JP2008060296A - Electronic equipment - Google Patents

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JP2008060296A
JP2008060296A JP2006234993A JP2006234993A JP2008060296A JP 2008060296 A JP2008060296 A JP 2008060296A JP 2006234993 A JP2006234993 A JP 2006234993A JP 2006234993 A JP2006234993 A JP 2006234993A JP 2008060296 A JP2008060296 A JP 2008060296A
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external terminal
substrate
terminal
connection
metal layer
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Hiroyuki Nakado
浩行 中堂
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Kyocera Display Corp
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Kyocera Display Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide electronic equipment having a connector using a photo-setting ACF, and having the excellent reliability of the connector. <P>SOLUTION: The electronic equipment related to a first mode has an insulating substrate 102 forming an electrode 113, and an external terminal 114 being formed on the end side of the insulating substrate 102 and having a metallic layer connected to the electrode 113. The electronic equipment further has a connecting substrate 116 having a connecting terminal 117 connected to the external terminal 114 through a photo-setting anisotropic conductive material 115. In the electronic equipment, the external terminal 114 and the connecting terminal 117 are arranged so as to be superposed, and a non-superposing region not superposed to the metallic layer 114b for the external terminal is formed to the whole or a part of the peripheral region of the connecting terminal 117. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は電子機器に関し、特に、光硬化性の異方性導電材を利用した電子機器に関する。   The present invention relates to an electronic device, and more particularly to an electronic device using a photocurable anisotropic conductive material.

液晶表示装置や有機EL(Electro Luminescence)表示装置等の表示パネルには、外部から電源電圧、表示信号等を供給するため、駆動回路等が実装されたフレキシブル基板が接続される。表示パネルとフレキシブル基板との接続方法としては、一般的に、表示パネルを構成するガラス基板の端部に設けられた外部端子とフレキシブル基板の接続端子とを、異方性導電フィルム(ACF:Anisotropic conductive film)を介して熱圧着する方法が用いられている(例えば、特許文献1参照)。   A display panel such as a liquid crystal display device or an organic EL (Electro Luminescence) display device is connected with a flexible substrate on which a drive circuit or the like is mounted in order to supply a power supply voltage, a display signal, and the like from the outside. As a method of connecting the display panel and the flexible substrate, generally, an external terminal provided at an end of a glass substrate constituting the display panel and a connection terminal of the flexible substrate are connected to an anisotropic conductive film (ACF: Anisotropic). A method of thermocompression bonding via a conductive film) is used (for example, see Patent Document 1).

具体的には、フレキシブル基板の接続端子上に、ACFを配置し、ガラス基板の外部端子とフレキシブル基板の接続端子とを位置合わせして熱圧着する。これにより、ガラス基板の外部端子がフレキシブル基板の接続端子と電気的に接続されるとともに、表示パネルとフレキシブル基板とが物理的に固定される。   Specifically, the ACF is disposed on the connection terminal of the flexible substrate, and the external terminal of the glass substrate and the connection terminal of the flexible substrate are aligned and thermocompression bonded. Thereby, the external terminal of the glass substrate is electrically connected to the connection terminal of the flexible substrate, and the display panel and the flexible substrate are physically fixed.

上記熱圧着するACFのバインダーとしては、熱硬化性化合物が用いられていが、近年、加熱を要さない光硬化性化合物の使用も検討されている。これにより、表示パネルの製造工程を簡略化することができる。この場合、紫外線硬化性化合物に導電粒子を混入させて異方性導電材とする。
特開平11−135909号公報
As the ACF binder to be thermocompression bonded, a thermosetting compound is used. In recent years, the use of a photocurable compound that does not require heating has been studied. Thereby, the manufacturing process of a display panel can be simplified. In this case, conductive particles are mixed into the ultraviolet curable compound to obtain an anisotropic conductive material.
JP-A-11-135909

光硬化性のACFを用いた場合、フレキシブル基板の接続端子上に、ACFを配置し、ガラス基板の外部端子とフレキシブル基板の接続端子とを位置合わせして加圧しつつ、反対側のガラス基板面から光を照射してACFを硬化する。   When photo-curing ACF is used, the ACF is placed on the connection terminal of the flexible substrate, the external terminal of the glass substrate and the connection terminal of the flexible substrate are aligned and pressed, and the opposite glass substrate surface The ACF is cured by irradiating light.

