JP2008059994A - Ion beam irradiation apparatus and ion beam irradiation method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an ion beam irradiation apparatus for injecting an ion beam uniformly into a substrate and having high flexibility in movement of a holder. <P>SOLUTION: The ion beam irradiation apparatus 1 which irradiates a substrate held by a holder 9 provided in a vacuum chamber 10 with ion beam advancing along the Z-axis direction, comprises a Z-axis slide mechanism 3 moving the holder 9 along the Z-axis direction and a Y-axis slide mechanism 2 making the holder 9 to rise and fall along Y-axis direction. The Z-axis slide mechanism 3 includes a Z-axis slider unit 6 provided with the holder 9 and sliding back and forth along the Z-axis direction, a Z-axis guide 7 guiding the Z-axis slider unit 6 along the Z-axis direction, a Z-axis driving motor 8 provided to make the Z-axis slider unit 6 slide back and forth. The Y-axis slide mechanism 2 includes a Y-axis guide 4 guiding the Z-axis guide 7 along the Y-axis direction, and a Y-axis driving motor 5 provided to make the Z-axis guide 7 slide back and forth along the Y-axis direction. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to an ion beam irradiation apparatus and an ion beam irradiation method configured to irradiate, for example, an ion beam traveling in a horizontal direction onto a substrate held on a substrate holding surface of a holder, and more particularly to divergence of an ion beam irradiated on a substrate. The present invention relates to an ion beam irradiation apparatus and an ion beam irradiation method for suppressing non-uniformity of implantation due to an angle.

  In this type of conventional ion beam irradiation apparatus, a configuration in which an ion beam is irradiated onto a substrate held by a holder is disclosed (for example, refer to Patent Document 1: FIG. 13, paragraphs [0015] and [0016]). This ion implantation apparatus includes a rotation device that rotates an electrostatic chuck (holder) so as to change an irradiation angle with respect to an ion beam traveling in a horizontal direction, and the electrostatic chuck together with the rotation device via a shaft. And a lifting device that moves up and down (up and down) in the Y direction (for example, the vertical direction). In the ion implantation apparatus configured as described above, the substrate held by the electrostatic chuck is irradiated with an ion beam that is scanned in the X direction (for example, the horizontal direction) substantially orthogonal to the Y direction. Ions are implanted into the entire surface.

  In addition, another configuration in which an ion beam is irradiated onto a substrate held by a holder is disclosed (for example, refer to Patent Document 2: Abstract). The ion implantation apparatus includes a workpiece holder that is provided inside a vacuum chamber and holds a workpiece. The workpiece is rotated about the X axis and is along the Y direction of the XY plane on the surface of the workpiece holder. Is lifted up and down.

Further, Patent Document 3 discloses another configuration (Patent Document 3: Claim 1, FIG. 1). This ion implantation apparatus includes a vacuum chamber that is irradiated with an ion beam through an opening formed on one side, and a scan shaft that includes a first drive motor that is rotatably and tiltably installed inside the vacuum chamber. And a scan axis correcting means capable of changing the tilt of the scan axis, and a horizontal transfer member that is coupled to an elevating member that is moved up and down in accordance with the operation of the first drive motor and is movable in the horizontal direction. A correction means, a vertical correction means having a vertical transfer member coupled to the front end of the horizontal transfer member and movable in the vertical direction, and a tilter mounted on the front end of the vertical transfer member to load or unload a substrate. I have.
JP 2003-110012 A (published on April 11, 2003 (2003.4.11)) Special Table 2001-516151 gazette (published on September 25, 2001 (2001.9.25)) JP 2001-155676 A (published June 8, 2001 (2001.6.8))

  However, in the configuration disclosed in Patent Document 1, since the substrate held by the electrostatic chuck moves up and down in an inclined state, the surface from the substrate surface on the electrostatic chuck to the ion source when the lower side of the substrate is irradiated is irradiated. The distance becomes shorter than the distance from the substrate surface on the electrostatic chuck when irradiating the upper side of the substrate to the ion source, and the distance changes during the ion beam irradiation process on the substrate surface. There is a problem that the concentration of the irradiated ion beam becomes non-uniform in the surface of the substrate. As a result, the uniformity of ion implantation on the substrate surface is deteriorated.

