JP2008147084A - Oxide electroluminescent element - Google Patents

Oxide electroluminescent element Download PDF

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JP2008147084A
JP2008147084A JP2006334691A JP2006334691A JP2008147084A JP 2008147084 A JP2008147084 A JP 2008147084A JP 2006334691 A JP2006334691 A JP 2006334691A JP 2006334691 A JP2006334691 A JP 2006334691A JP 2008147084 A JP2008147084 A JP 2008147084A
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electroluminescent
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JP4910192B2 (en
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Masanori Andou
昌儀 安藤
Susumu Sakaguchi
享 阪口
Akio Yamanaka
明生 山中
Yutaka Kawabe
豊 川辺
Eiichi Hanamura
榮一 花村
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Japan Science and Technology Agency
National Institute of Advanced Industrial Science and Technology AIST
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<P>PROBLEM TO BE SOLVED: To provide an oxide electroluminescent element containing, as an electroluminescent material, an oxide having a perovskite type crystalline structure expressed by general formula: RMO<SB>3</SB>, where R is a rare-earth element, and M is Al, Mn or Cr, and emitting ultraviolet light. <P>SOLUTION: This oxide electroluminescent element has an electroluminescent layer between electrodes facing each other. The oxide electroluminescent element is characterized in that (1) the electroluminescent layer contains the oxide having the perovskite type crystalline structure expressed by general formula: RMO<SB>3</SB>, where R is a rare-earth element, and M is Al, Mn or Cr; (2) the oxide further contains at least one kind selected from a group comprising transition metals and alkaline earth metals; and (3) light having a wavelength of 200-400 nm is emitted by applying a pulse voltage having a frequency of 0.1 to 10 kHz at electric field intensity above 10<SP>4</SP>V/cm between the electrodes to set a local maximum value of the density of a current flowing between the electrodes not smaller than 10 μA/cm<SP>2</SP>. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、酸化物電界発光素子及びその駆動方法に関する。   The present invention relates to an oxide electroluminescence device and a driving method thereof.

現行の電界発光材料は、無機系材料と有機系材料とに大別することができる。無機系の電界発光材料は、有機系の電界発光材料に比べて長期安定性に優れており、また高温等の苛酷な条件下でも発光するという利点がある。   Current electroluminescent materials can be broadly classified into inorganic materials and organic materials. Inorganic electroluminescent materials are superior in long-term stability to organic electroluminescent materials, and have the advantage of emitting light even under severe conditions such as high temperatures.

無機系の電界発光材料としては、例えば、MnをドープしたZnSが知られている(非特許文献1及び2参照)。この電界発光材料は発光素子材料として実用化されているが、黄色〜橙色の光しか発光できない。   For example, ZnS doped with Mn is known as an inorganic electroluminescent material (see Non-Patent Documents 1 and 2). This electroluminescent material has been put into practical use as a light emitting element material, but can emit only yellow to orange light.

本発明者は、従前の電界発光材料の発光色が黄色〜橙色に限定されていることに鑑み、鋭意研究の結果、ペロブスカイト型結晶構造を有する酸化物からなる、緑色の光を発光する電界発光材料を完成させている。具体的には、希土類元素をRとし、MはAl、Mn又はCrを示すものとし、一般式:RMO3で表されるペロブスカイト型結晶構造を有する酸化物である(特許文献1)。 In light of the fact that the emission color of the conventional electroluminescent material is limited to yellow to orange, the present inventor has made an electroluminescence that emits green light made of an oxide having a perovskite crystal structure as a result of earnest research. The material is completed. Specifically, the rare earth element is R, M represents Al, Mn, or Cr, and is an oxide having a perovskite crystal structure represented by a general formula: RMO 3 (Patent Document 1).

上記した緑色の光を発光する技術に加えて、黄色よりも長波長の赤色の光を得る技術が確立できれば、青色の光を発光する他の電界発光材料を組み合わせることにより光の三原色(RGB:赤、緑、青)を表すことが可能となり、これらの三原色の組み合わせにより、多用な可視波長域の光が得られる。そして、かかる技術は、ディスプレイ、照明、各種光源等の用途に応用できる点で有用である。さらに、赤色の発光が、緑色の発光が可能な前記電界発光材料から得られるのであれば、発光色ごとに異なる電界発光材料を用意する必要を減らせる点で有用性が高い。   In addition to the above-described technology for emitting green light, if a technology for obtaining red light having a wavelength longer than that of yellow can be established, the three primary colors of light (RGB: RGB) are combined by combining other electroluminescent materials that emit blue light. Red, green, and blue) can be expressed, and by combining these three primary colors, light in a wide range of visible wavelengths can be obtained. And this technique is useful at the point which can be applied to uses, such as a display, illumination, and various light sources. Furthermore, if red light emission is obtained from the electroluminescent material capable of emitting green light, it is highly useful in that the need to prepare different electroluminescent materials for each luminescent color can be reduced.

現在、本発明者は、上記課題に鑑みて鋭意研究を重ねた結果、緑色の発光が可能な前記電界発光材料において、1kHz以上の周波数のパルス電圧を印加する場合には、赤色の発光が得られるという知見を見出している。即ち、ペロブスカイト型結晶構造を有する前記電界発光材料において、印加するパルス電圧の周波数を選択することにより、緑色及び赤色の電界発光が得られることは本発明者において分かっている。   At present, as a result of intensive studies in view of the above problems, the present inventor obtained red light emission when applying a pulse voltage having a frequency of 1 kHz or higher in the electroluminescent material capable of emitting green light. The knowledge that it can be found. That is, the present inventor has found that electroluminescence of green and red can be obtained by selecting the frequency of the applied pulse voltage in the electroluminescent material having a perovskite crystal structure.

上記緑色及び赤色の発色に加えて、緑色よりも短波長の電界発光が得られれば、広い波長範囲での電界発光が可能となり、それらの発色の混合により、種々の色の可視光を得る自由度は高まる。前記電界発光材料において、紫外光(200〜400nmの光)が得られれば、紫外光は蛍光材料の励起光源として利用できるため、最終的に得られる発色の自由度は更に広がる。   In addition to the above green and red color development, if electroluminescence with a shorter wavelength than green is obtained, electroluminescence in a wide wavelength range is possible, and by mixing these color developments, the freedom to obtain visible light of various colors The degree increases. If ultraviolet light (light of 200 to 400 nm) is obtained in the electroluminescent material, since the ultraviolet light can be used as an excitation light source of the fluorescent material, the degree of freedom of color development finally obtained is further expanded.

しかしながら、前記電界発光材料をはじめ、ペロブスカイト型結晶構造を有する酸化物電界発光材料において、紫外光を取り出す技術は未だ見出されていない。
国際公開第WO2005/042669号パンフレット Y.A. Ono, Electroluminescent Displays, World Scientific, 1995, Singapore トリガー18巻3号21〜23頁(1999年)
However, a technique for extracting ultraviolet light has not yet been found in the electroluminescent materials and oxide electroluminescent materials having a perovskite crystal structure.
International Publication No. WO2005 / 042669 Pamphlet YA Ono, Electroluminescent Displays, World Scientific, 1995, Singapore Trigger Vol.18, No.3, pp.21-23 (1999)

本発明は、希土類元素をRとし、MはAl、Mn又はCrを示すものとし、一般式:RMO3で表されるペロブスカイト型結晶構造を有する酸化物を電界発光材料として含む電界発光素子であって、紫外光を発光する素子を提供することを主な目的とする。 The present invention is an electroluminescent device comprising a rare earth element as R, M representing Al, Mn or Cr, and an oxide having a perovskite crystal structure represented by a general formula: RMO 3 as an electroluminescent material. Therefore, it is a main object to provide an element that emits ultraviolet light.

本発明者は、鋭意研究を重ねた結果、上記電界発光材料を一対の電極間に挟持した電界発光層に対して、前記電極間に流れる電流密度が特定の範囲となるように前記電極間に特定のパルス電圧を印加する場合には、紫外光を得ることができることを見出し、本発明を完成するに至った。   As a result of intensive studies, the present inventor has determined that the current density flowing between the electrodes is within a specific range with respect to the electroluminescent layer in which the electroluminescent material is sandwiched between a pair of electrodes. In the case of applying a specific pulse voltage, it has been found that ultraviolet light can be obtained, and the present invention has been completed.

即ち、本発明は、下記の酸化物電界発光素子及びその駆動方法に関する。
1. 対向する電極間に電界発光層を有する酸化物電界発光素子であって、
(1)前記電界発光層は、希土類元素をRとし、MはAl、Mn又はCrを示すものとし、一般式:RMO3で表されるペロブスカイト型結晶構造を有する酸化物を含有し、
(2)前記酸化物は、遷移金属及びアルカリ土類金属からなる群から選ばれる少なくとも1種を更に含有し、
(3)前記電極間に流れる電流密度の極大値が10μA/cm2以上となるように、前記電極間に、周波数0.1Hz〜10kHzのパルス電圧を電界強度104V/cm以上で印加することにより、200〜400nmの波長の光を発光する、
ことを特徴とする電界発光素子。
2. 前記電極間に流れる電流密度の極大値が10μA/cm2以上となるように、前記電極間に、周波数0.1Hz〜1kHzのパルス電圧を電界強度105V/cm以上で印加することにより、200〜400nmの波長の光と、400nmを超え2500nm以下の光とを同時に発光する、上記項1に記載の電界発光素子。
3. 前記希土類元素Rは、Sc、Y、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb又はLuである、上記項1に記載の電界発光素子。
4. 前記遷移金属は、Ti、V、Cr、Mn、Fe、Co、Ni、Cu及びZnからなる群から選択される少なくとも1種である、上記項1に記載の電界発光素子。
5. 前記アルカリ土類金属は、Ca、Sr及びBaからなる群から選択される少なくとも1種である、上記項1に記載の電界発光素子。
6. 前記酸化物に対する前記遷移金属の含有量は、Mに対する遷移金属のモル%で表して、0.05〜2%である、上記項1に記載の電界発光素子。
7. 前記酸化物に対する前記アルカリ土類金属の含有量は、Mに対するアルカリ土類金属のモル%で表して、0.05〜2%である、上記項1に記載の電界発光素子。
8. 対向する電極の少なくとも一つは、金及びアルミニウムからなる群から選ばれる少なくとも1種を含有する、上記項1に記載の電界発光素子。
9. 対向する電極の少なくとも一つが透明である、上記項1に記載の電界発光素子。
10. 光反射層をさらに有する、上記項1に記載の電界発光素子。
11. 前記酸化物は、Ti及び/又はCaを含むYAlO3である、上記項1に記載の電界発光素子。
12. 前記酸化物は、Ti及び/又はCaを含むLaAlO3である、上記項1に記載の電界発光素子。
13. 前記電界発光素子は、電源と接続されており、前記電極と前記電源との間に、前記電界発光素子と直列に抵抗が更に接続されている、上記項1に記載の電界発光素子。
14. 対向する電極間に電界発光層を有する酸化物電界発光素子の駆動方法であって、(1)前記電界発光層は、希土類元素をRとし、MはAl、Mn又はCrを示すものとし、一般式:RMO3で表されるペロブスカイト型結晶構造を有する酸化物を含有し、
(2)前記酸化物は、遷移金属及びアルカリ土類金属からなる群から選ばれる少なくとも1種を更に含有し、
(3)前記電極間に流れる電流密度の極大値が10μA/cm2以上となるように、前記
電極間に、周波数0.1Hz〜10kHzのパルス電圧を電界強度104V/cm以上で印加することにより、200〜400nmの波長の光を発光させる、
ことを特徴とする駆動方法。
15. 前記電極間に流れる電流密度の極大値が10μA/cm2以上となるように、前記電極間に、周波数0.1Hz〜1kHzのパルス電圧を電界強度105V/cm以上で印加することにより、200〜400nmの波長の光と、400nmを超え2500nm以下の光とを同時に発光させる、上記項14に記載の駆動方法。
16. 前記酸化物は、Ti及び/又はCaを含むYAlO3である、上記項14に記載の駆動方法。
17. 前記酸化物は、Ti及び/又はCaを含むLaAlO3である、上記項14に記載の駆動方法。

