JP2008176095A5 - - Google Patents

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Publication number
JP2008176095A5
JP2008176095A5 JP2007009926A JP2007009926A JP2008176095A5 JP 2008176095 A5 JP2008176095 A5 JP 2008176095A5 JP 2007009926 A JP2007009926 A JP 2007009926A JP 2007009926 A JP2007009926 A JP 2007009926A JP 2008176095 A5 JP2008176095 A5 JP 2008176095A5
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JP
Japan
Prior art keywords
layer
mask
forming
etching
laser beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2007009926A
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English (en)
Japanese (ja)
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JP2008176095A (ja
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Publication date
Application filed filed Critical
Priority to JP2007009926A priority Critical patent/JP2008176095A/ja
Priority claimed from JP2007009926A external-priority patent/JP2008176095A/ja
Publication of JP2008176095A publication Critical patent/JP2008176095A/ja
Publication of JP2008176095A5 publication Critical patent/JP2008176095A5/ja
Withdrawn legal-status Critical Current

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JP2007009926A 2007-01-19 2007-01-19 パターン形成方法及び薄膜トランジスタの作製方法 Withdrawn JP2008176095A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007009926A JP2008176095A (ja) 2007-01-19 2007-01-19 パターン形成方法及び薄膜トランジスタの作製方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007009926A JP2008176095A (ja) 2007-01-19 2007-01-19 パターン形成方法及び薄膜トランジスタの作製方法

Publications (2)

Publication Number Publication Date
JP2008176095A JP2008176095A (ja) 2008-07-31
JP2008176095A5 true JP2008176095A5 (cg-RX-API-DMAC7.html) 2010-01-21

Family

ID=39703160

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007009926A Withdrawn JP2008176095A (ja) 2007-01-19 2007-01-19 パターン形成方法及び薄膜トランジスタの作製方法

Country Status (1)

Country Link
JP (1) JP2008176095A (cg-RX-API-DMAC7.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6961326B2 (ja) * 2016-03-30 2021-11-05 古河電気工業株式会社 レーザ光遮蔽材
GB2590428B (en) * 2019-12-17 2024-08-14 Flexenable Tech Limited Semiconductor devices
CN112271195A (zh) * 2020-10-22 2021-01-26 Oppo广东移动通信有限公司 发光元件及其制备方法、显示屏和电子设备

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0535207A (ja) * 1991-08-02 1993-02-12 Fuji Xerox Co Ltd Ｅｌ駆動装置
JP4698998B2 (ja) * 2004-09-30 2011-06-08 株式会社半導体エネルギー研究所 液晶表示装置の作製方法
JP4781066B2 (ja) * 2004-09-30 2011-09-28 株式会社半導体エネルギー研究所 表示装置の作製方法
JP2006148082A (ja) * 2004-10-19 2006-06-08 Semiconductor Energy Lab Co Ltd 配線基板及び半導体装置の作製方法
JP5238132B2 (ja) * 2005-02-03 2013-07-17 株式会社半導体エネルギー研究所 半導体装置、モジュール、および電子機器
JP5116251B2 (ja) * 2005-05-20 2013-01-09 株式会社半導体エネルギー研究所 半導体装置の作製方法

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