  Further, in the configurations disclosed in Patent Document 2 and Patent Document 3, the degree of freedom with respect to the drive range of the holder is low. For example, the holder is moved along the beam traveling direction while maintaining the same irradiation angle. I can't. As a result, when the substrate on the holder is easily charged, if the substrate is irradiated with a dense ion beam, the surface of the substrate is charged, causing a discharge, which may damage the element formed on the substrate surface. There is.

  The present invention has been made in view of the above problems, and an object of the present invention is to provide an ion beam irradiation apparatus and ion beam irradiation that can uniformly inject an ion beam onto a substrate and have a high degree of freedom with respect to movement of a holder. To realize the method.

  In order to solve the above problems, an ion beam irradiation apparatus according to the present invention is provided with an ion beam that travels along the Z-axis direction among the X-axis, the Y-axis, and the Z-axis orthogonal to each other in a vacuum chamber. An ion beam irradiation apparatus for irradiating a substrate held by a holder, the Z-axis sliding mechanism moving the holder along the Z-axis direction, and the Y-axis moving the holder up and down along the Y-axis direction The Z-axis sliding mechanism includes a holder and a Z-axis slider unit that reciprocally slides along the Z-axis direction, and the Z-axis slider unit extends along the Z-axis direction. And a Z-axis drive motor provided to reciprocately slide the Z-axis slider unit. The Y-axis sliding mechanism moves the Z-axis guide in the Y-axis direction. Y to guide along Guide and characterized by having a Y-axis drive motor provided the Z-axis guide to reciprocate along the Y-axis direction.

  Due to the above features, the Z-axis sliding mechanism driven by the Z-axis driving motor and the Y-axis sliding mechanism driven by the Y-axis driving motor are interlocked so that the holder holding the substrate can be used regardless of the irradiation angle. The substrate surface can be moved in a direction substantially perpendicular to the irradiation angle so that the substrate surface always passes through the same point of the ion beam. For this reason, the ion beam can be uniformly injected into the substrate in the vacuum chamber with a simple configuration.

  The ion beam irradiation apparatus according to the present invention preferably further includes a holder rotation mechanism that is built in the Z-axis slider unit and rotates the holder around an axis parallel to the X-axis.

  According to the above configuration, since the holder can be rotated around an axis parallel to the X axis, the irradiation angle can be changed according to the type of the ion beam and the substrate.

  The ion beam irradiation apparatus according to the present invention preferably further includes a holder rotation mechanism that is built in the Z-axis slider unit and rotates the holder around a direction perpendicular to the holding surface of the holder.

  According to the above configuration, the holder can be rotated around a direction perpendicular to the holding surface of the holder, so that the ion beam can be uniformly irradiated to the concave portion or the convex portion of the element formed on the substrate surface. it can.

  In the ion beam irradiation apparatus according to the present invention, it is preferable that the Z-axis drive motor and the Y-axis drive motor are provided outside the vacuum chamber.

  According to the said structure, the said Z-axis drive motor and the said Y-axis drive motor can be arrange | positioned in air | atmosphere, and it can be made to operate | move with good heat dissipation.

  In the ion beam irradiation apparatus according to the present invention, it is preferable that a Faraday mechanism for detecting divergence / convergence of the ion beam in the Y-axis direction is further provided before and after the holder in the Z-axis direction.

  According to the above configuration, the ion beam can be implanted by moving the holder along the traveling direction of the ion beam according to the divergence / convergence of the ion beam detected by the Faraday mechanism in the Y-axis direction.

  The ion beam irradiation method according to the present invention irradiates a substrate held by a holder provided in a vacuum chamber with an ion beam that travels along the Z-axis direction of the X, Y, and Z axes orthogonal to each other. In the ion beam irradiation method, the Z-axis slider unit provided with the holder is guided along the Z-axis direction and slid based on a Z-axis drive motor while the Z-axis slider unit is moved to the Y-axis. The ion beam is irradiated to the substrate held by the holder by being guided along the axial direction and sliding based on a Y-axis drive motor.

  According to the above feature, the sliding along the Z-axis direction of the Z-axis slider unit based on the Z-axis driving motor is linked with the sliding along the Y-axis direction of the Z-axis slider unit based on the Y-axis driving motor. The holder holding the substrate can be moved in a direction substantially perpendicular to the irradiation angle so that the substrate surface always passes through the same point of the ion beam regardless of the irradiation angle. For this reason, the ion beam can be uniformly injected into the substrate in the vacuum chamber with a simple configuration.

