JP2008006365A - Continuous producing method of hydrogen water, its producing apparatus, bathing apparatus using hydrogen water, and bathroom device - Google Patents

Continuous producing method of hydrogen water, its producing apparatus, bathing apparatus using hydrogen water, and bathroom device Download PDF

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JP2008006365A
JP2008006365A JP2006178057A JP2006178057A JP2008006365A JP 2008006365 A JP2008006365 A JP 2008006365A JP 2006178057 A JP2006178057 A JP 2006178057A JP 2006178057 A JP2006178057 A JP 2006178057A JP 2008006365 A JP2008006365 A JP 2008006365A
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hydrogen
water
gas
liquid mixing
bathroom
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Shigeo Kawasaki
重雄 川崎
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KAWAKURIIN KK
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<P>PROBLEM TO BE SOLVED: To provide a bathing apparatus continuously producing hydrogen water having cleaning effect or an anti-oxidation function in a safely usable state and safely using hydrogen water, and a bathroom device. <P>SOLUTION: In this hydrogen water producing apparatus, hydrogen gas B is mixed with water A by a gas-liquid mixing pump 3 and is discharged at a given pressure, passed through an agitation part 4 making fine bubbles by agitating the hydrogen-mixed water in the flow passage, flow speed is slowed for retarding the flow (gas-releasing stabilizing tank 5) to release surplus hydrogen E, to continuously produce saturated hydrogen water. By using a heating part, warm water is used in place of water to use as a bathing apparatus, and by combination with a bathroom having a hydrogen sensor, a safe bathroom device is obtained. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、飲用水や風呂用水等に使用される水素水の連続製造方法及びその製造装置並びに前記の水素水製造手段を採用した入浴装置及び浴室装置に関するものである。   The present invention relates to a method for continuously producing hydrogen water used for drinking water, bath water, and the like, a production apparatus therefor, and a bath apparatus and a bathroom apparatus employing the hydrogen water production means.

水素を水に混入させ、微細気泡状態で水中に溶存させた所謂水素水は、飲用によって人体内の活性酸素対策(抗酸化物質)となり、またその還元性から洗濯用水や入浴用水として使用されている。   So-called hydrogen water in which hydrogen is mixed into water and dissolved in water in the form of fine bubbles becomes a countermeasure against active oxygen (antioxidant) in the human body by drinking, and it is used as washing water and bathing water because of its reducibility. Yes.

この水素水の製造手段として特許文献1(特開2000−354696号公報)には、通水パイプに接続した入水側の導水パイプ、水素飽和槽、出水側の排出パイプで構成され、水素飽和槽において、水素ガスの供給を受けながら攪拌子(動力モーター駆動)で急速撹拌して、水素ガスを微細気泡として水素飽和水を得るようにしているものである。   Patent Document 1 (Japanese Patent Application Laid-Open No. 2000-354696) discloses a hydrogen water production means comprising a water inlet side pipe, a hydrogen saturation tank, and a water discharge side discharge pipe connected to a water flow pipe. In the above, hydrogen agitation is performed rapidly with a stirrer (powered motor drive) while receiving supply of hydrogen gas, and hydrogen saturated water is obtained using hydrogen gas as fine bubbles.

また特許文献2(特開2004−66071号公報)には入浴用水としての使用例が開示されており、水素水の製造は、所定の圧力下にある気液混合タンク内で水素を溶解させて溶解水素とし、浴槽には、水素混入水を紫外線照射筒で紫外線を照射して活性水素を含む水とし、圧力開放部から活性水素の微細な気泡を含む活性水素水を供給するようにしている。   Patent Document 2 (Japanese Patent Laid-Open No. 2004-66071) discloses an example of use as bathing water, and hydrogen water is produced by dissolving hydrogen in a gas-liquid mixing tank under a predetermined pressure. Dissolved hydrogen is used, and the hydrogen-mixed water is irradiated with ultraviolet rays with an ultraviolet irradiation tube into the bath to obtain water containing active hydrogen, and active hydrogen water containing fine bubbles of active hydrogen is supplied from the pressure release portion. .

特開2000−354696号公報。JP 2000-354696 A. 特開2004−66071号公報。JP 2004-66071 A.

水素水は、微細気泡が水中に溶け込んでいる所謂溶存水素として存在するもので、効果的に攪拌しても1.5ppm程度で飽和状態となり、而かも溶存水素の飽和状態は、水温や微細気泡の製出手段によって変化し一定ではない。そうすると特許文献1記載の水素水製造装置において、製出される水素水が飽和水素水とするには、当然余剰な水素が含まれる水素混入水となるものである。   Hydrogen water exists as so-called dissolved hydrogen in which fine bubbles are dissolved in water, and even if it is effectively stirred, it becomes saturated at about 1.5 ppm, and the saturated state of dissolved hydrogen is the water temperature and fine bubbles. It varies depending on the production means, and is not constant. If it does so, in the hydrogenous water manufacturing apparatus of patent document 1, in order for the hydrogen water produced to be saturated hydrogen water, naturally it becomes hydrogen mixed water containing excess hydrogen.

