JP2008042203A - Illumination system for projection exposure apparatus with wavelengths of less than or equal to 193 nm - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an illumination system which utilizes available illumination light with high light yield and is characterized by low uniformity, ellipticity, and telecentricity errors. <P>SOLUTION: The disadvantage is overcome by an illumination system having a light source which emits radiation with wavelengths of less than or equal to 193 nm. The illumination system includes an optical component having a first facet with a field raster element in a plane provided with a first illumination, and provides a controlling equipment for illumination of an incompletely-illuminated region raster element which has at least a portion thereof unilluminated. The equipment can control uniformity of a second illumination in a region on an object plane. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to an illumination system for a projection exposure apparatus with a wavelength ≦ 193 nm, preferably ≦ 126 nm, in particular ≦ 100 nm, as well as the projection exposure apparatus, the uniformity of illumination of the object plane, and the ellipticity of the exit pupil and It also relates to the method of adjusting the telecentricity of lighting.

  Illumination systems for microlithography applications with wavelengths λ ≦ 193 nm are known from numerous publications.

  In order to be able to reduce the structural width of the electronic component, in particular to the submicron range, it is advantageous to use light with a shorter wavelength. That is, it suggests using light with a wavelength ≦ 193 nm, particularly in a lithography process using soft X-rays, and is also referred to as EUV (extreme ultraviolet) lithography.

  In the case of EUV lithography, wavelengths in the range of 10-30 nm, in particular 11-14 nm (especially wavelength λ of 13.5 nm) are currently employed. The image quality of EUV lithography is determined on the one hand by the projection object and on the other hand by the illumination system. The area of the object plane (eg ring area) where a mask (so-called reticle) that maintains the structure can be placed must be illuminated with an illumination system with the highest possible uniformity. The projection target has a function of projecting an image of an area on the object plane onto an image plane called a wafer plane. A photosensitive object (eg, a wafer) is placed in the image plane.

  In systems operating with EUV light, the optical elements are configured as reflective optical elements, in particular as mirrors. The region of the object plane of the EUV illumination system generally has the shape of a ring region.

  A projection exposure apparatus in which the illumination system is used in a manner similar to the present invention normally operates in a so-called scan format. Patent Documents 1 to 3 disclose a projection exposure apparatus having this type of illumination system and an illumination system used for EUV lithography. The above EUV illumination system includes a so-called honeycomb condenser to set the etendue to provide uniform illumination of the area on the object plane and clear illumination of the pupil on the pupil plane. Honeycomb capacitors typically include two faceted optical elements (i.e., a first faceted optical element having multiple region raster elements and a second faceted optical element having multiple pupil raster elements).

  An illumination system with double facets is disclosed in US Pat. No. 6,057,089, where only area raster elements that are mostly fully illuminated are projected onto the object plane.

  An illumination system is disclosed in US Pat. No. 6,057,075, where individual area raster elements can be completely shut out by a light barrier. A partial shut-off of the area raster element is also shown in US Pat. No. 6,057,056, but the light barrier proposed in this US Pat. This has the disadvantage that no sharply bounded boundary is formed between the illuminated part and the non-irradiated part of the area raster element.

  Sharp boundaries are particularly advantageous when there are strong variations in the uniformity being corrected. By setting the boundary at a specifically targeted location, it has the effect of significant corrections at or at the targeted specific area within the area where the boundary is projected be able to. For example, if a strong, locally delimited variation is present in the illumination of the area raster element, a strong variation results from the uniformity. These variations can be caused, for example, by the shadows projected by collector support spokes placed in the optical path in front of the optical element together with the area raster elements. A collector having spokes for holding individual collector shells is disclosed, for example, in US Pat.

An illumination system with double facets is known from US Pat. No. 6,057,089, in which an attenuator (especially a filter element) is located on or near the surface, which improves the illumination uniformity in the region of the object plane. As shown in FIG. According to US Pat. No. 6,057,089, filter elements are assigned to individual facets of the first faceted element. This makes it possible to influence the individual bright channel luminosity derived from the facets of the first faceted element.
US Pat. No. 6,452,661 US Pat. No. 6,198,793 US Pat. No. 6,438,199 International Publication No. 2002/27401 Pamphlet US Pat. No. 6,771,352 European Patent Application Publication No. 1354325 International Publication No. 2005/015314 Pamphlet US Pat. No. 6,400,894

  The system disclosed in Patent Document 7 has the disadvantages of its structural complexity and cost. The above prior art system has a further disadvantage, which provides maximum uniformity (ie uniform as much illumination as possible on the object plane), so that the area raster is mostly fully illuminated. Only the elements are projected, and this point is also described in Patent Document 4. However, if the illumination is circular, the result is that no more than 20% of the light emitted from the light source to the surface on which the area raster elements are placed is not used.

本明細書で用いられる用語「テレセントリシティ誤差」は、例えば円形形状の射出瞳の中央からの射出瞳面の中央光線の交差偏差を意味する。 Further, the outline disclosed in Patent Document 8 (using a semi-illuminated facet) has drawbacks and ellipticity errors related to the telecentricity of the exit pupil of the illumination system. In an illumination system having dual facets, a region channel element and a pupil raster element are assigned to each other, resulting in the formation of a light channel therebetween. Thus, the non-uniform illumination of the first faceted optical element with the area raster element results in non-uniform illumination of the second faceted optical element with the pupil raster element. As a result of this non-uniform illumination, the above telecentricity and ellipticity errors occur. From the above, the illumination system provided in the prior art does not fully utilize the light emitted from the light source, or causes excessive telecentricity and ellipticity errors.
An outline of uniform illumination at the object plane of the illumination system is used herein, which means that the difference between the minimum and maximum scan captured energy ΔSE, the so-called uniformity error at the region height is below a certain value. It means that there is. The uniformity error ΔSE is defined as a percentage by the following formula:

As used herein, the term “telecentricity error” means, for example, the crossing deviation of the central ray of the exit pupil plane from the center of a circular exit pupil.

  The term “ellipticity” means a relative weighting factor that characterizes the energy distribution of the exit pupil. When the energy of the exit pupil is evenly distributed within a certain angle, the value of ellipticity is set to 1. The term “ellipticity error” refers to the deviation of the ellipticity from an ideal value of uniform distribution, ie an ellipticity value of one.

