JP2008194781A - Centrifugal type abrasive grain projection device - Google Patents
Centrifugal type abrasive grain projection device Download PDFInfo
- Publication number
- JP2008194781A JP2008194781A JP2007032798A JP2007032798A JP2008194781A JP 2008194781 A JP2008194781 A JP 2008194781A JP 2007032798 A JP2007032798 A JP 2007032798A JP 2007032798 A JP2007032798 A JP 2007032798A JP 2008194781 A JP2008194781 A JP 2008194781A
- Authority
- JP
- Japan
- Prior art keywords
- liner
- abrasive grain
- projection device
- centrifugal
- ceiling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000006061 abrasive grain Substances 0.000 title claims abstract description 49
- 238000005192 partition Methods 0.000 claims description 11
- 238000000638 solvent extraction Methods 0.000 claims 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000009191 jumping Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Abstract
Description
本発明は、遠心力を利用して砥粒を投射する遠心式砥粒投射装置に関する。 The present invention relates to a centrifugal abrasive grain projection device that projects abrasive grains using centrifugal force.
従来、この種の装置の一つとして、インペラと、インペラを囲むインペラカバーと、このインペラカバー内に取り付けられるライナとで構成され、前記インペラカバーは、左右の第1・第2側面カバーと、前・後面カバーと、開閉可能な天井蓋とにより構成され、前記ライナは、前記インペラカバーにネジにより着脱可能にされると共に前記インペラの回転軸及びインペラ側板を貫通可能に穿った貫通穴を有する第1・第2側面ライナと、これら第1・第2側面ライナの端面に押圧固定されると共に断面U字形に形成された前・ハブ側面ライナと、前記第1・第2側面ライナ及び前記前・ハブ側面ライナの上端部に着脱可能に嵌合載置された組付け枠ライナと、この組付け枠ライナに着脱可能に載置された天井側面ライナとにより構成され、前記天井側面ライナと前記第1・第2側面ライナとの合わせ面に、投射材の投射方向に対して4点以上の屈曲点のあるラビリンス構造を設け、前記天井側面ライナが、前記インペラカバーに取り付けられた固定手段により押圧固定可能にされたものがある。
しかし、このように構成された従来の遠心式砥粒投射装置は、一般に、1個のインペラが1個のライナ付きインペラカバーによって包囲される構造になっている。そのため、複数の遠心式砥粒投射装置を砥粒の投射方向へ並べて、例えば鋼板のような広い被処理面を有する製品を処理する場合、これら複数の遠心式砥粒投射装置を設置するための広い面積や空間が必要となり、これに伴って、複数の遠心式砥粒投射装置を設置したショットブラスト設備は大型の高価なものになるなどの問題があった。 However, the conventional centrifugal abrasive grain projection device configured as described above generally has a structure in which one impeller is surrounded by one impeller cover with a liner. Therefore, when a plurality of centrifugal abrasive projection devices are arranged in the projection direction of the abrasive grains and a product having a wide surface to be processed such as a steel plate is processed, for example, these centrifugal abrasive projection devices are installed. A large area and space are required, and along with this, there has been a problem that the shot blasting equipment provided with a plurality of centrifugal abrasive projection devices becomes large and expensive.
本発明は上記の事情に鑑みてなされたもので、その目的は、2個以上のインペラを並べて使用する場合、全体的に小型化することが可能なライナ機構を備えた遠心式砥粒投射装置を提供することにある。 The present invention has been made in view of the above circumstances, and its object is to provide a centrifugal abrasive grain projection apparatus having a liner mechanism that can be reduced in size when two or more impellers are used side by side. Is to provide.
上記の目的を達成するために発明における遠心式砥粒投射装置は、遠心力を利用して砥粒を投射する遠心式砥粒投射装置であって、所要の間隔をおき並べて配設した2個以上のインペラと、これら2個以上のインペラを囲むライナ機構とを備え、このライナ機構は、
その側部あるいはその端部で相互に着脱可能な複数の板状のライナによって構成された箱状を成し、かつ、前記インペラ取付け用ハブの貫通孔、砥粒の投射口および前記インペラへの砥粒の供給口を、有することを特徴とする。
In order to achieve the above object, the centrifugal abrasive grain projecting apparatus in the invention is a centrifugal abrasive grain projecting apparatus that projects abrasive grains by utilizing centrifugal force, and is arranged in a line with a predetermined interval. The above impeller and a liner mechanism that surrounds the two or more impellers are provided.