そこで前記製造装置で製出された水素水は溶存水素以外の余剰水素が気泡状態で存在することになり、水素水を飲用水として瓶詰め(ペットボトル包装やその他の包装)して提供しようとした場合には、瓶内に高圧水素ガスとして滞留し、開栓時に水素ガスが噴出することになり、近辺に火気が存在した場合に、非常に危険である。   Therefore, the hydrogen water produced by the production apparatus has surplus hydrogen other than dissolved hydrogen in the form of bubbles, and it was tried to provide hydrogen water as potable water by bottling (PET bottle packaging or other packaging). In such a case, the gas stays in the bottle as high-pressure hydrogen gas, and the hydrogen gas is ejected when the bottle is opened, which is very dangerous when there is fire in the vicinity.

同様に特許文献2で開示されている通り、水素水を入浴用水として使用する場合には、浴槽内の浴湯から水素ガスが放出されることになり、特に熱効率の点から密室に形成される浴室内においては、放出された水素ガスが浴室内に滞留することになり、浴湯用加熱装置が存在することによって非常に危険な状態に至る。   Similarly, as disclosed in Patent Document 2, when hydrogen water is used as bathing water, hydrogen gas is released from the bath water in the bathtub, and is formed in a closed room particularly from the viewpoint of thermal efficiency. In the bathroom, the released hydrogen gas stays in the bathroom, and the presence of the bath water heating device leads to a very dangerous state.

そこで本発明は、余剰水素ガスを含まない飽和状態の水素水を連続的に製造する手段及び前記手段を採用した新規な入浴装置及び浴室装置を提案したものである。   Therefore, the present invention proposes means for continuously producing saturated hydrogen water that does not contain surplus hydrogen gas, and a novel bathing apparatus and bathroom apparatus that employs the means.

本発明に係る水素水の連続製造方法(請求項1)は、気液混合ポンプで水素ガスと水を混合して所定の圧力で吐出し、流路途中に水素混入水を攪拌して気泡を微細化する攪拌部を通した後、流速を緩めて滞流させて余剰水素を放出させ、飽和水素水を連続製造することを特徴とするものである。   In the method for continuously producing hydrogen water according to the present invention (Claim 1), hydrogen gas and water are mixed by a gas-liquid mixing pump and discharged at a predetermined pressure, and the hydrogen-mixed water is stirred in the middle of the flow path to generate bubbles. After passing through the agitating part to be refined, the flow rate is slowed down and the remaining hydrogen is released to discharge surplus hydrogen, and saturated hydrogen water is continuously produced.

また本発明に係る水素水の連続製造装置(請求項3)は、水供給部と、水素供給部と、前記各供給部から水と水素の供給を受けて水素混入水を吐出する気液混合ポンプと、気液混合ポンプから吐出される水素混入水が攪拌される攪拌部と、攪拌部からの水素混入水が所定の滞流をなして溶存水素以外の水素を放出させる放気安定槽とを含んで構成されることを特徴とするものである。   Further, a continuous hydrogen water production apparatus according to the present invention (Claim 3) includes a water supply unit, a hydrogen supply unit, and a gas-liquid mixture that receives supply of water and hydrogen from each of the supply units and discharges hydrogen-mixed water. A pump, a stirring unit in which the hydrogen-mixed water discharged from the gas-liquid mixing pump is stirred, and a discharge stabilization tank in which the hydrogen-mixed water from the stirring unit forms a predetermined stagnation and releases hydrogen other than dissolved hydrogen It is characterized by including.

而して水に水素を混入し攪拌した後、水素混入水流が放気安定槽で滞流すると、当該時に余剰混入水素が放出され、溶存水素が飽和状態の飽和水素水が残ることになり、余剰水素を著しく減少させた水素水を連続的に供給できる。   Thus, after mixing and stirring hydrogen in the water, when the hydrogen-mixed water flow stagnates in the degassing stabilization tank, surplus mixed hydrogen is released at that time, and saturated hydrogen water in which dissolved hydrogen is saturated remains. Hydrogen water in which surplus hydrogen is significantly reduced can be continuously supplied.

また本発明に係る水素水の製造装置(請求項6)は、水素水及び水素混入水が流れる各部(気液混合ポンプと、攪拌部と、放気安定槽からなる水素混入水の製造装置及びそれらを接続する流路範囲)を、適宜な収納室内に配置し、前記収納室に室内空気の排出機構を設けると共に、排出機構の排出路又は収納室内に水素センサを設け、水素供給部と気液混合ポンプの間を接続する水素ガス供給路に設けた開閉弁機構を、水素センサの検知に基づいて動作制御してなることを特徴とするものである。更に排出機構を、前記水素センサの検知に基づいて動作制御してなるものである(請求項7)。   Further, the hydrogen water production apparatus according to the present invention (Claim 6) is provided with each part through which hydrogen water and hydrogen-mixed water flow (a gas-liquid mixing pump, a stirrer, and a hydrogen-mixed water production apparatus comprising a degassing stabilizing tank The flow range connecting them) is arranged in an appropriate storage chamber, the indoor chamber is provided with a discharge mechanism for indoor air, a hydrogen sensor is provided in the discharge passage of the discharge mechanism or the storage chamber, and the hydrogen supply section and the The on-off valve mechanism provided in the hydrogen gas supply path connecting the liquid mixing pumps is controlled based on the detection of the hydrogen sensor. Further, the operation of the discharge mechanism is controlled based on the detection of the hydrogen sensor (Claim 7).

