JP2008199040A - Vertical heat treatment apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a vertical heat treatment apparatus in which problems about corrosion of a cover and outgas from an O ring can be solved and durability of the O ring can be improved. <P>SOLUTION: The apparatus includes a cover 8 for closing an aperture end 2a of a treatment container 2 and a holder provided on the cover to hold a plurality of workpieces. The cover 8 includes an inner cover part 17 made of quartz in contact with the aperture end of the treatment container and an outer cover part 18 made of metal covering the outer surface of the inner cover part 17. An annular recess 50 is formed in an upper portion of the outer circumference of the inner cover part 17 in a manner more inwardly recessed than the outer circumferential portion of the aperture end of the treatment container, and a flange 21 is formed in a lower portion of the outer circumference of the inner cover part 17. The outer over part 18 is provided with a flange retainer 27 for holding the flange 21 of the inner cover part 17, located in the annular recess 50. A first O ring 51 in contact with the lower surface of the aperture end of the treatment container and a second O ring 52 in contact with the flange 21 are provided in an upper portion and a lower portion of the flange retainer 27, respectively. A refrigerant passage 31 is provided inside the flange retainer 27. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a vertical heat treatment apparatus.

  In the manufacture of semiconductor devices, various types of heat treatment apparatuses are used in order to perform processes such as oxidation, diffusion, and CVD (Chemical Vapor Deposition) on an object to be processed such as a semiconductor wafer. As one of them, there is known a vertical heat treatment apparatus capable of heat treating a large number of objects to be processed at one time.

  This vertical heat treatment apparatus includes a holder that holds a large number of objects to be processed in a quartz processing container having an opening at the lower end, and the opening is hermetically sealed with a lid, and a heater provided around the processing container Thus, the object to be processed is heated to perform a predetermined heat treatment in a predetermined processing gas atmosphere (see, for example, Japanese Patent Application Laid-Open No. 2003-257958). FIG. 6 is an enlarged sectional view of a main part of a conventional vertical heat treatment apparatus. As shown in the figure, the processing vessel 2 has an opening (furnace port) 3 at the lower end and a flange portion 4 on the outer periphery on the lower end side, and the flange portion 4 is supported by a metal flange presser 5. A lid 8 is in contact with the open end 2a of the processing container 2 and is closed. The lid body 8 is made of metal, for example, stainless steel, and an O-ring 60 made of a heat-resistant resin is attached to the lid body 8 through an attachment groove 61 as an airtight material for sealing between the opening end 2 a of the processing container 2. Installed.

JP 2003-257958 A

  However, in the vertical heat treatment apparatus, since the inner surface (upper surface) of the metal lid 8 is exposed in the processing container 2, the inner surface of the lid 2 is corroded by the processing gas having corrosiveness. There is a problem of metal contamination to the object to be processed. Further, since the O-ring 60 is sandwiched between the opening end 2 a of the processing container 2 and the lid 8, outgas is generated from the O-ring 60 when the processing container 2 is evacuated, and the processing container 2 is filled with the O-ring 60. There is a problem of being sucked in and becoming a source of contamination of the object to be processed. Further, since the O-ring 60 is in contact with the open end 2a of the high-temperature processing container 2, the durability is likely to be lowered, and a refrigerant passage is provided in the vicinity of the O-ring 60 of the lid 8 in order to suppress the durability. 63 is provided, but if it is cooled too much, reaction by-products of the processing gas easily adhere to the inner surface of the lid 8, and the temperature control of the refrigerant (ON / OFF control of water cooling) is difficult. A heater 64 for heating the lid body 8 is attached to the outer surface (lower surface) of the lid body 8 to prevent the adhesion of reaction byproducts.

  The present invention has been made in view of the above circumstances, and provides a vertical heat treatment apparatus that can eliminate the problem of corrosion of the lid and the problem of outgas from the O-ring and can improve the durability of the O-ring. There is.