ここで、ガラス基板の外部端子は、通常ITO等の透明導電性膜上にCuなどの金属層を形成する積層体からなるため、光を透過しない。従って、ガラス基板の外部端子とフレキシブル基板の接続端子とに挟まれた部分のACFは未硬化のままとなる。そのため、ガラス基板の外部端子とフレキシブル基板の接続端子との間に剥離が生じ、接続不良が発生するという問題があった。   Here, since the external terminal of the glass substrate is usually made of a laminate in which a metal layer such as Cu is formed on a transparent conductive film such as ITO, it does not transmit light. Therefore, the portion of the ACF sandwiched between the external terminal of the glass substrate and the connection terminal of the flexible substrate remains uncured. Therefore, there is a problem that peeling occurs between the external terminal of the glass substrate and the connection terminal of the flexible substrate, resulting in poor connection.

本発明は、上記を鑑みなされたものであり、本発明の目的は、光硬化性のACFを用いた接続部を有し、その接続部の信頼性に優れた電子機器を提供することである。   The present invention has been made in view of the above, and an object of the present invention is to provide an electronic device having a connection portion using a photocurable ACF and having excellent reliability of the connection portion. .

本発明の第1の態様に係る電子機器は、電極が形成された絶縁基板と、前記絶縁基板の端辺に形成され、前記電極と接続された金属層を含む外部端子と、前記外部端子に光硬化性の異方性導電材を介して接続される接続端子を有する接続基板とを備え、前記外部端子と前記接続端子とが重なるように配置され、前記接続端子の周辺領域の全体又は一部に、前記外部端子の金属層と重ならない非重なり領域が形成されているものである。これにより、光硬化性のACFを介して接続された絶縁基板と接続基板との接続部の信頼性を向上させることができる。   An electronic device according to a first aspect of the present invention includes an insulating substrate on which an electrode is formed, an external terminal formed on an edge of the insulating substrate and including a metal layer connected to the electrode, and the external terminal. A connection substrate having a connection terminal connected via a photocurable anisotropic conductive material, the external terminal and the connection terminal are arranged so as to overlap, and the entire peripheral area of the connection terminal or one A non-overlapping region that does not overlap with the metal layer of the external terminal is formed in the portion. Thereby, the reliability of the connection part between the insulating substrate and the connection substrate connected via the photocurable ACF can be improved.

本発明の第2の態様に係る電子機器は、上記の電子機器において、前記接続端子の周辺領域全体に、前記非重なり領域が形成されていることを特徴とするものである。これにより、確実に光硬化性のACFを介して接続された絶縁基板と接続基板との接続部の信頼性を向上させることができる。   The electronic device according to a second aspect of the present invention is characterized in that, in the electronic device described above, the non-overlapping region is formed in the entire peripheral region of the connection terminal. Thereby, the reliability of the connection part of the insulating substrate and connection board which were connected via the photocurable ACF reliably can be improved.

本発明の第3の態様に係る電子機器は、上記の電子機器において、前記外部端子は透明導電層と金属層の積層体からなり、前記金属層は、個々の前記外部端子において、複数個所に分割配置されていることを特徴とするものである。これにより、さらに光硬化性のACFを介して接続された絶縁基板と接続基板との接続部の信頼性を向上させることができる。   An electronic device according to a third aspect of the present invention is the above electronic device, wherein the external terminal is formed of a laminate of a transparent conductive layer and a metal layer, and the metal layer is provided at a plurality of locations in each of the external terminals. It is characterized by being divided and arranged. Thereby, the reliability of the connection portion between the insulating substrate and the connection substrate connected via the photocurable ACF can be further improved.

