JP2008145291A - Electron beam irradiation device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an electron beam irradiation device for surely and easily irradiating an electron beam to an electron beam irradiating object without performing partial and excessive irradiation even if the object is tubular solid-shaped. <P>SOLUTION: This electron beam irradiation device is made by disposing an electron beam generator in its interior with a vacuum state formed therein. This beam irradiation device is equipped with an electron beam tube, comprising an electron beam exit window for emitting an electron beam generated in the beam generator and a casing having an electron beam tube housing space for housing the beam tube therein. This beam irradiation device is provided with an electron beam application nozzle that extends in the emission direction of the electron beam emitted from the exit window of the beam tube and used for therethrough guiding the electron beam emitted from the exit window. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to an electron beam irradiation apparatus, and more particularly to an electron beam irradiation apparatus used for sterilizing a container having a bottomed cylindrical shape having an opening.

For example, containers for filling substances that are applied to the human body, such as pharmaceuticals, drinking water, and lotions, need to be sterilized in order to avoid the growth of germs harmful to the human body. As the sterilization method, a method of blowing ethylene oxide gas (EOG) or hydrogen peroxide (H ₂ O ₂ ) gas to the container, a method of irradiating the container with infrared rays or ultraviolet rays, and the like are known. Yes.

However, the sterilization treatment using ethylene oxide gas or hydrogen peroxide gas has a problem that the drug remains in the container, and the sterilization treatment using infrared rays or ultraviolet rays is not suitable for the container such as resin or paper. In the case of a material that is weak against heat, there is a problem that the container cannot be applied because there is a possibility that the container may be altered.
Thus, in recent years, as a method of sterilization treatment, a technique of irradiating an electron beam to a container has been attracting attention. According to sterilization treatment using this electron beam, a drug does not remain in the container, Further, even if the container is made of a material that is weak against heat, it is expected that the container is not likely to be altered.

On the other hand, as shown in FIG. 6, a certain type of electron beam irradiation apparatus includes a bottomed cylindrical bulb 21 made of glass, for example, and an opening 21 </ b> A of the bulb 21 has an electron beam exit window 23. The inside sealed by the disk-shaped lid portion 22 and thus sealed is in a vacuum state, and an electron beam generator 24 having a cathode (not shown) is provided in the inside where the vacuum state is formed. The electron beam tube 20 is provided and has a configuration in which the electron beam generated by the electron beam generator 24 is emitted from the electron beam emission window 23. The electron beam tube 20 has a columnar shape in a casing 62 molded with, for example, an epoxy resin, and the electron beam tube 20 is opened in an electron beam tube accommodating space 63 opened by an opening 62B formed on one surface 62A of the casing 62. The lid portion 22 is fixed to the one surface 62A of the casing 62 by an appropriate method in a state where the electron beam exit window 23 is inserted so as to be positioned on the one surface 62A side (lower side in FIG. 1) where the opening 62B of the casing 62 is formed. It is fixed by being done.
Here, the electron beam emission window 23 of the electron beam tube 20 is provided so as to close the electron beam emission hole 22A formed in the center portion of the lid portion 22, and is a thin film made of silicon having a thickness of 1 to 3 μm, for example. It is made up of.
In FIG. 6, reference numeral 16 denotes a high voltage transformer embedded in a molded casing 62 so as to be electrically insulated from the electron beam tube 20, and 19 is electrically connected to the high voltage transformer 16. 68 is a gas flow path for allowing a gas supplied from a gas supply means (not shown) installed outside the casing 62 to flow into the electron beam tube accommodating space 63. Is a power supply terminal for supplying power to the cathode of the electron beam generator 24, 27 is a base for bundling a plurality of power supply terminals 26, and 18 is a power supply connected to the high-voltage transformer 16. A connector provided at the tip of the electric wire 17.

