JP2007329250A - Permanent magnet, and manufacturing method of permanent magnet - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a permanent magnet which is manufactured through such a manner that films of Dy and Tb are formed on the surface of a rare earth-iron-boron-based sintered magnet prescribed in shape, and that Dy and Tb are diffused into a crystalline grain boundary phase and has a coercive force much higher than usual. <P>SOLUTION: The manufacturing method of a permanent magnet comprises a film forming process of forming, at least, either a Dy film or a Tb film on the surface of a rare earth-iron-boron-based sintered magnet prescribed in shape; a high-temperature thermal treatment process of forming a diffusion layer which is prescribed in film thickness and contains, at least, either Dy or Tb by subjecting the sintered magnet to a thermal treatment carried out in a high-temperature range on the surface of the sintered magnet, and diffusing, at least, either Dy or Tb into the crystalline grain boundary phase of the sintered magnet; and a low-temperature thermal treatment process of subjecting the sintered magnet to a thermal treatment carried out in a low-temperature range, so as to remove a distortion from the sintered magnet. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a permanent magnet and a method for producing a permanent magnet, and in particular, a metal film composed of at least one of Dy and Tb is formed on the surface of an iron-boron-rare earth sintered magnet and heat-treated at a predetermined temperature. The present invention relates to a permanent magnet in which at least one of Dy and Tb is diffused into a grain boundary phase of a sintered magnet, and a method for manufacturing the permanent magnet.

  Nd-Fe-B based sintered magnets (so-called neodymium magnets) can be manufactured at low cost by being made of a combination of iron and Nd and B elements that are inexpensive and abundant in resources and can be stably supplied. At the same time, it has high magnetic properties (the maximum energy product is about 10 times that of ferrite magnets), so it is used in various products such as electronic equipment. In recent years, it has been increasingly used in motors and generators for hybrid cars. Yes. On the other hand, the Nd—Fe—B based sintered magnet has a Curie temperature as low as about 300 ° C., so depending on the product used, the temperature may rise above a predetermined temperature. When heated, there arises a problem of demagnetization due to heat.

  For this reason, when obtaining a sintered magnet of Nd—Fe—B system, it has a magnetic anisotropy of 4f electrons larger than Nd and has a negative Stevens factor similar to Nd, so that the crystalline magnetism of the main phase Although it is conceivable to add Dy or Tb that greatly improves the anisotropy, Dy and Tb have a ferrimagnetic structure in which the spin arrangement is opposite to Nd in the main phase crystal lattice, so that the magnetic field strength, There is a problem that the maximum energy product exhibiting magnetic characteristics is greatly reduced.

In order to solve such a problem, Dy and Tb are formed with a predetermined film thickness (a film thickness of 3 μm or more depending on the volume of the magnet) over the entire surface of the Nd—Fe—B sintered magnet. ), And then heat treatment at a predetermined temperature to diffuse the Dy and Tb formed on the surface to the grain boundary phase of the magnet so that they are uniformly distributed (non-patent) Reference 1).
Improvement of coercivity on thin Nd2Fe14B sintered permanent magnets / Park Ki, Tohoku University Doctoral Dissertation March 23, 2000)

In the permanent magnet manufactured by the above method, Dy and Tb diffused into the grain boundary phase enhances the crystal magnetic anisotropy of each crystal grain surface, thereby strengthening the mechanism of generating a new coercive force. In addition to dramatically improving the coercive force, the maximum energy product is hardly impaired (for example, residual magnetic flux density: 14.5 kG (1.45 T), maximum energy product: 50 MGOe (400 Kj / m ³ )). Non-patent document 1 reports that a magnet having a coercive force of 23 KOe (3 MA / m) can be produced.

  By the way, if the coercive force is further increased, for example, a permanent magnet having a strong magnetic force can be obtained even if the thickness of the permanent magnet is reduced. Therefore, in order to reduce the size, weight and power consumption of this kind of permanent magnet product itself, it is desirable to develop a permanent magnet having a larger coercive force and higher magnetic characteristics than the above-mentioned conventional technology. It is. In addition, since Dy and Tb, which are scarce in resources and cannot be stably supplied, are used, the film formation of Dy and Tb on the surface of the sintered magnet and the diffusion to the grain boundary phase are efficiently performed to improve productivity. There is a need.

  In view of the above, the first object of the present invention is to provide a permanent magnet having an extremely high coercive force and high magnetic properties. A second object of the present invention is to provide a method for producing a permanent magnet that can produce a permanent magnet having an extremely high coercive force and high magnetic properties at high productivity and at low cost.

  In order to solve the above-mentioned problem, the method of manufacturing a permanent magnet according to claim 1 is a film forming method in which at least one of Dy and Tb is formed on the surface of an iron-boron-rare earth sintered magnet having a predetermined shape. Forming a diffusion layer having a predetermined film thickness including at least one of Dy and Tb on the surface of the sintered magnet by performing a heat treatment in a high temperature region, and at least one of Dy and Tb in the grain boundary phase of the sintered magnet And a low temperature heat treatment step for removing the distortion of the sintered magnet by performing a heat treatment in a low temperature region.

  According to the first aspect of the present invention, at least one of Dy and Tb formed on the surface of the sintered magnet is applied not only to the surface of the sintered magnet but also to substantially the entire region of the grain boundary by performing heat treatment in a high temperature region. A permanent magnet having high coercive force and high magnetic properties can be obtained by removing the strain in a low temperature region and then having a higher coercive force than that of the above-described conventional permanent magnet. In this case, Dy and Tb having extremely high corrosion resistance and weather resistance compared with Nd are present at least on the surface of the sintered magnet S, so that Dy also serves as a protective film, and there is no additional protective film. Since it becomes a permanent magnet having strong corrosion resistance, productivity can be further improved and cost can be reduced by omitting an additional surface treatment step.

