JP2008199066A - Semiconductor device - Google Patents
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- JP2008199066A JP2008199066A JP2008131096A JP2008131096A JP2008199066A JP 2008199066 A JP2008199066 A JP 2008199066A JP 2008131096 A JP2008131096 A JP 2008131096A JP 2008131096 A JP2008131096 A JP 2008131096A JP 2008199066 A JP2008199066 A JP 2008199066A
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Abstract
Description
本発明は、半導体装置に係り、詳細には単一の支持板上に複数のパワー半導体素子を搭載して小型化に製造できる半導体装置に関する。 The present invention relates to a semiconductor device, and more particularly to a semiconductor device that can be manufactured in a small size by mounting a plurality of power semiconductor elements on a single support plate.
図３に示すＨ型ブリッジ回路(10)を単一の半導体装置で構成する場合、Ｈ型ブリッジ回路(10)は、ハイサイド側の第１のトランジスタ(1)及び第３のトランジスタ(3)と、ローサイド側の第２のトランジスタ(2)及び第４のトランジスタ(4)とを備えている。第１のトランジスタ(1)のエミッタ電極と第２のトランジスタ(2)のコレクタ電極との接続点(A1)と、第３のトランジスタ(3)のエミッタ電極と第４のトランジスタ(4)のコレクタ電極との接続点(A2)との間には、交流電流により駆動される例えば冷陰極蛍光放電管である負荷(6)が接続される。
Ｈ型ブリッジ回路(10)を作動する際に、第１のトランジスタ(1)及び第４のトランジスタ(4)と、第２のトランジスタ(2)及び第３のトランジスタ(3)とを交互にオン・オフ動作させて、スイッチング作動させることにより、接続点(A1)と(A2)との間に交互に逆方向の電流を流して、負荷(6)を作動させることができる。このように、第１のトランジスタ(1)から第４のトランジスタ(4)までのスイッチング動作を行ない、直流電圧源を使用し、接続点(A1)と(A2)との間に接続された冷陰極蛍光放電管等を点灯させることができる。
When the H-type bridge circuit (10) shown in FIG. 3 is configured by a single semiconductor device, the H-type bridge circuit (10) includes the first transistor (1) and the third transistor (3) on the high side. And a second transistor (2) and a fourth transistor (4) on the low side. Connection point (A1) between the emitter electrode of the first transistor (1) and the collector electrode of the second transistor (2), the emitter electrode of the third transistor (3) and the collector of the fourth transistor (4) Between the connection point (A2) with the electrode, a load (6) which is a cold cathode fluorescent discharge tube driven by an alternating current is connected.
When the H-type bridge circuit (10) is operated, the first transistor (1) and the fourth transistor (4), and the second transistor (2) and the third transistor (3) are alternately turned on. By performing the switching operation by turning off the load, the load (6) can be operated by causing a reverse current to flow alternately between the connection points (A1) and (A2). In this way, the switching operation from the first transistor (1) to the fourth transistor (4) is performed, and the DC voltage source is used to connect the cold connected between the connection points (A1) and (A2). A cathode fluorescent discharge tube or the like can be lit.
図３に示すＨ型ブリッジ回路(10)を単一の半導体装置に構築するとき、４つの第１のトランジスタ(1)から第４のトランジスタ(4)までとその制御用ICを搭載する支持板（図示せず）の平面面積が大きくなるため、半導体装置のサイズが増大する欠点がある。そこで、例えば特許文献１に開示される２つの半導体素子の積層技術を適用して、半導体装置の平面面積を縮小することができる。特許文献１は、非導電性接着剤を介して２つの半導体素子を積層した電子部品を示す。しかしながら、パワー半導体素子を積層するＨ型ブリッジ回路では、単に半導体素子を積層しても、動作時に半導体素子の発熱が集中して、良好な放熱特性が得られず、半導体素子の電気的特性が劣化するおそれがあった。
そこで、本発明の目的は、複数の半導体素子を小さい面積に積層し且つ良好な放熱特性で作動できる半導体装置を提供することにある。
When the H-type bridge circuit (10) shown in FIG. 3 is constructed in a single semiconductor device, a support plate on which the four first transistors (1) to the fourth transistor (4) and their control ICs are mounted. Since the planar area (not shown) becomes large, there is a disadvantage that the size of the semiconductor device increases. Therefore, for example, by applying a stacking technique of two semiconductor elements disclosed in
Accordingly, an object of the present invention is to provide a semiconductor device in which a plurality of semiconductor elements are stacked in a small area and can operate with good heat dissipation characteristics.
