JP2007332262A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2007332262A5 JP2007332262A5 JP2006165384A JP2006165384A JP2007332262A5 JP 2007332262 A5 JP2007332262 A5 JP 2007332262A5 JP 2006165384 A JP2006165384 A JP 2006165384A JP 2006165384 A JP2006165384 A JP 2006165384A JP 2007332262 A5 JP2007332262 A5 JP 2007332262A5
- Authority
- JP
- Japan
- Prior art keywords
- formula
- group
- organic
- different
- same
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Claims (4)
ＲｎＳｉＸ４−ｎ・・・（Ｉ）
（式中、Ｒは、式中のＳｉに炭素原子が直接結合するような有機基を表し、Ｘは、水酸基又は加水分解性基を表す。ｎは１又は２を表し、ｎが２のとき、Ｒは同一であっても異なっていてもよく、（４−ｎ）が２以上のとき、Ｘは同一であっても異なっていてもよい。）で表される有機ケイ素化合物の縮合物を主成分とし、金属キレート化合物、金属有機酸塩化合物、２以上の水酸基若しくは加水分解性基を有する金属化合物、それらの加水分解物、及びそれらの縮合物からなる群より選ばれる少なくとも１種の３５０ｎｍ以下の波長の光に感応する光感応性化合物、及び／又はそれから誘導される化合物を含有する有機無機複合体であって、
さらに、機能性物質を含有することを特徴とする有機無機複合体。 Formula (I)
R n SiX 4-n (I)
(In the formula, R represents an organic group in which a carbon atom is directly bonded to Si in the formula, X represents a hydroxyl group or a hydrolyzable group, n represents 1 or 2, and n is 2. , R may be the same or different, and when (4-n) is 2 or more, X may be the same or different.) At least one 350 nm selected from the group consisting of a metal chelate compound, a metal organic acid salt compound, a metal compound having two or more hydroxyl groups or hydrolyzable groups, a hydrolyzate thereof, and a condensate thereof as a main component An organic-inorganic composite containing a light-sensitive compound that is sensitive to light of the following wavelengths, and / or a compound derived therefrom:
Furthermore, the organic-inorganic composite characterized by containing a functional substance.
ＲｎＳｉＸ４−ｎ・・・（Ｉ）
（式中、Ｒは、式中のＳｉに炭素原子が直接結合するような有機基を表し、Ｘは、水酸基又は加水分解性基を表す。ｎは１又は２を表し、ｎが２のとき、Ｒは同一であっても異なっていてもよく、（４−ｎ）が２以上のとき、Ｘは同一であっても異なっていてもよい。）で表される有機ケイ素化合物の縮合物を主成分とし、機能性物質を含有する薄膜であって、
膜表面から深さ方向１０ｎｍにおける膜表面部の炭素含有量が、膜裏面から深さ方向１０ｎｍにおける膜裏面部の炭素含有量の８０％以下であることを特徴とするポリシロキサン系薄膜。 Formula (I)
R n SiX 4-n (I)
(In the formula, R represents an organic group in which a carbon atom is directly bonded to Si in the formula, X represents a hydroxyl group or a hydrolyzable group, n represents 1 or 2, and n is 2. , R may be the same or different, and when (4-n) is 2 or more, X may be the same or different.) A thin film containing a functional substance as a main component,
A polysiloxane-based thin film characterized in that the carbon content of the film surface portion in the depth direction of 10 nm from the film surface is 80% or less of the carbon content of the film back surface portion in the depth direction of 10 nm from the film back surface.
機能性物質を含有する式（Ｉ）
ＲｎＳｉＸ４−ｎ・・・（Ｉ）
（式中、Ｒは、式中のＳｉに炭素原子が直接結合するような有機基を表し、Ｘは、水酸基又は加水分解性基を表す。ｎは１又は２を表し、ｎが２のとき、Ｒは同一であっても異なっていてもよく、（４−ｎ）が２以上のとき、Ｘは同一であっても異なっていてもよい。）で表される有機ケイ素化合物及び／又はその縮合物に、３５０ｎｍ以下の波長の光を照射することを特徴とする有機無機複合体の製造方法。 At least one photosensitive compound selected from the group consisting of metal chelate compounds, metal organic acid salt compounds, metal compounds having two or more hydroxyl groups or hydrolyzable groups, hydrolysates thereof, and condensates thereof. In the presence,
Formula (I) containing a functional substance
R n SiX 4-n (I)
(In the formula, R represents an organic group in which a carbon atom is directly bonded to Si in the formula, X represents a hydroxyl group or a hydrolyzable group, n represents 1 or 2, and n is 2. , R may be the same or different, and when (4-n) is 2 or more, X may be the same or different.) A method for producing an organic-inorganic composite, wherein the condensate is irradiated with light having a wavelength of 350 nm or less.
ＲｎＳｉＸ４−ｎ・・・（Ｉ）
（式中、Ｒは、式中のＳｉに炭素原子が直接結合するような有機基を表し、Ｘは、水酸基又は加水分解性基を表す。ｎは１又は２を表し、ｎが２のとき、Ｒは同一であっても異なっていてもよく、（４−ｎ）が２以上のとき、Ｘは同一であっても異なっていてもよい。）で表される有機ケイ素化合物及び／又はその縮合物と、金属キレート化合物、金属有機酸塩化合物、２以上の水酸基若しくは加水分解性基を有する金属化合物、それらの加水分解物、及びそれらの縮合物からなる群より選ばれる少なくとも１種の光感応性化合物と、機能性物質とを含有することを特徴とする有機無機複合体形成用組成物。 Formula (I)
R n SiX 4-n (I)
(In the formula, R represents an organic group in which a carbon atom is directly bonded to Si in the formula, X represents a hydroxyl group or a hydrolyzable group, n represents 1 or 2, and n is 2. , R may be the same or different, and when (4-n) is 2 or more, X may be the same or different.) At least one light selected from the group consisting of condensates, metal chelate compounds, metal organic acid salt compounds, metal compounds having two or more hydroxyl groups or hydrolyzable groups, their hydrolysates, and their condensates An organic-inorganic composite-forming composition comprising a sensitive compound and a functional substance.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006165384A JP5377820B2 (en) | 2006-06-14 | 2006-06-14 | Organic-inorganic composite containing functional substances |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006165384A JP5377820B2 (en) | 2006-06-14 | 2006-06-14 | Organic-inorganic composite containing functional substances |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007332262A JP2007332262A (en) | 2007-12-27 |
| JP2007332262A5 true JP2007332262A5 (en) | 2009-02-26 |
| JP5377820B2 JP5377820B2 (en) | 2013-12-25 |
Family
ID=38932035
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006165384A Expired - Fee Related JP5377820B2 (en) | 2006-06-14 | 2006-06-14 | Organic-inorganic composite containing functional substances |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5377820B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9034489B2 (en) | 2009-07-03 | 2015-05-19 | 3M Innovative Properties Company | Hydrophilic coatings, articles, coating compositions and methods |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100036012A1 (en) * | 2006-05-12 | 2010-02-11 | Nobuo Kimura | Organic-inorganic composite body |
| JP2008115332A (en) * | 2006-11-07 | 2008-05-22 | Mitsubishi Chemicals Corp | Phosphor-containing composition, light-emitting device, lighting device, and image display device |
| CN102241899B (en) | 2010-05-11 | 2014-05-14 | 3M创新有限公司 | Coating composition, method for modifying matrix surface, and product |
| US8357553B2 (en) * | 2010-10-08 | 2013-01-22 | Guardian Industries Corp. | Light source with hybrid coating, device including light source with hybrid coating, and/or methods of making the same |
| JP5845676B2 (en) * | 2011-07-20 | 2016-01-20 | コニカミノルタ株式会社 | Method for producing gas barrier film |
| CN204488674U (en) | 2011-09-23 | 2015-07-22 | 法国圣戈班玻璃厂 | For the post cover plate of vehicle |
| TWI447136B (en) * | 2012-02-08 | 2014-08-01 | Nippon Soda Co | Organic and inorganic composite film |
| TW201400562A (en) | 2012-04-05 | 2014-01-01 | Daikin Ind Ltd | Process for producing article having fluorine-containing silane-based coating |
| WO2016181622A1 (en) * | 2015-05-12 | 2016-11-17 | 日本曹達株式会社 | Photocatalyst-containing coating liquid and photocatalyst-supporting structure |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07149520A (en) * | 1993-11-29 | 1995-06-13 | Hoya Corp | Coating composition |
| ES2265150T3 (en) * | 1995-03-20 | 2007-02-01 | Toto Ltd. | USE OF A MATERIAL THAT HAS AN ULTRAHYDROPHILE AND PHOTOCATALITICAL SURFACE. |
| JP3930591B2 (en) * | 1995-12-22 | 2007-06-13 | 東陶機器株式会社 | Photocatalytic hydrophilic coating composition, method for forming hydrophilic film and coated article |
| JP3831457B2 (en) * | 1996-08-23 | 2006-10-11 | 東陶機器株式会社 | Hydrophilic structure having photocatalytic activity |
-
2006
- 2006-06-14 JP JP2006165384A patent/JP5377820B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9034489B2 (en) | 2009-07-03 | 2015-05-19 | 3M Innovative Properties Company | Hydrophilic coatings, articles, coating compositions and methods |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2007332262A5 (en) | ||
| WO2008126804A1 (en) | Composition for forming under-resist film | |
| EP2413194A3 (en) | Pattern forming method | |
| JP2010519270A5 (en) | ||
| JP2009519993A5 (en) | ||
| ATE487162T1 (en) | NEW SULFONIUM COMPOUND, PHOTOSENSITIVE COMPOSITION CONTAINING SAME, AND STRUCTURE FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION | |
| EP1640804A3 (en) | Positive-tone radiation-sensitive resin composition | |
| TW200722922A (en) | Film-forming composition, and pattern forming method and three-dimensional mold using the same | |
| JP2008524374A5 (en) | Siloxane resin, method for preparing siloxane resin, and antireflection coating composition | |
| JP2006018249A5 (en) | ||
| JP2008150365A5 (en) | ||
| JP2006276598A5 (en) | ||
| ATE526321T1 (en) | NEW EPOXY COMPOUND, ALKALINE DEVELOPABLE RESIN COMPOSITION AND ALKALINE DEVELOPABLE LIGHT SENSITIVE RESIN COMPOSITION | |
| JP2014160199A5 (en) | ||
| WO2008107502A8 (en) | Composition for teating infectious diseases | |
| JP2005289914A5 (en) | ||
| WO2008117696A1 (en) | Double-layered film and pattern-forming method using the same, resin composition for forming lower layer of double-layered film, and positive radiation-sensitive resin composition for forming upper layer of double-layered film | |
| TWI456344B (en) | Composition, dry film, hardened material and printed circuit board | |
| JP2007091721A5 (en) | ||
| JP2009258585A5 (en) | ||
| JP2008116785A5 (en) | ||
| JP2008007610A5 (en) | ||
| JP2014527200A5 (en) | ||
| JP2010243518A5 (en) | ||
| JP2009032914A5 (en) |