  After further performing the high temperature heat treatment step, if it further includes a slow cooling treatment step of cooling to a low temperature region at a cooling rate of 0.5 to 10 ° C./min, the cooling rate of the heat treatment in the high temperature region can be reduced. In addition, the permanent magnet itself is annealed to reduce the internal strain, and the coercive force can be further improved.

  In addition, if it further includes a rapid cooling treatment step of cooling to a temperature lower than the low temperature region after the slow cooling treatment step, the permanent magnet is quenched before the slow cooling treatment step, The effect of annealing before the treatment step is sufficiently exhibited, and the coercive force can be further improved.

  The high temperature region may be in the range of 750 to 1050 ° C, and the low temperature region may be in the range of 400 to 650 ° C. At a temperature lower than 750 ° C. in the high temperature region, at least one of Dy and Tb does not diffuse to the crystal grain boundary, and the defect strain of the magnet does not recover. Further, at a temperature exceeding 1050 ° C., at least one of Dy and Tb diffuses into the crystal grains, so that the magnetic characteristics of the permanent magnet deteriorate. On the other hand, at a temperature lower than 400 ° C. or a temperature exceeding 750 ° C. in the low temperature region, the defect strain of the magnet is not recovered.

  The film forming step includes a first step of heating the processing chamber and evaporating at least one of Dy and Tb disposed in advance in the processing chamber to form a metal vapor atmosphere in the processing chamber, and the temperature is kept lower than the temperature in the processing chamber. A second step of bringing the sintered magnet into the processing chamber and selectively depositing and depositing at least one of Dy and Tb on the surface of the sintered magnet due to a temperature difference between the processing chamber and the sintered magnet. If it is included, Dy and Tb can be deposited on the surface of the sintered magnet at a high speed with a predetermined film thickness, thereby further improving productivity, reducing resources, and increasing the yield of Dy and Tb that cannot be expected to provide a stable supply. Since it can be increased, further cost reduction can be achieved.

  The permanent magnet according to claim 6 has an iron-boron-rare earth sintered magnet having a predetermined shape, and after heat-treating at least one of Dy and Tb on the surface, heat treatment is performed in a high temperature region. And forming a diffusion layer having a predetermined film thickness including at least one of Dy and Tb on the surface of the sintered magnet, and diffusing at least one of Dy and Tb to a crystal grain boundary at a substantially central portion of the sintered magnet. The strain is removed in a low temperature region.

  The sintered magnet preferably has an average crystal grain size in the range of 1 μm to 5 μm or 7 μm to 20 μm. When the average crystal grain size is 7 μm or more, the rotational force at the time of magnetic field formation is increased, the degree of orientation is good, and further, when the diffusion step is performed, the surface area of the crystal grain boundary phase is reduced, so that Dy, At least one of Tb can be efficiently diffused in a short time. As a result, a permanent magnet having a very high holding force can be obtained, and the processing time of the diffusion process can be shortened to improve productivity. When the average crystal grain size exceeds 25 μm, the ratio of grains containing different crystal orientations at the grain boundaries becomes extremely large and the degree of orientation deteriorates. As a result, the maximum energy product of the permanent magnet, the residual magnetic flux density The holding power is reduced.

  On the other hand, when the average crystal grain size is less than 5 μm, the proportion of single domain crystal grains increases, and as a result, a permanent magnet having a very high holding force can be obtained. When the average crystal grain size is smaller than 1 μm, the grain boundary becomes fine and complicated, so that the time required for carrying out the diffusion process becomes extremely long and the productivity is poor.

  As described above, the permanent magnet of the present invention has extremely high coercive force and high magnetic characteristics, and the method for producing a permanent magnet of the present invention has extremely high coercive force and high magnetic characteristics. The permanent magnet can be produced with high productivity and at low cost.

  Referring to FIGS. 1 and 2, the permanent magnet M of the present invention forms at least one of Dy and Tb on the surface of the iron-boron-rare earth sintered magnet S having a predetermined shape. And a diffusion step of diffusing at least one of Dy and Tb formed on the surface by heat treatment at a predetermined temperature into the grain boundary phase of the sintered magnet S (FIG. 1). reference).

  The iron-boron-rare earth sintered magnet S is produced as follows. That is, Fe, B, and Nd are blended at a predetermined composition ratio, and an alloy of 0.05 mm to 0.5 mm is first manufactured by a known strip casting method. A small amount of Cu, Zr, Dy or Ga may be added during blending. Next, the produced alloy is once pulverized by a known hydrogen pulverization step, and then finely pulverized by a jet mill pulverization step.

  Next, the magnetic field is oriented by a known method and formed into a predetermined shape such as a rectangular parallelepiped with a mold, and thereafter sintered under predetermined conditions to obtain the sintered magnet (see FIG. 1A). Conditions were optimized in each step of manufacturing the sintered magnet so that the average crystal grain size of the sintered magnet was in the range of 1 μm to 5 μm, or in the range of 7 μm to 20 μm.

