JP2007526777A - Method of manufacturing intraosseous implant or medical prosthesis by ion implantation, and intraosseous implant or medical prosthesis manufactured thereby - Google Patents

Abstract

The present invention relates to a method for producing a medical prosthesis or implant having a fine surface irregularity and / or an oxide layer, the method comprising an intraosseous implant or prosthesis prepared from a metal, a metal alloy or a biocompatible composite material. A process step of implanting a specific amount of ions such as CO, C, H, N, or O; This surface treatment changes surface properties such as nano-level roughness, hydrophilicity, chemical composition, etc. of the intraosseous implant or prosthesis and significantly improves integration with the bone.

Description

  The method of the present invention can be used to obtain ion-implanted intraosseous implants or medical prostheses to achieve superior bone integration characteristics.

  It is an object of the present invention to implant a ion in a shorter time and form a fine unevenness (or roughness) or an oxidized portion in a portion in contact with the bone, thereby reducing the cost of a prosthesis having improved bone integration characteristics. Is to provide a way to get in.

  Another object of the present invention is to provide an implant having excellent bone integration characteristics obtained by the method of the present invention.

  In daily clinical practice, there is an increasing demand for long-term prosthetic treatments (implants or prostheses such as knees, hips, maxillofacial and cranium). As a result, metal materials (subcutaneous or intraosseous implants) have been used in many cases, especially patients who have undergone major surgery, maxillofacial surgery, osteoporosis patients, osteoproliferative patients. Has been used prominently. However, substitution with these prosthetic treatment instruments often results in significant defects, and in some cases the defect rate exceeds 30%, and sometimes this technique cannot be used again.

  The most common complications include infectious complications (rare complications such as implant infection, bacteremia, sepsis, and gangrene), inflammatory complications (response to foreign bodies, local inflammation, complete rejection), tissues Poor integration (gingivitis, synovial metalosis, bone resorption) and defects resulting from manipulation and use (bone damage, poor metallic tissue interface) are described in the medical literature.

  These complications usually occur in relation to biocompatibility, but biocompatible metals have excellent biocompatibility and chemical stability and are therefore suitable for contact with tissues and body fluids. It is used as the most important and diverse material in applications. Another important characteristic of biocompatible metals is that they can be produced by a wide variety of methods.

  However, although this type of alloy has been developed in recent years, complications have not been reduced as much as expected, and experimental approaches to improve their biocompatibility are based on bioactive molecules (antibiotics, antiseptics). The method is limited to a technique for slightly increasing the permeability or surface impregnation to the agent and the aggregation inhibitor.

  Accordingly, there is a need for the development of medical materials that can solve some or all of the above complications, and such materials may shorten the patient's treatment period.

  The solution to the above problem is only an early stage, and once these are solved, the problem remains that patients who have been diagnosed with a need for a prosthesis or implant have a long treatment period. Most of this long treatment period is the time required for the implant or prosthesis to integrate with the surrounding bone tissue, in other words, the time required to achieve good bone integration. Usually, bone integration and fixation of implants and prostheses are achieved only months after surgery.

In this connection, the following two challenges are encountered in the integration of implants and prostheses with the bone.
-Acceleration of bone integration (improving the percentage of the surface area of the implant or prosthesis that contacts the surrounding bone)
・ Improvement of bone integration in low bone density region

  One way to approach the problem of prosthesis or implant integration with bone is to treat them with surface treatments to give them the appropriate surface properties.

  This is the case of an ion implantation process, where a series of appropriately selected ions are introduced and modified on the surface of the prosthesis or implant to achieve the desired properties without changing structural or dimensional tolerances after processing. Get.

  Various ion implantation methods have been used for many years in various applications to change the surface properties of the components. For example, in the electronics field it is used to change the electrical properties of semiconductors. It is also used in the metal mechanics industry to improve resistance to wear and corrosion of molds, injection mouthpieces, machining and cutting tools, gauges and the like.

