JP2008174840A5 - Polymer parts - Google Patents

Polymer parts Download PDF

Info

Publication number
JP2008174840A5
JP2008174840A5 JP2008010808A JP2008010808A JP2008174840A5 JP 2008174840 A5 JP2008174840 A5 JP 2008174840A5 JP 2008010808 A JP2008010808 A JP 2008010808A JP 2008010808 A JP2008010808 A JP 2008010808A JP 2008174840 A5 JP2008174840 A5 JP 2008174840A5
Authority
JP
Japan
Prior art keywords
electroless plating
plating solution
polymer
polymer substrate
carbon dioxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008010808A
Other languages
Japanese (ja)
Other versions
JP5138394B2 (en
JP2008174840A (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2008010808A priority Critical patent/JP5138394B2/en
Priority claimed from JP2008010808A external-priority patent/JP5138394B2/en
Publication of JP2008174840A publication Critical patent/JP2008174840A/en
Publication of JP2008174840A5 publication Critical patent/JP2008174840A5/en
Application granted granted Critical
Publication of JP5138394B2 publication Critical patent/JP5138394B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Description

本発明は、プラスチック製のポリマー基材上に金属膜が形成されたポリマー部材に関する。 The present invention relates to a polymer member having a metal film formed on a plastic polymer substrate.

本発明は、上記問題を解決するためになされたものであり、本発明の目的は、ポリマー基材上に高密着強度を有する無電解メッキ膜が形成されたポリマー部材を提供することである The present invention has been made to solve the above problems, and an object of the present invention is to provide a polymer member in which an electroless plating film having high adhesion strength is formed on a polymer substrate .

本発明の第1の参考態様に従えば、ポリマー基材上にメッキ膜が形成されたポリマー部材の製造方法であって、表面内部に金属微粒子及び無電解メッキ液に溶解する物質の粒子が含浸したポリマー基材を用意することと、上記ポリマー基材に高圧二酸化炭素を接触させて上記ポリマー基材の表面近傍を膨潤させることと、上記ポリマー基材の表面近傍を膨潤させた状態で、高圧二酸化炭素を含む無電解メッキ液を上記ポリマー基材に接触させて、上記ポリマー基材にメッキ膜を形成することとを含む製造方法が提供される。 According to the first embodiment of the present invention, there is provided a method for producing a polymer member in which a plating film is formed on a polymer substrate, wherein the surface is impregnated with metal fine particles and particles of a substance dissolved in an electroless plating solution. A high-pressure carbon dioxide in a state in which the vicinity of the surface of the polymer substrate is swollen by bringing high-pressure carbon dioxide into contact with the polymer substrate, and the vicinity of the surface of the polymer substrate is swollen. There is provided a production method comprising contacting an electroless plating solution containing carbon dioxide with the polymer substrate to form a plating film on the polymer substrate.

それに対して、本発明の第1の参考態様に従うポリマー部材の製造方法では、まず、表面内部にメッキ触媒核となるPd、Ni、Pt、Cu等の金属微粒子、並びに、無電解メッキ液に溶解する物質(溶出物質)が含浸したポリマー基材に高圧二酸化炭素を接触させる。この際、ポリマー基材が非晶性材料で形成されている場合にはガラス転移温度が低下して表面近傍が軟化して膨潤する。一方、ポリマー基材が結晶性材料で形成されている場合には、軟化しないまでも、表面近傍で分子間距離が拡大して膨潤する。 On the other hand, in the method for producing a polymer member according to the first reference embodiment of the present invention, first, it is dissolved in metal fine particles such as Pd, Ni, Pt, Cu and the like, which are plating catalyst nuclei, and electroless plating solution inside the surface. The high-pressure carbon dioxide is brought into contact with the polymer substrate impregnated with the substance to be dissolved (eluting substance). At this time, when the polymer substrate is formed of an amorphous material, the glass transition temperature is lowered and the vicinity of the surface is softened and swells. On the other hand, when the polymer substrate is formed of a crystalline material, the intermolecular distance expands near the surface and swells even if it is not softened.