  When the average crystal grain size is 7 μm or more, the rotational force at the time of magnetic field formation is increased, the degree of orientation is good, and further, when the diffusion step is performed, the surface area of the crystal grain boundary phase is reduced, so that Dy, At least one of Tb can be efficiently diffused in a short time. As a result, a permanent magnet having a very high holding force can be obtained, and the processing time of the diffusion process can be shortened to improve productivity. When the average crystal grain size exceeds 25 μm, the ratio of grains containing different crystal orientations at the grain boundaries becomes extremely large and the degree of orientation deteriorates. As a result, the maximum energy product of the permanent magnet, the residual magnetic flux density The holding power is reduced.

  On the other hand, when the average crystal grain size is less than 5 μm, the proportion of single domain crystal grains increases, and as a result, a permanent magnet having a very high holding force can be obtained. When the average crystal grain size is smaller than 1 μm, the grain boundary becomes fine and complicated, so that the time required for carrying out the diffusion process becomes extremely long and the productivity is poor.

  As shown in FIG. 2, a film forming apparatus 1 for performing a film forming process has a known structure and is maintained at a predetermined degree of vacuum through a vacuum exhausting means 11 such as a turbo molecular pump, a cryopump, or a diffusion pump. A cylindrical vacuum chamber 12 is formed. An evaporation source 13 is provided at a substantially lower central portion of the vacuum chamber 12. The evaporation source 13 is a resistance heating type having a known structure, and has a crucible 13a that can store granular Dy and Tb. Then, resistance current is generated by passing a current through the crucible 13a, and Dy and Tb are heated and evaporated by the heat.

  On the other hand, an electron gun (not shown) may be disposed in the vicinity of the crucible, and an accelerated and focused electron beam may be applied to heat and evaporate Dy and Tb using the energy of the electron beam. The particle diameters of Dy and Tb installed in the crucible 13a are preferably in the range of 10 to 1000 μm. When the particle size is 10 μm or less, it is difficult to handle ignitable Dy and Tb grains. On the other hand, when the particle size exceeds 1000 μm, it takes time to evaporate.

A substrate holder 14 is provided in the upper part of the vacuum chamber 11 so as to face the evaporation source 13, and a plurality of sintered magnets S are sintered by the substrate holder 14 so that a surface having a large surface area faces the evaporation source 13. The magnet S can be held. The crucible 13a and the substrate holder 14 are made of a material that does not react with the metal evaporation material V to be deposited, for example, Mo, W, V, Ta or an alloy thereof, CaO, Y ₂ O ₃ , or a rare earth oxide, or these The material is formed as a lining film on the surface of another heat insulating material.

  In addition, a plasma generator (not shown) having a known structure for generating Ar or He plasma is provided in the vacuum chamber 12 so that the surface of the sintered magnet S is cleaned by plasma prior to film formation in the vacuum chamber 12. It may be.

When forming the film of Dy or Tb on the surface of the sintered magnet S by the film forming apparatus 1, the sintered magnet S produced as described above is set on the substrate holder 14, and Dy or Tb is arranged in the crucible 13 a. Next, after evacuating the vacuum chamber 12 to a predetermined pressure (for example, 10 × 10 ⁻⁶ Pa), the evaporation source 13 is operated to evaporate Dy and Tb, and adhere and deposit on the surface of the sintered magnet S ( (Refer FIG.1 (b)).

  The film thickness of Dy and Tb in the film forming process is determined in consideration of the heat treatment time in the diffusion process described later, the volume of the sintered magnet S, and the like (for example, 2 to 20 μm). In this case, it is not necessary to form Dy or Tb over the entire surface of the sintered magnet S. If Dy or Tb is formed on at least a part of the surface, the average crystal grain size of the sintered magnet is 1 μm. Since the range of ˜5 μm or the range of 7 μm to 20 μm is used, when Dy or Tb is diffused into the grain boundary phase in the next diffusion step, a high-performance permanent magnet M is obtained. However, if the surface area on which the Dy or Tb film is formed is small with respect to the volume of the sintered magnet, the heat treatment time in the diffusion process becomes longer. Therefore, considering productivity, at least 80% of the total surface area of the sintered magnet Dy and Tb are preferably formed.

  On the other hand, the heat treatment apparatus for carrying out the diffusion process may be any heat treatment apparatus that can heat the sintered magnet S with Dy and Tb formed on the surface at a predetermined temperature. In the vacuum chamber, a plurality of electric heaters are provided so that the sintered magnet S can be uniformly heated up to a predetermined temperature and held throughout.

When the sintered magnet S whose surface is formed with Dy or Tb is diffused by the heat treatment apparatus, it is necessary to obtain a permanent magnet having an extremely high coercive force and high magnetic properties. In the present embodiment, the diffusion process of evacuation is performed in two stages until the pressure in the processing chamber reaches a predetermined value (for example, 10 × 10 ⁻⁵ Pa) through the evacuation means. In this case, first, a heat treatment is performed in a high temperature region to form a diffusion layer having a predetermined thickness including at least one of Dy and Tb on the surface of the sintered magnet S, and Dy and Tb of the sintered magnet are formed in the grain boundary phase of the sintered magnet. A high-temperature heat treatment process for diffusing at least one of them is performed, and subsequently, a low-temperature heat treatment process for performing heat treatment in a low-temperature region to remove the distortion of the sintered magnet is performed.

  Moreover, after implementing a high temperature heat treatment process so that the distortion | strain inside a permanent magnet may reduce, the slow cooling process process which cools to a low temperature area | region at the cooling rate of 0.5-10 degreeC / min is implemented. In this case, if the cooling rate is slower than 0.5 ° C./min, the production time is extended and the cost is increased. Further, at a cooling rate exceeding 10 ° C./min, distortion is generated in the magnet, and the magnetic properties of the permanent magnet are deteriorated. Thereby, by slowing down the cooling rate of the heat treatment in the high temperature region, the sintered magnet is annealed, so that the distortion inside the permanent magnet M is reduced and the coercive force can be further improved.