  In order to solve the above problems, an ion beam irradiation apparatus according to the present invention is provided with an ion beam that travels along the Z-axis direction among the X-axis, the Y-axis, and the Z-axis orthogonal to each other in a vacuum chamber. An ion beam irradiation apparatus for irradiating a substrate held by a holder, the Z-axis sliding mechanism moving the holder along the Z-axis direction, and the Y-axis moving the holder up and down along the Y-axis direction A Y-axis slider unit that is provided with the holder and slides back and forth along the Y-axis direction, and the Y-axis slider unit extends along the Y-axis direction. And a Y-axis drive motor provided to reciprocately slide the Y-axis slider unit, and the Z-axis sliding mechanism moves the Y-axis guide in the Z-axis direction. Z to guide along Guide and characterized in having a Z-axis drive motor provided the Y-axis guide to reciprocate along the Z-axis direction.

  The ion beam irradiation apparatus according to the present invention preferably further includes a holder rotation mechanism that is built in the Y-axis slider unit and rotates the holder around an axis parallel to the X-axis.

  The ion beam irradiation apparatus according to the present invention preferably further includes a holder rotation mechanism that is built in the Y-axis slider unit and rotates the holder around a direction perpendicular to the holding surface of the holder.

  In the ion beam irradiation apparatus according to the present invention, the holder is perpendicular to the direction inclined by the irradiation angle with respect to the traveling direction of the ion beam so that the ion beam always passes through the substrate surface at the same point. It is preferable to make a linear motion along.

  In the ion beam irradiation apparatus according to the present invention, it is preferable that the Y-axis drive motor and the Z-axis drive motor are provided outside the vacuum chamber.

  In the ion beam irradiation apparatus according to the present invention, it is preferable that a Faraday mechanism for detecting divergence / convergence of the ion beam in the Y-axis direction is further provided before and after the holder in the Z-axis direction.

The ion beam irradiation method according to the present invention irradiates a substrate held by a holder provided in a vacuum chamber with an ion beam that travels along the Z-axis direction of the X, Y, and Z axes orthogonal to each other. An ion beam irradiation method for
While guiding the Y-axis slider unit provided with the holder along the Y-axis direction and sliding it based on the Y-axis drive motor, the Y-axis slider unit is guided along the Z-axis direction and Z The substrate is slid based on an axial drive motor, and the substrate is held by the holder, and the ion beam is irradiated.

  As described above, the ion beam irradiation apparatus according to the present invention has a Z-axis sliding mechanism that moves the holder along the Z-axis direction, and a Y-axis sliding that moves the holder up and down along the Y-axis direction. The Z-axis sliding mechanism includes a Z-axis slider unit that is provided with the holder and reciprocates along the Z-axis direction, and guides the Z-axis slider unit along the Z-axis direction. And a Z-axis drive motor provided to reciprocately slide the Z-axis slider unit, and the Y-axis sliding mechanism moves the Z-axis guide along the Y-axis direction. Since it has a Y-axis guide for guiding and a Y-axis drive motor provided to reciprocate the Z-axis guide along the Y-axis direction, the holder has a high degree of freedom in terms of movement, and ions are uniformly applied to the substrate. Injecting the beam There is an effect that it is. Furthermore, since the motor is disposed outside the vacuum chamber, the heat of the motor can be radiated well.

  In the ion beam irradiation method according to the present invention, as described above, the Z-axis slider unit provided with the holder is guided along the Z-axis direction and slid based on the Z-axis drive motor while Since the axial slider unit is guided along the Y-axis direction and slid based on the Y-axis drive motor to irradiate the ion beam onto the substrate held by the holder, the degree of freedom in moving the holder is high. The ion beam can be uniformly implanted into the substrate. Furthermore, since the motor is disposed outside the vacuum chamber, the heat of the motor can be radiated well.

  An embodiment of the present invention will be described below with reference to FIGS. FIG. 1 is a front view showing a configuration of an ion beam irradiation apparatus 1 according to the present embodiment. 2 is a side view thereof, and FIG. 3 is a plan view thereof.

  The ion beam irradiation apparatus 1 is a hybrid ion implantation apparatus, and an ion beam 12 traveling along the Z-axis direction among the X axis, the Y axis, and the Z axis orthogonal to each other is provided in a vacuum chamber 10. The substrate 9 (not shown) held by the electrostatic chuck is irradiated on the substantially disc-shaped holder 9.