  The object of the present invention is to overcome the drawbacks of the prior art, in particular to propose an illumination system with a wavelength ≦ 193 nm, characterized by low uniformity, ellipticity and telecentricity errors and at the same time the smallest possible light loss. That is. In other words, it is an illumination system that combines a low error characteristic with respect to uniformity, ellipticity and telecentricity with a high yield of usable illumination light.

  The above problems of the present invention are solved by an illumination system having a light source emitting radiation with a wavelength ≦ 193 nm, the illumination system being provided with a first illumination optical component having a first facet with a region raster element. There is provided an apparatus for adjusting the illumination of an incompletely illuminated area raster element, wherein at least a portion of the area raster element on the surface is not completely illuminated. The uniformity of the second illumination of the area can be adjusted. As used herein, the term “incompletely irradiated” means that less than 95% or less than 90%, less than 85%, less than 80%, and less than 75% of the surface of the raster element is irradiated in the preferred order. Means. Only the first partial area of the area facet is illuminated with an imperfectly illuminated area facet or an imperfectly illuminated area raster element. In the present invention, the light is blocked, for example by a light barrier, so that the second partial area of the area raster element does not actually receive the light, i.e. performs the light sorting. If the area raster element is, for example, 50% illuminated, the first partial area (illuminated part) occupies 50% of the entire surface of the area raster element, while the second, non-irradiated or dark part of the area raster element is Occupies 50% of the entire surface of the area raster element.

  The present invention is an illumination system for a projection exposure apparatus, particularly with a wavelength ≦ 193 nm, preferably ≦ 126 nm, more preferably a wavelength ≦ 30 nm, especially 10 nm to 30 nm. Toward the object plane (located on the plane installed towards the light source in the light path from the light source to the object plane), with illumination supplied to the plane and a number of At least one area raster element of the area raster element is illuminated only in the first partial area, not in the second partial area, and the respective sizes of the first and second partial areas of the area raster element are adjusted In order to do this, an adjustment device is installed, which provides a system that can adjust the uniform area illumination to the area of the object plane.

  With the device of the present invention, the design of the machine is very simple because only the illumination of the partially illuminated area facets changes to adjust the uniformity. For example, as a result of a sufficient aperture stop fixed at the boundary, the machine part does not protrude into the optical path where ambiguity arises. Furthermore, an aperture stop system also allows additional light from the optical path.

  In particular, the uniformity error is preferably within ± 5%, more preferably within ± 2%, particularly preferably within ± 0.5%, and / or the scanned ellipticity as a function of the x-position, ie irradiation. The region height within the region to be processed is preferably in the range of 1 ± 0.1, more preferably 1 ± 0.05, particularly preferably 1 ± 0.02. Further advantageous is that the system is characterized by a small telecentricity error, which depends on the position of the area, ie the area height, but an error of ± 2.5 mrad, preferably 1.5 mrad ±, particularly preferably ± 0.5 mrad. Not exceed. Preferably more than 70%, in particular more than 80% and in particular more than 90% of the energy of the light source supplied to the surface on which the area raster element is arranged must be received by the area raster element.

  Preferably, the region of the object plane has a first shape, the region raster element has a second shape, and the first shape mainly coincides with the second shape. If the region has an arcuate shape, the region raster element is preferably similarly arcuate as described, for example, in US Pat. No. 6,195,201.

  If the area raster elements have the shape of the area to be illuminated, the area raster elements can be arranged in columns and rows on the carrier structure of the faceted optical element, the rows are described in US Pat. No. 6,452,661. It is preferred that each be associated with a non-offset to provide a high recording density as described.

  If the area raster elements are arranged in columns and rows, it is advantageous to partition several area raster elements into blocks.

  Preferably, the illumination adjustment device comprises at least one aperture stop, which is preferably assigned to a region raster element that is incompletely illuminated. Alternatively, several area facets can be assigned to an aperture stop, especially when the area facets and thus their associated aperture stops have very few dimensions.

  When the illumination system is used in a scanning projection exposure apparatus, the region has one uniquely distinguished direction (i.e. the scan direction), which is also called the y-direction. The one or more aperture stops are in this case configured to be movable perpendicularly to the scanning direction. By moving one or more aperture stops substantially perpendicular to the scan direction (ie, x-direction), the amount of light (ie, energy) extracted from the region, or to a region that depends on the region height x The amount added can be controlled. This makes it possible to influence the illumination uniformity of the object plane that is dependent on the area height.

  Instead of an aperture stop, the illumination control device may have a number of conductors used for light attenuation. This type of light attenuating device is exemplified in EP 1291721. When adjustments are made by the conductor, the latter half is moved, for example, in such a way that the shadow of the conductor obfuscates a particular area of the area facet. Further illumination adjustment devices are devices in which, for example, any type of optical element that is deformed and / or tilted can be placed in the optical path from the light source to the object plane. Possible elements include collectors or spectral filters or additional mirrors. As a further possibility, the aperture stop can be arranged in the optical path from the light source to the object plane, behind the collector, ie on the outlet side of the collector. It is also possible to move all optical elements with area facets (ie area facet plates) in order to change the illumination of the partially illuminated area facets.

  With a movable adjustment device (for example an aperture stop that can be assigned to individual area facets), the uniformity error of the area illumination can also be ΔSE ≦ 10%, preferably 5% ≦, in particular ΔSE ≦ 2%. For example, a 2% residual uniformity error is essentially caused by coating degradation during operation, thermal deformation of optical components, or replacement of optical components or light sources.

  In particular, the effect of the present invention is that the uniformity of the illumination system can always be adjusted by the adjusting device, even if the illumination of the object surface changes with time due to the change of the illumination system. In a style that does not exceed This is true even if the illumination changes, for example because the light source has changed its position in space and over time. Changes in the position of the light source or the radiation intensity compared to a certain space and / or time frame are also referred to as “jitter” of the light source. In other words, the design configuration according to the present invention always provides a constant uniformity error by adjusting the illumination of partially illuminated areas of one or more area raster elements without changing the system part. Can provide.

  Furthermore, the change in the spectral intensity distribution of the light source can be linked to the change in illumination. One suitable example in this regard is that the reflectivity of an optical component is usually dependent on the wavelength of the irradiated light. Therefore, this change in wavelength leads to a change in reflectance, that is, a change in illumination.

  Replacement of the light source or the optical element of the illumination light path can also lead to changes in illumination (especially changes in the uniformity of illumination on the object plane). Uniformity errors caused by component replacement can also be corrected by specific sieving in area facets that are only partially illuminated using the apparatus of the present invention.