Formed in a box formed by a plurality of plate-like liners that can be attached to and detached from each other at the side or at the end thereof, and the through-hole of the hub for mounting the impeller, the projection port for abrasive grains, and the impeller It has the supply port of an abrasive grain, It is characterized by the above-mentioned.
なお、本発明における2個以上の前記インペラは、水平方向、垂直方向またはこれら2方向のうちいずれかに対して傾斜する方向であって、砥粒の投射方向に沿って一直線状または段違い状にして、所要の間隔をおき並べて配設される。
またなお、本発明におけるライナ機構は、2個以上のインペラを収納した空間に、インペラ毎に仕切る仕切りライナを設けてもよい。
Note that the two or more impellers in the present invention are a horizontal direction, a vertical direction, or a direction inclined with respect to one of these two directions, and are linear or stepped along the projection direction of the abrasive grains. Thus, they are arranged side by side with a required interval.
In addition, the liner mechanism according to the present invention may be provided with a partition liner that partitions each impeller in a space that houses two or more impellers.
またなお、本発明におけるライナ機構は、前記インペラと同じ個数の天井ライナ群と、この天井ライナ群の各天井ライナの供給口側に垂設した供給口側ライナと、前記天井ライナ群の各天井ライナのハブ側に垂設したハブ側ライナと、前記天井ライナ群、前記供給口側ライナ群および前記ハブ側ライナ群の両端部にそれぞれ取り付けた2個の側面ライナと、を含む構造にしてもよい。 The liner mechanism according to the present invention includes the same number of ceiling liner groups as the impellers, supply port side liners suspended from the supply port side of each ceiling liner of the ceiling liner group, and each ceiling of the ceiling liner group. A structure including a hub side liner suspended from the hub side of the liner, and two side liners respectively attached to both ends of the ceiling liner group, the supply port side liner group, and the hub side liner group. Good.
またなお、本発明におけるライナ機構は、前記ライナ同士が接合する部分に、相互に嵌合可能な断面凹部および断面凸部、または、相互に係合可能な段付き部を形成して相互に着脱可能にするとともに、投射された砥粒が外部に飛び出るのを防止できるようにすることが望ましい。 In addition, the liner mechanism according to the present invention forms a recess and a cross-section that can be fitted to each other at a portion where the liners are joined to each other, or a stepped portion that can be engaged with each other. It is desirable to make it possible to prevent the projected abrasive grains from jumping out.
またなお、本発明におけるライナ機構の仕切りライナは、天井片と、天井片の供給口側に垂設した供給口側片と、天井片のハブ側に垂設したハブ側片と、供給口側片またはハブ側片に一体的に設けた仕切り片とで構成してもよい。
またなお、本発明におけるライナ機構の供給口側ライナおよびハブ側ライナは、その中心線に基づき2個以上に分割可能な構造にして組付けや製作を容易にしてもよい。
またなお、本発明において、2個以上の前記インペラのうち対を成す2個インペラは、砥粒を相互に向き合う方向へ投射するように内側へ回転するのが望ましい。
In addition, the partition liner of the liner mechanism according to the present invention includes a ceiling piece, a supply port side piece suspended from the supply port side of the ceiling piece, a hub side piece suspended from the hub side of the ceiling piece, and a supply port side You may comprise by the partition piece integrally provided in the piece or the hub side piece.
In addition, the supply port side liner and the hub side liner of the liner mechanism according to the present invention may be divided into two or more based on the center line to facilitate assembly and manufacture.
In addition, in the present invention, it is preferable that two of the two or more impellers that make a pair rotate inward so as to project the abrasive grains in a direction facing each other.