  Among the present inventions, the invention according to claim 1 is a quartz processing container having an open lower end, a lid that can be moved up and down below the processing container, and closes the opening end of the processing container, and the lid In a vertical heat treatment apparatus provided with a holder that is provided on a body and holds a plurality of objects to be processed in multiple stages, and a heating unit provided around the processing container, the lid is formed of the processing container. An inner lid portion made of quartz that comes into contact with the opening end and an outer lid portion made of metal that covers the outer surface of the inner lid portion, and the outer peripheral portion of the opening end of the processing vessel on the upper outer periphery of the inner lid portion An annular recess recessed inwardly, and a flange portion is formed on the outer peripheral lower side portion of the inner lid portion, and a flange presser that holds the flange portion of the inner lid portion in the annular recess portion on the outer lid portion And a first upper portion and a lower portion of the flange presser that are in contact with the lower surface of the open end of the processing vessel Provided a first 2O ring in contact with the flange portion and the ring, characterized in that a coolant passage for cooling the first 1O ring and the second 2O ring inside the flange retainer.

  According to a second aspect of the present invention, in the first aspect of the invention, a liquid receiving portion for receiving an aqueous solution generated during dry cleaning using hydrogen fluoride is provided on the upper surface of the inner lid portion, and the inner peripheral surface of the processing vessel Is provided with a liquid guide part for guiding the aqueous solution generated and flowing down on the inner peripheral surface of the processing container to the liquid receiving part.

  According to a third aspect of the present invention, in the second aspect of the present invention, the liquid receiving portion is a quartz liquid receiving tray placed on the upper surface of the inner lid portion.

  The invention of claim 4 is characterized in that, in the invention of claim 1, an opaque layer for preventing the first O-ring from burning out is provided on the lower surface of the opening end of the processing vessel.

  According to the present invention, the following effects can be achieved.

  According to the first aspect of the present invention, a quartz processing container having an open lower end, a lid provided so as to be movable up and down below the processing container, and closing the opening end of the processing container; and on the lid In a vertical heat treatment apparatus provided with a holder that holds a plurality of objects to be processed in multiple stages, and a heating means provided around the processing container, the lid is at the open end of the processing container. It consists of an inner lid part made of quartz that comes into contact with and an outer lid part made of metal that covers the outer surface of the inner lid part. An annular recess is formed on the outer lid of the inner lid, and a flange presser is provided on the outer lid to hold the flange of the inner lid located in the annular recess. A first O-ring in contact with the lower surface of the open end of the processing vessel at the upper and lower portions of the flange presser Since the second O-ring in contact with the flange portion is provided, and the refrigerant passage for cooling the first O-ring and the second O-ring is provided in the flange retainer, the problem of corrosion of the lid can be solved and O The problem of outgas from the ring can be solved, and the durability of the O-ring can be improved.

  According to the invention of claim 2, a liquid receiving part for receiving an aqueous solution generated during dry cleaning using hydrogen fluoride is provided on the upper surface of the inner lid part, and a treatment is provided below the inner peripheral surface of the processing container. Since the liquid guide part that guides the aqueous solution generated and flowing down to the inner peripheral surface of the container to the liquid receiving part is provided, the aqueous solution can be prevented from entering the contact surface between the inner lid part and the processing container. It is possible to prevent surface roughness of the contact surface due to intrusion and corrosion of the metal flange presser and the outer lid.

  According to the invention of claim 3, since the liquid receiving portion is made of a quartz liquid receiving tray placed on the upper surface of the inner lid portion, it is possible to prevent the inner lid portion from being corroded by the aqueous solution, The durability of the inner lid can be improved.

  According to the invention of claim 4, since the opaque layer for preventing the first O-ring from burning out is provided on the lower surface of the opening end of the processing container, the durability of the first O-ring can be improved.

  The best mode for carrying out the present invention will be described below in detail with reference to the accompanying drawings. FIG. 1 is a longitudinal sectional view of a vertical heat treatment apparatus according to an embodiment of the present invention, and FIG. 2 is an enlarged cross-sectional view of a main part of the vertical heat treatment apparatus.

  As shown in FIG. 1, a vertical heat treatment apparatus 1 includes a vertical processing container 2 that accommodates a plurality of objects to be processed, for example, semiconductor wafers w and performs a predetermined heat treatment. The processing container 2 is formed of quartz (quartz glass) having heat resistance and corrosion resistance. The processing container 2 has an upper end formed in a dome shape, specifically, a reverse funnel shape, and a lower end opened as a furnace port 3. A flange portion 4 is provided on the outer peripheral portion on the opening end 2 a side of the processing container 2, and the flange portion 4 is fixed to a base plate (not shown) via a flange presser 5. An L-shaped exhaust pipe portion 6 is provided in the center of the head of the processing container 2, and an exhaust system pipe 7 that can reduce the inside of the processing container 2 to a predetermined pressure, for example, about 110 kgf is connected to the exhaust pipe portion 6. Has been. A cylindrical heater (not shown) capable of controlling the inside of the processing container 2 to a predetermined temperature, for example, 300 to 1200 ° C., is provided around the processing container 2.