而して水素水の製造過程において、余剰水素が混入している水素混入水から放出された水素が、その製造過程において漏洩した場合に、当該漏洩水素は、収納室内に滞留し、排出機構によって収納室外に排気されるが、水素濃度が所定値以上に達すると開閉弁機構を動作させて、水素ガスの供給を停止し、また排出機構を水素センサの検出値に基づいて動作制御することで、水素ガスの漏洩を確実に検知することができ、漏洩水素を適確に外気に放出し、爆発の可能性が生ずる濃度に達しないようにして、装置全体の安全を図っている。以下の入浴装置並びに浴室装置における水素水製造部分にも適用できるものである。   Thus, in the hydrogen water production process, when hydrogen released from the hydrogen-mixed water mixed with surplus hydrogen leaks in the production process, the leaked hydrogen stays in the storage chamber and is discharged by the discharge mechanism. Although exhausted outside the storage chamber, when the hydrogen concentration reaches a predetermined value or more, the on-off valve mechanism is operated to stop the supply of hydrogen gas, and the discharge mechanism is controlled based on the detection value of the hydrogen sensor. The leakage of hydrogen gas can be reliably detected, the leaked hydrogen is properly released to the outside air, and the concentration of the possibility of explosion is not reached so as to ensure the safety of the entire apparatus. The present invention can also be applied to the hydrogen water production part in the following bathing apparatus and bathroom apparatus.

また本発明に係る入浴装置(請求項8)は、浴湯供給部と、水素供給部と、前記各供給部から水と水素の供給を受けて水素混入水を吐出する気液混合ポンプと、気液混合ポンプから吐出される水素混入水が攪拌される攪拌部と、攪拌部からの水素混入水が所定の滞流をなして溶存水素以外の水素を放出させる放気安定槽と、放気安定槽から浴湯を受け入れる浴槽とを備えてなることを特徴とするものである。   Further, a bathing apparatus according to the present invention (Claim 8) includes a bath water supply unit, a hydrogen supply unit, a gas-liquid mixing pump that receives supply of water and hydrogen from each of the supply units and discharges hydrogen-containing water, An agitation unit in which hydrogen-mixed water discharged from the gas-liquid mixing pump is agitated, an air-release stabilization tank in which the hydrogen-mixed water from the agitation unit forms a predetermined stagnation and releases hydrogen other than dissolved hydrogen; It is characterized by comprising a bathtub for receiving bath water from a stabilization tank.

而して前記の水素水製造装置と同様に、混入余剰水素を減少させた水素水による浴湯を供給することができ、洗浄効果・美肌効果(還元電位が高いことによる効果)に優れた水素水による安全な入浴が実現する。   Thus, similar to the above hydrogen water production apparatus, it is possible to supply bath water using hydrogen water with reduced excess hydrogen mixture, and hydrogen with excellent cleaning effect and skin beautifying effect (effect due to high reduction potential). Safe bathing with water is realized.

更に本発明に係る浴室装置(請求項11)は、前記の入浴装置に加え、浴槽を内置した浴室を備え、前記浴室に所定の排出換気機構を設けると共に、浴室内の適宜位置又は排出換気機構の排出路に浴室内水素センサを設け、前記浴室内水素センサの検知値に基づいて、排出換気機構又は放気安定槽から浴槽に浴湯を供給する供給路に設けた遮断弁機構の何れか一方或いは双方の動作を制御してなることを特徴とするものである。   Furthermore, the bathroom apparatus according to the present invention (Claim 11) includes a bathroom in which a bathtub is placed, in addition to the bathing apparatus, and is provided with a predetermined exhaust ventilation mechanism in the bathroom, and an appropriate position in the bathroom or an exhaust ventilation mechanism. Either a hydrogen sensor in the bathroom is provided in the discharge channel, and a shut-off valve mechanism provided in the supply channel for supplying hot water from the discharge ventilation tank to the bathtub based on the detection value of the hydrogen sensor in the bathroom. One or both operations are controlled.

而して混入余剰水素を減少させた水素水による浴湯を供給し、浴湯から余剰水素が放出され浴室内の水素濃度が所定値以上に達すると、水素水の浴湯の供給を停止したり、排出機構を動作させて浴室内換気を実施するものである。   Thus, when the bath water is supplied with hydrogen water with reduced excess hydrogen mixed in, and the surplus hydrogen is released from the bath water and the hydrogen concentration in the bathroom reaches a predetermined value or higher, the supply of the hydrogen water bath water is stopped. Or ventilating the bathroom by operating the discharge mechanism.

本発明の構成は上記の通りであるから、余剰水素の混在を減少させた飽和水素水を連続的に製造できるものであり、また洗浄効果の高い水素水を浴湯として使用する際に、余剰水素の混入が少ないので、安全に入浴でき、更に水素センサを備えて浴室内換気の実施を行うことで、より安全に水素水の利用を実現できる。   Since the configuration of the present invention is as described above, it is possible to continuously produce saturated hydrogen water in which the presence of surplus hydrogen is reduced, and when using hydrogen water having a high cleaning effect as bath water, surplus Since there is little mixing of hydrogen, bathing can be performed safely, and the use of hydrogen water can be realized more safely by providing a hydrogen sensor and performing ventilation in the bathroom.