本発明による半導体装置は、放熱性を有する支持板(5)と、支持板(5)上に順次積層されて固着された第１の半導体素子(1)及び第２の半導体素子(2)を有する第１の半導体素子積層体(7)と、支持板(5)上に順次積層されて固着された第３の半導体素子(3)及び第４の半導体素子(4)を有する第２の半導体素子積層体(8)と、支持板(5)に接続された複数の外部リード(20)とを備える。支持板(5)は、第１の半導体素子積層体(7)と第２の半導体素子積層体(8)との配列方向に延伸する側面を有し、第１の半導体素子積層体(7)及び第２の半導体素子積層体(8)から離間する支持板(5)の側面の外側に複数の外部リード(20)を各々接続する。第１の半導体素子(1)及び第２の半導体素子(2)を順次支持板(5)上に積層して固着すると、支持板(5)の占有面積を減少しつつ集積度を向上することができる。
本発明の第１の実施の形態による半導体装置は、放熱性を有する支持板(5)と、支持板(5)上に順次積層されて固着され且つ交互にスイッチング動作される第１の半導体素子(1)及び第２の半導体素子(2)とを備えている。第１の半導体素子(1)と第２の半導体素子(2)とを交互にスイッチング動作させるので、一方がオンのとき他方がオフとなり、第１の半導体素子(1)と第２の半導体素子(2)の発生熱量を抑制することができる。
The semiconductor device according to the present invention includes a heat-dissipating support plate (5), and a first semiconductor element (1) and a second semiconductor element (2) that are sequentially stacked and fixed on the support plate (5). A second semiconductor having a first semiconductor element stack (7) having a third semiconductor element (3) and a fourth semiconductor element (4) which are sequentially stacked and fixed on the support plate (5). An element laminate (8) and a plurality of external leads (20) connected to the support plate (5) are provided. The support plate (5) has side surfaces extending in the arrangement direction of the first semiconductor element stack (7) and the second semiconductor element stack (8), and the first semiconductor element stack (7). A plurality of external leads (20) are connected to the outside of the side surface of the support plate (5) spaced from the second semiconductor element stack (8). When the first semiconductor element (1) and the second semiconductor element (2) are sequentially stacked and fixed on the support plate (5), the degree of integration is improved while reducing the area occupied by the support plate (5). Can do.
The semiconductor device according to the first embodiment of the present invention includes a support plate (5) having heat dissipation, and a first semiconductor element that is sequentially stacked and fixed on the support plate (5) and alternately switched. (1) and a second semiconductor element (2). Since the first semiconductor element (1) and the second semiconductor element (2) are alternately switched, when one is turned on, the other is turned off, and the first semiconductor element (1) and the second semiconductor element are turned off. The amount of heat generated in (2) can be suppressed.
本発明の第２の実施の形態による半導体装置は、放熱性を有する支持板(5)と、支持板(5)上に順次積層されて固着された第１の半導体素子(1)及び第２の半導体素子(2)を有する第１の半導体素子積層体(7)と、支持板(5)上に順次積層されて固着された第３の半導体素子(3)及び第４の半導体素子(4)を有する第２の半導体素子積層体(8)とを備え、第１の半導体素子積層体(7)の第１の半導体素子(1)及び第２の半導体素子(2)と、第２の半導体素子積層体(8)の第３の半導体素子(3)及び第４の半導体素子(4)とは、Ｈ型ブリッジ回路(10)を構成する。第１の半導体素子(1)から第４の半導体素子(4)までの各々は、スイッチング素子を有し、第１の半導体素子(1)及び第４の半導体素子(4)と第２の半導体素子(2)及び第３の半導体素子(3)とは交互にスイッチング動作される。第１の半導体素子(1)及び第４の半導体素子(4)並びに第２の半導体素子(2)及び第３の半導体素子(3)のスイッチング素子を交互にスイッチング動作させることにより、直流電源に接続したＨ型ブリッジ回路(10)の負荷(6)を交流電流で駆動することができる。 The semiconductor device according to the second embodiment of the present invention includes a support plate (5) having heat dissipation, and a first semiconductor element (1) and a second semiconductor layer (1), which are sequentially stacked and fixed on the support plate (5). The first semiconductor element stack (7) having the semiconductor elements (2), the third semiconductor element (3) and the fourth semiconductor element (4) sequentially stacked and fixed on the support plate (5). ) Having a second semiconductor element stack (8), the first semiconductor element (1) and the second semiconductor element (2) of the first semiconductor element stack (7), and a second semiconductor element stack (8). The third semiconductor element (3) and the fourth semiconductor element (4) of the semiconductor element stacked body (8) constitute an H-type bridge circuit (10). Each of the first semiconductor element (1) to the fourth semiconductor element (4) has a switching element, and the first semiconductor element (1), the fourth semiconductor element (4), and the second semiconductor element. The element (2) and the third semiconductor element (3) are alternately switched. By switching the switching elements of the first semiconductor element (1) and the fourth semiconductor element (4) and the second semiconductor element (2) and the third semiconductor element (3) alternately, a direct current power source is provided. The load (6) of the connected H-type bridge circuit (10) can be driven with an alternating current.