次いで、このような表面状態にあるポリマー基材に、高圧二酸化炭素を含む無電解メッキ液を接触させる。この際、ポリマー基材の表面近傍が膨潤した状態で無電解メッキ液を接触させるので、無電解メッキ液は高圧二酸化炭素とともにポリマー基材の内部に浸透させることができる。また、この際、超臨界状態等の高圧二酸化炭素を混合した無電解メッキ液は表面張力が低くなるので、ポリマー基材の内部に無電解メッキ液がより浸透し易くなる。この結果、ポリマー基材の内部に存在する金属微粒子まで無電解メッキ液が到達し、その金属微粒子を触媒核としてメッキ膜が成長する。すなわち、本発明の第1の参考態様に従うポリマー部材の製造方法では、ポリマー基材の表面だけでなく、内部に存在する金属微粒子を触媒核としてメッキ膜が成長するので、メッキ膜がポリマー基材表面から内部に渡って連続的に形成される(メッキ膜の一部がポリマー基材の内部に食い込んだ状態でポリマー基材上に形成される)。それゆえ、本発明の第1の参考態様に従うポリマー部材の製造方法では、従来の無電解メッキ法のようにポリマー基材の表面をエッチングで粗化する必要がなく、多様な種類のポリマー基材に対しても容易に密着性の優れたメッキ膜を形成することができる。また、従来の無電解メッキ法のようにポリマー部材の表面を粗化しないので、表面粗度の非常に小さい(ナノオーダー)メッキ膜を形成することができる。 Next, an electroless plating solution containing high-pressure carbon dioxide is brought into contact with the polymer substrate in such a surface state. At this time, since the electroless plating solution is brought into contact with the vicinity of the surface of the polymer substrate swollen, the electroless plating solution can penetrate into the polymer substrate together with the high-pressure carbon dioxide. At this time, since the electroless plating solution mixed with high-pressure carbon dioxide in a supercritical state has a low surface tension, the electroless plating solution is more easily penetrated into the polymer substrate. As a result, the electroless plating solution reaches the metal fine particles existing inside the polymer substrate, and the plating film grows using the metal fine particles as catalyst nuclei. That is, in the method for producing a polymer member according to the first reference embodiment of the present invention, the plating film grows using not only the surface of the polymer substrate but also the metal fine particles present therein as catalyst nuclei. It is continuously formed from the surface to the inside (formed on the polymer substrate in a state in which a part of the plating film is bitten into the interior of the polymer substrate). Therefore, in the method for producing a polymer member according to the first reference embodiment of the present invention, it is not necessary to roughen the surface of the polymer substrate by etching unlike the conventional electroless plating method, and various types of polymer substrates are used. In contrast, a plating film having excellent adhesion can be easily formed. Further, since the surface of the polymer member is not roughened unlike the conventional electroless plating method, a plating film having a very small surface roughness (nano order) can be formed.

また、本発明の第1の参考態様に従うポリマー部材の製造方法では、高圧二酸化炭素を含む無電解メッキ液をポリマー基材に接触させた際に、高圧二酸化炭素が気体並みの拡散性を有するので、無電解メッキ液をポリマー基材内部のより深い位置まで浸透させることができ、より深い位置からメッキ膜を連続的に形成することができる。例えば、ミクロンオーダーの深さからメッキ膜を連続的に形成することができる(メッキ膜の一部をミクロンオーダーの深さまで浸透させることができる)。なお、非特許文献2で開示されている無電解メッキ方法によっても、ポリマー基材の内部からメッキ膜を連続的に形成することはできるが、非特許文献2の方法では、ポリマー基材の最表面層部分に光触媒効果により親水性(濡れ性)を与え、その表面改質された最表面層にメッキ膜を成長させる方法であるので、メッキ膜の浸透深さは数十nm程度であり、本発明のようにメッキ膜の一部がミクロンオーダーの深さで浸透したポリマー部材を製造することは困難である。 Further, in the method for producing a polymer member according to the first reference embodiment of the present invention, when the electroless plating solution containing high-pressure carbon dioxide is brought into contact with the polymer substrate, the high-pressure carbon dioxide has a diffusibility similar to gas. The electroless plating solution can be penetrated to a deeper position inside the polymer substrate, and a plating film can be continuously formed from a deeper position. For example, a plating film can be continuously formed from a depth on the order of microns (part of the plating film can be penetrated to a depth on the order of microns). Although the electroless plating method disclosed in Non-Patent Document 2 can also form a plating film continuously from the inside of the polymer substrate, the method of Non-Patent Document 2 uses the most of the polymer substrate. Since the surface layer portion is hydrophilic (wetting) by the photocatalytic effect and the plating film is grown on the surface-modified outermost layer, the penetration depth of the plating film is about several tens of nm. As in the present invention, it is difficult to manufacture a polymer member in which a part of the plating film penetrates at a depth of micron order.

さらに、本発明の第1の参考態様に従うポリマー部材の製造方法では、ポリマー基材の表面内部に溶出物質が含浸しているので、高圧二酸化炭素を含む無電解メッキ液をポリマー基材に接触させた際に、ポリマー基材内部に含浸している溶出物質が無電解メッキ液に溶出して、溶出物質が占めていた領域に無電解メッキ液が入り込む(溶出物質の含浸領域が無電解メッキ液により置換される)。その結果、無電解メッキ液が入り込んだ領域(溶出物質が占めていた領域)にもメッキ膜が成長する。この方法では、結晶性材料のように内部の自由体積が拡大し難い材料をポリマー基材として用いた場合であっても、容易にポリマー基材内部に無電解メッキ膜が成長する十分な領域(空間)を確保することができる。また、溶出物質が占めている領域の大きさは溶出物質の分子量により制御することができるので、溶出物質が占めていた領域(無電解メッキ液で置換された領域)で成長する微細なメッキ粒子の大きさも溶出物質の分子量により任意に制御することができる。そのため、金属微粒子と一緒に溶出物質をポリマー基材内部に含浸させたポリマー基材上に無電解メッキ膜を形成した場合には、ポリマー基材内部に複雑な形状(毛細血管状、蟻の巣状、網目状等)のメッキ膜領域を形成することができ、溶出物質を浸透させない場合に比べてより強度な密着性有するメッキ膜を形成することができる。 Furthermore, in the method for producing a polymer member according to the first reference embodiment of the present invention, since the elution substance is impregnated inside the surface of the polymer substrate, an electroless plating solution containing high-pressure carbon dioxide is brought into contact with the polymer substrate. In this case, the elution substance impregnated inside the polymer substrate is eluted into the electroless plating solution, and the electroless plating solution enters the area occupied by the elution substance (the elution substance impregnation area is the electroless plating solution). Replaced by As a result, the plating film also grows in the region where the electroless plating solution has entered (the region occupied by the eluted material). In this method, even when a material such as a crystalline material whose internal free volume is difficult to expand is used as the polymer substrate, a sufficient region (e.g., an electroless plating film grows easily inside the polymer substrate ( Space) can be secured. In addition, since the size of the area occupied by the elution substance can be controlled by the molecular weight of the elution substance, fine plating particles that grow in the area occupied by the elution substance (area replaced by the electroless plating solution) The size of can be arbitrarily controlled by the molecular weight of the eluted substance. For this reason, when an electroless plating film is formed on a polymer substrate that is impregnated with metal particles together with an elution substance, a complicated shape (capillary shape, ant nest) is formed inside the polymer substrate. In other words, a plating film having a stronger adhesion can be formed as compared with the case where the elution substance is not permeated.