In the case of performing sterilization of a container using an electron beam irradiation apparatus having such a configuration, since the container that is an electron beam irradiation target is a three-dimensional shape with a bottomed cylindrical shape having an opening, When an electron beam is irradiated from the opening side to an upright container with the opening facing upward (see FIG. 6), there is a problem in that the dose distribution of the container is not uniform, resulting in an adverse effect. is there.
That is, since the irradiation dose of the electron beam becomes smaller as the distance from the electron beam exit window from which the electron beam is emitted becomes larger, the portion where the dose in the container which is the electron beam irradiation target is the smallest (specifically, If the required dose at the bottom) is to be obtained, the electron beam is excessively irradiated at the portion where the dose is highest (specifically, the opening), so the dose in the container is the highest. There is a problem in that the enlarged portion is partially degraded.

Thus, when performing sterilization of a container using an electron beam irradiation apparatus, for example, as shown in FIG. 7, the container (paper cup in the example of the figure) 70 is a target object. Based on the dose distribution with respect to the container 70, specifically, a drinking structure for partially shielding the electron beam on a portion of the paper cup where the dose becomes large, such as a drinking mouth and a side surface near the drinking mouth. A shielding structure 71 including a mouth shielding part 71A and a side shielding part 71B is provided, and an electron beam is irradiated from above the shielding structure 71 (see, for example, Patent Document 1).
According to such a method, since the predetermined dose can be uniformly irradiated to the container 70 that is the electron beam irradiation target object, the container 70 can be surely sterilized and the container 70 can be reliably treated. It is expected that the device itself can be partially degraded by being irradiated with an electron beam.

  However, in the method of performing sterilization using an electron beam irradiation apparatus using the shielding structure in this way, before the electron beam irradiation, the shielding structure is attached to the container that is the electron beam irradiation object, and the electron beam After the irradiation, it is necessary to remove and collect the shielding structure from the container, resulting in an increase in work man-hours. Also, since the shielding structure is attached to the container, the container is contaminated by the shielding structure. Since the shielding structure must be sterilized so as not to occur, a new preparation work is required, resulting in an increase in the number of work steps.

JP-A-8-151021

  The present invention has been made based on the circumstances as described above, and the object thereof is to provide an electron beam to the electron beam irradiation object even if the electron beam irradiation object is a cylindrical three-dimensional object. An object of the present invention is to provide an electron beam irradiation apparatus capable of reliably and easily performing beam irradiation without partially irradiating excessively.

The electron beam irradiation apparatus of the present invention includes an electron beam generator disposed inside a vacuum state, and an electron beam emitting window for emitting an electron beam generated by the electron beam generator. An electron beam irradiation apparatus comprising a beam tube and a casing having an electron beam tube housing space for housing the electron beam tube,
An electron beam irradiation nozzle that extends in the radiation direction of the electron beam emitted from the electron beam emission window of the electron beam tube and conducts the electron beam emitted from the electron beam emission window is provided. .

In the electron beam irradiation apparatus of the present invention, it is preferable to provide a gas flow path formed so that the electron beam exit window of the electron beam tube is exposed.
In the electron beam irradiation apparatus having such a configuration, the gas flow path has a region formed in the casing for flowing a cooling gas for cooling the electron beam tube, and the cooling gas is an inert gas. It is preferable that

  In the electron beam irradiation apparatus of the present invention, it is preferable that a positioning stopper for restricting movement of the electron beam irradiation object in the direction toward the electron beam tube is provided.

  In the electron beam irradiation apparatus of the present invention, an electron beam tube holder for fixing the electron beam tube in the electron beam tube housing space in the casing is provided, and the electron beam irradiation nozzle is provided in the electron beam tube holder. It is preferable that

  The electron beam irradiation apparatus of the present invention is characterized in that an electron beam irradiation nozzle is inserted from an opening of a cylindrical electron beam irradiation object, and in that state, the electron beam irradiation object is irradiated with the electron beam. .

