JP2008098621A5 - - Google Patents
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- JP2008098621A5 JP2008098621A5 JP2007233645A JP2007233645A JP2008098621A5 JP 2008098621 A5 JP2008098621 A5 JP 2008098621A5 JP 2007233645 A JP2007233645 A JP 2007233645A JP 2007233645 A JP2007233645 A JP 2007233645A JP 2008098621 A5 JP2008098621 A5 JP 2008098621A5
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Claims (7)
前記レーザ発振器から発振されたレーザ光の進行方向において順に凹型の第１のレンズ、第２のレンズ、第３のレンズを有するズーム機能を具備するビームエキスパンダー光学系と、
前記レーザ発振器と前記ビームエキスパンダー光学系との間に配置された補正レンズと、を有し、
前記第１のレンズと前記第２のレンズの間隔を変えることで前記レーザ光のビーム径を拡大、または縮小し、前記第３のレンズを前記第２のレンズと連動させて、前記レーザ光を平行光とし、
前記レーザ発振器の射出点を第１の共役点とし、前記第１の共役点の像が前記補正レンズを介して結像される点を第２の共役点とし、前記補正レンズから前記第２の共役点までの距離をＢとし、前記第１のレンズの焦点距離をｆとし、前記補正レンズと前記第１のレンズとの距離をＸとすると、前記Ｘが、Ｂ−３｜ｆ｜≦Ｘ≦Ｂ＋｜ｆ｜、を満たすことを特徴とするレーザ光照射装置。 A laser oscillator;
A beam expander optical system includes a first lens of a concave, a second lens, the third lens chromatic Suruzu over beam functions to forward in the traveling direction of the laser light oscillated from the laser oscillator,
A correction lens disposed between the laser oscillator and the beam expander optical system ,
The larger the beam diameter of the laser beam spacing of the first lens and the second lens by may varying or reduced, and a pre-Symbol third lens in conjunction with said second lens, said laser Let light be parallel light,
The emission point of the laser oscillator is a first conjugate point, the point at which the image of the first conjugate point is imaged through the correction lens is the second conjugate point, and the second conjugate point is the second conjugate point. If the distance to the conjugate point is B, the focal length of the first lens is f, and the distance between the correction lens and the first lens is X, then X is B-3 | f | ≦ X ≦ B + | f |.
前記レーザ発振器から発振されたレーザ光の進行方向において順に凹型の第１のレンズ、第２のレンズ、第３のレンズを有するズーム機能を具備するビームエキスパンダー光学系と、
前記レーザ発振器と前記ビームエキスパンダー光学系との間に配置された補正レンズと、を有し、
前記第１のレンズと前記第２のレンズの間隔を変えることで前記レーザ光のビーム径を拡大、または縮小し、前記第３のレンズを前記第２のレンズと連動させて、前記レーザ光を平行光とし、
前記レーザ発振器の射出点を第１の共役点とし、前記第１の共役点の像が前記補正レンズを介して結像される点を第２の共役点とし、前記補正レンズから前記第２の共役点までの距離をＢとし、前記第１のレンズの焦点距離をｆとし、前記補正レンズと前記第１のレンズとの距離をＸとすると、前記Ｘが、Ｘ＝Ｂ−｜ｆ｜、であることを特徴とするレーザ光照射装置。 A laser oscillator;
A beam expander optical system includes a first lens of a concave, a second lens, the third lens chromatic Suruzu over beam functions to forward in the traveling direction of the laser light oscillated from the laser oscillator,
A correction lens disposed between the laser oscillator and the beam expander optical system ,
The larger the beam diameter of the laser beam spacing of the first lens and the second lens by may varying or reduced, and a pre-Symbol third lens in conjunction with said second lens, said laser Let light be parallel light,
The emission point of the laser oscillator is a first conjugate point, the point at which the image of the first conjugate point is imaged through the correction lens is the second conjugate point, and the second conjugate point is the second conjugate point. Assuming that the distance to the conjugate point is B, the focal length of the first lens is f, and the distance between the correction lens and the first lens is X, the X is X = B− | f |, A laser beam irradiation apparatus characterized by the above.
前記レーザ発振器から発振されたレーザ光の進行方向において順に凸型の第１のレンズ、第２のレンズ、第３のレンズを有するズーム機能を具備するビームエキスパンダー光学系と、
前記レーザ発振器と前記ビームエキスパンダー光学系との間に配置された補正レンズと、を有し、
前記第１のレンズと前記第２のレンズの間隔を変えることで前記レーザ光のビーム径を拡大、または縮小し、前記第３のレンズを前記第２のレンズと連動させて、前記レーザ光を平行光とし、
前記レーザ発振器の射出点を第１の共役点とし、前記第１の共役点の像が前記補正レンズを介して結像される点を第２の共役点とし、前記補正レンズから前記第２の共役点までの距離をＢとし、前記第１のレンズの焦点距離をｆとし、前記補正レンズと前記第１のレンズとの距離をＸとすると、前記Ｘが、Ｂ−ｆ≦Ｘ≦Ｂ＋３ｆ、を満たすことを特徴とするレーザ光照射装置。 A laser oscillator;
A beam expander optical system includes a first lens convex in order, the second lens, the third lens chromatic Suruzu over beam function in the traveling direction of the laser light oscillated from the laser oscillator,
A correction lens disposed between the laser oscillator and the beam expander optical system ,
The larger the beam diameter of the laser beam spacing of the first lens and the second lens by may varying or reduced, and a pre-Symbol third lens in conjunction with said second lens, said laser Let light be parallel light,
The emission point of the laser oscillator is a first conjugate point, the point at which the image of the first conjugate point is imaged through the correction lens is the second conjugate point, and the second conjugate point is the second conjugate point. If the distance to the conjugate point is B, the focal length of the first lens is f, and the distance between the correction lens and the first lens is X, then X is B−f ≦ X ≦ B + 3f, The laser beam irradiation apparatus characterized by satisfy | filling.