本発明の第1の参考態様に従うポリマー部材の製造方法では、表面内部に金属微粒子及び無電解メッキ液に溶解する物質の粒子が含浸したポリマー基材を用意することが、射出成形機の金型内で表面内部に金属微粒子及び無電解メッキ液に溶解する物質が含浸したポリマー基材を成形することを含むことが好ましい。 In the method of manufacturing a polymer member according to the first reference aspect of the present invention, it is possible to prepare a polymer base material impregnated with metal fine particles and particles of a substance dissolved in an electroless plating solution inside the surface. It is preferable to include forming a polymer substrate impregnated with metal fine particles and a substance that dissolves in the electroless plating solution inside the surface.

本発明の第2の参考態様に従えば、ポリマー基材上にメッキ膜が形成されたポリマー部材の製造方法であって、表面内部に金属微粒子及び空隙が存在するポリマー基材を用意することと、上記ポリマー基材に高圧二酸化炭素を接触させて上記ポリマー基材の表面近傍を膨潤させることと、上記ポリマー基材の表面近傍を膨潤させた状態で、高圧二酸化炭素を含む無電解メッキ液を上記ポリマー基材に接触させて、上記ポリマー基材にメッキ膜を形成することとを含む製造方法が提供される。 According to the second reference aspect of the present invention, there is provided a method for producing a polymer member in which a plating film is formed on a polymer substrate, comprising preparing a polymer substrate having metal fine particles and voids inside the surface. The high pressure carbon dioxide is brought into contact with the polymer substrate to swell the vicinity of the surface of the polymer substrate, and the electroless plating solution containing high pressure carbon dioxide is swollen in the vicinity of the surface of the polymer substrate. There is provided a manufacturing method comprising contacting the polymer substrate and forming a plating film on the polymer substrate.

本発明の第2の参考態様に従うポリマー部材の製造方法では、本発明の第1の参考態様に従うポリマー部材の製造方法と同様に、メッキ膜の一部をポリマー基材の内部に浸透させることができる。それゆえ、従来の無電解メッキ法のようにポリマー基材の表面をエッチングで粗化する必要がなく、多様な種類のポリマー基材に対しても容易に密着性の優れたメッキ膜を形成することができる。また、従来の無電解メッキ法のようにポリマー部材の表面を粗化しないので、表面粗度の非常に小さい(ナノオーダー)メッキ膜を形成することができる。 In the method for producing a polymer member according to the second reference aspect of the present invention, as in the method for producing a polymer member according to the first reference aspect of the present invention, a part of the plating film is allowed to permeate the inside of the polymer substrate. it can. Therefore, it is not necessary to roughen the surface of the polymer substrate by etching unlike the conventional electroless plating method, and a plating film having excellent adhesion can be easily formed on various types of polymer substrates. be able to. Further, since the surface of the polymer member is not roughened unlike the conventional electroless plating method, a plating film having a very small surface roughness (nano order) can be formed.

さらに、本発明の第2の参考態様に従うポリマー部材の製造方法では、ポリマー基材の表面内部に空隙が存在するので、高圧二酸化炭素を含む無電解メッキ液をポリマー基材に接触させた際に、その空隙に無電解メッキ液が入り込み、その空隙にもメッキ膜が成長する。それゆえ、結晶性材料のように内部の自由体積が拡大し難い材料をポリマー基材として用いた場合であっても、容易にポリマー基材内部に無電解メッキ膜が成長する領域(空間)を確保することができる。 Furthermore, in the manufacturing method of the second polymer member according to Reference Aspect of the present invention, since there are voids inside the surface of the polymer substrate, the electroless plating solution containing pressurized carbon dioxide when in contact with the polymer substrate The electroless plating solution enters the gap, and a plating film grows in the gap. Therefore, even when a material such as a crystalline material whose internal free volume is difficult to expand is used as a polymer substrate, an area (space) where an electroless plating film easily grows inside the polymer substrate Can be secured.