次に本発明の実施形態について説明する。図1は水素水製造装置の実施形態(第一実施形態)で、装置全体は、水供給部1と、水素供給部2と、気液混合ポンプ3と、攪拌部4と、放気安定槽5と、収納室6とで構成されるものである。   Next, an embodiment of the present invention will be described. FIG. 1 shows an embodiment (first embodiment) of a hydrogen water production apparatus. The entire apparatus includes a water supply unit 1, a hydrogen supply unit 2, a gas-liquid mixing pump 3, a stirring unit 4, and an air discharge stabilization tank. 5 and the storage chamber 6.

水供給部1は、水素混入用水を供給するもので、水道水を直接使用したり、別置純水製造装置による純水を使用する等、製出する水素水の使用目的に対応する水を供給するもので、加熱部を設け、温水(20℃程度を目安)として供給すると、水素ガスの溶存率が高まる。   The water supply unit 1 supplies water for hydrogen mixing, and uses water corresponding to the purpose of use of the produced hydrogen water, such as using tap water directly or using pure water from a separate pure water production device. If it supplies and supplies a heating part and supplies as warm water (about 20 degreeC is a standard), the dissolved rate of hydrogen gas will increase.

水素供給部2は、水素ガスボンベを使用するので一般的であるが、特に水の電気分解装置を組み合わせ、得られた水素ガスを使用するようにしても良い。また水素ガスボンベ(水素供給部)から水素ガス供給路に開閉弁機構21を介設する。   The hydrogen supply unit 2 is general because it uses a hydrogen gas cylinder, but the hydrogen gas obtained by combining a water electrolysis device may be used. Further, an open / close valve mechanism 21 is provided from the hydrogen gas cylinder (hydrogen supply unit) to the hydrogen gas supply path.

気液混合ポンプ3は、既存の一般的なポンプを採用するもので、水供給部1からの用水Aと、水素供給部(水素ガスボンベ)2からの水素ガスBを、混合状態として所定の圧力で吐出するものである。   The gas-liquid mixing pump 3 employs an existing general pump, and mixes the water A from the water supply unit 1 and the hydrogen gas B from the hydrogen supply unit (hydrogen gas cylinder) 2 with a predetermined pressure. Is discharged.

攪拌部4は、水流が衝突すると水流が分断され攪拌される固定攪拌羽根を内装した筒状体である。   The stirring unit 4 is a cylindrical body having a fixed stirring blade that is divided and stirred when the water flow collides.

放気安定槽5は、適宜な容量のタンクで、上方部分に放気部51を設け、下流側に放出路52を設けたものである。   The air release stabilization tank 5 is a tank having an appropriate capacity, and is provided with an air release part 51 in the upper part and a discharge path 52 on the downstream side.

収納室6は、気液混合ポンプ3、攪拌部4及び放気安定槽5と、これらを接続する流路管を室内に配置し、前記収納室には、水素センサ61と排出機構を付設するもので、水素センサ61は、室内の適宜位置或いは排出機構62の排出路に設置し、その検出値に基づいて開閉弁機構21の開閉動作を制御したり、必要に応じて排出機構62を制御するものである。また排出機構62は、常時作動状態とするものであっても良いし、水素センサ61の検出値に基づいて動作制御されるものであっても良い。   The storage chamber 6 is provided with a gas-liquid mixing pump 3, a stirring unit 4, and an air discharge stabilization tank 5, and a flow path pipe connecting them, and a hydrogen sensor 61 and a discharge mechanism are attached to the storage chamber. Therefore, the hydrogen sensor 61 is installed at an appropriate position in the room or in the discharge path of the discharge mechanism 62, and controls the opening / closing operation of the on-off valve mechanism 21 based on the detected value, or controls the discharge mechanism 62 as necessary. To do. Further, the discharge mechanism 62 may be in an always operating state, or may be controlled in operation based on the detection value of the hydrogen sensor 61.

而して気液混合ポンプ3に水供給部1から用水Aと、水素供給部(水素ガスボンベ)2からの水素ガスBを供給し、両者を混合して所定の圧力で吐出すると、水素混合水Cは、所定の流速を以って攪拌部4に流れ込み、攪拌部4の固定攪拌羽根に水流が衝突することで水素ガスの気泡が微細分されて溶存状態となる。   Thus, when the water A from the water supply unit 1 and the hydrogen gas B from the hydrogen supply unit (hydrogen gas cylinder) 2 are supplied to the gas-liquid mixing pump 3, and both are mixed and discharged at a predetermined pressure, C flows into the stirring unit 4 at a predetermined flow rate, and the water flow collides with the fixed stirring blades of the stirring unit 4 so that the bubbles of hydrogen gas are finely divided into a dissolved state.