上記の説明から明らかなように本発明は、遠心力を利用して砥粒を投射する遠心式砥粒投射装置であって、所要の間隔をおき並べて配設した2個以上のインペラと、これら2個以上のインペラを囲むライナ機構とを備え、このライナ機構は、その側部あるいはその端部で相互に着脱可能な複数の板状のライナによって構成された箱状を成し、かつ、前記インペラ取付け用ハブの貫通孔、砥粒の投射口および前記インペラへの砥粒の供給口を、有するから、2個以上のインペラを並べて使用する場合、遠心式砥粒投射装置を全体的に小型化することが可能になるなどの優れた実用的効果を奏する。 As is clear from the above description, the present invention is a centrifugal abrasive grain projection device for projecting abrasive grains by utilizing centrifugal force, two or more impellers arranged side by side at a predetermined interval, and these A liner mechanism that encloses two or more impellers, and the liner mechanism has a box shape constituted by a plurality of plate-like liners that can be attached to and detached from each other at the side portion or the end portion thereof, and Since it has a through hole in the hub for mounting the impeller, an abrasive projection port, and an abrasive supply port to the impeller, when using two or more impellers side by side, the centrifugal abrasive projection device is entirely small Excellent practical effects such as being able to be realized.
本発明を適用した遠心式砥粒投射装置の一実施例について図1〜図4に基づき詳細に説明する。本遠心式砥粒投射装置は、図1に示すように、所要の間隔をおき左右に並べて配設された2個のインペラ1・1と、これら2個のインペラ1・1を囲むライナ機構2と、このライナ機構2を囲むインペラカバー3と、で構成してある。そして、前記ライナ機構2は前記インペラカバー3の内面に、インペラカバー3の側板を貫通するボルト(図示せず)を介して着脱可能に取り付けてある。また、前記インペラ1は、図2に示すように、ハブ4に取り付けてあり、ハブ4は回転可能に支持された左右方向へ指向する回転軸5の左部に嵌着してある。 An embodiment of a centrifugal abrasive grain projection device to which the present invention is applied will be described in detail with reference to FIGS. As shown in FIG. 1, the centrifugal abrasive grain projecting apparatus includes two impellers 1, 1 arranged at a predetermined interval and arranged on the left and right sides, and a liner mechanism 2 that surrounds the two impellers 1, 1. And an impeller cover 3 surrounding the liner mechanism 2. The liner mechanism 2 is detachably attached to the inner surface of the impeller cover 3 via bolts (not shown) that penetrate the side plates of the impeller cover 3. Further, as shown in FIG. 2, the impeller 1 is attached to a hub 4, and the hub 4 is fitted to the left part of a rotating shaft 5 that is rotatably supported and directed in the left-right direction.
さらに、前記ライナ機構2は、図3および図4に示すように、前記インペラ1と同じ個数の2個の天井ライナ6・6群と、2個の天井ライナ6・6群の各天井ライナ6の供給口側に垂設した供給口側ライナ7と、2個の前記天井ライナ6・6群の各天井ライナ6のハブ側に垂設したハブ側ライナ8と、前記天井ライナ6・6群、前記供給口側ライナ7・7群および前記ハブ側ライナ8・8群の両端部にそれぞれ取り付けた2個の側面ライナ9・9と、前記天井ライナ6・6群、前記供給口側ライナ7・7群および前記ハブ側ライナ8・8群のそれぞれの間に設けた仕切りライナ19とで構成してある。そして、前記ライナ機構2には、インペラ取付け用ハブの貫通孔10、砥粒の投射口11および前記インペラ1への砥粒の供給口12が設けてある。 Further, as shown in FIGS. 3 and 4, the liner mechanism 2 includes two ceiling liners 6 and 6 as many as the impeller 1, and each ceiling liner 6 of the two ceiling liners 6 and 6. A supply port side liner 7 suspended from the supply port side, a hub side liner 8 suspended from the hub side of each ceiling liner 6 of the two ceiling liners 6 and 6, and the ceiling liners 6 and 6 group. , Two side liners 9 and 9 attached to both ends of the supply port side liners 7 and 7 group and the hub side liners 8 and 8 group, the ceiling liners 6 and 6 group, and the supply port side liner 7, respectively. -It is comprised with the partition liner 19 provided between 7 groups and each of the said hub side liners 8 and 8 groups. The liner mechanism 2 is provided with a through hole 10 of an impeller mounting hub, an abrasive projection port 11 and an abrasive supply port 12 to the impeller 1.