本発明の第３の実施の形態による半導体装置は、放熱性を有する支持板(5)と、支持板(5)上に順次積層されて固着されたパワー半導体素子により各々構成された第１の半導体素子(1)及び第２の半導体素子(2)とを備えている。第１の半導体素子(1)及び第２の半導体素子(2)の各々はスイッチング素子を有する。第１の半導体素子(1)と第２の半導体素子(2)との間に放熱層(11)が固着され、第１の半導体素子(1)と第２の半導体素子(2)とは、放熱層(11)を介して電気的に互いに接続される。大電流が流れる第１の半導体素子(1)及び第２の半導体素子(2)から多量の発熱が発生しても、第１の半導体素子(1)と第２の半導体素子(2)との間に固着された放熱層(11)を通じて十分な量の熱を放出できるので、第１の半導体素子(1)と第２の半導体素子(2)の電気的特性は劣化しない。 A semiconductor device according to the third embodiment of the present invention includes a first support plate (5) having heat dissipation and a power semiconductor element that is sequentially stacked and fixed on the support plate (5). A semiconductor element (1) and a second semiconductor element (2) are provided. Each of the first semiconductor element (1) and the second semiconductor element (2) has a switching element. A heat dissipation layer (11) is fixed between the first semiconductor element (1) and the second semiconductor element (2), and the first semiconductor element (1) and the second semiconductor element (2) are: They are electrically connected to each other through the heat dissipation layer (11). Even if a large amount of heat is generated from the first semiconductor element (1) and the second semiconductor element (2) through which a large current flows, the first semiconductor element (1) and the second semiconductor element (2) Since a sufficient amount of heat can be released through the heat dissipation layer (11) fixed therebetween, the electrical characteristics of the first semiconductor element (1) and the second semiconductor element (2) do not deteriorate.
本発明の第４の実施の形態による半導体装置は、放熱性を有する支持板(5)と、支持板(5)上に順次積層されて固着されたパワー半導体素子により各々構成される第１の半導体素子(1)及び第２の半導体素子(2)を有する第１のパワー半導体素子積層体(7)と、支持板(5)上に順次積層されて固着されたパワー半導体素子により各々構成される第３の半導体素子(3)及び第４の半導体素子(4)を有する第２のパワー半導体素子積層体(8)とを備えている。第１の半導体素子(1)、第２の半導体素子(2)、第３の半導体素子(3)及び第４の半導体装置(4)の各々はスイッチング素子を有する。第１の半導体素子(1)と第２の半導体素子(2)との間に第１の放熱層(11)が固着され、第３の半導体素子(3)と第４の半導体素子(4)との間に第２の放熱層(12)が固着される。第１の半導体素子(1)と第２の半導体素子(2)とは、第１の放熱層(11)を介して電気的に互いに接続され、第３の半導体素子(3)と第４の半導体素子(4)とは、第２の放熱層(12)を介して電気的に互いに接続される。単一の支持板(5)上に第１のパワー半導体素子積層体(7)と第２のパワー半導体素子積層体(8)とを固着しても、第１の半導体素子(1)と第２の半導体素子(2)との間及び第３の半導体素子(3)と第４の半導体素子(4)との間に固着される第１及び第２の放熱層(11,12)を通じて十分な量の熱を放出できるので、第１の半導体素子(1)から第４の半導体素子(4)までの電気的特性は劣化しない。更に、第１の半導体素子(1)と第２の半導体素子(2)及び第３の半導体素子(3)と第４の半導体素子(4)とを第１及び第２の放熱層(11,12)を介して電気的に互いに接続するので、第１のパワー半導体素子積層体(7)と第２のパワー半導体素子積層体(8)とに流れる電流の結線経路を短縮して、電流の結線経路の延長によるノイズ発生及び電力損失を抑制することができる。 The semiconductor device according to the fourth embodiment of the present invention includes a first support plate (5) having heat dissipation and a power semiconductor element that is sequentially stacked and fixed on the support plate (5). A first power semiconductor element stack (7) having a semiconductor element (1) and a second semiconductor element (2) and a power semiconductor element sequentially stacked and fixed on a support plate (5). And a second power semiconductor element stack (8) having a third semiconductor element (3) and a fourth semiconductor element (4). Each of the first semiconductor element (1), the second semiconductor element (2), the third semiconductor element (3), and the fourth semiconductor device (4) has a switching element. A first heat dissipation layer (11) is fixed between the first semiconductor element (1) and the second semiconductor element (2), and the third semiconductor element (3) and the fourth semiconductor element (4). The second heat dissipation layer (12) is fixed between the two. The first semiconductor element (1) and the second semiconductor element (2) are electrically connected to each other via the first heat dissipation layer (11), and the third semiconductor element (3) and the fourth semiconductor element (4) are connected to each other. The semiconductor element (4) is electrically connected to each other through the second heat dissipation layer (12). Even if the first power semiconductor element stack (7) and the second power semiconductor element stack (8) are fixed on the single support plate (5), the first semiconductor element (1) and the second power semiconductor element stack (8) are fixed. Through the first and second heat dissipation layers (11, 12) fixed between the second semiconductor element (2) and between the third semiconductor element (3) and the fourth semiconductor element (4). Since a sufficient amount of heat can be released, the electrical characteristics from the first semiconductor element (1) to the fourth semiconductor element (4) do not deteriorate. Further, the first semiconductor element (1), the second semiconductor element (2), the third semiconductor element (3), and the fourth semiconductor element (4) are connected to the first and second heat dissipation layers (11, 11). 12) are electrically connected to each other via the first power semiconductor element stack (7) and the second power semiconductor element stack (8). Noise generation and power loss due to extension of the connection path can be suppressed.