  Furthermore, after the slow cooling process is performed, the operation of the electric heater is stopped and the vacuum chamber is opened to the atmosphere so that the rapid cooling process for cooling to a temperature lower than the low temperature region is performed. By sintering the sintered magnet before, the effect of annealing before the subsequent annealing process is sufficiently exhibited, and the coercive force can be further improved.

  The high temperature region may be in the range of 750 to 1050 ° C, and the low temperature region may be in the range of 400 to 650 ° C. At a temperature lower than 750 ° C. in the high temperature region, at least one of Dy and Tb does not diffuse to the crystal grain boundary, and the defect strain of the magnet does not recover. Further, at a temperature exceeding 1050 ° C., at least one of Dy and Tb diffuses into the crystal grains, so that the magnetic characteristics of the permanent magnet deteriorate. On the other hand, at a temperature lower than 400 ° C. or a temperature exceeding 750 ° C. in the low temperature region, the defect strain of the magnet is not recovered.

  Thereby, a diffusion layer of Dy or Tb is formed on at least a part of the surface of the sintered magnet S, and a permanent magnet diffused substantially over the entire crystal grain boundary is obtained (see FIG. 1C). In this case, since conventional neodymium magnets are easily rusted, a protective film is formed by adding surface treatment such as adding Co or resin coating such as epoxy resin or PPS resin or nickel plating, but compared with Nd Dy and Tb having extremely high corrosion resistance and weather resistance are present at least on the surface of the sintered magnet S, so that Dy also plays a role as a protective film, and has strong corrosion resistance without the addition of Co or an additional protective film. It becomes the permanent magnet which has. Further, by omitting an additional surface treatment step and not using expensive Co, productivity can be further improved and costs can be reduced.

  It is preferable that the surface of the sintered magnet S and the crystal grain boundary have a Dy rich phase (a phase containing Dy in a range of 5 to 80%). According to this, a conventional neodymium magnet is composed of three phases of a main phase, an Nd-rich phase, and a B-rich phase, but there is a Dy-rich phase in the Nd-rich phase at the grain boundary where the corrosion resistance and weather resistance are weak. Thus, combined with the presence of the Dy-rich phase on the surface of the sintered magnet S, a permanent magnet having extremely strong corrosion resistance and weather resistance is obtained.

  More preferably, the surface of the sintered magnet S is covered with the Dy-rich phase, and the Dy-rich phase is included in the range of 1 to 50% at the crystal grain boundary. When the Dy rich phase is included in the crystal grain boundary beyond the range of 50%, the maximum energy product, the residual magnetic flux density, and the coercive force showing magnetic characteristics are remarkably lowered.

  In the present embodiment, the film forming process using the film forming apparatus 1 by the vapor deposition method has been described. However, the yield of Dy and Tb, which are scarce in resources and cannot be stably supplied, is increased, and the film forming process is performed. In order to shorten the time and improve productivity, the following film forming apparatus 10 may be used as the film forming process.

Referring to FIGS. 3 and 4, the film forming apparatus 10 is suitable for selectively depositing Dy and Tb on the surface of the iron-boron-rare earth sintered magnet S at high speed. The processing chamber 2 and the preparation chamber 3 are connected in the vertical direction. The processing chamber 2 located on the upper side is a cylindrical vacuum chamber 10b that can be maintained at a predetermined degree of vacuum (for example, 10 × 10 ⁻⁶ Pa) through a vacuum exhaust means 10a such as a turbo molecular pump, a cryopump, or a diffusion pump. Is placed inside.

  The processing chamber 2 is defined by a soaking plate 21 processed into a cylindrical shape so that the lower surface is opened, and communicates with the preparation chamber 3 through the opening on the lower surface. The vacuum chamber 10b is provided with a heat insulating material 22 made of carbon so as to surround the periphery of the soaking plate 21 except for the opened lower surface. In the space between the soaking plate 21 and the heat insulating material 22, for example, a plurality of electric heaters 23 using W are provided to constitute a heating means. Thereby, the soaking plate 21 surrounded by the heat insulating material 22 in the vacuum is heated by the heating means 23, and the inside of the processing chamber 2 is indirectly heated through the soaking plate 21. Can be heated substantially evenly.

  In the processing chamber 2, a tray 24 having a concave section in which granular Dy and Tb, which are metal evaporation materials, are disposed is provided. The saucer 24 is formed in an annular shape so that Dy and Tb can be arranged around the sintered magnet S moved into the processing chamber 2 by a conveying means described later, and is attached to the inner wall surface of the heat equalizing plate 21. It has been. Note that the trays 24 do not have to be formed in an annular shape, and may be arranged at equal intervals in the circumferential direction.

  A first space 4 is formed below the processing chamber 2, and a shielding unit 5 is provided in the first space 4. The shielding means 5 is composed of a valve main body 51 and a driving means 52 such as an air cylinder for driving the valve main body 51. The driving means 52 allows the valve main body 51 to communicate with the processing chamber 2 and the preparation chamber 3. (The state shown in FIG. 1), the valve body 51 is movable between a closed position where the valve body 51 contacts the peripheral edge of the opening formed in the top plate 41 defining the first space 4 and seals the processing chamber 2. Become. The valve body 51 is provided with a second heating means (not shown).