以下、本発明の酸化物電界発光素子及びその駆動方法について説明する。
That is, the present invention relates to the following oxide electroluminescent element and its driving method.
1. An oxide electroluminescent device having an electroluminescent layer between opposing electrodes,
(1) The electroluminescent layer includes R as a rare earth element, M represents Al, Mn, or Cr, and includes an oxide having a perovskite crystal structure represented by a general formula: RMO 3 .
(2) The oxide further contains at least one selected from the group consisting of transition metals and alkaline earth metals,
(3) A pulse voltage having a frequency of 0.1 Hz to 10 kHz is applied between the electrodes at an electric field strength of 10 4 V / cm or more so that the maximum value of the current density flowing between the electrodes is 10 μA / cm 2 or more. By emitting light having a wavelength of 200 to 400 nm,
An electroluminescent element characterized by the above.
2. By applying a pulse voltage with a frequency of 0.1 Hz to 1 kHz at an electric field strength of 10 5 V / cm or more between the electrodes so that the maximum value of the current density flowing between the electrodes is 10 μA / cm 2 or more, Item 2. The electroluminescent device according to Item 1, wherein the device emits light having a wavelength of 200 to 400 nm and light having a wavelength of more than 400 nm and not more than 2500 nm.
3. 2. The electroluminescent element according to item 1, wherein the rare earth element R is Sc, Y, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, or Lu.
4). 2. The electroluminescent device according to item 1, wherein the transition metal is at least one selected from the group consisting of Ti, V, Cr, Mn, Fe, Co, Ni, Cu and Zn.
5. 2. The electroluminescent element according to item 1, wherein the alkaline earth metal is at least one selected from the group consisting of Ca, Sr and Ba.
6). The electroluminescence device according to Item 1, wherein the content of the transition metal with respect to the oxide is 0.05 to 2% in terms of mol% of the transition metal with respect to M.
7). The electroluminescent device according to Item 1, wherein the content of the alkaline earth metal with respect to the oxide is 0.05 to 2% in terms of mol% of the alkaline earth metal with respect to M.
8). 2. The electroluminescent element according to item 1, wherein at least one of the opposing electrodes contains at least one selected from the group consisting of gold and aluminum.
9. 2. The electroluminescent device according to item 1, wherein at least one of the opposing electrodes is transparent.
10. Item 2. The electroluminescent device according to Item 1, further comprising a light reflecting layer.
11. 2. The electroluminescent device according to item 1, wherein the oxide is YAlO 3 containing Ti and / or Ca.
12 2. The electroluminescent device according to item 1, wherein the oxide is LaAlO 3 containing Ti and / or Ca.
13. 2. The electroluminescent element according to item 1, wherein the electroluminescent element is connected to a power source, and a resistor is further connected in series with the electroluminescent element between the electrode and the power source.
14 A method for driving an oxide electroluminescent device having an electroluminescent layer between opposing electrodes, wherein (1) the electroluminescent layer is R for a rare earth element, M is Al, Mn or Cr, An oxide having a perovskite crystal structure represented by the formula: RMO 3 ;
(2) The oxide further contains at least one selected from the group consisting of transition metals and alkaline earth metals,
(3) A pulse voltage having a frequency of 0.1 Hz to 10 kHz is applied between the electrodes at an electric field strength of 10 4 V / cm or more so that the maximum value of the current density flowing between the electrodes is 10 μA / cm 2 or more. To emit light having a wavelength of 200 to 400 nm,
A driving method characterized by that.
15. By applying a pulse voltage with a frequency of 0.1 Hz to 1 kHz at an electric field strength of 10 5 V / cm or more between the electrodes so that the maximum value of the current density flowing between the electrodes is 10 μA / cm 2 or more, Item 15. The driving method according to Item 14, wherein light having a wavelength of 200 to 400 nm and light having a wavelength exceeding 400 nm and not more than 2500 nm are emitted simultaneously.
16. Item 15. The driving method according to Item 14, wherein the oxide is YAlO 3 containing Ti and / or Ca.
17. Item 15. The driving method according to Item 14, wherein the oxide is LaAlO 3 containing Ti and / or Ca.

Hereinafter, the oxide electroluminescence device of the present invention and the driving method thereof will be described.

本発明の酸化物電界発光素子は、対向する電極間に電界発光層を有し、
(1)前記電界発光層は、希土類元素をRとし、MはAl、Mn又はCrを示すものとし、一般式:RMO3で表されるペロブスカイト型結晶構造を有する酸化物を含有し、
(2)前記酸化物は、遷移金属及びアルカリ土類金属からなる群から選ばれる少なくとも1種を更に含有し、
(3)前記電極間に流れる電流密度の極大値が10μA/cm2以上となるように、前記電極間に、周波数0.1Hz〜10kHzのパルス電圧を電界強度104V/cm以上で印加することにより、200〜400nmの波長の光(紫外光)を発光する。
The oxide electroluminescent element of the present invention has an electroluminescent layer between opposed electrodes,
(1) The electroluminescent layer includes R as a rare earth element, M represents Al, Mn, or Cr, and includes an oxide having a perovskite crystal structure represented by a general formula: RMO 3 .
(2) The oxide further contains at least one selected from the group consisting of transition metals and alkaline earth metals,
(3) A pulse voltage having a frequency of 0.1 Hz to 10 kHz is applied between the electrodes at an electric field strength of 10 4 V / cm or more so that the maximum value of the current density flowing between the electrodes is 10 μA / cm 2 or more. Thus, light having a wavelength of 200 to 400 nm (ultraviolet light) is emitted.

当該電界発光層は、希土類元素をRとし、MはAl、Mn又はCrを示すものとし、一般式:RMO3で表されるペロブスカイト型結晶構造を有する酸化物を含有する。なお、当該電界発光層は、実質的に上記酸化物から形成すればよい。 The electroluminescent layer includes R as a rare earth element, M represents Al, Mn, or Cr, and contains an oxide having a perovskite crystal structure represented by a general formula: RMO 3 . Note that the electroluminescent layer may be substantially formed of the above oxide.

希土類元素Rとしては限定的ではないが、例えば、Sc、Y、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu等が挙げられる。この中でも、特にY、La、Nd及びSmが好ましい。   The rare earth element R is not limited, and examples thereof include Sc, Y, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, and Lu. Among these, Y, La, Nd, and Sm are particularly preferable.

MはAl、Mn又はCrであればよいが、この中でもAlが好ましい。   M may be Al, Mn or Cr, and among these, Al is preferable.

前記酸化物は、遷移金属及びアルカリ土類金属の少なくとも1種を更に含有する。これらの含有態様としては、希土類元素Rの一部と置換(ドープ)する形態が好ましい。遷移金属及びアルカリ土類金属の少なくとも1種を含有することにより、酸化物中で発光中心(カラーセンター)となる酸素欠陥が好適に安定化される。   The oxide further contains at least one of a transition metal and an alkaline earth metal. As these containing modes, a mode of substitution (doping) with a part of the rare earth element R is preferable. By containing at least one of a transition metal and an alkaline earth metal, oxygen defects serving as a light emission center (color center) in the oxide are preferably stabilized.

遷移金属としては限定的ではないが、例えば、Ti、V、Cr、Mn、Fe、Co、Ni、Cu及びZnからなる群から選択される少なくとも1種が好ましい。これらの中でも、Ti、Mn、Fe及びCuが好ましく、Tiがより好ましい。   Although it is not limited as a transition metal, For example, at least 1 sort (s) selected from the group which consists of Ti, V, Cr, Mn, Fe, Co, Ni, Cu, and Zn is preferable. Among these, Ti, Mn, Fe and Cu are preferable, and Ti is more preferable.

アルカリ土類金属としては限定的ではないが、例えば、Ca、Sr及びBaからなる群から選択される少なくとも1種が好ましい。これらの中でも、Ca、Srがより好ましく、Caが最も好ましい。   Although it is not limited as an alkaline-earth metal, For example, at least 1 sort (s) selected from the group which consists of Ca, Sr, and Ba is preferable. Among these, Ca and Sr are more preferable, and Ca is most preferable.

前記酸化物に対する遷移金属及び/又はアルカリ土類金属の含有量としては限定的ではないが、Mに対する遷移金属及びアルカリ土類金属の合計量をモル%で表して0.05〜2%程度が好ましく、0.1〜1.5%程度がより好ましい。   The content of the transition metal and / or alkaline earth metal with respect to the oxide is not limited, but the total amount of the transition metal and alkaline earth metal with respect to M is expressed in terms of mol%, and is about 0.05 to 2%. Preferably, about 0.1 to 1.5% is more preferable.