本発明の第2の参考態様に従うポリマー部材の製造方法では、表面内部に金属微粒子及び空隙が存在するポリマー基材を用意することが、金型及び加熱シリンダーを備える射出成形機を用い、上記金属微粒子を含む金属錯体を溶解させた高圧二酸化炭素を上記加熱シリンダー内の上記ポリマー基材の溶融樹脂に導入することと、上記金属錯体を溶解させた高圧二酸化炭素が導入された溶融樹脂を上記金型内に射出することと、射出された溶融樹脂内の高圧二酸化炭素を発泡させて空隙を形成することとを含むことが好ましい。 In the method for producing a polymer member according to the second reference aspect of the present invention, the preparation of a polymer base material having metal fine particles and voids inside the surface is performed using an injection molding machine equipped with a mold and a heating cylinder. Introducing high-pressure carbon dioxide in which a metal complex containing fine particles is dissolved into the molten resin of the polymer substrate in the heating cylinder; and introducing the molten resin into which the high-pressure carbon dioxide in which the metal complex is dissolved is introduced into the gold It is preferable to include injection into the mold and foaming high-pressure carbon dioxide in the injected molten resin to form a void.

上記ポリマー部材の製造方法では、上記無電解メッキ液が、アルコールを含むことが好ましい。 In the polymer member manufacturing method, the electroless plating solution preferably contains alcohol.

そこで、本発明者らは、この課題を解決するために検討を重ねた結果、無電解メッキ液は水が主成分であるが、さらに、アルコールを無電解メッキ液に混合させることにより、無電解メッキ液と高圧二酸化炭素とを攪拌しなくても、高圧状態の二酸化炭素とメッキ液とが安定して混ざり易くなることがわかった。これは、アルコールが高圧状態の二酸化炭素と相溶しやすいためであると考えられる。それゆえ、通常、無電解メッキ液を調合する際には、金属イオンや還元剤等の入った原液を、例えばメーカー推奨の成分比に従って、水で薄めてメッキ液を健浴するが、上記ポリマー部材の製造方法では、さらにアルコールを任意の割合で水に混合するだけで、無電解メッキ液と高圧二酸化炭素とが均一に相溶した安定した無電解メッキ液を調合することができる。なお、水とアルコールの体積比(アルコール/水)は、任意であるが、10〜80%の範囲であることが望ましい。アルコールが少ないと、安定な混合液が得られにくくなる。また、アルコール成分が多すぎると、例えばニッケル−リンメッキに用いられる硫酸ニッケルにエタノール等の有機溶媒は不溶であるため、浴が安定しない場合がある。 Therefore, as a result of repeated studies to solve this problem, the present inventors have found that the electroless plating solution is mainly composed of water, but further, by mixing alcohol with the electroless plating solution, It has been found that even if the plating solution and high-pressure carbon dioxide are not stirred, the high-pressure carbon dioxide and the plating solution can be mixed stably and easily. This is considered to be because alcohol is easily compatible with high-pressure carbon dioxide. Therefore, usually, in formulating the electroless plating solution, the containing stock solution of such as metal ions and a reducing agent, for example, according to the component ratio recommended by the manufacturer, although Ken'yoku the plating solution diluted with water, the polymer In the member manufacturing method, a stable electroless plating solution in which the electroless plating solution and high-pressure carbon dioxide are uniformly mixed can be prepared by further mixing alcohol with water at an arbitrary ratio. The volume ratio of water to alcohol (alcohol / water) is arbitrary, but is preferably in the range of 10 to 80%. When there is little alcohol, it will become difficult to obtain a stable liquid mixture. Moreover, when there are too many alcohol components, since organic solvents, such as ethanol, are insoluble in nickel sulfate used for nickel-phosphorus plating, for example, the bath may not be stable.

なお、上記ポリマー部材の製造方法に用い得るアルコールの種類は任意であり、メタノール、エタノール、n−プロパノール、イソプロパノール、ブタノール、ヘプタノール、エチレングリコール等を用いることができる。 In addition, the kind of alcohol which can be used for the manufacturing method of the said polymer member is arbitrary, Methanol, ethanol, n-propanol, isopropanol, butanol, heptanol, ethylene glycol, etc. can be used.

また、上記ポリマー部材の製造方法において、無電解メッキ液にアルコールを加えた場合には、アルコールは水よりも表面張力が低いので、アルコールが加えられた無電解メッキ液の表面張力は著しく低下する。そのため、ポリマー基材の自由体積(内部)、空隙、溶出物質の含浸領域等に、無電解メッキ液が一層浸透し易くなる。 In the method for manufacturing the polymer member, when added to the alcohol in the electroless plating solution, alcohol is because the surface tension is less than water, the surface tension of the electroless plating solution the alcohol added is significantly reduced . For this reason, the electroless plating solution is more likely to penetrate into the free volume (inside), the voids, the elution substance impregnation region, and the like of the polymer substrate.

上記ポリマー部材の製造方法では、上記無電解メッキ液が、界面活性剤を含むことが好ましい。これにより、超臨界二酸化炭素等の高圧二酸化炭素と水溶液である無電解メッキ液との相溶性(親和性)をより向上させ、エマルジョンの形成を助長することができる。また、ポリマー基材に対するメッキ液の親和性も向上させることができる。 In the polymer member manufacturing method, the electroless plating solution preferably contains a surfactant. Thereby, the compatibility (affinity) of the high pressure carbon dioxide such as supercritical carbon dioxide and the electroless plating solution that is an aqueous solution can be further improved, and the formation of the emulsion can be promoted. Also, the affinity of the plating solution for the polymer substrate can be improved.