  The ion beam irradiation apparatus 1 is provided with a Z-axis sliding mechanism 3 that moves the holder 9 along the Z-axis direction. The Z-axis sliding mechanism 3 includes a Z-axis slider unit 6 that is provided with a holder 9 and that reciprocates along the Z-axis direction. A rectangular parallelepiped arm 33 provided in a cantilever shape along the X-axis direction is attached to the Z-axis slider unit 6 so as to be rotatable around the X-axis. The holder 9 is rotatably attached to the tip of the arm 33. A twist motor 17 that rotates the holder 9 is provided inside the arm 33. Inside the Z-axis slider unit 6, a tilt motor 14 for rotating an arm 33 attached with a holder 9 around an axis parallel to the X-axis, a speed reducer 15 connected to the tilt motor 14, an arm In order to tilt 33 around an axis parallel to the X axis, a tilt link mechanism 16 coupled to the speed reducer 15 and the arm 33 is provided.

  One end of a hollow pipe 30b is connected to the Z-axis slider unit 6 via a vacuum seal unit 31c. The other end of the hollow pipe 30b is connected to the vacuum seal unit 31b. One end of a hollow pipe 30 a is connected to the vacuum seal unit 31 b, and the other end of the hollow pipe 30 a is connected to a vacuum seal unit 31 a fixed to the vacuum chamber 10. A cable for supplying power to the twist motor 17 and the tilt motor 14 is connected to the twist motor 17 and the tilt motor 14 through the hollow pipes 30a and 30b. The hollow pipes 30a and 30b constitute a link mechanism having the vacuum seal unit 31a as a fixed point and the vacuum seal unit 31b as a node.

  The ion beam irradiation apparatus 1 is provided with a Y-axis slider unit 28. The Y-axis slider unit 28 has a pair of Z-axis guides 7 that guide the Z-axis slider unit 6 along the Z-axis direction.

  The ion beam irradiation apparatus 1 has a Y-axis fixing member 36 fixed to the vacuum chamber 10. The Y-axis fixing member 36 has a Y-axis guide 4 that guides the Y-axis slider unit 28 along the Y-axis direction.

  The Y-axis sliding mechanism 2 is provided with a Y-axis drive motor 5. The Y-axis drive motor 5 is provided to reciprocate the Y-axis slider unit 28 along the Y-axis direction. The Y-axis sliding mechanism 2 has a Y-axis raising / lowering ball screw 25 that is provided to slide the Y-axis slider unit 28 along the Y-axis direction and is driven by the Y-axis drive motor 5. The rotation of the Y-axis drive motor 5 is transmitted to the ball screw 25. The ball screw 25 is fitted with a lifting plate 26 that moves up and down according to the rotation of the ball screw 25. The elevating plate 26 is guided by a pair of elevating plate guide shafts 29 and moves up and down in the Y-axis direction. Connected to the lift plate 26 is a Y-axis lift hollow shaft 27 that passes through the lower wall of the vacuum chamber 10 and is coupled to a Y-axis slider unit 28.

  The Z-axis sliding mechanism 3 has a Z-axis drive motor 8. The Z-axis drive motor 8 is connected to a Z-axis drive shaft 18 that passes through the interior of the elevating plate 26 and the hollow shaft 27. The Z-axis drive shaft 18 is connected to the steel belt pulley 21 through the speed reducer 19 and the vacuum seal unit 20 inside the vacuum chamber 10.

  FIG. 4A is a plan view for explaining the configuration of the steel belt drive mechanism, and FIG. 4B is a side view thereof. The steel belt pulley 21 has a flat cylindrical shape, and a steel belt 22a is fixed and wound around the steel belt fixing portion 24c below the outer peripheral surface thereof. The steel belt 22a is further wound around an idler pulley 23a and fixed to a steel belt fixing portion 24d of the Z-axis slider unit 6. On the upper side of the outer peripheral surface of the steel belt pulley 21, a steel belt 22b is fixed and wound around the steel belt fixing portion 24a. The steel belt 22b is further wound around an idler pulley 23b and fixed to a steel belt fixing portion 24b of the Z-axis slider unit 6.

  The ion beam irradiation apparatus 1 includes a control device 34 that controls the Y-axis drive motor 5 and the Z-axis drive motor 8.