遷移金属及び/又はアルカリ土類金属の含有量が多すぎるときは、電界発光層における紫外〜可視域の光吸収が多くなるため、発生した紫外光が電界発光層に吸収されて発光が弱くなるおそれがある。含有量を上記範囲に設定する場合には、発光中心の安定化により紫外光が発生し易く、また電界発光層への吸収も少ないために好ましい。   When the content of the transition metal and / or alkaline earth metal is too large, light absorption in the ultraviolet to visible region in the electroluminescent layer increases, so that the generated ultraviolet light is absorbed by the electroluminescent layer and light emission is weakened. There is a fear. When the content is set within the above range, it is preferable because ultraviolet light is easily generated due to stabilization of the emission center and absorption into the electroluminescent layer is small.

前記酸化物としては、具体的に、遷移金属としてTiを含む、YAlO3(イットリウムアルミネート)、LaAlO3(ランタンアルミネート)等が好ましい。また、アルカリ土類金属としてCaを含む、YAlO3、LaAlO3も好ましい。これらの酸化物は、YAlO3又はLaAlO3の中で結晶格子を構成する3価のY又はLaの一部を4価のTi又は2価のCaで置換(ドープ)したものである。 Specifically, YAlO 3 (yttrium aluminate), LaAlO 3 (lanthanum aluminate), etc. containing Ti as a transition metal are preferable as the oxide. Further, YAlO 3 and LaAlO 3 containing Ca as an alkaline earth metal are also preferable. These oxides are obtained by substituting (doping) a part of trivalent Y or La constituting the crystal lattice in YAlO 3 or LaAlO 3 with tetravalent Ti or divalent Ca.

前記酸化物は、単結晶、多結晶又はアモルファスのいずれでもよい。単結晶酸化物は、例えば、フローティングゾーン法により合成できる。多結晶及びアモルファス酸化物は、例えば、焼結法、スパッタ法、レーザーアブレーション法、金属塩熱分解法、金属錯体熱分解法、アルコキシドを原料とするゾル−ゲル法等により合成できる。   The oxide may be single crystal, polycrystalline, or amorphous. The single crystal oxide can be synthesized by, for example, a floating zone method. Polycrystalline and amorphous oxides can be synthesized by, for example, a sintering method, a sputtering method, a laser ablation method, a metal salt pyrolysis method, a metal complex pyrolysis method, a sol-gel method using alkoxide as a raw material, and the like.

以下にフローティングゾーン法により単結晶酸化物を合成する方法を例示する。フローティングゾーン法は、酸化物の原料となる種々の粉末の焼結体を炉内に収容後、ハロゲンランプ、キセノンランプ等の加熱手段で焼結体を加熱・溶融することにより実施する。   A method for synthesizing a single crystal oxide by the floating zone method will be exemplified below. The floating zone method is carried out by storing a sintered body of various powders, which are raw materials for oxides, in a furnace and then heating and melting the sintered body with a heating means such as a halogen lamp or a xenon lamp.

例えば、YAlO3単結晶であれば、Y23粉末及びAl23粉末の混合物の焼結体をキセノンランプ、ハロゲンランプ等の加熱手段を有する赤外集光炉内で加熱・溶融するフローティングゾーン法により、好適に合成できる。 For example, in the case of a YAlO 3 single crystal, a sintered body of a mixture of Y 2 O 3 powder and Al 2 O 3 powder is heated and melted in an infrared condenser having a heating means such as a xenon lamp or a halogen lamp. It can be suitably synthesized by the floating zone method.

フローティングゾーン法の原料として用いる前記焼結体は、YAlO3の組成の焼結体でもよく、Y23とAl23が混合した状態の焼結体であってもよい。フローティングゾーン法の原料である前記焼結体を製造する際の焼結条件は特に限定されないが、焼結温度は600〜1100℃程度が好ましい。前記焼結体を製造する際の焼結時間は温度に応じて調整できるが、0.5〜24時間程度が好ましく、1〜12時間程度がより好ましい。焼結雰囲気は限定的ではなく、酸化性雰囲気(大気等)でもよく、水素を含む還元性雰囲気でもよい。 The sintered body used as a raw material for the floating zone method may be a sintered body having a composition of YAlO 3 or a sintered body in a state where Y 2 O 3 and Al 2 O 3 are mixed. Sintering conditions for producing the sintered body that is a raw material of the floating zone method are not particularly limited, but the sintering temperature is preferably about 600 to 1100 ° C. Although the sintering time at the time of manufacturing the said sintered compact can be adjusted according to temperature, about 0.5 to 24 hours are preferable and about 1 to 12 hours are more preferable. The sintering atmosphere is not limited, and may be an oxidizing atmosphere (such as air) or a reducing atmosphere containing hydrogen.

なお、焼結体を製造する際に、Y23粉末及びAl23粉末の混合物に遷移金属を含む化合物及び/又はアルカリ土類金属を含む化合物を添加することにより、遷移金属及び/又はアルカリ土類金属をドープできる。例えば、Tiをドープする場合には、TiO2を添加すればよい。また、Caをドープする場合には、CaOを添加すればよい。 In addition, when manufacturing a sintered compact, a transition metal and / or a compound containing a transition metal and / or a compound containing an alkaline earth metal are added to a mixture of Y 2 O 3 powder and Al 2 O 3 powder. Alternatively, an alkaline earth metal can be doped. For example, when doping with Ti, TiO 2 may be added. Moreover, what is necessary is just to add CaO, when doping Ca.

次いで、得られるYAlO3単結晶は、切断・研磨して薄板にすることにより電界発光層にできる。この単結晶酸化物からなる電界発光層は、電界発光効率が高く、発光強度が散乱により低下する損失が最も小さいという特性を有する。なお、ペロブスカイト型結晶構造を有する酸化物の結晶面と電界発光層の面とは、方向性の観点からは制限がない。 Next, the obtained YAlO 3 single crystal can be cut and polished into a thin plate to form an electroluminescent layer. The electroluminescent layer made of this single crystal oxide has the characteristics that the electroluminescence efficiency is high and the loss in which the emission intensity is reduced by scattering is the smallest. Note that the crystal plane of the oxide having a perovskite crystal structure and the plane of the electroluminescent layer are not limited from the viewpoint of directionality.

なお、フローティングゾーン法により得られるYAlO3単結晶を平均粒径1〜5μm程度に粉砕後、圧縮成形又は粉砕物を含むペーストを成膜・乾燥する方法でも電界発光層を作製できる。この方法では、切断・研磨では作製し難い形状の電界発光層でも容易に形成できる。ペーストに含まれる液状成分としては、例えば、トルエン、アルコール、水等を使用できる。 The electroluminescent layer can also be produced by a method in which a YAlO 3 single crystal obtained by the floating zone method is pulverized to an average particle diameter of about 1 to 5 μm, and then a paste containing compression molding or pulverized material is formed and dried. In this method, even an electroluminescent layer having a shape difficult to produce by cutting and polishing can be easily formed. As a liquid component contained in the paste, for example, toluene, alcohol, water or the like can be used.

以下に焼結法により多結晶酸化物を合成する方法を例示する。この方法は、酸化物の原料となる種々の粉末を原料として、粉砕、圧縮、焼結を行うことにより実施する。   Hereinafter, a method for synthesizing a polycrystalline oxide by a sintering method will be exemplified. This method is carried out by performing pulverization, compression, and sintering using various powders as raw materials for oxides as raw materials.

例えば、LaAlO3多結晶であれば、La23粉末及びAl23粉末の混合物をボールミルで粉砕してスラリー化し、乾燥、再粉砕後、圧縮して作製したペレットを炉内で焼結することにより、好適に合成できる。 For example, in the case of LaAlO 3 polycrystal, a mixture of La 2 O 3 powder and Al 2 O 3 powder is pulverized by a ball mill to form a slurry, dried, re-pulverized and then compressed and sintered in a furnace. By doing so, it can be suitably synthesized.

なお、焼結体を製造する際に、Y23粉末及びAl23粉末の混合物に遷移金属を含む化合物及び/又はアルカリ土類金属を含む化合物を添加することにより、遷移金属及び/又はアルカリ土類金属をドープできる。例えば、Tiをドープする場合には、TiO2を添加すればよい。また、Caをドープする場合には、CaOを添加すればよい。 In addition, when manufacturing a sintered compact, a transition metal and / or a compound containing a transition metal and / or a compound containing an alkaline earth metal are added to a mixture of Y 2 O 3 powder and Al 2 O 3 powder. Alternatively, an alkaline earth metal can be doped. For example, when doping with Ti, TiO 2 may be added. Moreover, what is necessary is just to add CaO, when doping Ca.

焼結条件は特に限定されないが、焼結温度は1400〜1800℃程度が好ましい。焼結時間は温度条件(昇温速度等)に応じて調整できるが、0.5〜24時間程度が好ましく、1〜12時間程度がより好ましい。焼結雰囲気は限定的ではなく、酸化性雰囲気(大気等)でもよく、水素を含む還元性雰囲気でもよい。   Although sintering conditions are not specifically limited, As for sintering temperature, about 1400-1800 degreeC is preferable. Although sintering time can be adjusted according to temperature conditions (temperature rising rate etc.), about 0.5 to 24 hours are preferable and about 1 to 12 hours are more preferable. The sintering atmosphere is not limited, and may be an oxidizing atmosphere (such as air) or a reducing atmosphere containing hydrogen.

次いで、得られるLaAlO3多結晶は、例えば、平均粒径1〜5μm程度に粉砕後、圧縮成形又は粉砕物を含むペーストを成膜・乾燥する方法により電界発光層にできる。この焼結法は、比較的簡単な方法で不純物量の少ない電界発光層が得られるため好ましい。 Next, the obtained LaAlO 3 polycrystal can be formed into an electroluminescent layer by, for example, compressing or forming a paste containing a pulverized product after pulverization to an average particle size of about 1 to 5 μm. This sintering method is preferable because an electroluminescent layer with a small amount of impurities can be obtained by a relatively simple method.

電界発光層の厚みは特に限定されないが、0.005〜0.5mm程度が好ましく、0.01〜0.1mm程度がより好ましい。   Although the thickness of an electroluminescent layer is not specifically limited, About 0.005-0.5 mm is preferable and about 0.01-0.1 mm is more preferable.

電界発光層の電気伝導性は、10-6〜1S/cm程度が好ましく、10-5〜0.1S/cm程度がより好ましい。電界発光層の電気伝導性は、例えば、前記酸化物に含まれる遷移金属及び/又はアルカリ土類金属の濃度を制御することにより調整する。なお、これらの濃度は、紫外光の取り出し効率を低下させない限度で調整することが望ましい。 The electric conductivity of the electroluminescent layer is preferably about 10 −6 to 1 S / cm, and more preferably about 10 −5 to 0.1 S / cm. The electrical conductivity of the electroluminescent layer is adjusted, for example, by controlling the concentration of transition metal and / or alkaline earth metal contained in the oxide. It is desirable to adjust these concentrations as long as the ultraviolet light extraction efficiency is not lowered.