上記ポリマー部材の製造方法では、上記高圧二酸化炭素が、7.38MPa以上20MPa以下の圧力を有する超臨界状態の二酸化炭素であることが好ましい。二酸化炭素の臨界圧力は7.38MPaであるが、それ以上の超臨界状態であると密度が高くなり、メッキ液と相溶しやすくなるので好適である。また、圧力が30MPa以上に高くなると、二酸化炭素の使用量が過剰に多くなったり、高圧容器のシールが困難になる等の不具合が生じるので望ましくない。 In the method for producing the polymer member, the high-pressure carbon dioxide is preferably carbon dioxide in a supercritical state having a pressure of 7.38 MPa to 20 MPa. The critical pressure of carbon dioxide is 7.38 MPa, but a supercritical state higher than that is preferable because the density becomes high and it is easy to be compatible with the plating solution. On the other hand, when the pressure is increased to 30 MPa or more, problems such as excessive use of carbon dioxide and difficulty in sealing a high-pressure vessel are undesirable.

上記ポリマー部材の製造方法では、短時間で最小限の薄いメッキ膜をポリマー基材の表面に形成して、メッキ膜とポリマー基材との密着性を確保することが好ましい。それにより無電解メッキ液が過剰にポリマー基材内部に浸透することを抑制することができ、無電解メッキ液によるポリマー基材の変形や変質を抑制することができる。また、メッキ膜の膜厚を厚くする必要がある場合には、上記方法によりポリマー基材上に無電解メッキ膜を形成した後に、常圧で従来のメッキ法(無電解メッキ法及び/又は電解メッキ法)を施すことにより、所望の膜厚を有するメッキ膜をポリマー基材上に積層することができる。この方法では、メッキ膜の信頼性(密着性)と、導電性等の物性の確保とを両立したメッキ膜を得ることができる。 In the method for producing a polymer member, it is preferable that a minimum thin plating film is formed on the surface of the polymer substrate in a short time to ensure adhesion between the plating film and the polymer substrate. Thereby, it is possible to suppress the electroless plating solution from penetrating excessively into the polymer base material, and it is possible to suppress deformation and alteration of the polymer base material due to the electroless plating solution. When it is necessary to increase the film thickness of the plated film, after forming an electroless plating film by the upper Symbol method on a polymer substrate, the conventional plating method under normal pressure (electroless plating method and / or By performing the electrolytic plating method, a plating film having a desired film thickness can be laminated on the polymer substrate. According to this method, a plating film having both the reliability (adhesiveness) of the plating film and securing of physical properties such as conductivity can be obtained.

また、本発明者の検討によれば、特許文献2及び非特許文献1に記載されているような高圧二酸化炭素をメッキ液に含ませてメッキを行う方法では、高圧二酸化炭素を混合した際に、その混合条件によっては無電解メッキの析出速度が低下する等の不具合が生じることが判明した。これは、酸性の高圧二酸化炭素が高密度で無電解メッキ液に混合されるため、無電解メッキ液のpHが低下し、高圧二酸化炭素の混合したメッキ浴が最適なpH範囲の下限値より低くなるためであると考えられる。それゆえ、上記ポリマー部材の製造方法では、無電解メッキ液のpHを予め高めに調整しておいてもよい。この場合、高密度の二酸化炭素を含む無電解メッキ液を調合すると、高密度の二酸化炭素を混入させることにより無電解メッキ液のpHが低下し、メッキ浴を最適なpH範囲にすることができる。それゆえ、この方法を用いた場合には上述したメッキ膜の析出速度が低下する等の問題を抑制することができる。 Further, according to the study of the present inventor, in the method of plating by adding high-pressure carbon dioxide as described in Patent Document 2 and Non-Patent Document 1 to the plating solution, when high-pressure carbon dioxide is mixed, It has been found that problems such as a decrease in the deposition rate of electroless plating occur depending on the mixing conditions. This is because the acidic high-pressure carbon dioxide is mixed with the electroless plating solution at a high density, so that the pH of the electroless plating solution is lowered, and the plating bath mixed with the high-pressure carbon dioxide is lower than the lower limit of the optimum pH range. It is thought that it is to become. Therefore, in the manufacturing method of the polymer member may be previously adjusted in advance increases the pH of the electroless plating solution. In this case, when an electroless plating solution containing high-density carbon dioxide is prepared, the pH of the electroless plating solution is lowered by mixing high-density carbon dioxide, and the plating bath can be brought to an optimum pH range. . Therefore, when this method is used, problems such as a decrease in the deposition rate of the plating film described above can be suppressed.

上記ポリマー部材の製造方法では、メッキ皮膜となる金属としては、Ni,Co,Pd,Cu,Ag,Au,Pt,Sn等を用いることができ、これらは無電解メッキ液中における硫酸ニッケル、塩化パラジウム、硫酸銅等の金属塩から供給される。また、還元剤としては、ジメチルアミンボラン、次亜燐酸ナトリウム(ホスフィン酸ナトリウム)、ヒドラジン、ホルマリン、水素化ホウ素ナトリウム、水素化ホウ素カリウム、三塩化チタン等を用いることができる。 In the method for producing the polymer member, Ni, Co, Pd, Cu, Ag, Au, Pt, Sn, etc. can be used as the metal to be the plating film, and these are nickel sulfate, chloride in the electroless plating solution. Supplied from metal salts such as palladium and copper sulfate. As the reducing agent, dimethylamine borane, sodium hypophosphite (sodium phosphinate), hydrazine, formalin, sodium borohydride, potassium borohydride, titanium trichloride, or the like can be used.

