JP2008108772A - Aligner and support structure thereof - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To reduce vibration in the body of an aligner effectively for the support structure of the aligner supporting the aligner, and the aligner. <P>SOLUTION: The body of the aligner in which equipment for exposure is arranged is supported on a building foundation via a pedestal for the body. Auxiliary equipment as a vibration source is supported on the building foundation via a support means independent of the pedestal. The equipment for exposure includes a reticle stage, a projection optical system, and a wafer stage. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to an exposure apparatus support structure for supporting an exposure apparatus and an exposure apparatus.

In a conventional support structure for an exposure apparatus, the exposure apparatus is supported on a building foundation via a single pedestal (pedestal). In order to prevent disturbance vibrations from being transmitted to the exposure apparatus, the apparatus main body on which the reticle stage, projection optical system, wafer stage and the like are arranged is supported via a vibration isolation device.
On the other hand, in recent years, with the miniaturization of semiconductor integrated circuits, an EUV exposure apparatus using EUV light having a wavelength of about 13 nm has been developed in order to improve the resolving power of an optical system limited by the diffraction limit of light. . In such an EUV light exposure apparatus, the required value for disturbance vibration is very strict.
JP 7-254555 A

  However, in the conventional exposure apparatus support structure, since the exposure apparatus is installed on the building foundation via a single pedestal, vibrations of vacuum pumps and air conditioners that are auxiliary equipment (peripheral equipment) of the exposure apparatus Is transmitted to the apparatus main body through a single pedestal and vibration isolator, and there is a problem that it is difficult to satisfy strict requirements for disturbance vibration even when a high performance vibration isolator is used.

  The present invention has been made in order to solve such a conventional problem, and an object of the present invention is to provide a support structure for an exposure apparatus and an exposure apparatus that can effectively reduce vibration of the apparatus main body.

The exposure apparatus support structure according to the first aspect of the present invention supports an apparatus main body on which an exposure apparatus is disposed via a main body pedestal on a building foundation, and an auxiliary apparatus serving as a vibration source on the building base. It is characterized by being supported through support means independent of the main body pedestal.
An exposure apparatus support structure according to a second aspect of the present invention is the exposure apparatus support structure according to the first aspect, wherein the exposure apparatus includes a reticle stage, a projection optical system, and a wafer stage.

An exposure apparatus support structure according to a third aspect of the present invention is the exposure apparatus support structure according to the first or second aspect, wherein the support means is arranged on the building foundation independently from the main body pedestal. It is a pedestal for use.
A support structure for an exposure apparatus according to a fourth aspect of the invention is the support structure for an exposure apparatus according to the third aspect, wherein the auxiliary equipment pedestal is arranged on the building foundation via a vibration isolation device. To do.

An exposure apparatus support structure according to a fifth aspect of the present invention is the exposure apparatus support structure according to the first or second aspect, wherein the support means is a clean room floor supported on a building foundation via a column. Features.
An exposure apparatus support structure according to a sixth aspect is the exposure apparatus support structure according to any one of the first to fifth aspects, wherein the main body pedestal is disposed on the building foundation via a vibration isolation device. It is characterized by.

According to a seventh aspect of the present invention, there is provided a support structure for an exposure apparatus according to any one of the first to sixth aspects, wherein the auxiliary device includes a vacuum pump for evacuating the apparatus body. It is characterized by that.
An exposure apparatus support structure according to an eighth aspect of the present invention is the exposure apparatus support structure according to any one of the first to seventh aspects of the invention, wherein the auxiliary equipment includes air conditioning means for air conditioning the apparatus body. It is characterized by.

A support structure for an exposure apparatus according to a ninth aspect is the support structure for an exposure apparatus according to the eighth aspect, wherein the air conditioning means is disposed so as to cover the apparatus main body and is placed on the auxiliary instrument pedestal. It has a chamber.
An exposure apparatus support structure according to a tenth aspect of the present invention is the exposure apparatus support structure according to any one of the first to ninth aspects, wherein the auxiliary device has a temperature of the device in the apparatus body within a predetermined range. A temperature controller to be maintained is included.