電界発光層は、対向する電極間に挟持されている。電極は特に限定されず、公知の電界発光素子に用いられる電極(陽極及び陰極)を使用できる。   The electroluminescent layer is sandwiched between the opposing electrodes. An electrode is not specifically limited, The electrode (anode and cathode) used for a well-known electroluminescent element can be used.

陽極としては、仕事関数の大きい材料が好ましい。具体的には、金、白金等の金属;インジウム−スズ酸化物(ITO)等の透明金属酸化物などが挙げられる。この中でも、金が好ましい。   As the anode, a material having a high work function is preferable. Specific examples include metals such as gold and platinum; and transparent metal oxides such as indium-tin oxide (ITO). Among these, gold is preferable.

上記金は、酸化等の変化が実質的になく、陽極として電界発光層表面に均一な薄膜状に形成し易い。また、金薄膜電極は光を良く反射するため、電界発光層から発生する光を金薄膜電極に反射させて外部に取り出す場合に、反射効率が高い。金薄膜電極は、例えば、DCスパッタリング法により形成する。この方法は、比較的穏やかな条件で且つ短時間で電極形成できるため、電界発光層を厳しい酸化還元条件下に晒すことがないため、電極薄膜形成時に電界発光層に物性変化が生じて発光を阻害するおそれが殆どない。   The gold is substantially free from changes such as oxidation and is easily formed as a uniform thin film on the surface of the electroluminescent layer as an anode. Further, since the gold thin film electrode reflects light well, the reflection efficiency is high when light generated from the electroluminescent layer is reflected by the gold thin film electrode and taken out to the outside. The gold thin film electrode is formed by, for example, DC sputtering. This method allows electrodes to be formed under relatively mild conditions and in a short time, so that the electroluminescent layer is not exposed to severe redox conditions. There is almost no risk of obstruction.

他方、上記ITOは、透明性であるため、ITO電極を通して発光を取り出せるという利点がある。しかしながら、ITOは金と比較して薄膜成形が困難な場合があり、短絡や仕事関数の不均一化が生じるおそれがある。形成方法も、DCスパッタリングではなく、RFスパッタリングや真空蒸着等の方法が必要である。また、その際、ITOは酸化物であるため、酸化還元条件を適切に管理する必要がある。更に、金薄膜作製条件と比較して、厳しい条件に晒すことが多いため、条件によっては、ITO電極薄膜形成中に電界発光層の物性変化が生じて発光し難くなるおそれがある。   On the other hand, since the ITO is transparent, there is an advantage that light emission can be extracted through the ITO electrode. However, ITO may be difficult to form a thin film as compared with gold, and there is a risk of short circuit and non-uniform work function. The forming method is not DC sputtering but RF sputtering, vacuum deposition, or the like. Moreover, since ITO is an oxide in that case, it is necessary to manage oxidation-reduction conditions appropriately. Furthermore, since it is often exposed to strict conditions as compared with the gold thin film production conditions, depending on the conditions, there is a possibility that the physical property change of the electroluminescent layer occurs during the formation of the ITO electrode thin film, making it difficult to emit light.

陰極としては、仕事関数の小さい材料が好ましい。具体的には、カルシウム、ナトリウ
ム、マグネシウム、アルミニウム等の金属が好ましい。マグネシウムは、銀又はインジウムとの合金(例えば、共蒸着により得られる)又は混合物として用いることが、耐酸化性及び電界発光層との密着性の観点から好ましい。アルミニウムは、カルシウム、ナトリウム及びマグネシウムと比較して、大気中で酸化され難いため、経時的安定性を考慮すると最も実用的である。また、アルミニウムは光を良く反射する点、真空蒸着などの穏やかな条件において均一な薄膜を形成し易い点などからも好ましい。
As the cathode, a material having a small work function is preferable. Specifically, metals such as calcium, sodium, magnesium, and aluminum are preferable. Magnesium is preferably used as an alloy (for example, obtained by co-evaporation) or a mixture with silver or indium from the viewpoint of oxidation resistance and adhesion to the electroluminescent layer. Aluminum is most practical in consideration of stability over time because it is less oxidized in the atmosphere than calcium, sodium and magnesium. Aluminum is also preferable because it reflects light well and can easily form a uniform thin film under mild conditions such as vacuum deposition.

上記陽極と陰極との組み合わせとしては、例えば、金とアルミニウムとの組み合わせが好ましいものとして挙げられる。   As a combination of the anode and the cathode, for example, a combination of gold and aluminum is preferable.

電極の厚みは限定的ではないが、通常は20〜1000nm程度が好ましく、50〜500nm程度がより好ましい。   Although the thickness of an electrode is not limited, Usually, about 20-1000 nm is preferable and about 50-500 nm is more preferable.

電界発光素子の構造としては、下部電極/電界発光層/抵抗/上部電極の積層体が最も簡単な構造である。下部電極又は上部電極のいずれかを陽極又は陰極とする。また、発光を取り出す側(少なくとも一方)の電極は、透明が好ましい。透明には、発光を取り出せる限り、半透明が含まれる。その他、櫛形不透明電極を用いることにより発光を取り出してもよい。   As the structure of the electroluminescent element, a laminate of a lower electrode / electroluminescent layer / resistance / upper electrode is the simplest structure. Either the lower electrode or the upper electrode is used as an anode or a cathode. The electrode on the side from which light emission is extracted (at least one) is preferably transparent. Transparency includes translucency as long as light emission can be extracted. In addition, light emission may be extracted by using a comb-shaped opaque electrode.

電界発光素子は、必要に応じて、補助層(絶縁層など)、基板等を有してもよい。次に、電界発光素子の具体的な構造を挙げる。
1)下部電極/絶縁層/電界発光層/抵抗/透明上部電極からなる構造、
2)ガラス基板/透明下部電極/電界発光層/抵抗/透明上部電極からなる構造、
3)(プラスチック、セラミックス等の基板)/下部電極/電界発光層/抵抗/透明上部電極からなる構造。
The electroluminescent element may include an auxiliary layer (such as an insulating layer), a substrate, and the like as necessary. Next, a specific structure of the electroluminescent element is given.
1) Structure consisting of lower electrode / insulating layer / electroluminescent layer / resistance / transparent upper electrode,
2) Structure consisting of glass substrate / transparent lower electrode / electroluminescent layer / resistance / transparent upper electrode,
3) Structure consisting of (substrate of plastic, ceramics, etc.) / Lower electrode / electroluminescent layer / resistance / transparent upper electrode.

上記1)では、絶縁破壊を防止するための絶縁層を有する。発光は、透明上部電極を通して取り出せる。   The above 1) has an insulating layer for preventing dielectric breakdown. The emitted light can be extracted through the transparent upper electrode.

上記2)では、ガラス基板及び両電極が透明であり、電界発光層の両側から発光が取り出せる。   In 2) above, the glass substrate and both electrodes are transparent, and light emission can be extracted from both sides of the electroluminescent layer.

上記3)の構造では、不透明基板を有する。発光は、透明上部電極を通して取り出せる。   The structure 3) has an opaque substrate. The emitted light can be extracted through the transparent upper electrode.

なお、電界発光素子の構造は、上記に限定されず、基板上に形成された下部電極の上に、電界発光層と上部電極とを複数組積層した構造なども挙げられる。   Note that the structure of the electroluminescent element is not limited to the above, and includes a structure in which a plurality of sets of electroluminescent layers and upper electrodes are stacked on the lower electrode formed on the substrate.

前記絶縁層は、過大電流による絶縁破壊を防止するものであり、電界発光層と上部電極との間、並びに、電界発光層と下部電極との間、の一方又は両方に設置できる。   The insulating layer prevents dielectric breakdown due to an excessive current, and can be placed between one or both of the electroluminescent layer and the upper electrode and between the electroluminescent layer and the lower electrode.

絶縁層の材質は、絶縁効果が得られる限り特に限定されない。例えば、SiO2、SiON、Al23、Si34、SiAlON、Y23、BaTiO3、Sm23、Ta25、BaTa26、PbNb26、Sr(Zr,Ti)O3、SrTiO3、PbTiO3、HfO3等が挙げられる。これらを複合した絶縁性セラミックスも使用できる。 The material of the insulating layer is not particularly limited as long as an insulating effect can be obtained. For example, SiO 2, SiON, Al 2 O 3, Si 3 N 4, SiAlON, Y 2 O 3, BaTiO 3, Sm 2 O 3, Ta 2 O 5, BaTa 2 O 6, PbNb 2 O 6, Sr (Zr , Ti) O 3 , SrTiO 3 , PbTiO 3 , HfO 3 and the like. Insulating ceramics combining these can also be used.

絶縁層の厚さは、絶縁性が得られる限り薄いことが望ましい。通常は50〜800nm程度が好ましく、100〜400nm程度がより好ましい。   The thickness of the insulating layer is desirably thin as long as insulation can be obtained. Usually, about 50-800 nm is preferable and about 100-400 nm is more preferable.

電界発光素子は、光反射層をさらに有することが好ましい。光反射層は、通常は発光を取り出す側とは反対側に設ける。光反射層を設けることによって、発光に指向性が生じ、光の強度(輝度)が高まる。光反射層としては、例えば、アルミニウム、銀、金等の光輝性材料のほか、高屈折率を有する透明性材料が使用できる。光反射層の厚さは限定的ではないが、反射効率の観点から、100nm以上、特に200nm以上が好ましい。   The electroluminescent element preferably further includes a light reflecting layer. The light reflecting layer is usually provided on the side opposite to the side from which emitted light is extracted. By providing the light reflecting layer, directivity is generated in light emission, and the intensity (luminance) of light is increased. As the light reflecting layer, for example, a transparent material having a high refractive index can be used in addition to a glittering material such as aluminum, silver, and gold. The thickness of the light reflecting layer is not limited, but is preferably 100 nm or more, particularly 200 nm or more from the viewpoint of reflection efficiency.