本発明による半導体装置では、複数の半導体素子に大きな電流が流れても過度の発熱が発生せずに、電気的特性の劣化を抑制して、寿命を延長し、信頼性のある半導体装置を得ることができる。 In the semiconductor device according to the present invention, even if a large current flows through a plurality of semiconductor elements, excessive heat generation does not occur, electrical characteristics are prevented from deteriorating, life is extended, and a reliable semiconductor device is obtained. be able to.
以下、図３に示すＨ型ブリッジ回路を構成する本発明による半導体装置の実施の形態を図１及び図２について説明する。図１及び図２では、図３に示す部分と同一の箇所には、同一の符号を付する。 A semiconductor device according to an embodiment of the present invention constituting the H-type bridge circuit shown in FIG. 3 will be described below with reference to FIGS. 1 and 2, the same parts as those shown in FIG. 3 are denoted by the same reference numerals.
本発明による半導体装置は、放熱性を有する銅又はアルミニウム等の金属製の支持板(5)と、支持板(5)上に固着された第１の半導体素子積層体（第１のパワー半導体素子積層体）(7)と、支持板(5)上に固着された第２の半導体素子積層体（第２のパワー半導体素子積層体）(8)と、第１の半導体素子積層体(7)と第２の半導体素子積層体(8)との間で支持板(5)上に固着された半導体集積回路により構成された制御回路(13)とを備えている。第１の半導体素子積層体(7)は、支持板(5)上に順次積層されて固着された第１のトランジスタ（第１の半導体素子、第１のパワー半導体素子又は第１のスイッチング素子）(1)と第２のトランジスタ（第２の半導体素子、第２のパワー半導体素子又は第２のスイッチング素子）(2)とを有し、第２の半導体素子積層体(8)は、支持板(5)上に順次積層されて固着された第３のトランジスタ（第３の半導体素子、第３のパワー半導体素子又は第３のスイッチング素子）(3)と第４のトランジスタ（第４の半導体素子、第４のパワー半導体素子又は第４のスイッチング素子）(4)とを有する。第１のトランジスタ(1)から第４のトランジスタ(4)までは、図３に示すＨ型ブリッジ回路(10)の４つのパワートランジスタを構成する例えば絶縁ゲート型バイポーラトランジスタ（IGBT）である。 A semiconductor device according to the present invention includes a heat-dissipating metal support plate (5) such as copper or aluminum, and a first semiconductor element stack (first power semiconductor element) fixed on the support plate (5). (Laminated body) (7), a second semiconductor element laminated body (second power semiconductor element laminated body) (8) fixed on the support plate (5), and a first semiconductor element laminated body (7). And a second semiconductor element stack (8), and a control circuit (13) constituted by a semiconductor integrated circuit fixed on the support plate (5). The first semiconductor element stack (7) is a first transistor (first semiconductor element, first power semiconductor element or first switching element) that is sequentially stacked and fixed on the support plate (5). (1) and a second transistor (second semiconductor element, second power semiconductor element or second switching element) (2), and the second semiconductor element stack (8) is a support plate (5) A third transistor (third semiconductor element, third power semiconductor element or third switching element) (3) and a fourth transistor (fourth semiconductor element) which are sequentially stacked and fixed thereon , A fourth power semiconductor element or a fourth switching element) (4). The first transistor (1) to the fourth transistor (4) are, for example, insulated gate bipolar transistors (IGBT) constituting the four power transistors of the H-type bridge circuit (10) shown in FIG.