  A lid body 8 that opens and closes the furnace port (lower end opening) 3 of the processing container 2 is provided below the processing container 2 so as to be lifted and lowered by a lifting mechanism (not shown). A quartz boat (holding tool) 9 for holding a plurality of, for example, about 25 wafers w in the vertical direction at a predetermined interval is provided above the lid 8. The boat 9 has a support column 10 at the lower center portion, and the support column 10 is connected to a rotation shaft portion 12 of a rotation introducing mechanism 11 provided at the center portion of the lid body 8. A thermo plug 13 is provided at a central portion of the lid 8 as a heat insulating means for suppressing heat radiation from the furnace port 3 so as not to interfere with the support column 10. The thermo plug 13 is provided with a plurality of leg posts 14 erected on the lid body 8, and a lower heater 15 and a leg post 14 made of a planar heating element provided substantially horizontally at the upper end of the leg posts 14. It is mainly composed of a plurality of heat shield plates 16 arranged at predetermined intervals in the height direction.

  The lid 8 includes a quartz inner lid 17 that is in contact with the open end 2 a of the processing container 2 and a metal outer lid 18 that covers the outer surface of the inner lid 17. An upper end outer peripheral portion of the inner lid portion 17 is formed inside an outer peripheral portion of the opening end 2 a of the processing container 2. A boss portion 19 that passes through the rotating shaft portion 12 is formed downward in the center portion of the inner lid portion 17. An annular abutment surface 20 that abuts against the opening end 2 a of the processing container 2 is formed on the lower end portion of the boss portion 19 and the peripheral edge portion of the inner lid portion 17 so as to protrude upward. Further, a flange portion 21 is formed on the outer peripheral lower side of the inner lid portion 17.

  A rotation introducing mechanism 11 for rotating the boat 9 is provided at the center of the outer lid portion 18. The rotation introducing mechanism 11 has a flange portion 22 fixed to the lower surface of the outer lid portion 17 and a rotating shaft portion 12 protruding upward from the center of the flange portion 22. An opening 23 is formed at the center of the outer lid 18, and a flange 22 of the rotation introducing mechanism 11 is connected to the lower surface of the outer lid 18 so as to cover the opening 23. An O-ring 24 is provided between the lower end portion of the boss portion 19 of the inner lid portion 17 and the flange portion 22 of the rotation introducing mechanism 11 to seal between these.

  As shown in FIG. 2, an annular rising portion 25 is formed at the peripheral portion of the outer lid portion 18, and the flange portion 21 of the inner lid portion 17 is interposed on the upper surface of the rising portion 25 via a heat-resistant resin sheet 26. It is placed. An annular flange retainer 27 for fixing the flange portion 21 of the inner lid portion 17 is detachably attached to the rising portion 25 with a screw 28.

Between the inner lid portion 17 and the outer lid portion 18, a planar heater 32 for heating the inner lid portion 17 is provided in a non-contact manner with the inner lid portion 17. An annular hollow chamber 33 is formed between the inner lid portion 17 and the outer lid portion 18, and the heater 32 is supported in the hollow chamber 33 while being supported on the upper surface of the outer lid portion 18. A refrigerant passage 34 is provided in a portion of the outer lid portion 18 corresponding to the heater 32. The heater 32 is formed by sandwiching a resistance heating wire from above and below by two mica plates and further sandwiching the resistance heating wire from above and below by two stainless plates. Since the heater 32 is not in contact with the inner lid portion 17, the inner lid portion 17 is heated from the back surface by radiation heating rather than heat transfer heating. In order to increase the radiation efficiency, the radiation surface of the heater 32 is coated with a black or dark surface treatment such as titanium oxide (TiO ₂ ).