上記電界発光素子は、(1)電極間に流れる電流密度の極大値が10μA/cm2以上となるように、電極間に、周波数0.1Hz〜10kHzのパルス電圧を電界強度104V/cm以上で印加することにより、200〜400nmの紫外光を発光する。また、上記電界発光素子は、(2)電極間に流れる電流密度の極大値が10μA/cm2以上となるように、電極間に、周波数0.1Hz〜1kHzのパルス電圧を電界強度105V/cm以上で印加することにより、200〜400nmの紫外光と、400nmを超え2500nm以下の光(可視〜近赤外光)とを同時に発光する。 It said electroluminescent device (1) as the maximum value of the current density flowing between the electrodes is 10 .mu.A / cm 2 or more, between the electrodes, the frequency 0.1Hz~10kHz pulse voltage electric field strength 10 4 V / cm By applying as described above, ultraviolet light of 200 to 400 nm is emitted. Further, the electroluminescent device (2) as the maximum value of the current density flowing between the electrodes is 10 .mu.A / cm 2 or more, between the electrodes, the electric field strength 10 5 V pulse voltage having a frequency 0.1Hz~1kHz By applying at / cm or more, 200 to 400 nm ultraviolet light and light exceeding 400 nm and 2500 nm or less (visible to near infrared light) are simultaneously emitted.

上記(1)、(2)のいずれの場合でも、電極間に流れる電流密度の極大値は、10μA/cm2(0.01mA/cm2)以上に設定すればよいが、0.1mA/cm2以上が好ましく、1mA/cm2以上がより好ましい。なお、上記電流密度の極大値は、パルス電圧の印加時に電極間に瞬間的に流れる電流密度の極大値を言う。 In any of the cases (1) and (2), the maximum value of the current density flowing between the electrodes may be set to 10 μA / cm 2 (0.01 mA / cm 2 ) or more. 2 or more is preferable, and 1 mA / cm 2 or more is more preferable. The maximum value of the current density refers to the maximum value of the current density that instantaneously flows between the electrodes when a pulse voltage is applied.

上記(1)の場合には、周波数0.1Hz〜10kHzのパルス電圧を電界強度104V/cm以上で印加する。周波数は0.1Hz〜1kHzであれば好ましく、1Hz〜1kHzであればより好ましい。電界強度は104V/cm以上であればよいが、105V/cm以上であれば好ましく、106V/cm以上であればより好ましい。かかる条件でパルス電圧を印加することにより、波長200〜400nmの紫外光が得られる。 In the case of (1) above, a pulse voltage having a frequency of 0.1 Hz to 10 kHz is applied at an electric field strength of 10 4 V / cm or more. The frequency is preferably 0.1 Hz to 1 kHz, and more preferably 1 Hz to 1 kHz. The electric field strength may be 10 4 V / cm or more, preferably 10 5 V / cm or more, and more preferably 10 6 V / cm or more. By applying a pulse voltage under such conditions, ultraviolet light having a wavelength of 200 to 400 nm can be obtained.

上記(2)の場合には、周波数0.1Hz〜1kHzのパルス電圧を電界強度105V/cm以上で印加する。周波数は0.1Hz〜100Hzであれば好ましく、1Hz〜100Hzであればより好ましい。電界強度は105V/cm以上であればよいが、5×105V/cm以上であれば好ましく、106V/cm以上であればより好ましい。かかる条件でパルス電圧を印加することにより、波長200〜400nmの紫外光と、400nmを超え2500nm以下の光(例えば、410〜2500nm)(可視〜近赤外光)とが同時に得られる。 In the case of (2) above, a pulse voltage having a frequency of 0.1 Hz to 1 kHz is applied at an electric field strength of 10 5 V / cm or more. The frequency is preferably 0.1 Hz to 100 Hz, and more preferably 1 Hz to 100 Hz. Field strength may be at 10 5 V / cm or more, but preferably as long as 5 × 10 5 V / cm or more, more preferably equal to 10 6 V / cm or more. By applying a pulse voltage under such conditions, ultraviolet light having a wavelength of 200 to 400 nm and light of more than 400 nm and not more than 2500 nm (for example, 410 to 2500 nm) (visible to near infrared light) can be obtained simultaneously.

パルス電圧を発生させる電源は限定されず、例えば、上記周波数でパルス電圧を印加し得るバイポーラー電源が使用できる。   The power source for generating the pulse voltage is not limited, and for example, a bipolar power source that can apply the pulse voltage at the above frequency can be used.

パルス電圧の波形は限定的ではないが、パイポーラーの矩形波に電圧印加のない緩和時間を加えた波形(バイポーラー対称駆動波形)が好ましい。つまり、経時的に印加電圧をゼロ→正(一定値、一定時間)→ゼロ(緩和時間)→負(一定値、一定時間)→ゼロ(緩和時間)と周期的に変化させることが好ましい。正負電圧印加時間と緩和時間は、パルス電圧の周波数によって変わる。この波形を用いる場合には、パルス電圧がゼロから正負の極大値まで急峻に立ち上がる(又は落ち込む)ため、電極から電界発光層へのキャリア注入が起こり易い。また、緩和時間において電界発光層が放冷されて過度の温度上昇を抑制し易い。これにより、強い紫外発光と紫外・近赤外発光とが同時に得られ易いのであると考えられる。他方、緩和時間のない矩形波や急峻な電圧変化のないサイン波又は三角波を用いる場合には、バイポーラー対称駆動波形を用いる場合に比して、発光特性が弱くなる傾向がある。また、バイポーラー電源を用いてパルス電圧を印加する場合には、対向電極の両方が陽極としても陰極としても働いている可能性がある。   Although the waveform of the pulse voltage is not limited, a waveform (bipolar symmetric drive waveform) obtained by adding a relaxation time without voltage application to a rectangular rectangular wave is preferable. That is, it is preferable to change the applied voltage periodically over time from zero → positive (constant value, constant time) → zero (relaxation time) → negative (constant value, constant time) → zero (relaxation time). The positive / negative voltage application time and the relaxation time vary depending on the frequency of the pulse voltage. When this waveform is used, since the pulse voltage rises (or drops) steeply from zero to a positive and negative maximum value, carrier injection from the electrode to the electroluminescent layer is likely to occur. In addition, the electroluminescent layer is allowed to cool during the relaxation time, and an excessive temperature rise is easily suppressed. Thereby, it is considered that strong ultraviolet light emission and ultraviolet / near infrared light emission can be easily obtained at the same time. On the other hand, when a rectangular wave with no relaxation time or a sine wave or triangular wave without a steep voltage change is used, the light emission characteristics tend to be weaker than when a bipolar symmetric drive waveform is used. In addition, when a pulse voltage is applied using a bipolar power supply, both of the counter electrodes may function as both an anode and a cathode.

なお、電極と電源との間には、電界発光素子と直列に抵抗を接続することが好ましい。
電界発光層から紫外光を取り出すためには、電界発光層に電流が流れることが必要である。このとき、比較的低い電圧を印加する場合には、抵抗を直列に接続しなくても、電界発光層が破損する危険は少ない。他方、比較的高い電圧を印加する場合には、電界発光層に過大な電流が流れ、大きなジュール熱のために電界発光層が破損するおそれがある。よって、特に高電圧を印加する場合には、直列に抵抗を接続する必要がある。
Note that a resistor is preferably connected in series with the electroluminescent element between the electrode and the power source.
In order to extract ultraviolet light from the electroluminescent layer, it is necessary that a current flow through the electroluminescent layer. At this time, when a relatively low voltage is applied, there is little risk of damage to the electroluminescent layer without connecting resistors in series. On the other hand, when a relatively high voltage is applied, an excessive current flows through the electroluminescent layer, and the electroluminescent layer may be damaged due to a large Joule heat. Therefore, in particular, when a high voltage is applied, it is necessary to connect a resistor in series.

また、抵抗を直列に接続することは、電界発光層の保護以外にも利点がある。即ち、抵抗を接続することによって、紫外光が発生し易くなると考えられる。つまり、抵抗を直列に接続することにより、電極間にパルス電圧を印加した際に電界発光層と抵抗とが一体にコンデンサーのように作用し、抵抗を接続しない場合に比べて多くの電荷を蓄積・放出し、大きな電界が電界発光層に印加され、それ故、紫外光を発生させ易くなると考えられる。   Further, connecting the resistors in series is advantageous in addition to protecting the electroluminescent layer. That is, it is considered that ultraviolet light is easily generated by connecting a resistor. In other words, by connecting resistors in series, the electroluminescent layer and the resistor work together like a capacitor when a pulse voltage is applied between the electrodes, and accumulate more charge than when no resistor is connected. -It is believed that it emits and a large electric field is applied to the electroluminescent layer, thus making it easier to generate ultraviolet light.

上記抵抗の好適な大きさは、電界発光層の材質、厚さ等によって異なるが、例えば、電界発光層がYAlO3、LaAlO3等であって、直径2〜3mm、厚さ0.1〜0.3mmの円盤状である場合には、抵抗値は次のように設定することが望ましい。即ち、上記(1)の場合には、1Ω〜1MΩ(好ましくは10Ω〜100kΩ、より好ましくは10Ω〜10kΩ)の抵抗を直列に接続することが望ましい。また、上記(2)の場合には、1Ω〜100kΩ(好ましくは1Ω〜10kΩ、より好ましくは1Ω〜1kΩ)の抵抗を直列に接続することが望ましい。なお、接続する抵抗が1Ωより小さい場合又は抵抗を接続しない場合であっても、微弱にはなるが発光は観測される。 The preferred magnitude of the resistance varies depending on the material, thickness, etc. of the electroluminescent layer. For example, the electroluminescent layer is YAlO 3 , LaAlO 3, etc., and has a diameter of 2-3 mm and a thickness of 0.1-0. In the case of a 3 mm disk, the resistance value is desirably set as follows. That is, in the case of the above (1), it is desirable to connect a resistance of 1Ω to 1MΩ (preferably 10Ω to 100 kΩ, more preferably 10Ω to 10 kΩ) in series. In the case of (2) above, it is desirable to connect a resistance of 1Ω to 100 kΩ (preferably 1Ω to 10 kΩ, more preferably 1Ω to 1 kΩ) in series. Even when the connected resistance is smaller than 1Ω or when no resistance is connected, light emission is observed although it is weak.

上記駆動条件によって、電界発光層から紫外光(及び可視〜近赤外光)が発生する機構については明らかではないが、次のように考えられる。   The mechanism by which ultraviolet light (and visible to near-infrared light) is generated from the electroluminescent layer depending on the driving conditions is not clear, but is considered as follows.

つまり、発明者らが従来明らかにしてきたような、可視光のみを得る駆動条件では、パルス電圧印加時に、電界発光層に電流は流れていないと考えられる。即ち、可視光のみを得る場合には、高電圧によって加速されたキャリヤ(電子や正孔)が、電界発光層中の発光中心に衝突し、発光中心が励起され、その後基底状態に戻る際に発光が生じているものと考えられる。   That is, it is considered that no current flows through the electroluminescent layer when a pulse voltage is applied under the driving conditions for obtaining only visible light as has been clarified by the inventors. That is, when only visible light is obtained, carriers (electrons and holes) accelerated by a high voltage collide with the emission center in the electroluminescent layer, the emission center is excited, and then returns to the ground state. It is considered that light emission has occurred.