An exposure apparatus support structure according to an eleventh aspect is the exposure apparatus support structure according to any one of the first to tenth aspects, wherein the auxiliary device includes a control unit for controlling the exposure apparatus. And
An exposure apparatus support structure according to a twelfth aspect of the invention is the exposure apparatus support structure according to any one of the first to eleventh aspects of the invention, wherein the auxiliary device includes a loader device for carrying the substrate in and out of the apparatus body. It is included.

A support structure for an exposure apparatus according to a thirteenth aspect is the support structure for an exposure apparatus according to any one of the first to twelfth aspects, wherein the auxiliary device is connected to a stator of a linear motor disposed on a wafer stage. The counter mass is included.
An exposure apparatus according to a fourteenth aspect is characterized by being supported by a support structure for an exposure apparatus according to any one of the first to thirteenth aspects.

  In the present invention, the vibration of the apparatus main body can be effectively reduced.

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
(First embodiment)
1 and 2 schematically show a first embodiment of a support structure for an exposure apparatus of the present invention. In this embodiment, the present invention is applied to a support structure of an EUV exposure apparatus using EUV light.

The exposure apparatus support structure includes a building foundation 11, a main body pedestal 13, a first auxiliary equipment pedestal 15, a second auxiliary equipment pedestal 17, and a grating 19.
The building foundation 11 is a foundation of the building, and is formed of concrete, reinforced concrete, or the like. The main body pedestal 13, the first auxiliary equipment pedestal 15, and the second auxiliary equipment pedestal 17 are pedestals placed on the building foundation 11, and are formed of concrete, reinforced concrete, or the like. The main body pedestal 13, the first auxiliary device pedestal 15, and the second auxiliary device pedestal 17 are arranged at intervals in the horizontal direction. The grating 19 is a clean room floor, and is supported on the building foundation 11 via a column 21. The grating 19 is disposed at a horizontal interval with respect to the main body pedestal 13, the first auxiliary device pedestal 15, and the second auxiliary device pedestal 17.

  An apparatus main body 23 is placed on the main body pedestal 13. On the first auxiliary device pedestal 15, an atmospheric loader 25 as a loader device is placed. An air conditioning chamber 27 is placed on the second auxiliary device pedestal 17. As shown in FIG. 2, the second auxiliary device pedestal 17 is formed in a rectangular ring shape surrounding the apparatus main body 23 and the atmospheric loader 25.

  As shown in FIGS. 3 and 4, the apparatus main body 23 has a base plate 29. The base plate 29 is placed on the main body pedestal 13. A main body chamber 31 is disposed on the base plate 29. The main body chamber 31 has a rectangular parallelepiped shape, and has an upper surface portion 31a and a side surface portion 31b. The inside of the main body chamber 31 is evacuated by a vacuum pump unit and kept in a vacuum.

  A gantry 33 is horizontally disposed in the main body chamber 31. The gantry 33 is held in the main body chamber 31 via a vibration isolation device 35. The vibration isolator 35 is arrange | positioned at three places of the lower surface of the mount frame 33, as shown in FIG. Each vibration isolator 35 is disposed between beams 37 a, 37 b, 37 c that extend inward from the side surface portion 31 b of the main body chamber 31 and the gantry 33.

An illumination optical system 39 and a projection optical system 41 are arranged on the gantry 33. The illumination optical system 39 and the projection optical system 41 pass through the gantry 33 in the vertical direction and are fixed to the gantry 33. A lower portion 39 a of the illumination optical system 39 extends through the side surface portion 31 b of the main body chamber 31 to the outside of the main body chamber 31 and is opened to the light source portion 43.
A wafer stage 45 is disposed below the projection optical system 41. The wafer stage 45 is disposed on the base plate 29 via a vibration isolation device 47. A reticle stage 49 is disposed above the projection optical system 41. The reticle stage 49 is supported by a beam 51 projecting inward from the side surface portion 31 b of the main body chamber 31.