  A second space 3a is provided below the first space 4, and a gate valve (not shown) is provided on a side wall 30 defining the second space 3a. The gate valve is opened and closed to be sintered. The magnet S is carried in and out. The sintered magnet S is held by the holding means 6. The holding means 6 is supported by three struts 61 at predetermined intervals upward from the lower ends of the three struts 61 provided in the vertical direction at predetermined intervals on the same circumference. And two mounting tables 62 provided horizontally. Each strut 61 is configured so that the diameter of the strut 61 is small so that the heat conduction is small. This is to make it difficult for heat from the pressing member 74 described later to be transmitted to the sintered magnet S through the support 61.

  In addition, the mounting table 62 is formed by arranging wires of φ0.1 to 10 mm in a lattice shape so that the film can be formed on the surface of the sintered magnet S mounted on the mounting table 62 on the mounting table 62 side. It is good to do. Further, the interval between the mounting tables 62 is set in consideration of the height of the sintered magnet S and the like. The holding means 6 is provided on the disc 63 provided in the second space 3a and formed in the center with an opening 63a through which a support base, which will be described later, can be inserted. The disc 63 is provided in the processing chamber 2. It is placed on a ring-shaped support member 64.

As described above, when Al ₂ O ₃ often used in a general vacuum apparatus is used, Dy and Al ₂ O ₃ in the vapor atmosphere react to form a reaction product on the surface, and Al atoms are converted into Dy. Since there is a risk of entering the vapor atmosphere, the heat equalizing plate 21 that defines the processing chamber 2, the holding means 6 that the sintered magnet S holds, and the support base 73 of the conveying means 7 are metal evaporation materials to be formed into a film. Made of a material that does not react with, for example, Mo, W, V, Ta, or alloys thereof, CaO, Y ₂ O ₃ , or rare earth oxides, or these materials are lined on the surface of other insulating materials As shown in FIG.

A third space 3b is formed below the second space 3a, and the second spaces 3a and 3b are provided in the preparation chamber 3.
Configure. A vacuum evacuation unit 31 such as a turbo molecular pump, a cryopump, or a diffusion pump is connected to the preparation chamber 3, and the inside of the processing chamber 2 communicated with the preparation chamber 3 via the first space 4 by the vacuum evacuation unit 31. Can be maintained at a predetermined degree of vacuum. Driving means 71 such as an air cylinder is provided at the bottom of the preparation chamber 3, and a circular support base 73 is attached to the tip of the shaft portion 72 protruding into the preparation chamber 3. Constitutes the transfer means 7, and the support base 73 can be raised and lowered between a predetermined position (lowering position) in the preparation chamber 3 and a predetermined position (upward position) in the processing chamber 2.

  A pressing member 74 having an inverted T-shaped cross section is attached to the shaft portion 72 below the support base 73, and the pressing member 74 is a disk 63 when the transport means 7 is moved to the raised position. A role of sealing the processing chamber 2 by lifting the substrate upward and pressing a sealing material (not shown) such as a metal seal provided on the outer peripheral edge of the disc 63 against the peripheral edge of the opening formed in the top plate 41. Fulfill. The pressing member 74 is provided with third heating means (not shown).

  The second space 3a constituting the preparation chamber 3 is provided with a plasma generating means having a coil (not shown) connected to a high frequency power source and a gas introducing means 32 for introducing an inert gas. The inert gas is a rare gas such as He or Ar. Then, plasma is generated in the preparatory chamber 3, and a pretreatment for cleaning the surface of the sintered magnet S by plasma is performed prior to film formation in the processing chamber 2. In this case, the preparatory chamber 3 is provided with an electric heater (not shown) using, for example, W, and the pretreatment for cleaning the surface of the sintered magnet S by heat treatment is performed on the sintered magnet S after film formation is completed. You may comprise so that heat processing can be performed in a vacuum atmosphere.

  Next, production of a permanent magnet using the film forming apparatus 10 will be described. First, an iron-boron-rare earth sintered magnet S is obtained as described above. Next, the sintered magnet S is placed on the mounting table 61 of the holding means 6. In this case, it is good to mount so that the magnetization easy direction may become parallel to the mounting base 73. Next, Dy having a particle size in the range of 10 to 1000 μm is installed in the tray 24 in the processing chamber 3. In order to increase the yield of Dy, the total amount of Dy installed in the tray 24 is set so that the sintered magnet S has a predetermined temperature (the temperature at which Dy and Tb diffuse not only in the crystal grains of the sintered magnet but also in the grain boundary phase). It is necessary to continue the Dy vapor atmosphere in the processing chamber 2 until it reaches.

Next, the gate valve provided on the side wall 30 is opened, and the holding means 6 on which the sintered magnet is installed is loaded into the second space 3a and installed on the disc 63a, and then the gate valve is closed and each evacuation means is closed. 10a and 31 are operated to evacuate the vacuum chamber 10b, and until the processing chamber 2 reaches a predetermined pressure (for example, 10 × 10 ⁻⁶ Pa) through the preparation chamber 3 and the first space 4. Evacuate. In this case, the shielding means 5 is in the open position.