また、前記供給口側ライナ7および前記ハブ側ライナ8は、中心線を基にしてそれぞれ上下および左右の4個に分割可能に構成してある。
また、前記仕切りライナ19は、天井片20と、この天井片20の供給口側に垂設した供給口側片21と、前記天井片20のハブ側に垂設したハブ側片22と、ハブ側片22に一体的に設けた仕切り片23とで構成してある。そして、隣合う2個の前記インペラ1・1において一方のインペラ1が、他方のインペラ1から投射される砥粒を受けるのを避けるため、前記仕切り片23の下端が、図1に示すように、2個のインペラ1・1が回転した時に描く2個の回転円C・Cの下端部間を結ぶ接線Lより下方に位置するか、この接線L上に位置するようになっている。
また、前記各種のライナ6・7・8・9同士は、図4に示すように、相互に接合する接合部分が、相互に嵌合可能な断面凹部13および断面凸部14と、相互に係合可能な段付き部15に形成してある。
Further, the supply port side liner 7 and the hub side liner 8 are configured to be divided into four parts, upper and lower and left and right, respectively, based on the center line.
The partition liner 19 includes a ceiling piece 20, a supply port side piece 21 suspended from the ceiling piece 20, a hub side piece 22 suspended from the ceiling piece 20, and a hub. The partition piece 23 is provided integrally with the side piece 22. And in order to avoid one impeller 1 receiving the abrasive grain projected from the other impeller 1 in the two adjacent impellers 1 and 1, the lower end of the partition piece 23 is as shown in FIG. It is positioned below or on the tangent line L connecting the lower ends of the two rotation circles C and C drawn when the two impellers 1 and 1 rotate.
Further, as shown in FIG. 4, the various liners 6, 7, 8, and 9 are connected to each other at the joint portions to be joined with the cross-sectional concave portion 13 and the cross-sectional convex portion 14 that can be fitted to each other. It is formed in a stepped portion 15 that can be mated.
なお、図2において、符号16は前記インペラカバー3に装着されて砥粒を前記インペラ1の中心部に導入する導入筒、17は前記回転軸5に装着されて砥粒を飛散させる羽根車、18は前記インペラカバー3に装着されて砥粒の前記インペラ1への流量を制御するコントロールゲージである。 In FIG. 2, reference numeral 16 denotes an introduction cylinder that is attached to the impeller cover 3 and introduces abrasive grains to the central portion of the impeller 1, and 17 is an impeller that is attached to the rotary shaft 5 and scatters the abrasive grains. Reference numeral 18 denotes a control gauge which is attached to the impeller cover 3 and controls the flow rate of abrasive grains to the impeller 1.
このように構成したものは、2個のインペラ1・1をそれぞれ矢印方向へ回転させた状態の下に、各導入筒16から各羽根車17に砥粒を供給すると、砥粒は、羽根車17によって飛散されたのち、コントロールゲージ18によって流量を制御されながら、回転する2個のインペラ1・1によって投射口11から投射されることとなる。 When the abrasive grains are supplied from the respective introduction cylinders 16 to the respective impellers 17 with the two impellers 1 and 1 rotated in the direction of the arrows, the abrasive grains are impellers. After being scattered by 17, while being controlled by the control gauge 18, it is projected from the projection port 11 by the two rotating impellers 1 and 1.
なお、上述の実施例では前記インペラ1・1は左右に並べて設けてあるが、上述の実施例を垂直面内で90度回転した状態である、前記インペラ1・1が上下に並ぶとともに前記ライナ機構2が上下方向へ延びる構造、あるいは前記インペラ1・1が水平方向または垂直方向のいずれかに対して傾斜する方向に並ぶとともに前記ライナ機構2もその傾斜する方向へ延びる構造にしてもよい。 In the above-described embodiment, the impellers 1 and 1 are provided side by side. However, the impellers 1 and 1 are arranged in the vertical direction and the liner is in a state in which the above-described embodiment is rotated 90 degrees in a vertical plane. The mechanism 2 may extend in the vertical direction, or the impellers 1 and 1 may be arranged in a direction inclined with respect to either the horizontal direction or the vertical direction, and the liner mechanism 2 may extend in the inclined direction.
またなお、上述の実施例では前記ライナ機構2は、前記インペラカバー3の内面に着脱可能に取り付けてあるが、これに限定されるものではなく、例えば、研掃室を構成するキャビネット内に直接的に着脱可能に取り付けるようにしてもよい。 In the above-described embodiment, the liner mechanism 2 is detachably attached to the inner surface of the impeller cover 3. However, the present invention is not limited to this. For example, the liner mechanism 2 is directly installed in the cabinet constituting the polishing chamber. Alternatively, it may be detachably attached.