According to the electron beam irradiation apparatus of the present invention, the electron beam irradiation nozzle for conducting the electron beam emitted from the electron beam emission window of the electron beam tube is provided, and the electron beam irradiation object is irradiated with the electron beam. Can be irradiated while being partially shielded by the electron beam irradiation nozzle, so that even if the electron beam irradiation target is a cylindrical three-dimensional object, the electron beam irradiation target Irradiation can be performed reliably and easily without partial excessive irradiation.
Therefore, the bottomed cylindrical container having an opening as an electron beam irradiation target can be sterilized reliably and easily, and the container itself is partially irradiated with the electron beam. It is possible to prevent deterioration.

Moreover, in the electron beam irradiation apparatus of the present invention, by providing a gas flow path formed so that the electron beam exit window of the electron beam tube is exposed, an appropriate gas flows in the gas flow path. Thus, the exposure of the electron beam exit window and the electron beam emitted from the electron beam exit window to the atmosphere can be suppressed, and the electron beam emitted from the electron beam exit window can be suppressed. Since the oxygen partial pressure in the space through which the gas passes can be reduced, it is possible to prevent the generation of ozone due to the emission of the electron beam from the electron beam exit window. As a result, the electron beam exit window generates ozone. Oxidation due to the above can be prevented.
In the electron beam irradiation apparatus of the present invention having such a configuration, the gas flow path has a region formed in the casing for flowing a cooling gas for cooling the electron beam tube. By flowing a cooling gas made of an inert gas for cooling the electron beam tube in the path, in addition to the above effect, even when a high acceleration voltage is applied to the electron beam tube, electrons are cooled by the cooling action of the cooling gas. The deterioration of the casing due to the high temperature of the beam tube can be suppressed, and the cooling gas is caused to flow along the outer surface of the electron beam tube, and is generated on the outer surface of the electron beam tube. Since the generated static electricity is removed, unnecessary arc discharge can be prevented.

  Further, in the electron beam irradiation apparatus of the present invention, by providing a positioning stopper for restricting the movement of the electron beam irradiation target object in the direction toward the electron beam tube, the electron beam irradiation target object is surely intended. When the electron beam irradiation target is irradiated with the electron beam, it is easy to reliably irradiate a required dose of the electron beam. It is possible to prevent the electron beam exit window from being damaged due to the movement and contact with the electron beam exit window.

Hereinafter, the present invention will be described in detail.
FIG. 1 is a schematic diagram for explaining an example of the configuration of an electron beam irradiation apparatus according to the present invention, and FIG. 2 irradiates an electron beam irradiation target body with the main part of the electron beam irradiation apparatus of FIG. FIG. 3 is an explanatory partial enlarged view showing another state in which the electron beam irradiation target is irradiated with the electron beam.
The electron beam irradiation apparatus 10 is for sterilizing a bottomed cylindrical container (hereinafter also referred to as “cylindrical container”) 1 having an opening 1A as an electron beam irradiation target.

The electron beam irradiation apparatus 10 includes a bottomed cylindrical bulb 21 made of glass, for example, and an opening 21A of the bulb 21 is closed by a disc-like lid portion 22 so that the sealed interior is in a vacuum state. An electron beam generator 24 having a cathode (not shown) is disposed inside the vacuum state, and the electron beam generated in the electron beam generator 24 is transmitted to the electron beam exit window 23. It comprises the electron beam tube 20 having a configuration radiated from. The electron beam tube 20 has a columnar shape in the casing 12 and is an electron beam tube housing space opened by an opening 12B formed on one surface (hereinafter also referred to as an “opening forming surface”) 12A of the casing 12. 13 is fixed by an electron beam tube holder 30 in a state where the electron beam exit window 23 is inserted so as to be positioned on the opening forming surface 12A side (lower side in FIG. 1) of the casing 12.
Here, the electron beam emission window 23 of the electron beam tube 20 is provided so as to close the electron beam emission hole 22A formed in the central portion of the lid portion 22, and is a thin film made of silicon having a thickness of 1 to 3 μm, for example. It is made up of. The electron beam tube housing space 13 formed in the casing 12 has a total length that matches the total length of the electron beam tube 20 and an opening diameter that matches the outer diameter of the lid portion 22 of the electron beam tube 20. The lid fixing space having the same outer diameter as the opening diameter of the opening 12B of the casing 12 located on the opening forming surface 12A side, and the bulb 21 of the electron beam tube 20 having a smaller diameter than the outer diameter of the lid fixing space. And a valve housing space having an outer diameter larger than the outer diameter.