  The operation of the ion beam irradiation apparatus 1 configured as described above will be described. 5 and 6 are front views for explaining the operation of the ion beam irradiation apparatus 1. First, when the tilt motor 14 rotates, it is decelerated by the speed reducer 15, and the rotational motion is transmitted to the arm 33 by the tilt link mechanism 16, and the holder 9 provided on the arm 33 moves around an axis parallel to the X axis. The surface of the holder 9 is tilted along a direction perpendicular to the direction of the irradiation angle θ with respect to the traveling direction of the ion beam 12. In this way, the substrate adsorbed by the holder 9 is inclined with respect to the ion beam 12 at the irradiation angle θ. Thus, the irradiation angle can be changed by rotating the holder 9.

  Next, the Y-axis drive motor 5 rotates, and the rotational force is transmitted to the ball screw 25. When the ball screw 25 rotates, the elevating plate 26 and the hollow shaft 27 are guided by the elevating plate guide shaft 29 to move up and down, and are hollow. A Y-axis slider unit 28 connected to the shaft 27 is guided by the Y-axis guide 4 and moves up and down in the Y-axis direction.

  When the Z-axis drive motor 8 rotates, the Z-axis drive shaft 18 and the steel belt pulley 21 connected to the Z-axis drive motor 8 rotate (360 degrees or less). When the steel belt pulley 21 rotates, the Z-axis slider unit 6 connected to the steel belts 22a and 22b is guided by the Z-axis guide 7 by the steel belts 22a and 22b wound around the steel belt pulley 21, and is moved in the Z-axis direction. Slide.

  By such a cooperative operation of sliding along the Z-axis direction of the Z-axis slider unit 6 and raising / lowering the Y-axis slider unit 28 along the Y-axis direction, the holder 9 that sucks the substrate at the irradiation angle θ is The ion beam 12 linearly moves along a locus D1 in a direction perpendicular to the direction inclined by the irradiation angle θ with respect to the traveling direction of the ion beam 12 so that the ion beam 12 always passes the substrate surface at the same point P1.

  The holder 9 may be rotated by a predetermined angle by the twist motor 17 at the upper and lower ends of the trajectory D1. The holder 9 may move linearly along the locus D1 while being rotated by the twist motor 17. For this reason, an ion beam can be uniformly irradiated to the recessed part and convex part of an element formed on the substrate surface.

  The Y-axis drive motor 5 and the Z-axis drive motor 8 can all be constituted by general-purpose motors, and it is not necessary to use special motors, so that the ion beam irradiation apparatus 1 can be constituted at low cost.

  In addition, since the Y-axis drive motor 5 and the Z-axis drive motor 8 are provided outside the vacuum chamber 10, there is no problem of motor heat generation in a vacuum environment.

  FIG. 7 is a front view for explaining the configuration and operation of a modification of the ion beam irradiation apparatus. The same components as those described above are denoted by the same reference numerals. Therefore, detailed description of these components is omitted.

  The ion beam irradiation apparatus 1a includes multipoint Faraday mechanisms 35a and 35b. The multipoint Faraday mechanism 35a is arranged at the front stage of the same point P1, and the multipoint Faraday mechanism 35b is arranged at the rear stage of the same point P1. The multipoint Faraday mechanism 35a is arranged along the Y-axis direction on the basis of a change in the beam current of the ion beam 12 incident through the outside of one side of a beam limiting shutter (not shown) arranged in front of the multipoint Faraday mechanism 35a. Measure the beam current density distribution. The multipoint Faraday mechanism 35b is arranged along the Y-axis direction on the basis of a change in the beam current of the ion beam 12 incident through the outside of one side of a beam limiting shutter (not shown) disposed in front of the multipoint Faraday mechanism 35b. Measure the beam current density distribution. Based on the beam current density distribution along the Y-axis direction measured by the multipoint Faraday mechanisms 35a and 35b, it is detected whether the ion beam 12 is a divergent beam or a convergent beam. The ease of charging the substrate can be determined based on empirical rules from ion implantation conditions (recipe) and the like.

  When the substrate is easily charged, irradiating the substrate with a high-density ion beam causes the substrate surface to be charged, causing a discharge, destroying elements formed on the substrate surface, and damaging the substrate surface. Occurs.