図示しないが、第１のトランジスタ(1)から第４のトランジスタ(4)までは、半導体基板と、半導体基板の上面に電気的に接続されたベース電極及びエミッタ電極と、半導体基板の下面に電気的に接続されたコレクタ電極とを有する。エミッタ電極とベース電極との間に設けられる層間絶縁膜(9)により、エミッタ電極とベース電極とは電気的に分離される。第１のトランジスタ(1)のコレクタ電極は、ろう材（半田）(14)を介して支持板(5)に固着され、第１のトランジスタ(1)のエミッタ電極は、ろう材（半田）(15)を介して第１の放熱層(11)に固着される。第２のトランジスタ(2)のコレクタ電極は、ろう材(16)を介して第１の放熱層(11)に固着され、第２のトランジスタ(2)のエミッタ電極は、最上部に配置される。同様に、第３のトランジスタ(3)のコレクタ電極は、ろう材（半田）(17)を介して支持板(5)に固着され、第３のトランジスタ(3)のエミッタ電極は、ろう材（半田）(18)を介して第２の放熱層(12)に固着される。第４のトランジスタ(4)のコレクタ電極は、ろう材(19)を介して第２の放熱層(12)に固着され、第４のトランジスタ(4)のエミッタ電極は、最上部に配置される。図示の実施の形態では、第１及び第２の放熱層(11,12)は、銅又はアルミニウム等の金属により形成された放熱板が使用され、主に第２のトランジスタ(2)と第４のトランジスタ(4)から発生する熱を外部に放出するヒートスプレッダとも呼ばれる。放熱板により形成する代わりに、比較的肉薄の半田層により放熱層(11,12)を形成してもよい。図２に示すように、第１のトランジスタ(1)から第４のトランジスタ(4)までの各エミッタ電極、コレクタ電極及びベース電極は、図３に示す回路構成に接続されると共に、第１の半導体素子積層体(7)、第２の半導体素子積層体(8)及び制御回路(13)の電極に接続された複数の外部リード(20)が接続され、樹脂封止体(21)により半導体装置全体が被覆されるが、外部リード(20)は樹脂封止体(21)から外部に導出される。 Although not shown, the first transistor (1) to the fourth transistor (4) are electrically connected to the semiconductor substrate, the base electrode and the emitter electrode electrically connected to the upper surface of the semiconductor substrate, and the lower surface of the semiconductor substrate. Connected collector electrodes. The emitter electrode and the base electrode are electrically separated by the interlayer insulating film (9) provided between the emitter electrode and the base electrode. The collector electrode of the first transistor (1) is fixed to the support plate (5) through the brazing material (solder) (14), and the emitter electrode of the first transistor (1) is brazed (solder) ( It is fixed to the first heat dissipation layer (11) via 15). The collector electrode of the second transistor (2) is fixed to the first heat dissipation layer (11) via the brazing material (16), and the emitter electrode of the second transistor (2) is arranged at the top. . Similarly, the collector electrode of the third transistor (3) is fixed to the support plate (5) via the brazing material (solder) (17), and the emitter electrode of the third transistor (3) is fixed to the brazing material (solder). It is fixed to the second heat dissipation layer (12) via solder (18). The collector electrode of the fourth transistor (4) is fixed to the second heat dissipation layer (12) through the brazing material (19), and the emitter electrode of the fourth transistor (4) is arranged at the top. . In the illustrated embodiment, the first and second heat radiating layers (11, 12) are made of a heat radiating plate formed of a metal such as copper or aluminum, and mainly the second transistor (2) and the fourth radiating layer. It is also called a heat spreader that releases heat generated from the transistor (4) to the outside. Instead of forming with a heat sink, the heat dissipation layer (11, 12) may be formed with a relatively thin solder layer. As shown in FIG. 2, each emitter electrode, collector electrode and base electrode from the first transistor (1) to the fourth transistor (4) are connected to the circuit configuration shown in FIG. A plurality of external leads (20) connected to the electrodes of the semiconductor element stacked body (7), the second semiconductor element stacked body (8), and the control circuit (13) are connected, and a semiconductor is sealed by the resin sealing body (21). Although the entire apparatus is covered, the external lead (20) is led out from the resin sealing body (21).
動作の際に、支持板(5)は、図示しない直流電源の正側端子に接続され、第２のトランジスタ(2)と第４のトランジスタ(4)の各エミッタ電極は、直流電源の負側端子に接続される。第１のトランジスタ(1)から第４のトランジスタ(4)までの各ベース電極は、半導体集積回路により構成される制御回路(13)に接続され、制御回路(13)から制御信号を受信する。第１のトランジスタ(1)と第４のトランジスタ(4)がオンのとき、第２のトランジスタ(2)と第３のトランジスタ(3)とはオフとなり、負荷(6)に一方向の電流(I1)が流れ、その後、第１のトランジスタ(1)と第４のトランジスタ(4)がオフに切り換えられ、第２のトランジスタ(2)と第３のトランジスタ(3)とがオンに切り換えられると、負荷(6)に他方向の電流(I2)が流れて、負荷(6)が交流電流により作動される。 In operation, the support plate (5) is connected to a positive terminal of a DC power source (not shown), and the emitter electrodes of the second transistor (2) and the fourth transistor (4) are connected to the negative side of the DC power source. Connected to the terminal. Each base electrode from the first transistor (1) to the fourth transistor (4) is connected to a control circuit (13) constituted by a semiconductor integrated circuit, and receives a control signal from the control circuit (13). When the first transistor (1) and the fourth transistor (4) are on, the second transistor (2) and the third transistor (3) are off, and the load (6) has a unidirectional current ( I1) flows, and then the first transistor (1) and the fourth transistor (4) are switched off and the second transistor (2) and the third transistor (3) are switched on. The current (I2) in the other direction flows through the load (6), and the load (6) is operated by the alternating current.