A plurality of power supply terminals 26 for supplying power to the cathode are connected to the electron beam generator 24 constituting the electron beam irradiation apparatus 10.
The plurality of power supply terminals 26 protrude outward from the bulb 21 of the electron beam tube 20 and are connected to the high-voltage transformer 16 embedded in the casing 12 in a state of being bundled with the base 27. The electron beam tube 20 is electrically connected to the high-voltage transformer 16 by being inserted into and connected to a connector 18 provided at the tip. In the example of this figure, the casing 12 is molded by an insulating material such as an epoxy resin in order to electrically insulate the electron beam tube 20 and the high voltage transformer 16 from each other. A gas flow path groove 14A is formed for allowing a gas supplied from an external gas supply means (not shown) to flow into the electron beam tube accommodating space 13. The high voltage transformer 16 is connected to a control unit 19 installed outside the casing 12.

In the electron beam irradiation apparatus 10, the electron beam tube holder 30 extends in the radiation direction (downward in FIG. 1) of the electron beam emitted from the electron beam emission window 23 of the electron beam tube 20, and emits the electron beam. An electron beam irradiation nozzle for conducting an electron beam emitted from the window 23 is provided.
Since this electron beam irradiation nozzle is inserted from the opening 1A of the cylindrical container 1 which is an electron beam irradiation object, the opening diameter of the opening 1A of the cylindrical container 1 and the electron beam irradiation nozzle are inserted. It is necessary to have an outer diameter smaller than the inner diameter of the power opening portion.
Here, the electron beam irradiation nozzle is made of a material that is impermeable to an electron beam such as SUS and aluminum.

  The electron beam tube holder 30 is provided with a positioning stopper for restricting the cylindrical container 1 from moving in the direction toward the electron beam tube 20 (upward in FIG. 1).

In the example of this figure, the electron beam tube holder 30 has a configuration in which an electron beam irradiation nozzle and a positioning stopper are integrally provided. The electron beam tube holder 30 has a cylindrical shape as a whole, a positioning fixing portion 31 for fixing the electron beam tube 20 at a predetermined position, and an outer diameter disc adapted to the outer diameter of the positioning fixing portion 31. A positioning stopper portion 33 for restricting the cylindrical container 1 from moving in a direction toward the electron beam tube 20, and an electron beam irradiation nozzle portion 35 having a cylindrical shape smaller in diameter than the positioning fixing portion 31. And has an external shape of two cylindrical bodies having different outer diameters. Further, in the electron beam tube holder 30, the shape on the inner surface side in the cross section parallel to the axial direction including the central axis thereof has a shape suitable for the positioning fixing portion 31 and the lid portion 22 of the electron beam tube 20. The electron beam tube incorporation space 31A and the hole diameter of the electron beam emission hole 22A that is continuous with the electron beam tube incorporation space 31A, is smaller than the outer diameter of the electron beam tube incorporation space 31A, and is closed by the electron beam emission window 23. Since the electron beam passage space 31B having a larger outer diameter is formed, the inner diameter of the space 31B is inclined stepwise in the direction toward the central axis toward the radiation direction of the electron beam. Further, the electron beam tube holder 30 is formed with a gas flow channel groove 37A having an opening on each of an end surface on the positioning and fixing portion 31 side and an inner surface surrounding the electron beam passage space 31B in the positioning and fixing portion 31. The gas channel groove 37A has an opening on each of an inner surface formed in the casing 12 surrounding the valve housing space of the electron beam tube housing space 13 and an opening forming surface 12A of the casing 12. The gas passage groove 14B communicates with the gas passage groove 14B.
2 and 3, reference numeral 36 denotes a gas vent hole. The gas vent hole 36 is defined by the outer diameter of the electron beam irradiation nozzle portion 35, the opening diameter of the opening 1A of the cylindrical container 1, and the inner diameter of the opening portion. In the case where the difference is small, it is preferably provided to suppress the gas supplied from the gas supply means from staying in the electron beam tube accommodating space 13 and the electron beam tube holder 30, and the hole diameter thereof is preferably For example, the thickness is set to 2 mm so as not to obstruct the filling of the cylindrical container 1 with the gas via the electron beam irradiation nozzle portion 35.