本発明によれば、光硬化性のACFを用いた接続部を有し、その接続部の信頼性に優れた電子機器を提供することができる。   According to the present invention, it is possible to provide an electronic device having a connection portion using photocurable ACF and having excellent reliability of the connection portion.

以下に、本発明を適用可能な実施の形態が説明される。以下の説明は、本発明の実施形態を説明するものであり、本発明は以下の実施形態に限定されるものではない。   Hereinafter, embodiments to which the present invention can be applied will be described. The following description explains the embodiment of the present invention, and the present invention is not limited to the following embodiment.

実施の形態1.
本発明の実施の形態1について、図1を参照して説明する。図1は、本実施の形態に係る電子機器の一例を示す断面図である。本実施の形態においては、電子機器の一例として、液晶表示パネル100について説明する。図1に示すように、液晶表示パネル100は、フルドットのSTN型の液晶パネルであり、外部から入力される信号に従って画像の表示を行う。図1に示すように、液晶表示パネル100は、対向配置されたガラス、樹脂等からなる透明絶縁基板である第1の基板101と第2の基板102との間に液晶層111を挟持した構成を有している。第1の基板101と第2の基板102とは、シール材103により固着されている。
Embodiment 1 FIG.
A first embodiment of the present invention will be described with reference to FIG. FIG. 1 is a cross-sectional view illustrating an example of an electronic apparatus according to this embodiment. In this embodiment, a liquid crystal display panel 100 will be described as an example of an electronic device. As shown in FIG. 1, the liquid crystal display panel 100 is a full-dot STN type liquid crystal panel, and displays an image according to a signal input from the outside. As shown in FIG. 1, the liquid crystal display panel 100 has a configuration in which a liquid crystal layer 111 is sandwiched between a first substrate 101 and a second substrate 102 which are transparent insulating substrates made of glass, resin, or the like arranged to face each other. have. The first substrate 101 and the second substrate 102 are fixed by a sealing material 103.

第1の基板101及び第2の基板102の対向する面には、各々信号電極112、走査電極113が形成されている。第1の基板101には、複数の信号電極112が行方向に一定間隔を隔てて形成されている。また、第2の基板102には、信号電極112と交差するように複数の走査電極113が列方向に一定間隔を隔てて形成されている。表示領域は、複数の画素から構成され、信号電極112と走査電極113との交差部が画素に対応する。これらの電極は、例えば、ITO(Indium Tin Oxide)、IZO(Indium Zinc Oxide)、ITZO(Indium Tin Zinc Oxide)等の透明導電膜から形成されている。なお、上記とは反対に、第1の基板101上に走査電極が、第2の基板102上に信号電極が形成されていてもよい。   A signal electrode 112 and a scanning electrode 113 are formed on the opposing surfaces of the first substrate 101 and the second substrate 102, respectively. A plurality of signal electrodes 112 are formed on the first substrate 101 at regular intervals in the row direction. A plurality of scanning electrodes 113 are formed on the second substrate 102 at regular intervals in the column direction so as to intersect with the signal electrodes 112. The display area is composed of a plurality of pixels, and the intersection of the signal electrode 112 and the scanning electrode 113 corresponds to the pixel. These electrodes are formed of a transparent conductive film such as ITO (Indium Tin Oxide), IZO (Indium Zinc Oxide), and ITZO (Indium Tin Zinc Oxide). Note that, contrary to the above, a scan electrode may be formed on the first substrate 101 and a signal electrode may be formed on the second substrate 102.