本実施の形態での半導体装置は、下記の点で従来の半導体装置と異なる。
<1> ハイサイド側の第１のトランジスタ(1)と第３のトランジスタ(3)との上に、ローサイド側の第２のトランジスタ(2)と第４のトランジスタ(4)が固着されて第１及び第２の半導体素子積層体(7,8)が構成され、第１の半導体素子積層体(7)と第２の半導体素子積層体(8)の間に設けられる制御回路(13)とが単一の支持板(5)上に固着される。
<2> 第１のトランジスタ(1)と第２のトランジスタ(2)との間及び第３のトランジスタ(3)及び第４のトランジスタ(4)との間に金属製の第１及び第２の放熱層(11,12)が固着される。
<3> 第１のトランジスタ(1)及び第４のトランジスタ(4)と、第２のトランジスタ(2)及び第３のトランジスタ(3)とが交互にスイッチング動作される。
<4> 第１のトランジスタ(1)と第２のトランジスタ(2)との間及び第３のトランジスタ(3)と第４のトランジスタ(4)との間は、金属製の第１及び第２の放熱層(11,12)を介して電気的に接続される。
The semiconductor device in the present embodiment is different from the conventional semiconductor device in the following points.
<1> The second transistor (2) and the fourth transistor (4) on the low side are fixed on the first transistor (1) and the third transistor (3) on the high side. And a control circuit (13) provided between the first semiconductor element stack (7) and the second semiconductor element stack (8). Is fixed on a single support plate (5).
<2> Metal first and second transistors between the first transistor (1) and the second transistor (2) and between the third transistor (3) and the fourth transistor (4). The heat dissipation layer (11, 12) is fixed.
<3> The first transistor (1) and the fourth transistor (4), and the second transistor (2) and the third transistor (3) are alternately switched.
<4> Between the first transistor (1) and the second transistor (2) and between the third transistor (3) and the fourth transistor (4), the metal first and second Are electrically connected through the heat dissipation layers (11, 12).
本実施の形態による半導体装置は、下記の作用効果を生ずる。
[1] 第１のトランジスタ(1)の上に第２のトランジスタ(2)を固着し又は第３のトランジスタ(3)の上に第４のトランジスタ(4)を固着することにより、支持板(5)の占有面積を減少しつつ集積度を向上することができると共に、第１のトランジスタ(1)と第２のトランジスタ(2)又は第３のトランジスタ(3)と第４のトランジスタ(4)とを交互にスイッチング動作させるので、第１のトランジスタ(1)から第４のトランジスタ(4)までの各々から発生する熱を十分に放出して、第１の半導体素子積層体(7)又は第２の半導体素子積層体(8)の過度の温度上昇を防止することができる。
[2] 第１のトランジスタ(1)及び第４のトランジスタ(4)並びに第２のトランジスタ(2)及び第３のトランジスタ(3)のスイッチング素子(6)を交互にスイッチング動作させることにより、直流電源に接続されたＨ型ブリッジ回路(10)の負荷(6)を交流電流で駆動することができる。
[3] 大電流が流れる第１のトランジスタ(1)及び第２のトランジスタ(2)から多量の発熱が生じても、第１のトランジスタ(1)と第２のトランジスタ(2)との間に固着された第１の放熱層(11)を通じて十分な量の熱を放出できるので、第１のトランジスタ(1)と第２のトランジスタ(2)の電気的特性は劣化しない。
[4] 単一の支持板(5)上に第１のパワー半導体素子積層体(7)と第２のパワー半導体素子積層体(8)とを固着しても、第１のトランジスタ(1)と第２のトランジスタ(2)との間に固着される第１の放熱層(11)及び第３のトランジスタ(3)と第４のトランジスタ(4)との間に固着される第２の放熱層(12)を通じて十分な量の熱を放出できるので、第１のトランジスタ(1)から第４のトランジスタ(4)までの電気的特性は劣化しない。
[5] 第１のトランジスタ(1)と第２のトランジスタ(2)及び第３のトランジスタ(3)と第４のトランジスタ(4)とを第１及び第２の放熱層(11,12)を介して電気的に互いに接続するので、別途ワイヤボンディング等を行なう必要がなく、第１のパワー半導体素子積層体(7)と第２のパワー半導体素子積層体(8)とに流れる電流の結線経路を短縮して、ワイヤ結線等を簡素化し、電流の結線経路の延長によるノイズ発生及び電力損失を抑制することができる。
The semiconductor device according to the present embodiment produces the following operational effects.