  In the electron beam tube holder 30, the electron beam tube 20 is inserted into the electron beam tube housing space 13 of the casing 12, and the lid portion fixing space of the electron beam tube housing space 13 is placed behind the lid portion 22 of the electron beam tube 20. In the state where the end portion is incorporated, the end surface on the positioning and fixing portion 31 side of the electron beam tube holder 30 is fixed to the casing 12 by, for example, screwing in a state where the end surface is in contact with the opening forming surface 12A of the casing 12. . In this way, the electron beam tube holder 30 is attached to the electron beam tube mounting space 31A of the positioning fixing portion 31 by incorporating the tip end portion of the lid portion 22 of the electron beam tube 20 so that the electron beam tube 20 is attached to the casing 12. It is fixed at a predetermined position in the electron beam tube accommodating space 13.

Further, the electron beam irradiation apparatus 10 is formed with a gas flow path for flowing the gas supplied from the gas supply means, and the electron beam emission window 23 of the electron beam tube 20 is exposed by this gas flow path. It is supposed to be in a state.
In the example of this figure, the gas flow path is a gas flow path of an electron beam tube housing space 13 in which a gas flow channel groove 14A formed in the casing 12 and an electron beam tube 20 are disposed. It flows through the valve housing space, the gas flow path groove 14B formed in the casing 12, the gas flow path groove 37A formed in the electron beam tube holder 30, and the electron beam passage space 31B related to the electron beam tube holder 30 in this order. In the region partitioned by the electron beam passage space 31B of the gas flow path, the electron beam is formed so as to be discharged from the electron beam irradiation device 10 through the gas vent hole 36 or the electron beam irradiation nozzle portion 35. The exit window 23 is exposed.

Hereinafter, one structural example of the cylindrical container 1 which is an electron beam irradiation nozzle part 35 and the electron beam irradiation object in the electron beam irradiation apparatus 10 which concerns on this invention is shown.
The electron beam irradiation nozzle portion 35 has an outer diameter of 8 mm, an inner diameter of 7 mm, and an overall length of 8 mm.
The cylindrical container 1 has an opening diameter of 9 mm, an opening portion length l of 8 mm, and a total length of 33 mm.

  According to the electron beam irradiation apparatus 10 having such a configuration, the electron beam irradiation for sterilizing the electron beam irradiation object is performed as follows.