  The air loader 25 is disposed in an air atmosphere formed by the air conditioning chamber 27 as shown in FIGS. 1 and 2, and carries a substrate (wafer, reticle) into the apparatus main body 23 that is in a vacuum atmosphere. Carry out. More specifically, the atmospheric loader 25 has a robot hand 53 and carries the substrate in and out of a known load lock chamber 55 disposed in the apparatus main body 23. Then, vibration is generated when the robot hand 53 is driven.

  As shown in FIG. 1, the air conditioning chamber 27 has a rectangular parallelepiped shape whose lower surface is opened, and the lower end is placed on a second auxiliary device pedestal 17 having a rectangular ring shape. An air supply device 57 and an exhaust device 57 are disposed on the side surface of the air conditioning chamber 27. An air supply duct 61 and an exhaust duct 63 are connected to the air supply device 57 and the exhaust device 57. The air supply duct 61 and the exhaust duct 63 are connected to an air conditioner (not shown) disposed outside the air conditioning chamber 27. The air supply device 57 and the exhaust device 57 each have a fan 65 serving as a vibration source, and supply and exhaust air to the air conditioning chamber 27 by driving the fan 65. The air conditioning chamber 27 is maintained at a constant temperature and humidity by air supply and exhaust by the air supply device 57 and the exhaust device 57.

  In the embodiment described above, the vibration from the atmospheric loader 25 that is a vibration source is attenuated and transmitted from the first auxiliary device pedestal 15 to the building foundation 11 as indicated by the arrow in FIG. Is attenuated and transmitted from the building foundation 11 to the main body pedestal 13 after being attenuated. Further, the vibration from the air conditioning chamber 27 caused by the fan 65 as a vibration source is attenuated and transmitted from the second auxiliary equipment pedestal 17 to the building foundation 11 as shown by the arrow in FIG. 11 is attenuated and transmitted from the building foundation 11 to the main body pedestal 13 after being attenuated.

Therefore, the vibration transmitted from the atmospheric loader 25 and the air conditioning chamber 27 to the apparatus main body 23 becomes very small, and the vibration transmitted to the apparatus main body 23 can be effectively reduced. In addition to this, by using the high-performance vibration isolation devices 35 and 47, it becomes possible to satisfy strict requirements for disturbance vibration of the EUV exposure apparatus. The EUV exposure apparatus requires a VC-D level (250 μinch / s) in terms of environmental vibration standards.
(Second Embodiment)
FIG. 5 shows a second embodiment of the support structure of the exposure apparatus of the present invention.

In addition, in this embodiment, the same code | symbol is attached | subjected to the element same as 1st Embodiment, and detailed description is abbreviate | omitted.
In this embodiment, the main body pedestal 13, the first auxiliary device pedestal 15 </ b> A, and the second auxiliary device pedestal 17 </ b> A are directly placed on the building foundation 11. A vacuum pump unit 67 is placed on the first auxiliary device pedestal 15A. A control unit 69 is placed on the second auxiliary device pedestal 17A.

The vacuum pump unit 67 is connected to the apparatus main body 23 by a pipe 71. The vacuum pump unit 67 has a pump 73 such as a dry pump or a turbo molecular pump serving as a vibration source. Then, the inside of the apparatus main body 23 is evacuated by driving the pump 73, and the inside of the apparatus main body 23 is maintained at a predetermined degree of vacuum.
The control unit 69 is connected to the apparatus main body 23 by a cable 75. Then, various devices in the apparatus main body 23 are controlled. The control unit 69 is provided with a fan 77 for radiating heat from an electronic device (not shown) housed inside. The rotation of the fan 77 becomes a vibration source.

  In this embodiment, the vibration from the vacuum pump unit 67 which is a vibration source is attenuated and transmitted from the first auxiliary equipment pedestal 15A to the building foundation 11 as shown by the arrow in FIG. Is attenuated and transmitted from the building foundation 11 to the main body pedestal 13 after being attenuated. Further, the vibration from the control unit 69 as a vibration source is attenuated and transmitted from the second auxiliary equipment pedestal 17A to the building foundation 11 as shown by the arrow in FIG. It is attenuated and transmitted from the building foundation 11 to the main body pedestal 13.