  In order to avoid this problem, it is necessary to implant ions with an ion beam having the lowest possible concentration. In the ion beam irradiation apparatus according to the present embodiment, the Z-axis sliding mechanism and the Y-axis sliding mechanism can cooperate to move the holder 9 freely in the YZ plane, as shown in FIG. The divergence / convergence of the ion beam 12 in the Y-axis direction is detected by the multipoint Faraday mechanisms 35a and 35b, and the position of the holder 9 and the inclination of the holder 9 are kept at a predetermined irradiation angle θ within the movable range of the holder 9. The holder 9 can be moved along the trajectory D2 in which the ion beam 12 always passes through the substrate surface at the same point P2 while being moved along the traveling direction of the ion beam 12. Since the ion beam can be implanted at the same point P2 where the ion beam is wider than the same point P1, charges are less likely to accumulate on the substrate, and elements on the substrate are less likely to be destroyed. As a result, the ion implantation processing capability is improved.

  When it is difficult to charge the substrate, that is, when it is predicted that there is no problem even if ions are normally implanted, an ion beam is implanted into the substrate with a dense beam. In this case, on the contrary to the above-described operation, if the locus D2 is changed to the locus D1 and the holder 9 is moved, a dense ion beam can be implanted. In this case, since the ion beam is implanted in a place where the dimension of the ion beam in the Y direction is as small as possible, the moving distance of the holder 9 can be reduced. As a result, the ion implantation processing capability can be improved.

  When determining the ease of charging of the substrate based on an empirical rule, the operator sets whether the locus of the holder 9 is moved in the front stage direction or the rear stage direction.

  In the configurations disclosed in Patent Document 2 and Patent Document 3 described above, when the substrate on the holder is easily charged, when the ion beam having a high concentration is irradiated onto the substrate, the surface of the substrate is charged and discharge is generated. Although there is a problem that an element formed on the surface may be damaged, in this embodiment, the Z-axis sliding mechanism and the Y-axis sliding mechanism cooperate to freely move the holder 9 on the YZ plane. Therefore, the locus of the holder 9 can be freely changed in the YZ plane to adjust the concentration of the ion beam applied to the substrate, and damage to the elements formed on the substrate surface can be prevented. In this way, the degree of freedom of position control of the holder 9 is greatly improved.

  In the present embodiment, an example in which the Y-axis sliding mechanism supports the Z-axis sliding mechanism has been described, but the present invention is not limited to this. Conversely, the Z-axis sliding mechanism may be configured to support the Y-axis sliding mechanism.

  The present invention is not limited to the above-described embodiments, and various modifications can be made within the scope of the claims. That is, embodiments obtained by combining technical means appropriately modified within the scope of the claims are also included in the technical scope of the present invention.

  The present invention can be applied to, for example, an ion beam irradiation apparatus and an ion beam irradiation method configured to irradiate a substrate held on a substrate holding surface of a holder with an ion beam traveling in a horizontal direction. The present invention can be applied to an ion beam irradiation apparatus and an ion beam irradiation method that suppress non-uniformity of implantation due to the ion beam divergence angle.

It is a front view which shows the structure of the ion beam irradiation apparatus which concerns on this Embodiment. It is a side view which shows the structure of the said ion beam irradiation apparatus. It is a top view which shows the structure of the said ion beam irradiation apparatus. (A) is a top view for demonstrating the structure of the steel belt drive mechanism provided in the said ion beam irradiation apparatus, (b) is the side view. It is a front view for demonstrating operation | movement of the said ion beam irradiation apparatus. It is a front view for demonstrating operation | movement of the said ion beam irradiation apparatus. It is a front view for demonstrating the structure and operation | movement of the modification of the said ion beam irradiation apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Ion beam irradiation apparatus 2 Y-axis sliding mechanism 3 Z-axis sliding mechanism 4 Y-axis guide 5 Y-axis drive motor 6 Z-axis slider unit 7 Z-axis guide 8 Z-axis drive motor 9 Holder 10 Vacuum chamber 11 Substrate 12 Ion beam 14 Tilt motor (holder rotation mechanism)
15 Reducer (holder rotation mechanism)
16 Tilt link mechanism (holder rotation link mechanism)
17 Twist motor (holder rotation mechanism)
21 Steel belt pulley (pulley)
22a, 22b Steel belt 25 Ball screw 35a, 35b Multi-point Faraday mechanism (Faraday mechanism)

Claims (14)