First, as shown in FIG. 2, the electron beam irradiation nozzle portion in the electron beam tube holder 30 of the electron beam irradiation apparatus 10 in an upright state with the opening 1A of the cylindrical container 1 as an electron beam irradiation object. The electron beam is moved from the opening 1A of the cylindrical container 1 to a state where the opening 1A comes into contact with the positioning stopper portion 33 of the electron beam tube holder 30 by being positioned directly below 35 and moved upward (upward in FIG. 1). The irradiation nozzle part 35 is inserted.
In such a state where the electron beam irradiation nozzle portion 35 is inserted into the cylindrical container 1, an inert gas such as nitrogen gas, argon gas or helium gas is supplied from the gas supply means and flows into the gas flow path. By doing so, an inert gas is introduced into the cylindrical container 1 through the electron beam irradiation nozzle part 35.
The electron beam generator 24 is driven to generate an electron beam in the cylindrical container 1, the electron beam tube holder 30, and the cylindrical container 1 filled with an inert gas, thereby generating an electron beam. The electron beam radiated from the beam exit window 23 passes through the electron beam passage space 31B in the electron beam tube holder 30, and is then conducted to the inside of the cylindrical container 1 by the electron beam irradiation nozzle portion 35. An electron beam is irradiated onto the inner surface excluding the opening 1A into which the irradiation nozzle portion 35 is inserted and the opening portion (hereinafter also referred to as “electron beam inner surface irradiation step”).
In FIG. 2, the cylindrical container 1 is indicated by a broken line, the radiation direction of the electron beam is indicated by a broken line arrow, and the flow direction of the inert gas is indicated by a solid line arrow.

Next, as shown in FIG. 3, the electron beam generator 24 is driven to emit an electron beam from the electron beam exit window 23, and an inert gas is flowed and filled in the gas flow path by the gas supply means. In this state, by moving the cylindrical container 1 downward (downward in FIG. 2), the electron beam irradiation nozzle portion 35 is pulled out from the opening 1A of the cylindrical container 1, and this cylindrical container 1 is further moved to the electron beam irradiation nozzle. It is moved to a predetermined position directly below the portion 35. In this way, the electron beam is irradiated while moving the cylindrical container 1 to the opening 1A and the opening portion into which the electron beam irradiation nozzle portion 35 has been inserted in the electron beam inner surface irradiation step (hereinafter referred to as “electron beam”). It is also referred to as “aperture irradiation process”).
In FIG. 3, the radiation direction of the electron beam is indicated by a dashed arrow, and the flow direction of the inert gas is indicated by a solid arrow, as in FIG. Further, the moving direction of the container is indicated by a one-dot chain line arrow.

According to the electron beam irradiation apparatus 10 as described above, since the electron beam irradiation nozzle portion 35 is provided in the electron beam tube holder 30, the electron beam irradiation target object has the opening 1 </ b> A like the cylindrical container 1. Even if it has a three-dimensional shape with a bottomed cylindrical shape, it can irradiate the cylindrical container 1 with an electron beam partially shielded by the electron beam irradiation nozzle portion 35, The intended dose can be uniformly applied to the cylindrical container 1.
That is, first, in the electron beam inner surface irradiation step, by inserting the electron beam irradiation nozzle portion 35 into the opening 1A and the opening portion of the cylindrical container 1, the portion where the electron beam irradiation nozzle portion 35 is inserted is completely formed. In this state, the cylindrical container 1 is irradiated with an electron beam, and the inner surface of the cylindrical container 1 excluding the opening 1A and the opening portion is irradiated with the electron beam. Next, in the electron beam opening irradiation step that is continuous with the electron beam inner surface irradiation step, the cylindrical container 1 is moved downward so as to pull out the electron beam irradiation nozzle portion 35 from the opening 1A of the cylindrical container 1. Irradiating the electron beam in a state in which the irradiation dose is controlled by adjusting the distance between the opening 1A and the opening portion with respect to the electron beam exit window 23 based on the dose distribution related to the cylindrical container 1 by a simple operation. Can do.
Therefore, according to the electron beam irradiation apparatus 10, the cylindrical container 1 can be reliably and easily irradiated with an electron beam without excessively irradiating the opening 1A and the opening portion. The cylindrical container 1 can be reliably sterilized, and the cylindrical container 1 itself can be prevented from being partially deteriorated by irradiation with an electron beam.