Therefore, the vibration transmitted from the vacuum pump unit 67 to the apparatus main body 23 becomes very small, and the vibration transmitted to the apparatus main body 23 can be effectively reduced.
(Third embodiment)
FIG. 6 shows a third embodiment of the support structure of the exposure apparatus of the present invention.
In addition, in this embodiment, the same code | symbol is attached | subjected to the element same as embodiment mentioned above, and detailed description is abbreviate | omitted.

  In this embodiment, the main body pedestal 13 </ b> A on which the apparatus main body 23 is placed is placed on the building foundation 11 via the vibration isolation device 79. Further, the first grating 19A and the second grating 19B are provided with a space in the horizontal direction with respect to the main body pedestal 13A. A temperature controller unit 81 is placed on the first grating 19A. A control unit 69 is placed on the second grating 19B.

  The temperature controller unit 81 is connected to the apparatus main body 23 by a pipe 83. The temperature controller unit 81 has a pump 85 that circulates a liquid or gas maintained at a predetermined temperature into the apparatus main body 23 via a pipe 83. And the drive of this pump 85 becomes a vibration source. In the liquid temperature control, for example, a liquid refrigerant is circulated through the vacuum pump, the linear motor coils of the reticle stage 49 and the wafer stage 45, and the coils of the vibration isolation devices 35 and 47 to cool these devices. In the gas temperature control, for example, the gas supplied to the static pressure bearings of the reticle stage 49 and the wafer stage 45 or the vibration isolation devices 35 and 47 is cooled and circulated.

  In this embodiment, the vibration from the temperature controller unit 81 that is a vibration source is attenuated and transmitted from the first grating 19A to the building foundation 11 via the column 21, as indicated by the arrows in FIG. The vibration is attenuated at the building foundation 11 and transmitted from the building foundation 11 to the vibration isolation device 79. Further, the vibration from the control unit 69 which is a vibration source is attenuated and transmitted from the second grating 19B to the building foundation 11 via the column 21 as shown by the arrow in FIG. Then, the vibration is transmitted from the building foundation 11 to the vibration isolation device 79.

Accordingly, the vibration transmitted from the temperature controller unit 81 and the control unit 69 to the vibration isolation device 79 is very small, and the vibration can be substantially completely blocked by the vibration isolation device 79 and the main body pedestal 13A. The vibration transmitted to the apparatus main body 23 can be almost eliminated. In addition to this, by using a high-performance vibration isolator 79, it becomes possible to satisfy strict requirements for disturbance vibration of the EUV exposure apparatus.
(Fourth embodiment)
FIG. 7 shows a fourth embodiment of the support structure of the exposure apparatus of the present invention.

In addition, in this embodiment, the same code | symbol is attached | subjected to the element same as embodiment mentioned above, and detailed description is abbreviate | omitted.
In this embodiment, the first auxiliary equipment pedestal 15B on which the vacuum pump unit 67 is placed is placed on the building foundation 11 via the vibration isolation device 79A. In addition, the second auxiliary device pedestal 17B on which the control unit 69 is placed is placed on the building foundation 11 via the vibration isolation device 79B. The main body pedestal 13 on which the apparatus main body 23 is placed is placed directly on the building foundation 11.

  In this embodiment, the vibration from the vacuum pump unit 67, which is a vibration source, is attenuated by the first auxiliary device pedestal 15B and then greatly attenuated by the vibration isolation device 79A, as indicated by the arrows in FIG. It is transmitted to the building foundation 11. And it attenuate | damps in the building foundation 11, it attenuate | damps and transmits to the pedestal 13 for main bodies from the building foundation 11, and is transmitted to the apparatus main body 23 in the state by which the substantially vibration was interrupted | blocked completely. Further, the vibration from the control unit 69 which is a vibration source is attenuated by the second auxiliary equipment pedestal 17B and then greatly attenuated by the vibration isolator 79B to the building foundation 11 as shown by the arrow in FIG. Communicated. And it attenuate | damps in the building foundation 11, it attenuate | damps and transmits to the pedestal 13 for main bodies from the building foundation 11, and is transmitted to the apparatus main body 23 in the state by which the substantially vibration was interrupted | blocked completely.