これに対して、紫外光が発生する場合には、電極から電界発光層中へと、キャリヤ(電子や正孔)が注入され、電界発光層中で電子−正孔対が形成され、次いで電子と正孔が再結合する際に電界発光層中の発光中心を励起し、発光が生じることが考えられる。紫外光が生じる駆動条件をもとにして、印加電圧を高めていくと、発生する紫外光強度が強まり、それに加えて、可視〜近赤外光が同時に発生するようになる。この現象の原因として、例えば、発生した紫外光が、蛍光体である電界発光層を励起し、その結果、電界発光層が、可視〜近赤外波長域の蛍光を発生した可能性が考えられる。   On the other hand, when ultraviolet light is generated, carriers (electrons and holes) are injected from the electrode into the electroluminescent layer to form electron-hole pairs in the electroluminescent layer, and then electrons. It is conceivable that light emission is generated by exciting the light emission center in the electroluminescent layer when recombination with holes. When the applied voltage is increased based on the driving conditions for generating ultraviolet light, the generated ultraviolet light intensity increases, and in addition, visible to near-infrared light is generated simultaneously. As a cause of this phenomenon, for example, the generated ultraviolet light may excite the electroluminescent layer that is a phosphor, and as a result, the electroluminescent layer may generate fluorescence in the visible to near-infrared wavelength region. .

また、パルス電圧印加で発生する紫外光、あるいは、紫外光および可視〜近赤外光は、一概には言えないが、比較的、パルス電圧が低周波数、高電圧で、接続する抵抗が低抵抗の場合に強く、高周波数、低電圧、高抵抗の場合に弱いという傾向がある。パルス電圧の周波数が低い場合には、パルス電圧が極大値で印加されている比較的長い時間が、電界発光層中へのキャリヤ注入とそれに続く発光までに要する時間に対して、相対的に適切であったのではないかと考えられる。また、パルス電圧の周波数が低い場合には、電圧が印加されない時間も長くなることから、電圧印加時にジュール熱によって上昇した電界発光層の温度を、次の周期のパルス電圧印加直前までに十分に下げるためにも有利と考えられ、そのような比較的長時間の放冷過程が、強い電界発光を生じさせるために作用した可能性が考えられる。   In addition, ultraviolet light generated by applying a pulse voltage, or ultraviolet light and visible to near-infrared light cannot be generally described, but the pulse voltage is relatively low frequency and high voltage, and the connected resistance is low resistance. Tend to be strong, and weak when high frequency, low voltage, high resistance. When the frequency of the pulse voltage is low, the relatively long time during which the pulse voltage is applied at the maximum value is relatively appropriate for the time required for carrier injection into the electroluminescent layer and subsequent light emission. It is thought that it was. In addition, when the frequency of the pulse voltage is low, the time during which the voltage is not applied becomes long, so that the temperature of the electroluminescent layer that has risen due to Joule heat at the time of voltage application is sufficiently increased until immediately before the pulse voltage of the next period is applied. It is thought that it is advantageous for lowering, and such a relatively long cooling process may have acted to generate strong electroluminescence.

本発明の電界発光素子は、電界発光素子に作用させる印加周波数を変えることにより、紫外光(波長200〜400nm)及び可視〜近赤外光(波長400〜2500nm)の同時発光が得られる。即ち、駆動条件を選ぶことにより、同一の酸化物からなる電界発光素子において、赤色、緑色に加えて紫外光、さらに、紫外光と可視〜近赤外光を発生することができる。   In the electroluminescent element of the present invention, simultaneous emission of ultraviolet light (wavelength 200 to 400 nm) and visible to near infrared light (wavelength 400 to 2500 nm) can be obtained by changing the applied frequency applied to the electroluminescent element. That is, by selecting the driving conditions, in the electroluminescent device made of the same oxide, in addition to red and green, ultraviolet light, further ultraviolet light and visible to near infrared light can be generated.

当該紫外光は、各種蛍光体の励起光源としても用いることができる。例えば、本発明の電界発光素子を多数配列し、適当な蛍光体と組み合わせたディスプレイパネルを作製し、個々の電界発光素子に対して駆動条件の制御を行うことにより、多様な波長域の光をディスプレイパネルから取り出すことができる。   The ultraviolet light can also be used as an excitation light source for various phosphors. For example, a large number of electroluminescent elements of the present invention are arranged, a display panel combined with an appropriate phosphor is manufactured, and driving conditions are controlled for each electroluminescent element, so that light in various wavelength ranges can be obtained. Can be removed from the display panel.

以下に実施例を示して本発明を説明する。但し、本発明は実施例に限定されない。   The present invention will be described below with reference to examples. However, the present invention is not limited to the examples.

実施例1
フローティングゾーン法により、1%(Alに対するTiのモル%)チタンドープしたYAlO3単結晶(黄褐色半透明)を得た。
Example 1
1% (mol% of Ti with respect to Al) titanium-doped YAlO 3 single crystal (yellowish brown translucent) was obtained by the floating zone method.

前記単結晶を切断・研磨し、直径約2.9mm、厚さ0.137mmの円形薄板を得た。   The single crystal was cut and polished to obtain a circular thin plate having a diameter of about 2.9 mm and a thickness of 0.137 mm.

前記円形薄板の片面全部に、真空蒸着法により、厚さ150nmのアルミニウム電極層(陰極)を形成した。陰極形成面とは逆面の半分に、DCスパッタリング法により、厚さ75nmの半円状金電極層(陽極)を形成した。これにより、電界発光素子を作製した。   An aluminum electrode layer (cathode) having a thickness of 150 nm was formed on one side of the circular thin plate by a vacuum deposition method. A semicircular gold electrode layer (anode) having a thickness of 75 nm was formed on the half of the surface opposite to the cathode formation surface by DC sputtering. This produced the electroluminescent element.

電界発光素子の陰極及び陽極に白金線を接続し、末端をバイポーラー電源に接続した。バイポーラー電源と陰極(陽極でもよい)との間には、100Ωの抵抗を直列接続した。   A platinum wire was connected to the cathode and anode of the electroluminescent element, and the end was connected to a bipolar power source. A 100Ω resistor was connected in series between the bipolar power source and the cathode (which may be the anode).

バイポーラー電源から、電界強度±4.4×106V/m、1kHzの周波数のパルス電圧を電界発光素子に印加したところ、波長290〜430nmの範囲に数本の強い発光が現れ、ピーク波長は336nmであった。また、波長220〜250nm及び760〜780nmに数本の弱い発光が見られた。パルス電圧印加時に、前記電極間に流れた電流密度の極大値は1mA/cm2以上であった。 When a pulse voltage having a frequency of ± 4.4 × 10 6 V / m and 1 kHz is applied to the electroluminescent element from a bipolar power source, several intense light emission appears in the wavelength range of 290 to 430 nm, and the peak wavelength Was 336 nm. Moreover, several weak light emission was seen in wavelength 220-250nm and 760-780nm. When a pulse voltage was applied, the maximum value of the current density flowing between the electrodes was 1 mA / cm 2 or more.

ここで、パルス電圧の波形としては、バイポーラーの矩形波に電圧印加のない緩和時間を加えた波形(バイポーラー対称駆動波形)を用いた。つまり、経時的に印加電圧をゼロ→正(一定値、一定時間)→ゼロ(緩和時間)→負(一定値、一定時間)→ゼロ(緩和時間)と周期的に変化させた。正負電圧印加時間と緩和時間は、パルス電圧の周波数によって変わる。また、パルス電圧の波形として、緩和時間のない矩形波、サイン波又は三角波を用いた場合には、弱い紫外発光が見られた。   Here, as the pulse voltage waveform, a waveform obtained by adding a relaxation time without voltage application to a bipolar rectangular wave (bipolar symmetric drive waveform) was used. That is, the applied voltage was periodically changed from zero to positive (constant value, constant time) → zero (relaxation time) → negative (constant value, constant time) → zero (relaxation time) over time. The positive / negative voltage application time and the relaxation time vary depending on the frequency of the pulse voltage. In addition, when a rectangular wave, sine wave or triangular wave having no relaxation time was used as the pulse voltage waveform, weak ultraviolet light emission was observed.

発光波長(nm)と発光強度(任意単位)との関係を図1に示す。   The relationship between the emission wavelength (nm) and the emission intensity (arbitrary unit) is shown in FIG.

実施例2
実施例1と同様に、1%(Alに対するTiのモル%)チタンドープしたYAlO3単結晶の、直径約2.9mm、厚さ0.137mmの円形薄板を作製し、厚さ150nmのアルミニウム電極層(陰極)および厚さ75nmの半円状金電極層(陽極)を形成し、電界発光素子を作製した。
Example 2
As in Example 1, a circular thin plate having a diameter of about 2.9 mm and a thickness of 0.137 mm made of a YAlO 3 single crystal doped with 1% (mol% of Ti with respect to Al) was prepared, and an aluminum electrode having a thickness of 150 nm was prepared. A layer (cathode) and a semicircular gold electrode layer (anode) having a thickness of 75 nm were formed to produce an electroluminescent device.

電界発光素子の陰極及び陽極に白金線を接続し、末端をバイポーラー電源に接続した。バイポーラー電源と陰極又は陽極との間には、1kΩの抵抗を直列接続した。   A platinum wire was connected to the cathode and anode of the electroluminescent element, and the end was connected to a bipolar power source. A 1 kΩ resistor was connected in series between the bipolar power source and the cathode or anode.

バイポーラー電源から、電界強度±3.7×106V/m、50Hzの周波数のパルス電圧を電界発光素子に印加したところ、波長290〜430nmの範囲に数本の強い発光が現れ、ピーク波長は338nmであった。また、波長515〜555nm、760〜780nmに数本のやや強い発光、波長220〜250nmに弱い発光が見られた。更に、波長430〜800nmに、弱いが幅広い発光が見られた。パルス電圧印加時に、前記電極間に流れた電流密度の極大値は1mA/cm2以上であった。 When a pulse voltage having an electric field intensity of ± 3.7 × 10 6 V / m and a frequency of 50 Hz is applied to the electroluminescent element from a bipolar power source, several intense light emission appears in the wavelength range of 290 to 430 nm, and the peak wavelength Was 338 nm. Moreover, several moderately strong light emission was observed at wavelengths 515-555 nm and 760-780 nm, and weak light emission was observed at wavelengths 220-250 nm. Furthermore, a wide range of light emission was observed at a wavelength of 430 to 800 nm. When a pulse voltage was applied, the maximum value of the current density flowing between the electrodes was 1 mA / cm 2 or more.