Further, since the electron beam irradiation apparatus 10 is provided with a gas flow path formed so that the electron beam emission window 23 of the electron beam tube 30 is exposed, the electron beam inner surface irradiation process and the electron beam irradiation process are performed. In any step of the beam opening irradiation step, the gas flow path is filled with an inert gas in a flowing state, whereby the electron beam exit window 23 and the electron beam emitted from the electron beam exit window 23 are filled. Can be prevented from being exposed to the atmosphere. Further, the oxygen partial pressure in the space through which the electron beam emitted from the electron beam emission window 23 passes, specifically, the electron beam passage space 31B of the electron beam tube holder 30 and the internal space of the electron beam irradiation nozzle portion 35 is reduced. Therefore, it is possible to prevent ozone from being generated by the emission of the electron beam from the electron beam emission window 23. Therefore, it is possible to prevent the electron beam exit window 23 from being oxidized due to the generation of ozone.
Further, in the electron beam irradiation apparatus 10, the gas flow path is formed so as to flow in the electron beam tube housing space 13 of the casing 12 in which the electron beam tube 20 is housed. Even when an acceleration voltage as high as 60 kV, for example, is applied to the tube 20, it is possible to suppress deterioration of the casing 12 due to the electron beam tube 20 becoming high temperature due to the cooling action by the cooling gas, And since the static electricity which generate | occur | produced on the outer surface of the said electron beam tube 20 is removed when a cooling gas flows along the outer surface of the electron beam tube 20, generation | occurrence | production of an unnecessary arc discharge can be prevented. .

  Further, in the electron beam irradiation apparatus 10, since the electron beam tube holder 30 is provided with the positioning stopper portion 33, the opening 1 </ b> A of the cylindrical container 1 is formed in the positioning stopper portion 33 in the electron beam inner surface irradiation step. Since the cylindrical container 1 can be reliably disposed at a desired electron beam irradiation position by the contact, the inner surface of the cylindrical container 1 is reliably irradiated with the required dose of electron beam. Can be easily done. In addition, in the electron beam inner surface irradiation process and the electron beam opening irradiation process, the cylindrical container 1 moves in the direction toward the electron beam tube 20 while the cylindrical container 1 is being irradiated with the electron beam. However, since the positioning stopper portion 33 prevents the electron beam emission window 23 from coming into contact with the electron beam emission window 23, the cylindrical container 1 comes into contact with the electron beam emission window 23 during the electron beam irradiation. It is possible to prevent the window 23 from being damaged.

  Such an electron beam irradiation apparatus 10 is suitable for performing a sterilization treatment required for the container on a work line for filling the container with a substance to be applied to the human body such as pharmaceuticals and lotions. For example, by transporting a container that has been sterilized by the electron beam irradiation apparatus 10 from the sterilization process according to the electron beam irradiation apparatus 10 to a filling process that is the next process by, for example, a belt conveyor, Sterilization can be easily performed in-line.

As mentioned above, although embodiment of this invention was described, this invention is not limited to said embodiment, A various change can be added.
For example, when an acceleration voltage as high as 60 kV, for example, is applied to an electron beam tube, an electron beam irradiation device has a gas flow path formed so that a cooling gas flows into the electron beam tube housing space. However, when the acceleration voltage applied to the electron beam tube is not relatively high, as shown in FIG. 4, the gas flow path has a region formed in the casing 41. Instead, it may be configured such that the gas supply means is formed so as to be directly connected to the gas channel groove 49 formed in the electron beam tube holder 45. The casing 41 shown in FIG. 4 has the same configuration as the casing 12 according to the electron beam irradiation apparatus 10 of FIG. 1 except that the gas flow path grooves 14A and 14B are not provided. The electron beam tube holder 45 includes a positioning fixing portion 31, a positioning stopper portion 33 in which a gas vent hole 36 is formed, and an electron beam irradiation nozzle portion 35. A gas flow path is used instead of the gas flow path groove 37A. Except that the groove 49 is provided, it has the same configuration as the electron beam tube holder 30 according to the electron beam irradiation apparatus 10 of FIG.
Further, the electron beam irradiation nozzle need not be provided integrally with the electron beam tube holder. For example, as shown in FIG. 5, a ring-shaped electron having a gas flow channel groove 59 is formed. It may be provided below the beam tube holder 51 (downward in FIG. 5) and may be configured integrally with the positioning stopper. In FIG. 5, reference numeral 55 denotes a disk-shaped positioning stopper portion 56 in which a gas vent hole 58 is formed, and an electron beam emitted from the electron beam emission window 23 of the electron beam tube 20 that is continuous with the positioning stopper portion 56. This is an electron beam irradiation nozzle structure having an electron beam irradiation nozzle portion 57 having a cylindrical shape protruding so as to extend in the radial direction.