  The illumination characteristics of the illumination system can change as a result of degradation of the coating during operation or thermal deformation of the optical components. With this kind of change in illumination, the adjusting device of the invention also makes it possible to eliminate uniformity errors.

  That is, the present invention provides uniformity compared to a particular space and / or time coordinate system, even when illumination changes due to adjustment devices, for example, by changing optical components, temperature-related deformation of optical components, or changing light sources. An illumination system is provided that can always maintain the error within a certain uniformity error limit. That is, even when illumination changes with time, the present invention can always keep the uniformity error within a certain limit, for example, less than 5%, particularly less than 2%.

  In other embodiments of the present invention, there is no movable adjustment device (eg, aperture stop). Instead, region raster elements that are not fully illuminated have a region illumination within the region of uniformity error ≦ 5%, in particular ≦ 2%, in the object plane on the support structure of the first faceted optical element. .

  Preferably, the first illumination on the surface on which the first faceted optical element is disposed has an annular shape.

  Particularly preferred is an embodiment in which the illumination system is a double faceted illumination system having first and second faceted optical elements, as described for example in US Pat. No. 6,438,199 or US Pat. No. 6,198,793. is there. The second faceted optical element is disposed behind the first faceted optical element in the optical path from the light source to the object plane. The second faceted optical element has a number of pupil raster elements. A light channel is formed between individual region raster elements and pupil raster elements. The arrangement of the pupil raster elements determines the light distribution of the exit pupil, for example by assigning appropriately imperfectly illuminated area raster elements to specific pupil raster elements that are distributed symmetrically with respect to the center. Illumination can be placed on the exit pupil plane, in which case the pupil illumination of the exit pupil plane of the illumination system has a telecentricity better than ± 2 mrad, preferably ± 1 mrad, particularly preferably better than ± 0.5 mrad .

  In a particularly preferred embodiment, the area raster element in such a manner that the pupil illumination of the exit pupil of the illumination system has an ellipticity in the range of 1 ± 0.10, preferably 1 ± 0.05, particularly preferably 1 ± 0.025. Are assigned to pupil raster elements.

  In addition to the illumination system, the present invention also provides a projection exposure apparatus for projecting a target image irradiated onto the object plane by the illumination system onto an image plane, including a projection object and an illumination system.

  Furthermore, an illumination system with illumination of a surface on which an optical element having a first facet with area raster elements is arranged, an area of the area surface with area illumination, and pupil illumination uniformity at the exit pupil, telecentricity and A method for adjusting the ellipticity is disclosed. According to this method, the illumination is set on the surface on which the region raster elements are arranged in such a manner that the uniformity error ΔSE of the region illumination of the region is ≦ 5%, particularly ≦ 2%. Next, a pupil raster element of the second optical element is assigned to each region raster element to define a light channel, and a pupil illumination at the exit pupil plane of ± 1 mrad, preferably ± 0.5 mrad, and a telecentricity error, and The allocation is performed in such a manner that the ellipticity error is 1 ± 0.1, preferably 1 ± 0.05, particularly preferably 1 ± 0.02.

  All of the above illumination systems are characterized in particular by the fact that the light of the light source reaches the first faceted optical element, in which case the incompletely illuminated area raster element also receives light, 70% or more, preferably 80% or more, particularly preferably 90% or more of the illumination provided in is received by the area raster elements.

  Preferably, the illumination setting device is an aperture stop system that moves in a direction perpendicular to the scan direction.

  In order to control the assignment of region raster elements to pupil raster elements, region raster elements can also be placed on a carrier having a tilt angle that can be changed by an actuator. This allows adjustment of the allocation of region raster elements to pupil raster elements.

  The projection exposure apparatus according to the invention is suitable for the production of microelectronic components, in which case the image of the structural mask is projected onto a photosensitive coating placed on the image plane to be projected. The image of the structural mask is developed, thereby obtaining a part of the microelectronic component.

  The following examples illustrate the invention with reference to the drawings.

  For purposes of illustrating the principle, FIG. 1 shows the ray path of a refractive illumination system having two faceted optical elements (also referred to as a dual faceted illumination system). In illumination systems with EUV wavelengths in the range of 1-20 nm, reflective optical elements are exclusively used, for example, the reflecting mirror facet is the area facet of the optical component having the first facet. The light from the first light source 1 is collected by the collector 3 and converted into a parallel or convergent light beam. The area facet (more specifically, the area raster element 5 of the optical component 7 having the first facet) splits the luminous flux 2 from the light source 1 into a number of luminous fluxes 2.1, 2.2 and 2.3. A second light source 10 is produced at or near the position of the optical component 11 having two facets. The surface on which the optical component having the first facet is located is called the first surface 8. In the illustrated example (the optical component having the second facet is located and the second light source 10 is formed in this embodiment as well), the second surface 13 is a joint surface associated with the exit pupil surface of the illumination system. is there. The area mirror 12 projects an image of the second light source 10 onto an exit pupil of an illumination system (not shown), and in this case, coincides with an input pupil of a projection target (not shown) that follows downstream of the optical path. The image of the area raster element 5 is projected by the pupil raster element 9 and the optical element 12 onto the object plane 14 of the illumination system. Preferably, a structural mask (so-called reticle) is placed on the object plane 14 of the illumination system. The following description is based on examples of the first region raster element 20 and the first pupil raster element 22 (referring to FIGS. 2a and 2b) in which the light channel 21 is defined, and the region raster element and pupil raster element shown in FIG. It explains the purpose. Although the first region raster element 20 and the first pupil raster element 22 are again shown as refractive parts, the refractive parts are not limited thereby. Rather, the embodiment with a refractive component is also useful for the embodiment in the case of a reflective component.

  The image of the first region raster element 20 is projected onto the object plane 14 of the illumination system in which a region of a predetermined geometric shape is illuminated by the first pupil raster element 22 and the optical element 12. A reticle (particularly a structural mask) is placed on the object plane 14. In general, the geometry of the area raster element 20 determines the shape of the illuminated area of the object plane.

  An example of an illuminated region of an object surface having a shape is shown in FIG. 6 as typically formed in, for example, a ring region scanner.

  In a first embodiment of the invention, it is characterized that the region raster element 20 has the shape of a region (ie, for example in the case of an annular region, the region raster element is also annular). This is shown, for example, in US Pat. No. 6,452,661 or 6195201, the entire contents of which are hereby incorporated by reference.