第2の基板102に形成された走査電極113は、信号の入力又は出力のため、額縁領域である第2の基板102の端部まで延設されている。この第2の基板102の端部において、走査電極113から延設された外部端子の透明導電膜114a上には、Cu、Al、Cr、Mo、Ti等からなる外部端子の金属層114bが積層され、積層構造を有する外部端子114が形成されている。これにより、接続基板との接触抵抗を低減することができる。   The scanning electrode 113 formed on the second substrate 102 is extended to the end of the second substrate 102 which is a frame region for inputting or outputting a signal. At the end of the second substrate 102, an external terminal metal layer 114 b made of Cu, Al, Cr, Mo, Ti or the like is laminated on the external terminal transparent conductive film 114 a extending from the scanning electrode 113. Thus, an external terminal 114 having a laminated structure is formed. Thereby, contact resistance with a connection board | substrate can be reduced.

外部端子は、光硬化性のACF115を介し、接続基板であるFPC(Flexible Printed Circuit)116に接続されている。ここで、より詳細には、外部端子114は、FPC116の接続端子117に接続されている。光硬化性の樹脂としては、例えば、市販のエポキシ樹脂系の樹脂を用いることができる。具体例としては、ヘンケルジャパン社製のLX−3014等を挙げることができる。   The external terminal is connected to an FPC (Flexible Printed Circuit) 116 that is a connection substrate via a photocurable ACF 115. More specifically, the external terminal 114 is connected to the connection terminal 117 of the FPC 116. As the photocurable resin, for example, a commercially available epoxy resin-based resin can be used. Specific examples include LX-3014 manufactured by Henkel Japan.

図2は、第2の基板102の主面の法線方向から見た場合の外部端子の金属層114bと接続端子117との位置関係を示す平面透視図である。従来、外部端子の金属層114bと接続端子117とは略一致するように形成されていた。しかしながら、上述の通り、外部端子の金属層114bを形成した領域は光を透過できないため、当該領域上のACFは未硬化のままとなる。そのため、外部端子114と接続端子117との間に剥離が生じ、接続不良が発生するという問題があった。   FIG. 2 is a perspective plan view showing the positional relationship between the metal layer 114 b of the external terminal and the connection terminal 117 when viewed from the normal direction of the main surface of the second substrate 102. Conventionally, the metal layer 114b of the external terminal and the connection terminal 117 are formed so as to substantially coincide with each other. However, as described above, since the region where the external terminal metal layer 114b is formed cannot transmit light, the ACF on the region remains uncured. For this reason, there is a problem that separation occurs between the external terminal 114 and the connection terminal 117, resulting in poor connection.

そこで、本発明では、図2に示すように、第2の基板102の外部端子の金属層114bが形成された領域と接続基板の接続端子117が形成された領域とを、第2の基板102の主面の法線方向から見た場合、接続端子117の周辺領域の全体に、外部端子の金属層114bと重ならない非重なり領域が形成されている。すなわち、外部端子114の全体は接続端子117と重なっているが、接続端子117の周辺領域は非重なり領域となる。このような構成により、接続端子117の周辺部では、光硬化性のACFが硬化し、外部端子の透明導電膜114aと強固に接着されることになり、接続端子117と外部端子114とが剥離する起点が無くなる。従って、外部端子114と接続端子117との接続部の信頼性を向上することができる。非重なり領域は、接続端子117の周辺領域の一部のみに形成されていてもよいが、図2のように、周辺領域全体に形成されていることが好ましい。   Therefore, in the present invention, as shown in FIG. 2, the region where the metal layer 114 b of the external terminal of the second substrate 102 is formed and the region where the connection terminal 117 of the connection substrate is formed are divided into the second substrate 102. When viewed from the normal direction of the main surface, a non-overlapping region that does not overlap with the metal layer 114b of the external terminal is formed in the entire peripheral region of the connection terminal 117. That is, the entire external terminal 114 overlaps with the connection terminal 117, but the peripheral area of the connection terminal 117 is a non-overlapping area. With such a configuration, the photocurable ACF is cured at the peripheral portion of the connection terminal 117 and is firmly bonded to the transparent conductive film 114a of the external terminal, and the connection terminal 117 and the external terminal 114 are peeled off. There is no starting point to do. Therefore, the reliability of the connection portion between the external terminal 114 and the connection terminal 117 can be improved. The non-overlapping region may be formed only in a part of the peripheral region of the connection terminal 117, but is preferably formed in the entire peripheral region as shown in FIG.