  On the other hand, the flange retainer 5 of the processing container 2 is placed on the lower ring 35, which is in contact with the lower surface of the flange part 4 of the processing container 2 and supports the processing container 2, and the flange part 4, an intermediate ring 36 that surrounds the outer periphery of the ring 4, an upper ring 37 that is disposed on the intermediate ring 36 and presses the upper surface of the flange portion 4, and the upper ring 37 is fixed to the lower ring 35 via the intermediate ring 36. It consists of screws. The upper ring 37 is divided into a plurality of parts. Between the lower ring 35 and the flange portion 4 and between the upper ring 37 and the flange portion 4, heat resistant resin sheets (not shown) are respectively interposed. In FIG. 1, reference numeral 42 denotes a processing gas introduction port provided in the flange portion 4 of the processing container 2.

  An annular recess 50 that is recessed inwardly from the outer peripheral portion of the opening end of the processing container 2 is formed on the outer peripheral upper portion (upper peripheral upper half) of the inner lid portion 17, and the outer peripheral lower side portion (lower peripheral lower half) of the inner lid portion 17. The flange portion 21 is formed. The outer lid portion 18 is provided with the flange retainer 27 that is positioned in the annular recess 50 and holds the flange portion 21 of the inner lid portion 17. A first O-ring 51 in contact with the lower surface of the opening end and a second O-ring 52 in contact with the upper surface of the flange portion 21 are provided. A refrigerant passage (for example, a cooling water passage) 31 for cooling the first O-ring 51 and the second O-ring 52 is provided inside the flange retainer 27.

  The flange retainer 27 has a substantially inverted L-shaped cross section (having a vertical portion and a horizontal portion) and is formed in an annular shape (ring shape) so as to cover (enclose) the flange portion 21. The flange retainer 27 is detachably attached and fixed to the outer lid 18 with the screw 28 while holding the flange portion 21 of the inner lid portion 17. A first holding groove 53 for holding the first O-ring 51 and a second holding groove 54 for holding the second O-ring 52 are respectively formed in an annular shape at the upper and lower portions of the horizontal portion of the flange retainer 27. The refrigerant passage 31 is disposed between the first holding groove 53 and the second holding groove 54 so as to effectively cool the first O-ring 51 and the second O-ring 52. According to the vertical heat treatment apparatus of the present embodiment, the problem of corrosion of the lid 8 can be solved, the problem of outgas from the O-rings 51 and 52 can be solved, and the O-rings 51 and 52 can be solved. Can be used without burning up to a furnace temperature of 1000 ° C.

  FIG. 3 is an enlarged sectional view of a main part showing a modification of the vertical heat treatment apparatus. Although there is no problem with the heat resistance of the O-ring during the heat treatment under reduced pressure, the upper surface temperature of the O-ring becomes the heat-resistant temperature of the O-ring (300 ° C) due to the increase of heat transfer material when the inside of the processing vessel is returned from the reduced pressure state to the normal pressure In order to prevent the O-ring from burning out or deteriorating due to this temperature increase, the flange portion 4 of the processing vessel 2 is made opaque so that heat or light from the heater is difficult to pass through. It is desirable to do. In FIG. 7, in order to prevent burning or deterioration of the first O-ring 51 in contact with the inner side of the lower surface of the flange portion, an opaque layer (an opaque quartz layer) is formed on the inner surface from the substantially central portion in the width direction on the lower surface of the flange portion 4. ) 55 is shown.

  The opaque layer 55 includes a low density (large bubbles and low specific gravity) first opaque layer 55a effective against heat conduction, and a high density (small bubbles and high specific gravity) which is effective against heat radiation. More preferably, the second opaque layer 55b is laminated. The first opaque layer 55a is annularly attached to the lower surface of the flange portion 4 by thermal welding, and the second opaque layer 55b is annularly attached to the lower surface of the first opaque layer 55a by thermal welding. The thicknesses of the first opaque layer 55a and the second opaque layer 55b are about 4 to 10 mm, respectively. In order to prevent the opaque layer 55 from being exposed to the outside, the opaque layer 55 is preferably covered with a transparent quartz layer 56. The transparent quartz layer 56 has a thickness of about 1 to 2 mm. This transparent quartz layer 56 can prevent the opaque layer 55 from being eroded during the room temperature HF cleaning described later. The first opaque layer 55a and the second opaque layer 55b may be upside down. The opaque layer 55 may consist of only the first opaque layer or only the second opaque layer.