[1] The second transistor (2) is fixed on the first transistor (1) or the fourth transistor (4) is fixed on the third transistor (3). 5) It is possible to improve the degree of integration while reducing the area occupied by the first transistor (1) and the second transistor (2) or the third transistor (3) and the fourth transistor (4). Are alternately switched, so that the heat generated from each of the first transistor (1) to the fourth transistor (4) is sufficiently released, and the first semiconductor element stack (7) or the second It is possible to prevent an excessive temperature rise in the semiconductor element stack (2).
[2] By switching the switching elements (6) of the first transistor (1) and the fourth transistor (4) and the second transistor (2) and the third transistor (3) alternately, a direct current is generated. The load (6) of the H-type bridge circuit (10) connected to the power source can be driven with an alternating current.
[3] Even if a large amount of heat is generated from the first transistor (1) and the second transistor (2) through which a large current flows, it is between the first transistor (1) and the second transistor (2). Since a sufficient amount of heat can be released through the fixed first heat dissipation layer (11), the electrical characteristics of the first transistor (1) and the second transistor (2) do not deteriorate.
[4] Even if the first power semiconductor element stack (7) and the second power semiconductor element stack (8) are fixed on the single support plate (5), the first transistor (1) First heat dissipation layer (11) fixed between the first transistor and the second transistor (2) and second heat dissipation fixed between the third transistor (3) and the fourth transistor (4). Since a sufficient amount of heat can be released through the layer (12), the electrical characteristics from the first transistor (1) to the fourth transistor (4) do not deteriorate.
[5] The first transistor (1), the second transistor (2), the third transistor (3), and the fourth transistor (4) are connected to the first and second heat dissipation layers (11, 12). Since the wires are electrically connected to each other, there is no need to separately perform wire bonding or the like, and the connection path of the current flowing through the first power semiconductor element stack (7) and the second power semiconductor element stack (8) The wire connection and the like can be simplified, and noise generation and power loss due to extension of the current connection path can be suppressed.
本発明の前記実施の形態は、変更が可能である。例えば、絶縁ゲート型バイポーラトランジスタの代わりに、ＭＯＳＦＥＴ又は一般的なバイポーラトランジスタを使用することができる。また、第１の半導体素子(1)から第４の半導体素子(4)までをトランジスタとして示したが、トランジスタ等のスイッチング素子と他の半導体素子を含む複合素子であってもよい。 The embodiment of the present invention can be modified. For example, instead of an insulated gate bipolar transistor, a MOSFET or a general bipolar transistor can be used. Further, although the first semiconductor element (1) to the fourth semiconductor element (4) are shown as transistors, a composite element including a switching element such as a transistor and another semiconductor element may be used.
冷陰極蛍光放電管等の駆動装置に使用される半導体装置に適用することが可能である。 The present invention can be applied to a semiconductor device used in a driving device such as a cold cathode fluorescent discharge tube.
(1)・・第１の半導体装置（第１のトランジスタ）、 (2)・・第２の半導体装置（第２のトランジスタ）、 (3)・・第３の半導体装置（第３のトランジスタ）、 (4)・・第４の半導体装置（第４のトランジスタ）、 (5)・・支持板、 (6)・・負荷、 (7)・・第１のパワー半導体素子積層体、 (8)・・第２のパワー半導体素子積層体、 (10)・・Ｈ型ブリッジ回路、 (11,12)・・放熱層、 (13)・・制御回路、 (14,15,16,17,18,19)・・ろう材（半田）、 (1) ··· First semiconductor device (first transistor), (2) · · Second semiconductor device (second transistor), (3) · · Third semiconductor device (third transistor) (4) ・ ・ Fourth semiconductor device (fourth transistor), (5) ・ ・ Support plate, (6) ・ ・ Load, (7) ・ ・ First power semiconductor element stack, (8)・ ・ Second power semiconductor element stack, (10) ・ ・ H type bridge circuit, (11,12) ・ ・ Heat dissipation layer, (13) ・ ・ Control circuit, (14,15,16,17,18, 19) ・ ・ Brazer (solder),
Claims (4)
前記支持板は、前記第１の半導体素子積層体と前記第２の半導体素子積層体との配列方向に延伸する側面を有し、
前記第１の半導体素子積層体及び前記第２の半導体素子積層体から離間する前記支持板の側面の外側に前記複数の外部リードを各々接続したことを特徴とする半導体装置。 A support plate having heat dissipation, a first semiconductor element stack having a first semiconductor element and a second semiconductor element sequentially stacked and fixed on the support plate, and sequentially stacked on the support plate. A second semiconductor element stack having a third semiconductor element and a fourth semiconductor element fixed together, and a plurality of external leads connected to the support plate,
The support plate has a side surface extending in the arrangement direction of the first semiconductor element stack and the second semiconductor element stack,
A semiconductor device, wherein the plurality of external leads are respectively connected to the outside of the side surface of the support plate that is separated from the first semiconductor element stack and the second semiconductor element stack.