さらに、接続端子117の周辺領域全体に形成された非重なり領域が、接続端子117の内部領域において連通している。換言すれば、外部端子の金属層114bは各々の外部端子114において複数個所に分割して形成されていることが好ましい。このような構成により、さらに外部端子114と接続端子117との接続部の信頼性を向上することができる。具体的には、光の透過性が均一になり、より強固に接続することができる。ただし、外部端子114の形成領域の面積が小さくなるほど、接続部の接触抵抗は大きくなる。なお、マトリクスパネル120としては、単純マトリクス型に限定されず、TFT(Thin film transistor)を用いたアクティブマトリクス型の液晶表示パネル等を用いてもよい。   Further, a non-overlapping region formed in the entire peripheral region of the connection terminal 117 communicates with the inner region of the connection terminal 117. In other words, the metal layer 114b of the external terminal is preferably divided into a plurality of locations in each external terminal 114. With such a configuration, the reliability of the connection portion between the external terminal 114 and the connection terminal 117 can be further improved. Specifically, the light transmittance becomes uniform, and the connection can be made stronger. However, the contact resistance of the connection portion increases as the area of the formation region of the external terminal 114 decreases. The matrix panel 120 is not limited to a simple matrix type, and an active matrix type liquid crystal display panel using a TFT (Thin Film Transistor) may be used.

次に、本実施の形態に係る液晶表示パネル100の製造方法について説明する。図3は、本実施の形態に係る液晶表示パネル100の製造方法のフロー図である。   Next, a method for manufacturing the liquid crystal display panel 100 according to the present embodiment will be described. FIG. 3 is a flowchart of the manufacturing method of the liquid crystal display panel 100 according to the present embodiment.

まず、第1の基板101及び第2の基板102の一方の面に、真空蒸着法、スパッタリング法等により、ITO等からなる透明導電膜を形成する。各透明導電膜を、フォトリソグラフィプロセス等により、パターニングして、第1の基板101上に信号電極112を、第2の基板102上に走査電極113を形成する(ステップS101)。   First, a transparent conductive film made of ITO or the like is formed on one surface of the first substrate 101 and the second substrate 102 by a vacuum deposition method, a sputtering method, or the like. Each transparent conductive film is patterned by a photolithography process or the like to form a signal electrode 112 on the first substrate 101 and a scanning electrode 113 on the second substrate 102 (step S101).

次に、上記透明導電膜上に、各々真空蒸着法、スパッタリング法等により、外部端子用の金属層を形成する。各金属層を、フォトリソグラフィプロセス等により、パターニングして、外部端子の金属層114bを形成する。これにより、第2の基板102上に、外部端子の透明導電膜114aと外部端子の金属層114bとの積層体からなる外部端子114を形成する(ステップS102)。ここで、図2に示すように、第2の基板102の外部端子の金属層114bが形成された領域と接続基板の接続端子117が形成された領域とを、第2の基板102の主面の法線方向から見た場合、接続端子117の周辺領域の全体に、外部端子の金属層114bと重ならない非重なり領域が形成されている。さらに、接続端子117の周辺領域全体に形成された非重なり領域を、接続端子117の内部領域において連通させるのが好ましい。換言すれば、外部端子の金属層114bは各々の外部端子114において複数個所に分割して形成されていることが好ましい。この非重なり領域において光を透過させることができるようになる。   Next, a metal layer for external terminals is formed on the transparent conductive film by a vacuum deposition method, a sputtering method, or the like. Each metal layer is patterned by a photolithography process or the like to form a metal layer 114b of an external terminal. Thus, the external terminal 114 made of a laminate of the transparent conductive film 114a for the external terminal and the metal layer 114b for the external terminal is formed on the second substrate 102 (step S102). Here, as shown in FIG. 2, the region where the metal layer 114 b of the external terminal of the second substrate 102 is formed and the region where the connection terminal 117 of the connection substrate is formed are the main surface of the second substrate 102. When viewed from the normal line direction, a non-overlapping region that does not overlap with the metal layer 114 b of the external terminal is formed in the entire peripheral region of the connection terminal 117. Further, it is preferable that a non-overlapping region formed in the entire peripheral region of the connection terminal 117 is communicated in the internal region of the connection terminal 117. In other words, the metal layer 114b of the external terminal is preferably divided into a plurality of locations in each external terminal 114. Light can be transmitted in this non-overlapping region.