上記製造方法に用い得るポリマー基材の形成材料は任意であり、熱可塑性樹脂、熱硬化樹脂及び紫外線硬化樹脂を用いることができる。特に、熱可塑性樹脂で形成したポリマー基材を用いることが望ましい。熱可塑性樹脂の種類は任意であり、非晶性、結晶性いずれでも適用できる。例えば、ポリエステル系等の合成繊維、ポリプロピレン、ポリアミド系樹脂、ポリメチルメタクリレート、ポリカーボネート、アモルファスポリオレフィン、ポリエーテルイミド、ポリエチレンテレフタレート、液晶ポリマー、ABS系樹脂、ポリアミドイミド、ポリフタルアミド、ポリフェニレンサルファイド、ポリ乳酸等の生分解性プラスチック、ナイロン樹脂等及びそれら複合材料を用いることできる。また、ガラス繊維、カーボン繊維、ナノカーボン、ミネラル等、各種無機フィラー等を混練させた樹脂材料を用いることもできる。 The material for forming the polymer substrate that can be used in the production method is arbitrary, and a thermoplastic resin, a thermosetting resin, and an ultraviolet curable resin can be used. In particular, it is desirable to use a polymer substrate formed of a thermoplastic resin. The type of thermoplastic resin is arbitrary, and can be applied to either amorphous or crystalline. For example, synthetic fibers such as polyester, polypropylene, polyamide resin, polymethyl methacrylate, polycarbonate, amorphous polyolefin, polyetherimide, polyethylene terephthalate, liquid crystal polymer, ABS resin, polyamideimide, polyphthalamide, polyphenylene sulfide, polylactic acid Biodegradable plastics such as nylon resin, nylon resin and the like and composite materials thereof can be used. Further, a resin material in which various inorganic fillers such as glass fiber, carbon fiber, nanocarbon, and mineral are kneaded can also be used.

また、上記ポリマー部材の製造方法では、ポリマー基材の形態および作製方法は任意であり、例えば、押し出し成形により作製されたシートやパイプ、紫外線硬化や射出成形により作製されたポリマー成形品を用いることができる。工業性を考慮すると、連続生産性の高い射出成形により得られたポリマー成形品を用いることが好ましい。 Moreover, in the manufacturing method of the said polymer member, the form of a polymer base material and a preparation method are arbitrary, For example, the sheet | seat and pipe produced by extrusion molding, the polymer molded article produced by ultraviolet curing and injection molding are used. Can do. In consideration of industrial properties, it is preferable to use a polymer molded product obtained by injection molding with high continuous productivity.

上記ポリマー部材の製造方法によれば、無電解メッキ液をポリマー基材の内部に浸透させてメッキ反応を起こさせるので、従来のようにポリマー基材の表面を粗化する必要がなくなり、あらゆる種類のポリマー基材に対して密着性の優れたメッキ膜を形成することができる。 According to the above polymer member manufacturing method, the electroless plating solution penetrates into the inside of the polymer base material to cause a plating reaction, so that it is not necessary to roughen the surface of the polymer base material as in the prior art. A plating film having excellent adhesion to the polymer substrate can be formed.

また、上記ポリマー部材の製造方法によれば、ポリマー基材内部に含浸した溶出物質で占められた領域、または、空隙に無電解メッキ液を浸透させてメッキ膜を成長させることができるので、結晶性材料のように内部の自由体積が拡大し難い材料をポリマー基材として用いた場合であっても、容易にポリマー基材内部に無電解メッキ膜が成長する領域(空間)を確保することができる。 According to the manufacturing method of the polymer member, the area occupied by the eluted material impregnated therein the polymer substrate, or, since infiltrated an electroless plating solution in the gap can be grown plating film, crystalline Even in the case where a material whose internal free volume is difficult to expand is used as a polymer substrate, such as a conductive material, it is possible to easily secure a region (space) in which the electroless plating film grows inside the polymer substrate. it can.

さらに、上記ポリマー部材の製造方法によれば、ポリマー基材内部に含浸した溶出物質で占められた領域、または、空隙にメッキ膜が成長するので、ポリマー基材内部に複雑な形状のメッキ膜領域を形成することができ、一層強固な密着性有するメッキ膜を形成することができる。 Furthermore, according to the above method for producing a polymer member, a plating film grows in an area occupied by the eluted substance impregnated inside the polymer base material or in a void, so that the plating film area of a complicated shape is formed inside the polymer base material. And a plating film having stronger adhesion can be formed.