Therefore, the vibration transmitted from the vacuum pump unit 67 and the control unit 69 to the apparatus main body 23 becomes very small, and the vibration transmitted to the apparatus main body 23 can be almost eliminated. In addition to this, by using the high-performance vibration isolators 79A and 79B, it becomes possible to satisfy strict requirements for disturbance vibration of the EUV exposure apparatus.
(Fifth embodiment)
8 and 9 show a fifth embodiment of the support structure of the exposure apparatus of the present invention.

In addition, in this embodiment, the same code | symbol is attached | subjected to the element same as embodiment mentioned above, and detailed description is abbreviate | omitted.
In this embodiment, the main body pedestal 13 and the auxiliary equipment pedestal 15 </ b> C are directly placed on the building foundation 11. And the well-known counter mass apparatus 87A, 87B is mounted in the pedestal 15C for auxiliary devices. The counter mass devices 87A and 87B have a counter mass 89, a guide member 91, and a rod member 93. The counter mass 89 is connected by a rod member 93 to a stator (not shown) of a linear motor (not shown) that moves the wafer stage 45. Then, the reaction force generated when the moving element (not shown) of the linear motor is moved is absorbed by moving the counter mass 89 along the guide member 91. Then, a vibration is generated by the movement of the counter mass 89 along the guide member 91 and becomes a vibration source.

  The counter mass device 87A is connected to a linear motor that moves the wafer stage 45 in the X direction in FIG. 9, and the counter mass device 87B is connected to a linear motor that moves the wafer stage 45 in the Y direction in FIG. Further, a vacuum bellows 95 is disposed at the insertion portion of the rod member 93 into the apparatus main body 23, and the inside of the apparatus main body 23 is maintained in a vacuum. The counter mass devices 87A and 87B are placed on the L-shaped auxiliary device pedestal 15C, but the auxiliary device pedestal for the counter mass device 87A and the auxiliary device pedestal for the counter mass device 87B. It may be divided into

In this embodiment, the vibration from the counter mass devices 87A and 87B, which are the vibration sources, is attenuated and transmitted from the auxiliary equipment pedestal 15C to the building foundation 11 as shown by the arrows in FIG. It attenuates and is attenuated and transmitted from the building foundation 11 to the main body pedestal 13.
Therefore, the vibration transmitted from the counter mass devices 87A and 87B to the device main body 23 becomes very small, and the vibration transmitted to the device main body 23 can be effectively reduced.
(Embodiment of exposure apparatus)
FIG. 10 schematically shows an EUV light lithography system. In this embodiment, the same members as those in the first embodiment are denoted by the same reference numerals. In this embodiment, EUV light is used as illumination light for exposure. The EUV light has a wavelength of 0.1 to 400 nm, and in this embodiment, a wavelength of about 1 to 50 nm is particularly preferable. The projection image uses the image optical system 101 and forms a reduced image of the pattern on the wafer W by the reticle R.

The pattern irradiated onto the wafer W is determined by a reflective reticle R disposed below the reticle stage 49 via an electrostatic chuck 103. Further, the wafer W is placed on the wafer stage 45. Typically, exposure is done by step scanning.
Since EUV light used as illumination light at the time of exposure has low permeability to the atmosphere, the light path through which the EUV light passes is surrounded by a main body chamber 31 that is kept in a vacuum using an appropriate vacuum pump 73. EUV light is generated by a laser plasma X-ray source. The laser plasma X-ray source includes a laser source 108 (acting as an excitation light source) and a xenon gas supply device 109. The laser plasma X-ray source is surrounded by a vacuum chamber 110. EUV light generated by the laser plasma X-ray source passes through the window 111 of the vacuum chamber 110.

  The parabolic mirror 113 is disposed in the vicinity of the xenon gas discharge portion. The parabolic mirror 113 collects EUV light generated by the plasma. The parabolic mirror 113 constitutes a condensing optical system, and is arranged so that the focal position comes near the position where the xenon gas from the nozzle 112 is emitted. The EUV light is reflected by the multilayer film of the parabolic mirror 113 and reaches the condensing mirror 114 through the window 111 of the vacuum chamber 110. The condensing mirror 114 condenses and reflects the EUV light to the reflective reticle R. The EUV light is reflected by the condensing mirror 114 and illuminates a predetermined portion of the reticle R. That is, the parabolic mirror 113 and the condensing mirror 114 constitute an illumination system of this apparatus.