ここで、パルス電圧の波形としては、実施例1と同様にバイポーラー対称駆動波形を用いた。また、パルス電圧の波形として、緩和時間のない矩形波、サイン波又は三角波を用いた場合には、弱い紫外発光が見られた。   Here, as the waveform of the pulse voltage, a bipolar symmetric drive waveform was used as in the first embodiment. In addition, when a rectangular wave, sine wave or triangular wave having no relaxation time was used as the pulse voltage waveform, weak ultraviolet light emission was observed.

発光波長(nm)と発光強度(任意単位)との関係を図2に示す。   FIG. 2 shows the relationship between the emission wavelength (nm) and the emission intensity (arbitrary unit).

実施例3
実施例1と同様に、1%(Alに対するTiのモル%)チタンドープしたYAlO3単結晶の、直径約2.9mm、厚さ0.137mmの円形薄板を作製し、厚さ150nmのアルミニウム電極層(陰極)および厚さ75nmの半円状金電極層(陽極)を形成し、電界発光素子を作製した。
Example 3
As in Example 1, a circular thin plate having a diameter of about 2.9 mm and a thickness of 0.137 mm made of a YAlO 3 single crystal doped with 1% (mol% of Ti with respect to Al) was prepared, and an aluminum electrode having a thickness of 150 nm was prepared. A layer (cathode) and a semicircular gold electrode layer (anode) having a thickness of 75 nm were formed to produce an electroluminescent device.

電界発光素子の陰極及び陽極に白金線を接続し、末端をバイポーラー電源に接続した。バイポーラー電源と陰極又は陽極との間には、1kΩの抵抗を直列接続した。   A platinum wire was connected to the cathode and anode of the electroluminescent element, and the end was connected to a bipolar power source. A 1 kΩ resistor was connected in series between the bipolar power source and the cathode or anode.

バイポーラー電源から、電界強度±1.1×106V/m、1Hzの周波数のパルス電圧を電界発光素子に印加したところ、波長260〜400nmの範囲に数本の強い発光が現れ、ピーク波長は328nmであった。また、波長515〜555nm、580〜600nm、760〜780nmに数本の発光(やや弱〜やや強)が見られた。更に、波長400〜800nmに幅広い強い発光が見られ、この幅広い発光の強度は700〜800nm付近で最大であった。パルス電圧印加時に、前記電極間に流れた電流密度の極大値は1mA/cm2以上であった。 When a pulse voltage having an electric field intensity of ± 1.1 × 10 6 V / m and a frequency of 1 Hz is applied to the electroluminescent element from a bipolar power source, several intense light emission appears in the wavelength range of 260 to 400 nm, and the peak wavelength Was 328 nm. Moreover, several light emission (slightly weak-slightly strong) was seen by wavelength 515-555 nm, 580-600 nm, 760-780 nm. Furthermore, a wide range of strong light emission was observed at a wavelength of 400 to 800 nm, and the intensity of this wide light emission was maximum at around 700 to 800 nm. When a pulse voltage was applied, the maximum value of the current density flowing between the electrodes was 1 mA / cm 2 or more.

ここで、パルス電圧の波形としては、実施例1と同様にバイポーラー対称駆動波形を用いた。また、パルス電圧の波形として、緩和時間のない矩形波、サイン波又は三角波を用いた場合には、弱い紫外発光が見られた。   Here, as the waveform of the pulse voltage, a bipolar symmetric drive waveform was used as in the first embodiment. In addition, when a rectangular wave, sine wave or triangular wave having no relaxation time was used as the pulse voltage waveform, weak ultraviolet light emission was observed.

発光波長(nm)と発光強度(任意単位)との関係を図3に示す。   FIG. 3 shows the relationship between the emission wavelength (nm) and the emission intensity (arbitrary unit).

実施例4
フローティングゾーン法により、また、0.1%(Alに対するTiのモル%)チタンドープしたYAlO3単結晶(淡褐色半透明)を得た。
Example 4
A YAlO 3 single crystal (light brown translucent) doped with 0.1% (mol% of Ti with respect to Al) titanium was also obtained by the floating zone method.

前記単結晶を切断・研磨し、直径約2.1mm、厚さ0.137mmの円形薄板を得た。   The single crystal was cut and polished to obtain a circular thin plate having a diameter of about 2.1 mm and a thickness of 0.137 mm.

前記円形薄板の片面全部に、真空蒸着法により、厚さ150nmのアルミニウム電極層(陰極)を形成した。陰極形成面とは逆面の半分に、DCスパッタリング法により、厚さ75nmの半円状金電極層(陽極)を形成した。これにより、電界発光素子を作製した。   An aluminum electrode layer (cathode) having a thickness of 150 nm was formed on one side of the circular thin plate by a vacuum deposition method. A semicircular gold electrode layer (anode) having a thickness of 75 nm was formed on the half of the surface opposite to the cathode formation surface by DC sputtering. This produced the electroluminescent element.

電界発光素子の陰極及び陽極に白金線を接続し、末端をバイポーラー電源に接続した。バイポーラー電源と陰極(陽極でもよい)との間には、1MΩの抵抗を直列接続した。   A platinum wire was connected to the cathode and anode of the electroluminescent element, and the end was connected to a bipolar power source. A 1 MΩ resistor was connected in series between the bipolar power source and the cathode (which may be the anode).

バイポーラー電源から、電界強度±6.6×106V/m、10Hzの周波数のパルス
電圧を電界発光素子に印加したところ、波長290〜410nmの範囲に数本の強い発光が現れ、ピーク波長は337nmであった。更に、波長550〜800nmに、弱いが幅広い発光が見られた。パルス電圧印加時に、前記電極間に流れた電流密度の極大値は1mA/cm2以上であった。
When a pulse voltage having a frequency of ± 6.6 × 10 6 V / m and 10 Hz is applied to the electroluminescent element from a bipolar power source, several intense light emission appears in the wavelength range of 290 to 410 nm, and the peak wavelength Was 337 nm. Furthermore, a wide range of light emission was observed at a wavelength of 550 to 800 nm. When a pulse voltage was applied, the maximum value of the current density flowing between the electrodes was 1 mA / cm 2 or more.

ここで、パルス電圧の波形としては、実施例1と同様にバイポーラー対称駆動波形を用いた。また、パルス電圧の波形として、緩和時間のない矩形波、サイン波又は三角波を用いた場合には、弱い紫外発光が見られた。   Here, as the waveform of the pulse voltage, a bipolar symmetric drive waveform was used as in the first embodiment. In addition, when a rectangular wave, sine wave or triangular wave having no relaxation time was used as the pulse voltage waveform, weak ultraviolet light emission was observed.

発光波長(nm)と発光強度(任意単位)との関係を図4に示す。   FIG. 4 shows the relationship between the emission wavelength (nm) and the emission intensity (arbitrary unit).

実施例5
フローティングゾーン法により、0.1%(Alに対するCaのモル%)カルシウムドープしたYAlO3単結晶(白色半透明)を得た。
Example 5
YAlO 3 single crystal (white translucent) doped with 0.1% (mol% of Ca to Al) calcium was obtained by the floating zone method.

前記単結晶を切断・研磨し、直径約2.0mm、厚さ0.245mmの円形薄板を得た。   The single crystal was cut and polished to obtain a circular thin plate having a diameter of about 2.0 mm and a thickness of 0.245 mm.

前記円形薄板の片面全部に、真空蒸着法により、厚さ150nmのアルミニウム電極層(陰極)を形成した。陰極形成面とは逆面の半分に、DCスパッタリング法により、厚さ75nmの半円状金電極層(陽極)を形成した。これにより、電界発光素子を作製した。   An aluminum electrode layer (cathode) having a thickness of 150 nm was formed on one side of the circular thin plate by a vacuum deposition method. A semicircular gold electrode layer (anode) having a thickness of 75 nm was formed on the half of the surface opposite to the cathode formation surface by DC sputtering. This produced the electroluminescent element.

電界発光素子の陰極及び陽極に白金線を接続し、末端をバイポーラー電源に接続した。バイポーラー電源と陰極(陽極でもよい)との間には、1MΩの抵抗を直列接続した。   A platinum wire was connected to the cathode and anode of the electroluminescent element, and the end was connected to a bipolar power source. A 1 MΩ resistor was connected in series between the bipolar power source and the cathode (which may be the anode).

バイポーラー電源から、電界強度±3.3×106V/m、10Hzの周波数のパルス電圧を電界発光素子に印加したところ、波長230〜430nmの範囲に数本の強い発光が現れ、ピーク波長は395nm(紫外域の最大ピーク)、338nm(紫外域の2番目に大きなピーク)、および、329nm(紫外域の3番目に大きなピーク)であった。また、波長515〜555nm及び610〜800nmに数本の発光(やや弱〜やや強)が見られた。更に、波長430〜800nmに弱いが幅広い発光が見られた。パルス電圧印加時に、前記電極間に流れた電流密度の極大値は1mA/cm2以上であった。 When a pulse voltage having a frequency of ± 3.3 × 10 6 V / m and 10 Hz is applied to the electroluminescent element from a bipolar power source, several strong light emission appears in the wavelength range of 230 to 430 nm, and the peak wavelength Were 395 nm (maximum peak in the ultraviolet region), 338 nm (second largest peak in the ultraviolet region), and 329 nm (third largest peak in the ultraviolet region). Moreover, several light emission (slightly weak-slightly strong) was seen by wavelength 515-555 nm and 610-800 nm. Furthermore, although it was weak at wavelength 430-800 nm, wide light emission was seen. When a pulse voltage was applied, the maximum value of the current density flowing between the electrodes was 1 mA / cm 2 or more.

ここで、パルス電圧の波形としては、実施例1と同様にバイポーラー対称駆動波形を用いた。また、パルス電圧の波形として、緩和時間のない矩形波、サイン波又は三角波を用いた場合には、弱い紫外発光が見られた。   Here, as the waveform of the pulse voltage, a bipolar symmetric drive waveform was used as in the first embodiment. In addition, when a rectangular wave, sine wave or triangular wave having no relaxation time was used as the pulse voltage waveform, weak ultraviolet light emission was observed.

発光波長(nm)と発光強度(任意単位)との関係を図5に示す。   FIG. 5 shows the relationship between the emission wavelength (nm) and the emission intensity (arbitrary unit).