次に、信号電極112と走査電極113とを対向させて、第1の基板101と第2の基板102とをシール材103を介して貼り合わせる。これにより形成された空間内に液晶を充填し、液晶表示パネル100を形成する。ここで、充填された液晶が液晶層111を構成する。(ステップS103)。   Next, the signal electrode 112 and the scanning electrode 113 are opposed to each other, and the first substrate 101 and the second substrate 102 are bonded to each other with the sealant 103 interposed therebetween. A liquid crystal is filled in the formed space, and the liquid crystal display panel 100 is formed. Here, the filled liquid crystal constitutes the liquid crystal layer 111. (Step S103).

次に、第2の基板102上の外部端子114とFPC116とを、光硬化性のACF115を介して貼り合わせる。ここで、FPC116の上から加圧しつつ、第2の基板102の反対側から光を照射してACF115を硬化させる。これにより、第2の基板102上の外部端子114とFPC116とが固定され、かつ、電気的に接続される。(ステップS104)。   Next, the external terminal 114 and the FPC 116 on the second substrate 102 are bonded to each other through a photocurable ACF 115. Here, the ACF 115 is cured by irradiating light from the opposite side of the second substrate 102 while applying pressure from above the FPC 116. As a result, the external terminal 114 and the FPC 116 on the second substrate 102 are fixed and electrically connected. (Step S104).

具体的には、第2の基板102上の外部端子114上に光硬化性のACF115を配置し、その上にFPC116を配置する。ここで、FPC116の接続端子117を、外部端子の金属層114b上に、図2に示す位置関係となるように配置する。ACF115を形成する領域全体を、FPC116の上方から加圧すると同時に、第2の基板102の反対側すなわち下側から紫外線などの光を照射してACF115を硬化させる。ACF115の硬化により、第2の基板102上の外部端子114とFPC116とが固定され、かつ、電気的に接続される。この上下関係は反対でもよい。   Specifically, a photocurable ACF 115 is disposed on the external terminal 114 on the second substrate 102, and the FPC 116 is disposed thereon. Here, the connection terminal 117 of the FPC 116 is arranged on the metal layer 114b of the external terminal so as to have the positional relationship shown in FIG. The entire region where the ACF 115 is formed is pressurized from above the FPC 116, and at the same time, light such as ultraviolet rays is irradiated from the opposite side of the second substrate 102, that is, the lower side, to cure the ACF 115. As the ACF 115 is cured, the external terminal 114 and the FPC 116 on the second substrate 102 are fixed and electrically connected. This vertical relationship may be reversed.

ここで、第2の基板102の外部端子の金属層114bが形成された領域と接続基板の接続端子117が形成された領域とを、第2の基板102の主面の法線方向から見た場合、外部端子の金属層114bが形成されている領域では、ACFが未硬化であるが、接続端子117の形成領域であって、外部端子の金属層114bが形成されていない非重なり領域では、接続端子117と外部端子の透明導電膜114aとが、硬化したACFにより強固に接着される。そのため、接続端子117と外部端子114とが剥離する起点が無く、外部端子114と接続端子117との接続部の信頼性を向上することができる。   Here, the region where the metal layer 114 b of the external terminal of the second substrate 102 was formed and the region where the connection terminal 117 of the connection substrate was formed were viewed from the normal direction of the main surface of the second substrate 102. In this case, the ACF is uncured in the region where the external terminal metal layer 114b is formed, but in the non-overlapping region where the connection terminal 117 is formed and the external terminal metal layer 114b is not formed, The connection terminal 117 and the transparent conductive film 114a of the external terminal are firmly bonded by the cured ACF. Therefore, there is no starting point where the connection terminal 117 and the external terminal 114 are separated, and the reliability of the connection portion between the external terminal 114 and the connection terminal 117 can be improved.