そして水素ガスの一部が溶存水素となっている水素水Dが放気安定槽5に流れ込むと、前記水素水Dは滞流状態となり、水素水Dに混入している余剰水素(溶存水素以外のガス)が水素水Dから放出されて放気安定槽5の上方空間に溜まることになり、当該水素ガスは放出部51から放気安定槽5外に放出する。勿論放出水素Eはそのまま大気中に放出しても良いし、再度気液混合ポンプ3に水素ガスBとして供給するようにしても良い。   Then, when the hydrogen water D in which part of the hydrogen gas is dissolved hydrogen flows into the discharge stabilization tank 5, the hydrogen water D is in a stagnation state, and surplus hydrogen mixed in the hydrogen water D (other than dissolved hydrogen) Gas) is released from the hydrogen water D and accumulates in the upper space of the discharge stabilization tank 5, and the hydrogen gas is released from the discharge portion 51 to the outside of the discharge stabilization tank 5. Of course, the released hydrogen E may be released into the atmosphere as it is, or may be supplied again to the gas-liquid mixing pump 3 as hydrogen gas B.

放気安定槽5の放出路52から連続的に放出される水素水Fは、充分な溶存水素を含有する水素水(飽和水素水:含有水素量0.35〜045ppm、酸化還元電位−300〜−500mV程度)となり、且つ余剰水素ガスを殆ど含まないもので、そのまま瓶詰めとして飲用水(水素水)として提供したり、優れた洗浄効果を利用するように洗浄用水として使用できるものである。   Hydrogen water F continuously discharged from the discharge passage 52 of the discharge stabilization tank 5 is hydrogen water containing a sufficient amount of dissolved hydrogen (saturated hydrogen water: content of hydrogen 0.35 to 045 ppm, oxidation-reduction potential −300 to It is about -500 mV) and contains almost no surplus hydrogen gas, and can be provided as drinking water (hydrogen water) as it is as a bottle or as cleaning water so as to use an excellent cleaning effect.

更に前記の水素水の製造装置において、余剰水素が多量に混入している箇所(気液混合ポンプ3、攪拌部4及び放気安定槽5並びに前記各部を接続する流路)を収納室内に配置したものであから、前記箇所から余剰水素が漏洩したとしても、当該漏洩水素は、収納室6内に滞留し、排出機構62によって収納室外に排気される。特に水素濃度が水素センサ61の検出によって所定値以上に達すると開閉弁機構21を動作させて、水素ガスの供給を停止して、爆発の可能性が生ずる濃度に達しないようにして、装置全体の安全を図るものである。また排出機構62を常時作動させ、開閉弁機構21の開閉動作のみで安全を図っても良いし、特に排出機構62の動作も水素センサ61の検出値に基づいて制御して、省エネを図っても良い。   Further, in the hydrogen water production apparatus, a place where a large amount of surplus hydrogen is mixed (the gas-liquid mixing pump 3, the agitation unit 4, the discharge stabilization tank 5, and the flow path connecting the above parts) is disposed in the storage chamber. Therefore, even if surplus hydrogen leaks from the location, the leaked hydrogen stays in the storage chamber 6 and is exhausted out of the storage chamber by the discharge mechanism 62. In particular, when the hydrogen concentration reaches a predetermined value or more as detected by the hydrogen sensor 61, the on-off valve mechanism 21 is operated to stop the supply of hydrogen gas so that the concentration causing the possibility of explosion does not reach the entire apparatus. It is intended for safety. Further, the discharge mechanism 62 may be operated at all times, and safety may be achieved only by the opening / closing operation of the on-off valve mechanism 21. In particular, the operation of the discharge mechanism 62 is also controlled based on the detection value of the hydrogen sensor 61 to save energy. Also good.

図2は入浴装置の実施形態(第二実施形態)で、前記の第一実施形態に示した水素水製造装置において、水供給部1に変えて浴湯供給部7を採用し、更に浴槽部7を加えたもので、水素供給部2、気液混合ポンプ3、攪拌部4及び放気安定槽5の構成は第一実施形態と同様の構成である。   FIG. 2 shows an embodiment (second embodiment) of the bathing apparatus. In the hydrogen water production apparatus shown in the first embodiment, a bath water supply unit 7 is adopted instead of the water supply unit 1, and a bath unit 7, the configuration of the hydrogen supply unit 2, the gas-liquid mixing pump 3, the stirring unit 4 and the degassing stabilizing tank 5 is the same as that of the first embodiment.

浴湯供給部7は、浴湯用水を水道水や浴槽81からの戻り湯を加熱し、所定の温度(40℃程度を基準)に加熱し、所定の温水Gを気液混合ポンプ3に供給するものである。   The bath water supply unit 7 heats the bath water for tap water and the return hot water from the bathtub 81, heats it to a predetermined temperature (on the basis of about 40 ° C.), and supplies the predetermined hot water G to the gas-liquid mixing pump 3. To do.

浴槽部8は、放気安定槽5の放出路52が接続される浴槽81と、浴槽81から再加熱のために浴湯供給部7への戻り湯を行なう返湯路82を備え、更に放出路52に浴湯遮断弁83を、返湯路82に循環ポンプ84を介設してなるものである。   The bathtub portion 8 includes a bathtub 81 to which the discharge passage 52 of the release stabilizer 5 is connected, and a hot water return passage 82 for returning hot water from the bathtub 81 to the bath water supply portion 7 for reheating. A bath hot water shutoff valve 83 is provided in the passage 52, and a circulation pump 84 is provided in the hot water return passage 82.