  Next, when the pressure in the processing chamber 2 and the preparation chamber 3 reaches a predetermined value, the shielding unit 5 is moved to the closed position by the driving unit 52, the processing chamber 2 is sealed by the valve body 51, and the heating unit 23 and the shielding unit are sealed. 5, the second heating means of the valve main body 51 is operated to heat the temperature in the processing chamber 2 until it reaches a predetermined temperature. In this case, the temperature in the processing chamber is preferably set in a range of 1000 ° C. to 1700 ° C. At a temperature lower than 1000 ° C., the vapor pressure at which Dy can be formed at high speed on the surface of the sintered magnet S is not reached. On the other hand, if the temperature exceeds 1700 ° C., the film formation time of the sintered magnet S may be too short to form a film uniformly. The temperature of the processing chamber 2 is preferably in the range of 1200 ° C to 1500 ° C, more preferably in the range of 1200 ° C to 1400 ° C. In these temperature ranges, a desired film thickness can be formed at high speed.

  Then, for example, a Dy vapor atmosphere having a vapor pressure of 10 Pa at 1300 ° C. is formed in the processing chamber 2. At 10 Pa, since convection occurs in the processing chamber 2, as described later, when the room-temperature sintered magnet S is carried into the processing chamber, a film is formed over the entire surface.

On the other hand, while the Dy vapor atmosphere is formed in the processing chamber 2, in the preparation chamber 3, for example, a pretreatment for surface cleaning is performed in order to remove an oxide film on the surface of the sintered magnet S. In this case, an inert gas, for example, Ar is introduced into the preparation chamber 3 through the gas introduction means 32 until the pressure in the preparation chamber 3 reaches a predetermined value (for example, 10 × 10 ⁻¹ Pa), and the high-frequency power supply is activated. Then, plasma may be generated in the preparation chamber 3 to clean the surface of the sintered magnet with plasma. When the cleaning pretreatment is completed, the sintered magnet is brought to a temperature of room temperature to 200 ° C.

  Next, when the formation of the Dy vapor atmosphere in the processing chamber 2 and the cleaning of the surface of the sintered magnet S in the preparation chamber 3 are finished, a pressure difference of two digits or more is once generated between the processing chamber 2 and the processing chamber 2. The inert gas such as Ar is introduced into the preparation chamber 3 through the gas introduction means 32 until the pressure in the preparation chamber 3 reaches a predetermined value (for example, 1000 Pa). When the pressure in the preparation chamber 3 reaches a predetermined value, the shielding means 5 is moved to the open position to cause the processing chamber 2 and the preparation chamber 3 to communicate with each other. In this case, since a pressure difference is created between the processing chamber 2 and the preparation chamber 3, evaporation enters the processing chamber 2 from the preparation chamber 3 and the pressure in the processing chamber 2 increases, so that evaporation temporarily stops ( The operation of the heating means 23 is not stopped), and Dy evaporated in the processing chamber 2 is prevented from entering the preparation chamber 3 side.

Next, when evacuation is performed until the pressure in the processing chamber 2 and the preparation chamber 3 again reaches a predetermined value (for example, 10 × 10 ⁻² Pa) through the evacuation unit 31, Dy re-evaporates. Then, the driving means 71 of the conveying means 7 is operated to convey the holding means 6 holding the sintered magnet S into the processing chamber 2. In this case, the processing chamber 2 is sealed by a sealing material such as a metal seal provided on the outer peripheral edge of the disc 63 coming into contact with the peripheral edge of the opening formed in the top plate 41.

  Next, when the heated processing chamber 2 is sealed again, for example, a Dy saturated vapor atmosphere of 10 Pa at 1300 ° C. is formed in the processing chamber 2 and held in this state for a predetermined time. In this case, since the sintered magnet S having a temperature lower than that in the processing chamber 3 is carried into the high-temperature processing chamber 2, the surface of the sintered magnet S is caused by a temperature difference between the processing chamber 2 and the sintered magnet S. Dy in the vapor selectively adheres and deposits on the film (film formation step). Thereby, Dy is formed at high speed only on the surface of the sintered magnet S (see FIG. 3B). At this time, the pressing member 74 of the support base 73 is heated to substantially the same temperature as the soaking plate 21 by a third heating means (not shown), so that Dy in the vapor adheres to the pressing member 74. Absent.

  When the normal temperature sintered magnet S is carried into the processing chamber 2 heated to a high temperature, the sintered magnet S itself is also heated by the radiant heat, so that the holding time in the processing chamber 2 in which the saturated vapor atmosphere is formed. Is the time until the sintered magnet S reaches 900 ° C., and the required amount (“required amount” on the surface of the sintered magnet S means that Dy diffuses only in the grain boundary phase and the sintered magnet S This is the amount until the magnetic properties are improved. When the sintered magnet S reaches a temperature exceeding 900 ° C., Dy enters the grains (the main phase crystal grains) of the sintered magnet S, and in the end, it is the same as when Dy is added when obtaining a permanent magnet. Therefore, there is a possibility that the magnetic field strength, and hence the maximum energy product indicating magnetic characteristics, may be greatly reduced.

  By the way, when the sintered magnet S is heated and thermally expanded, the thermal expansion of the sintered magnet S exhibits an Invar alloy abnormality at a Curie temperature (about 300 ° C.) or lower and adheres to the surface of the sintered magnet S. The film peels easily. For this reason, it is preferable that the holding time is a time until the maximum temperature of the sintered magnet S reaches 250 ° C. or lower or 450 ° C. or higher. At a temperature of 250 ° C. or lower, the strain due to abnormal thermal expansion is reduced, so that the Dy film formed on the surface of the sintered magnet S does not easily peel off. On the other hand, when the sintered magnet S is partially melted at a temperature of 450 ° C. or higher, the adhesion between the sintered magnet S and the Dy deposited and deposited on the surface of the sintered magnet S is improved. Peeling of Dy formed on the surface of S is difficult to occur.

  On the other hand, an inert gas such as Ar is introduced into the preparation chamber 3 through the gas introduction means 32 until the pressure in the preparation chamber 3 reaches a predetermined value (for example, 1000 Pa). When a predetermined time elapses after the sintered magnet S is conveyed into the processing chamber 2, the driving means 71 moves the support base 73 from the rising position in the processing chamber 2 to the lowering position in the preparation chamber 3, thereby shielding the means. 5 is moved from the open position to the closed position. At this time, the valve body 51 of the shielding means 5 is heated to substantially the same temperature as the soaking plate 21 by a second heating means (not shown), so that Dy in the vapor does not adhere to the valve body 51. . Also, evaporation stops when Ar enters the processing chamber 2 from the preparation chamber 3. Then, the sintered magnet on which Dy is formed in this Ar atmosphere is cooled.

Subsequently, the vacuum chamber is evacuated until the pressure in the preparation chamber 3 isolated from the processing chamber 2 reaches a predetermined value (10 × 10 ⁻³ Pa) via the vacuum pumping means 31, and the heating unit provided in the preparation chamber 3 is operated. Then, as described above, heat treatment is performed on the sintered magnet S on which Dy is formed in two stages as the diffusion process. Finally, after cooling for a predetermined time, the gate valve on the side wall 30 is opened and the holding means 6 is taken out.

  Thereby, Dy is formed over the entire surface of the sintered magnet S, heat treatment is performed, and a diffusion layer of Dy and Tb is formed on at least a part of the surface of the sintered magnet S. A permanent magnet diffused over substantially the entire area can be obtained. In this case, the productivity can be further improved and the yield of Dy and Tb can be increased in combination with the fact that an additional surface treatment step can be omitted and that Dy can be formed on the surface of the magnet at a predetermined film speed. Therefore, further cost reduction becomes possible.

  As an iron-boron-rare earth sintered magnet, the composition is 28 Nd-2V-0.9B-bal. Using a thing of Fe, it processed into a rectangular parallelepiped shape of 10 × 20 × 40 mm. In this case, Fe, B, Nd, V are blended in the above composition ratio, an alloy of 0.05 mm to 0.5 mm is produced by a known strip casting method, and once pulverized by a known hydrogen pulverization step, Fine pulverization by jet mill pulverization process. Next, after magnetic field orientation and molding into a predetermined shape with a mold, sintering was performed under predetermined conditions to obtain a sintered magnet S. The surface of the fired magnet S was finished so as to have a surface roughness of 20 μm or less, and then washed with acetone.

  Next, Dy was formed on the surface of the sintered magnet S using the film forming apparatus 1. Using Dy having a purity of 99.9%, Dy was placed in the crucible 13a, and 70 sintered magnets S were placed on the substrate holder 14 such that one surface having the largest surface area was opposed to the crucible 13a.

Next, after the pressure in the vacuum chamber 12 is once evacuated to 10 × 10 ⁻⁶ Pa, the electron gun constituting the evaporation source 13 is operated to heat Dy, and the film is formed by EB vapor deposition for 5 minutes. A Dy film having an average thickness of 5 μm was obtained on the surface of the sintered magnet. Next, the vacuum chamber 12 is once opened to the atmosphere and the sintered magnet is taken out. The sintered magnet is again placed so that the other surface having the largest surface area faces the crucible 13a. A thin film of Dy was formed on at least 87% of the total surface area.

Subsequently, the sintered magnet S in which Dy was formed on two surfaces having the largest surface area was placed in a heat treatment apparatus, and a diffusion process was performed. As conditions for the diffusion process, the pressure in the vacuum chamber was set to 10 × 10 ⁻³ Pa, and a high-temperature heat treatment process (maximum 96 hours) and a low-temperature heat treatment process (30 minutes) were sequentially performed for a predetermined time.

  FIG. 5 shows that, under the above conditions, the temperature of the high temperature heat treatment step is changed in the range of 700 to 1080 ° C., the temperature of the low temperature heat treatment step is changed in the range of 400 to 650 ° C., and the annealing treatment step is changed in the range of 0 to 50 ° C./min. 11 is a table showing the average value of the magnetic properties of the permanent magnets obtained with or without the rapid cooling treatment step and the depth (mm) of the high-concentration diffusion layer from the surface of the permanent magnet M.

  According to this, when the temperature of the high-temperature heat treatment step is in the range of 750 to 1050 ° C., the permanent magnet having a high magnetic characteristic with a maximum energy product of 53 MGOe, a residual magnetic flux density of 14.8 or more, and a coercive force of 19.0 KOe. It can be seen that However, when the low temperature heat treatment step is not performed, only a coercive force of about 16 KOe can be obtained. On the other hand, when the low temperature heat treatment step is performed within the range of 400 to 650 ° C. in addition to the high temperature heat treatment step, the coercive force is higher than 19 KOe. It can be seen that the coercive force is obtained. In addition, when the annealing process was performed at a high speed exceeding 10 ° C./min, only a coercive force of about 15 KOe was obtained. Furthermore, it can be seen that the coercive force is higher in the permanent magnet subjected to the rapid cooling treatment step under the same conditions.

  The same iron-boron-rare earth sintered magnet as in Example 1 was used. Next, Dy was formed on the surface of the sintered magnet S using the film forming apparatus 10. Dy having a purity of 99.9% was used and placed on the tray 24, and 70 sintered magnets S were placed on each mounting table 62 so as to face each other along a radial line.

Prior to the film formation of Dy, Ar is introduced into the preparation chamber 3, the pressure is set to 10 × 10 ⁻¹ Pa, the high frequency voltage is set to 800 V, and the surface of the sintered magnet is cleaned by plasma treatment for 60 seconds. went. In this case, the temperature of the fired magnet after cleaning was 60 ° C.

On the other hand, the processing chamber 2 is sealed at the closed position of the shielding means 5, the inside of the processing chamber 2 is heated to 1300 ° C., Dy is evaporated, and the processing chamber 2 is filled with metal vapor. Further, the pressure in the processing chamber 2 and the preparation chamber 3 when the sintered magnet S is carried into the metal vapor atmosphere is set to 10 × 10 ⁻² Pa, and the sintered magnet S is held after being transferred to the processing chamber 2. The time was set to 5 minutes, and an average Dy film having a thickness of 10 μm was deposited. Furthermore, as the conditions for the heat treatment in the preparation chamber 3, the pressure in the preparation chamber 3 is set to 10 × 10 ⁻³ Pa, and a predetermined time, a high temperature heat treatment step (maximum 96 hours) and a low temperature heat treatment step (30 minutes), Were carried out sequentially.

  FIG. 6 shows that the temperature of the high temperature heat treatment step is in the range of 700 to 1080 ° C., the temperature of the low temperature heat treatment step is in the range of 450 to 650 ° C., and the slow cooling treatment step is in the range of 0.1 to 100 ° C./min. 4 is a table showing the average value of the magnetic characteristics of the permanent magnet obtained with or without performing the quenching process and the depth (mm) of the high-concentration diffusion layer from the surface of the permanent magnet M. .

  According to this, when the temperature of the high-temperature heat treatment process is in the range of 750 to 1050 ° C., the permanent magnet having a high magnetic property with a maximum energy product of 53 MGOe, a residual magnetic flux density of 14.8 or more, and a coercive force of 19.5 KOe. It can be seen that However, when the low temperature heat treatment step is not performed, only a coercive force of about 13 KOe can be obtained. On the other hand, when the low temperature heat treatment step is performed in the range of 400 to 650 ° C. in addition to the high temperature heat treatment step, 19.5 KOe or more. It can be seen that a high coercive force is obtained. In addition, when the annealing process was performed at a high speed exceeding 10 ° C./min, only a coercive force of about 15 KOe was obtained. Furthermore, it can be seen that the coercive force is higher in the permanent magnet subjected to the rapid cooling treatment step under the same conditions.

(A) thru | or (c) is a figure explaining the manufacturing procedure of the permanent magnet of this invention. 1 is a diagram schematically illustrating a configuration of a film forming apparatus of the present invention. The figure which illustrates schematically the structure of the film-forming apparatus which concerns on other embodiment. The figure explaining holding | maintenance of the sintered magnet in the process chamber of the film-forming apparatus shown in FIG. 2 is a table showing average values of magnetic characteristics of permanent magnets manufactured in Example 1; 6 is a table showing average values of magnetic characteristics of permanent magnets manufactured in Example 2.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Film-forming apparatus 12 Vacuum chamber 13 Evaporation source 14 Holder S Sintered magnet M Permanent magnet

Claims (7)

A film forming process for forming at least one of Dy and Tb on the surface of an iron-boron-rare earth sintered magnet having a predetermined shape, and a heat treatment in a high temperature region to form at least Dy and Tb on the sintered magnet surface. A diffusion layer having a predetermined thickness including one is formed, and a high-temperature heat treatment step for diffusing at least one of Dy and Tb into the grain boundary phase of the sintered magnet, and a heat treatment in a low-temperature region to cause distortion of the sintered magnet And a low-temperature heat treatment step of removing the permanent magnet. The method of manufacturing a permanent magnet according to claim 1, further comprising a slow cooling treatment step of cooling to a low temperature region at a cooling rate of 0.5 to 10 ° C./min after performing the high temperature heat treatment step. The method of manufacturing a permanent magnet according to claim 2, further comprising a rapid cooling treatment step of cooling to a temperature lower than a low temperature region after performing the slow cooling treatment step. The said high temperature area | region is the range of 750-1050 degreeC, and the said low temperature area | region is the range of 400-650 degreeC, The manufacturing method of the permanent magnet in any one of the Claims 1 thru | or 3 characterized by the above-mentioned. The film forming step includes a first step of heating the processing chamber and evaporating at least one of Dy and Tb disposed in advance in the processing chamber to form a metal vapor atmosphere in the processing chamber, and the temperature is kept lower than the temperature in the processing chamber. A second step of bringing the sintered magnet into the processing chamber and selectively depositing and depositing at least one of Dy and Tb on the surface of the sintered magnet due to a temperature difference between the processing chamber and the sintered magnet. The manufacturing method of the permanent magnet in any one of Claim 1 thru | or 4 characterized by the above-mentioned. It has an iron-boron-rare earth sintered magnet having a predetermined shape, and after depositing at least one of Dy and Tb on its surface, it is subjected to heat treatment in a high temperature region to form Dy and Tb on the surface of the sintered magnet. A diffusion layer having a predetermined film thickness including at least one is formed, and at least one of Dy and Tb is diffused to the crystal grain boundary in the substantially central portion of the sintered magnet, and then strain is removed in a low temperature region. A featured permanent magnet. The permanent magnet according to claim 6, wherein the sintered magnet has an average crystal grain size in the range of 1 μm to 5 μm or 7 μm to 20 μm.

Images