  As an alternative to the ring shape described above, the region raster element may be rectangular. For example, as described in US Pat. No. 6,198,793, in order to illuminate an arcuate area of an object surface, a rectangular area is converted into an arcuate area by, for example, an area mirror. is necessary.

  In systems with arcuate raster elements, no area mirror is required for illumination of the ring area of the object plane. The area raster element 20 is set in such a way that an image of the first light source 1, the so-called second light source 10, is formed at or near the position of the pupil raster element. In order to avoid excessive thermal exposure of the pupil raster element 9, the rear half can also be arranged away from the focal point with respect to the second light source.

  Due to defocusing, each of the second light sources extends through a finite area. The area covered can also be attributed to the form of the light source.

  A preferred embodiment of the present invention includes an embodiment in which the shape of the pupil raster element is suitable for the shape of the second light source.

  As shown in FIG. 2b, the optical element 12 projects an image of the second light source 10 onto the exit pupil plane 26 of the illumination system, and the exit pupil of the exit pupil plane 26 coincides with the input pupil to be projected. A third light source, a so-called lower pupil, is formed on the exit pupil plane 26 for each second light source. This is illustrated in FIG.

  FIG. 3 schematically illustrates a design configuration of a reflective projection exposure apparatus using the illumination system of the present invention, as used in EUV lithography. All of the optical components are reflective optical elements (ie mirrors), examples of which are area facet mirrors. The luminous flux of the light source 101 is converged by a grazing incidence collector mirror 103 (configured in this case as a nested collector mirror having a large number of mirror shells), and spectral filtering by the spectral grating filter element 105 involved in the formation of the intermediate image Z of the light source. Later, the light beam travels in the direction of the first faceted optical element 102 having the area raster elements. The light source 101, the collector mirror 103, and the spectral grating filter 105 are combined to form a so-called supply source device 154. A first faceted optical element 102 having a region raster element produces a second light source at or near the position of the second faceted optical element 104 having a pupil raster element. The first faceted optical element 102 is disposed on the first surface 150 and the second faceted optical element 104 is disposed on the second surface 152. Usually, since the light source is a light source that extends through a finite area, the second light source also extends through a specific area, which means that each of the second light sources has a predetermined shape. As described above, individual pupil raster elements can be adapted to the predetermined shape of the second light source.

  The pupil raster element is useful for the purpose of projecting an image of the area raster element by the optical element 121 onto the object plane 129 of the illumination system where the mask 114 that maintains the structure can be placed.

  In the object plane, the object plane illumination of the area is supplied, for example, as shown in FIG.

  The distance D between the first faceted optical element 102 and the second faceted optical element 104 is shown in FIG. 3, which is along the principal ray (also called the chief ray) CR through the central region position Z. It passes from the first optical element 102 to the second optical element 104.

  A pupil raster element of the second faceted optical element 104 is assigned to each area raster element of the first faceted optical element 102 as illustrated in FIGS. 1 to 2b. Between each region raster element and each pupil raster element, a light beam passes from the region raster element to the pupil raster element. The individual light flux that extends from the area raster element to the pupil raster element is called the optical channel.

  The exit pupil plane 140 of the illumination system (which coincides with the input pupil plane of the projection object 126) is further illustrated in FIG. The exit pupil plane is defined by the position of the intersection S where the main ray CR due to the center region position Z of the ring region (shown as an example in FIG. 6) intersects the optical axis OA of the projection system 126. Pupil illumination occurs at the exit pupil plane 140.

  An example of an exit pupil used in the type of illumination system shown in FIG. 3 is illustrated by the pupil illumination in FIG.

  The projection object 126 in the projection system, or more particularly in the exemplary embodiment, has six mirrors 128.1, 128.2, 128.3, 128.4, 128.5 and 128.6. The image of the structural mask is projected on the image plane 124 by the projection target, and a photosensitive object is disposed here.

  FIG. 3 shows a local xyz coordinate system of the object plane 129 and a local uvz coordinate system of the exit pupil plane 140.

FIG. 4a illustrates a two-dimensional arrangement of region raster elements in the prior art, which is circular illumination, where less than 70% of the incident light from the light source is received and used for illumination of the object plane region. Each reflective area facet 309 is arranged in a first faceted optical element (so-called area honeycomb plate) and is denoted in FIG. FIG. 4a illustrates a possible arrangement of 178 area raster elements 309 on an area honeycomb plate in the prior art. Circle 339 shows the illumination boundary with the outside of the circular illumination of the first optical element by the area raster element 309. The area raster element 309 (substantially rectangular) has, for example, a length X _FRE = 43.0 mm and a width Y _FRE = 4.00 mm. All region raster elements 309 are arranged in a circle 339 and are therefore fully illuminated. As shown in FIG. 4a, most of the light reaching the area facet mirror is not utilized. Circle 341 shows the inner illumination boundary caused by, for example, the central light barrier of the nested collector.

  Figures 4b to 4d illustrate the arrangement of the first faceted optical element of the present invention.

  FIG. 4b shows an array of a total of 312 area facets on the first faceted optical element, denoted as reference numeral 102 in FIG. Individual region facets are denoted by reference numeral 311. The area honeycomb of the individual raster elements 311 is fixed to a support structure (not shown) of the element having the first facet. As shown in FIG. 4b, the illumination of the surface on which the first faceted optical element is disposed is an annular illumination formed by an outer illumination boundary 341.1 and an inner illumination boundary 341.2. In addition, the raster elements are subdivided into a total of four columns 343.1, 343.2, 343.3, 343.4, and each of which is subdivided into columns 345. In contrast to the apparatus shown in FIG. 4a, where the different face region facets are each offset, the individual row raster elements 311 are aligned directly under each column. Individual facets are further grouped at block 347, each positioned downward. Blocks and columns are separated from each other by a free space 349. Further shown in FIG. 4b are spoke shadows 351.1, 351.2, 351.3, 351.4 that hold the individual shells of the grazing incidence collector 103 shown in FIG. As is clear from FIG. 4b, the multiple area facets are only partially illuminated. FIG. 4b also shows a coordinate system having axes in the x- and y- directions. As shown in FIG. 4b, the size of the area facets in the scanning direction of the projection exposure apparatus coinciding with the y-direction is significantly less than in the x-direction perpendicular to the scanning direction.

  One advantage of the present invention is the fact that the area facets can be arranged in blocks, thereby simplifying the assembly process. A stagger arrangement in the area facets as implemented in the prior art according to FIG. 4a is necessary to fill the circular illuminated area of the area facet mirror as much as possible by the fully illuminated area facets. In the inventive concept, this offset is no longer necessary since the partially illuminated facets are also involved in the illuminated area.

  In FIG. 4c, an optical component 102 having a first facet is shown having a design similar to that shown in FIG. 4b. Similar parts are given the same reference numerals. The individual raster elements 311 in FIG. 4c are again arranged in a total of four columns 343.1, 343.2, 343.3, 343.4, and a number of columns 345. Furthermore, the individual rows are spaced apart in particular, in such a way that the area facets are not arranged in the area shaded by the grazing incidence collector spokes.

  The further irradiated area is formed by the inner boundary 341.2 as well as the outer boundary 341.1.

  Also shown in FIG. 4c is an aperture stop 357 used for area raster elements that are not completely illuminated. Each aperture stop 357 is assigned to a region raster element 311. As indicated by the arrow X, the individual aperture stops 357 assigned to the area raster elements can move in the x-direction. As a result, the irradiated area of the object surface can be variably adjusted. This is shown in detail in FIG.

  In FIG. 4d, a method for adjusting the irradiated area in the x-direction is described. In order to visualize the outline, two area raster elements that are only partially illuminated are shown, in particular the area facets 311.1 and 311.2 located at the outer boundary 341.1 of the illuminated area. Partially irradiated region raster elements are respectively irradiated portions 360.1 and 360.2 (for region raster elements 311.1 and 311.2, respectively), non-irradiated portions 362.1 and 362.2 ( Region raster elements 311.1 and 311.2 respectively). When the partially illuminated region raster elements 311.1, 311.2 are projected onto the object plane, the illuminated portions 360.1 and 360.2 are each superimposed, as illustrated in case 1 of FIG. 4d. Each is supplemented to form a fully irradiated region. The aperture stops 364.2 and 364.1 make it possible to adjust the size of the illuminated areas of the area facets 311.1 and 311.2. If the aperture stops 364.1 and 364.2 are installed at the positions indicated by the dashed lines in FIG. 4d, each superposition of the region facets in the object plane results in the illumination shown in case 2 of FIG. 4d. As shown, portions 360.1. A and 360.2. Only the area A is irradiated. Portion 366 is not illuminated. As clearly shown in FIG. 4d, by moving the aperture stops 364.1 and 364.2 in the x-direction, energy removal from the irradiated region or energy addition to the region was made to correspond to the region height. Can be done in the form.

  This adjustment capability is based on the condition that the illumination uniformity, i.e. the variation of uniformity, can be influenced depending on the area height.

  As shown in FIGS. 4a and 4d in the form of an aperture stop, if the adjustment device gives the ability to change the uniformity in a manner that depends on the area height, a sudden change in illumination and thereby the uniformity of the object surface Uniformity error is constant in the event of a sudden change in sex (eg due to a change in the light source with respect to its spatial position and a temporal change in its radiation intensity) or when an optical component (eg collector or light source) is replaced It is possible to adjust the illumination uniformity by means of the aperture stops 364.2 and 364.1 in a manner that is kept below this value. In particular, this allows the area illumination to be in such a way that the uniformity error ΔSE is ≦ 10%, preferably ΔSE ≦ 5%, particularly preferably ΔSE ≦ 2%. In this way, the adjustment force provides an adjustment system for obtaining illumination uniformity on the object surface, in which case the uniformity error is kept within a certain limit, for example using the aperture stop of the adjustment device. Uniformity is adjusted in a dripping manner.

  For example, the uniformity and the resulting uniformity error may change after a light source change. In the present invention, by using the aperture stops 364.1 and 364.2, it is possible to adjust the irradiated region of the partially irradiated region facet, thereby keeping the uniformity error constant. It became. Readjustment during operation is also possible. To do this, the sensor moves, for example by swiveling, to the object plane or the image plane to be projected (after a certain number of exposures and measurements of the illumination of this plane). A uniformity error can be determined based on this measurement and corrected by appropriate adjustments. This makes it possible to readjust the uniformity in such a way that the uniformity error does not exceed a certain value, for example in the case of a coating degradation in a collector or mirror or in the case of a change in the light source. If the sensor moves to the image plane, i.e. the wafer surface, a measurement of the uniformity error of the projection object can be included in the measurement.

  FIG. 5 represents a first arrangement of pupil raster elements 415 on the second faceted optical element identified in FIG. A uvz coordinate system is also shown. The shape of the pupil raster element 415 preferably matches the shape of the second light source on the surface on which the second optical element having the pupil raster element is disposed.

  FIG. 6 shows an annular region of the type formed on the object plane 129 in the illumination system for the annular region scanner of FIG.

として表され、式中、Ｅはｘ−ｙ物体面のｘ及びｙの関数としての強度分布を表す。照明の均一性（すなわち均一な分布）、及び例えば同様に領域高ｘに依存する楕円率及びテレセントリシティのような照明システムの他の特性量を実現するためには、これらの量が全ての領域高ｘにおいて軽微な偏差のみを伴う実質的に一定の値を有する場合に有利となる。 In contrast to the rectangular area illustrated in the schematic of FIG. 4d, the area 131 is annular. FIG. 6 shows the xy coordinate system of the region 131 and the central region position z. When the illumination system is used in a scanning microlithographic projection system configured as an annular area scanner, the y-direction indicates the so-called scan direction, while the x-direction indicates a direction perpendicular to the scan direction. The amount of scan captured (meaning the amount captured along the y-axis) can be measured depending on their respective x-position, also referred to as region height. The many quantities that characterize lighting are area dependent quantities. An example of such a region dependent quantity is scanning energy (SE), the magnitude of which is found to vary with region height x, meaning that the scanning energy is a function of region height. . For general effectiveness, the scanning energy is

Where E represents the intensity distribution as a function of x and y on the xy object plane. In order to achieve illumination uniformity (ie uniform distribution) and other characteristic quantities of the illumination system, such as ellipticity and telecentricity, which also depend on the region height x, these quantities are all It is advantageous if it has a substantially constant value with only minor deviations in the region height x.

式中、ΔＳＥは、スキャニングエネルギーの偏差のパーセンテージとして表される、均一性誤差を表す。
ＳＥ_Ｍａｘ：スキャニングエネルギーの最大値
ＳＥ_Ｍｉｎ：スキャニングエネルギーの最小値 The uniformity of the scanning energy of the object surface is measured with respect to the deviation of the scanning energy over the entire area height. That is, uniformity is expressed as a percentage by the following equation for uniformity error:

Where ΔSE represents the uniformity error, expressed as a percentage of the scanning energy deviation.
SE _Max : Maximum value of scanning energy SE _Min : Minimum value of scanning energy

式中、Ｅ（ｕ，ｖ）は瞳の強度分布を表す。
−４５°／４５°楕円率は以下のように定義され、

また０°／９０°楕円率は以下のように定義される。

As used herein, the term “ellipticity” refers to a relative weighting factor that characterizes the energy distribution on the exit pupil, particularly the exit pupil plane. As shown in FIG. 7, when a coordinate system having directions u, v, and z is defined on the exit pupil plane 140, the energy of the exit pupil 1000 is distributed in the angular range of the coordinate axes u and v. The pupil in FIG. 7 is subdivided into angular ranges Q1, Q2, Q3, Q4, Q5, Q6, Q7, and Q8. The energy contained in each angular range is obtained by incorporation in the respective angular range. For example, I1 represents energy included in the angular range Q1. Therefore, I1 is represented by the formula:

In the equation, E (u, v) represents the intensity distribution of the pupil.
−45 ° / 45 ° ellipticity is defined as follows:

The 0 ° / 90 ° ellipticity is defined as follows.

  In the above equation, I1, I2, I3, I4, I5, I6, I7, and I8 in the above definition are the exit pupil angular ranges Q1, Q2, Q3, Q4, Q5, Q6, Q7, and Q8 shown in FIG. Each energy content of is represented.

  Since different exit pupils are associated with each of the illuminated areas of the object plane, the pupil and the resulting ellipticity depends on the position in the area. An annular region used in microlithography is shown in FIG. The region is described by the xyz coordinate system of the object plane 129. Since the pupil depends on the region position, it depends on the xy position of the region, where the y-direction represents the scan direction.

  Furthermore, the average light beam is determined for each region position of the irradiated region. The average light beam indicates that the average direction of the energy released from the light beam is generated from the region position.

式中、Ｅ（ｕ，ｖ，ｘ，ｙ）は物体面１２９上の領域座標ｘ、ｙ、及び射出瞳面１４０上の瞳座標ｕ、ｖの関数としてのエネルギー分布を表す。 The deviation of the average ray from the main ray (also called the chief ray) CR is represented by the so-called telecentricity error. The telecentricity error is expressed by the following equation.

In the equation, E (u, v, x, y) represents an energy distribution as a function of region coordinates x, y on the object plane 129 and pupil coordinates u, v on the exit pupil plane 140.

  In general, the exit pupil of the exit pupil plane 140 of the illumination system according to FIG. 3 is assigned to each region position in the region of the object plane 129. At the exit pupil assigned to the provided region position, a third multiple light source is formed, also called the lower pupil.

  For example, FIG. 8 shows a scan-captured pupil when the arc height of the type shown in FIG. 6 is x = −52 mm.

A scan-captured pupil results from capture in the energy distribution E (u, v, x, y) along the scan path, ie the y-direction. That is, the scanned pupil is expressed by the following equation.

  Scan acquisition of pupils on coordinates u, v gives intensities I1, I2, I3, I4, I5, I6, I7, I8 as defined above, thereby −45 ° / 45 The ° ellipticity or 0 ° / 90 ° ellipticity is obtained as a function of the region height x (eg, x = −52 mm).

  As is apparent from FIG. 8, the exit pupil has individual lower pupils on the exit pupil plane (ie, third light source 500). As will become clearer with reference to FIG. 8, each lower pupil 500 contains a different amount of energy, which has a detailed structure, eg returning to the collector shell or collector spoke of the collector, eg a nested configuration (eg FIG. 3 may be included. The different intensity values of the lower pupil 500 are a result of incomplete illumination of individual area raster elements or area facets of the first faceted optical element 102. As noted above, some individual area raster elements are not fully illuminated while others are fully illuminated. The energy difference between imperfect and fully illuminated area raster elements is a measure to ensure uniform ellipticity at area height (ie, along the x-coordinate) and telecentricity as much as possible. Unless otherwise noted, the telecentricity as a function of ellipticity at the exit pupil (eg, -45 ° / 45 ° ellipticity or 0 ° / 90 ° ellipticity), as well as region height (ie, along the x-coordinate). It has the effect of changing significantly.

  The most uniform ellipticity possible in the exit pupil as a function of area height or highest telecentricity is possible by assigning a constant area facet or area raster element to the pupil facet or pupil raster element, respectively. Become.

  An assignment method that allows this is illustrated in FIGS. 9a and 9b, which is used in the total eight region facet and pupil facet embodiment. FIG. 9a shows the area facets F9, F10, F11, F41 and F12, F42, F43 and F44, while FIG. 9b shows the relevant pupil facets leading to the exit pupil illumination.

  As is clear from FIGS. 9a and 9b, if the opposite positions of FIG. 9a, for example the region facets of region facets F9 and F10, are assigned to the position-symmetric sub-pupil of the exit pupil, all regions above Telecentricity error is minimized. This is also true for facets F11 and F12 located on opposite sides of each other. FIG. 9a shows a faceted optical element with area facets, and FIG. 9b shows an associated faceted optical element with pupil facets PF9, PF10, PF11, PF12, PF41, PF42, PF43 and PF44. The position of the pupil facet finally determines the position of the lower pupil of the exit pupil. This is because the area facets assigned to the pupil facets are those where the area facets are mirror-symmetrical with respect to the x-axis (eg, F9 and F10) and the image is located at the location of the exit pupil (PF9 and PR10) It is preferably done in a manner that is preferably assigned to the pupil facets. In general, this is advantageous because the region facets, which are usually arranged mirror-symmetrically with respect to the x-axis, usually have the same intensity profile.

  To keep the ellipticity error small, two pairs of adjacent facet mirrors, such as region facets F9 and F11, and F10 and F12, are assigned to pupil facet mirrors PF9 and PF11, and PF10 and PF12, with an offset of 90 °. There is a relationship. Thus, region facets with similar intensity profiles are present on the pupil octo ellipse with a 90 ° offset.

In the ideal case of I1 (x) = I3 (x) = I5 (x) = I7 (x), the following equation is obtained:

  The ellipticity of these four channels is constant throughout the region and is equal to 1.

  In illumination, facets that complement each other, for example facets F9, F41, are assigned to pupil facets PF9, PF41, which say that the lower pupils associated with the area facets PF9, PF41 are located adjacent to each other on the exit pupil. Meet the conditions.

  This kind of arrangement provides the effect that the same illumination is provided through the exit pupil. The fact that the area facets R9 and F41 complement each other means that the dark part F9.1 on the area facet F9 is supplemented by the illuminated part F41.2 of the area facet 41. The dark part F9.1 has the effect of darkening the associated lower pupil in the region area assigned to F9.1. Therefore, the lower pupil assigned to the pupil facet PF41 is completely illuminated in this region area. If the pupil forms facets in PF9 and PF41, they are located adjacent to each other, and the effect of transition or transition from illumination to darkness is minimized throughout the region.

The individual aperture stops used to control the illumination of individual area facets can influence the illumination uniformity of the object plane of the illumination system. In particular, the illumination uniformity can be adjusted in this way, for example, ΔSE (x) ≦ 2%. The result of uniformity adjustment by the aperture stop is illustrated in FIG. The uniformity error ΔSE without correction is a value of 10%, while the value with correction is ΔSE ≦ 5%. In particular, the maximum value SE _Max of the scan capture energy SE (x) after correction is about 1.02, and the minimum value SE _Min is about 1.0, so that ΔSE (about 2%) after area illumination is an aperture stop. It is corrected by.

  The effect of adjusting the uniformity with the aperture stop (described as a function of area height, i.e., x-coordinate in the ellipticity profile) is -45 ° / 45 ° ellipticity or 0 ° as shown in FIGS. 11a and 11b. It is described as / 90 ° ellipticity. FIG. 11a is a 45 ° / 45 ° ellipticity 2200.1 or 0 ° / 90 ° ellipticity 2200.2 in the illumination system of FIG. 3, with the area facet channels assigned to the pupil facets as described above. Indicates. Depending on the region height, the 45 ° / 45 ° ellipticity varies from 0.97 to 1.03, and the 0 ° / 90 ° ellipticity also varies from 0.97 to 1.03. FIG. 11b shows a 45 ° / 45 ° ellipticity 2200.3 profile or a 0 ° / 90 ° ellipticity 2200.4 profile after the uniformity of the region shown in FIG. 10 has been corrected. As is apparent from FIG. 11b, due to the uniformity correction, the 45 ° / 45 ° ellipticity and 0 ° / 90 ° ellipticity only changed within the allowed error range. Depending on the region height, the 45 ° / 45 ° ellipticity varied from 0.990 to 1.01, and the 0 ° / 90 ° ellipticity varied from 0.99 to 1.02.

  FIGS. 12a and 12b show x- and y-direction telecentricity in the system depending on the region height x for the system of FIG. 3 using the control of assigning exit pupils at different region heights x described above. Illustrates the city error.

  The total telecentricity error in the x-direction as well as the y-direction is less than 1 mrad. The profile in the x-direction before uniformity correction is referred to as 2300.1 in FIG. 12a, while the profile in the y-direction is referred to as 2300.2. FIG. 12b shows the telecentricity error after uniformity correction. As is apparent from FIG. 12b, the telecentricity error over the region is less than ± 0.2 mrad in the x-direction and the y-direction.

  While the illumination system of the present invention has been disclosed above, the surface on which the first facet element is located, with the illumination uniformity at the object plane, the scanned ellipticity error, and the telecentricity error of the system adjusted. This is the first disclosure that the majority of the light that reaches is used for illumination of the object surface.

2 illustrates the principle of a lighting system with double facets. Fig. 4 illustrates the light pattern to the object plane of an illumination system with double facets. Fig. 4 illustrates the light pattern to the exit pupil plane of an illumination system with double facets. 1 illustrates a main schematic design of a lighting system. 1 shows a first faceted optical element having a region raster element in the prior art. 1 represents a schematic representation of a first faceted optical element having an area raster element and an aperture stop in the present invention. 1 represents a detailed view of a first faceted optical element having an illumination adjustment device. FIG. Fig. 4 illustrates a schematic for adjusting illumination according to an embodiment of two area facets. Fig. 2 shows a second faceted optical element having pupil facets. Fig. 3 shows an illuminated ring region of the object plane of the illumination system. The outline which subdivides an exit pupil is illustrated. An embodiment of an exit pupil having a lower pupil is shown. Figure 8 illustrates how exit pupil illumination is obtained by assigning eight partially illuminated region facets to different pupil facets. Figure 8 illustrates how exit pupil illumination is obtained by assigning eight partially illuminated region facets to different pupil facets. Illustrates the uniformity profile used in the 312 channel embodiment, where 100 region facets are not fully illuminated. Illustrate 0 ° / 90 ° ellipticity and −45 ° / + 45 ° ellipticity as a function of region height x before uniformity correction. Illustrates 0 ° / 90 ° ellipticity and −45 ° / + 45 ° ellipticity as a function of region height x after uniformity correction. The telecentricity profile before uniformity correction is illustrated. The telecentricity profile after uniformity correction is illustrated.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Light source 3 Collector 5 Area raster element 7 Optical component 8 1st surface 9 Pupil raster element 10 2nd light source 11 Optical component 12 Optical element 13 2nd surface 14 Object surface 20 Area raster element 21 Optical channel 22 1st Pupil raster element 26 Exit pupil plane 101 Light source 102 Optical element 103 Incident collector 104 Optical element 105 Spectral grating filter 114 Mask 121 Optical element 124 Image plane 126 Projection target 128 Mirror 129 Object plane 131 Area 140 Exit pupil plane 150 First plane 152 Second surface 154 Source device 309 Region raster element 311 Region raster element 339 Circle 341 Circle 343 Column 345 Column 347 Block 349 Free space 351 Shade 357 Aperture diaphragm 360 Part 364 Aperture diaphragm 366 Part 415 Pupil raster element 500 Lower pupil 1000 Ejection pupil

Claims (26)

For a projection exposure apparatus characterized in that light from a light source travels along an optical path to an object plane (129) with a wavelength ≦ 193 nm, preferably ≦ 126 nm, more preferably ≦ 30 nm, particularly preferably 10 nm to 30 nm. A lighting system,
Comprising an optical element (102) comprising a number of area raster elements (309), said optical element (102) being located in the optical path from the light source (101) to the object plane (129) towards the light source (101) The surface (150) is illuminated, illumination is provided to the surface (150), and in at least one region raster element of the number of region raster elements (309) on the surface (150), a first partial region ( Only 360.1, 360.2) are covered by the illumination, the second partial area (362.1, 362.2) is not covered by the illumination, and the area raster elements (311.1, 311.2) A device for adjusting the size of the first and second partial areas of the lighting system, wherein the adjusting device can adjust the uniformity of the area illumination of the area (131) of the object plane (129).   Illumination according to claim 1, wherein more than 70%, preferably more than 80%, particularly preferably more than 90% of the illumination in the surface (150) is received by a region raster element (309) arranged on the surface (150). system.   The lighting system according to claim 1, wherein the area illumination has a uniformity error ΔSE and ΔSE ≦ 10%, preferably ≦ 5%, particularly preferably ≦ 2%.   The region (131) has a first shape, the region raster element (309) has a second shape, and the first shape substantially coincides with the second shape. The lighting system according to any one of the above.   The illumination system of claim 4, wherein the region raster element (309) has an arcuate shape.   The region raster elements (309) are arranged in columns (343.1, 343.2, 343.3, 343.4) and columns (345), the columns being associated with each other and not offset. The lighting system according to any one of the above.   The lighting system according to any of the preceding claims, wherein the area raster elements are arranged in columns and rows, and a plurality of area raster elements are grouped as a block (347).   The illumination system according to any one of the preceding claims, wherein the illumination adjustment device comprises at least one aperture stop (357).   The illumination system according to claim 8, wherein the aperture stop (357) is configured to be movable in the surface (150).   The illumination system according to claim 9, wherein a scanning direction is defined in the surface (150) and the aperture stop (357) is configured to be movable substantially perpendicular to the scanning direction.   The illumination system according to any one of claims 8 to 10, wherein the aperture stop (357) is assigned to one or more of the region raster elements (309).   An apparatus for deforming and / or tilting an optical element arranged in the optical path from the light source to the object plane, an apparatus for moving the optical element (102) in the plane (150), and thereby a region raster element; The illumination system according to claim 1, comprising one or more combinations of devices capable of moving at least one aperture stop assigned to. An illumination system for a projection exposure apparatus, characterized in that light from a light source travels to the object plane with a wavelength ≦ 193 nm, preferably ≦ 126 nm, more preferably ≦ 30 nm, particularly preferably 10 nm to 30 nm,
Comprising an optical element (102) comprising a number of region raster elements (309), the optical element (102) being arranged in the optical path from the light source to the object plane of the surface (150) towards the light source; 150) is illuminated, and at least some of the multiple area raster elements of the surface are not completely covered by the illumination, and area raster elements that are not fully illuminated have an area error with a uniformity error ΔSE in the surface Are arranged in such a manner that the uniformity error satisfies the condition of ΔSE ≦ 10%, preferably ≦ 5%, particularly preferably ≦ 2%, and the pupil raster element (22) is arranged in each region. Scan acquisition assigned to the raster element (20), wherein the light channel is in the range of 1 ± 0.1, preferably 1 ± 0.05, particularly preferably 1 ± 0.02 of the exit pupil of the illumination system. Ellipse An illumination system formed between a region raster element and an accompanying pupil raster element in a manner having a ratio.   The illumination system of claim 13, wherein the region has a first shape, the region raster element has a second shape, and the first shape substantially matches the second shape.   The lighting system of claim 14, wherein the region raster element has an arcuate shape.   16. An illumination system according to any one of claims 13 to 15, wherein the region raster elements are arranged in columns and rows, and the rows are each not offset relative to each other.   16. The illumination system according to any one of claims 13 to 15, wherein the area raster elements are arranged in columns and rows, and a plurality of area raster elements are grouped in blocks.   18. Illumination system according to any one of the preceding claims, wherein the illuminated area of the surface (150) has a circular or ring shape.   The optical element is a first optical element (102), and a second optical element (104) having a number of pupil raster elements is arranged in the optical path from the light source (101) to the object plane (129). 19. Illumination system according to any one of the preceding claims, arranged after the optical element (102).   Said pupil raster element (22) is assigned to each region raster element (20) and the exit pupil illumination of the exit pupil plane of the illumination system is ≦ 2.5 mrad, preferably ≦ 1.5 mrad, particularly preferably ≦ 0.5 mrad. 20. The illumination system of claim 19, wherein the rays are formed between a region raster element and its assigned pupil raster element in a manner having a telecentricity error.   A projection exposure apparatus comprising the illumination system according to any one of claims 1 to 20 and a projection target, wherein a target image irradiated on an object plane by the illumination system is projected onto an image plane. Exposure device.   Adjustment of illumination system uniformity, telecentricity and ellipticity in illumination of the plane (150) on which the first optical element with area raster elements is located, and pupil illumination in the exit pupil and area illumination in the area of the object plane Method of illuminating a surface (150) having a region raster element, wherein the uniformity of the region illumination of the region is a uniformity error ≦ 10%, preferably ≦ 5%, particularly preferably ≦ 2%. Adjusting by an illumination adjustment device and assigning a second optical element in which a light channel is defined to each area raster element, wherein the pupil raster element assignment is such that the pupil illumination of the exit pupil plane is subject to a telecentricity error ≦ 2 mrad, preferably ≦ 1.5 mrad, particularly preferably ≦ 0.5 mrad, and / or ellipticity is 1 ± 0.1, preferably 1 ± 0.05, particularly preferably 1 ± 0.02. Adjusting method comprising the steps made in that manner.   The illumination adjustment device comprises an aperture stop assigned to an incompletely illuminated area raster element, the illuminated area having a scan direction on the surface (150), for uniformity adjustment, The method according to claim 22, wherein the aperture stop moves in a direction perpendicular to the scanning direction.   The illumination adjustment device comprises a device for deforming and / or tilting the optical element disposed on the optical path from the light source to the object plane, wherein the optical element is deformed and / or tilted for adjusting the uniformity. 24. The method of claim 22 or 23.   25. The region raster elements are arranged with a tilt angle on a carrier, and the tilt angle can be changed by an actuator, thereby adjusting the allocation of region raster elements to pupil raster elements. The method according to any one of the above.   A method of manufacturing a microelectronic component, comprising: projecting an image of a structural mask onto a photosensitive coating layer on an image plane to be projected using the projection exposure apparatus according to claim 21, and developing the structural mask; As a result, a manufacturing method for obtaining a part of the microelectronic component or the entire microelectronic component.

Images