また収納室6内には、第一実施形態と同様に、気液混合ポンプ3、攪拌部4及び放気安定槽5と、これらを接続する流路管を配置する他、浴湯供給部7、返湯路82及び循環ポンプ84を内置しても良い。   In the storage chamber 6, similarly to the first embodiment, a gas-liquid mixing pump 3, a stirring unit 4, and an air discharge stabilization tank 5, and a flow channel pipe connecting them are arranged, and a bath water supply unit 7 is also provided. The hot water return passage 82 and the circulation pump 84 may be installed.

而して前記第一実施形態と同様に所定の温度に加熱された浴湯用水(温水)Gは、気液混合ポンプ3で水素ガスBと混合されて攪拌部4に送り出され、攪拌部4で水素ガスの気泡が微細分されて溶存状態となり、放気安定槽5で余剰水素ガスが放出され、飽和水素水の浴湯Hが浴槽に供給されるものである。   Thus, as in the first embodiment, the bath water (warm water) G heated to a predetermined temperature is mixed with the hydrogen gas B by the gas-liquid mixing pump 3 and sent out to the agitator 4, where the agitator 4 Thus, bubbles of hydrogen gas are finely divided to be dissolved, surplus hydrogen gas is released in the discharge stabilization tank 5, and bath water H of saturated hydrogen water is supplied to the bathtub.

従って浴槽71に満たされる浴湯Hは、水素水であり、所定の効果(雑菌の繁殖を防止して、浴槽内のぬめりの発生を抑える。人体に対しては皮膚の老化防止の効果がある)を奏するものである。   Therefore, the bath water H filled in the bathtub 71 is hydrogen water, and has a predetermined effect (prevents the propagation of various bacteria and suppresses the occurrence of slime in the bathtub. It has an effect of preventing skin aging for the human body. ).

また水素供給部2の供給路の開閉弁機構21において、水素ガスの供給を停止して運転すると、通常の入浴装置として稼動するものである。   In addition, when the hydrogen gas supply is stopped and operated in the on-off valve mechanism 21 of the supply path of the hydrogen supply unit 2, it operates as a normal bathing device.

図3は浴室装置の実施形態(第三実施形態)で、前記の第二実施形態に示した入浴装置において、密閉型の浴室システム(所謂ユニットバス)を採用したものである。即ち前記浴槽部8の浴槽81を、更に所定の部材で組み立てられる密閉型の浴室部9内に設けたものである。   FIG. 3 shows an embodiment (third embodiment) of the bathroom apparatus, which employs a closed bathroom system (so-called unit bath) in the bathing apparatus shown in the second embodiment. That is, the bathtub 81 of the bathtub portion 8 is further provided in the hermetic bathroom portion 9 assembled by a predetermined member.

浴室部9は、前記のとおり壁面及び天井と、ドアなどの建具並びに浴槽81が所定の部材で一体に組み立てられた所謂ユニットバスであり、特に本発明の浴室装置は、更に浴室部9に水素センサ91と排出換気機構92を設けたものである   The bathroom unit 9 is a so-called unit bath in which the wall surface and ceiling, the door and other fittings, and the bathtub 81 are integrally assembled with predetermined members as described above. In particular, the bathroom device of the present invention further includes a hydrogen in the bathroom unit 9. A sensor 91 and a discharge ventilation mechanism 92 are provided.

水素センサ91は、浴室内の適宜位置又は排出換気機構92の排出路に設置し、その検出値に基づいて浴湯遮断弁83の開閉動作を制御したり、必要に応じて排出換気機構92を制御するものである。また排出換気機構92は、常時作動状態とするものであっても良いし、水素センサ91の検出値に基づいて動作制御されるものであっても良い。   The hydrogen sensor 91 is installed at an appropriate position in the bathroom or in the discharge passage of the discharge ventilation mechanism 92, and controls the opening / closing operation of the bath water shutoff valve 83 based on the detected value, or the discharge ventilation mechanism 92 is installed as necessary. It is something to control. Further, the exhaust ventilation mechanism 92 may be always in an operating state, or may be controlled in operation based on the detection value of the hydrogen sensor 91.

而して第二実施形態と同様に混入余剰水素を減少させた水素水による浴湯Hが浴槽71に供給され、清浄化効果並びに入浴効果を奏する水素水入浴が可能となり、特に含有水素ガス(浴湯Hからの余剰水素ガス)が放出され浴室内の水素濃度が所定値以上に達すると、水素センサ91で検知し、浴湯遮断弁83を閉塞して浴湯Hの供給を停止し、排出機構92が動作していない場合には、動作させて浴室内換気を実施し、安全性を確保するものである。   Thus, similarly to the second embodiment, the bath water H by the hydrogen water in which the excess hydrogen mixed in is reduced is supplied to the bathtub 71, and the hydrogen water bath having a cleaning effect and a bathing effect is possible. When surplus hydrogen gas from the bath water H) is released and the hydrogen concentration in the bathroom reaches a predetermined value or more, it is detected by the hydrogen sensor 91, the bath water shutoff valve 83 is closed, and the supply of the bath water H is stopped. When the discharge mechanism 92 is not operating, it is operated to ventilate the bathroom and ensure safety.

