective layer 28 having a thickness of 6 nm had a good reproduction durability because the reflective layer was thin, and the transmittance was high and good, but the heat dissipation decreased and the Tmp margin was x. Sample 26 having a reflective layer thickness of 20 nm had high heat dissipation and good Tmp margin, but had low transmittance and a reproduction durability of x. Further, since the transmittance of the sample 26 decreased, the recording characteristics of the first information layer 14 also deteriorated. Sample 23 with a reflective layer thickness of 8 nm, Sample 24 with a thickness of 12 nm, and Sample 25 with a thickness of 16 nm were both good in Tmp margin and reproduction durability.

  Therefore, it was found that the preferred thickness of the reflective layer 28 is 8 nm or more and 16 nm or less.

  Examples 1 to 5 described above relate to an optical recording medium having two information layers and a recording film material for an optical recording medium used therefor, but the present invention is not limited to this, and the information layer has The present invention is also applicable to an optical recording medium having three or more layers and a recording film material for an optical recording medium used therefor.

Sectional drawing which shows typically the optical recording medium based on Example 1 of this invention A graph showing the relationship between the In amount (a) and the Sb amount (x) of the transflective information layer applied to the optical recording medium according to Example 1 of the present invention when b = 80.09. 6 is a graph showing the relationship between the In amount (a) and the Sb amount (x) of the semi-transmissive information layer of the optical recording medium according to Example 1 of the invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 ... Optical recording medium 12 ... Board | substrate 14 ... 1st information layer 16 ... 2nd information layer (semi-transmissive information layer)
DESCRIPTION OF SYMBOLS 18 ... Recording film 20 ... Protective layer 22 ... Spacer layer 24 ... Cover layer 26 ... 1st dielectric layer 28 ... Reflective layer 32 ... 2nd dielectric layer 34 ... Radiation layer 36 ... Interface layer

Claims (11)

A substrate, a first information layer provided on the light incident surface side of the laser beam in the substrate, and at least one semi-transmissive information layer provided further on the light incident surface side than the first information layer; And the semi-transmissive information layer includes a recording film made of a phase change material having an element of Sb _x Te _y Ge _z and a composition ratio, and y is 5 ≦ y ≦ 15, An optical recording medium in which z is 5 ≦ z ≦ 15, and the recording film can be rewritten by an optical system of λ / NA ≦ 650 nm, where NA is the numerical aperture of the objective lens and λ is the wavelength of the laser beam Because
4. The optical recording medium according to claim 1, wherein when the recording film is further added with In having a composition ratio a and x + y + z + a = 100, 4 ≦ a ≦ 15. In claim 1,
An optical recording medium characterized in that x = −0.713 × a + b when the relationship between x and a in the composition ratio is 77 ≦ b ≦ 84. In claim 1 or 2,
An optical recording medium, wherein the recording film has a thickness of 3 nm to 7 nm. In any one of Claims 1 thru | or 3,
The semi-transmissive information layer includes a reflective layer on a side opposite to a light incident surface side of the laser beam of the recording film, and the thickness of the reflective layer is from 8 nm to 16 nm. Medium. In any one of Claims 1 thru | or 4,
The semi-transmissive information layer includes an interface layer in contact with the light incident surface side of the recording film, and the interface layer includes at least Cr and O. In any one of Claims 1 thru | or 5,
The semi-transmissive information layer includes a heat radiation layer, a dielectric layer, an interface layer, and a recording film in that order from the light incident surface side of the laser beam, and the heat radiation layer is made of an AlN film. Medium. In claim 5 or 6,
The optical recording medium, wherein the interface layer is made of a ZrO ₂ —Cr ₂ O ₃ film, and the thickness of the ZrO ₂ —Cr ₂ O ₃ film is 2 nm or more and 10 nm or less. In claim 7,
When the composition ratio of the ZrO ₂ —Cr ₂ O ₃ film is ZrO ₂ : Cr ₂ O ₃ = C: D (mol%),
20 ≦ C ≦ 90 and 10 ≦ D ≦ 80 and C + D = 100
An optical recording medium characterized by the above. In claim 7 or 8,
The ZrO ₂ is stabilized ZrO ₂ containing _Y 2 _{O 3,} the composition ratio of ZrO ₂ and _Y 2 _{O 3} of the stabilized ZrO in _{2, ZrO 2: Y 2 O} 3 = 100-x: x (Mol%)
2 ≦ x ≦ 10
An optical recording medium characterized by the above. A substrate, a first information layer provided on the light incident surface side of the laser beam in the substrate, and at least one semi-transmissive information layer provided on the light incident surface side further than the first information; The semi-transmissive information layer includes a recording film that is rewritable by an optical system of λ / NA ≦ 650 nm when the numerical aperture of the objective lens is NA and the wavelength of the laser beam is λ, and the recording film And an optical recording medium comprising a protective layer in a position in contact with the substrate side,
The optical recording medium, wherein the recording film is made of an Sb eutectic phase change material containing Sb as a main component, and the protective layer contains at least Cr and O. It is made of an element of Sb _x Te _y Ge _z and a phase change material having a composition ratio, y is 5 ≦ y ≦ 15, z is 5 ≦ z ≦ 15, the numerical aperture of the objective lens is NA, and the laser beam A recording film material for an optical recording medium constituting a recording film rewritable by an optical system of λ / NA ≦ 650 nm, where
A recording film material wherein 4 ≦ a ≦ 15 is satisfied when In of composition ratio a is further added and x + y + z + a = 100.

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