2 ライナ機構
6 天井ライナ
7 供給口側ライナ
8 ハブ側ライナ
9 側面ライナ
10 インペラの回転軸用貫通孔
11 砥粒の砥粒投射口
12 砥粒の砥粒供給口
2 Liner Mechanism 6 Ceiling Liner 7 Supply Port Side Liner 8 Hub Side Liner 9 Side Liner 10 Impeller Rotating Shaft Through-hole 11 Abrasive Grain Abrasive Projection Port 12 Abrasive Grain Supply Port
Claims (8)
所要の間隔をおき並べて配設した2個以上のインペラと、
これら2個以上のインペラを囲むライナ機構とを備え、
このライナ機構は、
その側部あるいはその端部で相互に着脱可能な複数の板状のライナによって構成された箱状を成し、かつ、前記インペラ取付け用ハブの貫通孔、砥粒の投射口および前記インペラへの砥粒の供給口を、有することを特徴とする遠心式砥粒投射装置。 A centrifugal abrasive grain projection device for projecting abrasive grains using centrifugal force,
Two or more impellers arranged side by side at the required intervals;
A liner mechanism surrounding these two or more impellers,
This liner mechanism
Formed in a box shape composed of a plurality of plate-like liners that can be attached to and detached from each other at the side portion or the end portion thereof, and to the through-hole of the hub for mounting the impeller, the abrasive projection port, and the impeller A centrifugal abrasive grain projection device comprising an abrasive grain supply port.
前記ライナ機構は、2個以上の前記インペラを収納した空間に、インペラ毎に仕切る板状の仕切りライナを設けたことを特徴とする遠心式砥粒投射装置。 In the centrifugal abrasive grain projection device according to claim 1,
The centrifugal abrasive grain projection device according to claim 1, wherein the liner mechanism is provided with a plate-like partition liner for partitioning each impeller in a space in which two or more impellers are stored.
前記ライナ機構は、前記インペラと同じ個数の天井ライナ群と、この天井ライナ群の各天井ライナの供給口側に垂設した供給口側ライナと、前記天井ライナ群の各天井ライナのハブ側に垂設したハブ側ライナと、前記天井ライナ群、前記供給口側ライナ群および前記ハブ側ライナ群の両端部にそれぞれ取り付けた2個の側面ライナとを含むことを特徴とする遠心式砥粒投射装置。 In the centrifugal abrasive grain projection device according to claim 1 or 2,
The liner mechanism has the same number of ceiling liner groups as the impellers, a supply port side liner suspended from the supply port side of each ceiling liner of the ceiling liner group, and a hub side of each ceiling liner of the ceiling liner group. Centrifugal abrasive grain projection comprising: a suspended hub side liner; and two side liners respectively attached to both ends of the ceiling liner group, the supply port side liner group, and the hub side liner group apparatus.
前記ライナ機構は、前記ライナ同士が接合する部分に、相互に嵌合可能な断面凹部および断面凸部、または、相互に係合可能な段付き部を形成したことを特徴とする遠心式砥粒投射装置。 In the centrifugal abrasive grain projection device according to any one of claims 1 to 3,
The liner mechanism is characterized in that a cross-sectional recess and a cross-sectional protrusion that can be fitted to each other, or a stepped portion that can be engaged with each other is formed at a portion where the liners are joined to each other. Projection device.
前記ライナ機構をインペラカバーによって包囲したことを特徴とする遠心式砥粒投射装置。 In the centrifugal abrasive grain projection device according to any one of claims 1 to 4,
A centrifugal abrasive grain projection device characterized in that the liner mechanism is surrounded by an impeller cover.
前記仕切りライナは、天井片と、この天井片の供給口側に垂設した供給口側片と、前記天井片のハブ側に垂設したハブ側片と、前記供給口側片または前記ハブ側片に一体的に設けた仕切り片とで構成したことを特徴とする遠心式砥粒投射装置。 In the centrifugal abrasive grain projection device according to any one of claims 2 to 5,
The partition liner includes a ceiling piece, a supply port side piece suspended from a supply port side of the ceiling piece, a hub side piece suspended from a hub side of the ceiling piece, and the supply port side piece or the hub side. A centrifugal abrasive grain projection apparatus comprising a partition piece provided integrally with a piece.
前記供給口側ライナおよび前記ハブ側ライナをその中心線を基にして2個以上に分割可能としたことを特徴とする遠心式砥粒投射装置。 In the centrifugal abrasive grain projection device according to any one of claims 3 to 6,
The centrifugal abrasive grain projection device characterized in that the supply port side liner and the hub side liner can be divided into two or more based on the center line.