  FIG. 4 is an enlarged cross-sectional view of a main part showing a modification of the vertical heat treatment apparatus. In this modification, the same parts as those of the modification of FIG. When the dry cleaning after the silicon nitride (SiN) film forming process is repeated about five times, the surface roughness of the inner wall of the processing vessel advances, and the SiN process gas is eroded into the rough surface portion, and the original deposition on the wafer is performed. There is a problem that decreases. In order to solve this problem, a dry cleaning method is proposed in which the inner wall of the processing vessel is shaved including the rough surface portion by room temperature HF cleaning using hydrogen fluoride (HF) (process of 400 Torr, 60 ° C. or less). Has been. However, in this room temperature HF cleaning, an acidic aqueous solution (hydrofluoric acid) is generated, and when this aqueous solution enters the contact surface between the inner lid and the processing container, the contact surface may be roughened or a metal flange may be formed. There is a risk of corroding the presser foot and the outer lid.

  Therefore, in order to solve this problem, a liquid receiving portion 60 for receiving an aqueous solution generated during normal temperature HF cleaning using hydrogen fluoride (HF) is provided on the upper surface of the inner lid portion, and the inner peripheral surface of the processing container A bowl-shaped liquid guide part 70 is provided below that guides the aqueous solution generated and flowing down on the inner peripheral surface of the processing container 2 to the liquid receiving part 60. The liquid guide portion 70 is made of the same quartz as the processing container 2, is formed in an annular shape along the inner peripheral surface (circumferential direction) of the processing container 2, and has a bowl shape that is inclined downward toward the center direction. The aqueous solution is prevented from flowing toward the contact surface 80 side of the inner lid portion 17 and the processing container 2. The base end portion (outer edge portion) of the liquid guide portion 70 is integrally fixed to the inner peripheral surface of the processing container 2, and the aqueous solution rebounds at the tip end portion (inner edge portion) of the liquid guide portion 70 inclined inward. In order to hang down on the liquid receiving part 60, it is preferable that a drooping portion 71 is formed that hangs downward facing the liquid receiving part 60.

  The liquid receiver 60 may be directly formed on the upper surface of the inner lid 17, but is provided separately as a quartz liquid receiver 61 placed on the upper surface of the inner lid 17 as shown in the figure. It is preferable that The liquid receiving tray 61 as the liquid receiving portion 60 is formed in an annular shape so as to cover the upper surface of the inner lid portion 17, and an inner peripheral edge portion 62 and an outer peripheral edge portion 63 are formed on the inner peripheral portion and the outer peripheral portion thereof. ing.

  According to the vertical heat treatment apparatus 1, the same effect as that of the modified example of FIG. 3 can be obtained, and the upper surface of the inner lid portion 17 receives an aqueous solution generated during dry cleaning using hydrogen fluoride. A liquid receiver 60 is provided, and a liquid guide 70 is provided below the inner peripheral surface of the processing container 2 to guide the aqueous solution generated and flowing down on the inner peripheral surface of the processing container 2 to the liquid receiver 60. Therefore, the aqueous solution can be prevented from entering the contact surface 80 of the inner lid portion 17 and the processing container 2, the surface of the contact surface 80 is roughened by the penetration of the aqueous solution, and the metal flange retainer 27 and the outer lid portion 18 are corroded. Can be prevented. Further, since the liquid receiving part 60 is composed of the quartz liquid receiving tray 61 placed on the upper surface of the inner lid part 17, the inner lid part 17 can be prevented from being corroded by the aqueous solution. The durability of 17 can be improved.

  FIG. 5 is an enlarged cross-sectional view of a main part showing a modification of the vertical heat treatment apparatus of FIG. A quartz table plate 58 that covers the open end of the shaft hole 57 of the inner lid portion 17 is provided at the upper end portion of the rotary shaft portion 12 of the rotation introducing mechanism 11. In order to prevent the aqueous solution at the room temperature HF cleaning from entering the shaft hole 57 through the minute gap formed in the shaft and corroding the components of the rotation introducing mechanism 11 and the like, An annular groove 65a extending in the circumferential direction is provided on the opposing surface of at least one (table plate in the illustrated example). The rotating shaft portion 12 includes, for example, an Inconel upper hub 12a and a lower hub 12b, and the lower hub 12b is fitted and fixed to the rotating shaft 12c of the rotation introducing mechanism 11. The upper hub 12a is attached to the lower hub 12b through a plurality of (for example, three) height adjusting screws 66 and fastening screws 67 so that the height can be adjusted.