該一方の側面及び他方の側面に前記複数の外部リードをそれぞれ接続した請求項１又は２に記載の半導体装置。 The side surface of the support plate is composed of one side surface and the other side surface facing each other,
The semiconductor device according to claim 1, wherein the plurality of external leads are connected to the one side surface and the other side surface, respectively.
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| JP2007027432A (en) * | 2005-07-15 | 2007-02-01 | Sanken Electric Co Ltd | Semiconductor device |
| JP5481104B2 (en) | 2009-06-11 | 2014-04-23 | ルネサスエレクトロニクス株式会社 | Semiconductor device |
| DE102013008193A1 (en) | 2013-05-14 | 2014-11-20 | Audi Ag | Device and electrical assembly for converting a DC voltage into an AC voltage |
| CN103824832B (en) * | 2014-03-13 | 2016-08-24 | 杭州明果教育咨询有限公司 | A kind of integrated six brachium pontis package modules of many MOSFET |
| JP2018503250A (en) * | 2014-12-10 | 2018-02-01 | 日本テキサス・インスツルメンツ株式会社 | Integration of power field effect transistors (FETs), pre-drivers, controllers, and sense resistors |
| US10204847B2 (en) | 2016-10-06 | 2019-02-12 | Infineon Technologies Americas Corp. | Multi-phase common contact package |
| JP6770452B2 (en) * | 2017-01-27 | 2020-10-14 | ルネサスエレクトロニクス株式会社 | Semiconductor device |
| JP2022136455A (en) * | 2021-03-08 | 2022-09-21 | 株式会社デンソー | Semiconductor module with semiconductor device built into circuit board |
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| JPH09213877A (en) * | 1996-02-02 | 1997-08-15 | Toshiba Corp | Multi-chip module semiconductor device |
| JP2005519578A (en) * | 2002-03-04 | 2005-06-30 | インターナショナル レクティフィアー コーポレイション | H-bridge with single lead frame |
| JP2005519576A (en) * | 2002-03-04 | 2005-06-30 | インターナショナル レクティフィアー コーポレイション | Single lead frame H-bridge |
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| WO1999004433A2 (en) * | 1997-07-19 | 1999-01-28 | Koninklijke Philips Electronics N.V. | Mcm semiconductor device assemblies and circuits |
| JP2000164800A (en) | 1998-11-30 | 2000-06-16 | Mitsubishi Electric Corp | Semiconductor module |
| US6259615B1 (en) * | 1999-07-22 | 2001-07-10 | O2 Micro International Limited | High-efficiency adaptive DC/AC converter |
| JP2001043985A (en) * | 1999-07-30 | 2001-02-16 | Denso Corp | Discharge lamp device |
| JP2002026251A (en) | 2000-07-11 | 2002-01-25 | Toshiba Corp | Semiconductor device |
| DE10102750B4 (en) * | 2001-01-22 | 2006-04-20 | Siemens Ag | circuitry |
| EP1475836B1 (en) * | 2003-05-08 | 2006-05-03 | Infineon Technologies AG | Circuit module having interleaved groups of circuit chips |
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| JPH09213877A (en) * | 1996-02-02 | 1997-08-15 | Toshiba Corp | Multi-chip module semiconductor device |
| JP2005519578A (en) * | 2002-03-04 | 2005-06-30 | インターナショナル レクティフィアー コーポレイション | H-bridge with single lead frame |
| JP2005519576A (en) * | 2002-03-04 | 2005-06-30 | インターナショナル レクティフィアー コーポレイション | Single lead frame H-bridge |
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| CN100546028C (en) | 2009-09-30 |
| WO2005018001A1 (en) | 2005-02-24 |
| JPWO2005018001A1 (en) | 2007-10-04 |
| EP1657750B1 (en) | 2018-12-05 |
| US20060202228A1 (en) | 2006-09-14 |
| EP1657750A1 (en) | 2006-05-17 |
| CN1795557A (en) | 2006-06-28 |
| JP4853493B2 (en) | 2012-01-11 |
| JP2008199067A (en) | 2008-08-28 |
| EP1657750A4 (en) | 2009-09-02 |
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| JP4844591B2 (en) | 2011-12-28 |
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