  Ion implantation is also used in the field of biomaterials. For example, injection of a bactericidal element into a medical facility described in US Pat. No. 5,492,763, and an implant for improving surface hardness and reducing friction described in European Patent No. 0,526,581 As an example, an injection of a cobalt-chromium alloy is used. Patents that improve the tribological properties of metal materials are also known. For example, in the pamphlet of International Publication No. 91/16013, wear resistance is improved, and friction resistance is obtained by reducing friction. U.S. Pat. No. 4,568,396 reduces wear and improves resistance to fretting fatigue, while British Patent No. 2154450 has been successfully cured.

  Furthermore, the ion implantation method is also used for polymer materials. For example, British Patent No. 2286347 and International Publication No. 01/49339 pamphlet have improved wear characteristics and compatibility by ion implantation. U.S. Pat. No. 8,806,890 describes wear and friction coefficient reduction, and U.S. Pat. No. 5,133,757 injects into the surface of prosthesis components and implants that function in conjunction with each other. In US Pat. No. 6,217,615 and US Pat. No. 6,051,751, adhesion of the bonding agent in the prosthesis is improved. In US Pat. No. 4,693,760, an ion implantation process prevents discoloration of the orthopedic implant.

  The ion implantation method is also used for the problem of integration with the bone. In this case, a hydroxyapatite-coated surface that is also used in various other processes is formed by ion implantation. One example is a method for producing a synthetic implant coated with synthetic bone as described in Spanish Patent 2,006,658, in which a high-energy xenon beam is used, by sputtering or cathodic spraying. Coat the implant with hydroxyapatite. German Patent Application No. 1980530 describes the production of a titanium surface coated with calcium phosphate by ion implantation. In this last example, phosphorus and calcium are injected followed by a heat treatment.

  The present applicant is the right holder of WO 02/083777, which includes at least one element selected from C, O, H, Xe, Ar, He, Kr, and Ne, and / or them. A method for producing an intraosseous implant or prosthesis from a substrate that has been subjected to ion implantation surface treatment using a compound comprising one or more of the following is described, wherein the implant is integrated with the bone and contacts the implant The leaching of ions into the physiological medium and / or the tribological properties are improved.

US Pat. No. 5,492,763 European Patent No. 0,526,581 International Publication No. 91/16013 Pamphlet US Pat. No. 4,568,396 British Patent No. 2154450 British Patent No. 2286347 International Publication No. 01/49339 Pamphlet French Patent No. 8806890 Specification US Pat. No. 5,133,757 US Pat. No. 6,217,615 US Pat. No. 6,051,751 US Pat. No. 4,693,760 Spanish Patent No. 2,006,658 German Patent Application No. 19830530 International Publication No. 02/083977 Pamphlet

  The object of the present invention is to solve the above-mentioned problems, in particular to obtain an intraosseous implant and prosthesis which have been surface-treated by ion implantation and have improved integration characteristics with bone.

  The present invention provides a bone structure by forming a fine wrinkle and / or oxide layer at least in a portion in contact with bone, and further ion-implanting the surface of the portion with an appropriate amount of a specific element and / or compound. The present invention relates to a method for obtaining an implant or a medical prosthesis exhibiting excellent integration characteristics with bone.

The method of the present invention includes the following steps.
(A) The process of processing an intraosseous implant or a medical prosthesis from a metal alloy or a metal matrix composite material.
(B) A step of forming fine irregularities (roughness) on at least a surface of the intraosseous implant or medical prosthesis that contacts the bone.
(C) forming or growing an oxide layer on at least the bone contacting surface of the intraosseous implant or medical prosthesis.
(D) A compound containing at least one of C ions, O ions, H ions, N ions, and CO ions and / or one or more of these ions on at least a bone contacting surface of an intraosseous implant or medical prosthesis. The process of ion-implanting processing using.

  Steps (b) and (c) may be performed arbitrarily, and the above method may be performed using steps (a), (b) and (d), steps (a), (c) and (d), or step (a), (B), (c) and (d) may be included, and these steps may be performed in a different order than described herein depending on the required properties of the implant.

  In particular, the resulting intraosseous implant and / or medical prosthesis exhibits improved integration characteristics with bone and / or reduced leaching of ions into the physiological medium.

  Furthermore, in the method of the present invention, the ion implantation treatment time for capturing fine irregularities (roughness) on the surface and / or the oxide layer is shortened, and the treatment can be performed at low cost.

The present invention relates to an intraosseous bone produced from a substrate having a fine unevenness (or roughness) and / or a grown oxide layer on at least a surface in contact with bone tissue, and further having an ion implantation treatment surface on at least the surface. With respect to an implant or medical prosthesis, this ion implantation process uses at least one ion selected from C, O, H, N, and CO ions and / or a compound containing one or more of these ions; Ion beam energy of 2 keV to 1 MeV is applied, and ions of 10 ¹⁵ ions / cm ² or more are implanted in a vacuum chamber under a pressure higher than 1 mbar.

The present invention also relates to a method comprising the following steps, which results in an implant and a medical prosthesis having improved bone integration characteristics.
(A) The process of processing an intraosseous implant or a medical prosthesis from a metal alloy or a metal matrix composite material.
(B) A step of forming fine irregularities (or roughness) on at least the surface of the implant that comes into contact with the bone tissue.
(C) growing an oxide layer on at least the surface of the implant in contact with the bone tissue.
(D) Using at least one ion selected from C, O, H, N, and CO ions and / or a compound containing one or more of these ions in an intraosseous implant or medical prosthesis in a vacuum chamber. A step of performing ion implantation under conditions of an applied ion beam energy of 0.2 keV to 1 MeV, a pressure of over 1 mbar, and an implanted ion amount of 10 ¹⁵ ions / cm ² or more.

  This method includes the above steps, and includes at least a step of forming fine irregularities (or roughness) or a step of growing an oxide layer, and an ion implantation treatment step, and the steps may be performed in any order.

  More specifically, the method may include all of the above steps (a), (b), (c) and (d), or only steps (a), (b) and (d), or Only steps (a), (c) and (d) may be included.

  Furthermore, these steps can be performed in a different order from the above, for example, in the order of (a), (b), (c), (d), (a), (c), (b), (d) Order, (a), (b), (d), (c), (a), (d), (c), (b), (a), (d), (b), You may carry out in the order of (c) or (a), (c), (d), (b).

  As used herein, the term intraosseous implant or medical prosthesis encompasses any intraosseous implant or prosthesis intended to come into contact with biological tissue, cells, or body fluids or biological fluids.

  As the substrate, any metal, metal alloy, biocompatible material, and mixtures and composites thereof can be used to produce intraosseous implants and / or medical prostheses, such as the UNE-EN ISO 10993 standard. The material which satisfy | fills is mentioned. In one particular embodiment, the substrate is made of titanium, an alloy of titanium such as Ti-6Al-4V, aluminum, and vanadium, an alloy of chromium and cobalt (Cr—Co), an alloy of cobalt, chromium and molybdenum (Co— Cr-Mo), stainless steel such as AISI 316, and the like.

  In the method of the present invention, the fine unevenness (or roughness) is formed at least on the surface in contact with the bone by fine shot peening or shot blasting, and the Ra value of the unevenness (or roughness) is 0.5 to 10 μm. .

  The oxide layer introduced at least on the surface in contact with the bone is formed by chemical corrosion, anodization, heat treatment, or acid corrosion, by temperature or chemical transformation (chemical conversion), and this layer is typically 15 nanometers. It has a thickness exceeding meter.

  The method of the present invention includes the step of implanting at least one of C ions, O ions, H ions, N ions, and CO ions, and / or a compound ion containing one or more of these ions. Ions, CONn ions, CxHy ions, and the like (where n is an integer of 1 to 3, and x and y are integers of 1 to 100).

  The process according to the invention is preferably carried out in a vacuum chamber under a vacuum of at least 1 mbar.

In the method of the present invention, ion implantation can be optionally performed in a vacuum chamber in a residual atmosphere. This residual atmosphere may include oxygen and residual organic compounds (eg, those created by evaporation of organic compounds during an ion implantation step within the processing chamber). The amount of ions implanted may vary over a wide range depending on the nature of the ions, in view of the purpose of imparting the necessary properties to the intraosseous implant or medical prosthesis to significantly improve the integration properties with the bone. In general, the amount of implanted ions is greater than 10 ¹⁵ ions / cm ² .

  In the method of the present invention, the ion implantation step can be performed in a wide temperature range, for example, −120 ° C. to 800 ° C., preferably at ambient temperature to 250 ° C. In certain embodiments, the ion implantation step in the method of the present invention can be performed at a temperature of 250 ° C. to 800 ° C. for the purpose of promoting the diffusion, precipitation, or conversion mechanism of the compound. In other embodiments, heat treatment of the intraosseous implant or prosthesis at a temperature between 250 ° C. and 800 ° C. when the ion implantation process is complete facilitates this similar diffusion, precipitation, or transformation mechanism.

  Ion implantation treatment into an intraosseous implant or medical prosthesis according to the method of the present invention can be performed using sight ion implantation or plasma immersion ion implantation techniques or other equivalent ion irradiation techniques. .

  A nano-textured surface can be formed on the surface of fine irregularities (or roughness) by ion implantation treatment according to the method of the present invention (when this nano-textured surface is mirror-polished in advance, the Ra value of the surface is about 3 to 6 nm) This allows more anchor points to be supplied to the cells, thus improving the integration characteristics with the bone.

  In the method of the present invention, a carbon-rich surface is formed, and the carbon composition ratio exceeds 20% on average in the range where the depth of the oxide layer is at least 20 nanometers or less.

  The carbon-rich surface includes graphite bonds, carbon-rich titanium carbide, titanium carbide, or CO bonds.

  More specifically, in the carbon-rich surface, the content of graphite bonds exceeds 10% in a range of at least 10 nanometers in depth.

  According to the method of the present invention, an intraosseous implant or medical prosthesis, such as an artificial tooth root, a hip or knee prosthesis, is obtained, and its integration characteristics with bone are improved and / or the implant and / or prosthesis. Leaching of ions into the physiological medium in contact with the

  Hereinafter, examples of implants according to the object of the present invention will be described.

[Example 1]
CO ⁺ ions are implanted into a titanium artificial tooth root having a titanium oxide layer of about 50 nm.

In this example, the surface treatment of CO ⁺ ion implantation of an artificial tooth root made of titanium will be described.

  This corresponds to a Ti6Al4V alloy screw having a titanium oxide layer of about 50 nm.

  A plurality of artificial tooth roots were anodized to form a titanium oxide layer of about 50 nanometers.

Thereafter, the artificial tooth root was continuously washed in an ultrasonic bath of acetone and ethanol for a minimum of 5 minutes. They were then all introduced into the vacuum chamber. During the entire ion implantation process, the degree of vacuum was always kept above 5.10 ⁻⁷ mbar.

In the ion implantation process, a 1090 series ion implanter (Ion Implanter) manufactured by Danfysik AS was used. The conditions for implanting CO ⁺ ions into the artificial tooth root were an energy of 30 keV and an implantation amount of 6.10 ¹⁷ ions / cm ² . The treatment was applied to the cylindrical side surface and the screw end surface of the artificial root. The temperature of the artificial tooth root was always less than 170 ° C.

  FIG. 3 shows a simplified concept of a typical artificial root manufacturing process.

  FIG. 4 shows the chemical composition of the surface obtained, and the carbon composition ratio greatly exceeds 50% in several places. This composition was analyzed using an XPS (X-ray Photoelectron Spectroscopy) technique.

  The resulting chemical composition directly corresponds to the chemical composition of the sample that was not anodized and was ion implanted for a longer time. These treatments likewise relate to excellent bone integration properties such as those described in the international patent application PCT ES02 / 00178.

[Example 2]
C ⁺ ion implantation is performed on a titanium artificial tooth root having a titanium oxide layer of about 50 nm on fine irregularities (or roughness) having an Ra value of about 2 μm.

In this example, the surface treatment of CO ⁺ ion implantation of an artificial tooth root made of titanium will be described.

  This corresponds to a Ti6Al4V alloy screw having a titanium oxide layer of about 50 nm on fine irregularities (or roughness) having an Ra value of about 2 μm.

A plurality of artificial tooth roots were subjected to fine shot peening treatment to form ridges (or irregularities) with an Ra value of 2 μm on the surface, and then anodized to form a titanium oxide layer of about 50 nanometers. Thereafter, the artificial tooth root was continuously washed in an ultrasonic bath of acetone and ethanol for a minimum of 5 minutes. They were then all introduced into the vacuum chamber. During the entire ion implantation process, the degree of vacuum was always kept above 5.10 ⁻⁷ mbar.

In the ion implantation process, a 1090 series ion implanter (Ion Implanter) manufactured by Danfysik AS was used. The conditions for implanting CO ⁺ ions into the artificial tooth root were energy 20 keV and implantation amount 6.10 ¹⁷ ions / cm ² . The treatment was applied to the cylindrical side surface and the screw end surface of the artificial root.

  The temperature of the artificial tooth root was always less than 170 ° C.

  FIG. 3 shows a simplified concept of a typical artificial root manufacturing process.

It is a simplified diagram showing an ion implantation process, where ions are accelerated by application of a high electromagnetic field, collide with the material surface, penetrate into the material, and in this process the surface dimensions of the implant material do not change at all, but the physicochemical It is a figure which shows that a local characteristic changes. FIG. 4 shows details of one embodiment, where the ion beam impinges directly on the artificial tooth root, and at the same time the artificial tooth root rotates, the ion beam impacts the member from different directions, so that the entire surface of the implant is ion implanted. It is a figure explaining what is processed. It is a simplified diagram showing a manufacturing process of a typical artificial tooth root. In the method of this invention, it is a figure which shows the result of having analyzed the surface composition of the titanium alloy Ti6Al4V by XPS (X-ray Photoelectron Spectroscopy) after anodization and ion implantation.

Claims (44)

A method for producing an intraosseous implant or medical prosthesis by ion implantation, comprising: (a) processing the intraosseous implant or medical prosthesis from a metal alloy or metal matrix composite; and (b) the intraosseous implant. Alternatively, ion implantation using at least one of C ions, O ions, H ions, N ions, and CO ions, and / or a compound containing one or more of these ions, on at least a surface of the medical prosthesis that contacts the bone. And a process of processing,
(C) forming fine irregularities on at least a surface of the intraosseous implant or medical prosthesis in contact with the bone; and (d) oxidizing at least a surface of the intraosseous implant or medical prosthesis in contact with the bone. Including at least one of forming or growing a material layer;
The manufacturing method characterized in that the steps (b), (c) and (d) can be performed in any order depending on the characteristics of the implant and the subsequent steps.   The method for producing an intraosseous implant or medical prosthesis by ion implantation according to claim 1, comprising the steps (a), (b) and (c).   The method for producing an intraosseous implant or medical prosthesis by ion implantation according to claim 1, comprising the steps (a), (b) and (d).   The method for producing an intraosseous implant or medical prosthesis by ion implantation according to claim 1, comprising the steps (a), (b), (c) and (d).   5. The intraosseous implant or medical treatment by ion implantation according to claim 1, wherein the fine irregularities are formed on at least a surface in contact with the bone by fine shot peening or shot blasting. Prosthesis manufacturing method.   The typical Ra value of the fine irregularities is 0.5 to 10 µm, manufacturing an intraosseous implant or medical prosthesis by ion implantation according to any one of claims 1, 2, 4 Method.   5. The oxide layer according to claim 1, wherein the oxide layer is introduced into at least the surface in contact with the bone by temperature or chemical conversion by chemical corrosion, anodization, heat treatment, or acid corrosion. A method for producing an intraosseous implant or medical prosthesis by ion implantation as described in the item.   The method for producing an intraosseous implant or medical prosthesis by ion implantation according to any one of claims 1, 3, and 4, wherein the oxide layer has a thickness exceeding 15 nanometers.   A carbon-rich surface is formed by performing ion implantation on at least the surface in contact with the bone, and the composition ratio of carbon exceeds 20% on average in the range of at least a depth of 20 nanometers or less of the surface oxide layer. The method for producing an intraosseous implant or medical prosthesis by ion implantation according to any one of claims 1, 2, 3, and 4.   The carbon-rich surface is formed by performing the ion implantation treatment on at least the surface in contact with the bone, and the carbon-rich surface includes graphite bonds, carbon-rich titanium carbide, and titanium carbide. A method for producing an intraosseous implant or medical prosthesis by ion implantation according to any one of claims 1, 3 and 4.   The carbon-rich surface is formed by performing the ion implantation treatment on at least a surface in contact with the bone, and the carbon-rich surface includes graphite bonds, carbon-rich titanium carbide, titanium carbide, and CO bonds. The manufacturing method of the intraosseous implant or medical prosthesis by the ion implantation of any one of 1, 2, 3, 4.   A carbon-rich surface is formed by performing ion implantation on at least the surface in contact with the bone, and the content of graphite bonds exceeds 10% in a range of at least 10 nanometers in depth of the carbon-rich surface. A method for producing an intraosseous implant or medical prosthesis by ion implantation according to any one of claims 1, 2, 3, and 4.   3. The implant obtained in step (a) is prepared from titanium, titanium alloy, cobalt-chromium alloy, stainless steel, or a metal matrix composite comprising any of these alloys. A method for producing an intraosseous implant or medical prosthesis by ion implantation according to any one of claims 1, 3 and 4.   The bone implant or medical prosthesis by ion implantation according to any one of claims 1, 2, 3, and 4, wherein a nanotextured surface is formed by the ion implantation treatment in the step (b). Manufacturing method.   The method for producing an intraosseous implant or medical prosthesis by ion implantation according to claim 14, wherein when the nanotextured surface is mirror-polished, the Ra value of the irregularities on the surface is about 3 to 6 nm.   The ion implantation according to any one of claims 1, 2, 3, and 4, wherein the ion implantation treatment in the step (b) forms a surface that is more hydrophilic than the first surface. For producing an intraosseous implant or a medical prosthesis. The ion implantation treatment in the step (b) is performed in an atmosphere of residual oxygen, CO ₂ , or an organic compound in a treatment chamber. A method for producing an intraosseous implant or medical prosthesis by ion implantation according to claim 1.   5. The bone by ion implantation according to claim 1, wherein the ion implantation treatment of the step (b) is performed while evaporating an organic compound in a treatment chamber. A method for producing an internal implant or a medical prosthesis.   The ion implantation process in the step (b) is performed using “line-of-sight ion implantation” or “beam ion implantation”, “plasma immersion ion implantation” or “plasma source ion implantation”, or an ion irradiation technique. A method for producing an intraosseous implant or medical prosthesis by ion implantation according to any one of claims 1, 2, 3, and 4. The ion implantation treatment of the step (b) is performed in a treatment chamber under conditions of energy 200 eV to 500 keV, a degree of vacuum exceeding 1 millibar, and an implantation amount of 10 ¹⁵ ions / cm ² or more. Item 5. A method for producing an intraosseous implant or medical prosthesis by ion implantation according to any one of Items 1, 2, 3, and 4.   5. The intraosseous implant by ion implantation according to claim 1, wherein the ion implantation treatment of the step (b) is performed at a temperature of −120 ° C. to 800 ° C. 6. Or the manufacturing method of a medical prosthesis.   The bone by ion implantation according to any one of claims 1, 2, 3, and 4, wherein after the ion implantation treatment in the step (b), heat treatment is performed at a temperature of about 250 ° C to 800 ° C. A method for producing an internal implant or a medical prosthesis.   (A) a base material prepared from a metal alloy or a metal matrix composite material; and (b) at least one of C ions, O ions, H ions, N ions, and CO ions that are ion-implanted into a surface that contacts at least bone. And / or a compound containing one or more of these ions, (c) at least fine irregularities formed on the surface in contact with the bone, and (d) an oxide introduced on at least the surface in contact with the bone An intraosseous implant or medical prosthesis characterized in that it comprises a layer.   (A) a base material prepared from a metal alloy or a metal matrix composite material; and (b) at least one of C ions, O ions, H ions, N ions, and CO ions that are ion-implanted into a surface that contacts at least bone. And / or a compound containing one or more of these ions, and (c) at least fine irregularities formed on the surface in contact with the bone, or an intraosseous implant or medical prosthesis.   (A) a base material prepared from a metal alloy or a metal matrix composite material; and (b) at least one of C ions, O ions, H ions, N ions, and CO ions that are ion-implanted into a surface that contacts at least bone. And / or a compound containing one or more of these ions, and (c) an intraosseous implant or medical prosthesis, characterized in that it comprises at least an oxide layer introduced on the surface in contact with the bone.   26. Intraosseous bone according to any one of claims 23, 24 and 25, wherein the implant or prosthesis is an artificial dental root or a prosthesis for the hip, knee, shoulder, elbow, wrist, finger or spine. Implant or medical prosthesis.   25. The intraosseous implant or medical prosthesis according to claim 23 or 24, wherein at least the fine irregularities on the surface in contact with the bone are formed by fine shot peening or shot blasting.   25. The intra-osseous implant or medical prosthesis according to claim 23 or 24, wherein a typical Ra value of the fine irregularities is 0.5 to 10 m.   24. The oxide layer introduced into at least the surface in contact with the bone is formed by temperature or chemical conversion by chemical corrosion, anodization, heat treatment, or acid corrosion. Or an intraosseous implant or medical prosthesis according to claim 25;   30. The intraosseous implant or medical prosthesis according to claim 29, wherein the thickness of the oxide layer exceeds 15 nanometers.   A carbon-rich surface is formed by implanting the ions into at least the surface in contact with the bone, and the average composition ratio of carbon is 20% in the range where the depth of the oxide layer is 20 nanometers or less on the surface. The intraosseous implant or medical prosthesis according to any one of claims 23, 24, 25, characterized in that   24. A carbon-rich surface is formed by implanting the ions into at least a surface in contact with the bone, and the carbon-rich surface includes graphite bonds, carbon-rich titanium carbide, and titanium carbide. Intraosseous implant or medical prosthesis according to any one of.   A carbon-rich surface is formed by implanting the ions into at least a surface in contact with the bone, and the carbon-rich surface includes graphite bonds, carbon-rich titanium carbide, titanium carbide, and CO bonds. The intraosseous implant or medical prosthesis according to any one of claims 23, 24, 25.   A carbon-rich surface is formed by implanting the ions into at least the surface in contact with the bone, and the content of graphite bonds exceeds 10% in a range of at least 10 nanometers in depth of the carbon-rich surface. 26. The intraosseous implant or medical prosthesis according to any one of claims 23, 24, 25.   26. Any one of claims 23, 24 and 25, wherein the substrate is prepared from titanium, titanium alloy, cobalt-chromium alloy, stainless steel, or a metal matrix composite comprising any of these alloys. The intraosseous implant or medical prosthesis according to Item.   The intraosseous implant or medical prosthesis according to any one of claims 23, 24, 25, characterized in that it has a nanotextured surface.   37. The intraosseous implant or medical prosthesis according to claim 36, wherein when the nanotextured surface is mirror-polished, the Ra value of the surface is about 3 to 6 nm.   26. The intraosseous implant or medical prosthesis according to any one of claims 23, 24, and 25, which is more hydrophilic than the substrate. The ions in the processing chamber, oxygen, CO _2, or osseous implant or medical according to any one of claims 23, 24, 25, characterized in that it is injected under the residual atmosphere of an organic compound Prosthesis.   26. The intraosseous implant or medical prosthesis according to any one of claims 23, 24 and 25, wherein the ions are implanted in a processing chamber while evaporating the organic compound.   The ion is implanted using a technique of “line-of-sight ion implantation” or “beam ion implantation”, “plasma immersion ion implantation” or “plasma source ion implantation”, or ion irradiation. The intraosseous implant or medical prosthesis according to any one of 24 and 25. 26. The ions are implanted in a processing chamber under conditions of an energy of 200 eV to 1000 keV, a high vacuum exceeding 1 mbar, and an implantation amount of 10 ¹⁵ ions / cm ² or more. The intraosseous implant or medical prosthesis according to any one of the above.   The intraosseous implant or medical prosthesis according to any one of claims 23, 24, and 25, wherein a temperature of -120 ° C to 800 ° C is applied after the ion implantation.   The intraosseous implant or medical prosthesis according to any one of claims 23, 24, and 25, wherein the implant is heat-treated at a temperature of about 250C to 800C after the ion implantation.

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