本発明の第一実施形態の構成説明図。BRIEF DESCRIPTION OF THE DRAWINGS Configuration explanatory drawing of 1st embodiment of this invention. 同第二実施形態の構成説明図。Configuration explanatory diagram of the second embodiment. 同第三実施形態の構成説明図。Structure explanatory drawing of the third embodiment.

符号の説明Explanation of symbols

1 水供給部
2 水素供給部(水素ガスボンベ)
21 ガス供給開閉弁機構
3 気液混合ポンプ
4 攪拌部
5 放気安定槽
51 放気部
52 放出路
6 収納室
61 水素センサ
62 排出機構
7 浴湯供給部
8 浴槽部
81 浴槽
82 返湯路
83 浴湯遮断弁
84 循環ポンプ
9 浴室部
91 浴室内水素センサ
92 排出換気機構
1 Water supply part 2 Hydrogen supply part (hydrogen gas cylinder)
21 Gas supply on / off valve mechanism 3 Gas-liquid mixing pump 4 Stirring unit 5 Air discharge stabilization tank 51 Air discharge unit 52 Release path 6 Storage chamber 61 Hydrogen sensor 62 Discharge mechanism 7 Bath water supply unit 8 Bath unit 81 Bath 82 Return hot water channel 83 Bath water shut-off valve 84 Circulation pump 9 Bathroom section 91 Hydrogen sensor 92 in bathroom Bathroom exhaust ventilation mechanism

Claims (13)