An ion beam irradiation apparatus that irradiates a substrate held by a holder provided in a vacuum chamber with an ion beam that travels along a Z-axis direction among X axis, Y axis, and Z axis orthogonal to each other,
A Z-axis sliding mechanism for moving the holder along the Z-axis direction;
A Y-axis sliding mechanism that raises and lowers the holder along the Y-axis direction,
The Z-axis sliding mechanism includes a Z-axis slider unit that is provided with the holder and reciprocates along the Z-axis direction;
A Z-axis guide for guiding the Z-axis slider unit along the Z-axis direction;
A Z-axis drive motor provided for reciprocatingly sliding the Z-axis slider unit;
The Y-axis sliding mechanism includes a Y-axis guide that guides the Z-axis guide along the Y-axis direction;
An ion beam irradiation apparatus comprising: a Y-axis drive motor provided to reciprocate the Z-axis guide along the Y-axis direction.   The ion beam irradiation apparatus according to claim 1, further comprising a holder rotation mechanism that is built in the Z-axis slider unit and rotates the holder around an axis parallel to the X axis.   The ion beam irradiation apparatus according to claim 1, further comprising a holder rotating mechanism that is built in the Z-axis slider unit and rotates the holder around a direction perpendicular to a holding surface of the holder.   The holder moves linearly along a direction perpendicular to a direction inclined by an irradiation angle with respect to a traveling direction of the ion beam so that the ion beam always passes through the substrate surface at the same point. Ion beam irradiation equipment.   The ion beam irradiation apparatus according to claim 1, wherein the Z-axis drive motor and the Y-axis drive motor are provided outside the vacuum chamber.   The ion beam irradiation apparatus according to claim 1, further comprising a Faraday mechanism that detects divergence / convergence of the ion beam in the Y-axis direction before and after the holder in the Z-axis direction. An ion beam irradiation method for irradiating a substrate held by a holder provided in a vacuum chamber with an ion beam that travels along a Z-axis direction among X axis, Y axis, and Z axis orthogonal to each other,
While guiding the Z-axis slider unit provided with the holder along the Z-axis direction and sliding it based on the Z-axis drive motor, guiding the Z-axis slider unit along the Y-axis direction An ion beam irradiation method characterized by irradiating the ion beam onto a substrate held by the holder by sliding on an axis drive motor. An ion beam irradiation apparatus that irradiates a substrate held by a holder provided in a vacuum chamber with an ion beam that travels along the Z-axis direction of the X-axis, the Y-axis, and the Z-axis that are orthogonal to each other,
A Z-axis sliding mechanism for moving the holder along the Z-axis direction;
A Y-axis sliding mechanism that raises and lowers the holder along the Y-axis direction,
The Y-axis sliding mechanism includes a Y-axis slider unit that is provided with the holder and slides back and forth along the Y-axis direction;
A Y-axis guide for guiding the Y-axis slider unit along the Y-axis direction;
A Y-axis drive motor provided for reciprocatingly sliding the Y-axis slider unit;
The Z-axis sliding mechanism includes a Z-axis guide that guides the Y-axis guide along the Z-axis direction;
An ion beam irradiation apparatus comprising: a Z-axis drive motor provided to reciprocate the Y-axis guide along the Z-axis direction.   The ion beam irradiation apparatus according to claim 8, further comprising a holder rotation mechanism that is built in the Y-axis slider unit and rotates the holder around an axis parallel to the X axis.   The ion beam irradiation apparatus according to claim 8, further comprising a holder rotation mechanism that is built in the Y-axis slider unit and rotates the holder around a direction perpendicular to a holding surface of the holder.   The holder moves linearly along a direction perpendicular to a direction inclined by an irradiation angle with respect to a traveling direction of the ion beam so that the ion beam always passes through the substrate surface at the same point. Ion beam irradiation equipment.   The ion beam irradiation apparatus according to claim 8, wherein the Y-axis drive motor and the Z-axis drive motor are provided outside the vacuum chamber.   The ion beam irradiation apparatus according to claim 8, further comprising a Faraday mechanism that detects divergence / convergence of the ion beam in the Y-axis direction before and after the holder in the Z-axis direction. An ion beam irradiation method for irradiating a substrate held by a holder provided in a vacuum chamber with an ion beam that travels along a Z-axis direction among X axis, Y axis, and Z axis orthogonal to each other,
While guiding the Y-axis slider unit provided with the holder along the Y-axis direction and sliding it based on the Y-axis drive motor, the Y-axis slider unit is guided along the Z-axis direction and Z An ion beam irradiation method characterized by irradiating the ion beam onto a substrate held by the holder by sliding on an axis drive motor.

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