本発明は、液晶表示装置、有機EL表示装置等の表示装置だけでなく、絶縁基板上に電極が形成され、その電極に光硬化性のACFを介して、FPCが接続された構成を有する電子機器であれば、同様に適用できる。   The present invention provides not only a display device such as a liquid crystal display device and an organic EL display device, but also an electronic device in which an electrode is formed on an insulating substrate and an FPC is connected to the electrode through a photocurable ACF. The same applies to any device.

実施の形態に係る電子機器の構成を示す断面図である。It is sectional drawing which shows the structure of the electronic device which concerns on embodiment. 実施の形態に係る絶縁基板の外部端子とFPCの接続端子との位置関係を示す平面透過図である。It is a plane transmission figure which shows the positional relationship of the external terminal of the insulated substrate which concerns on embodiment, and the connection terminal of FPC. 実施の形態に係る電子機器の製造方法を説明するフロー図である。It is a flowchart explaining the manufacturing method of the electronic device which concerns on embodiment.

符号の説明Explanation of symbols

100 液晶表示パネル
101 第1の基板
102 第2の基板
103 シール材
111 液晶層
112 信号電極
113 走査電極
114 外部端子
114a 外部端子の透明導電膜
114b 外部端子の金属層
115 ACF
116 FPC
117 接続端子
DESCRIPTION OF SYMBOLS 100 Liquid crystal display panel 101 1st board | substrate 102 2nd board | substrate 103 Sealing material 111 Liquid crystal layer 112 Signal electrode 113 Scan electrode 114 External terminal 114a External conductive film 114b External terminal metal layer 115 ACF
116 FPC
117 connection terminal

Claims (3)

電極が形成された絶縁基板と、
前記絶縁基板の端辺に形成され、前記電極と接続された金属層を含む外部端子と、
前記外部端子に光硬化性の異方性導電材を介して接続される接続端子を有する接続基板とを備え、
前記外部端子と前記接続端子とが重なるように配置され、
前記接続端子の周辺領域の全体又は一部に、前記外部端子の前記金属層と重ならない非重なり領域が形成されている電子機器。
An insulating substrate on which electrodes are formed;
An external terminal including a metal layer formed on an edge of the insulating substrate and connected to the electrode;
A connection board having a connection terminal connected to the external terminal via a photocurable anisotropic conductive material,
Arranged so that the external terminal and the connection terminal overlap,
An electronic apparatus in which a non-overlapping region that does not overlap the metal layer of the external terminal is formed in the whole or a part of the peripheral region of the connection terminal.
前記接続端子の周辺領域全体に、前記非重なり領域が形成されていることを特徴とする請求項1に記載の電子機器。   The electronic apparatus according to claim 1, wherein the non-overlapping region is formed in the entire peripheral region of the connection terminal. 前記外部端子は透明導電層と金属層の積層体からなり、前記金属層は、各々の前記外部端子において、複数個所に分割配置されていることを特徴とする請求項1又は2に記載の電子機器。   3. The electron according to claim 1, wherein the external terminal includes a laminate of a transparent conductive layer and a metal layer, and the metal layer is divided and arranged at a plurality of locations in each of the external terminals. machine.
JP2006234993A 2006-08-31 2006-08-31 Electronic equipment Pending JP2008060296A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105449476A (en) * 2015-12-29 2016-03-30 广东欧珀移动通信有限公司 Circuit board connection assembly and mobile terminal

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105449476A (en) * 2015-12-29 2016-03-30 广东欧珀移动通信有限公司 Circuit board connection assembly and mobile terminal

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