The reticle R has a multilayer film that reflects EUV light and an absorber pattern layer for forming a pattern. The EUV light is “patterned” by being reflected by the reticle R. The patterned EUV light reaches the wafer W through the projection system 101.
The image optical system 101 of this embodiment includes four reflecting mirrors: a concave first mirror 115a, a convex second mirror 115b, a convex third mirror 115c, and a concave fourth mirror 115d. Each of the mirrors 115a to 115d is provided with a multilayer film that reflects EUV light.

The EUV light reflected by the reticle R is sequentially reflected from the first mirror 115a to the fourth mirror 115d to form an image in which the reticle pattern is reduced (eg, 1/4, 1/5, 1/6). The image optical system 101 is telecentric on the image side (wafer W side).
The reticle R is supported at least in the XY plane by a movable reticle stage 49. The wafer W is preferably supported by a wafer stage 45 that is movable in the X, Y, and Z directions. When exposing the die on the wafer W, EUV light is irradiated to a predetermined area of the reticle R by the illumination system, and the reticle R and the wafer W follow the reduction ratio of the image optical system 101 with respect to the image optical system 101. It moves at a predetermined speed. In this way, the reticle pattern is exposed to a predetermined exposure range (with respect to the die) on the wafer W.

  During exposure, the wafer W is preferably disposed behind the partition 116 so that the gas generated from the resist on the wafer W does not affect the mirrors 115a to 115d of the image optical system 101. The partition 116 has an opening 116a through which EUV light is irradiated from the mirror 115d onto the wafer W. The space in the partition 116 is evacuated by a vacuum pump 117. In this manner, gaseous dust generated by irradiating the resist is prevented from adhering to the mirrors 115a to 115d or the reticle R. Therefore, deterioration of these optical performances is prevented.

In the exposure apparatus of this embodiment, vibration transmitted to the apparatus main body 23 can be effectively reduced, so that highly accurate exposure can be performed.
(Supplementary items of the embodiment)
As mentioned above, although this invention was demonstrated by embodiment mentioned above, the technical scope of this invention is not limited to embodiment mentioned above.

(1) In the above-described embodiment, the example in which the present invention is applied to the support structure of the exposure apparatus using EUV light has been described. However, the present invention can be widely applied to the support structure of the exposure apparatus.
(2) In the above-described embodiment, the example in which the apparatus main body 23 is directly placed on the main body pedestals 13 and 13A has been described. For example, the apparatus main body 23 is placed on the main body pedestal via a vibration isolation device. Also good.

(3) In the first embodiment described above, the example in which the main body pedestal 13, the first auxiliary equipment pedestal 15, and the second auxiliary equipment pedestal 17 are directly placed on the building foundation 11 has been described. Alternatively, some or all of the pedestals may be placed on the building foundation via a vibration isolation device.
(4) In the second embodiment described above, the example in which the main body pedestal 13, the first auxiliary device pedestal 15A, and the second auxiliary device pedestal 17A are directly placed on the building foundation 11 has been described. Alternatively, some or all of the pedestals may be placed on the building foundation via a vibration isolation device.

(5) In the third embodiment described above, the example in which the main body pedestal 13 is placed on the building foundation 11 via the vibration isolation device 79 has been described, but it may be placed directly on the building foundation.
(6) In the above-described fourth embodiment, the example in which the main body pedestal 13 is directly placed on the building foundation 11 has been described. However, the main body pedestal may be placed on the building foundation via a vibration isolation device. .

  (7) In the fifth embodiment described above, the example in which the main body pedestal 13 and the auxiliary equipment pedestal 15C are directly placed on the building foundation 11 has been described. However, the main body pedestal or the auxiliary equipment pedestal is provided with a vibration isolator. You may make it mount on a building foundation through.