  A lower flange portion 10a of the column 10 of the boat 9 is mounted on the upper portion of the upper hub 12a via a disk-shaped table plate 58. The lower flange portion 10a is positioned on the upper portion of the upper hub 12a with a positioning pin 68 and a fastening screw. The positioning is fixed via 69. A minute gap (about 0.25 mm) is provided between the lower surface of the table plate 58 and the upper surface of the inner lid portion 17 so that the table plate 58 can rotate without contact with the inner lid portion 17. . The groove 65a is provided in order to form a space in the middle of a minute gap so as to cut off the capillary phenomenon, thereby preventing the aqueous solution from entering due to the capillary phenomenon.

  An annular groove 65b is provided on the opposing surface of at least one of the table plate 58 and the upper hub 12a (table plate in the illustrated example) in order to prevent the aqueous solution from entering from the gap between the opposing surfaces. It is preferable. Further, the opposing surface of at least one of the table plate 58 and the lower flange portion 10a of the column 10 of the boat 9 (the table plate in the illustrated example) is annular in order to prevent the aqueous solution from entering from the gap between the opposing surfaces. The groove portion 65c is preferably provided. The grooves 65a, 65b, 65c have a depth of about 1 mm and a width of about 2 mm. In order to prevent the processing gas and the cleaning gas from entering the shaft hole 57, an inert gas such as nitrogen gas is supplied into the shaft hole 57.

  Although the embodiments and examples of the present invention have been described in detail with reference to the drawings, the present invention is not limited to the above-described embodiments and examples, and various design changes can be made without departing from the gist of the present invention. Etc. are possible.

It is a schematic longitudinal cross-sectional view of the vertical heat processing apparatus which is embodiment of this invention. It is a principal part expanded sectional view of FIG. It is a principal part expanded sectional view which shows the modification of the same vertical heat processing apparatus. It is a principal part expanded sectional view which shows the modification of the same vertical heat processing apparatus. It is a principal part expanded sectional view which shows the modification of the same vertical heat processing apparatus. It is a principal part expanded sectional view of the conventional vertical heat processing apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Vertical heat processing apparatus 2 Processing container 2a Open end 8 Lid body 9 Boat (holding tool)
DESCRIPTION OF SYMBOLS 17 Inner cover part 18 Outer cover part 21 Flange part 27 Flange clamp 31 Refrigerant passage 32 Planar heater 45 O-ring 46 Exhaust passage 47 Exhaust hole 50 Annular recessed part 51 1st O-ring 52 2nd O-ring 60 Liquid receiving part 61 Liquid receiving tray 70 Liquid guide

Claims (4)

  A quartz processing container having an open lower end, a lid that can be moved up and down below the processing container, closes the opening end of the processing container, and a plurality of objects to be processed that are provided on the lid. In a vertical heat treatment apparatus having a holder for holding at a predetermined interval and a heating means provided around the processing container, the lid is made of quartz that comes into contact with the open end of the processing container. An inner lid portion and a metal outer lid portion that covers the outer surface of the inner lid portion, and an annular recess that is recessed inwardly from the outer peripheral portion of the opening end of the processing container on the outer peripheral upper portion of the inner lid portion, In addition, a flange portion is formed on the outer peripheral lower side portion of the inner lid portion, and flange pressers are provided on the outer lid portion to hold the flange portion of the inner lid portion located in the annular recess, and upper and lower portions of the flange presser The first O-ring that contacts the lower surface of the open end of the processing vessel and the flange portion To a second 2O ring provided, the vertical heat treatment apparatus characterized in that a coolant passage for cooling the first 1O ring and the second 2O ring inside the flange retainer.   A liquid receiving portion for receiving an aqueous solution generated during dry cleaning using hydrogen fluoride is provided on the upper surface of the inner lid portion, and is generated on the inner peripheral surface of the processing container below the inner peripheral surface of the processing container. The vertical heat treatment apparatus according to claim 1, further comprising a liquid guide section that guides the flowing aqueous solution to the liquid receiving section.   The vertical heat treatment apparatus according to claim 2, wherein the liquid receiver is a quartz liquid receiver placed on the upper surface of the inner lid.   2. The vertical heat treatment apparatus according to claim 1, wherein an opaque layer for preventing burning of the first O-ring is provided on a lower surface of the opening end of the processing container.

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