It is the schematic for description which shows an example of a structure of the electron beam irradiation apparatus of this invention. FIG. 2 is a partial enlarged view for explanation showing a main part of the electron beam irradiation apparatus of FIG. 1 in a state in which an electron beam irradiation target is irradiated with an electron beam. It is a partial enlarged view for explanation showing another state in which an electron beam irradiation object is irradiated with an electron beam. It is the elements on larger scale for explanation which show the principal part in other examples of the composition of the electron beam irradiation apparatus of the present invention. It is the elements on larger scale for explanation which shows the important section in the further another example of composition of the electron beam irradiation apparatus of the present invention. It is the explanatory schematic which shows an example of a structure of the conventional electron beam irradiation apparatus. It is explanatory drawing which shows an example of the shielding structure used when irradiating an electron beam to a container using the conventional electron beam irradiation apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Container 1A Opening 10 Electron beam irradiation apparatus 12 Casing 12A One side 12B Opening 13 Electron beam tube accommodating space 14A, 14B Gas channel groove 16 High voltage transformer 17 Feed line 18 Connector 19 Control unit 20 Electron beam tube 21 Valve 21A Opening 22 Lid Part 22A Electron beam exit hole 23 Electron beam exit window 24 Electron beam generator 26 Feed terminal 27 Base 30 Electron beam tube holder 31 Positioning fixing part 31A Electron beam tube installation space 31B Electron beam passage space 33 Positioning stopper part 35 Electron beam irradiation nozzle Portion 36 Gas vent 37A Gas channel groove 41 Casing 45 Electron beam tube holder 49 Gas channel groove 51 Electron beam tube holder 55 Electron beam irradiation nozzle structure 56 Positioning stopper unit 57 Electron beam irradiation Zur unit 58 the gas vent holes 59 the gas flow path groove 62 casing 62A one side 62B opening 63 the electron beam tube housing space 68 gas channel 70 container 71 shield structure 71A spout shielding portion 71B side shielding portion

Claims (6)

An electron beam generator is disposed inside the vacuum state, and an electron beam tube having an electron beam exit window for emitting an electron beam generated in the electron beam generator, and the electron beam tube An electron beam irradiation apparatus comprising a casing having an electron beam tube accommodating space for accommodating,
An electron beam irradiation nozzle that extends in the radiation direction of the electron beam emitted from the electron beam emission window of the electron beam tube and conducts the electron beam emitted from the electron beam emission window is provided. Electron beam irradiation device.   The electron beam irradiation apparatus according to claim 1, further comprising a gas flow path formed so that an electron beam emission window of the electron beam tube is exposed.   The gas flow path has a region for flowing a cooling gas for cooling the electron beam tube formed in the casing, and the cooling gas is an inert gas. Electron beam irradiation device.   The electron beam irradiation apparatus according to any one of claims 1 to 3, further comprising a positioning stopper for restricting the electron beam irradiation object from moving in a direction toward the electron beam tube. .   An electron beam tube holder for fixing the electron beam tube in an electron beam tube housing space in the casing is provided, and the electron beam tube holder is provided with an electron beam irradiation nozzle. The electron beam irradiation apparatus according to claim 1.   6. The electron beam irradiation nozzle is inserted from an opening of a cylindrical electron beam irradiation object, and in that state, the electron beam irradiation object is irradiated with the electron beam irradiation object. The electron beam irradiation apparatus in any one.

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