It is explanatory drawing which shows 1st Embodiment of the support structure of the exposure apparatus of this invention. It is explanatory drawing which removed the air-conditioning chamber and looked at the support structure of the exposure apparatus of FIG. It is explanatory drawing which shows the detail of the apparatus main body of FIG. It is explanatory drawing which looked at the apparatus main body of FIG. 3 from the AA direction. It is explanatory drawing which shows 2nd Embodiment of the support structure of the exposure apparatus of this invention. It is explanatory drawing which shows 3rd Embodiment of the support structure of the exposure apparatus of this invention. It is explanatory drawing which shows 4th Embodiment of the support structure of the exposure apparatus of this invention. It is explanatory drawing which shows 5th Embodiment of the support structure of the exposure apparatus of this invention. It is explanatory drawing which looked at the support structure of the exposure apparatus of FIG. 8 from upper direction. It is explanatory drawing which shows embodiment of exposure apparatus.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 11 ... Building foundation, 13, 13A ... Main body pedestal, 15, 15A, 15B ... First auxiliary equipment pedestal, 17, 17A, 17B ... Second auxiliary equipment pedestal, 15C ... Auxiliary equipment pedestal, 19, 19A, 19B ... grating, 23 ... main body, 25 ... atmospheric loader, 27 ... air conditioning chamber, 45 ... wafer stage, 49 ... reticle stage, 65 ... fan, 67 ... vacuum pump unit, 69 ... control unit, 73 ... pump, 81 ... Temperature controller unit, 87A, 87B ... Counter mass device.

Claims (14)

  The apparatus main body on which the exposure equipment is placed is supported on the building foundation via the main body pedestal, and the auxiliary equipment serving as a vibration source is supported on the building foundation via supporting means independent of the main body pedestal. A support structure for an exposure apparatus. The support structure for an exposure apparatus according to claim 1,
A support structure for an exposure apparatus, wherein the exposure apparatus includes a reticle stage, a projection optical system, and a wafer stage. In the support structure of the exposure apparatus according to claim 1 or 2,
The support structure of an exposure apparatus, wherein the support means is a pedestal for auxiliary equipment that is arranged on the building foundation independently from the pedestal for main body. In the support structure of the exposure apparatus according to claim 3,
A support structure for an exposure apparatus, wherein the auxiliary device pedestal is arranged on the building foundation via a vibration isolation device. In the support structure of the exposure apparatus according to claim 1 or 2,
The support structure for an exposure apparatus, wherein the support means is a clean room floor supported on the building foundation via a column. 6. The support structure for an exposure apparatus according to claim 1, wherein:
A support structure for an exposure apparatus, wherein the main body pedestal is arranged on the building foundation via a vibration isolation device. The support structure for an exposure apparatus according to any one of claims 1 to 6,
The support structure for an exposure apparatus, wherein the auxiliary device includes a vacuum pump for evacuating the apparatus body. In the supporting structure of the exposure apparatus according to any one of claims 1 to 7,
The support structure for an exposure apparatus, wherein the auxiliary equipment includes air conditioning means for air conditioning the apparatus main body. The support structure for an exposure apparatus according to claim 8,
The support structure of an exposure apparatus, wherein the air-conditioning means includes an air-conditioning chamber that is disposed so as to cover the apparatus main body and is placed on the auxiliary equipment pedestal. The support structure for an exposure apparatus according to any one of claims 1 to 9,
The support structure for an exposure apparatus, wherein the auxiliary device includes a temperature controller that maintains the temperature of the device in the apparatus main body within a predetermined range. The support structure for an exposure apparatus according to any one of claims 1 to 10,
A support structure for an exposure apparatus, wherein the auxiliary device includes a control unit for controlling the exposure apparatus. The support structure for an exposure apparatus according to any one of claims 1 to 11,
The support structure for an exposure apparatus, wherein the auxiliary device includes a loader device for carrying the substrate in and out of the apparatus main body. The support structure for an exposure apparatus according to any one of claims 1 to 12,
The support structure for an exposure apparatus, wherein the auxiliary device includes a counter mass connected to a stator of a linear motor disposed on the wafer stage.   An exposure apparatus, which is supported by the support structure for an exposure apparatus according to any one of claims 1 to 13.

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