本発明者らの検討によれば、無電解メッキ液8は水が主成分であるが、アルコールを混合することで、高圧状態の二酸化炭素と無電解メッキ液が安定に混ざり易くなることが分かった。これは、アルコールと超臨界二酸化炭素とが相溶し易いことによるものと考えられる。それゆえ、本実施例のように無電解メッキ液にアルコールを混合した場合には、無電解メッキ液に界面活性剤を添加したり、無電解メッキ液を攪拌する必要がなくなる。さらに、ポリマー基材内に高圧二酸化炭素とともにメッキ液を浸透させてポリマー基材内部でメッキ反応を起こさせるためには、メッキ液にアルコールを添加させたほうが、水のみよりも表面張力が低下するため、より好適である。ただし、本発明のポリマー部材の製造方法では、高圧二酸化炭素と無電解メッキ液との相溶性(親和性)をより高めるために、界面活性剤を添加したり、無電解メッキ液を攪拌したりしても良い。この例では、後述するように、界面活性剤を無電解メッキ液に添加し、無電解メッキ液の攪拌も行った。 According to the study by the present inventors, the electroless plating solution 8 is mainly composed of water, but it is understood that the high pressure carbon dioxide and the electroless plating solution are easily mixed stably by mixing alcohol. It was. This is considered due to the fact that alcohol and supercritical carbon dioxide are easily compatible. Therefore, when alcohol is mixed with the electroless plating solution as in this embodiment, it is not necessary to add a surfactant to the electroless plating solution or to stir the electroless plating solution. Furthermore, in order to cause the plating solution to penetrate into the polymer base material together with the high-pressure carbon dioxide to cause the plating reaction inside the polymer base material, the surface tension is lower than the water alone when the alcohol is added to the plating solution. Therefore, it is more preferable. However, in the method for producing a polymer member of the present invention , in order to further improve the compatibility (affinity) between the high pressure carbon dioxide and the electroless plating solution, a surfactant is added, or the electroless plating solution is stirred. You may do it. In this example, as described later, a surfactant was added to the electroless plating solution, and the electroless plating solution was also stirred.

なお、上記実施例6の無電解メッキ処理では、まず、高圧二酸化炭素のみをポリマー基材に接触させてポリマー基材の表面を膨潤した後に、無電解メッキ液をポリマー基材に接触させたが、本発明のポリマー部材の製造方法はこれに限定されない。例えば、ポリマー基材に高圧二酸化炭素を含み且つメッキ反応の起こらないメッキ液濃度を有する第1の無電解メッキ液をポリマー基材に接触させ、次いで、高圧二酸化炭素を含み且つメッキ反応の起こるメッキ液濃度を有する第2の無電解メッキ液をポリマー基材に接触させてメッキ膜を形成してもよい。なお、ここでいう、メッキ液濃度とは、メッキ液中の、メッキ反応を決定する因子である次亜燐酸ナトリウム等の還元剤の濃度のことである。すなわち、上記方法をより具体的に説明すると、メッキ反応が起きない程度に十分に還元剤量が少ない無電解メッキ液(第1の無電解メッキ液)と高圧二酸化炭素をポリマー基材に接触させることでポリマー基材内にメッキ液を浸透させ、次いで、第1の無電解メッキ液を、十分にメッキ反応が起きる程度に還元剤が含まれた無電解メッキ液(第2の無電解メッキ液)に置換してもよい。または、還元剤を主成分とする水やアルコ−ルの含まれる溶媒と高圧二酸化炭素を、還元剤の少ない第1の無電解メッキ液に添加することで、第2の無電解メッキ液を形成してもよい。 In the electroless plating treatment of Example 6 above, first, only the high pressure carbon dioxide was brought into contact with the polymer substrate to swell the surface of the polymer substrate, and then the electroless plating solution was brought into contact with the polymer substrate. The method for producing the polymer member of the present invention is not limited to this. For example, a first electroless plating solution containing a high-pressure carbon dioxide in a polymer substrate and having a plating solution concentration that does not cause a plating reaction is contacted with the polymer substrate, and then plating containing a high-pressure carbon dioxide and causing a plating reaction A plating film may be formed by bringing a second electroless plating solution having a solution concentration into contact with the polymer substrate. Here, the plating solution concentration refers to the concentration of a reducing agent such as sodium hypophosphite that is a factor that determines the plating reaction in the plating solution. That is, the above method will be described more specifically. An electroless plating solution (first electroless plating solution) and a high-pressure carbon dioxide, which have a sufficiently small amount of reducing agent so as not to cause a plating reaction, are brought into contact with a polymer substrate. Then, the plating solution is infiltrated into the polymer substrate, and then the first electroless plating solution is replaced with an electroless plating solution (a second electroless plating solution containing a reducing agent enough to cause a plating reaction). ) May be substituted. Alternatively, a second electroless plating solution is formed by adding a solvent containing water or alcohol containing a reducing agent as a main component and high-pressure carbon dioxide to the first electroless plating solution having a small reducing agent. May be.

また、実施例6では、ポリマー基材の射出成形時に、溶融樹脂のフローフロント部に金属錯体を導入して射出成形し、金属微粒子をポリマー基材の表面内部に浸透させる例を説明したが、本発明のポリマー部材の製造方法はこれに限定されない。サンドイッチ成形法により金属微粒子が表面内部に含浸したポリマー基材を成形しても良い。具体的には、金属微粒子を含んだ溶融樹脂を加熱シリンダーから射出し、次いで、金属微粒子を含まない溶融樹脂を別の加熱シリンダーから射出して成形しても良い。また、実施例1のように、表面に金属微粒子が含浸していないポリマー基材を成形した後、金属錯体を溶解した高圧二酸化炭素をポリマー基材に接触させて、金属微粒子をポリマー基材の表面内部に浸透させても良い。 Further, in Example 6, during the injection molding of the polymer base material, an example in which a metal complex is introduced into the flow front portion of the molten resin to perform injection molding, and the metal fine particles penetrate into the surface of the polymer base material has been described. The manufacturing method of the polymer member of this invention is not limited to this. You may shape | mold the polymer base material which the metal microparticles impregnated to the surface inside by the sandwich molding method. Specifically, a molten resin containing metal fine particles may be injected from a heating cylinder, and then a molten resin not containing metal fine particles may be injected from another heating cylinder to be molded. In addition, as in Example 1, after forming a polymer base material that is not impregnated with metal fine particles on the surface, high-pressure carbon dioxide in which a metal complex is dissolved is brought into contact with the polymer base material so that the metal fine particles are formed on the polymer base material. It may penetrate into the surface.