気液混合ポンプで水素ガスと水を混合して所定の圧力で吐出し、流路途中に水素混入水を攪拌して気泡を微細化する攪拌部を通した後、流速を緩めて滞流させて余剰水素を放出させ、飽和水素水を連続製造することを特徴とする水素水の連続製造方法。   Hydrogen gas and water are mixed with a gas-liquid mixing pump and discharged at a predetermined pressure. After passing through the stirring section that stirs the hydrogen-mixed water and refines the bubbles in the middle of the flow path, the flow rate is reduced and the flow is slowed down. A method for continuously producing hydrogen water, characterized in that surplus hydrogen is released to produce saturated hydrogen water continuously. 水素混入水流を、固定攪拌羽根に衝突させて攪拌させてなる請求項1記載の水素水の連続製造方法。   The continuous production method of hydrogen water according to claim 1, wherein the hydrogen-mixed water stream is agitated by colliding with a fixed stirring blade. 水供給部と、水素供給部と、前記各供給部から水と水素の供給を受けて水素混入水を吐出する気液混合ポンプと、気液混合ポンプから吐出される水素混入水が攪拌される攪拌部と、攪拌部からの水素混入水が所定の滞流をなして溶存水素以外の水素を放出させる放気安定槽とを含んで構成されることを特徴とする水素水の連続製造装置。   A water supply unit, a hydrogen supply unit, a gas-liquid mixing pump that receives supply of water and hydrogen from each of the supply units and discharges hydrogen-containing water, and hydrogen-containing water discharged from the gas-liquid mixing pump are stirred. An apparatus for continuously producing hydrogen water, comprising: an agitation unit; and an air destabilization tank in which hydrogen-mixed water from the agitation unit forms a predetermined stagnant flow to release hydrogen other than dissolved hydrogen. 水供給部に加熱部を設け、所望の温度の水素水を製出する請求項3記載の水素水の連続製造装置。   The continuous production apparatus for hydrogen water according to claim 3, wherein a heating unit is provided in the water supply unit to produce hydrogen water at a desired temperature. 攪拌部を、水素混入水が衝突して攪拌される固定攪拌羽根を備え請求項3又は4記載の水素水の連続製造装置。   The continuous production apparatus for hydrogen water according to claim 3 or 4, wherein the agitation unit includes a fixed agitation blade that is agitated by the collision of the hydrogen-mixed water. 気液混合ポンプと、攪拌部と、放気安定槽からなる水素混入水の製造装置及びそれらを接続する流路範囲を、適宜な収納室内に配置し、前記収納室に室内空気の排出機構を設けると共に、排出機構の排出路又は収納室内に水素センサを設け、水素供給部と気液混合ポンプの間を接続する水素ガス供給路に設けた開閉弁機構を、水素センサの検知に基づいて動作制御してなる請求項3乃至5記載の何れかの水素水の製造装置。   An apparatus for producing hydrogen-mixed water consisting of a gas-liquid mixing pump, a stirring section, and an air discharge stabilization tank, and a flow path range connecting them are arranged in an appropriate storage room, and an indoor air discharge mechanism is provided in the storage room. In addition, a hydrogen sensor is provided in the discharge path of the discharge mechanism or in the storage chamber, and the open / close valve mechanism provided in the hydrogen gas supply path that connects between the hydrogen supply unit and the gas-liquid mixing pump operates based on the detection of the hydrogen sensor. The apparatus for producing hydrogen water according to any one of claims 3 to 5, which is controlled. 排出機構を、水素センサの検知に基づいて動作制御してなる請求項6記載の水素水の製造装置。   The apparatus for producing hydrogen water according to claim 6, wherein the operation of the discharge mechanism is controlled based on detection by a hydrogen sensor. 浴湯供給部と、水素供給部と、前記各供給部から水と水素の供給を受けて水素混入水を吐出する気液混合ポンプと、気液混合ポンプから吐出される水素混入水が攪拌される攪拌部と、攪拌部からの水素混入水が所定の滞流をなして溶存水素以外の水素を放出させる放気安定槽と、放気安定槽から浴湯を受け入れる浴槽とを備えてなることを特徴とする水素水を使用した入浴装置。   The bath water supply unit, the hydrogen supply unit, the gas-liquid mixing pump that receives the supply of water and hydrogen from each of the supply units and discharges the hydrogen-containing water, and the hydrogen-containing water discharged from the gas-liquid mixing pump are stirred. A stirring part, a degassing stabilization tank in which hydrogen-mixed water from the stirring part forms a predetermined stagnation and releases hydrogen other than dissolved hydrogen, and a bathtub for receiving bath water from the degassing stabilization tank. A bathing device using hydrogen water. 水素水及び水素混入水が流れる各部を、適宜な収納室内に配置し、前記収納室に室内空気の排出機構を設けると共に、排出機構の排出路又は収納室内に水素センサを設け、水素供給部と気液混合ポンプの間を接続する水素ガス供給路に設けた開閉弁機構を、水素センサの検知に基づいて動作制御してなる請求項8記載の水素水を使用した入浴装置。   Each part through which hydrogen water and hydrogen-mixed water flow is arranged in an appropriate storage room, and a room air discharge mechanism is provided in the storage room, a hydrogen sensor is provided in the discharge path of the discharge mechanism or the storage room, and a hydrogen supply unit; 9. The bathing apparatus using hydrogen water according to claim 8, wherein the on-off valve mechanism provided in the hydrogen gas supply path connecting the gas-liquid mixing pumps is controlled based on detection by a hydrogen sensor. 排出機構を、水素センサの検知に基づいて動作制御してなる請求項9記載の水素水を使用した入浴装置。   The bathing apparatus using hydrogen water according to claim 9, wherein the operation of the discharge mechanism is controlled based on detection by a hydrogen sensor. 浴湯供給部と、水素供給部と、前記各供給部から水と水素の供給を受けて水素混入水を吐出する気液混合ポンプと、気液混合ポンプから吐出される水素混入水が攪拌される攪拌部と、攪拌部からの水素混入水が所定の滞流をなして溶存水素以外の水素を放出させる放気安定槽と、放気安定槽から浴湯を受け入れる浴槽と、前記浴槽を内置した浴室とを備え、前記浴室に所定の排出換気機構を設けると共に、浴室内の適宜位置又は排出換気機構の排出路に浴室内水素センサを設け、前記浴室内水素センサの検知値に基づいて、排出換気機構又は放気安定槽から浴槽に浴湯を供給する供給路に設けた遮断弁機構の何れか一方或いは双方の動作を制御してなることを特徴とする水素水を使用した浴室装置。   The bath water supply unit, the hydrogen supply unit, the gas-liquid mixing pump that receives the supply of water and hydrogen from each of the supply units and discharges the hydrogen-containing water, and the hydrogen-containing water discharged from the gas-liquid mixing pump are stirred. An agitation part, a destabilization tank in which hydrogen-mixed water from the agitation part forms a predetermined stagnation and releases hydrogen other than dissolved hydrogen, a bathtub for receiving bath water from the deaeration stabilizer, and the bathtub And a predetermined exhaust ventilation mechanism in the bathroom, a hydrogen sensor in the bathroom at an appropriate position in the bathroom or a discharge path of the exhaust ventilation mechanism, based on the detection value of the hydrogen sensor in the bathroom, A bathroom apparatus using hydrogen water, characterized by controlling the operation of either or both of a shutoff valve mechanism provided in a supply path for supplying hot water to a bathtub from a discharge ventilation mechanism or a discharge stabilization tank. 浴室以外における水素水及び水素混入水が流れる各部を、適宜な収納室内に配置し、前記収納室に室内空気の排出機構を設けると共に、排出機構の排出路又は収納室内に水素センサを設け、水素供給部と気液混合ポンプの間を接続する水素ガス供給路に設けた開閉弁機構を、水素センサの検知に基づいて動作制御してなる請求項11記載の水素水を使用した浴室装置。   Each part where hydrogen water and hydrogen-mixed water flow outside the bathroom is placed in an appropriate storage room, and an indoor air discharge mechanism is provided in the storage room, and a hydrogen sensor is provided in the discharge path of the discharge mechanism or in the storage room. 12. The bathroom apparatus using hydrogen water according to claim 11, wherein the on-off valve mechanism provided in the hydrogen gas supply path connecting between the supply unit and the gas-liquid mixing pump is controlled based on detection by a hydrogen sensor. 排出機構を、水素センサの検知に基づいて動作制御してなる請求項12記載の水素水を使用した入浴装置。   The bathing apparatus using hydrogen water according to claim 12, wherein the operation of the discharge mechanism is controlled based on detection by a hydrogen sensor.
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