前記レーザ発振器から発振されたレーザ光の進行方向において順に凸型の第１のレンズ、第２のレンズ、第３のレンズを有するズーム機能を具備するビームエキスパンダー光学系と、
前記レーザ発振器と前記ビームエキスパンダー光学系との間に配置された補正レンズと、を有し、
前記第１のレンズと前記第２のレンズの間隔を変えることで前記レーザ光のビーム径を拡大、または縮小し、前記第３のレンズを前記第２のレンズと連動させて、前記レーザ光を平行光とし、
前記レーザ発振器の射出点を第１の共役点とし、前記第１の共役点の像が前記補正レンズを介して結像される点を第２の共役点とし、前記補正レンズから前記第２の共役点までの距離をＢとし、前記第１のレンズの焦点距離をｆとし、前記補正レンズと前記第１のレンズの距離をＸとすると、前記Ｘが、Ｘ＝Ｂ＋ｆ、であることを特徴とするレーザ光照射装置。 A laser oscillator;
A beam expander optical system includes a first lens convex in order, a second lens, a zoom function to have a third lens in the traveling direction of the laser light oscillated from the laser oscillator,
A correction lens disposed between the laser oscillator and the beam expander optical system ,
The larger the beam diameter of the laser beam spacing of the first lens and the second lens by may varying or reduced, and a pre-Symbol third lens in conjunction with said second lens, said laser Let light be parallel light,
The emission point of the laser oscillator is a first conjugate point, the point at which the image of the first conjugate point is imaged through the correction lens is the second conjugate point, and the second conjugate point is the second conjugate point. When the distance to the conjugate point is B, the focal length of the first lens is f, and the distance between the correction lens and the first lens is X, the X is X = B + f. A laser beam irradiation device.
前記レーザ発振器と前記第１のレンズとの距離が、０．５ｍ以上であることを特徴とするレーザ光照射装置。 In any one of Claims 1 thru | or 4 ,
A laser beam irradiation apparatus, wherein a distance between the laser oscillator and the first lens is 0.5 m or more.
前記第３のレンズは、凸レンズであることを特徴とするレーザ光照射装置。 In any one of Claims 1 thru | or 5 ,
The laser light irradiation apparatus , wherein the third lens is a convex lens.
前記補正レンズは、凸レンズであることを特徴とするレーザ光照射装置。 In any one of Claims 1 thru | or 6 ,
The laser light irradiation apparatus, wherein the correction lens is a convex lens.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007233645A JP5210574B2 (en) | 2006-09-14 | 2007-09-10 | Laser irradiation device |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006248975 | 2006-09-14 | ||
| JP2006248975 | 2006-09-14 | ||
| JP2007233645A JP5210574B2 (en) | 2006-09-14 | 2007-09-10 | Laser irradiation device |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008098621A JP2008098621A (en) | 2008-04-24 |
| JP2008098621A5 true JP2008098621A5 (en) | 2010-09-30 |
| JP5210574B2 JP5210574B2 (en) | 2013-06-12 |
Family
ID=39381092
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007233645A Expired - Fee Related JP5210574B2 (en) | 2006-09-14 | 2007-09-10 | Laser irradiation device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5210574B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2460648A (en) * | 2008-06-03 | 2009-12-09 | M Solv Ltd | Method and apparatus for laser focal spot size control |
| CN108549159B (en) * | 2018-06-04 | 2023-06-23 | 凯迈（洛阳）测控有限公司 | Optical system for airborne laser irradiation detector |
| WO2024018785A1 (en) * | 2022-07-19 | 2024-01-25 | 住友重機械工業株式会社 | Beam adjusting device and laser annealing device |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04237587A (en) * | 1991-01-18 | 1992-08-26 | Hitachi Constr Mach Co Ltd | Laser beam machine |
| JPH11251220A (en) * | 1998-03-02 | 1999-09-17 | Nikon Corp | Exposure equipment and exposure method |
| JP2003053578A (en) * | 2001-08-15 | 2003-02-26 | Sumitomo Heavy Ind Ltd | Method and device for adjusting profile of laser beam |
| DE10144244A1 (en) * | 2001-09-05 | 2003-03-20 | Zeiss Carl | Zoom-lens system esp. for micro-lithography illumination device e.g. for manufacture of semiconductor components, uses image plane as Fourier-transformed- plane to object plane |
| JP4439794B2 (en) * | 2001-09-10 | 2010-03-24 | 株式会社半導体エネルギー研究所 | Method for manufacturing semiconductor device |
| JP2006049606A (en) * | 2004-08-05 | 2006-02-16 | Sumitomo Heavy Ind Ltd | Laser beam machining equipment |
| JP5100127B2 (en) * | 2006-01-12 | 2012-12-19 | 株式会社半導体エネルギー研究所 | Laser light irradiation device |
-
2007
- 2007-09-10 JP JP2007233645A patent/JP5210574B2/en not_active Expired - Fee Related
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