また、0.5%(Alに対するCaのモル%)カルシウムドープしたLaAlO3単結晶(淡黄色半透明)を用いて上記同様にパルス電圧を印加したところ、紫外波長域の発光が得られた。 When a pulse voltage was applied in the same manner as described above using 0.5% (mol% of Ca relative to Al) calcium-doped LaAlO 3 single crystal (light yellow translucent), emission in the ultraviolet wavelength region was obtained.

他方、電流密度の極大値が、請求項1の範囲から外れた場合、例えば、0.1μA/cm2以下であった場合には、電極間に印加するパルス電圧が、請求項1の範囲、即ち、周波数0.1Hz〜10kHz及び電界強度104V/cm以上である場合でも、紫外光の発生は観測できなかった。 On the other hand, when the maximum value of the current density is out of the range of claim 1, for example, 0.1 μA / cm 2 or less, the pulse voltage applied between the electrodes is within the range of claim 1. That is, even when the frequency was 0.1 Hz to 10 kHz and the electric field intensity was 10 4 V / cm or more, generation of ultraviolet light could not be observed.

実施例1の電界発光素子の発光波長と発光強度との関係を示す図である。It is a figure which shows the relationship between the light emission wavelength of the electroluminescent element of Example 1, and light emission intensity. 実施例2の電界発光素子の発光波長と発光強度との関係を示す図である。It is a figure which shows the relationship between the light emission wavelength of the electroluminescent element of Example 2, and light emission intensity. 実施例3の電界発光素子の発光波長と発光強度との関係を示す図である。It is a figure which shows the relationship between the light emission wavelength of the electroluminescent element of Example 3, and light emission intensity. 実施例4の電界発光素子の発光波長と発光強度との関係を示す図である。It is a figure which shows the relationship between the light emission wavelength of the electroluminescent element of Example 4, and light emission intensity. 実施例5の電界発光素子の発光波長と発光強度との関係を示す図である。It is a figure which shows the relationship between the light emission wavelength of the electroluminescent element of Example 5, and light emission intensity.

Claims (17)

対向する電極間に電界発光層を有する酸化物電界発光素子であって、
(1)前記電界発光層は、希土類元素をRとし、MはAl、Mn又はCrを示すものとし、一般式:RMOで表されるペロブスカイト型結晶構造を有する酸化物を含有し、
(2)前記酸化物は、遷移金属及びアルカリ土類金属からなる群から選ばれる少なくとも1種を更に含有し、
(3)前記電極間に流れる電流密度の極大値が10μA/cm以上となるように、前記電極間に、周波数0.1Hz〜10kHzのパルス電圧を電界強度10V/cm以上で印加することにより、200〜400nmの波長の光を発光する、
ことを特徴とする電界発光素子。
An oxide electroluminescent device having an electroluminescent layer between opposing electrodes,
(1) The electroluminescent layer includes R as a rare earth element, M represents Al, Mn, or Cr, and includes an oxide having a perovskite crystal structure represented by a general formula: RMO 3 .
(2) The oxide further contains at least one selected from the group consisting of transition metals and alkaline earth metals,
(3) A pulse voltage having a frequency of 0.1 Hz to 10 kHz is applied between the electrodes at an electric field strength of 10 4 V / cm or more so that the maximum value of the current density flowing between the electrodes is 10 μA / cm 2 or more. By emitting light having a wavelength of 200 to 400 nm,
An electroluminescent element characterized by the above.
前記電極間に流れる電流密度の極大値が10μA/cm以上となるように、前記電極間に、周波数0.1Hz〜1kHzのパルス電圧を電界強度10V/cm以上で印加することにより、200〜400nmの波長の光と、400nmを超え2500nm以下の光とを同時に発光する、請求項1に記載の電界発光素子。 By applying a pulse voltage with a frequency of 0.1 Hz to 1 kHz between the electrodes at an electric field strength of 10 5 V / cm or more so that the maximum value of the current density flowing between the electrodes is 10 μA / cm 2 or more, The electroluminescent element according to claim 1, which emits simultaneously light having a wavelength of 200 to 400 nm and light having a wavelength of more than 400 nm and not more than 2500 nm. 前記希土類元素Rは、Sc、Y、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb又はLuである、請求項1に記載の電界発光素子。   The electroluminescent device according to claim 1, wherein the rare earth element R is Sc, Y, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, or Lu. 前記遷移金属は、Ti、V、Cr、Mn、Fe、Co、Ni、Cu及びZnからなる群から選択される少なくとも1種である、請求項1に記載の電界発光素子。   The electroluminescent device according to claim 1, wherein the transition metal is at least one selected from the group consisting of Ti, V, Cr, Mn, Fe, Co, Ni, Cu, and Zn. 前記アルカリ土類金属は、Ca、Sr及びBaからなる群から選択される少なくとも1種である、請求項1に記載の電界発光素子。   The electroluminescent element according to claim 1, wherein the alkaline earth metal is at least one selected from the group consisting of Ca, Sr, and Ba. 前記酸化物に対する前記遷移金属の含有量は、Mに対する遷移金属のモル%で表して、0.05〜2%である、請求項1に記載の電界発光素子。   2. The electroluminescent device according to claim 1, wherein the content of the transition metal with respect to the oxide is 0.05 to 2% in terms of mol% of the transition metal with respect to M. 3. 前記酸化物に対する前記アルカリ土類金属の含有量は、Mに対するアルカリ土類金属のモル%で表して、0.05〜2%である、請求項1に記載の電界発光素子。   2. The electroluminescent device according to claim 1, wherein the content of the alkaline earth metal with respect to the oxide is 0.05 to 2% in terms of mol% of the alkaline earth metal with respect to M. 3. 対向する電極の少なくとも一つは、金及びアルミニウムからなる群から選ばれる少なくとも1種を含有する、請求項1に記載の電界発光素子。   The electroluminescent element according to claim 1, wherein at least one of the opposing electrodes contains at least one selected from the group consisting of gold and aluminum. 対向する電極の少なくとも一つが透明である、請求項1に記載の電界発光素子。   The electroluminescent element according to claim 1, wherein at least one of the opposing electrodes is transparent. 光反射層をさらに有する、請求項1に記載の電界発光素子。   The electroluminescent element according to claim 1, further comprising a light reflecting layer. 前記酸化物は、Ti及び/又はCaを含むYAlOである、請求項1に記載の電界発光素子。 The electroluminescent device according to claim 1, wherein the oxide is YAlO 3 containing Ti and / or Ca. 前記酸化物は、Ti及び/又はCaを含むLaAlOである、請求項1に記載の電界発光素子。 The electroluminescent device according to claim 1, wherein the oxide is LaAlO 3 containing Ti and / or Ca. 前記電界発光素子は、電源と接続されており、前記電極と前記電源との間に、前記電界発光素子と直列に抵抗が更に接続されている、請求項1に記載の電界発光素子。   The electroluminescent element according to claim 1, wherein the electroluminescent element is connected to a power source, and a resistor is further connected in series with the electroluminescent element between the electrode and the power source. 対向する電極間に電界発光層を有する酸化物電界発光素子の駆動方法であって、
(1)前記電界発光層は、希土類元素をRとし、MはAl、Mn又はCrを示すものとし、一般式:RMOで表されるペロブスカイト型結晶構造を有する酸化物を含有し、
(2)前記酸化物は、遷移金属及びアルカリ土類金属からなる群から選ばれる少なくとも1種を更に含有し、
(3)前記電極間に流れる電流密度の極大値が10μA/cm以上となるように、前記電極間に、周波数0.1Hz〜10kHzのパルス電圧を電界強度10V/cm以上で印加することにより、200〜400nmの波長の光を発光させる、
ことを特徴とする駆動方法。
A method of driving an oxide electroluminescent device having an electroluminescent layer between opposing electrodes,
(1) The electroluminescent layer includes R as a rare earth element, M represents Al, Mn, or Cr, and includes an oxide having a perovskite crystal structure represented by a general formula: RMO 3 .
(2) The oxide further contains at least one selected from the group consisting of transition metals and alkaline earth metals,
(3) A pulse voltage having a frequency of 0.1 Hz to 10 kHz is applied between the electrodes at an electric field strength of 10 4 V / cm or more so that the maximum value of the current density flowing between the electrodes is 10 μA / cm 2 or more. To emit light having a wavelength of 200 to 400 nm,
A driving method characterized by that.
前記電極間に流れる電流密度の極大値が10μA/cm以上となるように、前記電極間に、周波数0.1Hz〜1kHzのパルス電圧を電界強度10V/cm以上で印加することにより、200〜400nmの波長の光と、400nmを超え2500nm以下の光とを同時に発光させる、請求項14に記載の駆動方法。 By applying a pulse voltage with a frequency of 0.1 Hz to 1 kHz between the electrodes at an electric field strength of 10 5 V / cm or more so that the maximum value of the current density flowing between the electrodes is 10 μA / cm 2 or more, The driving method according to claim 14, wherein light having a wavelength of 200 to 400 nm and light having a wavelength exceeding 400 nm and not more than 2500 nm are simultaneously emitted. 前記酸化物は、Ti及び/又はCaを含むYAlOである、請求項14に記載の駆動方法。 The driving method according to claim 14, wherein the oxide is YAlO 3 containing Ti and / or Ca. 前記酸化物は、Ti及び/又はCaを含むLaAlOである、請求項14に記載の駆動方法。 The driving method according to claim 14, wherein the oxide is LaAlO 3 containing Ti and / or Ca.
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Publication number Priority date Publication date Assignee Title
JP2006278102A (en) * 2005-03-29 2006-10-12 Japan Science & Technology Agency Electroluminescent element
JP2016050249A (en) * 2014-08-29 2016-04-11 株式会社トクヤマ Deep ultraviolet emission material
JP7378087B2 (en) 2019-12-13 2023-11-13 株式会社デンソー electret
JP7390687B2 (en) 2019-12-13 2023-12-04 株式会社デンソー electret

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JP2000236112A (en) * 1996-09-20 2000-08-29 Siemens Ag Usage of cast molding material for wavelength conversion
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Publication number Priority date Publication date Assignee Title
JP2006278102A (en) * 2005-03-29 2006-10-12 Japan Science & Technology Agency Electroluminescent element
JP2016050249A (en) * 2014-08-29 2016-04-11 株式会社トクヤマ Deep ultraviolet emission material
JP7378087B2 (en) 2019-12-13 2023-11-13 株式会社デンソー electret
JP7390687B2 (en) 2019-12-13 2023-12-04 株式会社デンソー electret

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