2個以上の前記インペラのうち対を成す2個インペラは、砥粒を相互に向き合う方向へ投射するように内側方向へ回転することを特徴とする遠心式砥粒投射装置。 In the centrifugal abrasive grain projection device according to any one of claims 1 to 7,
A centrifugal abrasive grain projection device characterized in that two impellers forming a pair among the two or more impellers rotate inward so as to project abrasive grains toward each other.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007032798A JP4877601B2 (en) | 2007-02-14 | 2007-02-14 | Centrifugal abrasive grain projection device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007032798A JP4877601B2 (en) | 2007-02-14 | 2007-02-14 | Centrifugal abrasive grain projection device |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008194781A true JP2008194781A (en) | 2008-08-28 |
JP4877601B2 JP4877601B2 (en) | 2012-02-15 |
Family
ID=39754202
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007032798A Active JP4877601B2 (en) | 2007-02-14 | 2007-02-14 | Centrifugal abrasive grain projection device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4877601B2 (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5657756A (en) * | 1979-10-15 | 1981-05-20 | Sumitomo Chem Co Ltd | Preparation of more highly active carboxylic ester |
JPS57117118A (en) * | 1981-01-12 | 1982-07-21 | Fujitsu Ltd | Thin film magnetic head |
JPH05123969A (en) * | 1991-11-01 | 1993-05-21 | Kashiwabara Token Kogyo Kk | Floor surface polishing-cleaning method |
JP2004358626A (en) * | 2003-06-05 | 2004-12-24 | Naoyuki Tomioka | Device and method for separating and removing deposit on floor surface |
-
2007
- 2007-02-14 JP JP2007032798A patent/JP4877601B2/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5657756A (en) * | 1979-10-15 | 1981-05-20 | Sumitomo Chem Co Ltd | Preparation of more highly active carboxylic ester |
JPS57117118A (en) * | 1981-01-12 | 1982-07-21 | Fujitsu Ltd | Thin film magnetic head |
JPH05123969A (en) * | 1991-11-01 | 1993-05-21 | Kashiwabara Token Kogyo Kk | Floor surface polishing-cleaning method |
JP2004358626A (en) * | 2003-06-05 | 2004-12-24 | Naoyuki Tomioka | Device and method for separating and removing deposit on floor surface |
Also Published As
Publication number | Publication date |
---|---|
JP4877601B2 (en) | 2012-02-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6140818B2 (en) | Electronic device and manufacturing method thereof | |
EP2891328B1 (en) | Speaker | |
CA2579206C (en) | Leading sheave mine winding engine with improved cooling air conduction | |
CN106438426B (en) | Fan with cooling device | |
JP4877601B2 (en) | Centrifugal abrasive grain projection device | |
US20110044799A1 (en) | Fan apparatus | |
CA2975014A1 (en) | Sanding system comprising a protected motor | |
US3815741A (en) | Plansifter mounting and clamping apparatus | |
CN106233750A (en) | Many opening arrangements for low frequency linear array | |
US704801A (en) | Ice-breaker. | |
KR20200072041A (en) | Air cleaning apparatus | |
KR102300428B1 (en) | High-efficiency mixed magnetic impeller stirrer using sediment suppression and multiple vortices | |
JP2017521842A (en) | Retaining frame for plug connector module and / or plug connector | |
EP3954131B1 (en) | Low profile loudspeakers | |
JP2018091510A (en) | Indoor unit of air conditioner | |
JP5250198B2 (en) | Rock or ore crushing and granulating equipment | |
AU2006100173A4 (en) | Display Device Having Cylindrical Screen | |
JP4193027B2 (en) | Game machine | |
JP2008098779A (en) | Indication device | |
JP6402048B2 (en) | Electronic equipment and support structure | |
KR20200033695A (en) | Stand and display apparatus having the same | |
WO2019193625A1 (en) | Outdoor unit of air conditioner | |
JP5762920B2 (en) | Coating equipment | |
JP5758330B2 (en) | Game machine | |
CN219233049U (en) | Granular fertilizer screening plant |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20081212 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20101130 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110715 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110906 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20111104 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20111117 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 Ref document number: 4877601 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20141209 Year of fee payment: 3 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |