JP2008038240A - Method of plating chip-shaped electronic component - Google Patents

Method of plating chip-shaped electronic component Download PDF

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JP2008038240A
JP2008038240A JP2006238243A JP2006238243A JP2008038240A JP 2008038240 A JP2008038240 A JP 2008038240A JP 2006238243 A JP2006238243 A JP 2006238243A JP 2006238243 A JP2006238243 A JP 2006238243A JP 2008038240 A JP2008038240 A JP 2008038240A
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electronic component
chip
plating
external electrode
shaped electronic
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Satoaki Makino
聡朗 牧野
Takashi Kamiguchi
孝 髪口
Hiroyuki Kobayashi
浩之 小林
Kikuko Ida
紀久子 井田
Fumio Ishida
文男 石田
Shoji Shibazaki
正二 柴崎
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Taiyo Yuden Co Ltd
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Taiyo Yuden Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a plating method by which a plating film having optional and uniform thickness is formed on an external electrode of a chip-shaped electronic component. <P>SOLUTION: An anode 29 is arranged in a plating solution spray nozzle 25, the surface of the chip-shaped electronic component 11 is held by a holding means 20 to allow at least one external electrode 14 on the surface of the electronic component to face the nozzle in a state that the lower half of the surface of the electronic component is masked from the plating solution, a cathode probe 26 is brought into contact with a part of the external electrode of the electronic component and the plating solution is sprayed to the external electrode from the nozzle while applying voltage between the anode and the probe to plate the external electrode. After that, the cathode probe is brought into contact with the different position on the surface of external electrode to plate the surface of the external electrode again. As a result, the occurrence of unapplied part of the plating film in the vicinity of the contact position of the cathode probe in the surface of the external electrode of the chip-shaped electronic component is prevented to form the plating film having the optional and uniform thickness. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、各種電子機器に用いられるチップ状電子部品の外部電極にめっき膜を形成するチップ状電子部品のめっき方法に関し、さらに詳細には、外部電極に任意で均一な厚みのめっき膜を形成するめっき方法に関する。  The present invention relates to a method for plating a chip-shaped electronic component that forms a plating film on an external electrode of a chip-shaped electronic component used in various electronic devices, and more specifically, forms a plating film having an arbitrary uniform thickness on the external electrode. The present invention relates to a plating method.

チップ状電子部品の外部電極にめっき膜を形成する方法として、バレルめっきが一般的に用いられている。上記バレルめっき法は、めっきバレル内に大量のチップ状電子部品を導電性ダミー粒子とともに挿入して、めっき槽のめっき液中に浸漬させた状態でめっきバレルを回転させてめっきバレル内を撹拌しつつ、前記めっき槽内に配置された陽極と、前記めっきバレル内に配置された陰極との間に所定の電圧を印加して、前記導電性ダミー粒子を介して前記陰極に接続されたチップ状電子部品の外部電極の表面にめっき膜を形成するものである。  Barrel plating is generally used as a method for forming a plating film on the external electrode of a chip-shaped electronic component. In the above barrel plating method, a large amount of chip-like electronic components are inserted into the plating barrel together with conductive dummy particles, and the plating barrel is rotated while being immersed in the plating solution in the plating tank, and the inside of the plating barrel is agitated. On the other hand, a predetermined voltage is applied between the anode disposed in the plating tank and the cathode disposed in the plating barrel, and the chip is connected to the cathode via the conductive dummy particles. A plating film is formed on the surface of the external electrode of the electronic component.

一方、金属基体の表面の任意の箇所に任意の厚みでめっき膜を形成する技術として、例えば特許文献1に示されるように金属基体にノズルからめっき液を吹付噴流するめっき方法が提案されている。具体的には、図4に示されるように、めっき液吹き付けノズル125内に陽極129を配置するととものに、被めっき面111を陰極128Bに接続し、陽極129と陰極111との間に電圧を印加した状態でめっき液123を連続して吹き付けるものである。  On the other hand, as a technique for forming a plating film at an arbitrary thickness on the surface of a metal substrate, for example, as disclosed in Patent Document 1, a plating method in which a plating solution is sprayed from a nozzle onto a metal substrate has been proposed. . Specifically, as shown in FIG. 4, the anode 129 is disposed in the plating solution spray nozzle 125, and the surface 111 to be plated is connected to the cathode 128 </ b> B, and a voltage is applied between the anode 129 and the cathode 111. In this state, the plating solution 123 is continuously sprayed.

特開平09−263989号公報Japanese Patent Application Laid-Open No. 09-263389

近年、各種電子機器の小型化、薄型化の傾向が強まっており、これらの電子機器に用いる微小サイズのチップ状電子部品、具体的には長さ0.4mm×幅0.2mm(×高さ0.2mm以下)の0402サイズの等のチップ状電子部品や、複数の素子を一体化したアレイタイプのチップ状電子部品が提案されるようになっている。
しかしながら、上記背景技術に示されるバレルめっき法では、例えばアレイタイプのチップ状電子部品のように電子部品の表面上の異なる位置に複数の外部電極が設けられている場合、外部電極の位置や大きさ、電子部品素子の内部電極と外部電極との間の接続抵抗等によってめっき膜の厚みの差が生じやすいという課題があった。
また、例えば特許文献1に記載されているようにめっき液吹付噴流するめっき方法においては、被めっき面のめっき液吹き付けノズルの正面と同心的にめっき膜の厚みの差が生じやすいという課題があった。
In recent years, various electronic devices have been increasingly miniaturized and thinned, and micro-sized chip-like electronic components used in these electronic devices, specifically 0.4 mm long × 0.2 mm wide (× height) A chip-shaped electronic component of 0402 size (0.2 mm or less) or an array type chip-shaped electronic component in which a plurality of elements are integrated has been proposed.
However, in the barrel plating method shown in the background art, when a plurality of external electrodes are provided at different positions on the surface of the electronic component such as an array type chip-shaped electronic component, the position and size of the external electrode In addition, there is a problem that a difference in the thickness of the plating film is likely to occur due to the connection resistance between the internal electrode and the external electrode of the electronic component element.
Further, for example, in the plating method in which a plating solution is sprayed as described in Patent Document 1, there is a problem that a difference in thickness of the plating film tends to occur concentrically with the front surface of the plating solution spray nozzle on the surface to be plated. It was.

本発明の目的は、上記課題を解決して、微小なチップ状電子部品や電子部品の表面上の異なる位置に複数の外部電極を備えたチップ状電子部品であっても、前記外部電極上に任意で均一な厚みのめっき膜を形成することが可能なチップ状電子部品のめっき方法を提供することにある。  The object of the present invention is to solve the above-mentioned problems, and even in a chip-shaped electronic component having a plurality of external electrodes at different positions on the surface of a minute chip-shaped electronic component or electronic component, An object of the present invention is to provide a method for plating a chip-shaped electronic component capable of forming a plating film having an arbitrary uniform thickness.

前記目的を達成するため、本発明のチップ状電子部品のめっき方法は、
(1)めっき液吹き付けノズル内に陽極を配置し、チップ状電子部品の表面の少なくとも一つの外部電極に前記吹き付けノズルが対向するように前記チップ状電子部品の表面の任意の位置を保持手段で保持し、前記チップ状電子部品の前記外部電極の表面の任意の位置に陰極プローブを接触させ、前記吹き付けノズルの陽極と前記陰極プローブとの間に電圧を印加しながら前記吹き付けノズルとチップ状電子部品の外部電極との間にめっき液が連続するように前記外部電極にめっき液を吹き付けてめっきし、さらに前記チップ状電子部品の前記外部電極の表面の前記と異なる位置に陰極プローブを接触させて再びめっきするものである。(・・・以下、本発明の第1の課題解決手段と称する。)
In order to achieve the above object, the plating method for chip-shaped electronic components of the present invention comprises
(1) An anode is disposed in the plating solution spray nozzle, and an arbitrary position on the surface of the chip-shaped electronic component is held by the holding means so that the spray nozzle faces the at least one external electrode on the surface of the chip-shaped electronic component. Holding and contacting a cathode probe to an arbitrary position of the surface of the external electrode of the chip-shaped electronic component, and applying the voltage between the anode of the spray nozzle and the cathode probe, the spray nozzle and the chip-shaped electron Plating is performed by spraying a plating solution on the external electrode so that the plating solution is continuous with the external electrode of the component, and a cathode probe is brought into contact with a position different from the above on the surface of the external electrode of the chip-shaped electronic component. And then plating again. (... Hereinafter referred to as the first problem solving means of the present invention.)

また、上記めっき方法の主要な形態の一つは、
(2)前記チップ状電子部品の表面の前記と異なる位置を保持して再びめっきするものである。(・・・以下、本発明の第2の課題解決手段と称する。)
One of the main forms of the plating method is
(2) Re-plating while holding a different position on the surface of the chip-shaped electronic component. (... Hereinafter referred to as the second problem solving means of the present invention.)

また、上記めっき方法の他の主要な形態の一つは、
(3)前記陰極プローブの接触位置を囲むようにマスキングした状態でめっきするものである。(・・・以下、本発明の第3の課題解決手段と称する。)
One of the other main forms of the plating method is
(3) Plating in a masked state so as to surround the contact position of the cathode probe. (... Hereinafter referred to as the third problem solving means of the present invention.)

また、上記めっき方法の他の形態の一つは、
(4)前記保持手段で前記陰極プローブの接触位置の周囲をマスキングした状態でめっきするものである。(・・・以下、本発明の第4の課題解決手段と称する。)
One of the other forms of the plating method is as follows:
(4) The plating is performed with the holding means masking the periphery of the contact position of the cathode probe. (... Hereinafter referred to as the fourth problem solving means of the present invention.)

また、上記めっき方法の他の形態の一つは、
(5)前記チップ状電子部品の一つの外部電極の露出面積よりも大きな開口面積のノズルでめっき液を吹き付けるものである。(・・・以下、本発明の第5の課題解決手段と称する。)
One of the other forms of the plating method is as follows:
(5) The plating solution is sprayed with a nozzle having an opening area larger than the exposed area of one external electrode of the chip-shaped electronic component. (... Hereinafter referred to as the fifth problem solving means of the present invention.)

上記第1の課題解決手段による作用は次の通りである。すなわち、めっき液吹き付けノズル内に陽極を配置し、チップ状電子部品の表面の少なくとも一つの外部電極に前記吹き付けノズルが対向するように前記チップ状電子部品の表面の任意の位置を保持手段で保持し、前記チップ状電子部品の前記外部電極の表面の任意の位置に陰極プローブを接触させ、前記吹き付けノズルの陽極と前記陰極プローブとの間に電圧を印加しながら前記吹き付けノズルとチップ状電子部品の外部電極との間にめっき液が連続するように前記外部電極にめっき液を吹き付けてめっきし、さらに前記チップ状電子部品の前記外部電極の表面の前記と異なる位置に陰極プローブを接触させて再びめっきするので、チップ状電子部品の外部電極の表面のうち先の陰極プローブの接触位置の近傍にめっき膜の未着部分が生じるのを防止できる。  The operation of the first problem solving means is as follows. That is, an anode is disposed in the plating solution spray nozzle, and an arbitrary position on the surface of the chip-shaped electronic component is held by the holding means so that the spray nozzle is opposed to at least one external electrode on the surface of the chip-shaped electronic component. The spray nozzle and the chip-shaped electronic component while contacting a cathode probe at an arbitrary position on the surface of the external electrode of the chip-shaped electronic component and applying a voltage between the anode of the spray nozzle and the cathode probe The plating solution is sprayed onto the external electrode so that the plating solution is continuous with the external electrode, and then the cathode probe is brought into contact with a position different from the surface of the external electrode of the chip-like electronic component. Since plating is performed again, an unattached portion of the plating film is generated near the contact position of the previous cathode probe on the surface of the external electrode of the chip-shaped electronic component. That the can be prevented.

また、上記第2の課題解決手段による作用は次の通りである。すなわち、前記チップ状電子部品の表面の前記と異なる位置を保持して再びめっきするので、チップ状電子部品の外部電極の表面のうち先の保持位置の近傍にめっき膜の未着部分が生じるのを防止できる。  The operation of the second problem solving means is as follows. That is, since the position different from the above on the surface of the chip-shaped electronic component is held and plating is performed again, an unattached portion of the plating film is generated in the vicinity of the previous holding position on the surface of the external electrode of the chip-shaped electronic component. Can be prevented.

また、上記第3の課題解決手段による作用は次の通りである。すなわち、前記陰極プローブの接触位置を囲むようにマスキングした状態でめっきするので、陰極プローブ上に直接めっき膜が形成されてめっき効率が低下するのを防止できる。  The operation of the third problem solving means is as follows. That is, since plating is performed in a masked state so as to surround the contact position of the cathode probe, it is possible to prevent a plating film from being directly formed on the cathode probe and thereby reducing the plating efficiency.

また、上記第4の課題解決手段による作用は次の通りである。すなわち、前記保持手段で陰極プローブの接触位置の周囲をマスキングした状態でめっきするので、マスキング手段のほかに別途保持手段を設けなくともチップ状電子部品を保持することができる。チップ状電子部品の外部電極の表面のうち任意の領域がマスキング手段で覆われるので、比較的開口面積が小さなめっき液吹き付けノズルを用いても均一な厚みのめっき膜を形成することができる。  The operation of the fourth problem solving means is as follows. That is, since plating is performed in a state where the periphery of the contact position of the cathode probe is masked by the holding means, the chip-like electronic component can be held without providing a separate holding means in addition to the masking means. Since an arbitrary region of the surface of the external electrode of the chip-shaped electronic component is covered with the masking means, a plating film having a uniform thickness can be formed even using a plating solution spray nozzle having a relatively small opening area.

また、上記第5の課題解決手段による作用は次の通りである。すなわち、前記チップ状電子部品の一つの外部電極の面積よりも大きな開口面積のノズルでめっき液を吹き付けるので、外部電極上で局部的にめっき膜の厚みが厚くなるのを防止することができる。  The operation of the fifth problem solving means is as follows. That is, since the plating solution is sprayed with a nozzle having an opening area larger than the area of one external electrode of the chip-like electronic component, it is possible to prevent the thickness of the plating film from locally increasing on the external electrode.

本発明のチップ状電子部品のめっき方法によれば、チップ状電子部品の外部電極の表面のうち先の陰極プローブの接触位置の近傍にめっき膜の未着部分が生じるのを防止でき、任意で均一な厚みのめっき膜を形成することができる。
本発明の前記目的とそれ以外の目的、構成特徴、作用効果は、以下の説明と添付図面によって明らかとなろう。
According to the chip-shaped electronic component plating method of the present invention, it is possible to prevent the occurrence of a non-deposited portion of the plating film in the vicinity of the contact position of the previous cathode probe on the surface of the external electrode of the chip-shaped electronic component. A plating film having a uniform thickness can be formed.
The above object and other objects, structural features, and operational effects of the present invention will become apparent from the following description and the accompanying drawings.

以下、本発明のチップ状電子部品のめっき方法の第1の実施形態について、図1及び図2を参照して説明する。図1は第1の実施形態のめっき方法に用いるめっき装置10の全体構造を示す概念図である。図2は上記めっき装置10を用いて第1の実施形態のめっき方法を説明するための前記図1における一点鎖線で囲まれたAの領域を示す要部拡大断面図であり、図2(A)はまずチップ状電子部品の表面のうち下側半分を保持して上側半分に露出する外部電極の表面にめっき膜を形成する様子を示し、図2(B)はその後にチップ状電子部品11の表面のうち上側半分を保持して下側半分に露出する外部電極14の表面にめっき膜15を形成する様子を示すものである。  Hereinafter, a first embodiment of a plating method for chip-shaped electronic components of the present invention will be described with reference to FIGS. 1 and 2. FIG. 1 is a conceptual diagram showing the overall structure of a plating apparatus 10 used in the plating method of the first embodiment. FIG. 2 is an enlarged cross-sectional view of a main part showing a region A surrounded by a chain line in FIG. 1 for explaining the plating method of the first embodiment using the plating apparatus 10. ) Shows a state in which a plated film is formed on the surface of the external electrode that holds the lower half of the surface of the chip-shaped electronic component and is exposed to the upper half, and FIG. 2B shows the chip-shaped electronic component 11 thereafter. This shows a state in which the plating film 15 is formed on the surface of the external electrode 14 that holds the upper half of the surface and is exposed to the lower half.

図1に示すように、本実施形態のチップ状電子部品のめっき方法に用いる一例のめっき装置10は、箱状のめっき室21と、めっき液23を貯えるタンク22と、めっき室21内の陰極と陽極との間に電圧を印加するための電源28とを備えている。より詳細には、前記めっき室21の内部には、チップ状電子部品11を保持するための保持手段20とチップ状電子部品11にめっき液23を吹き付けるための一対のめっき液吹き付けノズル25とが配置されている。前記めっき室21のめっき液排出口の下方にはタンク22が配置されている。前記タンク22内のめっき液23は必要により撹拌手段22Aで撹拌されるとともに、該めっき液23は配管24Aおよびポンプ24Bを備えためっき液供給手段24を介して前記めっき室21内のめっき液吹き付けノズル25からチップ状電子部品に向けて噴射される。次に図2に示すように、前記チップ状電子部品11の表面の任意の位置を保持するための保持手段20は、チップ状電子部品11の長さ方向の両端面および両側面の外部電極の一部を含む任意の領域を被覆する保持部20Aと、前記チップ状電子部品11の下面を支持する支持部20Bと、を有するとともに、前記下面と対向する位置には端部を除いて外周が保護手段20Cで被覆された陰極プローブ26が配置されている。前記陰極プローブ26の一方の端部は前記保持手段20で保持されたチップ状電子部品11の外部電極14の表面に接するとともに、前記陰極プローブ26の他方の端部は印加電圧を調整可能な電源28の陰極側出力端子に接続されている。また、前記めっき液吹き付けノズル25の内部にはめっき液23の流路に露出するように陽極29が配置されるとともに、該陽極29は前記電源28の陽極側出力端子に接続されている。  As shown in FIG. 1, an example of the plating apparatus 10 used in the chip-like electronic component plating method of the present embodiment includes a box-shaped plating chamber 21, a tank 22 for storing a plating solution 23, and a cathode in the plating chamber 21. And a power supply 28 for applying a voltage between the anode and the anode. More specifically, inside the plating chamber 21 are a holding means 20 for holding the chip-shaped electronic component 11 and a pair of plating solution spray nozzles 25 for spraying the plating solution 23 to the chip-shaped electronic component 11. Is arranged. A tank 22 is disposed below the plating solution outlet of the plating chamber 21. The plating solution 23 in the tank 22 is stirred by the stirring means 22A if necessary, and the plating solution 23 is sprayed in the plating chamber 21 via the plating solution supply means 24 having a pipe 24A and a pump 24B. Sprayed from the nozzle 25 toward the chip-shaped electronic component. Next, as shown in FIG. 2, the holding means 20 for holding an arbitrary position on the surface of the chip-shaped electronic component 11 includes the external electrodes on both end surfaces and both side surfaces of the chip-shaped electronic component 11 in the length direction. It has a holding part 20A that covers an arbitrary area including a part and a support part 20B that supports the lower surface of the chip-shaped electronic component 11, and has an outer periphery excluding an end at a position facing the lower surface. A cathode probe 26 covered with the protection means 20C is disposed. One end of the cathode probe 26 is in contact with the surface of the external electrode 14 of the chip-like electronic component 11 held by the holding means 20, and the other end of the cathode probe 26 is a power source capable of adjusting the applied voltage. 28 cathode-side output terminals. An anode 29 is disposed inside the plating solution spray nozzle 25 so as to be exposed to the flow path of the plating solution 23, and the anode 29 is connected to the anode side output terminal of the power source 28.

上記のようなメッキ装置10を用いて、チップ状電子部品11の外部電極14にめっき膜15を形成する第1の実施形態のめっき方法は、図2(A)に示すように、めっき液吹き付けノズル25内に陽極29を配置し、チップ状電子部品11の表面の少なくとも一つの外部電極14に前記吹き付けノズル25が対向するように、かつ前記チップ状電子部品11の表面の下側半分を前記めっき液23からマスキングした状態に保持手段20で保持し、前記チップ状電子部品11の前記外部電極14の表面の前記めっき液23からマスキングされた領域の一部に陰極プローブ26を接触させ、前記吹き付けノズル25の陽極29と前記陰極プローブ26との間に電圧を印加しながら前記吹き付けノズル25とチップ状電子部品11の外部電極14の上側半分の露出された表面との間にめっき液23が連続するように前記外部電極14にめっき液23を吹き付けてめっきする。
次に、図2(B)に示すように、前記チップ状電子部品11の表面の前記と異なる上側半分をマスキングした状態に保持し、前記チップ状電子部品11の前記外部電極14の表面の前記と異なる位置であって前記マスキングされた領域の一部に陰極プローブ26を接触させ、前記吹き付けノズル25の陽極29と前記陰極プローブ26との間に電圧を印加しながら前記吹き付けノズル25とチップ状電子部品11の外部電極14の下側半分の露出された表面との間にめっき液23が連続するように前記外部電極14にめっき液23を吹き付けて再びめっきする。
The plating method of the first embodiment in which the plating film 15 is formed on the external electrode 14 of the chip-like electronic component 11 using the plating apparatus 10 as described above is a plating solution spray as shown in FIG. An anode 29 is disposed in the nozzle 25, the spray nozzle 25 faces the at least one external electrode 14 on the surface of the chip-shaped electronic component 11, and the lower half of the surface of the chip-shaped electronic component 11 is placed on the lower half. The cathode probe 26 is brought into contact with a part of the area masked from the plating solution 23 on the surface of the external electrode 14 of the chip-like electronic component 11 in a state masked from the plating solution 23, and While applying a voltage between the anode 29 of the spray nozzle 25 and the cathode probe 26, the spray nozzle 25 and the external electrode 14 of the chip-shaped electronic component 11 are applied. The plating solution 23 between the upper half exposed surfaces of plated by spraying the plating solution 23 to the external electrode 14 so as to be continuous.
Next, as shown in FIG. 2B, the upper half of the surface of the chip-shaped electronic component 11 different from the upper half is held in a masked state, and the surface of the external electrode 14 of the chip-shaped electronic component 11 is masked. The cathode probe 26 is brought into contact with a part of the masked region at a position different from the above, and the spray nozzle 25 and the tip shape are applied while applying a voltage between the anode 29 and the cathode probe 26 of the spray nozzle 25. Plating is performed again by spraying the plating solution 23 onto the external electrode 14 so that the plating solution 23 is continuous with the exposed surface of the lower half of the external electrode 14 of the electronic component 11.

また、本実施形態においては、上述したように前記チップ状電子部品11の表面の前記と異なる位置を保持して再びめっきするものである。  Further, in the present embodiment, as described above, plating is performed again while holding a position different from the above on the surface of the chip-shaped electronic component 11.

また、本実施形態においては、上述したように前記陰極プローブ26の接触位置を囲むようにめっき液23からマスキングした状態でめっきするものである。  Further, in the present embodiment, as described above, the plating is performed in a state of being masked from the plating solution 23 so as to surround the contact position of the cathode probe 26.

また、本実施形態においては、上述したように保持手段20で前記陰極プローブ26の接触位置の周囲をマスキングした状態でめっきするものである。  In the present embodiment, as described above, plating is performed with the holding means 20 masking the periphery of the contact position of the cathode probe 26.

また、本実施形態においては、チップ状電子部品11の一つの外部電極14の露出面積よりも大きな開口面積のノズル25でめっき液23を吹き付けるものである。本実施形態においては、チップ状電子部品11の外部電極14の表面のうち保持手段20で被覆されていない上側半分もしくは下側半分が露出する。このため、本実施形態のめっき方法では、ノズル25の開口面積は、チップ状電子部品11の外部電極の面積の1/2を超えるものを用いることが好ましい。  In the present embodiment, the plating solution 23 is sprayed by the nozzle 25 having an opening area larger than the exposed area of one external electrode 14 of the chip-shaped electronic component 11. In the present embodiment, the upper half or the lower half of the surface of the external electrode 14 of the chip-shaped electronic component 11 that is not covered with the holding means 20 is exposed. For this reason, in the plating method of this embodiment, it is preferable that the opening area of the nozzle 25 is more than 1/2 of the area of the external electrode of the chip-shaped electronic component 11.

また、本実施形態においては、チップ状電子部品11の外部電極14の露出する表面にめっき液23の流速が60m/min.以上になるようにめっき液23を吹き付けることが好ましく、これにより電極界面への金属イオン供給を十分に行い、めっき液の濃度分極を抑制することができる。  Further, in the present embodiment, the flow rate of the plating solution 23 is 60 m / min. On the exposed surface of the external electrode 14 of the chip-shaped electronic component 11. It is preferable to spray the plating solution 23 as described above, whereby metal ions can be sufficiently supplied to the electrode interface, and concentration polarization of the plating solution can be suppressed.

上記チップ状電子部品としては、誘電体材料、磁性体材料、その他の絶縁体等のセラミックからなる素体12の内部に内部電極13が配置され焼成により積層一体化されるとともに、前記素体12の表面には前記内部電極と接続された外部電極14が設けられているものが一般的であるが、これに限定するものではなく、内部電極を有さず素体の表面のみに電極を有するものや、セラミック素体の変わりにセラミック粉含有樹脂複合材を用いたものであってもよい。  As the chip-like electronic component, an internal electrode 13 is disposed in a body 12 made of ceramic such as a dielectric material, a magnetic material, and other insulators, and is laminated and integrated by firing. However, the present invention is not limited to this, and the electrode is provided only on the surface of the element body without the internal electrode. A ceramic powder-containing resin composite material may be used instead of the ceramic body.

上記チップ状電子部品11の外部電極14は、前記素体12を形成する際に一体に設けられるものや、前記素体12の形成後に前記内部電極に接続するように焼付形成されるものが一般的であるが、これに限定するものではなく、その他の方法で設けられるものであってもよい。  The external electrode 14 of the chip-shaped electronic component 11 is generally provided when the element body 12 is formed, or is formed by baking so as to be connected to the internal electrode after the element body 12 is formed. However, the present invention is not limited to this and may be provided by other methods.

また、上記チップ状電子部品11の外部電極14は、素体12の軸方向の両端面及びそれと接する上面、下面、両側面のそれぞれ前記端面の近傍に設けられるものが一般的であるが、これに限定するものではなく、チップ状電子部品11の表面の任意の位置に設けられたものであってもよい。  In addition, the external electrodes 14 of the chip-shaped electronic component 11 are generally provided in the vicinity of both end surfaces in the axial direction of the element body 12 and the end surfaces on the upper surface, the lower surface, and the both side surfaces in contact therewith. However, the present invention is not limited to this, and may be provided at an arbitrary position on the surface of the chip-shaped electronic component 11.

また、上記チップ状電子部品11の外部電極14は、前記実施形態では1対設けられたものであるが、これに限定するものではなく、アレイタイプのチップ状電子部品のように、チップ状電子部品の表面に3つ以上設けられたものであってもよい。  The pair of external electrodes 14 of the chip-shaped electronic component 11 is provided in the embodiment, but the present invention is not limited to this, and chip-shaped electronic components such as an array-type chip-shaped electronic component are not limited thereto. Three or more parts may be provided on the surface of the component.

上記チップ状電子部品11の外部電極14の表面上に形成されるめっき膜としては、Ag,Cu,Ni,Sn等の金属もしくは合金からなるめっき膜が一般的であるが、これに限定するものではなく、その他種々の金属もしくは合金であってもよい。  The plating film formed on the surface of the external electrode 14 of the chip-shaped electronic component 11 is generally a plating film made of a metal or alloy such as Ag, Cu, Ni, or Sn, but is not limited thereto. Instead, various other metals or alloys may be used.

また、上記チップ状電子部品11の外部電極14の表面上に形成されるめっき膜15としては、上記の金属もしくは合金のうちいずれか1種のめっき膜を単層もしくは複数種のめっき膜を順次重ねて形成してもよい。  Further, as the plating film 15 formed on the surface of the external electrode 14 of the chip-shaped electronic component 11, any one type of plating film of the above metals or alloys is sequentially formed as a single layer or a plurality of types of plating films. You may overlap and form.

前記めっき液吹き付けノズル25は、内部に陽極29が配置されており、該ノズルの開口面積は、該ノズル25と対向するチップ状電子部品の少なくとも一つの外部電極の露出面積より大きいことが好ましい。これにより、チップ状電子部品11の外部電極14の表面の露出面積のうち一部の表面のみにめっき膜が厚く形成されるのを防止することができる。  The plating solution spray nozzle 25 has an anode 29 disposed therein, and the opening area of the nozzle is preferably larger than the exposed area of at least one external electrode of the chip-shaped electronic component facing the nozzle 25. Thereby, it is possible to prevent the plating film from being thickly formed only on a part of the exposed area of the surface of the external electrode 14 of the chip-shaped electronic component 11.

前記陽極29は、その表面が前記ノズル25内でめっき液23の流路に露出しているものが好ましい。  The anode 29 preferably has a surface exposed to the flow path of the plating solution 23 in the nozzle 25.

前記チップ状電子部品の保持は、前記実施形態では保持手段20でチップ状電子部品11の周側面の外部電極を含むそれぞれの一部を保持するとともに下面を支持するものであったが、これに限定するものではなく、チップ状電子部品を対向する2面で挟持するものであってもよい。  In the embodiment, the holding of the chip-shaped electronic component is to hold each part including the external electrodes on the peripheral side surface of the chip-shaped electronic component 11 and support the lower surface by the holding means 20. It is not limited, and the chip-like electronic component may be sandwiched between two opposing surfaces.

前記チップ状電子部品11を保持する位置は、前記チップ状電子部品の表面のいずれの位置であってもよい。尚、前記保持する位置が前記チップ状電子部品の表面のうち前記外部電極14の表面の一部を覆うものである場合には、前記保持位置を異ならせて再びめっきすることが好ましい。  The position where the chip-shaped electronic component 11 is held may be any position on the surface of the chip-shaped electronic component. In addition, when the holding position covers a part of the surface of the external electrode 14 in the surface of the chip-shaped electronic component, it is preferable to perform plating again while changing the holding position.

前記チップ状電子部品11の外部電極14の表面に前記陰極プローブ26が接する位置は、前記外部電極14の表面上の何れの位置であってもよく、前記陰極プローブ26の接触位置を異ならせて再びめっきすることが好ましい。  The position where the cathode probe 26 contacts the surface of the external electrode 14 of the chip-shaped electronic component 11 may be any position on the surface of the external electrode 14, and the contact position of the cathode probe 26 is varied. Plating again is preferable.

前記外部電極14の表面上には前記陰極プローブ26の接触位置を囲むように、前記めっき液23が直接接触しないようにマスキングが施されることが好ましい。  Masking is preferably performed on the surface of the external electrode 14 so as to surround the contact position of the cathode probe 26 so that the plating solution 23 is not in direct contact.

また、前記陰極プローブの接触位置の周囲のマスキングする手段としては、前記保持手段を併用することがこのましい。  In addition, it is preferable that the holding means is used in combination as a means for masking around the contact position of the cathode probe.

次に、上記めっき装置10を用いて本発明のチップ状電子部品のめっき方法の第1の実施形態に基づく実施例について説明する。本実施例においては、チップ状電子部品11として長さ1.0mm、幅0.5mm、高さ0.5mmの所謂1005サイズのチップ状積層セラミックコンデンサを用いた。該チップ状積層セラミックコンデンサは、チタン酸バリウム系高誘電率セラミック材料からなる素体12の内部にNiからなる内部電極13の端部が前記素体12の両端面に交互に露出するように対向して配置されているとともに、前記素体12の一方及び他方の端面に露出した複数の内部電極13の端部をそれぞれ接続するように前記両端面および該端面と接する上面、下面、及び両側面のそれぞれ前記端面の近傍にNiからなる一対の外部電極14が設けられている。前記素体12の上面、下面、及び両側面に形成された外部電極14の回り込み寸法はそれぞれ前記端面から0.25mmの幅であり、それぞれの外部電極14の面積は約0.75mmとなっている。陽極29としてNiを、まためっき液としてNiめっき用のめっき液を用い、めっき液吹き付けノズル25は、直径0.7mmの円形の開口を有するものを用いた。前記陰極プローブ26と前記陽極との間に連続するめっき液23の電流密度が100A/dmをとなるように前記電源の電圧を調整した。途中で前記保持位置及び前記陰極プローブの接触位置を異ならせたのち再びめっきし、合計7秒の通電を行って厚み1μmのNiめっき膜15を形成した。
次に、前記チップ状電子部品11の表面を純水で1分間洗浄した後、陽極29としてAgを、まためっき液としてAgめっき用のめっき液を用い、前記と同様のめっき液吹き付けノズル25を用い、前記陰極プローブ26と前記陽極との間に連続するめっき液23の電流密度が100A/dmをとなるように前記電源の電圧を調整した。途中で前記保持位置及び前記陰極プローブの接触位置を異ならせたのち再びめっきし、合計4秒の通電を行って前記Niめっき膜上に厚み2μmのAgめっき膜を形成した。
上記で得られたNi/Agめっき膜は耐はんだクワレ性、耐はんだ濡れ性を得るためのめっき膜を形成させることができた。
Next, the Example based on 1st Embodiment of the plating method of the chip-shaped electronic component of this invention using the said plating apparatus 10 is demonstrated. In this example, a so-called 1005 chip multilayer ceramic capacitor having a length of 1.0 mm, a width of 0.5 mm, and a height of 0.5 mm was used as the chip-shaped electronic component 11. The chip-shaped multilayer ceramic capacitor is opposed to the element body 12 made of a barium titanate-based high dielectric constant ceramic material so that the end portions of the internal electrodes 13 made of Ni are alternately exposed on both end faces of the element body 12. And both end surfaces and upper, lower, and both side surfaces in contact with the end surfaces so as to connect the ends of the plurality of internal electrodes 13 exposed at one and the other end surfaces of the element body 12, respectively. A pair of external electrodes 14 made of Ni is provided in the vicinity of each of the end faces. The wraparound dimension of the external electrodes 14 formed on the upper surface, the lower surface, and both side surfaces of the element body 12 is 0.25 mm from the end surface, and the area of each external electrode 14 is about 0.75 mm 2. ing. Ni was used as the anode 29, a plating solution for Ni plating was used as the plating solution, and the plating solution spray nozzle 25 had a circular opening with a diameter of 0.7 mm. The voltage of the power source was adjusted so that the current density of the plating solution 23 continuous between the cathode probe 26 and the anode was 100 A / dm 2 . The holding position and the contact position of the cathode probe were changed on the way, and then plating was performed again. A current was applied for a total of 7 seconds to form a Ni plating film 15 having a thickness of 1 μm.
Next, after the surface of the chip-shaped electronic component 11 is washed with pure water for 1 minute, Ag is used as the anode 29, and a plating solution for Ag plating is used as the plating solution. The voltage of the power source was adjusted such that the current density of the plating solution 23 continuous between the cathode probe 26 and the anode was 100 A / dm 2 . In the middle, the holding position and the contact position of the cathode probe were made different, then plating was performed again, and a current was applied for a total of 4 seconds to form an Ag plating film having a thickness of 2 μm on the Ni plating film.
The Ni / Ag plating film obtained above was able to form a plating film for obtaining solder crease resistance and solder wet resistance.

次に、本発明のチップ状電子部品のめっき方法の第2の実施形態について、図3を参照して説明する。図3は本発明の第2の実施形態のめっき方法を説明するための要部拡大断面図であり、図3(A)はまずチップ状電子部品31を上面および下面で保持手段40で挟持することにより保持し、最初にチップ状電子部品31の外部電極34の表面のうち下面に陰極プローブ46を接触させ、該陰極プローブ46の接触位置の近傍を除いて露出する外部電極34の表面にめっき膜35を形成する様子を示し、図3(B)はその後にチップ状電子部品31の外部電極34の表面のうち上面に陰極プローブ46を接触させ、該陰極プローブ46の接触位置の近傍を除いて露出する外部電極34の表面にめっき膜35を形成する様子を示すものである。  Next, a second embodiment of the chip-shaped electronic component plating method of the present invention will be described with reference to FIG. FIG. 3 is an enlarged cross-sectional view of a main part for explaining a plating method according to the second embodiment of the present invention. FIG. 3A shows a chip-shaped electronic component 31 that is first sandwiched by holding means 40 on the upper surface and the lower surface. First, the cathode probe 46 is brought into contact with the lower surface of the surface of the external electrode 34 of the chip-shaped electronic component 31, and the exposed surface of the external electrode 34 is plated except in the vicinity of the contact position of the cathode probe 46. FIG. 3B shows a state in which the film 35 is formed. Thereafter, the cathode probe 46 is brought into contact with the upper surface of the surface of the external electrode 34 of the chip-shaped electronic component 31, and the vicinity of the contact position of the cathode probe 46 is excluded. 2 shows a state in which a plating film 35 is formed on the surface of the external electrode 34 that is exposed.

本実施形態に用いられるメッキ装置30と前記第1の実施形態で用いられるメッキ装置10とで異なる点は、チップ状電子部品31を保持する保持手段40と、前記チップ状電子部品31の表面の外部電極に接触する陰極プローブ46の配置および構造である。
本実施形態に用いられるめっき装置30は、全体構造は図示省略するが、チップ状電子部品31を該チップ状電子部品31の表面のうち外部電極34が形成されていない部分を上面及び下面で保持手段40で挟持することにより保持するものである。
また、本実施形態に用いられるめっき装置30は、陰極プローブ46およびそのマスキング手段47が前記保持手段40と独立して設けられているものである。
また、本実施形態に用いられるめっき装置30のめっき液吹き付けノズルは、先の第1の実施形態の実施例で用いたノズルより開口が大きく、直径1.0mmの円形である。
その他の構成及び作用効果は前記第1の実施形態で用いたメッキ装置10と同様であるため説明を省略する。
The difference between the plating apparatus 30 used in the present embodiment and the plating apparatus 10 used in the first embodiment is that the holding means 40 that holds the chip-shaped electronic component 31 and the surface of the chip-shaped electronic component 31 are different. This is the arrangement and structure of the cathode probe 46 in contact with the external electrode.
Although the entire structure of the plating apparatus 30 used in this embodiment is not shown, the chip-shaped electronic component 31 is held on the upper and lower surfaces of the surface of the chip-shaped electronic component 31 where the external electrode 34 is not formed. It is held by being clamped by means 40.
The plating apparatus 30 used in the present embodiment has a cathode probe 46 and its masking means 47 provided independently of the holding means 40.
Further, the plating solution spray nozzle of the plating apparatus 30 used in the present embodiment has a larger opening than the nozzle used in the example of the first embodiment, and has a circular shape with a diameter of 1.0 mm.
Since other configurations and operational effects are the same as those of the plating apparatus 10 used in the first embodiment, the description thereof is omitted.

尚、本発明は前記第1、第2の実施形態に限定するものではなく、前記各実施形態の一部もしくは全部の手段を併用することもできる。
また、上記実施例ではチップ状積層セラミックコンデンサを1個ずつめっき処理を行っているが、これに限定するものではなく多数個のチップ状電子部品を同時に処理することもできる。
The present invention is not limited to the first and second embodiments, and some or all of the means of the respective embodiments can be used in combination.
In the above-described embodiment, the chip-shaped multilayer ceramic capacitors are plated one by one. However, the present invention is not limited to this, and a large number of chip-shaped electronic components can be simultaneously processed.

尚、上記実施形態ではチップ状電子部品としてチップ状積層セラミックコンデンサを示したが、本発明はこれに限定するものではなく、チップ状サーミスタ、チップ状インダクタその他の各種チップ状電子部品に適用することができる。
また、上記実施形態ではチップ状電子部品として一対の外部電極を備えた単一素子のチップ状電子部品を示したが、本発明はこれに限定するものではなく、複数の電子部品素子を備えたアレイ型のチップ状電子部品や複数種の電子部品素子を備えた複合型のチップ状電子部品等の多端子型のチップ状電子部品にも適用することができる。
また、上記実施形態ではチップ状電子部品として角型のチップ状電子部品を示したが、本発明はこれに限定するものではなく、鼓形のコアを用いた巻線インダクタ、その他種々の形状のチップ状電子部品に適用することができる。
In the above embodiment, the chip-shaped multilayer ceramic capacitor is shown as the chip-shaped electronic component. However, the present invention is not limited to this, and is applicable to a chip-type thermistor, a chip-shaped inductor, and other various chip-shaped electronic components. Can do.
In the above embodiment, a single-element chip-shaped electronic component having a pair of external electrodes is shown as the chip-shaped electronic component. However, the present invention is not limited to this, and a plurality of electronic component elements are provided. The present invention can also be applied to a multi-terminal chip electronic component such as an array type chip electronic component or a composite chip electronic component including a plurality of types of electronic component elements.
In the above embodiment, a rectangular chip-shaped electronic component is shown as the chip-shaped electronic component. However, the present invention is not limited to this, and a winding inductor using a drum-shaped core, and other various shapes. It can be applied to chip-shaped electronic components.

本発明によれば、小型・薄型の各種電子機器に用いられるチップ状電子部品の外部電極へのめっき膜の形成に好適である。  The present invention is suitable for forming a plating film on an external electrode of a chip-shaped electronic component used in various small and thin electronic devices.

本発明のチップ状電子部品のめっき方法の第1の実施形態に用いられるめっき装置の全体構造を説明するための概念図である。It is a conceptual diagram for demonstrating the whole structure of the plating apparatus used for 1st Embodiment of the plating method of the chip-shaped electronic component of this invention. 前記第1の実施形態のめっき方法を説明するための図1における一点鎖線で囲まれたAの領域を示す要部拡大断面図である。It is a principal part expanded sectional view which shows the area | region of A enclosed with the dashed-dotted line in FIG. 1 for demonstrating the plating method of the said 1st Embodiment. 本発明の第2の実施形態のめっき方法を説明するための要部拡大断面図である。It is a principal part expanded sectional view for demonstrating the plating method of the 2nd Embodiment of this invention. 背景技術の一例を示す断面図である。It is sectional drawing which shows an example of background art.

符号の説明Explanation of symbols

10:めっき装置
11:チップ状電子部品
12:素体
13:内部電極
14:外部電極
15:めっき膜
20:保持手段
21:めっき室
22:タンク
23:めっき液
24:めっき液供給手段
25:ノズル
26:陰極プローブ
28:電源
29:陽極
30:めっき装置
31:チップ状電子部品
32:素体
33:内部電極
34:外部電極
35:めっき膜
40:保持手段
43:めっき液
45:ノズル
46:陰極プローブ
47:マスキング手段
49:陽極
DESCRIPTION OF SYMBOLS 10: Plating apparatus 11: Chip-shaped electronic component 12: Element body 13: Internal electrode 14: External electrode 15: Plating film 20: Holding means 21: Plating chamber 22: Tank 23: Plating solution 24: Plating solution supply means 25: Nozzle 26: Cathode probe 28: Power source 29: Anode 30: Plating device 31: Chip-shaped electronic component 32: Element body 33: Internal electrode 34: External electrode 35: Plating film 40: Holding means 43: Plating solution 45: Nozzle 46: Cathode Probe 47: Masking means 49: Anode

Claims (5)

めっき液吹き付けノズル内に陽極を配置し、チップ状電子部品の表面の少なくとも一つの外部電極に前記吹き付けノズルが対向するように前記チップ状電子部品の表面の任意の位置を保持手段で保持し、前記チップ状電子部品の前記外部電極の表面の任意の位置に陰極プローブを接触させ、前記吹き付けノズルの陽極と前記陰極プローブとの間に電圧を印加しながら前記吹き付けノズルとチップ状電子部品の外部電極との間にめっき液が連続するように前記外部電極にめっき液を吹き付けてめっきし、さらに前記チップ状電子部品の前記外部電極の表面の前記と異なる位置に陰極プローブを接触させて再びめっきすることを特徴とするチップ状電子部品のめっき方法。  An anode is disposed in the plating solution spray nozzle, and an arbitrary position on the surface of the chip-like electronic component is held by the holding means so that the spray nozzle faces the at least one external electrode on the surface of the chip-like electronic component, A cathode probe is brought into contact with an arbitrary position on the surface of the external electrode of the chip-shaped electronic component, and a voltage is applied between the anode of the spray nozzle and the cathode probe, and the outside of the spray nozzle and the chip-shaped electronic component. Plating is performed by spraying a plating solution onto the external electrode so that the plating solution is continuous with the electrode, and further, the cathode probe is brought into contact with a different position on the surface of the external electrode of the chip-like electronic component to perform plating again. A method for plating a chip-like electronic component, comprising: 前記チップ状電子部品の表面の前記と異なる位置を保持して再びめっきすることを特徴とする請求項1に記載のチップ状電子部品のめっき方法。  The method for plating a chip-shaped electronic component according to claim 1, wherein the plating is performed again while holding a position different from the position on the surface of the chip-shaped electronic component. 前記陰極プローブの接触位置を囲むようにマスキングした状態でめっきすることを特徴とする請求項1に記載のチップ状電子部品のめっき方法。  2. The chip-shaped electronic component plating method according to claim 1, wherein plating is performed in a masked state so as to surround a contact position of the cathode probe. 前記保持手段で前記陰極プローブの接触位置の周囲をマスキングした状態でめっきすることを特徴とする請求項1〜3のいずれか一項に記載のチップ状電子部品のめっき方法。  The plating method for a chip-shaped electronic component according to any one of claims 1 to 3, wherein plating is performed in a state where the periphery of the contact position of the cathode probe is masked by the holding means. 前記チップ状電子部品の一つの外部電極の露出面積よりも大きな開口面積のノズルでめっき液を吹き付けることを特徴とする請求項1〜3のいずれか一項に記載のチップ状電子部品のめっき方法。  The plating method for a chip-shaped electronic component according to any one of claims 1 to 3, wherein the plating solution is sprayed with a nozzle having an opening area larger than an exposed area of one external electrode of the chip-shaped electronic component. .
JP2006238243A 2006-08-07 2006-08-07 Method of plating chip-shaped electronic component Withdrawn JP2008038240A (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010043340A (en) * 2008-08-18 2010-02-25 Fuji Electric Holdings Co Ltd Electroplating tool and electroplating method
WO2010120158A2 (en) * 2009-04-17 2010-10-21 주식회사 케이엠더블유 Electroplating apparatus
CN102459714A (en) * 2009-04-17 2012-05-16 株式会社Kmw Electroplating apparatus
WO2023234564A1 (en) * 2022-05-31 2023-12-07 주식회사 애니캐스팅 Electrode module having positive electrode and negative electrode, and s-ecam printing device comprising same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010043340A (en) * 2008-08-18 2010-02-25 Fuji Electric Holdings Co Ltd Electroplating tool and electroplating method
WO2010120158A2 (en) * 2009-04-17 2010-10-21 주식회사 케이엠더블유 Electroplating apparatus
WO2010120158A3 (en) * 2009-04-17 2011-02-03 주식회사 케이엠더블유 Electroplating apparatus
CN102459714A (en) * 2009-04-17 2012-05-16 株式会社Kmw Electroplating apparatus
WO2023234564A1 (en) * 2022-05-31 2023-12-07 주식회사 애니캐스팅 Electrode module having positive electrode and negative electrode, and s-ecam printing device comprising same

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