なお、本実施例では、ポリマー基材の内部に十分なメッキ膜の成長領域を形成するために、水溶性物質としてポリエチレングリコールを用いた例を説明したが、本発明のポリマー部材の製造方法はこれに限定されず、酸化マグネシウム、炭酸カルシウム等のミネラル成分、デンプン、アルギン酸ナトリウム、ポリビニルアルコール、ポリビニルメチルエーテル、アクリル酸等を用いても良い。また、水溶性物質の代わりに溶解性の低分子材料、例えば、ポリエチレンオキシド、εカプロラクタム、アルコール(エタノール、プロパノール、ブタノール等)、エチレングリコール、ポリアクリルアミド、ポリビニルピロリドン、エチルセルロース、アセチルセルロース等を用いても良い。 In the present embodiment, in order to form a growth area of sufficient plating film in the interior of the polymer substrate has been described an example using polyethylene glycol as the water-soluble substance, method for producing a polymer member of the present invention Without being limited thereto, mineral components such as magnesium oxide and calcium carbonate, starch, sodium alginate, polyvinyl alcohol, polyvinyl methyl ether, acrylic acid and the like may be used. In addition, soluble low molecular weight materials such as polyethylene oxide, ε-caprolactam, alcohol (ethanol, propanol, butanol, etc.), ethylene glycol, polyacrylamide, polyvinyl pyrrolidone, ethyl cellulose, acetyl cellulose, etc. are used instead of water-soluble substances. Also good.

JP2008010808A 2008-01-21 2008-01-21 Polymer parts Active JP5138394B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008010808A JP5138394B2 (en) 2008-01-21 2008-01-21 Polymer parts

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008010808A JP5138394B2 (en) 2008-01-21 2008-01-21 Polymer parts

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2006330167A Division JP4092360B1 (en) 2006-05-11 2006-12-07 Polymer member and manufacturing method thereof

Publications (3)

Publication Number Publication Date
JP2008174840A JP2008174840A (en) 2008-07-31
JP2008174840A5 true JP2008174840A5 (en) 2009-11-19
JP5138394B2 JP5138394B2 (en) 2013-02-06

Family

ID=39702055

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008010808A Active JP5138394B2 (en) 2008-01-21 2008-01-21 Polymer parts

Country Status (1)

Country Link
JP (1) JP5138394B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5175162B2 (en) * 2008-11-18 2013-04-03 日立マクセル株式会社 Reflective member
JP5379603B2 (en) * 2009-08-12 2013-12-25 株式会社神戸製鋼所 Method for producing metal-containing material
JP7172211B2 (en) * 2017-07-28 2022-11-16 Tdk株式会社 Conductive substrates, electronic devices and display devices

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4660661B2 (en) * 2000-02-22 2011-03-30 コスモ石油株式会社 Plating pretreatment method for plastic, plating method, method for producing plated product, and plating apparatus
JP3806102B2 (en) * 2002-05-22 2006-08-09 日立マクセル株式会社 Molded product, injection molding method and apparatus
JP2005050992A (en) * 2003-07-28 2005-02-24 Toshiba Corp Wiring board and multilayer wiring board
JP2005232338A (en) * 2004-02-20 2005-09-02 Daicel Polymer Ltd Plated resin molding

Similar Documents

Publication Publication Date Title
JP3914961B2 (en) Method for manufacturing molded product, extrusion molding apparatus and molded product
CN101302612B (en) Manufacturing method of polymer member and polymer member
US20070264451A1 (en) Method of manufacturing polymer member and polymer member
JP2008174840A5 (en) Polymer parts
JP5070152B2 (en) Manufacturing method of resin molding
JP2007084929A (en) Pretreatment method to plating for polymer substrate, plating method, and method for producing molding made of thermoplastic resin
CN108608615B (en) Preparation method of direct combination of composite material and resin
JP4160623B2 (en) Production method and production apparatus for polymer member
JP4092364B1 (en) Method for forming plating film and electroless plating solution
JP5138394B2 (en) Polymer parts
JP4092360B1 (en) Polymer member and manufacturing method thereof
JP3926835B1 (en) Formation method of plating film
JP2011001577A (en) Method for manufacturing polymer member having plating film
WO2009113607A1 (en) Process for producing composite material comprising resin molded product
JP4105214B1 (en) Plating film forming method, polymer member and manufacturing method thereof
JP6830596B2 (en) Manufacturing method of plated molded product and plated molded product
JP2010280416A (en) Method for manufacturing conductive fastening band
JP2016125123A (en) Manufacturing method of compact having plated film
JP2013227617A (en) Method for manufacturing formed body having plating film
JP2010132976A (en) Method for producing plastic member having plated film
JP2009113266A (en) Method for modifying surface of plastic molded body, method for forming metal film including the same, and plastic component thereof
JP5175151B2 (en) Method for producing resin molded product having metal film
JP2008247962A (en) Plastic surface modification method and metal film formation method
JP6318001B2 (en) Method for producing molded body having plated film
JP2017031456A (en) Method for manufacturing plated component and plated component